KR101682521B1 - Apparatus for observing specimen, Cover assembly And Method for observing specimen - Google Patents

Abstract

The present invention relates to a column part having a vacuum space formed therein and having an opening at one side and electron beam generating means capable of generating an electron beam, a supporting part positioned opposite to the opening part of the column part and supporting the sample at atmospheric pressure, A cover portion coupled to the opening portion and including a transmission window through which the electron beam can pass and a collection body for collecting electrons generated from the sample, and a detection portion connected to the cover portion and detecting a current generated by the collected electrons A sample observing apparatus capable of collecting secondary electrons emitted from a sample at atmospheric pressure in observing a sample under atmospheric pressure and increasing the resolving power of the observed sample image is presented.

Description

Technical Field [0001] The present invention relates to a specimen observation apparatus, a cover assembly, and a specimen observing method.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sample observing apparatus, and more particularly, to a sample observing apparatus, a cover assembly, and a sample observing method which can increase the resolution of a sample image observed when observing a sample under atmospheric pressure .

Scanning Electron Microscope is a device used for image formation and composition analysis of a sample and is applied to a process of inspecting a sample or a wafer in a manufacturing field of various display devices, a solar cell, a semiconductor chip, or the like have.

However, there is a problem that an image of a desired quality can not be generated when a sample or a substrate in an atmospheric pressure is inspected by a scanning electron microscope. This means that back scattered electrons and secondary electrons emitted from the sample or the substrate are interfered with and partially lost in the atmosphere until reaching the scanning electron microscope to obtain sufficient electrons in the scanning electron microscope It is difficult. Accordingly, there is a demand for an apparatus of a new structure and system that can be applied to various displays, solar cells, semiconductor chips, and the like to produce high-quality samples or substrate images.

KR 10-2014-0027687 A KR 10-1321049 B1

The present invention provides a sample observation device, a cover assembly, and a sample observation method capable of enhancing resolution of a sample image observed in observing a sample at atmospheric pressure.

The present invention provides a sample observing apparatus, a cover assembly, and a sample observing method capable of smoothly collecting secondary electrons and reflected electrons emitted from a sample in observing a sample under atmospheric pressure.

A sample observation apparatus according to an embodiment of the present invention is an apparatus for observing a sample in the atmosphere. The apparatus includes an electron beam generating means capable of generating an electron beam and having an internal vacuum space formed therein, ; A support positioned opposite the opening of the column and supporting the sample at atmospheric pressure; A cover part coupled to an opening of the column part and having a transmission window through which an electron beam can pass and a collecting body collecting electrons generated from the sample; And a signal processing unit connected to the cover unit and detecting a current generated by the collected electrons and connected to the detection unit and processing the detected current, And a bias power supply connected to the supporter for applying a bias power.

Wherein the cover portion includes: a main body having a plurality of layers in which a through hole is formed in a central region; A collecting body coupled to the through-hole; And a gas injection port for injecting a gas, wherein at least one of the plurality of layers of the main body includes an insulator layer .

The main body includes a lower layer, an intermediate layer and an upper layer laminated in a vertical direction, and the intermediate layer may include an insulator, and the main body may be coupled to the column via an insulating sealing ring.

The collecting body has conductivity and can be directly bonded to the main body. The collecting body includes a silicon single crystal material. After the electron beam is incident on the sample under atmospheric pressure, secondary electrons emitted from the sample can be collected have.

The detection portion may include a contact needle which is in contact with at least a part of the main body and the collecting body and a transfer line which is connected with the contact needle and which carries current and the contact needle is located inside the column, The transfer line may be provided through the column portion.

A cover assembly according to an embodiment of the present invention is a cover assembly coupled to an apparatus for observing a sample using an electron beam, the cover assembly comprising: a main body having a through hole in a central region and having an insulator; A collecting body coupled to the through-hole and collecting electrons generated from the sample; And a transmission window formed in a central region of the collecting body, through which the electron beam can pass. The main body includes a lower layer, an intermediate layer, and an upper layer laminated in a vertical direction, and the intermediate layer includes an insulator, and the lower layer and the upper layer may include a conductor. The lower layer and the upper layer include a stainless steel material, and the intermediate layer may include at least one of rubber and plastic. A gas path may be formed between the plurality of layers of the main body and a gas injection port connected to the gas path may be provided at an end of the main body facing the collecting body.

A sample observation method according to an embodiment of the present invention is a method of observing a sample placed in the atmosphere, comprising the steps of: preparing a sample in the atmosphere, the sample being separated from a column portion having a vacuum formed therein; Emitting a beam of electrons toward the sample; Collecting electrons emitted from the sample in an atmospheric pressure atmosphere after the electron beam incident on the sample collides with the sample; Detecting a current caused by the obtained electrons; And processing the detected current to form an image.

The process of collecting electrons in the atmospheric pressure atmosphere may include a step of acquiring secondary electrons generated from the sample through the exposed portion of the column portion in the atmosphere, And collecting back scattered electrons emitted from the sample inside the column after collision with the sample.

The process of forming the image may include a process of converting a signal from the collected secondary electrons and a signal from the collected reflection electrons into an image.

And a step of forming an inert gas atmosphere in a space between the column and the sample before collecting electrons in the atmospheric pressure atmosphere, and applying a bias power to the sample provided in the atmosphere can do.

According to the embodiment of the present invention, secondary electrons and reflected electrons emitted from a sample can be collected smoothly in observing a sample under atmospheric pressure, and secondary electrons can be easily collected with high efficiency, The resolution can be increased.

For example, when the present invention is applied to a process for inspecting a sample or a substrate in the field of manufacturing various display devices, solar cells, or semiconductor chips, the energy level of the electrons emitted from the sample using the collecting body of the sample observing device is low, It is possible to easily collect secondary electrons, which have not been possible, at high efficiency in an atmospheric pressure atmosphere. Therefore, it is possible to utilize the secondary electrons as well as the reflection electrons in the image generation of the sample, thereby producing a high-quality sample image.

1 to 4 are views for explaining a sample observation apparatus and a cover assembly according to an embodiment of the present invention.
5 is a view illustrating a process of forming a transmission window on a cover according to an embodiment of the present invention.
6 is a view for explaining a sample observation method according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below, but may be embodied in various forms. It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. BRIEF DESCRIPTION OF THE DRAWINGS The drawings may be exaggerated or enlarged to illustrate embodiments of the invention, wherein like reference numerals refer to like elements throughout.

FIG. 1 is a schematic view for explaining a sample observing apparatus according to an embodiment of the present invention, and FIG. 2 is a partially enlarged view of a sample observing apparatus for explaining a cover assembly according to an embodiment of the present invention. 3 and 4 are partial schematic views of a sample observation apparatus for explaining a cover assembly according to an embodiment of the present invention. FIG. 5 is a view illustrating a process of forming a transmission window on a cover according to an embodiment of the present invention Fig.

The sample observation apparatus according to the embodiment of the present invention, the cover assembly mounted thereon, and the sample observation method applied thereto provide a technical feature capable of increasing the resolution of a sample image observed in observing the sample at atmospheric pressure .

First, a sample observation apparatus according to an embodiment of the present invention will be described with reference to Figs. 1 and 2. Fig. A sample observation apparatus according to an embodiment of the present invention is an apparatus for observing and analyzing various samples 10 in the atmosphere and includes a column section 100, a support section 200, a cover section 300, and a detection section 400 .

The sample 10 may be a wafer or a glass panel used for manufacturing various electronic devices in various display devices including LCDs, OLEDs, and LEDs, and a process of manufacturing solar cells or semiconductor chips.

Of course, the sample 10 is not limited to the one described above, and includes various organic or inorganic substances or mixtures thereof prepared in a solid state or in a liquid state or in a mixed state of a solid state and a liquid state at a standard atmospheric pressure, It can be a wide range of samples.

The column portion 100 may have a vacuum space formed therein, an opening 110 formed at one side thereof, and an electron beam generating means 120 capable of generating an electron beam therein. The column portion 100 may extend in one direction and may be disposed in a direction crossing the support portion 200 from above the support portion 200. The column portion 100 may be a container of various shapes that can accommodate the electron beam generating means 120, for example, and may be formed of stainless steel (SUS). The inside of the column section 100 can be controlled to a vacuum of a predetermined size, for example, about 1.5E-6 torr to 1.5E-7 torr for generating and accelerating the electron beam.

An opening 110 may be formed in the lower end of the column section 100. For example, the opening may be formed in the shape of a hollow cylinder, and a predetermined thread may be formed on the outer circumferential surface thereof, so that the cover part 300 can be easily attached to and detached from the column part 100 by using the screw.

The electrons emitted from the sample 10 flow to the column portion 100 side and are not lost and the collector body 320 of the cover portion 300 can be electrically grounded. ). ≪ / RTI >

The electron beam generating means 120 may be formed to generate and accelerate a predetermined electron beam within the column portion 100 controlled in a vacuum atmosphere. The electron beam generating means 120 includes electron emitting means 121 disposed on the upper side of the column portion 100 to emit electrons from the upper side of the column portion 100 toward the opening portion 110 side of the column portion 100, . ≪ / RTI > The electron beam generating means 120 includes a plurality of electron beam generating means 120 arranged inside the column portion 100 to converge and accelerate electrons emitted from the electron emitting means 121 toward the opening 110 of the column portion 100, Lens.

The electron emitting means 121 may include an electron gun capable of emitting electrons with an acceleration voltage and a probe current of a desired size by using any one of an electric field emission system and a heat radiation system. In the present embodiment, the electron gun of the field emission type Schottky type is exemplified as the electron emitting means 121. The electron gun emits electrons from the tip of the electron gun by applying a predetermined high voltage from the first anode of the electron gun, It is possible to accelerate and discharge the electron beam by applying a predetermined acceleration voltage from the anode.

The plurality of lenses may include a condenser lens 122 for focusing the electron beam and an objective lens 123 for adjusting the focus of the electron beam. Here, the focusing lens 122 and the objective lens 123 collect the electron bundle emitted from the electron emitting means 121 by using an electromagnetic force. The plurality of lenses can be arranged in the order of the focusing lens 122 and the objective lens 123 with reference to the direction from the electron emitting means 121 side toward the open aperture 110 side of the column portion 100, An aperture (not shown) for passing an electron beam, an aberration correcting electromagnet (not shown) for controlling an aberration of the electron beam, and a scanning coil (not shown) for correcting the deflection of the electron beam . On the other hand, a predetermined controller (not shown) may be connected to the electron beam generating means 120 so that the generation and acceleration of the electron beam by the electron beam generating means 120 can be controlled.

The supporting part 200 may be positioned opposite to the opening of the column part 100 and may be formed in various shapes and structures having a supporting surface of a predetermined shape and size capable of supporting the sample 10. For example, the supporting part 200 may be a stage of various configurations and systems capable of supporting the sample 10 at atmospheric pressure, and is not particularly limited in the present invention.

Meanwhile, a bias power supply 210 may be connected to the supporter 200. The bias power supply 210 applies a bias power to the sample 10 with a negative voltage to increase the repulsive force between the sample 10 and the secondary electrons emitted from the sample 10, It gives the force that can be directed to the direction. Accordingly, the collecting body 320 can collect the secondary electrons more smoothly. For example, when a bias power source is applied to the sample 10 in observing the image of the sample 10, the resolving power of the image is increased by, for example, 5 to 10 times as compared with the case where no bias power is applied to the sample 10 The effect can be obtained.

Next, referring to Figs. 2 to 4, a cover part 300 according to an embodiment of the present invention will be described. The cover part 300 includes a main body 310, a collecting body 320 and a transmission window 330A and hermetically coupled to the opening of the column part 100 to maintain the internal vacuum of the column part 100 Or the like. The cover part 300 passes the electron beam to the outside of the column part 100 and passes the reflection electrons and X-rays generated from the sample 10 into the column part 100, It collects secondary electrons and generates current.

The main body 310 may be, for example, a disc-shaped member serving as a body of the cover part 300, and may have a plurality of layers. At least one of the plurality of layers may include an insulator layer have. For example, the main body 310 may include a lower layer 313, an intermediate layer 312, and an upper layer 311 laminated to each other in the vertical direction, wherein the intermediate layer 312 may include an insulator.

The upper layer 311 and the lower layer 313 of the main body 310 may be electrically conductive members made of an electrically conductive material such as stainless steel and the intermediate layer 312 may be rubber or plastic ), Or the like. The upper layer 311 and the lower layer 313 can be electrically insulated by the intermediate layer 312. At this time, the intermediate layer 312 may be provided as a single unitary member or may be radially disposed with a plurality of separate members.

As the upper layer 311 is insulated from the lower layer 313 by the intermediate layer 312, the secondary electrons collected in the collecting body 320 can be transferred without loss to the upper layer 311, And can be detected by the detecting unit 400. [

The main body 310 may have a central region and a vicinity thereof bent to protrude downward, and a through hole 314 may be formed through the central region protruding downwardly in a vertical direction. With this structure, the penetrating end near the central region of each of the upper layer 311 and the lower layer 313 may have a structure that is inclined downward toward the center of the central region. At this time, the penetrating end of the upper layer 311 may be surrounded by the penetrating end of the lower layer 313 and may be located inside thereof, and may be exposed from the inner side surrounded by the penetrating end of the lower layer 313 to the lower side of the lower layer 313.

The collecting body 320 is coupled to the through hole 314 of the main body 310 in such a manner that the collecting body 320 is directly bonded or bonded to the penetrating end of the upper layer 311 of the main body 310 so that the through hole 314 can be sealed And may be electrically connected to the upper layer 311. The collecting body 320 may be a conductive plate member having various shapes such as a disc shape or a rectangular plate shape and may be a silicon wafer or a silicon carbide (SiC) wafer or a graphite (C) wafer And the like. Accordingly, the collecting body 320 can smoothly collect electrons, e.g., secondary electrons, emitted from the sample 10 by the electron beam incident on the sample 10 under atmospheric pressure.

The transmissive window 330A may comprise a thin membrane, such as a silicon nitride (SiN) film having a thickness of less than 100 nm, and more specifically between 3 and 100 nm, And passes through the BSE, the X-ray, and the electron beam, and passes or collects the secondary electrons SE.

Since the BSE and X-rays are higher in energy than the secondary electrons SE, they can reach the second detection unit 600 and the third detection unit 700 through the transmission window 330A. However, (SE) has a problem that the energy is small and does not reach the second detection unit 600. [ According to the embodiment of the present invention, since the secondary electrons that have not passed through the transmission window 330A can be collected through the collecting body 320, the sample can be observed at a higher resolution.

5, a process of forming the transmission window 330A according to the embodiment of the present invention in the central region of the collection body 320 will be described.

A transparent thin film 330, for example, a silicon nitride film is formed on one surface of the collecting body 320. The via hole is etched in the central region of the collecting body 320 in the direction toward the one side of the collecting body 320 from the other side of the collecting body 320 where the transmissive thin film 330 is not formed. A transmission window 330A may be formed in the central region of the collection body 320 by a via hole.

5 is only one example for forming a transmissive thin film 330 for vacuum maintenance or the like inside the column part 100 on one surface of the collecting body 320. However, the present invention is not limited thereto. That is, any method for forming the transmissive thin film 330 may be applied in addition to the above-described process.

Next, with reference to Figs. 2 to 4, the remaining components of the cover portion 300 will be described. The main body 310 of the cover part 300 may be detachably coupled to the opening of the column part 100. To this end, the cover part 300 may include a coupling part 340 such as a socket or a connector a connector may be provided. The main body 310 of the cover part 300 may be hermetically coupled to the opening of the column part 100. For this purpose, an insulating seal is provided between the main body 310 and the opening of the column part 100. [ A ring 350 may be provided. That is, the main body 310 may be coupled to the column 100 through the coupling member 340 and the insulating sealing ring 350.

The coupling member 340 may be formed in a hollow cylindrical shape or an annular ring shape whose interior is opened in the up and down direction. The inner circumferential surface size and shape of the coupling member 340 may be a size and a shape corresponding to the size and shape of the main body 310 so that the main body 310 can be fitted to the inner circumferential surface of the coupling member 340 . The width of the inner peripheral surface of the coupling member 340 in the vertical direction may be larger than the thickness of the main body 310 in the vertical direction. A protruding end portion is formed to extend in the circumferential direction of the inner circumferential surface of the inner circumferential surface of the coupling member 340 and a lower layer 313 of the main body 310 is contacted or closely supported on the protruding end portion of the coupling member 340 . A thread is formed on the inner circumferential surface of the coupling member 340 so as to extend in the circumferential direction of the inner peripheral surface and the thread of the coupling member 340 can be screwed into the opening thread of the column portion 100. The coupling member 340 may be made of stainless steel (SUS) or plastic.

The insulating sealing ring 350 may be, for example, an O ring and serves to airtightly couple the upper layer 311 of the main body 310 and the opening of the column 100 between them. Accordingly, the inside of the column part 100 can be kept vacuum, and the column part 100 and the upper layer 311 of the main body 310 can be electrically insulated from each other. Accordingly, the secondary electrons collected in the collecting body 320 can be transmitted to the detecting unit 400 through the upper layer 311 of the main body 310 without loss.

The cover part 300 may include a gas injection port 360A for injecting gas downwardly and a gas path 360 connected to the gas injection port 360A for supplying gas. Although not shown in the drawings, the gas path 360 may be connected to a gas supply source provided separately to the outside of the cover unit 300 to receive gas. The gas path 360 may extend from the plurality of layers of the main body 310 toward the gas injection port 360A and may extend from the upper layer 311 to the lower layer 313 of the main body 310, 312, respectively. At this time, the gas path 360 may be separated from the upper layer 311 and the lower layer 313 for electrical insulation or may be covered with an insulating film.

Of course, the gas path 360 can be formed in various structures. The gas path 360 may be a spacing space formed between the upper layer 311, the lower layer 313 and the intermediate layer 312 when the intermediate layer 312 is provided with a plurality of detachable members and arranged radially.

The gas injection hole 360A may be provided at the end portion of the main body 310 which is directed toward the collecting body 320 side. The gas injection port 360A may be an end portion of the gas path 360 extending downwardly in a direction toward the lower center position of the collecting body 320 between the penetrating end of the upper layer 311 and the penetrating end of the lower layer 313. [ have.

A plurality of gas injection ports 360A may be formed, and the arrangement thereof may be such that the arrangement thereof is arranged radially with respect to the collecting body 320. At this time, an inert gas such as a helium (He) gas, a neon (Ne) gas, an argon (Ar) gas or a mixed gas containing at least two of these gases is injected at 360 deg. 320 may be locally formed under the inert gas atmosphere.

On the other hand, when the gas pathway 360 is formed as a spacing space formed between the upper layer 311, the lower layer 313 and the intermediate layer 312, the gas injection port 360A is formed at the penetrating end of the upper layer 311 and the lower layer 313 Or the like.

Next, with reference to FIG. 3, a process in which the secondary electrons emitted from the sample are transmitted to the detection unit will be described. Here, for convenience of explanation, a description will be made with reference to a state in which a contact needle of a detecting portion is directly in contact with a collecting body of a silicon (Si) single crystal material. Of course, the contact needles of the detector can be contacted at various locations that satisfy the requirement to be able to receive the secondary transfer collected in the collecting body, so that the upper layer 311 of the main body 310, Or may be in contact with the collecting body as shown in Fig.

When the electron beam is incident on the specimen, the specimen emits reflected electrons (BSE), X-rays and secondary electrons. The reflection electrons and X-rays pass through the transmission window made of silicon nitride (SiN) and enter the inside of the column. The secondary electrons are partially absorbed by the transmission window of the silicon nitride (SiN) material, collected in the collecting body of the silicon (Si) single crystal material, and the rest are passed through the transmission window of the silicon nitride (SiN) ) Is collected directly on the collecting body of single crystal material. The secondary electrons collected in the collecting body cause a predetermined current to be detected by the detecting unit. At this time, an inert gas atmosphere may locally be formed in the space (D) having a width of, for example, 200 mu m or less formed between the transmission window and the sample, so that the secondary electrons can be smoothly collected into the collection body.

Next, a detection unit 400 according to an embodiment of the present invention will be described with reference to FIG. The detection unit 400 may be connected to the cover unit 300 and may be configured to detect a current generated by electrons collected by the cover unit 300. The detection unit 400 may include a contact needle 410 that contacts the main body 310 and at least a portion of the area of the collection body 320 and a transfer line 420 that is connected to the contact needle 410 and that carries current. have. The contact needle 410 may be connected to the upper layer 311 of the main body 310 of the cover part 300 in the inside of the column part 100. [ The transfer line 420 may be partially penetrated through the column portion 100 and one end thereof may be connected to the contact needle 410. The delivery line 420 may include an insulative coating.

Of course, the detecting unit 400 may be variously modified in various structures and systems that are electrically connected to the collecting body 320, and the detecting unit 400 is not particularly limited in the embodiment of the present invention. For example, the detection unit 400 may be electrically connected to the collection body 320 of the cover unit 300 from the outside of the column unit 100.

The apparatus for observing a sample according to an embodiment of the present invention may further include a signal processing unit 500 connected to the detection unit 400 and processing the detected current. The signal processing unit 500 may be formed to process the detected current through the detecting unit 400 and form an image. For example, an observation target region of the sample 10 positioned below the transmission window 330A is divided into a plurality of pixels, and one of the plurality of pixels is scanned with an electron beam. When electrons are emitted from the sample 10 by the electron beam and are collected in the collecting body 320, the detector 400 detects the current caused by the collected electrons. The current detected by the detection unit 400 is amplified and processed by the signal processing unit 500 and selectively output to the corresponding image signal, for example, the brightness value of the corresponding pixel. The above process can be repeated to form an image signal of each of a plurality of pixels, from which the image of the observation target region of the sample 10 can be formed.

The apparatus for observing a sample according to an embodiment of the present invention includes a second detector 600 for collecting reflected electrons scattered into the column 100 and delivering the reflected electrons to the signal processor 500 and a second detector 600 for scattering X- And a third detecting unit 700 for collecting and analyzing the components of the sample 10 from the collected data.

The second detecting unit 600 may be a semiconductor detector provided in a predetermined plate shape and may be vertically aligned with the collecting body 320 of the cover unit 300 in the column unit 100, As shown in FIG. At this time, the central region of the second detector 600 may be vertically penetrated to form an electron beam passage, and the electron beam may be incident on the transmission window 330A of the cover unit 300. [ In the second detection unit 600, reflected electrons that are transmitted through the transmission window 330A and are incident into the column unit 100 are obtained, and the current caused by the obtained reflection electrons is transmitted to the signal processing unit 500, .

The third detector 700 includes an energy dispersive X-ray spectroscopy detector (EDS detector), and a part of the third detector 700 passes through the column 100 and has an end inside the column 100 And may be disposed to face the transmission window 330A of the cover part 300. [ The energy dispersive spectroscopic detector is configured to detect the surface component of the sample 10 in such a manner that the X-ray energy obtained from the sample 10 is scanned by electron beam scanning in the form of energy using a pin semiconductor element of silicon single crystal . For this, the third detector 700 may be connected to a data processor (not shown), and the data processor may output the X-ray energy intensity data output from the third detector 700 and the detection frequency data for each energy intensity, It is possible to quantitatively and qualitatively analyze the components of the sample 10 in preparation for emission X-ray intrinsic energy magnitude data of each component, and to output it as visual information.

The cover unit 300 of the above-described sample observation apparatus is applicable as a cover assembly mounted on various apparatuses for observing various samples using an electron beam. This will be described below.

The cover assembly according to an embodiment of the present invention may include a main body 310, a collecting body 320, and a transmission window 330A, which are coupled to various devices for observing a sample using an electron beam.

The main body 310 may have a through hole 314 in a central region thereof and may include a lower layer 313, an intermediate layer 312 and an upper layer 311 which are vertically stacked. At this time, the middle layer 312 of the main body 310 includes an insulator, and the lower layer 313 and the upper layer 311 may include conductors. For example, each of the lower layer 313 and the upper layer 311 may include a stainless steel material, and the intermediate layer 312 may include at least one of rubber and plastic. The main body 310 is provided with a gas path 360 between a plurality of layers and a gas injection hole 360A connected to the gas path 360 is formed at the penetrating end of the main body 310 facing the collecting body 320 . At this time, the gas injection hole 360A may be formed to be inclined downward in the direction toward the lower center position of the collecting body 320 so that the gas can be inclined downwardly.

The collecting body 320 may be formed to collect electrons generated from the sample 10 while being coupled to the through hole 314 of the main body 310. The transmitting window 330A may be formed to collect electrons generated from the sample 10, And through which the electron beam can be scanned into the sample.

The construction and the method of the cover assembly described above can be applied to the structure and the method of the cover part 300 of the sample observing apparatus according to the embodiment of the present invention, and thus a detailed description thereof will be omitted.

6 is a flowchart showing a sample observation method according to an embodiment of the present invention. 1 to 3 and 6, a sample observation method according to an embodiment of the present invention is a method of observing a sample placed in the air, and includes a step of preparing a sample in the air, A process of emitting an electron beam toward the sample, a process of collecting electrons emitted from the sample after the electron beam incident on the sample collides with the sample in an atmospheric pressure atmosphere, a process of detecting a current caused by the obtained electron, And processing the current to form an image.

First, a sample is prepared in the air (S100). The sample is loaded on the support part 200 of the sample observation apparatus according to the embodiment of the present invention by using a predetermined transfer robot (not shown). For this purpose, the support part 200 may be a plate type corresponding to the size and shape of the sample, and the support part 200 may further include a separate lift pin (not shown).

The sample 10 may be a wafer or a glass panel used for manufacturing various electronic devices in various display devices including LCDs, OLEDs, and LEDs, and a process of manufacturing solar cells or semiconductor chips. Of course, the sample 10 is not limited to the above-described ones, and may be a wide variety of materials including various organic materials or inorganic materials prepared in a solid state or a liquid state or a mixed state of solid and liquid phases at a standard atmospheric pressure, It can be a meaningful sample.

When the sample 10 is provided on the upper surface of the supporter 200, the column portion 100 having the vacuum formed therein is positioned to face the sample 10 from above the sample 10. Subsequently, at least one of the column portion 100 and the support portion 200 is lifted up and down, and the space D between the transmission window 330A of the sample observation device and the sample 10 is, for example, Can be precisely controlled.

Next, an electron beam is emitted toward the sample 10 (S200). Electron beam generating means 120 provided in the column section 100 and each lens are used to emit and accelerate electrons to a predetermined acceleration voltage and a probe current. The accelerated electron beam passes through the cover part 300 mounted on the opening of the column part 100 and is controlled to have a probe size of several nm to several hundreds nm, and a focus can be formed at a desired position on the sample 10. At this time, the focus of the electron beam is precisely adjusted to a height in the range of several micrometers to several hundreds of micrometers at a predetermined position spaced apart from the lower side of the transmission window 330A of the cover part 300, and the electron beam is emitted to a desired position of the sample 10 You can collide.

Next, electrons emitted from the sample are collected in an atmospheric pressure atmosphere (S300). Here, the electrons emitted from the sample means electrons emitted from the sample after the electron beam incident on the sample collides with the sample. At this time, electrons emitted from the sample by the electron beam incident on the sample are scattered by a relatively high energy level and are scattered backward in a predetermined direction, for example, in a direction from the sample 10 toward the column 100 electron). The electron emitted from the sample by the electron beam incident on the sample has a secondary electron scattered near the sample 10 due to the relatively low energy level.

The above process of collecting electrons in the atmospheric pressure atmosphere is a process of acquiring secondary electrons generated from the sample through the exposed portion of the column 100 in the atmosphere by the transmission window 330A of the cover unit 300 . At this time, the secondary electrons are collected in the collecting body 320 of the cover part 300, and the collected secondary electrons are collected in the upper layer 311 of the cover part 300 in direct contact with and coupled to the collecting body 320 And may be electrically transmitted to the detection unit 400 and the signal processing unit 500 via the antenna.

Meanwhile, in the sample observation method according to the embodiment of the present invention, the process of collecting electrons in atmospheric pressure and the step of collecting the reflected electrons emitted from the sample in the second detection unit 600 in the column unit 100 . The reflection electrons may be collected by the second detection unit 600 in the column unit 100 through the transmission window 330A of the cover unit 300 and the second detection unit 600 may collect the reflected electrons, (Not shown).

Next, a current caused by the secondary electrons and the reflected electrons obtained as described above is detected (S400). The current caused by the secondary electrons collected in the collecting body 320 can be detected by the detecting unit 400 via the upper layer 311 of the main body 310. [

Next, the detected current is processed to form an image (S500). This process can be performed in the signal processing unit 500. At this time, the signals from the collected secondary electrons and the signals from the collected reflected electrons can be added to the image, thereby improving the quality of the image. A known technique can be applied to the above-described process and method of forming an image from the detected current, so that a detailed description thereof will be omitted.

In an embodiment of the present invention, an inert gas atmosphere may be formed in a space between the column section 100 and the sample 10 before or simultaneously with the process of collecting electrons in the atmospheric pressure atmosphere. For example, helium gas, neon gas, argon gas, or a mixed gas of these gases may be injected at the gas injection port 360A of the cover portion 300 before or simultaneously with the electron beam emission. The space D having a width of, for example, 200 mu m between the transmission window 330A and the sample 10 can be formed in an inert atmosphere, so that the secondary electrons can be easily and efficiently collected. Thus, high-quality sample images can be generated by collecting secondary electrons with high efficiency.

In addition, the embodiment of the present invention may include a step of applying a bias power to the sample 10 provided in the atmosphere before or simultaneously with the process of collecting electrons in an atmospheric pressure atmosphere. A negative voltage on the order of several hundreds of volts (V) can be applied to the sample using, for example, a bias power supply 210 connected to the supporting part 200 before or simultaneously with electron beam emission. Accordingly, electrons emitted from the sample can be smoothly moved toward the collecting body 320 by the repulsive force with the sample, and the secondary electrons can be easily and efficiently collected from the collecting body 320. Thus, high-quality sample images can be generated by collecting secondary electrons with high efficiency.

The order of forming the inert gas atmosphere in the space between the column part 100 and the sample 10 and applying the bias power to the sample 10 provided in the atmosphere is not particularly limited. Either one may be performed first, or both processes may be performed at the same time.

It should be noted that the above-described embodiments of the present invention are for the purpose of illustrating the present invention and not for the purpose of limitation of the present invention. That is, the present invention may be embodied in various forms without departing from the scope of the appended claims and equivalents thereof, and it is to be understood and appreciated by one skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention It will be understood that various embodiments are possible.

10: sample 100: column part
200: Support part 300: Cover part
310: main body 312: middle layer
314: through-hole 320: collecting body
330A: Transmission window 350: Insulating sealing ring
400: detecting part 410: contact needle
420: transmission line 500: signal processing section
600: second detection unit 700: third detection unit

Claims (22)

As an apparatus for observing a sample in the atmosphere,
A column portion having a vacuum space formed therein and having an opening at one side thereof and electron beam generating means capable of generating an electron beam;
A support positioned opposite the opening of the column and supporting the sample at atmospheric pressure;
A cover part coupled to an opening of the column part and having a transmission window through which an electron beam can pass and a collecting body collecting electrons generated from the sample; And
And a detector connected to the cover and detecting a current generated by the collected electrons,
The cover portion
A main body having a through hole formed in a central region thereof and having a plurality of layers; A collecting body coupled to the through-hole; And a transmissive window formed in a central region of the collecting body,
Wherein the main body includes a lower layer, an intermediate layer, and an upper layer laminated in a vertical direction, and the intermediate layer includes an insulator. The method according to claim 1,
And a signal processing unit connected to the detection unit and processing the detected current. delete delete delete The method according to claim 1 or 2,
And the main body is coupled to the column via an insulating sealing ring. The method according to claim 1 or 2,
Wherein the detection portion includes a contact needle contacting at least a portion of the main body and the collecting body, and a transfer line connected to the contact needle and transmitting current. The method of claim 7,
Wherein the contact needle is located inside the column, and the transfer line is provided through the column. The method according to claim 1 or 2,
Wherein the collecting body has conductivity and is directly bonded to the main body. The method of claim 9,
Wherein the collecting body includes a silicon single crystal material and collects secondary electrons emitted from the sample after the electron beam is incident on the sample under atmospheric pressure. The method according to claim 1 or 2,
Wherein the cover portion includes a gas injection hole for injecting gas. The method according to claim 1 or 2,
And a bias power supply connected to the supporter to apply a bias power to the sample.
A cover assembly coupled to an apparatus for observing a sample using an electron beam,
A main body having a through hole formed in a central region thereof and having an insulator;
A collecting body coupled to the through-hole and collecting electrons generated from the sample; And
And a transmission window formed in a central region of the collecting body and through which the electron beam can pass,
The main body includes a lower layer, an intermediate layer and an upper layer laminated in a vertical direction, and the intermediate layer includes an insulator. 14. The method of claim 13,
Wherein the lower layer and the upper layer comprise conductors. 15. The method of claim 14,
Wherein the lower layer and the upper layer comprise a stainless steel material, and the intermediate layer comprises at least one of rubber and plastic. 14. The method of claim 13,
Wherein a gas path is formed between a plurality of layers of the main body and a gas injection port connected to the gas path is provided at an end of the main body toward the collection body.
As a method for observing a sample placed in the atmosphere,
A step of preparing a sample in the atmosphere by being separated from a column portion in which a vacuum is formed;
Passing an electron beam through a cover portion coupled to an opening of the column portion and emitting an electron beam toward the sample;
Collecting electrons emitted from the sample in the collecting body of the cover portion in an atmospheric pressure atmosphere after the electron beam incident on the sample collides with the sample;
Detecting a current caused by electrons obtained in the collecting body; And
And processing the detected current to form an image,
Wherein an upper layer and a lower layer of the main body coupled with the collecting body are electrically insulated by an intermediate layer of the main body and electrons collected in the collecting body are transferred to the upper layer and then detected by the detecting unit. 18. The method of claim 17,
Wherein the step of collecting electrons in the atmospheric pressure atmosphere includes the step of acquiring secondary electrons generated from the sample through the collecting body. The method according to claim 17 or 18,
And collecting back scattered electrons emitted from the sample inside the column after the electron beam incident on the sample collides with the sample. The method of claim 19,
Wherein the step of forming the image comprises the step of converting a signal from the collected secondary electron and a signal from the collected reflection electron to an image. The method according to claim 17 or 18,
And forming an inert gas atmosphere in a space between the column portion and the sample before collecting electrons in the atmospheric pressure atmosphere. The method according to claim 17 or 18,
And applying a bias power to the sample provided in the atmosphere before the step of collecting electrons in the atmospheric pressure atmosphere.

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