KR101714035B1 - A wire grid polarizer, liquid crystal display, 3d-display including the same and method of manufacturing the wire grid polarizer - Google Patents

Abstract

The present invention relates to a wire grid polarizer capable of obtaining a high luminance and reducing the number of processes, a liquid crystal display including the wire grid polarizer, and a method of manufacturing the wire grid polarizer.
According to the present invention, a wire grid polarizer including a first grating arranged on a substrate at a predetermined interval and a second grating on the first grating can be formed only by an imprint process, a deposition process, and a wet etching process , The number of process steps can be reduced, the process cost and time can be reduced, and reliability can be secured.

Description

TECHNICAL FIELD [0001] The present invention relates to a wire grid polarizer, a liquid crystal display including the wire grid polarizer, a three-dimensional stereoscopic image display device, and a method of manufacturing a wire grid polarizer.

The present invention relates to a wire grid polarizer capable of obtaining a high luminance and reducing the number of processes, a liquid crystal display including the wire grid polarizer, and a method of manufacturing the wire grid polarizer.

Generally, a polarizer or a polarizing element means an optical element that extracts linearly polarized light having a specific vibration direction from unpolarized light such as natural light. A wire grid polarizer, one type of optical element, is an optical element that produces polarized light using a conductive wire grid. This has been used as a useful reflective polarizer for a long time in the wavelength region of the infrared region because it has higher polarization separation performance than other polarizers.

The process for forming the wire grid polarizer is a process of forming a wire grid polarizer in a number of process steps such as a metal deposition process, a photoresist process, a photolithography process, a photoresist process, a metal layer etch process, and a photoresist strip process, And thus the time and cost are increased.

In addition, the most important factor determining the performance of the wire grid polarizer is the relationship between the interval pitch between wire grids and the incident light wavelength. That is, when the pitch between the wire grids is not sufficiently small, it is difficult to expect the desired effect because the incident light is diffracted without being polarized. As described above, the polarization characteristics of the wire grid polarizer are important factors in the pitch between the wire grids, the width and height of the wire grids. However, it is difficult to control the width and height of the wire grid in the conventional process described above.

SUMMARY OF THE INVENTION The present invention has been conceived to solve the problems described above, and an object of the present invention is to provide a wire grid polarizer comprising a first grating arranged on a plate at a predetermined interval and a second grating on the first grating, The present invention is to provide a manufacturing process that can secure reliability by reducing the number of process steps and manufacturing cost by only manufacturing the imprint process, the deposition process, and the wet etching process.

It is another object of the present invention to provide a wire grid polarizer capable of improving the transmittance by providing a second grating having a structure capable of improving luminance and maximizing polarization efficiency by a wet etching process.

According to one aspect of the present invention, there is provided a semiconductor device comprising: a first lattice layer having at least one first lattice having a constant pitch and a height on a substrate; And a second grating layer having at least one second grating having a constant pitch and height on the first grating, wherein the ratio of the width of the first grating to the width of the second grating is 1 :( 0.2 to 1.5) of the wire grid polarizer.

In this case, the first grating and the first grating layer of the wire grid polarizer may be formed of a polymer material, and the second grating may be formed of a metal material.

In particular, in the structure described above, the structure of the two gratings may be such that the ratio of the width of the second grating to the spacing of the second grating satisfies 1: (0.2 to 1.5) The ratio of the height of the lattice satisfies 1: (1 to 5), or the ratio of the pitch of the second lattice and the height of the second lattice satisfies 1: (1 to 5).

Further, the wire grid polarizer of the above-described structure according to the present invention may be formed so that the ratio of the width of the first lattice to the interval of the first lattice satisfies 1: (0.2 to 1.5) And the height of the first lattice is in a range of 1: (0.2 to 5).

In either case, the pitch of the second lattice or the pitch of the first lattice can be formed in the range of 50 nm to 1 占 퐉.

Furthermore, the first lattice and the second lattice according to the present invention may be formed in a circular, elliptical, or polygonal shape in cross section.

The wire grid polarizer having the above-described structure can be formed by the following process. Specifically, the manufacturing process according to the present invention includes: a first step of forming a plurality of first gratings having a predetermined pitch by processing a first grating base layer laminated on a substrate; A second step of forming a second lattice base layer on the first lattice; Forming a plurality of second gratings by etching the second grating base layer, wherein a ratio of a width of the first grating to a width of the second grating is 1: (0.2 to 1.5); And the like.

In this case, the first step is to form a plurality of first gratings in the regions corresponding to the plurality of grooves by pressing the imprint mold having a plurality of grooves on the first grating base layer made of a polymer material can do.

The second step may include forming a metal material layer through a deposition process.

Particularly, in the above-described manufacturing process, the first step may be such that the ratio of the width of the first lattice to the interval of the first lattice satisfies 1: (0.2 to 1.5) It is preferable that the ratio of the height of the lattice is formed so as to satisfy 1: (0.2 to 5).

Further, in the manufacturing process according to the present invention, the third step is performed by a wet etching process, and the ratio of the width of the second lattice to the interval of the second lattice satisfies 1: (0.2 to 1.5) The ratio of the width of the lattice to the height of the second lattice satisfies 1: (1 to 5), or the ratio of the pitch of the second lattice and the height of the second lattice satisfies 1: (1 to 5) And then performing an etching process so as to satisfy the following condition.

The wire grid polarizer of the above-described structure according to the present invention can be applied to a liquid crystal display device.

More specifically, the liquid crystal display device includes a liquid crystal display panel; A backlight unit for supplying light to the liquid crystal display panel; The liquid crystal display device can be formed by including the above-described wire grid polarizer according to the present invention on either the upper surface or the lower surface of the liquid crystal display panel or a plurality of optical sheets for increasing the efficiency of light included in the backlight unit have.

In the wire grid polarizer included in the liquid crystal display, the ratio of the width of the first lattice to the interval of the first lattice satisfies 1: (0.2 to 1.5), or the ratio of the width of the first lattice to the width of the first lattice Height ratio of 1: (0.2 to 5) is satisfied as described above.

It is needless to say that the wire grid polarizer according to the present invention can be applied to a device for displaying three-dimensional stereoscopic images in addition to the above-described liquid crystal display device.

According to the present invention, a wire grid polarizer including a first grating arranged on a substrate at a predetermined interval and a second grating on the first grating can be formed only by an imprint process, a deposition process, and a wet etching process , The number of process steps can be reduced, the process cost and time can be reduced, and reliability can be secured.

In addition, by forming the second lattice to have the optimum height and width by the wet etching process, it is possible to improve the luminance and the polarization efficiency by improving the transmittance.

1 is a perspective view showing the principle of operation of a wire grid polarizer according to the present invention.
2 is a cross-sectional view illustrating the height and width of each of the first and second gratings of the wire grid polarizer shown in FIG.
3 is a graph showing the transmittance according to the height and width of the second grating of the wire grid polarizer according to the present invention.
4 is a graph showing transmittance and luminance.
5 to 7 are schematic views showing a method of manufacturing a wire grid polarizer according to the present invention.
8 is a cross-sectional view of a wire grid polarizer in which a pattern of a first lattice is formed in a hemispherical shape according to the present invention.
FIGS. 9 to 11 are perspective views illustrating a method of manufacturing the wire grid polarizer shown in FIG.
12 shows a structure of a wire grid polarizer according to another embodiment of the present invention.
13 shows a structure of a wire grid polarizer according to another embodiment of the present invention.
14 is a cross-sectional view illustrating a liquid crystal display device according to an embodiment of the present invention.

Hereinafter, the configuration and operation according to the present invention will be described in detail with reference to the accompanying drawings. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the following description with reference to the accompanying drawings, the same reference numerals denote the same elements regardless of the reference numerals, and redundant description thereof will be omitted. The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.

FIG. 1 is a perspective view illustrating the principle of operation of the wire grid polarizer according to the present invention, and FIG. 2 is a cross-sectional view illustrating the height and width of each of the first and second grids of the wire grid polarizer shown in FIG.

Referring to the drawings, a wire grid polarizer according to the present invention includes a plurality of wire grids (grating structures) arranged at regular intervals on a substrate. The wire grid polarizer is a vector that is orthogonal to the conductive wire grid when light in a nonpolarized state is incident when the pitch (which means the distance between the lattice width and the lattice spacing) is sufficiently smaller than the wavelength of the incident light. That is, P polarized light, and a component having a vector parallel to the wire grid, i.e., S polarized light, is reflected.

The optical characteristics of such a wire grid polarizer can be evaluated by the transmittance, the polarization efficiency, the polarization extinction ratio, and the like. The polarization efficiency is (Tp - Ts) / (Tp + Ts) where Tp is the P wave transmittance and Ts is the S wave transmittance. The polarization extinction ratio is Tp / Ts. That is, you can evaluate the three characteristics and determine the required use.

A plurality of wire grids in accordance with the present invention are formed in at least two layers and are formed of a plurality of wire grids each having a plurality of first gratings 110 arranged in parallel at predetermined intervals on a substrate 100 as shown in FIG. And a second grating layer having a plurality of second gratings 112 formed on the first gratings 110 of the first grating layer.

The optical characteristics of the wire grid polarizer are determined in accordance with the widths F and C of the first and second gratings 110 and 112 and the pitches H and H of the first and second gratings, (A). Here, the pitch refers to the width of each lattice and the distance to the neighboring lattice. In the structure shown in the figure, the pitch H of the first lattice 110 corresponds to the interval G of the first lattice + F and the pitch A of the second grating 112 is defined as the interval B of the second grating and the width C of the second grating.

In this wire grid polarizer, the transmittance can be adjusted according to the lattice height and width. If the grating width becomes wider at the same pitch, the transmittance becomes lower and the polarization extinction ratio becomes higher.

In order to secure the maximum polarization efficiency, the polarization characteristics are increased as the pitch is decreased. When the distance between the same lattices and the width of the same lattice are formed, the polarization characteristics are increased as the lattice height is increased. The polarization characteristic is improved as the width of the lattice is increased.

Thus, in order to obtain the maximum luminance, the optimum pitch, lattice height and width should be adjusted. The widths F and C of the first and second gratings 110 and 112 and the pitches A and H of the gratings A and H are given in Table 1 below, . In the structure shown in the figure, B denotes a second inter-lattice spacing, and G denotes a first inter-lattice spacing.

{Table 1}

Referring to Table 1 and FIG. 2, the wire grid polarizer according to the present invention includes a first grid 110 having a width F and a height E at a constant pitch H on a substrate 100 And a second grating 112 having a width C and a height D at a constant pitch A on the first grating 110, And a second grating layer. In this case, the ratio of the width (F) of the first lattice to the width (C) of the second lattice is preferably formed so as to satisfy F: C = 1: (0.2 to 1.5).

The second grating 112 is formed of a metal material and the ratio of the width C of the second grating to the spacing B of the second grating is C: B = 1: 0.2 to 1.5. Or the ratio of the width C of the second lattice to the height D of the second lattice satisfies C: D = 1: (1 to 5) And the height (D) of the second lattice satisfies A: D = 1: (1 to 5). The structure described above can maximize transmittance, luminance, and polarization efficiency. Particularly, in this case, the pitch A of the second grating 112 is preferably in the range of 50 nm to 1 탆.

Particularly, only the ratio of the pitch A of the second grating 112 to the height D of the second grating is measured, and the degree of improvement of the transmittance is measured.

FIG. 3 is a graph showing the relationship between the pitch A of the second grating and the height D of the second grating measured in a range satisfying A: D = 1: (1 to 5) This is a result.

3A shows a case where the height D of the second grating 112 is 100 to 150 nm and the pitch A of the second grating 112 is 100 to 200 nm, 112), the width (C)

In addition, (b) shows that the height (D) of the second grating 112 is 151 to 200 nm, and when the pitch A of the second grating 112 is 100 to 200 nm, (C) of the transparent electrode 112 is narrowed.

When the pitch A of the second lattice 112 is 100 to 200 nm, the second lattice 112 is formed to have a height D of 201 to 300 nm, (C) of the light-shielding film. That is, the height D of the second grating 112 is made constant in the range of A: D = 1: (1 to 5) as shown in FIGS. 3A, 3B, As the width C of the grating 112 is gradually narrowed, the transmittance is improved.

For example, as shown in FIG. 4, a high luminance is exhibited when the transmittance is 40 to 60%, preferably 50%. Therefore, when the first and second gratings 110 and 112 are formed with the heights E and D and the widths F and C of the first and second gratings 110 and 112 or the pitch A of the second grating 112, .

Table 2 shows the transmittance and the polarization efficiency according to the pitch A between the second gratings 112 of the present invention.

{Table 2}

In addition to the structure of the second grating according to the present invention, the maximum optical effect can be realized by adjusting the structure of the first grating according to the present invention. In particular, the first grating 110 of the present invention is made of a polymer material, and the ratio of the width F of the first grating to the spacing G of the first grating is F: G = 1: 0.2 The ratio of the width (F) of the first lattice to the height (E) of the first lattice satisfies F: E = 1: (0.2 to 5) . In addition, the pitch H of the first grating in the present invention described above can be formed within a range of 50 nm to 1 mu m.

The first lattice and the second lattice according to the present invention may be formed in various shapes such as a stripe, a curve, a square, and a triangle. That is, the first lattice and the second lattice may be formed in various shapes such as a circular, elliptical, or polygonal shape in cross section.

Hereinafter, a manufacturing process of the wire grid polarizer according to the present invention will be described with reference to FIGS. 5 to 7. FIG. 5 to 7 illustrate a manufacturing process of a wire grid polarizer according to the present invention. In this embodiment, the first and second lattices are formed in a stripe shape.

The manufacturing process of the wire grid polarizer according to the present invention includes a first step of forming a plurality of first gratings 110 having a predetermined pitch by processing a first grating base 122 layer stacked on a substrate, A second step of forming a second lattice base layer 124 on the lattice, and a third step of etching the second lattice base layer 124 to form a plurality of second lattices 112.

In this case, it is preferable that the ratio of the width F of the first lattice to the width C of the second lattice in the third step is F: C = 1: (0.2 to 1.5).

Referring to FIG. 5, a first step of the manufacturing process according to the present invention is to form a first lattice base layer 122 by applying UV resin, for example, a polymer material, on a substrate 100. The imprint mold 120 having the grooves 126 and the protrusions 128 is aligned on the substrate 100 to which the first lattice base layer 122 is applied. Here, the grooves 126 and the protrusions 128 of the imprint mold 120 are repeatedly formed at a predetermined distance from each other. In addition, the grooves 126 of the imprint mold 120 correspond to the positions where the first grating 110 is to be formed.

At this time, the height and width of the groove 126 of the imprint mold 120 correspond to the width F of the first lattice and the height E of the first lattice. It is preferable that F: E = 1: (0.2 to 5), which is the ratio of the height (E) of the first lattice and the width (F) of the first lattice.

That is, in the case of manufacturing the imprint mold, the resultant structure of the first grating is such that the ratio of the width (F) of the first grating to the interval (G) of the first grating is F: G = 1: 0.2 Or 1.5 or the ratio of the width F of the first lattice to the height E of the first lattice satisfies F: E = 1: (0.2 to 5) .

The grooves 126 of the imprint mold 120 are formed in a stripe shape. The imprint mold 120 presses the polymer material 122 to contact the polymer material 122 with the groove 126 of the imprint mold 120 and then irradiates UV light. Accordingly, a plurality of first gratings 110 are formed on portions of the polymer material 122 corresponding to the grooves 126 of the imprint mold 120.

6, a second lattice base layer 124, which is a metal layer, is deposited on the substrate 100 having a plurality of first lattices 110 formed thereon. Then, as shown in FIG. 7, The layer 124 is etched to form a second grating 112 on the first grating 110.

Specifically, the second grating base layer 124, which is a metal layer deposited on the substrate 100 on which the plurality of first gratings 110 are formed, is subjected to the wet etching process to form the second grating 112.

The ratio of the width (C) of the second lattice to the interval (B) of the second lattice as a result of the wet etching process described above satisfies C: B = 1: (0.2 to 1.5) The ratio of the width C of the grating to the height D of the second grating satisfies C: D = 1: (1 to 5), or the ratio of the pitch A of the second grating to the pitch It is preferable to perform the etching process so that the ratio of the height (D) satisfies at least one of A: D = 1: (1 to 5). As a result, a wire grid polarizer having a second grating 112 formed on the first grating 110 of the substrate 100 is formed.

As shown in FIGS. 5 to 7, the wire grid polarizer including the first and second gratings 110 and 112 can be formed only through the imprint process, the deposition process, and the wet etching process. By reducing the manufacturing process, it is possible to reduce the process cost and apply it to mass production.

8 is a cross-sectional view showing a case where the first grating 140 of the wire grid polarizer has a semicircular shape curve instead of a stripe shape, and Figs. 9 to 11 are cross-sectional views showing a method of manufacturing the wire grid polarizer shown in Fig. 8 And also has the same steps and the same structure as those of Fig. 2, Fig. 5 to Fig. 7, and will not be described here. In this case, when the cross-sectional shape of the first lattice is semicircular or semi-elliptical, and the outer surface has a curvature, the width F of the first lattice and the interval G between the first lattice are set to be Defining a gap (G) between the width (F) of the first lattice and the first lattice on the basis of a portion where a horizontal line at a half of the height (E) and a curved surface of the first lattice meet, do.

12, the shape of the first grating 110 may be a stripe shape, and the shape of the second grating may be circular or elliptical. This can be accomplished by forming a first grating 110, forming a second grating base layer, and then embodying a wire grid polarizer as in the structure of FIG. 12, when adjusting the wet etch process.

FIG. 13 illustrates another embodiment of the present invention. In the preferred embodiment of the present invention, the ratio of the width F of the first lattice to the width C of the second lattice is F: C = 1: (0.2 to 1.5), the width of the second lattice may be wider than the width of the first lattice. That is, the width C of the second lattice is 1 to 1.5 times the width F of the first lattice. Of course, in the structure shown in the figure, the second lattice may have a curved surface having an ellipse, or a stripe shape or a rectangular shape.

14 is a cross-sectional view illustrating a liquid crystal display device including a wire grid polarizer according to the present invention.

14, a liquid crystal display according to an exemplary embodiment of the present invention includes a liquid crystal display panel 200, a backlight unit 230 for supplying light to the liquid crystal display panel 200, And a wire grid polarizer patterned on either one of an upper / lower or an optical sheet included in the backlight unit. The backlight unit 230 includes a light source 232, a diffusion sheet 236 for diffusing light from the light source 232, and a reflection sheet 234 disposed under the light source 232.

The light source 232 may be formed of any one of a cold cathode fluorescent lamp (CCFL), an external electrode fluorescent lamp (EEFL), and a light emitting diode (LED). The light source 232 generates light and emits the light toward the diffusion sheet 236.

The reflective sheet 234 is formed of a material having a high reflection efficiency and reflects light traveling in a direction opposite to the liquid crystal display panel 200 toward the diffusion sheet 236 to reduce light loss.

The diffusion sheet 236 directs the light incident from the light source 232 to the front of the liquid crystal display panel 200 and diffuses light so as to have a uniform distribution over a wide range to be irradiated on the liquid crystal display panel 200 do. As the diffusion sheet 236, it is preferable to use a film composed of a transparent resin on both sides of which a predetermined light diffusion member is coated.

The liquid crystal display panel 200 includes a color filter substrate 212 and a thin film transistor substrate 210 bonded to the color filter substrate 212 to face the color filter substrate 212 with a liquid crystal layer 202 therebetween, And a thin film transistor substrate 210.

In the color filter substrate 212, a color filter array (not shown) including a black matrix for preventing light leakage, a color filter for implementing color, a common electrode having a vertical electric field with the pixel electrode, and an upper alignment layer Is formed on the upper substrate. The thin film transistor substrate 210 includes gate lines and data lines formed to intersect with each other, thin film transistors formed at intersections thereof, pixel electrodes connected to the thin film transistors, and a lower alignment film coated thereon for liquid crystal alignment A thin film transistor array is formed on the lower substrate.

The wire grid polarizer according to the present invention may be formed on the lower portion of the liquid crystal display panel 120 as shown in FIG. 14 and may be formed on the upper surface of the liquid crystal display panel 200 or the optical sheet included in the backlight unit 230 Can be formed on either side. In addition, the wire grid polarizer according to the present invention may be attached to the surface of the liquid crystal module as shown in the drawing, or may be disposed at regular intervals, and further, the second grating may be directed upwardly or downwardly.

The wire grid polarizer according to the present invention includes a first grating 110 arranged at a predetermined interval on a lower surface of a liquid crystal display panel 200 and a second grating 112 formed on the first grating 110 ).

The wire grid polarizer according to the present invention is applicable not only to the above-described liquid crystal display device but also to a display device capable of realizing a three-dimensional stereoscopic image, and has general versatility to realize high brightness and reliability.

In the foregoing detailed description of the present invention, specific examples have been described. However, various modifications are possible within the scope of the present invention. The technical idea of the present invention should not be limited to the embodiments of the present invention but should be determined by the equivalents of the claims and the claims.

100: substrate
110,140: First grid
112, 142: second lattice
120: mold for imprint
122: first lattice base layer
124: second lattice base layer
200: liquid crystal display panel
230: Backlight unit
A: pitch of the second lattice
B: Spacing of the second grid
C: width of the second lattice
D: Height of the second grid
E: height of the first grid
F: width of the first lattice
G: spacing of the first lattice
H: pitch of the first lattice

Claims (17)

A first grating layer having at least one first grating having a constant pitch and height on a substrate;
And a second grating layer having at least one second grating having a predetermined pitch and height in contact with the first grating,
The ratio of the width of the first lattice to the width of the second lattice is 1: (0.2 to 1.5)
And a length of a portion of the second grating contacting the first grating is shorter than a width of the second grating.
The method according to claim 1,
Wherein the first grating and the first grating layer are formed of a polymer material, and the second grating is formed of a metal material.
The method of claim 2,
Wherein a ratio of a width of the second lattice to an interval of the second lattice satisfies 1: (0.2 to 1.5).
The method of claim 2,
And the ratio of the width of the second lattice to the height of the second lattice satisfies 1: (1 to 5).
The method of claim 2,
Wherein the ratio of the pitch of the second grating to the height of the second grating satisfies 1: (1 to 5).
6. The method according to any one of claims 1 to 5,
Wherein a ratio of a width of the first lattice to an interval of the first lattice satisfies 1: (0.2 to 1.5).
The method of claim 6,
Wherein a ratio of a width of the first lattice to a height of the first lattice satisfies 1: (0.2 to 5).
The method according to claim 1,
And the pitch of the second grating or the pitch of the first grating is 50 nm to 1 占 퐉.
The method of claim 8,
Wherein the first grid and the second grid are formed in a circular, elliptical, or polygonal shape in cross section.
A first step of forming a plurality of first gratings having a constant pitch by processing a first grating base layer laminated on a substrate;
A second step of forming a second lattice base layer on the first lattice to contact the first lattice;
Wherein a ratio of a width of the first lattice to a width of the second lattice is 1: (0.2 to 1.5), and the second lattice is in contact with the first lattice And forming a second portion of the wire grid polarizer having a length shorter than the width of the second grid.
The method of claim 10,
In the first step,
Forming a plurality of first gratings in a region corresponding to the plurality of grooves by pressing an imprint mold having a plurality of grooves on the first grating base layer made of a polymer material, Way.
The method of claim 11,
The second step comprises:
And forming a metal material layer through a deposition process. ≪ RTI ID = 0.0 > 11. < / RTI >
The method according to any one of claims 10 to 12,
In the first step,
Wherein a ratio of a width of the first lattice to an interval of the first lattice satisfies 1: (0.2 to 1.5)
Wherein a ratio of a width of the first lattice to a height of the first lattice is formed so as to satisfy 1: (0.2 to 5).
14. The method of claim 13,
The third step is performed by a wet etching process,
Wherein a ratio of a width of the second lattice to an interval of the second lattice satisfies 1: (0.2 to 1.5)
The ratio of the width of the second lattice to the height of the second lattice satisfies 1: (1 to 5)
Or a ratio of a pitch of the second grating to a height of the second grating satisfies 1: (1 to 5).
A liquid crystal display panel;
A backlight unit for supplying light to the liquid crystal display panel;
Characterized by comprising a wire grid polarizer according to any one of claims 1 to 5 on any one of an upper surface or a lower surface of the liquid crystal display panel or a plurality of optical sheets for enhancing the efficiency of light contained in the backlight unit Display device.
16. The method of claim 15,
Wherein the wire grid polarizer comprises:
Wherein a ratio of a width of the first lattice to an interval of the first lattice satisfies 1: (0.2 to 1.5)
Wherein a ratio of a width of the first lattice to a height of the first lattice is formed so as to satisfy 1: (0.2 to 5).
A three-dimensional stereoscopic image display device comprising the wire grid polarizer of any one of claims 1 to 5.

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