KR101736624B1 - Shot blast - Google Patents

Shot blast Download PDF

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Publication number
KR101736624B1
KR101736624B1 KR1020150182861A KR20150182861A KR101736624B1 KR 101736624 B1 KR101736624 B1 KR 101736624B1 KR 1020150182861 A KR1020150182861 A KR 1020150182861A KR 20150182861 A KR20150182861 A KR 20150182861A KR 101736624 B1 KR101736624 B1 KR 101736624B1
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KR
South Korea
Prior art keywords
unit
projection
supply
short ball
width
Prior art date
Application number
KR1020150182861A
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Korean (ko)
Inventor
박석달
Original Assignee
주식회사 포스코
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Priority to KR1020150182861A priority Critical patent/KR101736624B1/en
Application granted granted Critical
Publication of KR101736624B1 publication Critical patent/KR101736624B1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/10Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces for treating external surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/10Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces for treating external surfaces
    • B24C3/14Apparatus using impellers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C5/00Devices or accessories for generating abrasive blasts
    • B24C5/06Impeller wheels; Rotor blades therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C7/00Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
    • B24C7/0007Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier
    • B24C7/0015Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier with control of feed parameters, e.g. feed rate of abrasive material or carrier
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C9/00Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
    • B24C9/006Treatment of used abrasive material
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning In General (AREA)

Abstract

Start the shot blast.
The shot blast according to an embodiment of the present invention includes: a width sensing unit for sensing a width of a strip to be transferred after annealing; A short ball supply unit connected to the short ball supply source to supply a short ball; A short ball projecting unit configured to project the short ball supplied from the short ball supply unit onto at least a part of the strip and adjust the projection width of the short ball; And a control unit for adjusting a projection width of a shot ball projected from the shotball projection unit according to a width of the strip sensed by the width sensing unit. . ≪ / RTI >

Description

SHOT BLAST {SHOT BLAST}

The present invention relates to a shot blast for shoveling an oxide scale layer formed on a surface of a strip by projecting a short ball to an annealed strip.

An oxide scale layer is formed on the surface of the strip annealed in the annealing furnace.

In order to remove the oxidized scale layer thus formed from the surface of the script, the strip is pickled with an acid solution in a pickling apparatus.

Shot blast is used to facilitate removal of the oxide scale layer by the pickling treatment of the strip in such a pickling apparatus.

In the shot blast, a short ball, which is a small iron ball, is projected onto the annealed strip in the annealing furnace. Thereby, the oxide scale layer formed on the surface of the strip is crushed, and the pickling solution can easily penetrate into the oxide scale layer in the pickling treatment of the strip in the pickling apparatus. Further, removal of the oxide scale layer from the surface of the strip by the pickling treatment in the pickling apparatus can be made easier.

On the other hand, the width of the annealed strip is not constant. Therefore, depending on the width of the strip, the width of the projection of the short ball must also vary.

In the conventional shot blast, the operator manually adjusts the projection width of the shot ball while checking the width of the strip with the naked eye.

Therefore, when adjustment of the projection width of the short ball by the operator is not smooth, there is a portion of the strip on which the oxide scale layer is not broken due to the short ball. Then, in the pickling apparatus, there was a part where the pickling treatment was not performed, that is, the oxide scale layer was not removed from the other parts.

In this way, strips having portions where the oxide scale layer was not removed had to be reprocessed.

The present invention is realized by recognizing at least one of the requirements or problems occurring in the conventional shot blast.

One aspect of the object of the present invention is to minimize the portion of the surface of the strip remaining on the surface of the strip after the pickling treatment.

A shot blast relating to an embodiment for realizing at least one of the above problems may include the following features.

The shot blast according to an embodiment of the present invention includes: a width sensing unit for sensing a width of a strip to be transferred after annealing; A short ball supply unit connected to the short ball supply source to supply a short ball; A short ball projecting unit configured to project the shot ball supplied from the short ball supply unit onto at least a part of the strip and adjust the projection width of the shot ball; And a control unit for adjusting a projection width of the shot ball projected from the shotball projecting unit according to the width of the strip sensed by the width sensing unit. . ≪ / RTI >

In this case, the short ball supply unit is configured to adjust the supply amount of the short ball, and the control unit can adjust the supply amount of the short ball supplied from the shot ball supply unit to the shot ball projection unit according to the width of the strip sensed by the width sensing unit.

The width sensing unit may include a plurality of first sensors provided on one side of the strip at a predetermined interval in a width direction of the strip and a plurality of second sensors provided below one side of the strip to correspond to the plurality of first sensors, And a plurality of first and second sensors may be electrically connected to the control unit.

The width sensing unit may further include a sensor support member through which at least a portion of one side of the strip passes and includes a plurality of first and second sensors.

The short ball supply unit may include a supply unit main body connected to the shot ball supply source and the shot ball throwing unit, and a supply adjustment unit electrically connected to the control unit to adjust the opening degree of the supply port formed in the supply unit main body.

The supply regulating unit may include a supply regulating plate movably provided in the supply main body to open and close the supply port, and a supply regulating cylinder connected to the supply regulating plate and configured to move the supply regulating plate by the control unit.

The short ball supply unit may further include a foreign matter removing unit for removing foreign matter adhered to the short ball supplied from the short ball supply source.

The foreign matter removing unit may include a filter member movably provided in the supply member body on the supply port, and a foreign matter removing cylinder connected to the filter member and reciprocating the filter member by the control unit.

The short ball throwing unit includes a projection unit connected to the short ball supply unit and provided on the strip, a projection unit configured to project a short ball supplied from the short ball supply unit onto a strip through a projection hole formed in the projection unit body, And a projection adjusting unit that adjusts the degree of opening of the projection and is electrically connected to the control unit.

The projection unit may include a projection fan that is rotatably installed in the projection unit body and allows the shot ball to be projected through the projection unit, and a projection motor connected to the projection fan and rotated by the control unit.

The projection adjusting unit may include a projection adjusting plate movably provided in the projection unit main body to open and close the projection tool, and a projection adjusting cylinder connected to the projection adjusting plate to move the projection adjusting plate by the controller.

The shotball throwing unit may further include a shotball collecting unit for sending a shot ball not projected to the throwing ball to a shotball supply source.

In addition, the shotball collecting unit may include a short ball supply source and a return pipe connected to the main body of the projection unit, an air supply pipe for blowing air to the short ball supply source side to the return pipe to allow the short ball introduced into the return pipe to move to the short ball supply source, Closing valve that is opened or closed by the control unit.

As described above, according to the embodiment of the present invention, the projection width of the short ball can be adjusted according to the width of the strip.

Further, according to the embodiment of the present invention, the oxide scale layer formed on the strip can be evenly fractured by the short ball.

1 is a view showing an embodiment of a shot blast according to the present invention.
FIG. 2 is an enlarged view of a shot ball supply unit according to an embodiment of the shot blast according to the present invention.
3 and 4 are views showing the operation of one embodiment of the shot blast according to the present invention.

In order to facilitate understanding of the features of the present invention as described above, a shot blast according to an embodiment of the present invention will be described in more detail.

The embodiments described below will be described on the basis of embodiments best suited to understand the technical characteristics of the present invention and the technical features of the present invention are not limited by the embodiments described, It is to be understood that the invention can be practiced with embodiments. Therefore, it is intended that the present invention covers the modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents. In order to facilitate an understanding of the embodiments described below, in the reference numerals shown in the accompanying drawings, among the constituent elements which perform the same function in the respective embodiments, the related constituent elements are indicated by the same or an extension line number.

Hereinafter, one embodiment of the shot blast according to the present invention will be described with reference to FIGS. 1 to 4. FIG.

FIG. 1 is a view showing an embodiment of shot blast according to the present invention, FIG. 2 is an enlarged view of a shot ball supply unit of a shot blast according to an embodiment of the present invention, FIGS. 3 and 4 are cross- Lt; RTI ID = 0.0 > Blast < / RTI >

One embodiment of the shot blast 100 according to the present invention may include a width sensing unit 200, a shot ball supply unit 300, a shotball projecting unit 400, and a control unit 500 as shown in FIG. have.

Although only one embodiment of the shot blast 100 according to the present invention is shown for the sake of convenience, the shot blast 100 according to an embodiment of the present invention may be provided in plurality.

The width sensing unit 200 may sense the width of the strip ST to be transported after annealing in an annealing furnace (not shown).

The width sensing unit 200 may include a plurality of first and second sensors 210 and 220.

The plurality of first sensors 210 may be provided on one side of the strip ST at predetermined intervals in the width direction of the strip ST. The plurality of second sensors 220 may be provided under one side of the strip ST so as to correspond to the plurality of first sensors 210, respectively. The plurality of first and second sensors 210 and 220 may be electrically connected to the controller 500.

The number of the first and second sensors 210 and 220 and the distance between the first and second sensors 210 and 220 are not particularly limited and may be any number or interval as long as the number and interval of the width of the strip ST can be detected.

In the first sensor 210, for example, an electromagnetic wave can be irradiated by the control unit 500. The second sensor 220 senses electromagnetic waves irradiated from the first sensor 210 and transmits the sensed electromagnetic wave to the controller 500.

3 and 4, depending on the width of the strip ST, the number of the second sensors 220 sensing the electromagnetic wave and the final second sensor 220 sensing the electromagnetic wave can be changed.

Therefore, the control unit 500 can know the width of the strip ST through the number of the second sensors 220 sensing the electromagnetic waves and the final second sensor 220 sensing the electromagnetic waves.

The width sensing unit 200 may further include a sensor supporting member 230. The sensor supporting member 230 can pass at least a part of one side of the strip ST. In addition, a plurality of first and second sensors 210 and 220 may be provided.

The sensor supporting member 230 may be, for example, a "C" shape as shown in Fig. However, the shape of the sensor supporting member 230 is not particularly limited, and any shape can be used as long as at least a portion of one side of the strip ST passes therethrough and a plurality of first and second sensors 210 and 220 can be provided. Do.

The width sensing unit 200 is not limited to the above-described configuration, and any known structure may be used as long as the width sensing unit 200 can sense the width of the strip ST.

The short ball supply unit 300 may be connected to a short ball supply source (not shown) to supply the short ball SB to the shot ball throwing unit 400.

The short ball supply unit 300 may be configured to adjust the supply amount of the short ball SB. The control unit 500 may adjust the supply amount of the short ball SB supplied from the short ball supply unit 300 to the shot ball projecting unit 400 according to the width of the strip ST sensed by the width sensing unit 200.

For example, as shown in FIG. 3, when the width of the strip ST is relatively small, the controller 500 may control the short ball SB to be supplied from the short ball supply unit 300 to the shot ball throwing unit 400 can do.

4, when the width of the strip ST is relatively large, the controller 500 controls the short ball supply unit 300 such that a relatively large amount of the short ball SB is supplied from the short ball supply unit 300 to the shot ball throwing unit 400 can do.

The short ball supply unit 300 may include a supply unit main body 310 and a supply adjustment unit 320 as shown in FIGS.

The supply unit body 310 may be connected to the shot ball supply source and the shot ball throwing unit 400. For example, the upper portion of the supply unit body 310 may be connected to a short ball supply source, and the lower portion may be connected to the shot ball throwing unit 400.

However, the position of the supply part main body 310 connected to the short ball supply source and the shot ball projecting part 400 is not particularly limited, and any position of the supply part main body 310 is possible.

A supply port 311 may be formed in the supply unit main body 310. 3 and 4, the short ball SB supplied from the short ball supply source may be supplied to the shot ball throwing unit 400 through the supply port 311 of the supply unit main body 310.

The shape and configuration of the supply unit main body 310 are not particularly limited and may be any shape and configuration as long as it is connected to the shot ball supply source and the shot ball projecting unit 400 and has the shape and configuration of the supply port 311.

The supply regulating unit 320 regulates the opening degree of the supply port 311 and can be electrically connected to the control unit 500. [

The control unit 500 controls the opening degree of the supply port 311 through the supply control unit 320 according to the width of the strip ST detected by the width sensing unit 200, The supply amount of the supplied short ball SB can be adjusted.

The feed regulating unit 320 may include a feed regulating plate 321 and a feed regulating cylinder 322.

The supply regulating plate 321 may be movably provided in the supply unit main body 310 to open and close the supply port 311. [ The supply regulating cylinder 322 is connected to the supply regulating plate 321 and can move the supply regulating plate 321 by the control unit 500. Thereby, the opening degree of the supply port 311 can be adjusted.

The supply control cylinder 322 may be provided with a movement sensing sensor S electrically connected to the control unit 500 to sense the movement distance of the rod of the supply control cylinder 322. Accordingly, the control unit 500 can adjust the movement distance of the rod of the supply control cylinder 322 through the signal from the movement detection sensor S.

The short ball supply unit 300 may further include a foreign matter removing unit 330. The foreign matter removing unit 330 can remove foreign matter adhering to the short ball SB supplied from the short ball supply source.

The foreign matter removing unit 330 may include a filter member 331 and a foreign matter removing cylinder 332.

The filter member 331 may be movably provided in the supply part main body 310 on the supply port 311.

The filter member 331 may be a lattice. However, the shape of the filter member 331 is not particularly limited, and any shape can be used as long as it can remove foreign matter adhering to the short ball SB.

The foreign material removing cylinder 332 may be connected to the filter member 331. In addition, the filter member 331 can be reciprocated by the control unit 500.

As a result, the short ball SB supplied from the short ball supply source to the short ball supply unit 300 can be vibrated by the filter member 331, and the foreign matter attached to the short ball SB can be removed. The foreign matter removed from the short ball SB remains on the filter member 331 and the short ball SB from which the foreign matter is removed passes through the lattice of the filter member 331 and can be moved to the supply port 311.

The foreign substance removing cylinder 332 may be provided with a movement detecting sensor S electrically connected to the controller 500 to sense the moving distance of the rod of the foreign substance removing cylinder 332. [ Accordingly, the control unit 500 can adjust the moving distance of the rod of the foreign substance removing cylinder 332 through the signal from the movement detecting sensor S.

The shot ball projecting unit 400 may project the shot ball SB supplied from the shot ball feeder 300 onto at least a part of the strip ST as shown in FIGS.

Thereby, the oxide scale layer formed on the surface of the strip ST can be crushed by annealing in the annealing furnace.

The short ball projection unit 400 can be configured to adjust the projection width of the short ball SB. The control unit 500 can adjust the projection width of the short ball SB projected from the short ball shotball projecting unit 400 according to the width of the strip ST sensed by the width sensing unit 200.

For example, as shown in FIG. 3, when the width of the strip ST is relatively small, the control unit 500 can relatively reduce the projection width of the short ball SB projected from the shot ball projecting unit 400. [

4, when the width of the strip ST is relatively large, the control unit 500 can relatively increase the projection width of the short ball SB projected from the shot ball projecting unit 400. In addition,

Thereby, the oxide scale layer formed on the strip ST can be evenly fractured by the short ball SB. In addition, the oxide scale layer which is not broken by the short ball SB among the oxide scale layers formed in the strip ST can be minimized.

Thereby, the pickling treatment with the pickling agent in the pickling apparatus (not shown) can easily penetrate into the oxide scale layer of the entire screen ST. Therefore, the portion of the strip ST where the oxide scale layer remains after the pickling treatment can be minimized. Then, the reprocessing of the strip ST can be minimized.

As shown in FIG. 1, the shotball projection unit 400 may include a projection unit main body 410, a projection unit 420, and a projection adjustment unit 430.

The projection unit main body 410 may be connected to the short ball supply unit 300. For example, the upper portion of the projection unit main body 410 may be connected to the shot ball supply unit 300.

However, the position of the projection unit main body 410 connected to the shot ball supply unit 300 is not particularly limited, and any position of the projection unit main body 410 is possible.

The projection unit main body 410 may be provided on the strip ST. However, the projection unit main body 410 may be provided under the strip ST.

The projection unit 411 may be formed in the projection unit main body 410. 3 and 4, the short ball SB supplied from the short ball supply unit 300 may be projected on the strip ST through the projection unit 411 of the projection unit main body 410. [

The short ball SB projected on the strip ST passing through the projection unit 411 of the projection unit main body 410 may be collected by the short ball supply source by a device for collecting the short ball SB although not shown.

The shape and configuration of the projection unit main body 410 are not particularly limited and may be any shape and configuration as long as it is connected to the shot ball supply unit 300 and has a projection 411 formed therein.

The projection unit 420 may cause the short ball SB supplied from the short ball supply unit 300 to be projected onto the strip ST through the projection hole 411 of the projection unit main body 410. [ The projection unit 420 may be electrically connected to the control unit 500.

The projection unit 420 may include a projection fan 421 and a projection motor 422.

The projection fan 421 may be rotatably mounted on the projection unit main body 410. Then, the short ball SB can be projected through the projection tool 411. [ As shown in FIG. 1, the projection fan 421 may include a plurality of projection members 421a radially. Accordingly, the projection member 421a strikes the short ball SB supplied from the short ball supply unit 300 while the projection fan 421 rotates, so that the short ball SB can be projected through the projection unit 411. [

The projection motor 422 may be connected to the projection fan 421. In addition, the projection motor 422 can be rotated by the control unit 500. The control unit 500 can adjust the rotation speed of the projection motor 422.

The projection adjusting unit 430 adjusts the degree of opening of the projection 411 and may be electrically connected to the controller 500.

Accordingly, the control unit 500 adjusts the opening degree of the projection tool 411 through the projection adjusting unit 430 according to the width of the strip ST sensed by the width sensing unit 200, Can be adjusted.

The projection adjusting unit 430 may be provided on the projection unit main body 410 such that two projecting units 411 face each other, as shown in FIG. However, the number and position of the projection adjusting units 430 are not particularly limited, and any number and positions can be used as long as the number and position of the projection opening 411 can be adjusted.

The projection adjusting unit 430 may include a projection adjusting plate 431 and a projection adjusting cylinder 432.

The projection adjusting plate 431 may be movably provided on the projection unit main body 410 to open and close the projection unit 411. The projection adjustment cylinder 432 is connected to the projection adjustment plate 431 and can move the projection adjustment plate 431 by the control unit 500. Thereby, the degree of opening of the projection 411 can be adjusted.

The projection adjustment cylinder 432 may be provided with a movement detection sensor S electrically connected to the control unit 500 to sense the movement distance of the rod of the projection adjustment cylinder 432. Accordingly, the control unit 500 can adjust the moving distance of the rod of the projection adjusting cylinder 432 through the signal from the movement detecting sensor S.

Meanwhile, the shotball projecting unit 400 may further include a shotball collecting unit 440.

The short ball collection unit 440 can return the short ball SB that has not been projected to the projection tool 411 to the short ball supply source.

The short ball collection unit 440 may include a return pipe 441, an air supply pipe 442, and an on-off valve 443.

The return pipe 441 may be connected to the short ball supply source and the projection unit main body 410. The return pipe 411 may extend from the projection unit main body 410 and may be connected to the projection control plate 431 of the projection adjustment unit 430. In this case, at least a part of the recovery pipe 441 may be a flexible pipe.

The air supply pipe 442 blows air into the return pipe 411 toward the short ball supply source so that the short ball SB flowing into the return pipe 441 can be moved to the short ball supply source.

To this end, one side of the air supply pipe 442 may be connected to an air supply source (not shown) and the other side may be inserted into the recovery pipe 411 and directed toward the short supply source side, as shown in FIG.

The opening / closing valve 443 may be provided in the supply pipe 442. The opening and closing valve 443 can be opened and closed by the control unit 500. [

Accordingly, when the control unit 500 opens the on-off valve 443, the air supplied from the air supply source to the air supply pipe 442 can be blown into the return pipe 411 toward the short ball supply side.

As described above, by using the shot blast according to the present invention, the projection width of the shot ball can be adjusted according to the width of the strip, the oxide scale layer formed on the strip can be evenly broken by the shot ball, The oxide scale layer that is not broken by the short ball in the layer can be minimized and the portion of the strip where the oxide scale layer remains after the pickling treatment can be minimized and the reprocessing of the strip can be minimized.

The above-described short blast may not be limited to the above-described embodiments, but all or a part of the embodiments may be selectively combined so that various modifications may be made to the embodiments.

100: shot blast 200: width detection unit
210: first sensor 220: second sensor
230: sensor supporting member 300: short ball supply unit
310: Feeder body 311: Feeder
320: Supply adjustment unit 321: Supply adjustment plate
322: supply control cylinder 330: foreign matter removing unit
331: Filter member 332: Foreign matter removing cylinder
400: shotball projecting part 410: projecting part main body
411: projection unit 420: projection unit
421: projection fan 421a: projection member
422: projection motor 430: projection adjustment unit
431: Projection control panel 432: Projection control cylinder
440: Shotball collecting unit 441: Collecting pipe
442: air supply pipe 443: opening / closing valve
500: Control part S: Movement detection sensor

Claims (13)

A width detecting unit for detecting a width of a strip to be transferred after annealing;
A short ball supply unit connected to the short ball supply source to supply a short ball;
A short ball projecting unit configured to project the short ball supplied from the short ball supply unit onto at least a part of the strip and adjust the projection width of the short ball; And
A control unit for adjusting a projection width of a shot ball projected from the shotball projection unit according to a width of the strip sensed by the width sensing unit; / RTI >
Wherein the short ball supply unit is configured to adjust a supply amount of the short ball and the control unit controls the supply amount of the short ball supplied from the short ball supply unit to the shot ball projection unit according to the width of the strip sensed by the width sensing unit,
Wherein the short ball supply unit includes a supply unit main body connected to the short ball supply source and the shot ball throwing unit and a supply adjusting unit electrically connected to the control unit to adjust the opening degree of the supply port formed in the supply unit main body.
delete [2] The apparatus of claim 1, wherein the width sensing unit comprises: a plurality of first sensors disposed on one side of the strip at predetermined intervals in a width direction of the strip; And a plurality of second sensors,
Wherein the plurality of first and second sensors are electrically connected to the control unit.
4. The shot blast of claim 3, wherein the width sensing unit further comprises a sensor supporting member having at least a portion of one side of the strip passing therethrough and the plurality of first and second sensors. delete 2. The apparatus of claim 1,
A supply regulating plate movably provided in the supply unit main body to open and close the supply port,
A supply control cylinder connected to the supply control plate and configured to move the supply control plate by the control unit,
Lt; / RTI >
The short blast according to claim 1, wherein the short ball supply unit further comprises a foreign matter removing unit for removing foreign matter adhered to the shot ball supplied from the short ball supply source. 8. The apparatus according to claim 7, wherein the foreign matter removing unit
A filter member movably provided in the supply part body on the supply port,
And a foreign matter removing cylinder connected to the filter member and reciprocating the filter member by the control unit
Lt; / RTI >
A width detecting unit for detecting a width of a strip to be transferred after annealing;
A short ball supply unit connected to the short ball supply source to supply a short ball;
A short ball projecting unit configured to project the short ball supplied from the short ball supply unit onto at least a part of the strip and adjust the projection width of the short ball; And
A control unit for adjusting a projection width of a shot ball projected from the shotball projection unit according to a width of the strip sensed by the width sensing unit; / RTI >
And a short ball supplied from the short ball supply unit is projected onto a strip through a projection hole formed in the projection unit main body and electrically connected to the control unit, And a projection adjustment unit that adjusts the degree of opening of the projection and is electrically connected to the control unit.
10. The projection system of claim 9,
A projection fan rotatably provided on the projection unit body so that a short ball is projected through the projection unit;
And a projection lens connected to the projection fan and rotated by the control unit,
Lt; / RTI >
10. The apparatus of claim 9, wherein the projection adjustment unit
A projection adjusting plate movably provided on the projection unit body to open and close the projection unit,
And a projection adjusting cylinder connected to the projection adjusting plate for moving the projection adjusting plate by the controller,
Lt; / RTI >
10. The shot blast of claim 9, wherein the shotball throwing unit further comprises a shotball collecting unit for sending a shot ball not projected to the throwing ball to the shotball supply source. 13. The apparatus according to claim 12, wherein the shotball collecting unit
A return pipe connected to the short ball supply source and the projection unit main body,
An air supply pipe for blowing air into the return pipe toward the short ball supply source so that a short ball introduced into the return pipe is moved to the short ball supply source,
And an opening / closing valve provided in the air supply pipe and being opened /
Lt; / RTI >


KR1020150182861A 2015-12-21 2015-12-21 Shot blast KR101736624B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020038605A1 (en) 2018-08-20 2020-02-27 Genr8 Bvba Particle blast system, and blast device and recipient therefor.
CN111590468A (en) * 2020-07-03 2020-08-28 常德力元新材料有限责任公司 Manufacturing device for metal thin strip with large roughness and high specific surface area

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020038605A1 (en) 2018-08-20 2020-02-27 Genr8 Bvba Particle blast system, and blast device and recipient therefor.
BE1026552B1 (en) * 2018-08-20 2020-03-19 Genr8 Bvba Particle jet device
CN111590468A (en) * 2020-07-03 2020-08-28 常德力元新材料有限责任公司 Manufacturing device for metal thin strip with large roughness and high specific surface area

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