KR101733813B1 - colored photoresist composition, color filter fabricated by the same and screen display device comprising the color filter - Google Patents

colored photoresist composition, color filter fabricated by the same and screen display device comprising the color filter Download PDF

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KR101733813B1
KR101733813B1 KR1020110070906A KR20110070906A KR101733813B1 KR 101733813 B1 KR101733813 B1 KR 101733813B1 KR 1020110070906 A KR1020110070906 A KR 1020110070906A KR 20110070906 A KR20110070906 A KR 20110070906A KR 101733813 B1 KR101733813 B1 KR 101733813B1
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pigment red
color filter
photosensitive resin
resin composition
colored photosensitive
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KR1020110070906A
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Korean (ko)
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KR20130010237A (en
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김주호
권영수
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동우 화인켐 주식회사
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/24Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Abstract

본 발명은 (A) 착색제, (B) 알칼리 가용성 수지, (C) 광중합성 화합물, (D) 광중합 개시제 및 (E) 용매를 포함하는 착색 감광성 수지 조성물에 있어서, 상기 (A) 착색제는 C.I. Pigment·Red 208과, C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상을 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물에 관한 것이다.The present invention provides a colored photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator and (E) a solvent. Pigment Red 208 and C.I. Pigment Red 177, C.I. Pigment Red 242 and C.I. Pigment Red 254. The colored photosensitive resin composition of the present invention may further contain at least one selected from the group consisting of Pigment Red 254 and the like.

Description

착색 감광성 수지 조성물, 이로 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치{colored photoresist composition, color filter fabricated by the same and screen display device comprising the color filter}TECHNICAL FIELD The present invention relates to a colored photosensitive resin composition, a color filter manufactured thereby, and an image display device including the color filter.

본 발명은 착색 감광성 수지 조성물, 이로 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치에 관한 것이다.The present invention relates to a colored photosensitive resin composition, a color filter manufactured thereby, and an image display device including the color filter.

평판표시장치 또는 고체촬상소자 등의 화상표시장치는 백색광으로부터 원하는 색을 추출하기 위한 컬러필터를 포함할 수 있다. 이러한 컬러필터로는 주로 빛의 삼원색인 적색, 녹색, 청색에 각각 대응하는 적색 컬러필터, 녹색 컬러필터, 청색 컬러필터를 이용한다. 그러나 컬러필터는 백색광에서 오는 빛 중 특정 파장대의 성분만을 통과시키고 나머지는 흡수함으로써 원하는 색을 추출하기 때문에 백색광이 컬러필터가 걸러내지 못하는 어중간한 파장대의 광성분을 많이 포함하는 경우에는 컬러필터를 통과한 빛의 색 순도가 저하되어 원하는 색을 표시하기 어려워진다. An image display device such as a flat panel display device or a solid-state image pickup device may include a color filter for extracting a desired color from white light. As such color filters, a red color filter, a green color filter, and a blue color filter corresponding to the three primary colors of light, that is, red, green, and blue, respectively, are used. However, since the color filter extracts a desired color by passing only a specific wavelength band component of light coming from white light and absorbing the rest, white light passes through a color filter when a large amount of light components in a moderate wavelength band, The color purity of light is lowered and it becomes difficult to display a desired color.

따라서, 컬러필터의 색순도를 향상시키기 위한 연구가 진행되고 있다. 예를 들면, 일본공개특허 2009-223344호에서는 청색의 명도를 조정하여 3색의 색순도를 변경하지 않고 백색을 구현할 수 있는 컬러필터용 청색 감광성 수지 조성물을 개시하고 있다. 그리고, 대한민국 공개특허 2009-0126991호에서는 표시장치를 통해 표시되는 백색의 색좌표를 목표값에 근접시키기 위한 색필터가 개시되어 있다.Therefore, research for improving the color purity of the color filter is underway. For example, Japanese Laid-Open Patent Application No. 2009-223344 discloses a blue photosensitive resin composition for a color filter which can realize white color without changing the color purity of the three colors by adjusting the brightness of blue. Korean Patent Laid-Open Publication No. 2009-0126991 discloses a color filter for approximating a white color coordinate displayed through a display device to a target value.

하지만, 상술한 특허를 바탕으로, 색구현성이 우수하고 콘트라스트비가 높은 적색 감광성 수지 조성물을 제조하기는 어렵다.However, it is difficult to produce a red photosensitive resin composition excellent in color reproducibility and high in contrast ratio based on the above-mentioned patent.

JP2009-223344AJP2009-223344A KR2009-0126991AKR2009-0126991A

본 발명의 목적은, 착색 감광성 수지 조성물의 적색 착색력을 향상시켜, 현상속도 및 패턴특성이 우수한 착색 수지 감광성 수지 조성물을 제공하는 것이다.An object of the present invention is to provide a colored resin photosensitive resin composition which improves the red coloring power of the colored photosensitive resin composition and is excellent in development speed and pattern characteristic.

또한 본 발명의 목적은 감도, 투과율, 해상력, 콘트라스트비, 휘도가 높은 컬러필터를 제공하는 것이다.It is also an object of the present invention to provide a color filter having high sensitivity, transmittance, resolution, contrast ratio, and brightness.

본 발명은 (A) 착색제, (B) 알칼리 가용성 수지, (C) 광중합성 화합물, (D) 광중합 개시제 및 (E) 용매를 포함하는 착색 감광성 수지 조성물에 있어서, 상기 (A) 착색제는 C.I. Pigment·Red 208과, C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상을 포함하는 것을 특징으로 하는 착색 감광성 수지 조성물을 제공한다.The present invention provides a colored photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator and (E) a solvent. Pigment Red 208 and C.I. Pigment Red 177, C.I. Pigment Red 242 and C.I. Pigment Red 254. The colored photosensitive resin composition of the present invention is characterized in that it contains at least one selected from the group consisting of Pigment Red 254 and the like.

본 발명은 상기 착색 감광성 수지 조성물로 제조된 컬러필터를 제공한다.The present invention provides a color filter made of the colored photosensitive resin composition.

본 발명은 상기 컬러필터를 포함하는 화상표시장치를 제공한다.The present invention provides an image display device including the color filter.

본 발명의 착색 감광성 수지 조성물은 적색 착색력이 향상되어, 화소 형성시, 현상속도 및 패턴특성이 우수해진다.The colored photosensitive resin composition of the present invention has improved red coloring power, and has excellent developing speed and pattern characteristics at the time of pixel formation.

또한 본 발명의 착색 감광성 수지 조성물로 제조된 컬러필터는 감도, 투과율, 해상력, 콘트라스트비, 휘도가 높다.The color filter made of the colored photosensitive resin composition of the present invention has high sensitivity, transmittance, resolution, contrast ratio, and brightness.

이하, 본 발명을 구체적으로 설명한다. Hereinafter, the present invention will be described in detail.

1. 착색 감광성 수지 조성물1. Colored photosensitive resin composition

본 발명의 착색 감광성 수지 조성물은 (A) 착색제, (B) 알칼리 가용성 수지, (C) 광중합성 화합물, (D) 광중합 개시제 및 (E) 용매를 포함한다.The colored photosensitive resin composition of the present invention comprises (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator and (E) a solvent.

본 발명의 착색 감광성 수지 조성물에 포함되는 (A) 착색제는 C.I. Pigment·Red 208과, C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상을 포함한다. 상기 (A) 착색제가 상술한 안료를 포함함으로써, 적색의 색순도가 우수해져 적색 착색력이 향상되고, 화소 형성시, 현상속도 및 패턴특성이 우수해진다. The colorant (A) contained in the colored photosensitive resin composition of the present invention is preferably a colorant. Pigment Red 208 and C.I. Pigment Red 177, C.I. Pigment Red 242 and C.I. Pigment Red 254, and the like. When the above-mentioned (A) colorant contains the above-mentioned pigment, the color purity of red is improved and the coloring power of red is improved, and the developing speed and pattern characteristics are excellent at the time of pixel formation.

상기 (A) 착색제는, 바람직하게는 착색 감광성 수지 조성물 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 바람직하게는 3~60중량%로 포함되고, 보다 바람직하게는 5~55중량%로 포함된다. 상술한 범위를 만족하면, 컬러필터를 박막으로 형성하여도 화소의 색 농도가 충분하므로 색순도가 우수하고, 비화소부의 현상특성이 우수하여, 잔사가 발생하지 않고, 패턴형성이 잘 된다.The colorant (A) is preferably contained in an amount of 3 to 60% by weight, more preferably 5 to 55% by weight, based on the solid content after volatilization of the volatile components in the colored photosensitive resin composition do. When the above-mentioned range is satisfied, even when the color filter is formed as a thin film, the color density of the pixel is sufficient, and therefore, the color purity is excellent and the developing property of the non-pixel portion is excellent.

그리고, 상기 (A) 착색제 중에서 상기 C.I. Pigment·Red 208과, 상기 C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상은, 바람직하게는 상기 (A) 착색제 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 상기 C.I. Pigment·Red 208 5~90중량%; 및 상기 C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상은 잔량으로 포함된다. 특히, 상기 C.I. Pigment·Red 208은 상기 (A) 착색제 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 보다 바람직하게는 10~80중량%로 포함된다. 상술한 범위 미만으로 포함되면, 착색력 향상효과가 미비하다. 상술한 범위를 초과하여 포함되면, 휘도가 저하되는 문제가 발생한다.And, among the colorants (A), the C.I. Pigment Red 208, and C.I. Pigment Red 177, C.I. Pigment Red 242 and C.I. Pigment Red 254 is preferably one or two or more selected from the group consisting of the C.I. pigment and the red pigment, based on the solid content after volatilization of the volatile component in the colorant (A). 5 to 90% by weight of Pigment Red 208; And C.I. Pigment Red 177, C.I. Pigment Red 242 and C.I. Pigment Red 254 is contained in the remaining amount. In particular, the C.I. Pigment Red 208 is more preferably contained in an amount of 10 to 80% by weight based on the solid content after volatile components in the colorant (A) are volatilized. If it is contained within the above-mentioned range, the effect of improving coloring power is insufficient. If it exceeds the above-mentioned range, there arises a problem that luminance is lowered.

상기 (A) 착색제는 밀베이스의 형태로 존재할 수 있다.The colorant (A) may be present in the form of a mill base.

상기 (A) 착색제는 상기 C.I. Pigment·Red 208과, 상기 C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상의 분산이 효과적으로 이루어지고, 본 발명의 착색 감광성 수지 조성물로 제조된 컬러필터의 광학적, 물리적 품질이 우수해질 수 있도록, 분산제를 더 포함할 수 있다.The colorant (A) is a colorant. Pigment Red 208, and C.I. Pigment Red 177, C.I. Pigment Red 242 and C.I. Pigment Red 254, and further includes a dispersing agent so that the optical and physical quality of the color filter made of the color photosensitive resin composition of the present invention can be improved .

상기 분산제는 본 발명의 기술분야에서 이용되는 것이라면 특별히 한정하지 않으나, 예를 들면 폴리아크릴계 분산제, 폴리에스테르계 분산제, 폴리에틸렌이민계 분산제 및 폴리우레탄계 분산제 등을 들 수 있다. The dispersant is not particularly limited as long as it is used in the technical field of the present invention, and examples thereof include a polyacrylic dispersant, a polyester dispersant, a polyethylene imine dispersant and a polyurethane dispersant.

상기 (A) 착색제는 보조용 착색제를 더 포함할 수 있는데, 예를 들면, 본 발명의 기술분야에서 일반적으로 사용되는 C.I. Pigment·Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137,138, 139, 147, 148, 150, 153, 154, 166, 173, 180, 185, 194, 214; C.I. Pigment·Orange 13, 31, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73; C.I. C.I. Pigment·Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 180, 192, 209, 215, 216, 224, 255, 264, 265 등을 들 수 있다.
The colorant (A) may further include an auxiliary colorant, for example, CI Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 184, 147, 148, 150, 153, 154, 166, 173, 180, 185, 194, 214; CI Pigment Orange 13, 31, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73; CICI Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 180, 192, 209, 215, 216, 224, 255, 264, 265 and the like.

본 발명의 착색 감광성 수지 조성물에 포함되는 (B) 알칼리 가용성 수지는 포토레지스트 공정 중 현상공정 시, 착색 감광성 수지 조성물을 이용하여 형성된 착색 감광성 수지층의 비노광영역을 제거하고, 노광영역을 잔류시키는 성능을 부여하는 역할을 수행한다. The alkali-soluble resin (B) contained in the colored photosensitive resin composition of the present invention is obtained by removing the non-exposed region of the colored photosensitive resin layer formed using the colored photosensitive resin composition during the development process in the photoresist process, It performs the role of giving performance.

상기 (B) 알칼리 가용성 수지는 표준 물질로서 폴리스티렌을 사용하여 겔 침투 크로마토그래피(GPC)로 측정한 중량평균분자량(MW)이 5,000~400,000이고, 10,000~300,000인 것이 바람직하다.The alkali-soluble resin (B) preferably has a weight average molecular weight (MW) measured by gel permeation chromatography (GPC) using polystyrene as a standard substance of 5,000 to 400,000 and preferably 10,000 to 300,000.

상기 (B) 알칼리 가용성 수지는 카르복실기를 갖는 단량체를 포함하는 중합체를 포함하는 것이 바람직하다.The alkali-soluble resin (B) preferably comprises a polymer containing a monomer having a carboxyl group.

상기 카르복실기를 갖는 단량체의 예로는 분자 내에 1개 이상의 카르복실기를 갖는 불포화 카르복실산, 예컨대 불포화 모노카르복실산, 불포화 디카르복실산 등을 들 수 있다. 이들의 구체적인 예로는 아크릴산, 메타크릴산, 크로톤산, 이타콘산, 말레산, 푸말산 등을 들 수 있다. 상기 카르복실기를 갖는 단량체는 탄소-탄소 불포화 결합을 갖는 화합물이며, 각각 단독으로 또는 2종 이상이 사용할 수 있다.Examples of the monomer having a carboxyl group include unsaturated carboxylic acids having at least one carboxyl group in the molecule, such as unsaturated monocarboxylic acids and unsaturated dicarboxylic acids. Specific examples thereof include acrylic acid, methacrylic acid, crotonic acid, itaconic acid, maleic acid, and fumaric acid. The monomer having a carboxyl group is a compound having a carbon-carbon unsaturated bond, and each may be used alone or in combination of two or more.

상기 (B) 알칼리 가용성 수지는 카르복실기를 갖는 단량체로 이루어진 단독 중합체일 수 있지만, 바인더 중합체는 카르복실기를 갖는 단량체와 다른 단량체로 이루어진 공중합체일 수도 있다. 여기서, 상기 다른 단량체는 탄소-탄소 불포화 결합을 갖고 있고, 상기 카르복실기를 갖는 단량체와 공중합할 수 있는 단량체이다. The alkali-soluble resin (B) may be a homopolymer composed of a monomer having a carboxyl group, but the binder polymer may be a copolymer composed of a monomer having a carboxyl group and another monomer. Here, the other monomer is a monomer having a carbon-carbon unsaturated bond and capable of copolymerizing with the monomer having a carboxyl group.

상기 다른 단량체의 구체적인 예로는 방향족 비닐 화합물, 불포화 카르복실레이트 화합물, 불포화 아미노알킬 카르복실레이트 화합물, 불포화 글리시딜 카르복실레이트 화합물, 비닐 카르복실레이트 화합물, 비닐 시아나이드 화합물 및 불포화 옥세탄 카르복실레이트 화합물 등을 들 수 있다.Specific examples of the other monomer include an aromatic vinyl compound, an unsaturated carboxylate compound, an unsaturated aminoalkyl carboxylate compound, an unsaturated glycidyl carboxylate compound, a vinyl carboxylate compound, a vinyl cyanide compound and an unsaturated oxetanecarboxylic acid And the like.

상기 비닐화합물의 구체적인 예로는 스티렌, α-메틸스티렌, 비닐톨루엔 등을 들 수 있다. 상기 불포화 카르복실레이트 화합물의 구체적인 예로는 메틸 아크릴레이트, 메틸 메타크릴레이트, 에틸 아크릴레이트, 에틸 메타크릴레이트, 부틸 아크릴레이트, 부틸 메타크릴레이트, 2-히드록시에틸 아크릴레이트, 2-히드록시에틸 메타크릴레이트, 벤질 아크릴레이트, 벤질 메타크릴레이트 등을 들 수 있다. 상기 불포화 아미노알킬 카르복실레이트 화합물의 구체적인 예로는 아미노에틸 아크릴레이트 등을 들 수 있다. 상기 불포화 글리시딜 카르복실레이트 화합물의 구체적인 예로는 글리시딜 메타크릴레이트 등을 들 수 있다. 상기 비닐 카르복실레이트 화합물의 구체적인 예로는 비닐 아세테이트, 비닐 프로피오네이트 등을 들 수 있다. 상기 비닐 시아나이드 화합물의 구체적인 예로는 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴 등을 들 수 있다. 상기 불포화 옥세탄 카르복실레이트 화합물의 구체적인 예로는 3-메틸-3-아크릴옥시 메틸 옥세탄, 3-메틸-3-메타크릴옥시 메틸 옥세탄, 3-에틸-3-아크릴옥시 메틸 옥세탄, 3-에틸-3-메타크릴옥시 메틸 옥세탄, 3-메틸-3-아크릴옥시 에틸 옥세탄, 3-메틸-3-메타크릴옥시 에틸 옥세탄, 3-메틸-3-아크릴옥시 에틸 옥세탄 및 3-메틸-3-메타크릴옥시 에틸 옥세탄 등을 들 수 있다. 상기 다른 단량체는 각각 단독으로 또는 2종 이상이 사용될 수 있다.Specific examples of the vinyl compound include styrene,? -Methylstyrene, vinyltoluene, and the like. Specific examples of the unsaturated carboxylate compound include methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl Methacrylate, benzyl acrylate, benzyl methacrylate, and the like. Specific examples of the unsaturated aminoalkyl carboxylate compound include aminoethyl acrylate and the like. Specific examples of the unsaturated glycidyl carboxylate compound include glycidyl methacrylate and the like. Specific examples of the vinyl carboxylate compound include vinyl acetate and vinyl propionate. Specific examples of the vinyl cyanide compound include acrylonitrile, methacrylonitrile,? -Chloroacrylonitrile, and the like. Specific examples of the unsaturated oxetanecarboxylate compound include 3-methyl-3-acryloxymethyloxetane, 3-methyl-3-methacryloxymethyloxetane, 3-ethyl- Methyl-3-acryloxyethyl oxetane, 3-methyl-3-acryloxyethyl oxetane, 3-methyl- Methyl-3-methacryloxyethyloxetane and the like. These other monomers may be used alone or in combination of two or more.

상기 공중합체의 예로는 3-에틸-3-메타크릴옥시 메틸 옥세탄/벤질 메타크릴레이트/메타크릴산 공중합체, 3-에틸-3-메타크릴옥시 메틸 옥세탄/벤질 메타크릴레이트/메타크릴산/스티렌 공중합체, 3-에틸-3-메타크릴옥시 메틸 옥세탄/메틸 메타크릴레이트/메타크릴산 공중합체, 3-에틸-3-메타크릴옥시 메틸 옥세탄/메틸 메타크릴레이트/메타크릴산/스티렌 공중합체 등을 들 수 있다. Examples of the copolymer include 3-ethyl-3-methacryloxymethyloxetane / benzyl methacrylate / methacrylic acid copolymer, 3-ethyl-3-methacryloxymethyloxetane / benzyl methacrylate / Ethyl-3-methacryloxymethyloxetane / methyl methacrylate / methacrylic acid copolymer, 3-ethyl-3-methacryloxymethyl oxetane / methyl methacrylate / methacrylic acid / Acid / styrene copolymer and the like.

상기 (B) 알칼리 가용성 수지는 본 발명의 착색 감광성 수지 조성물 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 바람직하게는 5~90중량%로 포함되고, 보다 바람직하게는 10~70중량%로 포함된다. 상술한 범위를 만족하면, 현상 시 광선 미조사 영역을 제거하고, 광선 조사 영역을 잔류시키는 성능을 부여하여 우수한 패턴을 형성할 수 있는 이점이 있다.
The alkali-soluble resin (B) is contained in an amount of preferably 5 to 90% by weight, more preferably 10 to 70% by weight, based on the solid content after volatilization of the volatile components in the colored photosensitive resin composition of the present invention . When the above-mentioned range is satisfied, there is an advantage that an excellent pattern can be formed by giving a capability of removing the light non-irradiated area and remaining the light irradiated area at the time of development.

본 발명의 착색 감광성 수지 조성물에 포함되는 (C) 광중합성 화합물은 중합 가능한 탄소-탄소 불포화 결합을 갖는 화합물 등을 포함할 수 있다. 상기 화합물은 일작용성의 광중합성 화합물, 이작용성의 광중합성 화합물 또는 삼작용성 이상인 다작용성의 광중합성 화합물일 수 있다.The photopolymerizable compound (C) contained in the colored photosensitive resin composition of the present invention may include a compound having a polymerizable carbon-carbon unsaturated bond or the like. The compound may be a monofunctional photopolymerizable compound, a bifunctional photopolymerizable compound, or a trifunctional or more multifunctional photopolymerizable compound.

상기 일작용성의 광중합성 화합물의 예로는 노닐페닐카비톨 아크릴레이트, 2-히드록시-3-페녹시프로필 아크릴레이트, 2-에틸헥실카비톨 아크릴레이트, 2-히드록시에틸 아크릴레이트, N-비닐피롤리돈 등을 들 수 있다. 상기 이작용성의 광중합성 화합물의 예로는 1,6-헥산디올 디아크릴레이트, 1,6-헥산디올 디메타크릴레이트, 에틸렌 글리콜 디아크릴레이트, 에틸렌 글리콜 디메타크릴레이트, 네오펜틸 글리콜 디아크릴레이트, 네오펜틸 글리콜 디메타크릴레이트, 트리에틸렌 글리콜 디아크릴레이트, 트리에틸렌 글리콜 디메타크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸) 에테르, 3-메틸펜탄디올 디아크릴레이트, 3-메틸펜탄디올 디메타크릴레이트 등을 들 수 있다. 상기 다관능 아크릴 올리고머 및 다관능 아크릴 모노머의 예로는 트리메틸올프로판 트리아크릴레이트, 트리메틸올프로판 트리메타크릴레이트, 펜타에리스리톨 트리아크릴레이트, 펜타에리스리톨 트리메타크릴레이트, 펜타에리스리톨 테트라아크릴레이트, 펜타에리스리톨 테트라메타크릴레이트, 디펜타에리스리톨 펜타아크릴레이트, 디펜타에리스리톨 펜타메타크릴레이트, 디펜타에리스리톨 헥사아크릴레이트, 디펜타에리스리톨 헥사메타크릴레이트 등을 들 수 있다.Examples of the monofunctional photopolymerizable compound include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, N-vinyl Pyrrolidone and the like. Examples of the bifunctional photopolymerizable compound include 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, ethylene glycol diacrylate, ethylene glycol dimethacrylate, neopentyl glycol diacrylate , Neopentyl glycol dimethacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol diacrylate, 3-methylpentane Diol dimethacrylate, and the like. Examples of the polyfunctional acryl oligomer and polyfunctional acrylic monomer include trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetra Methacrylate, dipentaerythritol pentaacrylate, dipentaerythritol penta methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexa methacrylate, and the like.

상기 (C) 광중합성 화합물은 본 발명의 착색 감광성 수지 조성물 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 바람직하게는 5~45중량%로 포함되고, 보다 바람직하게는 7~40중량%로 포함된다. 상술한 범위를 만족하면, 패턴 뜯김 현상이 발생하지 않고, 우수한 패턴을 형성할 수 있으며, 공정 중 본 발명의 착색 감광성 수지조성물이 균일하게 도포되고 역테이퍼 및 잔사 발생을 방지할 수 있는 이점이 있다.
The photopolymerizable compound (C) is contained in an amount of preferably 5 to 45% by weight, more preferably 7 to 40% by weight, based on the solid content after volatilization of the volatile components in the colored photosensitive resin composition of the present invention . When the above-mentioned range is satisfied, an excellent pattern can be formed without causing pattern peeling, and the colored photosensitive resin composition of the present invention can be uniformly applied during the process, and reverse taper and residue generation can be prevented .

본 발명의 착색 감광성 수지 조성물에 포함되는 (D) 광중합 개시제는 광 조사에 의해 활성 라디칼을 발생시키는 활성 라디칼 발생제 또는 산을 발생시키는 산 발생제 등을 예로 들 수 있다. 상기 활성 라디칼 발생제의 예로는 아세토페논계 광중합 개시제, 벤조인계 광중합 개시제, 벤조페논계 광중합 개시제, 티오크산톤계 광중합 개시제, 트리아진계 광중합 개시제 등을 들 수 있다.The photopolymerization initiator (D) contained in the colored photosensitive resin composition of the present invention is exemplified by an active radical generator that generates an active radical upon irradiation with light or an acid generator that generates an acid. Examples of the active radical generator include an acetophenone photopolymerization initiator, a benzoin photopolymerization initiator, a benzophenone photopolymerization initiator, a thioxanthone photopolymerization initiator, and a triazine photopolymerization initiator.

상기 아세토페논계 광중합 개시제의 예로는 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-2-메틸-1-[2-(2-히드록시에톡시)페닐]프로판-1-온, 1-히드록시시클로헥실 페닐 케톤, 2-메틸-2-모르폴리노-1-(4-메틸티오페닐)프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 및 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온의 올리고머 등을 들 수 있다. Examples of the acetophenone photopolymerization initiator include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, 2- (2-hydroxyethoxy) phenyl] propan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2- Methyl-1- [4- (1-methylvinyl) phenyl] propane-1-one and 2-hydroxy-2-methyl- -One oligomers, and the like.

상기 벤조인계 광중합 개시제의 예로는 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르 등을 들 수 있다. 상기 벤조페논계 광중합 개시제의 예로는 벤조페논, 메틸 o-벤조일 벤조에이트, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐 설파이드, 3,3',4,4'-테트라(t-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등을 들 수 있다. 상기 티오크산톤 광중합 개시제의 예로는 2-이소프로필티오크산톤, 4-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다.Examples of the benzoin-based photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether. Examples of the benzophenone photopolymerization initiator include benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'-tetra (t -Butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like. Examples of the thioxanthone photopolymerization initiator include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1- ≪ / RTI > propoxycyclohexanone, and the like.

상기 트리아진계 광중합 개시제의 예로는 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸푸란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(푸란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다.Examples of the triazine photopolymerization initiator include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6 - (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, (Trichloromethyl) -6- [2- (5-methylfuran-2- (4-methoxystyryl) -1,3,5-triazine, Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan- , 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4- ) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.

또한, 상기 활성 라디칼 발생제로서는, 예를 들면 2,4,6-트리메틸벤조일디페닐포스핀 옥사이드, 2,2'-비스(o-클로로페닐)-4,4',5,5'-테트라페닐-1,2'-바이이미다졸, 10-부틸-2-클로로아크리돈, 2-에틸안트라퀴논, 벤질, 9,10-페난트렌퀴논, 캄포퀴논, 메틸 페닐글리옥실레이트, 티타노센 화합물 등을 사용할 수도 있다.Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-bimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methylphenylglyoxylate, Etc. may be used.

또한, 상기 활성 라디칼 발생제는 상업적으로 이용 가능한 것들도 사용할 수 있다. 상업적으로 이용 가능한 광중합 개시제로서는, 예를 들면 「이가큐어(Irgacure)-907」(상품명, 종류: 아세토페논계 광중합 개시제, 제조사: 시바-가이기) 등을 들 수 있다.In addition, commercially available active radical generating agents may be used. Commercially available photopolymerization initiators include, for example, " Irgacure-907 " (trade name, type: acetophenone-based photopolymerization initiator;

상기 산 발생제의 예로는 오늄염, 예컨대 4-히드록시페닐디메틸설포늄 p-톨루엔설포네이트, 4-히드록시페닐디메틸설포늄 헥사플루오로안티모네이트, 4-아세톡시페닐디메틸설포늄 p-톨루엔설포네이트, 4-아세톡시페닐ㆍ메틸ㆍ벤질설포늄 헥사플루오로안티모네이트, 트리페닐설포늄 p-톨루엔설포네이트, 트리페닐설포늄 헥사플루오로안티모네이이트, 디페닐요오도늄 p-톨루엔설포네이트, 디페닐요오도늄 헥사플루오로안티모네이트 등, 니트로벤질 토실레이트, 벤조인 토실레이트 등을 들 수 있다. Examples of the acid generator include an onium salt such as 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium p- Benzenesulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, diphenylsulfonium p-toluenesulfonate, Toluene sulfonate, diphenyl iodonium hexafluoroantimonate and the like, nitrobenzyl tosylate, and benzoin tosylate.

상기 언급한 화합물 중에는 활성 라디칼 발생제로서 활성 라디칼과 함께 동시에 산을 발생시키는 화합물도 포함될 수 있다. 예를 들면, 상기 트리아진계 광중합 개시제는 산 발생제로서 사용될 수 있다. 상기 광중합 개시제는 각각 단독으로 또는 2종 이상의 조합으로 사용할 수 있다.Among the above-mentioned compounds, a compound capable of generating an acid simultaneously with an active radical as an active radical generator may also be included. For example, the triazine-based photopolymerization initiator can be used as an acid generator. These photopolymerization initiators may be used alone or in combination of two or more.

상기 (D) 광중합 개시제는 본 발명의 착색 감광성 수지 조성물 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 바람직하게는 0.1~40중량%로 포함되고, 보다 바람직하게는 1~30중량%로 포함된다. 상술한 범위를 만족하면, 패턴 뜯김 현상이 발생하지 않고, 우수한 패턴을 형성할 수 있으며, 공정 중 잔사 발생을 방지할 수 있는 이점이 있다.The photopolymerization initiator (D) is contained in an amount of preferably 0.1 to 40% by weight, more preferably 1 to 30% by weight, based on the solid content after volatilization of the volatile components in the colored photosensitive resin composition of the present invention do. When the above-mentioned range is satisfied, an excellent pattern can be formed without occurrence of pattern peeling, and there is an advantage that residue can be prevented from being generated during the process.

상기 (D) 광중합 개시제는 광중합 개시 보조제를 더 포함할 수 있다. 상기 광중합 개시 보조제는 상기 (D) 광중합 개시제에 의해 개시되는 상기 (C) 광중합성 화합물의 중합을 증진시키기 위해 상기 (D) 광중합 개시제와 함께 사용되는 화합물이다. 상기 광중합 개시 보조제로서는, 예를 들면 아민계 광중합 개시 보조제, 알콕시안트라센계 광중합 개시 보조제 등을 들 수 있다.The photopolymerization initiator (D) may further comprise a photopolymerization initiator. The photopolymerization initiation assistant is a compound used together with the photopolymerization initiator (D) for promoting polymerization of the photopolymerizable compound (C) initiated by the photopolymerization initiator (D). Examples of the photopolymerization initiator include amine-based photopolymerization initiators, alkoxyanthracene photopolymerization initiators, and the like.

상기 아민계 광중합 개시 보조제의 예로는 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 메틸 4-디메틸아미노벤조에이트, 에틸 4-디메틸아미노벤조에이트, 이소아밀 4-디메틸아미노벤조에이트, 2-디메틸아미노에틸벤조에이트, 2-에틸헥실 4-디메틸아미노벤조에이트, N,N-디메틸 p-톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(일반명: 마이클러스(Michler's) 케톤), 4,4'-비스(디에틸아미노)벤조페논, 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있다.Examples of the amine photopolymerization initiation auxiliary include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylamino N, N-dimethyl p-toluidine, 4,4'-bis (dimethylamino) benzophenone (generic name: Michler's ketone), 4, 4'-bis (diethylamino) benzophenone, and 4,4'-bis (ethylmethylamino) benzophenone.

상기 알콕시안트라센계 광중합 개시 보조제의 예로는 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센 등을 들 수 있다.Examples of the alkoxyanthracene-based photopolymerization initiator include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, etc. .

상기 광중합 개시 보조제로서는 상업적으로 이용 가능한 것들도 사용할 수 있다. 이러한 상업적으로 이용 가능한 광중합 개시 보조제로서는, 예를 들면「EAB-F」(상품명: 호도가야 케미칼 컴파니 리미티드 제품) 등을 들 수 있다.
Commercially available photopolymerization initiators may also be used. Examples of such commercially available photopolymerization initiators include " EAB-F " (trade name, product of Hodogaya Chemical Co., Ltd.) and the like.

본 발명의 착색 감광성 수지 조성물에 포함되는 (E) 용매는 적당한 점성을 갖고, 나머지 성분들을 용이하게 용해시킬 수 있다. 상기 (E) 용매는 본 발명의 착색 감광성 수지 조성물의 총 중량이 100중량%가 되도록 잔량 포함되는 것이 바람직하다.The solvent (E) contained in the colored photosensitive resin composition of the present invention has an appropriate viscosity and can easily dissolve the remaining components. The solvent (E) is preferably such that the total amount of the colored photosensitive resin composition of the present invention is 100% by weight.

상기 (E) 용매는 통상의 착색감광성 조성물에서 사용된 것과 동일한 용매를 사용할 수 있다. 상기 (E) 용매의 예로는 에틸렌 글리콜 모노알킬 에테르, 예컨대 에틸렌 글리콜 모노메틸 에테르, 에틸렌 글리콜 모노에틸 에테르, 에틸렌 글리콜 모노프로필 에테르, 에틸렌 글리콜 모노부틸 에테르 등, 디에틸렌 글리콜 디알킬 에테르, 예컨대 디에틸렌 글리콜 디메틸 에테르, 디에틸렌 글리콜 디에틸 에테르, 디에틸렌 글리콜 디프로필 에테르, 디에틸렌 글리콜 디부틸 에테르 등, 에틸렌 글리콜 알킬 에테르 아세테이트, 예컨대 메틸셀로솔브 아세테이트, 에틸셀로솔브 아세테이트 등, 알킬렌 글리콜 알킬 에테르 아세테이트, 예컨대 프로필렌 글리콜 모노메틸 에테르 아세테이트, 프로필렌 글리콜 모노에틸 에테르 아세테이트, 프로필렌 글리콜 모노프로필 에테르 아세테이트, 메톡시부틸 아세테이트, 메톡시펜틸 아세테이트 등, 방향족 탄화수소, 예컨대 벤젠, 톨루엔, 크실렌 등, 케톤, 예컨대 메틸 에틸 케톤, 아세톤, 메틸 아밀 케톤, 메틸 이소부틸 케톤, 시클로헥산온 등, 알콜, 예컨대 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌 글리콜, 글리세린 등, 에스테르, 예컨대 에틸 3-에톡시프로피오네이트, 메틸 3-메톡시프로피오네이트 등, 고리형 에스테르, 예컨대 γ-부티롤락톤 등을 들 수 있다. 상기 (E) 용매는 각각 단독으로 또는 2종 이상이 사용될 수 있다.
The solvent (E) may be the same solvent as that used in conventional colored photosensitive compositions. Examples of the solvent (E) include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, alkylene glycol alkyl ethers such as ethylene glycol diethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; Ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, methoxypentyl acetate, etc., aromatic hydrocarbons, examples Methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, Glycerin and the like, esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate, and cyclic esters such as? -Butyrolactone. The above (E) solvents may be used alone or in combination of two or more.

본 발명은 상기 착색 감광성 수지 조성물로 제조된 컬러필터를 제공한다.The present invention provides a color filter made of the colored photosensitive resin composition.

본 발명은 상기 컬러필터를 포함하는 화상표시장치를 제공한다. 상기 화상표시장치는 평판표시장치 또는 고체촬상소자일 수 있다.
The present invention provides an image display device including the color filter. The image display device may be a flat panel display device or a solid-state image pickup device.

본 발명의 착색 감광성 수지 조성물은 적색 착색력이 향상되어, 화소 형성시, 현상속도 및 패턴특성이 우수해진다. 또한 본 발명의 착색 감광성 수지 조성물로 제조된 컬러필터는 감도, 투과율, 해상력, 콘트라스트비, 휘도가 높다.
The colored photosensitive resin composition of the present invention has improved red coloring power, and has excellent developing speed and pattern characteristics at the time of pixel formation. The color filter made of the colored photosensitive resin composition of the present invention has high sensitivity, transmittance, resolution, contrast ratio, and brightness.

이하, 실시예를 참조하여 본 발명을 보다 상세히 설명하고자 하나, 본 발명이 이들 실시예에 의해 한정되는 것은 아니다.
Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited by these Examples.

합성예 1: 알칼리 가용성 수지의 제조Synthesis Example 1: Preparation of alkali-soluble resin

교반기, 온도계 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크를 준비하고, 한편, 모노머 적하 로트로서, 디메틸-2,2'-[옥시비스(메틸렌)]비스-2-프로페노에이트 85.6g(0.2몰), 아크릴산 43.2g(0.3몰), 비닐톨루엔 118.0g(0.5몰), t-부틸퍼옥시-2-에틸헥사노에이트 4g, 프로필렌글리콜 모노메틸에테르아세테이트(PGMEA) 40부를 투입 후 교반 혼합하여 준비하였다. 연쇄 이동제 적하조로서, n-도데칸티올 6g, PGMEA 24g를 넣고 교반 혼합한 것을 준비하였다. 이후 플라스크에 PGMEA 395g을 도입하고 플라스크 내 분위기를 공기에서 질소로 한 후 교반하면서 플라스크의 온도를 90℃까지 승온하였다. 이어서 모노머 및 연쇄 이동제를 적하 로트로부터 적하를 개시하였다. 적하는, 90℃를 유지하면서, 각각 2시간 동안 진행하고 1시간 후에 110℃ 승온하여 3시간 동안 유지한 뒤, 가스 도입관을 도입시켜, 산소/질소=5/95(v/v) 혼합 가스의 버블링을 개시하였다. 이어서, 글리시딜메타크릴레이트 28.4g(0.1몰)(본 반응에 사용한 아크릴산의 카르복실기에 대하여 33몰%), 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀) 0.4g, 트리에틸아민 0.8g을 플라스크내에 투입하여 110℃에서 8시간 반응을 계속하였고, 고형분 산가가 71㎎KOH/g인 수지 A를 얻었다. GPC에 의해 측정한 폴리스티렌 환산의 중량평균분자량은 17,000이고, 분자량 분포(Mw/Mn)는 2.3이었다.A flask equipped with a stirrer, a thermometer reflux condenser, a dropping funnel and a nitrogen inlet tube was prepared, and dimethyl-2,2 '- [oxybis (methylene)] bis-2-propenoate 85.6 butylperoxy-2-ethylhexanoate and 40 parts of propylene glycol monomethyl ether acetate (PGMEA) were charged into a flask equipped with a stirrer, a thermometer and a thermometer, Followed by stirring and mixing. As a chain transfer agent, 6 g of n-dodecanethiol and 24 g of PGMEA were added and stirred and prepared. Then, 395 g of PGMEA was introduced into the flask, the atmosphere in the flask was changed to nitrogen in air, and the temperature of the flask was raised to 90 캜 while stirring. The monomer and the chain transfer agent were then added dropwise from the dropping funnel. The mixture was allowed to stand at 90 DEG C for 2 hours and then elevated at 110 DEG C for 1 hour and maintained for 3 hours. Then, a gas introduction tube was introduced to prepare an oxygen / nitrogen mixed gas of 5/95 (v / v) . Then, 28.4 g (0.1 mol) of glycidyl methacrylate (33 mol% based on the carboxyl group of the acrylic acid used in the present reaction), 0.4 g of 2,2'-methylenebis (4-methyl-6-t- And 0.8 g of triethylamine were charged into a flask, and the reaction was continued at 110 DEG C for 8 hours to obtain a resin A having a solid acid value of 71 mgKOH / g. The weight average molecular weight measured by GPC in terms of polystyrene was 17,000 and the molecular weight distribution (Mw / Mn) was 2.3.

상기 알카리 가용성 수지의 중량평균분자량(Mw) 및 수평균분자량(Mn)의 측정에 대해서는 GPC법을 이용하여 이하의 조건으로 행하였다. The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the alkali-soluble resin were measured by the GPC method under the following conditions.

장치: HLC-8120GPC(도소㈜ 제조) Apparatus: HLC-8120GPC (manufactured by TOSOH CORPORATION)

칼럼: TSK-GELG4000HXL + TSK-GELG2000HXL(직렬 접속) Column: TSK-GELG4000HXL + TSK-GELG2000HXL (Serial connection)

칼럼 온도: 40℃ Column temperature: 40 DEG C

이동상 용매: 테트라히드로퓨란 Mobile phase solvent: tetrahydrofuran

유속: 1.0 ㎖/분 Flow rate: 1.0 ml / min

주입량: 50 ㎕ Injection amount: 50 μl

검출기: RI Detector: RI

측정 시료 농도: 0.6 질량%(용매 = 테트라히드로퓨란) Measurement sample concentration: 0.6 mass% (solvent = tetrahydrofuran)

교정용 표준 물질: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500(도소㈜ 제조) Standard materials for calibration: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (manufactured by TOSOH CORPORATION)

상기에서 얻어진 중량평균분자량 및 수평균분자량의 비를 분자량 분포 (Mw/Mn)로 하였다.
The ratio of the weight average molecular weight to the number average molecular weight obtained above was defined as a molecular weight distribution (Mw / Mn).

제조예 1~5: 착색제의 제조Production Examples 1 to 5: Preparation of Colorant

하기 표 1 에 기재된 각 성분 중, 안료, 분산제, 용매1(D1)을 용기에 혼입 후 고속 교반기(신원산업기계 제조, 0.5Hp High speed mixer)를 통해 선속도 5m/s로 2시간 동안 교반한 후 다시 용매2(D2)를 추가로 혼합하여, 횡형식 비드밀(Dyno사 제조, ECM-Lab)에 0.3㎜ 지르코니아 비드를 사용하여 선속도 8m/s, 유량 2kg/min의 속도로 하여 3시간 동안 분산을 진행하였고, 분산이 종료 된 후 용매3(D3)을 더하여 착색제 M1~ 3를 제조하였다. The pigment, dispersant and solvent 1 (D1) were mixed in a vessel and stirred at a linear velocity of 5 m / s for 2 hours through a high-speed stirrer (manufactured by Shinwon Industrial Machinery Co., Ltd., 0.5Hp high speed mixer) Then, the solvent 2 (D2) was further mixed, and 0.3 mm zirconia beads were applied to the transverse type bead mill (ECM-Lab, manufactured by Dyno) at a linear velocity of 8 m / s and a flow rate of 2 kg / (D3) was added after dispersion was completed, to prepare colorants M1 to 3.

착색제 제조예Example of colorant preparation M1(중량%)M1 (% by weight) M2(중령%)M2 (Colonel%) M3(중량%)M3 (% by weight) M4(중량%M4 (wt% 안료 1Pigment 1 12.012.0 00 00 00 안료 2Pigment 2 00 12.012.0 00 00 안료 3 Pigment 3 00 00 12.012.0 00 안료 4 Pigment 4 00 00 00 12.012.0 분산제(C)Dispersant (C) 5.05.0 5.05.0 5.05.0 5.05.0 용매1(D1)Solvent 1 (D1) 20.020.0 20.020.0 20.020.0 20.020.0 용매2(D2)Solvent 2 (D2) 40.040.0 40.040.0 40.040.0 40.040.0 용매3(D3)Solvent 3 (D3) 23.023.0 23.023.0 23.023.0 23.023.0 합계Sum 100100 100100 100100 100100

안료 1: C.I. Pigment·Red 208 (Clariant사 제조)Pigment 1: C.I. Pigment Red 208 (manufactured by Clariant)

안료 2: C.I. Pigment·Red 254 (Ciba specialty사 제조)Pigment 2: C.I. Pigment Red 254 (manufactured by Ciba Specialty)

안료 3: C.I. Pigment·Red 177 (Ciba specialty사 제조)Pigment 3: C.I. Pigment Red 177 (manufactured by Ciba Specialty)

안료 4: C.I. Pigment·Red 242 (Clariant사 제조)Pigment 4: C.I. Pigment Red 242 (manufactured by Clariant)

분산제: Disperbyk-161 (BYK-chemi사 제조)Dispersant: Disperbyk-161 (BYK-chemi)

용매1: 프로필렌글리콜모노메틸에테르아세테이트Solvent 1: Propylene glycol monomethyl ether acetate

용매2: 프로필렌글리콜모노메틸에테르아세테이트Solvent 2: Propylene glycol monomethyl ether acetate

용매3: 프로필렌글리콜모노메틸에테르아세테이트
Solvent 3: Propylene glycol monomethyl ether acetate

실시예1~7, 비교예1~6: 착색 감광성 수지 조성물의 제조Examples 1 to 7 and Comparative Examples 1 to 6: Preparation of colored photosensitive resin composition

표 1에 기재된 조성비로 착색제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용매를 포함하는 착색감광성수지조성물을 제조하였다. 여기서, 용매를 제외한 모든 구성요소는 고형분이다.A colored photosensitive resin composition including a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent was prepared at the composition ratios shown in Table 1. Here, all components except for the solvent are solids.

M1
(g)
M1
(g)
M2
(g)
M2
(g)
M3
(g)
M3
(g)
M4
(g)
M4
(g)
합성예1
(g)
Synthesis Example 1
(g)
C-1
(g)
C-1
(g)
D-1
(g)
D-1
(g)
E-1
(g)
E-1
(g)
F-1
(g)
F-1
(g)
실시예1Example 1 4.44.4 00 50.0550.05 00 1515 1212 7.957.95 1010 0.050.05 실시예2Example 2 8.88.8 00 46.246.2 00 1515 1212 7.957.95 1010 0.050.05 실시예3Example 3 16.516.5 00 38.538.5 00 1515 1212 7.957.95 1010 0.050.05 실시예4Example 4 26.426.4 28.628.6 00 00 1515 1212 7.957.95 1010 0.050.05 실시예5Example 5 30.830.8 00 00 24.224.2 1515 1212 7.957.95 1010 0.050.05 실시예6Example 6 42.942.9 00 12.112.1 00 1515 1212 7.957.95 1010 0.050.05 실시예7Example 7 45.145.1 00 9.99.9 00 1515 1212 7.957.95 1010 0.050.05 비교예1Comparative Example 1 00 3.853.85 51.1551.15 00 1515 1212 7.957.95 1010 0.050.05 비교예2Comparative Example 2 00 6.66.6 48.448.4 00 1515 1212 7.957.95 1010 0.050.05 비교예3Comparative Example 3 00 11.011.0 44.044.0 00 1515 1212 7.957.95 1010 0.050.05 비교예4Comparative Example 4 00 38.538.5 16.516.5 00 1515 1212 7.957.95 1010 0.050.05 비교예5Comparative Example 5 00 23.123.1 31.931.9 00 1515 1212 7.957.95 1010 0.050.05 비교예6Comparative Example 6 00 24.224.2 30.830.8 00 1515 1212 7.957.95 1010 0.050.05

C-1: 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)C-1: dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

D-1: 에타논-1-[9-에틸-6-(2-메틸-4테트라히드로피라닐옥시벤조일)-9H-카바졸-3-일]-1-(O-아세틸옥심) (Irgacure OXE02; Ciba 사 제조)D-1: Ethanone-l- [9-ethyl-6- (2-methyl-4-tetrahydropyranyloxybenzoyl) -9H-carbazol-3-yl] -1- (O- acetyloxime) (Irgacure OXE02 manufactured by Ciba)

E-1: 프로필렌글리콜모노메틸에테르아세테이트E-1: Propylene glycol monomethyl ether acetate

F-1: 불소계 레벨링제 F-475 (DIC사 제조)
F-1: Fluorine leveling agent F-475 (manufactured by DIC)

시험예: 착색 감광성 수지의 특성 평가Test Example: Characteristic Evaluation of Colored Photosensitive Resin

실시예1~7 및 비교예1~6의 적색 착색 조성물을 2평방인치의 유리 기판(코닝사 제조, #1737)을 중성 세제, 물 및 알코올로 차례로 세정, 건조하여 유리기판을 준비하였다. 그리고, 상기 유리기판 상에 본 발명에 따른 착색 감광 수지 조성물을 목적한 색이 발현되도록 스핀 코팅하고, 이어서 크린 오븐 중, 100℃에서 3분간 건조하였다.A glass substrate of 2 square inches (# 1737, manufactured by Corning) was sequentially washed with a neutral detergent, water and alcohol, and dried to prepare a glass substrate, in which the red coloring compositions of Examples 1 to 7 and Comparative Examples 1 to 6 were sequentially cleaned. Then, the colored photosensitive resin composition according to the present invention was spin-coated on the glass substrate so as to exhibit a desired color, and then dried in a clean oven at 100 ° C for 3 minutes.

건조된 착색 기판 위에 패턴 마스크를 위치시키고, 우시오 덴끼㈜제의 초고압 수은 램프(상품명 USH-250D)를 이용하여 대기 분위기 하에 100mJ/㎠의 노광량(365㎚)으로 광 조사하였다. 그 후, 비이온계 계면 활성제 0.12% 와 수산화칼륨 0.06%를 포함하는 수계 현상액을 이용하여 현상을 실시하고 이에 대한 현상속도 및 패턴뜯김을 평가하였다.The pattern mask was placed on the dried colored substrate, and light irradiation was performed at an exposure dose (365 nm) of 100 mJ / cm 2 using an ultra-high pressure mercury lamp (trade name: USH-250D) manufactured by Ushio DENKI CO., LTD. Thereafter, development was carried out using an aqueous developer containing 0.12% of a nonionic surfactant and 0.06% of potassium hydroxide, and the development rate and pattern peeling thereof were evaluated.

평가가 완료된 기판은 착색력 평가를 위해 크린오븐 중 220℃에서 20분간 추가 건조한 후 도막두께측정기(Veeco사 DECTAK 6M)를 이용하여 막두께를 측정하였다. After evaluation, the substrate was further dried in a clean oven at 220 ° C for 20 minutes to evaluate the tinting strength, and then the film thickness was measured using a film thickness meter (Veeco DECTAK 6M).

색도Chromaticity 막두께
(㎛)
Film thickness
(탆)
착색력Coloring power 휘도특성Luminance characteristic 현상속도Development speed 패턴특성Pattern characteristics
xx yy zz 실시예1Example 1 0.6600.660 0.3070.307 14.4914.49 2.302.30 실시예2Example 2 0.6700.670 0.3100.310 14.1614.16 2.362.36 실시예3Example 3 0.6500.650 0.3100.310 15.9615.96 1.771.77 실시예4Example 4 0.6500.650 0.3300.330 19.8019.80 1.411.41 실시예5Example 5 0.6500.650 0.3300.330 19.8119.81 1.441.44 실시예6Example 6 0.6600.660 0.3200.320 16.8516.85 1.581.58 실시예7Example 7 0.6500.650 0.3200.320 17.6817.68 1.211.21 XX 비교예1Comparative Example 1 0.6600.660 0.3070.307 14.5014.50 2.362.36 -- -- 비교예2Comparative Example 2 0.6700.670 0.3100.310 14.1814.18 2.602.60 -- -- XX ×× 비교예3Comparative Example 3 0.6500.650 0.3100.310 16.0116.01 2.032.03 -- -- 비교예4Comparative Example 4 0.6500.650 0.3300.330 19.8819.88 1.671.67 -- -- 비교예5Comparative Example 5 0.6600.660 0.3200.320 16.9516.95 2.022.02 -- -- 비교예6Comparative Example 6 0.6500.650 0.3200.320 17.8617.86 1.801.80 -- --

<착색력><Tinting power>

동일색을 가지는 실시예, 비교예의 막두께 값을 기준으로 하기 수식으로 구한 값을 통해 판정한다.Based on the film thickness values of the Examples and Comparative Examples having the same color, by the following formula.

착색력 = (비교예 막두께)/(실시예 막두께)Tinting strength = (comparative example film thickness) / (example film thickness)

◎: 130% 이상, ○: 110%이상 120%미만?: Not less than 130%,?: Not less than 110% and less than 120%

△: 100%이상 110%미만, ×: 100% 이하
?: 100% or more and less than 110%, X: 100% or less

<휘도특성><Luminance characteristics>

동일색을 가지는 실시예, 비교예의 Y 값을 기준으로 하기 수식으로 구한 값을 통해 판정한다.Based on the Y values of Examples and Comparative Examples having the same color as the following formula.

휘도특성 = (비교예 Y값) - (실시예 Y값)Luminance characteristic = (Comparative Example Y value) - (Example Y value)

○: 0.1미만, ×: 0.1이상
?: Less than 0.1, x: not less than 0.1

<현상속도>&Lt; Development speed >

현상<Spray Developer HPMJ 방식>시 비노광부가 현상액에 최초로 용해되는데 걸리는 시간을 측정하였다.Development <Spray Developer HPMJ method> The time taken for the first time to dissolve the developer in the developer was measured.

◎: 15초 미만, ○: 15초 이상 20초 미만, ?: Less than 15 seconds,?: Less than 15 seconds, less than 20 seconds,

△: 20초 이상 25초 미만, X: 25초 이상
△: 20 seconds or more but less than 25 seconds, X: 25 seconds or more

<패턴특성><Pattern characteristics>

250배율의 광학현미경을 통해 100㎛ 선폭의 라인 패턴을 통해 패턴뜯김 발생 수를 통해 판단한다.Through an optical microscope at a magnification of 250 magnification, through a line pattern with a line width of 100 mu m.

◎: 패턴 뜯김 없음, ○: 패턴 뜯김 5개 미만 ◎: No pattern peeling, ○: Less than 5 pattern peeling

△: 패턴 뜯김 5개 이상 10개 미만, ×: 패턴 뜯김 10개 이상
△: Pattern peeling 5 or more and less than 10, ×: Pattern peeling 10 or more

<콘트라스트><Contrast>

Bare 30,000:1을 기준으로 하여 측정하였으며, 수치가 높을수록 우수하다.Bare 30,000: 1. The higher the value, the better.

○: 20,000이상, △: 10,000이상 20,000미만, ×: 10,000미만
?: Not less than 20,000,?: Not less than 10,000 and less than 20,000, x: less than 10,000

Claims (5)

(A) 착색제, (B) 알칼리 가용성 수지, (C) 광중합성 화합물, (D) 광중합 개시제 및 (E) 용매를 포함하는 착색 감광성 수지 조성물에 있어서,
상기 (A) 착색제는
C.I. Pigment·Red 208과,
C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상을 포함하고,
상기 (A) 착색제는, 착색 감광성 수지 조성물 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로, 3~60중량%로 포함되고,
상기 (A) 착색제 내 휘발성 성분을 휘발시킨 후의 고형 함유량을 기준으로,
상기 C.I. Pigment·Red 208 5~90중량%; 및
상기 C.I. Pigment·Red 177, C.I. Pigment·Red 242 및 C.I. Pigment·Red 254로 이루어진 군에서 선택되는 1종 또는 2종 이상은 잔량으로 포함되는 것을 특징으로 하는 착색 감광성 수지 조성물.
A colored photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E)
The colorant (A)
CI Pigment Red 208,
CI Pigment Red 177, CI Pigment Red 242, and CI Pigment Red 254, and at least one selected from the group consisting of CI Pigment Red 177, CI Pigment Red 242,
The colorant (A) is contained in an amount of 3 to 60% by weight based on the solid content after volatile components in the colored photosensitive resin composition are volatilized,
Based on the solid content after volatile components in the colorant (A) are volatilized,
5 to 90% by weight of the CI Pigment Red 208; And
Wherein at least one selected from the group consisting of CI Pigment Red 177, CI Pigment Red 242 and CI Pigment Red 254 is contained in a residual amount.
삭제delete 삭제delete 청구항 1 기재의 착색 감광성 수지 조성물로 제조된 컬러필터.A color filter made of the colored photosensitive resin composition according to claim 1. 청구항 4 기재의 컬러필터를 포함하는 화상표시장치.

An image display apparatus comprising the color filter according to claim 4.

KR1020110070906A 2011-07-18 2011-07-18 colored photoresist composition, color filter fabricated by the same and screen display device comprising the color filter KR101733813B1 (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006299050A (en) * 2005-04-19 2006-11-02 Dainichiseika Color & Chem Mfg Co Ltd Dispersing agent for pigment and pigment composition containing the same
JP2010032698A (en) 2008-07-28 2010-02-12 Fujifilm Corp Coloring curable composition for color filter, color filter, method for manufacturing color filter, and liquid crystal display element
JP2010265468A (en) 2003-02-04 2010-11-25 Sony Corp Method for producing resin molded articles

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010265468A (en) 2003-02-04 2010-11-25 Sony Corp Method for producing resin molded articles
JP2006299050A (en) * 2005-04-19 2006-11-02 Dainichiseika Color & Chem Mfg Co Ltd Dispersing agent for pigment and pigment composition containing the same
JP2010032698A (en) 2008-07-28 2010-02-12 Fujifilm Corp Coloring curable composition for color filter, color filter, method for manufacturing color filter, and liquid crystal display element

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