KR101202058B1 - Fringe Field Switching mode Liquid Crystal Display and Manufacturing Method Thereof - Google Patents

Abstract

The present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and each pixel region is defined by gate lines and data lines formed in mutually alternating directions on the lower substrate, and the gate In an FFS mode liquid crystal display device in which switching elements are disposed at intersections of lines and data lines, an insulating layer is disposed on a transparent common electrode and a transparent common electrode in a pixel area in order to adjust a light transmission amount by applying a voltage to the liquid crystal layer. A transparent pixel electrode having a plurality of slits spaced apart from each other, the plurality of slits under the reflective structure formed in the electrically independent form using the same material as the data line on the bottom of the data line and / or the gate line Data line and / or by having an active layer having separate closed curve patterns Provides a liquid crystal display device of the FFS mode, characterized in that so as to have a shape with a curved reflecting structures.

FFS, liquid crystal display, aperture, reflectance

Description

FSF mode liquid crystal display and manufacturing method therefor {Fringe Field Switching mode Liquid Crystal Display and Manufacturing Method Thereof}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a FFS mode liquid crystal display device and a method of manufacturing the same having improved aperture ratio, which reduces power consumption and increases internal reflectivity, thereby improving outdoor readability.

Fringe Field Switching mode LCD (hereinafter referred to as FFS mode LCD) is designed to improve the low aperture ratio and transmittance of In Plane Switching mode LCD (hereinafter referred to as IPS mode LCD). It is proposed.

The FFS mode LCD forms a common electrode and a pixel electrode with a transparent conductive layer such as ITO to increase the aperture ratio and transmittance as compared to the IPS mode LCD, and to form a narrow gap between the common electrode and the pixel electrode to form a gap between the common electrode and the pixel electrode. By allowing the fringe field to be formed, even the liquid crystal molecules present on the electrodes can be operated to obtain more improved transmittance. Prior arts for FFS mode LCD liquid crystal displays are disclosed, for example, in US Pat. Nos. 6,608,1,6226118 and the like, filed and registered by the present applicant.

Meanwhile, the liquid crystal display may be classified into two types, a transmissive liquid crystal display using a backlight and a reflective liquid crystal display using natural light as a light source. The transmissive liquid crystal display uses a backlight as a light source, so it can realize bright images even in a dark environment. However, the use of a backlight has high power consumption and poor readability outdoors. Because it uses the natural light of the environment, the power consumption is small and can be used outdoors, but the disadvantage is that it is impossible to use when the surrounding environment is dark.

That is, the general transmissive liquid crystal display device has excellent characteristics indoors in terms of brightness, color reproducibility, and CR (contrast ratio), but outdoors, the information of the display is almost read on the screen by sunlight and light reflected by the sunlight. In the outdoor, the transmissive liquid crystal display device, which does not emit light by itself due to strong light of 100,000 LUX or more, depends on the brightness of the backlight and the panel transmittance. In order to solve this problem, the brightness of the backlight may be increased, but this may cause excessive power consumption.

Due to this problem, a semi-transmissive liquid crystal display has been proposed to solve the disadvantages of the transmissive and reflective liquid crystal display. Since the transflective liquid crystal display device can use both a reflection type and a transmissive type as needed, it has a relatively low power consumption and can be used even in a dark environment. The semi-transmissive liquid crystal display device is disclosed, for example, in Korean Patent No. 666236 by the applicant.

In general, the transflective liquid crystal display uses a single cell gap structure that makes the cell gap of the transmission region and the cell gap of the reflection region the same, and a dual cell gap structure that makes the cell gap of the transmission region twice as large as the cell gap of the reflection region. This is being designed. However, when a semi-transmissive liquid crystal display device is manufactured by applying the same liquid crystal mode in a single cell gap structure, the phase delay value of the reflection area is twice the phase delay value of the transmission area, and thus the VR (Voltage-Reflective) curve of the reflection mode and the transmission mode are applied. There is a problem that the gray scale mismatch and the deterioration of the electro-optic characteristics are caused by the mismatch of the voltage-transmittance curve.

Accordingly, recently, many transflective liquid crystal displays have been manufactured using a dual cell gap structure in which the cell gap of the transmissive region is designed to be about twice as large as the cell gap of the reflective region. This is because the V-R curve of the reflection mode and the V-T curve of the transmission mode can be coincident with this method. However, when the semi-transmissive liquid crystal display device is manufactured by applying the dual cell gap, the step difference due to the difference in the cell gap between the reflection areas is about twice, which causes difficulties in the manufacturing process such as the liquid crystal alignment process is uneven. There is a problem of deterioration. In addition, the semi-transmissive liquid crystal display device has a problem that the manufacturing process is complicated and difficult, but the aperture ratio is significantly lower when used indoors.

On the other hand, in order to realize the advantages of the FFS mode liquid crystal display device and the semi-transmissive liquid crystal display device, the semi-transmissive FFS mode liquid crystal display device has been proposed by the applicant. A semi-transmissive FFS mode liquid crystal display device is disclosed, for example, in Korean Laid-Open Patent Publication No. 2006-117465.

However, when the transflective mode is applied to the FFS mode liquid crystal display, a resin process must be included in order to form the uneven portion for increasing the reflectance. The resin process is basically a difficult process because it cannot be completely escaped from the contamination problem in the manufacturing process. In addition, manufacturing costs are high, and development of a compensation film and a polarizing film must be preceded according to such a structure in order to implement a FFS mode liquid crystal display device in a transflective mode. .

Under such a background, there is a need for a study that can partially adopt the characteristics of the transflective mode liquid crystal display such as readability in the outdoors while maintaining the process in the transmissive FFS mode in general.

Accordingly, it is an object of the present invention to improve the readability in the outdoors without significantly changing the process in the general transmissive FFS mode liquid crystal display by using the basic characteristics of the FFS mode liquid crystal display.

Another object of the present invention is to provide an FFS mode liquid crystal display device which can improve screen quality by improving aperture ratio and minimizing light leakage and coupling effects generated thereby.

It is still another object of the present invention to provide an FFS mode liquid crystal display device capable of increasing internal reflection.

It is still another object of the present invention to reduce the power consumption by increasing the aperture ratio in a room than a conventional transmissive FFS mode liquid crystal display.

As a technical means for solving the above-described problems, the first aspect of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, the gate line formed in the direction crossing each other on the lower substrate In the FFS mode liquid crystal display device in which each pixel region is defined by the data lines and the data lines, and a switching element is disposed at the intersection of the gate line and the data lines.

Transparent with a plurality of slits spaced apart from each other with a transparent common electrode having a predetermined shape and an insulating layer on top of the transparent common electrode in the pixel region in order to adjust a light transmission amount by applying a voltage to the liquid crystal layer. A pixel electrode is provided, and a rubbing direction for arranging the liquid crystal layer is within 5 ° based on the direction of the gate line, and the light leakage is controlled by adjusting the arrangement of the transparent common electrode and the transparent pixel electrode based on the data line. The present invention provides a liquid crystal display (FFS) mode in which an end of the transparent common electrode is disposed between the data line and the transparent pixel electrode while reducing a phenomenon and a coupling effect.

Preferably, the ratio L3 / L1 of the distance L1 between the data line and the transparent pixel electrode and the distance L3 between the data line and the transparent common electrode is within 0.75, and the data line and the transparent pixel electrode. The distance between them is preferably spaced within 4 μm.

The second aspect of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and each pixel region is formed on the lower substrate by gate lines and data lines formed in cross directions. In the FFS mode liquid crystal display device defined and the switching element is disposed at the intersection of the gate line and the data line,

In order to control the amount of light transmission by applying a voltage to the liquid crystal layer, a plurality of slits are disposed in the pixel area and spaced apart from each other with an insulating layer interposed therebetween to overlap the transparent common electrode. A transparent pixel electrode having a slit type having a transparent pixel electrode provided therein, wherein the reflective structure is manufactured on the gate line by using the same material as the data line in an electrically independent form. A liquid crystal display device is provided.

A third aspect of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and each pixel region is defined by gate lines and data lines formed in a direction crossing each other on the lower substrate. In the manufacturing method of the FFS mode liquid crystal display device wherein the switching element is arranged at the intersection of the lines,

Forming a transparent common electrode on the lower substrate; Sequentially forming a transparent pixel electrode of a slit type having a gate line, a gate insulating film, an active layer, a data line, an interlayer insulating film, and a plurality of slits on the transparent common electrode; And coating and rubbing an alignment layer for arranging the liquid crystal layer on the transparent pixel electrode, wherein light leakage and coupling are performed by using the arrangement of the transparent common electrode and the transparent pixel electrode based on the data line. The present invention provides a method of manufacturing a liquid crystal display device in an FFS mode, in which an end of the transparent common electrode is disposed between the data line and the transparent pixel electrode.

The present invention has the following effects.

(1) According to the present invention, it is a transmissive FFS mode liquid crystal display device which improves the aperture ratio and internal reflectivity, which is excellent in outdoor readability and can reduce power consumption, so that PCs, notebook PCs, PDAs, cellular phones, It is particularly effective when applied to displays integrated in digital cameras.

(2) According to the present invention, the light shielding phenomenon and the coupling effect are minimized through the optimized arrangement of the characteristics of the FFS mode, the liquid crystal rubbing direction, the transparent pixel electrode, the data line, and the transparent common electrode, thereby providing a separate light shielding area on the data line. It is possible to not form a and through this has the effect of dramatically improving the aperture ratio.

(3) In order to increase the internal reflection of the light incident on the data line portion in which the light shielding region is not formed, in addition to not forming a separate light shielding region on the data line, the reflectance of the data line itself is increased and By having a bend, the internal reflection is increased.

(4) By fabricating the active layer to be deposited to fabricate the FFS mode liquid crystal display without using a separate deposition process, and by configuring the data line deposited on the upper portion has a curved shape, the internal reflection can be easily performed without complicated change of the process. There is an effect that can be increased.

(5) In order to improve internal reflection and improve outdoor readability, a reflective structure is formed with a data line without forming a light shielding area on the top of the gate line, and has a plurality of separated closed curve patterns using an active layer material. As a result, the reflective structure of the data line material formed thereon has a curved shape so that the internal reflection can be easily increased without complicated change of the process.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings so that those skilled in the art can easily implement the technical idea of the present invention.

The liquid crystal display according to the exemplary embodiment of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the lower substrate and the upper substrate, and the lower substrate is formed in a direction crossing each other to apply a voltage to the liquid crystal layer. Each pixel region is defined by the electrodes. 1 is a plan view of a pixel area formed on a lower substrate of a liquid crystal display according to an exemplary embodiment of the present invention. 2A to 2C are cross-sectional views taken along the lines II ′, II-II ′, and III-III ′ of FIG. 1, respectively.

1 and 2A to 2C, the FFS mode liquid crystal display according to the present exemplary embodiment is arranged such that the gate line 120 and the data line 150 intersect on the lower substrate 100 and the gate line 120 crosses the gate line 120. A thin film transistor (TFT), which is a switching element, is disposed at an intersection of the data line 150 and the transparent common electrode 110 in the unit pixel area defined by the gate line 120 and the data line 150. A transparent pixel electrode 170 having a plurality of slits formed at a predetermined angle with the gate line 120 is spaced apart from the transparent common electrode 110 with the interlayer insulating layer 160 interposed therebetween. In FIG. 1, a case in which the transparent common electrode 110 is manufactured in a plate shape is illustrated as an example, but the transparent common electrode 110 may also be configured to have a plurality of slits.

FIG. 2D illustrates only the transparent common electrode 110, the transparent pixel electrode 170, and the data line 150 for the convenience of identification in the FFS mode liquid crystal display of FIG. 1. Slits form a predetermined angle θ with the gate line 120. The transparent common electrode 110 and the transparent pixel electrode 170 are insulated from each other by at least the interlayer insulating layer 160. The gate insulating layer 130 is provided between the gate line 120 and the active layer 140.

On the other hand, the common bus line 122 is arranged parallel to the gate line 120 at the pixel edge portion spaced apart from the gate line 120, and the common bus line 122 is electrically connected to the transparent common electrode 110. It is connected to continuously apply a common signal to the transparent common electrode (110).

An upper substrate 200 is formed on the lower substrate 100 by a predetermined distance, and the lower substrate 100 includes a light blocking area 205, a color filter (not shown), and an overcoat 220. 100 and a liquid crystal layer (not shown) including a plurality of liquid crystal molecules are interposed therebetween.

Hereinafter, a manufacturing method of the liquid crystal display device of the present invention will be described with reference to FIGS. 1 and 2A to 2C.

First, a transparent conductive layer is deposited on the lower substrate 100 and patterned to form a transparent common electrode 110.

In addition, after the opaque metal is deposited on the transparent common electrode 110, the gate line 120 is formed on one side of the transparent common electrode 110 through patterning, and the structure covers a portion of the transparent common electrode 110. The common bus line 122 is formed (see FIG. 2B).

Next, the gate insulating layer 130 is deposited on the entire surface of the lower substrate 100 on which the patterned transparent common electrode 110, the gate line 120, and the common bus line 122 are formed. The active layer 140 is formed by patterning the a-Si layer and the n + a-Si layer on the upper gate insulating layer 130.

In addition, after depositing a metal layer on the entire surface of the lower substrate on which the active layer 140 is patterned, the data line 150 and the source-drain electrode 152 are formed through patterning, and the data line 150 and the source-drain electrode ( The interlayer insulating layer 160 is deposited on the lower substrate 100 on which the 152 is formed.

Next, after forming the contact hole CN to expose a portion of the source-drain electrode 152, a transparent conductive layer is deposited on the interlayer insulating layer 160. In this case, the transparent conductive layer is patterned to connect the source-drain electrode 152 and the transparent pixel electrode 170 through the contact hole CN to form a transparent pixel electrode 170 having a slit shape.

On the other hand, the light blocking region 205 is formed in the upper substrate 200 corresponding to the pixel region. According to the present exemplary embodiment, only the upper substrate 200 corresponding to the switching element is provided with the light blocking region. According to the related art, a light blocking area is formed on the gate line 120 and the data line 150, but in the present embodiment, the upper substrate 200 corresponding to the data line 150 and / or the gate line 120 is formed on the upper substrate 200. No light shielding area is formed. It is obvious that the opening ratio is relatively increased when the area of shading region is reduced.

Hereinafter, a structure of not forming a light blocking region on an upper portion of a data line according to an exemplary embodiment of the present invention will be described in detail.

In the liquid crystal display of the FFS mode according to the present embodiment, the transparent common electrode 110 and the transparent pixel electrode 170 having a plurality of slits control the arrangement of the liquid crystal layer (not shown). The transmittance can be controlled in units of pixels.

In the structure of the liquid crystal display according to the present exemplary embodiment, a light blocking area is not formed in an area of the upper substrate 200 on the data line 150 to improve the aperture ratio. The light blocking area (for example, a black matrix) is an area for preventing light transmission in an area where the liquid crystal molecules cannot be controlled. According to the related art, a light blocking area is formed on the data line 150. . However, according to the present exemplary embodiment, the light blocking area can be removed using the basic characteristics of the FFS mode liquid crystal display, the rubbing angle, and the like. The disadvantage of the light blocking area can be eliminated based on the data line 150. The transparent common electrode 110 and the transparent pixel electrode 170 have been overcome by optimizing the arrangement.

2A is a cross-sectional view of a portion of the data line 150. Referring to FIG. 2A, a transparent common electrode 110 is formed on a lower substrate 100, and a gate insulating layer is formed on the transparent common electrode 110. 130 is formed, and a data line 150 is formed on the active layer 140, and an interlayer insulating layer 160 and a transparent pixel electrode 170 are formed on the data line 150. It is formed in turn.

In FIG. 2A, the data line 150 is configured to cover the active layer 140, but it is obvious that the data line 150 may be used as a structure in which the active layer 140 is removed. In addition, a material having high reflectivity or a bent portion may be disposed on the uppermost layer so that the upper surface of the data line 150 may increase reflection with removal of the light blocking region. Formation of the bent portion will be described later in detail.

Meanwhile, a color filter (not shown), an overcoat layer 220, and an alignment layer (not shown) are formed on the upper substrate 200 corresponding to the lower substrate 100, and the light blocking area is not formed. not.

3A to 3C illustrate results of simulating light transmittance near a data line in a TN mode and an FFS mode by arranging a common electrode and a pixel electrode near the data line.

First, FIG. 3A is a result of simulating light transmittance occurring near a data line in a conventional twisted neumetic (TN) mode. The upper graph of FIG. 3A shows the light transmittance in the region corresponding to the lower region. Referring to FIG. 3A, the left pixel electrode is set to a voltage applied state (on_state) and the right pixel electrode is not applied to a voltage (off_state) based on the data line, and the rubbing direction of the liquid crystal is generally 45 °.

In the simulation condition of FIG. 3A, the common electrode is formed on the upper substrate having the color filter in the TN mode, and is driven to normally white. Accordingly, in the case of FIG. 3A, since the left pixel electrode region is in a voltage applied state, the transmittance should be zero, and the right pixel electrode region should show maximum transmittance with no voltage off_state, but is affected by the data line voltage. Likewise, light leakage occurs at the electrode edge and the data line.

Therefore, in the case of the TN mode, when the light blocking region is removed from the upper portion of the data line, a fatal problem that light leakage occurs around the data line may occur, and thus, the light blocking region may be formed on the data line. However, it will be apparent that forming the light shielding region will reduce the overall aperture ratio.

However, in the case of the FFS mode manufactured by the liquid crystal manufacturing method of the present invention, when the rubbing direction of the liquid crystal is substantially set to 0 ° with respect to the gate line, the present inventors have found that a voltage difference between the data line, the pixel electrode, and the common electrode has occurred. It was found that light leakage can be blocked regardless of the magnitude of the electric field due to the same direction of electric field.

3B and 3C illustrate simulation results of light transmittance generated near a data line when a rubbing direction is set to 0 ° and 90 ° (based on a gate line) in the FFS mode, respectively. In FIG. 3A to FIG. 3C, the intervals between the electrodes were all set the same.

3B and 3C, as in FIG. 3A, the left pixel electrode is set to a voltage applied state (on_state), and the right pixel electrode is set to voltage off_state. And the rubbing direction of the liquid crystal was set to 0 degrees in FIG. 3B, and 90 degrees in FIG. 3C. As a result, in FIG. 3B, the transmittance is almost close to 0 regardless of on / off driving of the voltage applied to the pixel electrode, while in FIG. 3C, light leakage occurs in the B region. can confirm.

In particular, the case of FIG. 3C may be described as a case corresponding to the general IPS mode, since the IPS mode also has the same electrode arrangement near the data line. In FIG. 3C, the rubbing direction of the liquid crystal is 90 °, and the direction of the electric field generated by the voltage difference between the data line, the pixel electrode, and the common electrode is 0 °, perpendicular to each other. Therefore, when the potential difference between electrodes occurs, the liquid crystal oriented in the 90 ° direction rotates in the 0 ° direction, which is the electric field direction, and the light leakage region is generated like the B region.

3B and 3C, light leakage should not occur at the periphery of the data line so as not to form a light blocking region on the data line. In the TN mode or the IPS mode (or the rubbing direction of FFS mode, 90 °), the data line Since unwanted liquid crystal rotation occurs due to the electric field generated between the pixel electrode and the common electrode, and light leakage occurs as a result, it is inevitable to form a light shielding region on the data line. On the other hand, referring to FIG. 3B, when the liquid crystal rubbing direction is set to 0 ° in the FFS mode, the problem of light leakage around the data line can be avoided.

On the other hand, the simulation was performed when the liquid crystal rubbing direction was set to 0 °. However, in actual application, when the voltage is 0 to 5 ° in consideration of driving voltage and response speed, the light leakage around the data line can be almost avoided, which is a preferable range. In view of the process margin, it is more preferable to implement within 0 to 2 °, most preferably to substantially 0 °.

4 is a conceptual diagram illustrating the occurrence of a coupling phenomenon according to an arrangement relationship between a data line, a transparent pixel electrode, and a transparent common electrode in the FFS mode of the present invention, and FIGS. 5A and 5B are data lines, transparent pixel electrodes, and transparent layers. It is a simulation result showing the occurrence of the coupling phenomenon according to the arrangement relationship between the common electrodes.

Referring to FIG. 4, the distance between the data line 150 and the transparent pixel electrode 170 is denoted by L1, and the distance between the data line 150 and the transparent common electrode 110 is denoted by L3, and is transparent. A distance from one end E of the electrode 110 toward the data line 150 than the transparent pixel electrode 170 is indicated by L2. Thus, the formula L1 = L2 + L3 holds.

Since the transparent common electrode 110 has a fixed voltage value among the electrodes for generating an electric field, even if an electric field is formed in the data line 150 or the transparent pixel electrode 170, a constant voltage difference is maintained, thereby affecting deterioration of screen quality. Less crazy However, since the voltage applied to the data line 150 or the transparent pixel electrode 170 varies irregularly according to the driving screen, the coupling caused by the electric field generated between the two electrodes may cause the screen deterioration. .

Therefore, in the present exemplary embodiment, one end E of the transparent common electrode 110 is positioned between the transparent pixel electrode 170 and the data line 150, so that the transparent pixel electrode 170 and the data line 150 are disposed between the transparent pixel electrode 170 and the data line 150. The electric field is directly formed to mitigate the phenomenon that can lead to unstable liquid crystal array. When the transparent common electrode 110 is designed to be positioned between the transparent pixel electrode 170 and the data line 150, the transparent common electrode 110 does not form a direct electric field between the transparent pixel electrode 170 and the data line 150. ) Acts as an intermediate to offset the electric field. That is, in the state where the light blocking region is removed from the upper portion of the data line 150, a direct electric field is not formed between the transparent pixel electrode 170 and the data line 150, and the transparent common electrode 110 having a constant voltage value is centered in the center. Positioning allows the formation of a constant electric field and prevents screen deterioration due to irregular coupling.

Next, with reference to the simulation results of FIGS. 6A to 6C, the optimum conditions for the one end E of the transparent common electrode 110 to be arranged between the data line 150 and the transparent pixel electrode 170 will be described in detail. Explain.

In FIGS. 6A to 6C, the insets indicated by 1 to 6 are the simulation results when L1 and L3 are as follows. More specifically, L1 = 4 µm, L3 = 0 µm, L1 = 4 µm, L3 = 1 µm, L1 = 4 µm, L3 = 2 µm, L1 = 4 µm, L3 = 3 µm, ⑤ L1 = 4 µm, L3 = 4 µm, ⑥ L1 = 4 µm, and L3 = 5 µm.

Meanwhile, in the simulation data of FIG. 6A, the right side is an off state, the left side is an on state, and the left side of FIG. 6A is an off state. 6C is an enlarged view of the right-side voltage on state.

6A through 6C, the distance L1 between the data line 150 and the transparent pixel electrode 170 may be removed in order to simultaneously remove the coupling effect in the voltage on state or the voltage off state. When 4) is 4 μm, the distance L3 between the data line 150 and the transparent common electrode 110 may be in a range of about 0 μm to 3 μm.

Therefore, as the distance L1 between the data line 150 and the transparent pixel electrode 170 changes, the distance L3 between the data line 150 and the transparent common electrode 110 may change at the same ratio. Since L3 / L1 is defined as L, preferably, the range of L (L3 / L1) is 0 to 0.75.

On the other hand, in the FFS mode, even if the light blocking region is removed from the upper portion of the data line 150, light leakage due to the voltage variation of the data line 150 does not occur, but when the transparent pixel electrode 170 and the data line 150 overlap each other, Coupling between electrodes can lead to signal deterioration of the data, vertical cross talk, and deterioration of screen quality such as shot mura due to the increase of parasitic capacitance Cpd.

Therefore, it is desirable to set a minimum design rule to minimize the phenomenon and to not overlap the transparent pixel electrode 170 and the data line 150 in consideration of process capability. In addition, when the distance L1 between the data line 150 and the transparent pixel electrode 170 becomes too wide, an area where the liquid crystal molecules cannot be controlled increases, thereby degrading screen quality. Preferably, the distance L1 between the data line 150 and the transparent pixel electrode 170 is set within 4 μm.

On the other hand, since the optimal alignment tolerance value required for the design is about 1.5 μm, the design value is 1.5 μm even when the distance L1 between the data line 150 and the transparent pixel electrode 170 is to be 0. Shall be. Of course, the process proceeded according to the design value may be different by the alignment in the process.

On the other hand, by removing the light shielding area on the data line according to the present embodiment, further increasing the reflectivity of the exposed data line may further improve outdoor readability while increasing the aperture ratio of the liquid crystal display of the present embodiment.

To achieve this purpose, the top of the data line allows metals with high reflectivity to be exposed, while increasing the internal reflectance by the data lines to improve outdoor readability. It is preferable to form a curved structure in the data line to reflect the light incident on the data line therein to increase the internal reflectance.

FIG. 7A is a partial plan view of a data line employing a curved (embossed) structure to increase internal reflection in the data line, and FIG. 7B is a cutaway cross-sectional view of IV-IV ′ of FIG. 7A.

Referring to FIGS. 7A and 7B, in a cross-sectional view of the active layer 140 and the data line 150 cut in a double structure of the data line 150 and the active layer 140, the lower substrate 100 is disposed on the lower substrate 100. The transparent pixel electrode 170 is formed on the gate electrode, a gate insulating layer 130 is formed on the transparent pixel electrode 170, and the data line 150 is formed on the transparent pixel electrode 170 to cover the active layer 140. The interlayer insulating layer 160 and the transparent pixel electrode 170 are sequentially formed on the data line 150.

In FIG. 2A, the data line 150 covers the active layer 140. However, the structure of the data line 150 reduces the delay of the signal transmitted through the data line 150. Independent closed curves, such as ellipses, form a plurality of separate closed curve-shaped patterns to form an active layer pattern 145 so that the data line 150 formed on the active layer pattern 145 has a curved shape. This can increase the internal reflection.

The curved shape of the data line 150 may be formed by the dual layer structure of the active layer pattern 145 and the data line 150, which is a relatively simple method, and does not require an additional process. That is, the internal reflection can be increased while maintaining the process of the general transmissive FFS mode liquid crystal display without greatly changing. Accordingly, the data line 150 may have a curved portion in addition to the configuration in which the light blocking area is not formed on the data line 150, thereby increasing the aperture ratio and outdoor readability.

Meanwhile, the overcoat layer 220 is formed on the upper substrate 200 corresponding to the lower substrate 100 based on the upper substrate, and the light blocking region is not formed.

8 is a plan view of a gate line portion of a pixel area formed on a lower substrate of a liquid crystal display according to an exemplary embodiment of the present invention. FIG. 9 is a cross-sectional view taken along line VV ′ of FIG. 8.

By removing the light blocking area and forming the reflective structure 300 in the upper region of the gate line 120 in a manner to improve outdoor readability by improving the internal reflectance.

The reflective structure 300 is formed to cover the gate line 120. The reflective structure 300 is manufactured in an electrically independent form using the material of the data line 150. Preferably, a curved shape is formed in the reflective structure 300 using the material of the active layer.

The curved shape forms active layer patterns 145 by forming a plurality of separate closed curve shape patterns such as circles, ellipses, etc. using the active layer material, and forms a pattern 155 of data lines of the reflective structure 300 formed thereon. ) Has a curved shape, which increases the internal reflection by the curved shape. That is, the curved shape of the pattern 155 of the data line may be more effectively implemented by the double layer structure of the active layer patterns 145 and the data line pattern 155. Accordingly, outdoor readability may be significantly improved by having the curved portion of the data line pattern 155, which is the reflective structure 300, without forming a light blocking area on the upper part of the gate line 120.

This structure is useful in that it does not require much development because it can improve readability outdoors while maintaining the process of a typical transmissive FFS mode liquid crystal display without greatly changing the process.

In addition, the reflective structure 300 is electrically formed independently, and preferably formed of two regions separated by the gate line 120. Since the gate line 120 may be made of an opaque metal, the reflective structure 300 may be formed as a separated region while exposing the gate line 120 based on the gate line 120.

Meanwhile, the light shielding region 205 formed on the switching element may be implemented by covering the reflective structure 300 in a predetermined region to secure a process margin.

Although the technical spirit of the present invention has been described in detail according to the above-described preferred embodiment, it should be noted that the above-described embodiment is for the purpose of description and not of limitation. In addition, it will be understood by those of ordinary skill in the art that various embodiments are possible within the scope of the technical idea of the present invention.

1 is a partial plan view of a pixel area formed on a lower substrate of a liquid crystal display according to an exemplary embodiment of the present invention.

2A to 2C are cross-sectional views taken along the lines I-I ', II-II', and III-III 'of FIG. 1, respectively, and FIG. 2D is a transparent common electrode and a transparent pixel electrode in the FFS mode liquid crystal display of FIG. Only a portion of the data line is shown.

Figure 3a is a result of simulating the light transmittance occurring near the data line in the TN mode of the prior art, Figures 3b and 3c is a result of simulating the transmittance of the light generated near the data line when the rubbing direction is changed in the FFS mode These are the pictures.

4C is a conceptual diagram illustrating a coupling phenomenon caused by an arrangement relationship between a data line, a transparent pixel electrode, and a transparent common electrode according to an exemplary embodiment of the present invention.

5A and 5B are simulation results illustrating the occurrence of a coupling phenomenon according to an arrangement relationship between a data line, a transparent pixel electrode, and a transparent common electrode in an embodiment of the present invention.

6A to 6C are simulation results for obtaining an optimal condition for arranging one end of a transparent common electrode between a data line and a transparent pixel electrode in an embodiment of the present invention.

FIG. 7A is a fragmentary plan view of a data line employing a curved shape to increase internal reflection in the data line in an embodiment of the present invention, and FIG. 7B is a cutaway cross-sectional view taken along line IV-IV 'of FIG. 7A.

8 is a plan view of a gate line portion of a pixel area formed on a lower substrate of a liquid crystal display according to an exemplary embodiment of the present invention. FIG. 9 is a cross-sectional view taken along line VV ′ of FIG. 8.

Claims (18)

Each pixel region is defined by gate lines and data lines including a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and the lower substrates are formed in a direction crossing each other. In the FFS mode liquid crystal display device wherein the switching element is arranged at the intersection of the lines, In order to control the amount of light transmission by applying a voltage to the liquid crystal layer, the pixel area includes a transparent pixel electrode having a plurality of slits spaced apart from each other with an insulating layer interposed between the transparent common electrode and the transparent common electrode. But And an active layer having a plurality of separated closed curve patterns below the data line so that the data line has a curved shape. The method of claim 1, And a reflective structure formed on the gate line in an electrically independent form using the same material as that of the data line. 3. The method of claim 2, And the active layer having a plurality of separated closed curve patterns below the reflective structure to make the reflective structure have a curved shape. A lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, wherein each pixel region is defined by a gate line and data lines formed in a direction crossing each other, and the gate line and the In the FFS mode liquid crystal display device in which a switching element is arranged at the intersection of the data lines, In order to control the amount of light transmission by applying a voltage to the liquid crystal layer, the pixel area includes a transparent pixel electrode having a plurality of slits spaced apart from each other with an insulating layer interposed between the transparent common electrode and the transparent common electrode. But A reflection structure formed on the gate line in an electrically independent form using the same material as the data line, And an active layer having a plurality of separated closed curve patterns below the reflective structure to allow the reflective structure to have a curved shape. The method according to any one of claims 2 to 4, And the reflective structure includes a region separated into two regions with respect to the gate line. 5. The method according to any one of claims 1 to 4, And a rubbing direction for arranging the liquid crystal layer is within 5 degrees with respect to the direction of the gate line. 5. The method according to any one of claims 1 to 4, A rubbing direction for arranging the liquid crystal layer is within 2 degrees with respect to the direction of the gate line, the liquid crystal display device of the FFS mode. 5. The method according to any one of claims 1 to 4, And an end portion of the transparent common electrode disposed between the data line and the transparent pixel electrode, thereby reducing light leakage and a coupling effect. 9. The method of claim 8, The ratio L3 / L1 of the distance L3 between the data line and the transparent common electrode to the distance L1 between the data line and the transparent pixel electrode is within 0.75. Device. 5. The method according to any one of claims 1 to 4, And the distance L1 between the data line and the transparent pixel electrode is spaced within 4 μm. 5. The method according to any one of claims 1 to 4, And the plurality of slits of the transparent pixel electrode form a predetermined angle with the gate line. Each pixel region is defined by a gate line and a data line including a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and formed in a direction crossing each other on the lower substrate. In the manufacturing method of the FFS mode liquid crystal display device in which a switching element is arrange | positioned, Forming a transparent common electrode on the substrate; And Sequentially forming a transparent pixel electrode having a gate line, a gate insulating film, an active layer, a data line, an interlayer insulating film, and a plurality of slits on the transparent common electrode; , ≪ / RTI & In the forming of the active layer, a curved shape is provided on the data line formed thereon by forming a plurality of separated closed curve patterns using the active layer below the data line. Method for manufacturing a liquid crystal display device in mode. The method of claim 12, And in the forming of the data line, an electrically independent reflective structure is formed on the gate line by using the same material as that of the data line. 14. The method of claim 13, In the forming of the active layer, a curved shape is formed on the reflective structure formed thereon by forming a plurality of separated closed curved patterns using the active layer on the gate line on which the reflective structure is to be formed. Method of manufacturing a liquid crystal display device of the FFS mode, characterized in that. Each pixel region is defined by a gate line and a data line including a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and formed in a direction crossing each other on the lower substrate. In the manufacturing method of the FFS mode liquid crystal display device in which a switching element is arrange | positioned, Forming a transparent common electrode on the substrate; And Sequentially forming a transparent pixel electrode having a gate line, a gate insulating film, an active layer, a data line, an interlayer insulating film, and a plurality of slits on the transparent common electrode; , ≪ / RTI & The forming of the data line may include forming an electrically independent reflective structure on the gate line by using the same material as the data line. In the forming of the active layer, a curved shape is formed on the reflective structure formed thereon by forming a plurality of separated closed curve patterns using the active layer on the gate line on which the reflective structure is to be formed. Method of manufacturing a liquid crystal display device of the FFS mode characterized in that. The method according to any one of claims 13 to 15, And the reflecting structure is formed to have a region separated into two regions with respect to the gate line. delete delete

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