KR101714413B1 - In-plane switching mode transflective type liquid crystal display device - Google Patents

Abstract

The present invention provides a plasma display panel comprising: a first substrate and a second substrate facing each other; A gate line and a data line formed on an inner surface of the first substrate, the gate line and the data line intersecting each other with a gate insulating film interposed therebetween to define a pixel region having a reflective region and a transmissive region; A common wiring formed in parallel with the gate wiring; A thin film transistor connected to the gate line and the data line in the pixel region; A first protective layer covering the data line and the thin film transistor; A reflective plate formed on the reflective layer over the first protective layer; A second protective layer formed on the reflection plate; And a drain electrode formed on the second passivation layer, the drain electrode being in contact with the drain electrode through a drain contact hole exposing a drain electrode of the thin film transistor, the passivation layer being formed in a plate shape with respect to the transmissive region, A pixel electrode including a plurality of first openings formed therein; A third protective layer formed on the pixel electrode; A plurality of second openings that are connected to the common protection layer through the common wiring and the common contact hole and are spaced apart from the transparent region with a long axis thereof in a second direction orthogonal to the gate wiring, A common electrode including a plurality of third openings having a long axis in one direction and spaced apart from each other; A color filter layer formed on an inner surface of the second substrate; And a liquid crystal layer interposed between the first and second substrates, wherein the first opening and the third opening are alternately arranged in a planar manner.

Reflective transmission type, liquid crystal display device, reflection efficiency, transverse electric field mode

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a transflective liquid crystal display (LCD)

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a transverse electric field mode transflective liquid crystal display device having an improved reflectance in a reflective region.

In general, a liquid crystal display device is a display device using the characteristics of liquid crystal molecules having different arrangements according to voltage application, and can be driven at a lower power than a cathode ray tube, and is advantageous in downsizing and thinning. Therefore, And is used as a display device of a notebook computer, a personal portable terminal, or the like because it is easy to carry because of its lightweight and thin characteristics.

In such a liquid crystal display device, two substrates on which electrodes are formed are arranged so that the two electrodes are opposed to each other, and an electric field generated by a voltage difference between the two substrates through the liquid crystal, By controlling the movement of molecules, the transmittance of light varies according to the intensity of light.

On the other hand, a liquid crystal display device is generally a passive device that can not emit light by itself, and thus a separate light source is required. Therefore, in addition to a liquid crystal panel composed of the two substrates and the liquid crystal layer, a backlight for supplying light to the backside of the panel is disposed, and light emitted from the backlight is incident on the liquid crystal panel. To display an image.

Such a liquid crystal display device is referred to as a transmission type liquid crystal display device. Since a transmissive liquid crystal display device uses an artificial light source such as a backlight, a bright image can be realized even in a dark external environment. However, A relatively large power consumption is a drawback.

Accordingly, a reflection type liquid crystal display device using an external light source without using a backlight has been proposed to overcome such disadvantages.

Since the reflection type liquid crystal display device operates using external natural light or artificial light, since the amount of power consumed by the backlight is greatly reduced, the power consumption is relatively smaller than that of the transmissive type and can be used in a portable state for a long time, And a display device of a portable device such as an assistant.

However, such a reflection type liquid crystal display device has a low power consumption because it does not have a separate light source, but it has a disadvantage that it can not be used in a place where external light is weak or absent.

Recently, a transflective type liquid crystal display device which merely has advantages of a reflective liquid crystal display device and a transmissive liquid crystal display device has been proposed. In the case of such a reflective transmissive liquid crystal display device, an ECB (electrically controlled birefringence) mode or a VA In the ECB mode, the viewing angle is low. In addition, in the case of the VA mode, a plurality of viewing angle compensating films must be additionally provided to improve the viewing angle. This increases the manufacturing cost. have.

On the other hand, in the case of a liquid crystal display device, due to its light and thin structural features, it has recently been used as a mass medium such as a TV, since it is separated from a personal display device such as a portable notebook computer so that a large number of users can watch The viewing angle becomes an important issue.

Therefore, in order to overcome the disadvantage that the viewing angle of the VA mode and the ECB mode liquid crystal display are low, the common electrode and the pixel electrode are formed on the same substrate and are driven by a transverse electric field to improve the viewing angle range. A device has been proposed.

1 is a schematic cross-sectional view of a reflective area and a transmissive area of a conventional transverse electric field mode reflective / transmissive liquid crystal display device. At this time, the pixel region is defined as a reflection region where a reflection plate is formed and light does not pass through from below, and a reflection region where the reflection plate is not formed.

As shown in the drawing, the array substrate 2 is formed by defining gate lines (not shown) and data lines (not shown) intersecting each other and defining the pixel regions P, and in parallel with the gate lines (Not shown) extending through the pixel region P are formed. In each pixel region P, a thin film transistor (not shown) serving as a switching element is formed.

A reflective electrode 50 is formed on the reflective region RA with a good reflectivity and a pixel electrode 70 is formed on the reflective electrode 50 in the pixel region P.

A common electrode 80 connected to the common wiring (not shown) via an insulating layer 72 and having a plurality of bar-shaped openings op1 and op2 is formed on the pixel electrode 70 . The plurality of openings op1 and op2 are divided into a plurality of first openings op1 and a plurality of second openings op2 and are provided in the transmissive region TA and the reflective region RA, And the first and second openings op1 and op2 are different in the direction of their long axes.

A color filter layer 86 corresponding to the black matrix (not shown) and each pixel region P, and an overcoat layer 88 over the entire surface, opposite to the array substrate 2 having such a configuration, And a liquid crystal layer 90 is interposed between the array substrate 2 and the color filter substrate 83. [

On the other hand, in the conventional transverse electric field mode transflective type liquid crystal display device 1 having the above-described configuration, the thickness of the liquid crystal layer 90 in the transmissive area TA (hereinafter referred to as the first cell gap d1) RA is twice as large as the cell gap d2. This is to match the retardation felt by the light in the liquid crystal layer 90. In the case of the transmissive region TA, light emitted from a backlight unit (not shown) The external light is incident on the display region of the liquid crystal display device 1 in the reflection area RA and is reflected by the reflection plate 50 to be returned to the outside The liquid crystal layer 90 passes through the liquid crystal layer 90 twice.

Therefore, in this process, the light coming out of the reflection area RA and the light coming out of the transmission area TA have different retardation values. Therefore, in order to match them, the reflection area RA has a transmission area TA, The thickness of the liquid crystal layer 90 is differently set so as to form a cell of? / 2.

On the other hand, the transverse electric field mode transreflective type liquid crystal display device having the above-described configuration improves power efficiency and external visibility by simultaneously or selectively using a light source and an external light source from a backlight unit by forming a pixel region and a transmissive region in one pixel region I have to.

However, in the conventional transverse electric field mode transreflective type liquid crystal display device having the above-described configuration, there arises a problem that the reflection efficiency is relatively lowered in the reflective region.

2 is a cross-sectional view of a reflective region of an array substrate of a conventional transverse electric field mode transreflective-type liquid crystal display device, which schematically shows an external light path in a common electrode, a pixel electrode, and a reflection plate and a reflective region.

As shown in the figure, the reflective area RA of the conventional transverse electric field mode transflective type liquid crystal display device has an insulating layer (not shown) formed on the reflective substrate 50 on the basis of the reflective plate 50, A pixel electrode 70 in the form of a plate is formed for each pixel region (not shown) on an insulating layer (not shown), and a plurality of second openings op2 are formed through a second insulating layer (not shown) A common electrode 80 is formed.

A part of the external light incident on the common electrode 80 passes through the common electrode 80 and is incident on the pixel electrode 70 and is reflected by the reflection plate 50 And then passes through the pixel electrode 70 and the common electrode 80 to be finally incident on the user's eye.

Except for the insulating layer, the part of the external light is transmitted twice through the common electrode 80 and twice through the pixel electrode 70 in the array substrate 1, and light loss is generated in this process, .

Therefore, the transverse electric field mode transflective type liquid crystal display device having the above-described configuration is required to have a configuration capable of further maximizing the reflection efficiency in the reflective region.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a transverse electric field mode liquid crystal display device capable of improving reflection efficiency by minimizing the number of transmissions of external light incident on a reflective region The purpose of that is to do.

A transverse electric field mode transflective type liquid crystal display device according to the present invention includes: a first substrate and a second substrate facing each other; A gate line and a data line formed on an inner surface of the first substrate, the gate line and the data line intersecting each other with a gate insulating film interposed therebetween to define a pixel region having a reflective region and a transmissive region; A common wiring formed in parallel with the gate wiring; A thin film transistor connected to the gate line and the data line in the pixel region; A first protective layer covering the data line and the thin film transistor; A reflective plate formed on the reflective layer over the first protective layer; A second protective layer formed on the reflection plate; And a drain electrode formed on the second passivation layer, the drain electrode being in contact with the drain electrode through a drain contact hole exposing a drain electrode of the thin film transistor, the passivation layer being formed in a plate shape with respect to the transmissive region, A pixel electrode including a plurality of first openings formed therein; A third protective layer formed on the pixel electrode; A plurality of second openings that are connected to the common protection layer through the common wiring and the common contact hole and are spaced apart from the transparent region with a long axis thereof in a second direction orthogonal to the gate wiring, A common electrode including a plurality of third openings having a long axis in one direction and spaced apart from each other; A color filter layer formed on an inner surface of the second substrate; And a liquid crystal layer interposed between the first and second substrates, wherein the first opening and the third opening are alternately arranged in a planar manner.

The width of the first opening, the width of the common electrode finger, and the width of the common electrode finger are defined as a common electrode finger portion, a second electrode portion, And the width of the second opening or the third opening is defined as a third width, the first width is equal to or larger than 2 mu m, and is equal to or smaller than 1.2 times the third width, And the first opening is formed to overlap with the common electrode finger. In addition, when the pixel electrode portion between the first openings is defined as a pixel electrode finger portion, both ends of the pixel electrode finger are overlapped with both ends of the common electrode finger portion by 10% or less of the common electrode finger width .

In addition, the plate-shaped pixel electrode formed in the transmissive region is provided with a plurality of fourth openings alternately arranged in parallel with the plurality of second openings having the long axis in the second direction.

In addition, the thickness of the liquid crystal layer in the reflective region is a half of the thickness of the liquid crystal layer in the transmissive region.

In addition, a first storage electrode that branches off from the common wiring to the reflective region and a second storage electrode that branches to overlap the data wiring are formed, and the drain electrode is extended to overlap the first storage electrode The first storage electrode, the gate insulating film, and the drain electrode overlap each other to form a first storage capacitor, and the second storage electrode, the gate insulating film, and the data wiring overlap each other to form a second storage capacitor.

The first protective layer is made of an organic insulating material and has a convexo-concave shape on the surface of the reflective region, and the reflective plate formed on the first protective layer has an irregular convexo-concave shape .

In addition, a fourth protective layer made of an inorganic insulating material is formed between the thin film transistor and the first protective layer, and a fifth protective layer made of an inorganic insulating material is formed between the first protective layer and the reflective plate. At this time, a sixth passivation layer is formed between the second passivation layer and the third passivation layer, corresponding to the reflective region, using an organic insulating material.

A black matrix is formed between the inner surface of the second substrate and the color filter layer in correspondence to the gate and the data lines. An overcoat layer is formed on the entire surface of the second substrate to cover the color filter layer. The color filter layer corresponds to the reflection area and is patterned and removed at the center of the color filter layer to form a transmission hole.

The first and second polarizers are respectively disposed on the outer surfaces of the first and second substrates, and the polarization axes of the first and second polarizers are perpendicular to each other. A first alignment layer covering the common electrode; And a second alignment layer formed to cover the color filter layer.

The present invention is configured to have a plurality of first openings and a plurality of third openings alternately in a planar alternating manner corresponding to the pixel electrodes and the common electrodes provided in the reflective region, There is an effect of improving the reflection efficiency in the reflection area by reducing the number of times.

In addition, in correspondence with the transmissive region, the second region and the fourth region have a plurality of second openings and a plurality of fourth openings alternately in a planar manner, corresponding to the pixel electrodes and the common electrode, It is possible to improve the transmission efficiency in the transmissive region by reducing the number of the pixel electrodes and the common electrode.

Hereinafter, a reflective transmissive liquid crystal display device according to the present invention will be described in detail with reference to the accompanying drawings.

3 is a cross-sectional view of one pixel region of a transverse electric field mode transflective type liquid crystal display device according to an embodiment of the present invention. For convenience of explanation, a region where the thin film transistor Tr as a switching element is formed is defined as a switching region TrA in the pixel region P and a portion in the pixel region P where the reflection plate 150 is formed is defined as a reflection The region RA and the other region are defined as a transmission region TA.

The gate line 103 and the data line 125 intersect with each other to define a pixel region P and extend in parallel with the gate line 103, A common wiring 109 penetrating the pixel region P is formed.

At this time, a first storage electrode 110 is formed in the reflection region RA at the common wiring 109, and the common wiring 109 is branched at an upper portion of the data wiring 125, An electrode 111 is formed.

Each pixel region P is connected to the gate wiring 103 and the data wiring 125 and includes a gate electrode 106, a gate insulating film 115, an active layer 120a of pure amorphous silicon, A thin film transistor Tr composed of a semiconductor layer 120 made of a silicon ohmic contact layer 120b and source and drain electrodes 130 and 133 spaced apart from each other is formed.

The drain electrode 133 is formed so as to overlap the first storage electrode 110 and the gate insulating layer 115 and is electrically connected to the first storage electrode 110 and the drain electrode 133 form a first storage capacitor StgC1 including a gate insulating film 115 interposed between the two electrodes 110,

The second storage electrode 111 and the data line 125 overlapping each other with the gate insulating film 115 interposed therebetween form a second storage capacitor StgC2.

A first passivation layer 136 is formed as an inorganic insulating material covering the thin film transistor Tr and the data line 125. A second passivation layer 136 is formed on the first passivation layer 136 as an organic insulating material 140 are formed on the front surface. At this time, the second protective layer 140 is characterized in that convex and concave portions are formed on the surface of the reflective region RA.

A third passivation layer 142 is formed on the second passivation layer 140 as an inorganic insulating material and a reflective material RA is formed on the third passivation layer 142 as a reflective material 150 are formed. At this time, the third protective layer 142 and the reflective plate 150 are formed in a concavo-convex shape having a convex surface due to the influence of the second protective layer 140 formed below the third protective layer 142.

Although the first to third protective layers 136, 140, and 142 are illustrated in the embodiment of the present invention, the first and third protective layers 136 and 142 may be omitted. Since the first protective layer 136 made of an inorganic insulating material comes into contact with the active layer 120a, the organic insulating material contacts with the active layer 120a and the channel contamination, which may occur due to contact with the active layer 120a, In order to solve the problem of weakening the adhesive force between the organic insulating material and the metallic material, the third protective layer 142 is formed in order to prevent the reflection plate 150 made of a metal material and the third protective layer 142 made of an organic insulating material. And is formed between the protective layer 142.

Next, a fourth protective layer 152 is formed on the reflection plate 150 in correspondence to the reflection region RA as an organic insulating material. The fourth protective layer 152 is formed to form a step with the transmissive area TA to form the double cell gaps d3 and d4 in the reflective area RA and the transmissive area TA.

A fifth passivation layer 155 is formed on the entire surface of the fourth passivation layer 152 and the third passivation layer 142 as an inorganic insulating material. At this time, the fifth passivation layer 155 and the third passivation layer 142, the second and the first passivation layer (not shown) on the bottom of the fourth passivation layer 152, 140 and 136 are patterned to form a drain contact hole 158 for exposing the drain electrode 133. [

 Next, on the fifth passivation layer 155, a plate-shaped pixel electrode 160 is formed for each pixel region P using a transparent conductive material. At this time, as a most characteristic configuration in the present invention, a plurality of first openings op1 are formed in a portion corresponding to the reflection region RA in the plate-shaped pixel electrode 160, . That is, in the reflection area RA, a plurality of first openings op1 in which the major axes thereof are arranged in the first direction are formed with a predetermined spacing.

On the other hand, in the embodiment of the present invention, in the transmissive area TA, the pixel electrode 160 is formed so as to maintain the plate shape without forming the first opening op1 therein.

The pixel electrode 160 having the above-described shape is in contact with the drain electrode 133 of the thin film transistor Tr through the drain contact hole 158.

The fifth passivation layer 155 made of an inorganic insulating material is also formed to improve adhesion between the fourth passivation layer 152 made of an organic insulating material and the pixel electrode 160 made of a transparent conductive material, .

A sixth protective layer 163 is formed as an inorganic insulating material on the pixel electrode 160 having the plurality of first openings op1 and a transparent conductive material is formed on the sixth protective layer 163. [ A common electrode 170 is formed on each pixel region P or on the entire surface of the display region of the array substrate 102. In the drawing, the common electrode 170 is formed on the entire display area. At this time, although not shown in the drawing, the common electrode 170 is in contact with the common wiring 109 through a common contact hole (not shown).

The common electrode 170 has a plurality of second openings op2 arranged in a spaced relation to the transmissive region so that the major axis of the common electrode 170 has a second direction different from the first direction And a plurality of third openings op3 in which the major axes thereof are arranged with the first direction corresponding to the reflection region RA are formed at a predetermined interval.

As a characteristic feature of the embodiment according to the present invention, a plurality of first openings op1 provided in the pixel electrode 160 and a plurality of second openings op1 arranged in the common electrode 170 And the plurality of third openings op3 formed are arranged alternately with each other.

That is, the common electrode fingers 170a formed between the third openings op3 of the common electrode 170 correspond to the plurality of first openings op1 provided in the pixel electrode 160, And the pixel electrode fingers 160a between the first openings op1 of the pixel electrode 160 correspond to the third openings op3 of the common electrode 170. [

On the other hand, a first alignment layer (not shown) is provided on the common electrode 170 having the second and third openings op2 and op3.

A color filter substrate 181 is provided corresponding to the array substrate 102 having the above-described configuration.

On the inner surface of the color filter substrate 181 facing the array substrate 102, a black matrix 183 is formed corresponding to the boundaries of the pixel regions P, that is, the gate and data lines 103 and 125 Green and blue color filter patterns (R, G, not shown) which are sequentially and repeatedly corresponding to the respective pixel regions P, covering the black matrix 183, are formed . At this time, the color filter layer 185 is patterned corresponding to the central portion of the reflection region RA in each pixel region P, and is thus removed, thereby providing a transmission hole TH. Such a transmission hole TH in the reflection area RA may be omitted for the purpose of improving the luminance in the reflection area RA.

An overcoat layer 187 is formed on the entire surface of the color filter substrate 181 to cover the color filter layer 185 having the transmission hole TH and a second alignment layer .

First and second polarizers 193 and 195 are provided on the outer surfaces of the array substrate 102 and the color filter substrate 181, respectively, and have polarization axes perpendicular to each other.

On the other hand, between the first and second alignment layers (not shown), a second thickness d1 corresponding to the transmissive area TA and a thickness smaller than the first thickness d1 in the reflective area RA and a liquid crystal layer 190 having a thickness d2. At this time, the second thickness d2 is 1/2 of the first thickness d1.

Although not shown in the drawings, a second direction in the longitudinal direction of the second opening (op2) in the transmissive area TA is a direction in which the data line 125 extends, that is, parallel to the data line 125 And the second direction which is the major axis direction of the first and third openings op1 and op3 in the reflection region RA is the gate wiring formed so as to be perpendicular to the data wiring 125 ) In the clockwise direction or the counterclockwise direction with respect to the longitudinal direction (X-axis direction).

FIG. 4 is a cross-sectional view schematically showing only a pixel electrode, a common electrode, and a reflection plate formed in a reflective region of an array substrate in a transverse electric field mode liquid crystal display device according to an embodiment of the present invention.

As shown in the figure, in the case of the array substrate 102 of the transverse electric field mode liquid crystal display device having the above-described configuration, most of the external light passes through only one time of the common electrode 170 and one time of the pixel electrode 160, (See FIG. 1) in which the pixel electrode 160 and the common electrode 170 pass through the liquid crystal display device twice (twice).

The common electrode 170 and the pixel electrode 160 are typically made of indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) which is a transparent conductive material. For example, 1000 Å to 3000 Å, a light loss of 7% to 11% occurs.

Therefore, in the conventional transverse electric field mode transflective type liquid crystal display device (see FIG. 1), the external light passes through the common electrode and the pixel electrode twice, resulting in a relatively large light loss. However, In the transverse electric field mode transflective liquid crystal display device, a plurality of first openings (not shown) are formed alternately with the third openings op3 provided in the common electrode 170 in the pixel electrodes 160 corresponding to the reflection areas RA. since most of the external light passes through the common electrode 170 once and the pixel electrode 160 only once, the loss of light generated by passing through the transparent conductive material layer is minimized and the reflection efficiency is improved by about 17% .

5 is a cross-sectional view schematically illustrating only a pixel electrode, a common electrode, and a reflection plate formed in a reflective region of an array substrate in a transverse electric field mode liquid crystal display device according to an embodiment of the present invention. The first opening width and the third opening width And the width of the common electrode finger portion. At this time, the dotted line portion shows the case where both ends of the pixel electrode fingerring overlap with the common electrode fingerprinting.

As shown in the figure, the plurality of first openings op1 provided in the pixel electrode 160 have a width w3 equal to 1.2 times the width w1 of the common electrode finger 170a corresponding thereto, (2 [mu] m < = w3 < = w1 * 1.2) so as to have a value equal to or larger than the patterning threshold value of 2 mu m.

If the width w3 of the plurality of first openings op1 provided in the pixel region is larger than 1.2 times the width w1 of the common electrode finger 170a located at the upper portion of the common electrode 170, It is experimentally found that a larger driving voltage is required by affecting the intensity and shape of the fringe field generated between the third opening op3 of the pixel electrode 160 and the pixel electrode 160. Accordingly, It can be seen that the width w3 of the first opening op1 which does not affect the second electrode is 1 to 1.2 times as large as the width w1 of the common electrode finger 170a located on the first opening op1.

If the width w3 of the first opening op1 is smaller than the width w1 of the common electrode fingers 170a located thereon, the same fringe field intensity and the same fringe field intensity as forming the plate- So it does not matter.

However, the greater the width w3 of the first openings op1 formed in the pixel electrode 160, the greater the reflection efficiency of the external light. Therefore, the width w1 of the common electrode finger 170a It is preferable to form it to be large in proportion to the thickness.

Therefore, from this point of view, it is preferable that the width w3 of the first opening op1 is more precisely the width of the common electrode fingers adjacent to both ends of the pixel electrode fingers 160a located between the first openings op1, (W4 < w1 * 0.1) in a range of less than 10% of the width w1 of the common electrode fingers 170a, and the overlap width w4 between both ends of the common electrode fingers 170a, The width w3 of the first opening op1 is preferably larger than 2 占 퐉 because the limit of the thickness of about 2 占 퐉 can be minimized in the current technology stage.

The common electrode finger 170a has a width w1 of about 2 m to 10 m and a common electrode finger 170a having a width w1 of 2 m to 10 m, The width w3 of the third opening op3 positioned between the first electrode 170a and the finger electrode 170a is preferably about 1.5 to 2.5 times the width w1 of the common electrode finger 170a Therefore, in the embodiment of the present invention, the width w2 of the third opening op3 is about 3 to 25 mu m.

For example, when the width w1 of the common electrode finger 170a is 2 占 퐉, the width w2 of the third opening op3 may be 4 占 퐉, And the first opening op1 provided in the first opening may be formed to have a width w3 of about 2 to 2.4 mu m.

6 is a cross-sectional view of one pixel region of a transverse electric field mode transflective type liquid crystal display device according to a modification of the embodiment of the present invention. For convenience of explanation, the same reference numerals are given to the same constituent elements as those of the embodiment, and a description will be given mainly of the portions having different points.

In the modification of the embodiment of the present invention, the portion which is different from the embodiment is in the form of the pixel electrode 160 formed in the transmissive region TA. In the embodiment, a plate-shaped pixel electrode is formed corresponding to the transmissive area. In the modified example, the transmissive area TA corresponds to the common electrode finger 170a located in the upper part of the pixel area P And a plurality of fourth openings op4 parallel to the second direction parallel to the plurality of second openings op2 provided in the common electrode 170 are formed. At this time, the range of the width of the fourth opening (op4) has the same range as the width of the first opening described above, and the other constituent elements are the same as those of the above-described embodiment, and a description thereof will be omitted.

In the modification of the embodiment of the present invention having the above-described configuration, the reflection efficiency can be improved with respect to the reflection area RA as in the embodiment. In addition, in the transmission area TA, Since most of the light emitted from the backlight unit (not shown) passes through only one of the electrodes of the light emitting diode 160, the transmission efficiency can be improved.

When the pixel electrode is formed in a plate shape, since the pixel electrode and the common electrode finger portion are formed so as to completely overlap each other, light emitted from the backlight unit passes through both the pixel electrode and the common electrode in the portion corresponding to the common electrode finger. A fourth opening op4 is formed in the pixel electrode 160 in correspondence with the common electrode finger 170a so that most of light emitted from the backlight unit is applied to the pixel electrode 160, Or the common electrode 170, it is possible to minimize the light loss caused by passing through the transparent conductive material layer.

 The present invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a simplified cross-sectional view of a reflective region and a transmissive region of a conventional transverse electric field mode transflective type liquid crystal display device. Fig.

BACKGROUND OF THE INVENTION Field of the Invention [0001] The present invention relates to an array substrate of a transflective transmission type liquid crystal display device, and more particularly, to an array substrate of a conventional transverse electric field mode transflective type liquid crystal display device.

3 is a cross-sectional view of one pixel region of a transverse electric field mode transflective type liquid crystal display device according to an embodiment of the present invention.

4 is a cross-sectional view schematically illustrating only a pixel electrode, a common electrode, and a reflection plate formed in a reflective region of an array substrate in a transverse electric field mode liquid crystal display device according to an embodiment of the present invention.

FIG. 5 is a cross-sectional view schematically showing only a pixel electrode, a common electrode, and a reflector formed in a reflective region of an array substrate in a transverse electric field mode liquid crystal display device according to an embodiment of the present invention. And a width of the electrode finger portion.

6 is a cross-sectional view of one pixel region of a transverse electric field mode transflective type liquid crystal display device according to a modification of the embodiment of the present invention.

Description of the Related Art

101: transverse electric field mode reflective transmissive liquid crystal display

102: array substrate 106: gate electrode

110: first storage electrode 115: gate insulating film

120: semiconductor layer 120a: active layer

120b: Ohmic contact layer 125: Data wiring

130: source electrode 133: drain electrode

136: first protective layer 140: second protective layer

142: Third protective layer 150: Reflector

152: fourth protection layer 160: pixel electrode

160a: Pixel electrode fingering 163: Fifth protective layer

170: common electrode 170: common electrode finger

181: Color filter substrate 183: Black matrix

185: color filter layer 187: overcoat layer

190: liquid crystal layer 193: first polarizer plate

195: second polarizer plate

d1, d2: first and second cell gap

op1, op2, op3: first, second and third openings

P: pixel region RA: reflection region

TA: transmissive region Tr: thin film transistor

TrA: device region

Claims (13)

A first substrate and a second substrate facing each other; A gate line and a data line formed on an inner surface of the first substrate, the gate line and the data line intersecting each other with a gate insulating film interposed therebetween to define a pixel region having a reflective region and a transmissive region; A common wiring formed in parallel with the gate wiring; A thin film transistor connected to the gate line and the data line in the pixel region; A first protective layer covering the data line and the thin film transistor; A reflective plate formed on the reflective layer over the first protective layer; A second protective layer formed on the reflection plate; The drain electrode of the thin film transistor is connected to the drain electrode through a drain contact hole exposing the drain electrode of the thin film transistor on the second passivation layer and is formed in a plate shape corresponding to the entire transmissive region with respect to the transmissive region, A pixel electrode including a plurality of first openings having a long axis in a first direction; A third protective layer formed on the pixel electrode; A plurality of second openings that are connected to the common protection layer through the common wiring and the common contact hole and are spaced apart from the transparent region with a long axis thereof in a second direction orthogonal to the gate wiring, A common electrode including a plurality of third openings having a long axis in one direction and spaced apart from each other; A color filter layer formed on an inner surface of the second substrate; And a liquid crystal layer interposed between the first and second substrates Wherein the first opening and the third opening are arranged to alternate in a planar manner. The method according to claim 1, The common electrode portion located between the second openings and between the third openings is defined as a common electrode finger portion, and the width of the first opening is set to a first width, the width of the common electrode finger portion to a second width, Or the width of the third opening is defined as a third width, Wherein the first width is equal to or greater than 2 microns and is equal to or less than 1.2 times the second width of the transverse electric field mode reflective transmission type liquid-crystal display device. 3. The method of claim 2, And the first opening is formed to overlap with the common electrode finger. The method of claim 3, The pixel electrode portion between the first openings is defined as a pixel electrode finger portion, and both ends of the pixel electrode are overlapped with both ends of the common electrode finger portion by 10% or less of the common electrode finger width In transverse electric field mode reflective transmission type liquid crystal display device. delete The method according to claim 1, Wherein the thickness of the liquid crystal layer in the reflective region is 1/2 of the thickness of the liquid crystal layer in the transmissive region. The method according to claim 1, A first storage electrode that branches off from the common wiring to the reflective region, and a second storage electrode that is branched to overlap the data wiring, The drain electrode is formed to overlap with the first storage electrode so that the first storage electrode, the gate insulating film, and the drain electrode overlap each other to form a first storage capacitor, And the second storage electrode, the gate insulating film, and the data line overlap each other to form a second storage capacitor. The method according to claim 1, Wherein the first protective layer is made of an organic insulating material and the surface of the reflective region has an irregular convexo-concave shape, and the reflective plate formed on the first protective layer has a convex- Field mode reflective transflective liquid crystal display. The method according to claim 1, A fourth protective layer made of an inorganic insulating material is formed between the thin film transistor and the first protective layer, And a fifth passivation layer made of an inorganic insulating material is formed between the first passivation layer and the reflection plate. 10. The method of claim 9, And a sixth protective layer corresponding to the reflective region is formed between the second protective layer and the third protective layer by an organic insulating material. The method according to claim 1, A black matrix is formed between the inner surface of the second substrate and the color filter layer in correspondence with the gate and the data wiring, And an overcoat layer is formed on the entire surface of the second substrate so as to cover the color filter layer. 12. The method of claim 11, Wherein the color filter layer is patterned and removed at a central portion corresponding to the reflective region, thereby forming a transmission hole. The method according to claim 1, First and second polarizers each of which is formed on the outer surface of the first and second substrates and whose polarization axes are orthogonal to each other; A first alignment layer covering the common electrode; A second alignment film formed to cover the color filter layer, The liquid crystal display device of claim 1,

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