KR101735519B1 - Apparatus for dipping flux - Google Patents

Abstract

A flux dipping apparatus is provided. A flux dipping apparatus according to an embodiment of the present invention includes a tank for storing a first flux, a plate for supporting a bottom surface of the tank, a plate to which the first flux is applied, a light source disposed under the plate, And a control unit for extracting a correlation between the amount of light received by the camera and the amount of the first flux stored in the tank, the plate being located at a position corresponding to the tank Wherein the control unit changes the amount of the first flux stored in the tank before the dipping process so as to collect data on the amount of light measured by the camera in accordance with the amount of the first flux, Extracting the correlation on the basis of the data, and based on the amount of light acquired from the camera using the correlation, And a flux dipping apparatus for calculating a first flux amount stored in the tank.

Description

[0001] APPARATUS FOR DIPPING FLUX [0002]

The present invention relates to a flux dipping apparatus, and more particularly, to a flux dipping apparatus capable of easily detecting a level of a flux stored in a tank.

The component mounting machine is a device for automatically installing components such as semiconductor chips at a predetermined position on a printed circuit board. In the component mounting machine, various kinds of parts required for a printed circuit board are supplied in various ways and mounted on a printed circuit board using a suction nozzle.

If the size of the component mounted on the printed circuit board is relatively large, the component is loaded by loading the component in the tray. However, if the size of the component is relatively small, it is lost or damaged during transportation or installation The feeder is used to supply relatively small parts to the component mounting machine.

The flux dipping apparatus is installed in the above-mentioned component mounting machine and is applied on the flux plate with a predetermined thickness so that the flux can be transferred to the parts supplied to the component mounting machine.

The flux dipping apparatus applies the flux to the bumps of the component in order to mount the supplied component on a printed circuit board or the like. The flux prevents the parts or bumps to be adhered of the component from being oxidized and removes the oxide film formed on the surface. In addition, when heat is applied, the melting point of the bumps is lowered to prevent adjacent bumps from coming into contact with each other.

Korean Patent Laid-Open Publication No. 2010-0021813 (published on February 26, 2010) Japanese Patent Laid-Open Publication No. 2011-139085 (published on July 14, 2011) Korean Patent Laid-Open Publication No. 2007-0097744 (published on October 5, 2007)

In the flux dipping apparatus, after the flux is filled in the tank, the presence or absence of the flux in the tank is detected during use, and the new flux is automatically filled before the flux is exhausted, or the operator is recharged after a certain period of use.

If there is no apparatus for detecting the presence or absence of flux in the tank of the flux dipping apparatus, it is inconvenient for the operator to manually check the tank in which the flux is stored and to supply it when the flux is insufficient. Sensing devices have been proposed.

However, the conventional sensing device uses an optical fiber sensor or the like. In this case, different result values are measured according to the type of flux contained in the tank, and the remaining amount is accurately detected due to various causes such as surface bending due to movement of the tank The sensor unit or the like is installed on the upper surface of the tank and there is a possibility of collision with the head part of the actual organs. In addition, when the tank and the flux plate are separated for cleaning, have.

The present invention has been made in view of the above points, and an object of the present invention is to provide a flux dipping apparatus capable of precisely measuring the amount of flux remaining in a tank.

Another problem to be solved by the present invention is to provide a flux dipping apparatus which does not need to install a separate sensor by measuring the residual amount of flux using a fiducial camera of an actual organs without using a separate sensor member.

The problems to be solved by the present invention are not limited to the above-mentioned problems, and other matters not mentioned can be clearly understood by those skilled in the art from the following description.

According to an aspect of the present invention, there is provided a flux dipping apparatus including a tank for storing a first flux, a plate for supporting a bottom surface of the tank, a plate to which the first flux is applied, And a control unit for detecting a correlation between a quantity of light received by the camera and a first amount of flux stored in the tank, the plate being located at an upper portion of the tank, the plate receiving light emitted from the light source, Wherein the control unit changes the amount of the first flux stored in the tank before the dipping process so that the amount of light measured by the camera in accordance with the amount of the first flux Extracting the correlation based on the data, and using the correlation, And calculates a first amount of flux stored in the tank based on the acquired amount of light.

Other specific details of the invention are included in the detailed description and drawings.

1 is a perspective view illustrating a flux dipping apparatus according to an embodiment of the present invention.
Fig. 2 is a perspective view showing a state in which the tank of the flux dipping apparatus of Fig. 1 is displaced by the moving part. Fig.
3 is a schematic cross-sectional view of the flux dipping apparatus of FIG.
FIGS. 4A and 4B are views for explaining a difference in amount of light received by the camera when the level of the flux stored in the tank of the flux dipping apparatus of FIG. 1 is different. FIG.
5 is a perspective view showing a flux dipping apparatus according to another embodiment of the present invention.
6 is a flowchart illustrating a method of detecting a flux level using a flux dipping apparatus according to an embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention and the manner of achieving them will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. The dimensions and relative sizes of layers and regions in the figures may be exaggerated for clarity of illustration.

In the present specification, the singular form includes plural forms unless otherwise specified in the specification. As used herein, the terms "comprises" and / or "made of" means that a component, step, operation, and / or element may be embodied in one or more other components, steps, operations, and / And does not exclude the presence or addition thereof.

It is to be understood that when an element or layer is referred to as being "on" or " on "of another element or layer, All included. On the other hand, a device being referred to as "directly on" or "directly above" indicates that no other device or layer is interposed in between. "And / or" include each and every combination of one or more of the mentioned items.

The terms spatially relative, "below", "beneath", "lower", "above", "upper" and the like, Lt; / RTI > can be used to easily describe the correlation between the two. Like reference numerals refer to like elements throughout the specification.

Hereinafter, a flux dipping apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 to 4. FIG. FIG. 1 is a perspective view showing a flux dipping apparatus according to an embodiment of the present invention, FIG. 2 is a perspective view showing a state where a tank of the flux dipping apparatus of FIG. 1 is displaced by a moving unit, FIGS. 4A and 4B are diagrams for explaining a difference in amount of light received by the camera when the level of the flux stored in the tank of the flux dipping apparatus of FIG. 1 is different. FIG.

The flux dipping apparatus according to an embodiment of the present invention includes a tank 120 for storing a first flux F, a plate 120 for supporting a bottom surface of the tank 120, A light source 116 disposed below the plate 112 and a camera 140 positioned above the tank 120 and receiving light emitted from the light source 116, The plate 112 is formed with a translucent window 114 at a position corresponding to the tank 120.

The support 110 is supported by the lower body 170 and supports the plate 112 to which the flux is applied. The supporting part 110 is connected to the moving part 130 so that the moving part 130 can linearly reciprocate the tank 120 in a predetermined direction. To this end, a moving rail (not shown) may be installed at a position where the supporting part 110 and the moving part 130 are connected to allow the moving part 130 to move smoothly.

A light source 116 may be installed on one side of the support 110 (see FIG. 2). The light source 116 may irradiate predetermined light for measuring the amount of the flux to the upper tank 120 through the translucent window 114 formed on the upper plate 112.

To this end, a groove may be formed in a part of the support 110 to receive the light source 116 (see FIG. 3).

The light source 116 receives a driving signal and electric power from the outside and passes through the light transmitting window 114 and passes through the flux F in the tank 120 and is received by the camera 140.

The flux dipping apparatus according to the present embodiment including the support portion 110 may be installed in a component body (not shown) and may be fixed by fixing means such as a base frame. Further, it may further include an air supply port (not shown) so that air can be supplied through the component mounting machine.

Further, a flux supply unit (not shown) may be provided to supply a predetermined amount of the liquid flux F having a viscosity by using the air supplied by the air supply port, and the supply amount of the flux F may be determined A valve (not shown) for determining the amount of air to be supplied to one side, and the like.

The plate 112 is installed on the upper portion of the support portion 110. Since the flux P deposited on the plate 112 has a property of curing after a predetermined period of time, the plate 112 may be detachably provided to the support 110 so that the plate 112 can be separated and cleaned .

A coating depth of a predetermined depth may be formed on the upper surface of the plate 112, and the flux F may be applied to the coating depth to a predetermined thickness.

A transparent light transmitting window 114 may be formed on one side of the plate 112. The light transmitting window 114 may be formed of a material that transmits light, for example, transparent plastic such as glass or polyethylene terephthalate may be used, but the present invention is not limited thereto.

In some embodiments, the translucent window 114 may not be made of a transparent material, and the translucent window 114 may be formed in a groove through the plate 112 to allow light to pass therethrough.

The light transmitting window 114 transmits light emitted from the lower light source 116 and allows the transmitted light to be received by the camera 140 through the flux F stored in the upper tank 120.

There is no limitation on the position, shape or area where the light-transmitting window 114 is formed, provided that the different amounts of light can be received by the camera 140 by changing the flux level in the tank 120. [

The tank 120 is provided so as to be capable of reciprocating from the top of the support 110 or the plate 112 and has a receiving portion capable of storing the flux F therein. The tank 120 is coated with the flux F stored in the tank 120 at a predetermined thickness in the application groove of the plate 112 in the process of sliding back and forth while being in close contact with the upper surface of the plate 112.

For this purpose, a predetermined opening for applying the flux (F) may be formed on the bottom surface of the tank 120. In this case, the tank 120 and the plate 112 are kept in tight contact with each other, and when the tank 120 moves and reaches the application groove of the plate 112 The flux F can be applied to the application groove of the plate 112 since the upper surface of the plate 112 that cuts off the opening of the tank 120 is separated from the opening.

In some embodiments, the opening of the tank 120 may further include a blocking portion that is opened or closed by a mechanical signal or an electronic signal. Therefore, only when the tank 120 is opened and closed according to the position on the plate 112 and reaches the application groove of the plate 112, the flux F can be applied with high precision.

The left and right extensions of the tank 120 may be connected to a moving part 130 that allows the tank 120 to slide and reciprocate. When the moving part 130 moves along the guide rails formed on the main body 170 or the supporting part 110 by a power means such as a motor or the like, the tank 120 can also reciprocate along the moving part 130.

The camera 140 can measure the amount of light by receiving light passing through the flux F irradiated from the light source 116 and stored in the tank 120.

In some embodiments, the camera 140 may be a fiducial camera that performs substrate recognition. That is, not a separately installed camera for measuring the level of the flux but a fiducial camera used for controlling the component mounting position by checking the alignment mark of the substrate in the substrate mounting apparatus is commonly used, And the like are unnecessary.

As shown in FIG. 3, the camera 140 may be positioned in a straight line with the light source 116, the light projecting window 114, and the tank 120.

The principle of measuring the flux level or flux amount in the tank 120 using the camera 140 will be described with reference to FIGS. 4A and 4B. FIG.

4A, light having the same amount of light is continuously irradiated from the light source 116. The irradiated light passes through the light transmitting window 114 to reach the tank 120, passes through the bottom surface of the tank 120 Passes through the flux (F) filled with the first water level (L1), and is received by the camera (140).

To this end, the bottom surface of the tank 120 may be formed of a transparent material that transmits light, and as previously noted, the tank 120 may have openings through which the illuminated light passes through the openings.

A part of the light emitted from the light source 116 is lost by the flux F so that the amount of light received by the camera 140 can be reduced compared with the amount of light irradiated by the light source 116. [

With this principle, the first light amount I1 received by the camera 140 can be measured in a state in which the flux F is filled up to the first water level L1.

4B, light having the same amount of light is continuously irradiated from the light source 116, and the irradiated light passes through the light transmitting window 114 to reach the tank 120, And passes through the flux F that is filled with the second water level L2, and is then received by the camera 140.

A part of the light emitted from the light source 116 is lost by the flux F so that the amount of light received by the camera 140 can be reduced compared with the amount of light irradiated by the light source 116. [ At this time, as the amount of the flux F increases, the amount of light to be lost increases, so that the amount of light passing through the tank 120 can be reduced.

With this principle, it is possible to measure the second light amount 12 received by the camera 140 in a state where the flux F is filled up to the second water level L2.

The above process can be repeated a predetermined number of times to derive a correlation between the amount of flux or flux amount of the flux F stored in the tank 120 and the amount of light received by the camera 140. [

For this purpose, before performing the process of dipping the actual flux into the bumps of the component, the above-described data collection process may be performed a predetermined number of times in order to derive the above-described correlation depending on the type of flux to be used.

In the data collection process, the operator can maintain the amount of light generated by supplying the predetermined power to the light source 116 at a constant level and recognize the flux level of the tank 120, The light amount can be determined from the brightness information.

In the process of repeating the above-described processes in various flux levels to derive a predetermined correlation and then dipping the actual flux into the bumps of the component, the brightness information of the image acquired by the camera 140 is analyzed Conversely, the flux level in the tank 120 can be derived.

5 is a perspective view showing a flux dipping apparatus according to another embodiment of the present invention. The flux dipping apparatus according to the present embodiment may further include a control unit 150 connected to the camera 140 and a display unit 160 connected to the control unit 150, substantially the same as the configuration of the previous embodiment.

The control unit 150 can extract the correlation between the amount of light received by the camera 140 and the amount of the flux stored in the tank 120. [ That is, before the actual dipping process, if the amount of flux is changed in a state in which the water level is previously determined, and the process of measuring the light amount by the camera 140 is repeated, the controller 150 calculates the correlation based on the collected data can do.

The control unit 150 calculates the amount of flux and the level Lx of the flux stored in the tank 120 based on the light amount I3 acquired from the camera 140 in the actual flux dipping process by using the correlation thus determined Can be calculated.

The type of flux used may vary depending on the type of the component. If the types of flux are different, the light transmittance according to the flux may also be different.

Accordingly, when storing a second flux having a different transmittance from the first flux in the tank 120, the controller 150 calculates the changed transmittance of the reference flux (first flux) and the newly changed flux (second flux) The correlation can be corrected.

That is, every time the type of flux is changed, the correlation is corrected in consideration of the difference in transmittance based on the transmittance data according to the type of flux, instead of measuring the correlation newly, Can be measured.

The display unit 160 can digitize or graphically display the flux level or flux amount in the tank 120 measured by the control unit 150 and display it to the operator.

6 is a flowchart illustrating a method of detecting a flux level using a flux dipping apparatus according to an embodiment of the present invention.

First, light having a constant amount of light is irradiated from a light source (S110). The light emitted from the light source can pass through the light transmitting window and the tank of the plate.

The light passing through the tank filled with the flux is received, and the amount of light received by the camera is measured (S120). Since the amount of light that is lost depends on the amount of flux, the amount of light received by the camera may be different.

After confirming that the relationship between the amount of flux in the tank and the light amount is derived (S130), if the reliability is insufficient to derive the correlation, the amount of flux in the tank is changed (S140) And accumulates the data.

If the correlation is determined to be equal to or greater than the predetermined reliability, the correlation between the amount of flux and the amount of received light can be functioned (S150). The greater the amount of flux, the less the amount of light received by the camera.

The amount of flux in the tank is detected based on the amount of light acquired by the camera using the function thus derived (S160).

Also, as described above, even if the type of flux is changed and the transmittance is changed, it is not necessary to repeat the data collection process to reset the correlation, and the determined correlation is corrected according to the changed flux transmittance, It is possible to determine a modified correlation according to the type of flux.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, You will understand. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

110: support 112: plate
114: light transmitting window 116: light source
120: tank 130: moving part
140: camera 150:
160:

Claims (9)

A tank for storing a first flux;
A plate that supports the bottom surface of the tank and onto which the first flux is applied;
A light source disposed under the plate;
A camera positioned above the tank and receiving light emitted from the light source; And
A controller for extracting a correlation between the amount of light received by the camera and the amount of the first flux stored in the tank; , ≪ / RTI &
Wherein the plate has a light transmitting window at a position corresponding to the tank,
Wherein the control unit varies the amount of the first flux stored in the tank before the dipping process to collect data on the amount of light measured by the camera in accordance with the amount of the first flux, And calculates a first amount of flux stored in the tank based on the amount of light acquired from the camera using the correlation. delete The method according to claim 1,
Wherein the tank stores a second flux having a different transmittance from the first flux,
Wherein the control unit corrects the correlation by taking into account the changed transmittance of the second flux. delete delete delete delete delete delete

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