KR101674653B1 - Layer formation device and formation method thereof - Google Patents

Layer formation device and formation method thereof Download PDF

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KR101674653B1
KR101674653B1 KR1020150119650A KR20150119650A KR101674653B1 KR 101674653 B1 KR101674653 B1 KR 101674653B1 KR 1020150119650 A KR1020150119650 A KR 1020150119650A KR 20150119650 A KR20150119650 A KR 20150119650A KR 101674653 B1 KR101674653 B1 KR 101674653B1
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South Korea
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base material
film
pattern
container
groove
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KR1020150119650A
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Korean (ko)
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정승호
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주식회사 오피트
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C23C2/10—Lead or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators

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Abstract

The present invention provides an apparatus to form a film on a groove on a pattern of a basic material, and a forming method thereof. According to the present invention, the forming method comprises: dipping a basic material formed by a material among graphite and glass in which a groove or a pattern is formed into a container in which melting liquid of pure metal or alloy is stored; forming a metal film on a groove or a pattern of the basic material; spraying a mixture in which a paste is processed by mixing a special material such as lead oxide to a surface of the basic material in which the groove or the pattern is formed; and forming an oxide film on the groove or the pattern of the basic material by processing a defoamation and hardening process for the basic material in which the pasted mixture is sprayed. As such, the method may increase adhesive power for a metal film or an oxide film on a groove or a pattern of the basic material and may improve product performance in applying the basic material in which the metal film or the oxide film is formed to a manufacturing process such as various environmental and/or bio sensors, an optical collimator, a grid to remove X-ray scattering light, grating to photograph an X-ray phase difference image, and the like.

Description

BACKGROUND OF THE INVENTION Field of the Invention [0001] The present invention relates to a method of forming a film on a substrate,

The present invention relates to a method for absorbing, refracting, or reflecting a groove or a pattern of a base material applied to various environments and / or manufacturing products such as a biosensor, an optical collimator, a grid for removing x-ray scattered light, a grating for x- More particularly, the present invention relates to a technique for forming a metal film or an oxide film for performing a plasma etching process, and more particularly, to a technique for forming a metal film or an oxide film for performing a predetermined process It is possible to form a metal film on a groove or a pattern by a dipping method or to form a film on a groove or a pattern of a base material capable of forming an oxide film by a defoaming method in a state where a groove or a pattern having a width and a depth is formed And to a method for forming such a device.

A groove or a pattern having a predetermined width and depth is formed by machining, laser processing, or chemical etching on a base material such as ceramics, graphite, or glass, and then light having a specific wavelength or energy is applied to the groove or pattern A refraction film, a reflection film, or the like for absorbing, refracting, or reflecting, as needed, due to various environments and / or biosensors, an optical collimator, a grid for removing x-ray scattered light, (Japanese Patent Laid-Open No. 10-2003-0086400 (published on November 10, 2003, hereinafter referred to as "prior art 1"), Japanese Patent Application Laid-Open No. 10-2008-0094374 Published on October 23, 2008, hereinafter referred to as " Prior Art 2 ").

However, in the prior art 1, the base material (e.g., a plastic material) such as Kapton, which is a trade name of a polyimide resin, and Ultem, which is a polyetherimide resin, An alloy having a melting temperature of 123 ° C to 160 ° C (for example, a low melting point lead alloy) is melted in a vacuum state and filled with the micro-machined groove to obtain an X-ray scattered light shielding film In this prior art 1, the base material forming the fine grooves is made of an alloy of 123 ° C. to 160 ° C. which is plastic-based and is susceptible to heat and has a very low melting point. As a result, The present invention does not specifically describe how the filling is performed in addition to filling the grooves with micro-machining.

That is, in the prior art 1, a practical implementation method for determining whether the alloy is filled by dipping or filling by a deposition (e.g., heat or electron beam) is not specifically disclosed in the fine grooves formed in the base material Of course, the description of the filling device is also not disclosed at all, and therefore it can not be understood at all whether the filling conditions for the alloy are.

On the other hand, the prior art 2 uses a base material such as plastic, polymer, aluminum, ceramic, graphite, carbon fiber, etc. as a base material, A plurality of thin and long grooves are formed at regular intervals through a sawing device and then a thin and long X-ray absorber strip is inserted and fixed in the groove to form an X-ray scattered light absorbing shielding film. 2 has a disadvantage in that the adhesion force of the X-ray absorber strip to be inserted and fixed in the groove can not be firmly maintained, and thus the base material on which the above-mentioned absorbing shielding film is formed is exposed to various environments and / or biosensors, an optical collimator, Grid, grating for X-ray phase contrast imaging, etc., it acts as a factor to deteriorate the product performance. Will have a problem.

Accordingly, it is an object of the present invention to improve the disadvantages of the prior arts as described above, and to provide a method of manufacturing a honeycomb structure in which a base material, which is made of any one of ceramic, graphite and glass, The adhesion of the metal film to the metal film in the groove or the pattern of the base material is increased so that the base material on which the metal film is formed is exposed to various environments and / A method for forming a film on a groove or a pattern of a base material that can improve the performance of a product such as a collimator, a grid for removing x-ray scattered light, and a grating for X-ray phase contrast imaging The purpose of that is to provide.

Another object of the present invention is to provide a method for manufacturing a semiconductor device in which lead oxide is mixed with a specific material and paste is applied to the surface of the base material or the patterned base material and then the base material to which the paste mixture is applied is degassed and cured An oxide film is formed on the groove or pattern of the base material to increase the adhesion of the oxide film to the oxide film in the groove or pattern of the base material so that the base material on which the oxide film is formed can be used for various environments and / or biosensors, optical collimators, A grating for removing scattered light, a grating for X-ray phase contrast imaging, and the like, and to provide a method for forming a film on a groove or pattern of a base material so as to improve the performance of the product.

In order to achieve the above object, an apparatus for forming a film on a groove or a pattern of a base material according to the present invention comprises a connecting pipe and a lid, a container member into which a first film material melted at a predetermined temperature or more is introduced to immerse the first base material, ; A first base material coated with a groove or a pattern in the container portion or a second base material coated with a second film material is selectively inserted into the container portion, Parent stock government to securely support the base metal; The first film material formed on the outer side of the container portion and charged into the container portion so as to be immersed in the first base material fixedly supported on the parent material portion is hardened or the second film material coated on the second base material is cured A heating unit for maintaining an internal temperature of the container unit at a predetermined temperature or higher through a heating operation; An angle adjusting unit for adjusting a tilt angle of the left and right sides of the parent restroom; And a connection pipe connected to the container portion and converting the inside of the container portion into a vacuum state to form a metal film through the first film material melted in the groove or pattern of the first base material, A vacuum apparatus for defoaming a second film material applied to the first base material to drive an oxide film on the groove or pattern of the second base material; .

The angle adjusting unit may include a plurality of first driving units disposed on the outer side of the cover; And one end connected to the plurality of the first driving units and the other end connected to both ends of the parental restroom disposed in the container through the lid, An adjusting rod that moves and regulates the left and right tilt angles of the parent restroom; .

In addition, the vacuum apparatus is a rotary pump that drives the vacuum unit in the container unit to keep the vacuum degree constant within a certain range.

The vacuum apparatus is a diffusion pump or a turbo pump that drives the vacuum unit in the container unit to maintain the degree of vacuum higher than that of the vacuum maintained by the rotary pump.

In addition, the container portion and the lid are configured to be hermetically sealed through a sealing device to maintain the degree of vacuum in the container portion.

The sealing device may further include: a second driving unit; A binding part rotatably coupled to one end of the container part by a hinge, the binding part being bound to the cover; And an operating body for moving up and down according to the driving of the second driving unit to press-fix the binding unit so as to keep the binding force of the binding unit constant; .

It is preferable that the container portion is provided with a first inlet, and the first inlet is provided with an opening for preventing the oxidation of the first film material or the second film material during heating of the heating portion, A gas supply device for supplying a purge gas into the container section for connection minimization.

The purge gas may be an inert gas such as helium gas, Ne gas, Ar gas, krypton gas, Xe gas, radon gas (Rn gas) , And nitrogen gas (N2 gas).

In addition, the container portion is constituted by a second inlet, and the second inlet is constituted by connecting a ventilation device for ventilation in the container portion.

In addition, the above-described stocking part is made of a graphite material having thermal stability and stability that is physically and chemically resistant to deformation even at high temperatures.

Also, it is preferable that the mother restroom includes a fixing plate having a connecting portion having hinges at both ends thereof, a plurality of guide grooves formed on a plane, and a first base material or a second base material being raised; A rod connection portion rotatably coupled to the hinge and connected to the other end of the adjustment rod; A plurality of moving plates for forming guide protrusions inserted into the guide grooves and fixing the first base material or the second base material placed on the base plate; .

Further, the first film material is a pure metal or an alloy.

Further, the second film material is a paste mixture in which lead oxide and a polymer resin are pasted and mixed.

Further, the lead oxide has a particle size of 1 to 2 mu m.

The lead oxide and the polymer resin are mixed in a ratio of 8: 1 to 1: 1 in relation to 100% by weight of the paste mixture.

The polymer resin is any one of an amine resin, an isocyanate resin, an acid resin, an acid anhydride resin, an azole resin curing agent, and a urethane polymer resin .

In addition, a buffer layer of several hundred nanometers is deposited on the first base material to prevent a decrease in adhesion of the first film material due to a difference in lattice constant between the first base material and the groove or pattern.

According to another aspect of the present invention, there is provided a method for forming a film on a groove or a pattern of a base material, comprising: a first step of putting a first base material on which a groove or a pattern has been formed, A second step of injecting a first film material into the container section and sealing the container section using a sealing device; A third step of maintaining the temperature within the container at a predetermined temperature or higher by using a heating unit to melt the first film material injected into the container unit so that the first base material is immersed; The first and second base materials are immersed in the molten first film material by using a vacuum apparatus, and the inside of the container unit is converted into a vacuum state. Then, while adjusting left and right tilt angles of the first and second base materials, A fourth step of forming a metal film on the pattern; And a fourth step of separating a first base material having a metal film formed on a groove or a pattern from the container and removing the first film material remaining on a surface other than the groove or the pattern of the first base material by grinding through a polishing machine A fifth step; .

The surface of the first base material on which the grooves or the patterns have been formed in the first step is coated with a buffer layer of several hundred nanometers to prevent the deterioration of the adhesion due to the difference in lattice constant between the surface of the first base material and the groove or pattern, ; As shown in FIG.

According to another aspect of the present invention, there is provided a method for forming a film on a groove or pattern of a base material, comprising the steps of: 11) applying a second film material to a surface of a second base material on which a groove or a pattern is formed; A twelfth step of securing the second base material to which the second film material is applied to the inside of the container in the container of the film forming apparatus and sealing the container part using a sealing device; The inside of the closed container portion is converted into a vacuum state by using a vacuum device and the second film material coated on the surface of the second base material is defoamed to form an oxide film on the groove or pattern of the second base material (13); (14) a step of heating the container portion by using a heating portion to cure the oxide film formed on the groove or pattern of the second base material while keeping the temperature within the container portion at a predetermined temperature or higher; And separating the second base material having an oxide film formed on the groove or pattern from the container portion from the fourteenth step and polishing the second film material remaining on the surface other than the groove or the pattern of the second base material through a polishing machine A fifteenth step; .

Supplying a purge gas into the container section to prevent oxidation of the first film material or the second film material during heating of the heating section, to introduce moisture into the atmosphere during opening and closing of the container section, and to minimize contact with oxygen; As shown in FIG.

As described above, the present invention is a method of dipping a base material having a groove or a pattern formed of any one of ceramics, graphite, and glass into a container containing a pure metal or a melt of an alloy, A mixture of lead oxide and a specific material is applied to the surface of the base material or the patterned base material, and the base material to which the paste mixture is applied is defoamed and cured to form a base material And the adhesion of the metal film or the oxide film to the metal film or the oxide film in the groove or pattern of the base material is increased so that the base material on which the metal film or the oxide film is formed is exposed to various environments and / (Collimator), Grid for removing x-ray scattering light, Grating for x-ray phase contrast imaging It is possible to expect an effect of improving the product performance.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a side schematic view showing a structure of an apparatus for forming a film on a groove or pattern of a base material according to an embodiment of the present invention. FIG.
2 is a schematic plan view showing a structure of a device for forming a film on a groove or pattern of a base material according to an embodiment of the present invention;
FIG. 3 is a perspective view showing the structure of a warehouse according to an embodiment of the present invention; FIG.
FIG. 4 is a view illustrating a state in which the left and right tilt angles of the parent restroom are adjusted according to an embodiment of the present invention. FIG.
5 is a photograph showing a state in which a metal film is formed on a groove or a pattern of a first base material (for example, a glass substrate) according to an embodiment of the present invention.
6 is a photograph showing a state in which a metal film is formed in a groove or a pattern of a first base material (for example, a glass substrate) by an immersion method and polished, according to an embodiment of the present invention.
7 is a photograph showing an oxide film formed on a groove or a pattern of a second base material (e.g., a glass substrate) according to an embodiment of the present invention.
8 is a photograph showing a state in which a honeycomb oxide film is formed on a groove or a pattern of a second base material (for example, a glass substrate) by a defoaming method and polished, according to an embodiment of the present invention.
9 is a photograph showing a state in which a quadrangular oxide film is formed on a groove or a pattern of a second base material (for example, a glass substrate) by a defoaming method and polished, according to an embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and how to accomplish them, will become apparent by reference to the embodiments described in detail below with reference to the accompanying drawings. However, it should be understood that the present invention is not limited to the disclosed embodiments, but may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. It will be understood by those of ordinary skill in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

The terminology used herein is for the purpose of illustrating embodiments and is not intended to be limiting of the present invention. In the present specification, the singular form includes plural forms unless otherwise specified in the specification.

In this specification, the terms "comprises" or "having ", and the like, specify that the presence of stated features, integers, steps, operations, elements, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

In addition, the embodiments described herein will be described with reference to cross-sectional views and / or plan views, which are ideal illustrations of the present invention. In the drawings, the thicknesses of the films and regions are exaggerated for an effective description of the technical content. Thus, the shape of the illustrations may be modified by manufacturing techniques and / or tolerances. Accordingly, the embodiments of the present invention are not limited to the specific forms shown, but may include variations in shapes that are created or required according to the manufacturing process. For example, the area shown at right angles may be rounded or may have a shape with a certain curvature. Thus, the regions illustrated in the figures have schematic attributes, and the shapes of the regions illustrated in the figures are intended to illustrate specific forms of regions of the apparatus and are not intended to limit the scope of the invention.

Like reference numerals refer to like elements throughout the specification. Accordingly, although the same reference numerals or similar reference numerals are not mentioned or described in the drawings, they may be described with reference to other drawings. Further, even if the reference numerals are not shown, they can be described with reference to other drawings.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

FIG. 1 is a side schematic view showing a structure of a device for forming a film on a groove or pattern of a base material according to an embodiment of the present invention, and FIG. 2 is a schematic view showing a structure of a device for forming a film on a groove or a pattern of a base material FIG. 3 is a perspective view showing a structure of a parent restroom according to an embodiment of the present invention, FIG. 4 is a view showing a state of adjusting left and right inclination angles of a parent restroom in an embodiment of the present invention FIG.

Referring to FIGS. 1 to 4, an apparatus T for forming a film on a groove or pattern of a base material according to an embodiment of the present invention includes a container portion 10, a stock restricting portion 20, a heating portion The gas supply unit 70 and the ventilation unit 80 and the control unit 40. The gas supply unit 70 and the ventilation unit 80 are connected to the gas supply unit 30, (90).

The container unit 10 is used to form a metal film or an oxide film on a groove or a pattern processed in the first or second base material A1 or A2. The first base material A1 may be dipped (For example, 400 ° C or more) when the heating operation of the heating unit 30 is performed for the first film material.

At this time, the container unit 10 constitutes a connection pipe 11, a lid 12, and first and second input ports 13 and 14. The connection pipe 11 is connected to the vacuum device 50, And the first inlet 13 is provided with an opening for preventing the oxidation of the first film material or the second film material during the heating of the heating section 30 and the inflow of moisture into the atmosphere during opening and closing of the container section 10, The gas supply device 70 for supplying purge gas is connected to the container portion 10 to minimize the contact with the oxygen and the container portion 10 is connected to the second input port 14. [ And the ventilation device 80 for ventilation in the indoor space is connected.

The purge gas may be a helium gas, a Ne gas, an Ar gas, a krypton gas, a xenon gas, a radon gas, , And nitrogen gas (N2 gas).

Although the container unit 10 is not specifically shown in the drawing, the container unit 10 may be a double-structure container made of an inner and an outer unit, and an opening of the container may be closed by the cover 12 And a separate structure in which the inner container is inserted into the outer container.

When the second base material A2 is supplied to the container portion 10, the first film material is not introduced into the container portion 10.

The first and second base materials A1 and A2 are made of any one of ceramics, graphite and glass. The first and second base materials A1 and A2 may be machined, Grooves or patterns having a width in the range of 10 to 20 mu m and a depth in the range of 100 to 120 mu m have been processed by the phosphorus etching method.

And, (for example, lead), and the second film material is lead oxide having a particle size of 1~2um the first film material is a pure metal or alloy; paste by screen (such as Pb0, Pb 3 O 4) and the polymeric resin As the mixed paste, the polymer resin may be prepared by using an amine resin, an isocyanate, an acid, an acid anhydride or an azole type curing agent in an epoxy resin, Wherein the paste mixture is composed of the lead oxide and the polymer resin mixed in a ratio of 8: 1 to 1: 1 in a mixing ratio of 100% by weight.

On the other hand, before the first base material A1 is immersed in the container portion 10, the first base material A1 is preliminarily coated with several hundreds of nano- Although a buffer layer of the meter may be formed by vapor deposition, this buffer layer is optional and does not necessarily have to be formed by vapor deposition.

When the first base material A1 on which grooves or patterns have been processed or the second base material A2 on which the second film material is applied is selectively inserted into the container portion 10, The first base material (A1) or the second base material (A2) is fixedly supported to adjust the tilt angle in the left and right directions within the container portion (10) And is made of graphite material with stability.

The restroom 20 includes a fixing plate 21, a rod connecting portion 22 and a moving plate 23. The fixing plate 21 has a connecting portion 21a having hinges h1 and h2 at both ends thereof, And a plurality of guide grooves 21b are formed on the plane so that the first base material A1 or the second base material A2 is selectively raised.

The rod connecting portion 22 is rotatably coupled to the hinges h1 and h2 so that the other end of the adjusting rod 42, which will be described later, included in the angle adjusting portion 40 is connected.

The moving plate 23 is provided with a pair of structures 22 facing each other on the upper surface of the fixing plate 21 for fixing both side portions of the first base material A1 or the second base material A2 mounted on the fixing plate 21, And a guide protrusion 23a inserted into the guide groove 21b is formed to be movable along the guide groove 21b.

The heating unit 30 is formed on the outer side of the container unit 10 and the first base material A1 fixedly supported on the bottom unit 20 is immersed into the container unit 10, (For example, 400 DEG C or more) through the heating operation so as to melt the film material or to cure the second film material applied to the second base material A2 The heating operation for maintaining the heating operation is performed.

That is, the heating unit 30 melts the first film material to be charged into the container unit 10 when the first base material A1 is put in the container unit 10, The first base material A1 is immersed so that the metal film D1 is formed on the groove or pattern of the first base material A1 as shown in FIGS. 5 and 6, When the second base material A2 to which the second film material is applied is charged into the second base material A2, the second film material applied to the second base material A2 is cured, The heating operation is performed at a predetermined temperature or higher so that the oxide film D2 can be formed in the groove or pattern of the second base material A2.

The angle adjusting unit 40 adjusts the inclination angles of the left and right sides of the parent reconstitution unit 20 and includes a first driving unit 41 and an adjusting rod 42.

The first driving part 41 is driven in accordance with a control signal outputted from the control panel 90 and is disposed on the outer side of the lid 12 which closes the opening of the container part 10 in a pair.

The control rod 42 has one end connected to the first driving unit 41 and the other end of the control rod 42 is disposed in the container unit 10 through the cover 12 And is connected to a rod connection part 22 provided at both ends of a fixing plate 21 included in the parent restroom 20. The first and second driving parts 41 and 41 are moved up and down As shown in FIG. 4, the left and right inclination angles of the fixing plate 21 included in the hair restoration part 20 are adjusted.

That is, adjusting the tilt angles of the left and right tilt restricting portions 20 through the angle adjusting portion 40 may be performed by immersing the first base material A1 in the melted first film material in the container portion 10 The remaining amount of the first film material on the surface excluding the groove or pattern of the first base material A1 can be minimized.

The vacuum apparatus 50 is connected to the connection pipe 11 of the container unit 10 and converts the inside of the container unit 10 into a vacuum state so that the groove or pattern of the first base material A1 The metal film D1 as shown in FIGS. 5 and 6 attached through the first film material melted in the second base material A2 is formed, or the second film material applied to the second base material A2 is defoamed, To form the oxide film D2 as shown in Figs. 7 to 9 attached to the groove or pattern of the substrate A2.

Here, the vacuum device 50 is a rotary pump that drives the vacuum device in the container 10 to maintain a constant degree of vacuum within a certain range (e.g., 10 -3 torr to 10 -5 torr) A diffusion pump or a turbo pump may be selectively connected to the connection pipe 11 so as to maintain a vacuum state in the container unit 10 at a higher vacuum level than a degree of vacuum maintained by the rotary pump It is.

The sealing device 60 is configured to firmly maintain the closed state of the lid 12 covering the opening portion of the container portion 10 for maintaining the degree of vacuum in the container portion 10, And includes a driving unit 61, a coupling unit 62, and an operating unit 63.

The second driving unit 61 is configured to be driven in accordance with a control signal output from the control panel 90.

The binding portion 62 is a U-shaped structure that is rotatably coupled to one end of the container portion 10 by a hinge and is bound to the lid 12. [

The actuating member 63 maintains a constant binding force between the container unit 10 and the coupling unit 62 that binds the lid 12. The actuating member 63 can be moved up and down according to the driving of the second driving unit 61, And the binding portion 62 is pressed and fixed while being lowered.

[0031] As described above, by using the apparatus T of FIGS. 1 to 4 for forming a film on the groove or pattern of the base material according to the embodiment of the present invention, A method of forming the metal film D1 as shown in FIGS. 5 and 6 will be described. As a first step, a first base material A1 made of any one of ceramics, graphite and glass is machined , A groove or a pattern having a width in the range of 10 to 20 mu m and a depth in the range of 100 to 120 mu m is processed by a laser or chemical etching method and then the first base material A1, (20) in the main body (10).

In other words, in the container 10, a rest room 20 including a fixing plate 21, a rod connecting portion 22 and a plurality of moving plates 23 is disposed, Is connected to a pair of first driving parts (41) arranged outside the lid (12) covering the opening of the container part (10) through a pair of adjusting rods (42) included in the adjusting part The bar,

The first base material A1 is placed on the fixing plate 21 on which the guide groove 21b is formed and then the pair of moving plates 23 are moved through the guide protrusions 23a, 23 to fix both side portions of the first base material A1.

Here, in the first step, the surface of the first base material A1 is preferentially placed on the surface of the first base material A1 before the first base material A1 having the groove or pattern processed therein is injected into the container portion 10, To prevent the adhesion of the first film material from being deteriorated due to the difference in lattice constant between the molten first film material and the groove or pattern processed in the first base material A1, will be.

A first film material such as pure metal or an alloy (for example, lead) is introduced into the container portion 10 and then the container portion 10 is sealed using a sealing device 60 as a second process .

That is, in the state that the opening at the upper end of the container unit 10 is closed by the lid 12, the binding unit 62, which is a structure of the C-shaped member included in the sealing device 60, is rotated around the hinge, The portion 62 binds the container portion 10 and the lid 12 together.

When the second driving unit 61 is driven by outputting a control signal from the control panel 90, the actuating member 63 moves from the driving force of the second driving unit 61 to the container unit 10 and the cover 12 So that the binding force between the container portion 10 and the lid 12 by the binding portion 62 is kept constant.

At this time, since the gas supply device 70 is connected to the first inlet 13 of the container 10, the upper opening of the container 10 is closed by the lid 12 by the sealing device 60 A gas such as He gas, Ne gas, Ar gas, Kr gas, or the like is used as an inert gas in the container unit 10 in the gas supply device 70, (Purge gas) of one of the first, the second, the third, the fourth, the fifth, the sixth, the eighth, the ninth, the xenon, the radon gas and the nitrogen gas. To minimize oxidation of moisture in the atmosphere and contact with oxygen when opening and closing the container portion 10 as well as to prevent oxidation of the membrane material.

The heating section 30 disposed outside the container section 10 is heated by a control signal outputted from the control panel 90 to control the temperature in the container section 10 to a predetermined temperature (E.g., 400 DEG C) to melt the first film material charged into the container portion 10 and immerse the parent material portion 20 in the molten first film material.

The first base material A1 or the first base material A1 on which the buffer layer is deposited is also immersed in the molten first film material and the angle adjusting section 40 The left and right tilting angles of the parent material restricting portion 20 are adjusted so that the first parent material A1 or the first buffer material A1 on which the buffer layer is deposited is melted Thereby minimizing the residual amount.

Then as the fourth step, the coupling pipe by means of a vacuum device 50 connected to 11, and regulates the internal of the container portion 10 range (for example, the storage portion 10 of; from 10 -3 torr for 10 - 5 , a groove or a pattern of the first base material A1 or the first base material A1 on which the buffer layer is deposited is formed with a metal film by the first film material, (D1) is formed.

Herein, the degree of vacuum within a certain range within the container portion 10 is set to 1 minute or less so as to form the metal film D1 on the groove or pattern of the first base material A1 or the first base material A1 on which the buffer layer is deposited. The heating unit 30 is heated so as to be kept constant within a range of 1 to 1 hour and the first base material A1 or the buffer layer is deposited on the first film material melted in the container unit 10 The first base material A1 was immersed in the range of 1 minute to 1 hour.

The cover 12 covering the upper opening of the container portion 10 is separated from the sealing operation of the sealing device 60 and then the first cover 12 having the metal film D1 formed in the groove or the pattern The first base material A1 on which the base material A1 or the buffer layer is deposited is separated from the container portion 10 and the first base material A1 or the buffer layer is deposited on the first base material A1, The first metal material A1 remaining on the surface is polished and removed by a polishing machine (not shown) to remove the first metal material D1 or the first metal material D1 formed on the groove or pattern as shown in FIG. The first base material A1 on which the buffer layer is deposited is applied to various environments and / or products such as a biosensor, an optical collimator, a grid for removing x-ray scattered light, a grating for X-ray phase contrast imaging, It can be improved.

As described above, by using the apparatus (T) of FIGS. 1 to 4 for forming a film on the groove or pattern of the base material according to the embodiment of the present invention, The method of forming the oxide film D2 as shown in FIGS. 7 to 9 will now be described. In the eleventh step, a second base material A2 made of any one of ceramics, graphite, and glass is machined , A groove or a pattern having a width in the range of 10 to 20 mu m and a depth in the range of 100 to 120 mu m is processed by a laser processing or a chemical etching method and then a groove or a pattern is formed on the surface of the second base material A2 The second film material is applied.

Here, the second film material is lead oxide having a particle size of 1~2um (Example; Pb0, Pb 3 O 4) and a mixture of a paste mixed with silver paste screen a polymeric resin, said polymeric resin is an epoxy resin amine An organic acid, an acid anhydride or an azole type curing agent or an urethane-based polymer resin is used and the paste mixture has a mixing ratio of 100 wt% %, The lead oxide and the polymer resin are mixed in a ratio of 8: 1 to 1: 1.

The second base material A2 coated with the second film material is fixed to the parent resting portion 20 in the container portion 10 and the upper opening of the container portion 10 is covered with the cover 12, and then the sealed state is maintained firmly through the sealing device 60. [

In other words, in the container 10, a rest room 20 including a fixing plate 21, a rod connecting portion 22 and a plurality of moving plates 23 is disposed, Is connected to a pair of first driving parts (41) arranged outside the lid (12) covering the opening of the container part (10) through a pair of adjusting rods (42) included in the adjusting part The bar,

The second base material A2 to which the second film material is applied is placed on the fixing plate 21 on which the guide groove 21b is formed and then the pair of moving plates 23 is guided by the guide protrusion 23a And fixing both side portions of the second base material A2 through the moving plate 23 while moving the second base material A2.

The binding portion 62 which is a structure of the C-shaped member included in the sealing device 60 is rotated around the hinge in a state where the opening at the upper end of the container portion 10 is closed by the lid 12, The portion 62 binds the container portion 10 and the lid 12 together.

When the second driving unit 61 is driven by outputting a control signal from the control panel 90, the actuating member 63 moves from the driving force of the second driving unit 61 to the container unit 10 and the cover 12 So that the binding force between the container portion 10 and the lid 12 by the binding portion 62 is kept constant.

At this time, since the gas supply device 70 is connected to the first inlet 13 of the container 10, the upper opening of the container 10 is closed by the lid 12 by the sealing device 60 A gas such as He gas, Ne gas, Ar gas, Kr gas, or the like is used as an inert gas in the container unit 10 in the gas supply device 70, (Purge gas) of one of the first, the second, the third, the fourth, the fifth, the sixth, the eighth, the ninth, the xenon, the radon gas and the nitrogen gas. To minimize oxidation of moisture in the atmosphere and contact with oxygen when opening and closing the container portion 10 as well as to prevent oxidation of the membrane material.

The inside of the container portion 10 sealed by the sealing device 60 is converted into a vacuum state by using the vacuum device 60 so that the surface of the second base material A2 is coated The oxide film D2 is formed in the groove or pattern of the second mother material A2 while defoaming the second mother material.

That is, the inside of the container unit 10 is evacuated to a vacuum degree within a certain range (for example, 10 -3 torr to 10 -5 torr) through a vacuum device 50 connected to the connection pipe 11 of the container unit 10. , The second film material applied to the second base material A2 is defoamed as shown in FIG. 7, so that the groove or pattern of the second base material A2 is provided with the second film material A2, The oxide film D2 is formed.

The heating section 30 disposed outside the container section 10 is heated by a control signal outputted from the control panel 90 to change the temperature in the container section 10 to a predetermined temperature (For example, 400 DEG C), so that the oxide film D2 formed in the groove or pattern of the second base material A2 is cured.

Here, when the oxide film D2 formed on the groove or pattern of the second base material A2 is cured, the inclination of the second base material A2 with respect to the left and right sides By adjusting the angle through the angle regulating portion 40, the hardening of the oxide film D2 can be made quickly and uniformly.

The lid 12 covering the upper opening of the container portion 10 is separated from the sealing operation of the sealing device 60 and then the second cover 12 having the oxide film D2 formed in the groove or pattern The base material A2 is separated from the container portion 10 and the second film material remaining on the surfaces other than the grooves or the patterns of the second base material A2 is polished and removed through a grinder (not shown) The honeycomb structure of FIG. 8 attached to the groove or the pattern or the second mother material A2 formed with the oxide film D2 such as the quadrangle of FIG. 9 may be attached to the grooves or patterns through various environments and / or biosensors, optical collimators, A grating for removing scattered light, a grating for X-ray phase contrast imaging, etc., and the product performance can be improved.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood. It is therefore to be understood that the above-described embodiments are illustrative and not restrictive in every respect.

10; A container portion 11; Connector
12; Cover 13; The first inlet
14; A second inlet 20; Mother stock government
21; A fixing plate 21a; Connection
21b; Guide grooves 22; Load connection
23; A moving plate 23a; Guide projection
30; A heating unit 40; Angle adjusting portion
41; A first driving unit 42; Control rod
50; A vacuum device 60; Sealing device
61; A second driving unit 62; The binding portion
63; Actuator 70; Gas supply device
80; Ventilation device 90; Control panel
A1; A first base material A2; Second base material
T; Film forming apparatus

Claims (27)

The second preform is applied with the second film material, which is a paste mixture which is formed by mixing the lead oxide and the polymer resin in paste form so as to form an oxide film on the groove or pattern while the groove or the pattern is being processed A container portion;
A mother stocking part fixed to the container part so as to be adjustable in angle and fixedly supporting the second mother material in the container part when the second mother material coated with the second film material for forming the oxide film is inserted;
A heating unit which is formed outside the container unit and maintains the internal temperature of the container unit at a predetermined temperature or higher through a heating operation so as to cure the second film material applied to the second base material fixedly supported by the parental unit;
An angle adjusting unit for adjusting a tilt angle of the left and right sides of the parent restroom; And
And is connected to the connection pipe of the container portion and is driven to convert the inside of the container portion to a vacuum state to defoam the second film material applied to the second base material while forming an oxide film on the groove or pattern of the second base material Vacuum device; And forming a film on the groove or pattern of the base material. [2] The apparatus of claim 1,
A plurality of first drivers disposed on the outside of the cover; And
One end of the first driving part is connected to one end of the first driving part and the other end is connected to both ends of the mother rest room disposed in the container through the lid and moves up and down according to the selective driving of the first driving part An adjusting rod adjusting the left and right tilt angles of the parent stocker; And forming a film on the groove or pattern of the base material. The apparatus as claimed in claim 1, wherein the vacuum apparatus is a rotary pump that drives the vacuum unit in the container unit to maintain a constant degree of vacuum within a predetermined range. The method as claimed in claim 3, wherein the vacuum apparatus is a diffusion pump or a turbo pump that drives the vacuum pump to maintain the degree of vacuum in the container unit higher than a degree of vacuum maintained by the rotary pump. . 2. The apparatus of claim 1, wherein the container portion and the lid are closed through a sealing device to maintain a degree of vacuum in the container portion. 6. The apparatus according to claim 5,
A second driver;
A binding part rotatably coupled to one end of the container part by a hinge, the binding part being bound to the cover; And
An actuating member for moving up and down according to the driving of the second driving unit to press-fix the binding unit so as to keep the binding force of the binding unit constant; And forming a film on the groove or pattern of the base material. The method according to claim 1,
The container portion is constituted by a first inlet,
Wherein the first inlet is provided with a gas supply device for supplying a purge gas into the container for preventing oxidation of the second film material during heating of the heating part, for introducing moisture into the atmosphere during opening and closing of the container part, Wherein the groove is formed by connecting the groove or the pattern of the base material. 8. The method of claim 7, wherein the purge gas is an inert gas selected from the group consisting of He gas, Ne gas, Ar gas, Kr gas, Xe gas, (Rn gas), and nitrogen gas (N2 gas). The method according to claim 1,
And a ventilation device for ventilation in the container section is connected to the second inlet port, wherein the ventilation device is connected to the container section. [3] The apparatus of claim 2, wherein the mother board is made of a grahite material which is thermally expanded at high temperatures and has stability to be physically and chemically deformed. . 11. The method of claim 10,
A fixing plate on which a connecting portion having hinges at both ends is formed, a plurality of guide grooves are formed on a plane, and a second base material is mounted;
A rod connection portion rotatably coupled to the hinge and connected to the other end of the adjustment rod; And
A plurality of moving plates for forming guide protrusions inserted into the guide grooves and fixing the second base material placed on the fixing plates; And forming a film on the groove or pattern of the base material. delete delete The apparatus of claim 1, wherein the lead oxide is configured to have a particle size of 1 to 2 um. The method according to claim 1, wherein the lead oxide and the polymer resin are mixed in a ratio of 8: 1 to 1: 1 in relation to 100% by weight of the paste mixture. / RTI > The polymer resin according to claim 1, wherein the polymer resin is selected from the group consisting of an amine resin, an isocyanate resin, an acid resin, an acid anhydride resin, an azole resin curing agent, Wherein the film is formed on the base material or the pattern of the base material. delete delete An eleventh step of applying a second film material to a surface of a second base material on which a groove or a pattern is formed;
A twelfth step of securing the second base material to which the second film material is applied to the inside of the container in the container of the film forming apparatus and sealing the container part using a sealing device;
The inside of the closed container portion is converted into a vacuum state by using a vacuum device and the second film material coated on the surface of the second base material is defoamed to form an oxide film on the groove or pattern of the second base material (13);
(14) a step of heating the container portion by using a heating portion to cure the oxide film formed on the groove or pattern of the second base material while keeping the temperature within the container portion at a predetermined temperature or higher; And
Removing the second base material having an oxide film formed on the groove or pattern from the container portion from the 14th step and polishing the second film material remaining on the surface other than the groove or the pattern of the second base material by a grinder, fair; ≪ RTI ID = 0.0 > 1, < / RTI > delete 20. The method of claim 19,
Supplying a purge gas into the container portion to prevent oxidation of the second film material upon heating of the heating portion, to introduce moisture into the atmosphere when the container portion is opened and closed, and to minimize contact with oxygen; The method comprising the steps of: forming a pattern on a substrate; 22. The method of claim 21, wherein the purge gas is an inert gas selected from the group consisting of He gas, Ne gas, Ar gas, Krypton gas, Xe gas, Radon gas (Rn gas), and nitrogen gas (N2 gas). delete 20. The method according to claim 19, wherein the second film material is a paste mixture in which lead oxide and a polymer resin are pasted and mixed. 25. The method of claim 24, wherein the lead oxide is configured to have a particle size of 1-2 um. 25. The method according to claim 24, wherein the lead oxide and the polymer resin are mixed in a ratio of 1: 1 from a ratio of 8: 1 to 100% by weight of the paste mixture. / RTI > The polymer resin according to claim 24, wherein the polymer resin is selected from the group consisting of an amine resin, an isocyanate resin, an acid resin, an acid anhydride resin, an azole resin curing agent, Wherein the film is formed on the base material or the pattern of the base material.
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN111560612A (en) * 2020-06-18 2020-08-21 河北光束激光科技有限公司 Laser cladding device and method capable of changing non-uniform distribution of Gaussian light energy

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Publication number Priority date Publication date Assignee Title
JPH1193000A (en) * 1997-09-16 1999-04-06 Ebara Corp Plating method and apparatus therefor
KR20120120785A (en) * 2011-04-25 2012-11-02 고영욱 apparatus for testing wetting characteristic of the glass
JP2015137374A (en) * 2014-01-21 2015-07-30 株式会社荏原製作所 plating apparatus and plating method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1193000A (en) * 1997-09-16 1999-04-06 Ebara Corp Plating method and apparatus therefor
KR20120120785A (en) * 2011-04-25 2012-11-02 고영욱 apparatus for testing wetting characteristic of the glass
JP2015137374A (en) * 2014-01-21 2015-07-30 株式会社荏原製作所 plating apparatus and plating method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111560612A (en) * 2020-06-18 2020-08-21 河北光束激光科技有限公司 Laser cladding device and method capable of changing non-uniform distribution of Gaussian light energy
CN111560612B (en) * 2020-06-18 2022-03-01 河北光束激光科技有限公司 Laser cladding device and method capable of changing non-uniform distribution of Gaussian light energy

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