KR101673777B1

KR101673777B1 - Apparatus for achieving the uniform cryogenic treatment

Info

Publication number: KR101673777B1
Application number: KR1020150079818A
Authority: KR
Inventors: 박주현; 박경수; 유장용; 고영건
Original assignee: 영남대학교 산학협력단
Priority date: 2015-06-05
Filing date: 2015-06-05
Publication date: 2016-11-08

Abstract

A cryogenic treatment apparatus according to the present invention comprises: a body made of a heat insulating material, wherein a chamber having a large conical columnar shape is formed at a central portion, and a gas charging path and a gas discharging path are formed in which cryogenic temperature processing gas is charged and discharged; A seating part for seating a cryogenic object to be processed at a central portion of the chamber; A gas supply unit for supplying the cryogenic process gas into the chamber using the gas inlet path and the gas outlet path; And a stirring part for stirring the cryogenic process gas introduced into the chamber.
According to such a cryogenic processing apparatus according to the present invention, the cryogenic processing gas injected into the chamber can be uniformly distributed using the agitating portion, thereby minimizing the thermal shock received by the object to be cryogenic. In addition, the automatic temperature control using the temperature control part and the excellent heat insulation property enable various cryogenic conditions to be stably maintained for a long time, thereby achieving a uniform cryogenic treatment.

Description

[0001] Apparatus for achieving uniform cryogenic treatment [

The present invention relates to a cryogenic treatment apparatus, and more particularly, to a cryogenic treatment apparatus capable of performing uniform cryogenic heat treatment immediately after Austenizing in order to improve mechanical properties of various steel materials.

Generally, the cryogenic treatment method is a method of cooling various steel materials to 0 DEG C or less after osteonizing. The cryogenic treatment method is divided into cold treatment (0 ~ -80 ℃), shallow cryogenic treatment (-80 ~ -160 ℃) and deep cryogenic treatment (-160 ~ -180 ℃) according to low temperature range.

By the cryogenic treatment as described above, wear resistance of the material surface can be increased, high mechanical strength can be obtained, and residual stress in the material can be reduced. As a result, various materials can be used to increase the lifetime of the rewritten product. This is due to the complete martensitic transformation of retained austenite and the formation of nano-eta ( h ) carbides.

Korean Patent Laid-Open No. 10-2009-0000957 discloses a technique relating to the above conventional cryogenic temperature treating apparatus.

However, the above conventional cryogenic temperature treatment apparatus is a method in which a refrigerant (such as liquefied nitrogen) at a cryogenic temperature is contained in a chamber, and the material is immersed in a cryogenic refrigerant to quench the refrigerant. In this method, the material directly comes into contact with the refrigerant, and the material is suddenly cooled, and the material is subjected to thermal shock. Therefore, defects may occur in the material during the cryogenic treatment.

Also, since the refrigerant in the chamber is difficult to maintain a stable temperature for a long time, there is a problem in that it is difficult to treat the cryogenic temperature according to various time parameters.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to provide a cryogenic temperature control system capable of minimizing a thermal shock received by a material through atmosphere control in a chamber, And an object of the present invention is to provide a device.

According to an aspect of the present invention, there is provided a cryogenic temperature treating apparatus comprising: a chamber having a large conical columnar top surface at a central portion thereof; a gas inlet path and a gas discharge path through which cryogenic temperature processing gas is introduced and discharged, A body made of a heat insulating material; A seating part for seating a cryogenic object to be processed at a central portion of the chamber; A gas supply unit for supplying the cryogenic process gas into the chamber using the gas inlet path and the gas outlet path; And a stirring part for stirring the cryogenic process gas introduced into the chamber.

The cryogenic temperature treating apparatus may further include a temperature adjusting unit that adjusts the supply amount of the cryogenic process gas supplied through the gas inlet path to automatically adjust the temperature in the chamber. The temperature controller may include a control valve for controlling the amount of liquefied gas introduced through the gas inlet, a temperature meter for measuring the temperature in the chamber, and a control unit for controlling the temperature of the control valve And a control unit for controlling the opening and closing amount.

The seating part may include a support protruding from an inner wall of the chamber, and a mesh network having a porous structure seated on the support.

Further, it is preferable that the gas inlet passage communicates with the lower portion of the seat portion, and the gas discharge passage communicates with the upper portion of the seat portion.

Also, the stirring part may include a stirring fan disposed below the seating part, the stirring fan rotating to stir the cryogenic temperature gaseous gas, and a driving source for transmitting rotational power to the stirring fan.

In addition, the main body may include a lid provided on the upper side to open and close the inside of the chamber.

According to the cryogenic processing apparatus according to the present invention, the cryogenic processing gas injected into the chamber can be uniformly distributed using the agitating portion, so that the thermal shock received by the object to be cryogenic can be minimized.

In addition, the automatic temperature control using the temperature control part and the excellent heat insulation property enable various cryogenic conditions to be stably maintained for a long time, thereby achieving a uniform cryogenic treatment.

1 is a perspective view showing a cryogenic treating apparatus according to an embodiment of the present invention,
2 is a vertical sectional view of the cryogenic treating apparatus shown in Fig.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to this, terms and words used in the present specification and claims should not be construed as limited to ordinary or dictionary terms, and the inventor should appropriately interpret the concepts of the terms appropriately The present invention should be construed in accordance with the meaning and concept consistent with the technical idea of the present invention.

Therefore, the embodiments described in the present specification and the configurations shown in the drawings are merely the most preferred embodiments of the present invention, and not all of the technical ideas of the present invention are described. Therefore, at the time of the present application, It should be understood that variations can be made.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view showing a cryogenic treating apparatus according to an embodiment of the present invention, and FIG. 2 is a vertical sectional view of the cryogenic treating apparatus shown in FIG.

1 and 2, the cryogenic temperature treating apparatus 10 according to an embodiment of the present invention includes a cryogenic temperature treating apparatus 10 for heating a cryogenic treating object T such as a steel material at a temperature of 0 ° C after Austenizing Lt; 0 > C or less. The cryogenic temperature treatment apparatus 10 includes a main body 100, a seating portion 200, a gas supply portion 300, and a stirring portion 400.

In the cryogenic treatment apparatus 10, a cryogenic gas is injected into the main body 100 to generate a cryogenic atmosphere. Here, liquefied nitrogen may be used as the cryogenic process gas, but this is merely an example, and a refrigerant gas of another material may be used. The cryogenic treatment object T may be exemplified by a steel material after osteonizing, but the present invention is not limited thereto, and other metals or ceramic polymers that require cryogenic treatment may also be used as a material to be treated.

In the main body 100, a chamber 101 having a large conical columnar shape is formed at a central portion. The chamber 101 adopts the shape of a conical column as a space to be subjected to cryogenic treatment due to the cryogenic processing gas, thereby minimizing the contact surface area with the outside. Also, as described above, the chamber 101 has a wide upper surface. This allows the object to be cryogenic treatment T to be rapidly injected and withdrawn, thus facilitating the uniformly cryogenic treatment.

In addition, the main body 100 is formed with a gas inlet path 111 and a gas outlet path 112, respectively. A cryogenic process gas is injected into the chamber 101 through the gas inlet path 111 and the cryogenic process gas is exhausted out of the chamber 101 through the gas discharge path 112. The main body 100 is made of a heat insulating material 120 so as to insulate the chamber 101 from the outside. Therefore, the inside of the chamber 101 can stably maintain the cryogenic condition for a long time.

Meanwhile, the main body 100 may include a lid 130 on the upper side thereof to open and close the inside of the chamber 101. Here, the lid 130 is preferably hinged to one side of the lid 130 so that the lid 130 can be opened and closed. As shown in FIG. 1, the lid 130 may have a handle on its upper surface.

The seating part 200 is provided at a central portion of the chamber 101. The cryogenic temperature treatment object T is placed on the upper surface of the seating part 200. To this end, the seating part 200 may include a support 210 and a wire net 220.

The support 210 protrudes from the inner wall of the chamber 101. The wire net 220 is supported on the support 210. Here, the cryogenic treatment object T is seated on the upper surface of the wire net 220. It is preferable that the wire mesh 220 has a mesh structure having a porous structure. The cryogenic process gas can smoothly move from the lower part to the upper part in the chamber 101 through the porous mesh structure. On the other hand, since the chamber 101 has a conical shape that becomes narrower toward the bottom, the wire net 220 can be stably fixed without a separate fixing device.

The gas supply unit 300 supplies and discharges the cryogenic process gas into the chamber 101 using the gas supply path 111 and the gas discharge path 112. The cryogenic process gas is supplied to the chamber 101 through the gas inlet path 111 and the cryogenic process gas is discharged to the chamber 101 through the gas discharge path 112. Here, the gas inlet path 111 preferably communicates with the lower part of the seating part 200. As described above, the cryogenic processing gas injected in communication with the lower part of the seating part 200 is naturally or forcedly moved up by the stirring part 400 to be described later, It can spread. Further, it is preferable that the gas discharge passage 112 communicates with the upper portion of the seating part 200. The cryogenic process gas diffused upward is discharged to the outside through the gas discharge passage 112 which is in communication with the upper portion of the seat portion 200.

The agitating unit 400 stirs the cryogenic process gas introduced into the chamber 101. The stirring part 400 may be disposed below the seating part 200 and may include a stirring fan 410 and a driving source 420. Here, the stirring fan 410 rotates to agitate the cryogenic process gas. This allows the cryogenic process gas injected through the gas inlet path 111 to be uniformly distributed in the chamber 101. The driving source 420, such as a motor, is connected to the lower end of the stirring fan 410 to transmit rotational power to the stirring fan 410.

In the present invention as described above, the cryogenic temperature treating apparatus 10 may further include a temperature controller 500. Here, the temperature regulating unit 500 regulates the supply amount of the cryogenic process gas supplied through the gas inlet line 111. Whereby the temperature in the chamber 101 can be automatically adjusted. The temperature regulator 500 may include a regulator valve 510, a temperature gauge 520, and a controller 530.

The control valve 510 may control the amount of cryogenic gas introduced into the gas supply path 300 through the gas inlet path 111. Further, the temperature measuring unit 520 may be positioned at the lower end of the seating unit 200 to measure the temperature in the chamber 101. The temperature measuring device 520 is positioned at the lower end of the seating part 200 so that the temperature of the cryogenic temperature state exposed to the extreme ultimate temperature object T can be measured. The control unit 530 adjusts the opening and closing amount of the control valve 510 according to the temperature measured by the temperature measuring unit 520.

In addition, the temperature measuring unit 520 measures the temperature in the chamber 101 and transmits the information to the controller 530. The control unit 530 controls the amount of the cryogenic process gas introduced into the chamber 101 by opening and closing the control valve 510 based on the measured temperature. By doing so, the amount of the cryogenic process gas flowing into the chamber 101 is automatically controlled. Therefore, it is possible to prevent the temperature inside the chamber 101 from changing, and consequently to maintain the desired cryogenic state stably for a long time.

As described above, according to the cryogenic temperature treatment apparatus 10 of the present invention, the cryogenic treatment gas injected into the chamber 101 can be uniformly distributed using the agitator 400, Thereby minimizing the thermal shock that it receives.

Also, various temperature conditions can be stably maintained for a long period of time through automatic temperature control using the temperature controller 500 and excellent heat insulation, so that uniform cryogenic processing can be performed.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

10: Cryogenic treatment apparatus 100:
101: chamber 111: gas inlet
112: gas discharge pathway 120: insulation material
130: lid 200:
210: support frame 220: wire mesh
300: gas supply part 400: stirring part
410: stirring fan 420: driving source
500: Temperature regulator 510: Regulating valve
520: Temperature meter 530:
T: cryogenic object

Claims

A main body made of a heat insulating material, wherein a chamber having a large conical columnar top surface is formed at the central portion, and a gas inlet path and a gas outlet path through which cryogenic temperature processing gas is introduced and discharged are respectively formed;
A seating part for seating a cryogenic object to be processed at a central portion of the chamber;
A gas supply unit for supplying the cryogenic process gas into the chamber using the gas inlet path and the gas outlet path; And
And a stirring portion for stirring the cryogenic process gas introduced into the chamber,
Wherein the gas inlet passage communicates with a lower portion of the seat portion, the gas discharge passage communicates with an upper portion of the seat portion,
Wherein the agitating portion is disposed below the seating portion and moves the cryogenic process gas injected from the gas inlet passage to the upper portion by stirring.

The method according to claim 1,
Further comprising a temperature regulator for regulating a temperature of the chamber by regulating a supply amount of the cryogenic process gas supplied through the gas inlet path.

The method of claim 2,
The temperature controller may include:
A regulating valve for regulating the amount of liquefied gas injected through the gas inlet,
A temperature measuring device for measuring a temperature in the chamber,
And a controller for controlling the opening and closing amount of the control valve in correspondence with the temperature measured by the temperature measuring device.

The method according to any one of claims 1 to 3,
The seat (1)
A support protruding from the inner wall of the chamber,
And a wire net of a mesh structure which is seated on the support and has a porous structure.

delete

The method according to any one of claims 1 to 3,
An agitation fan rotating to agitate the cryogenic heating gas,
And a driving source for transmitting rotational power to the stirring fan.

The method according to any one of claims 1 to 3,
The main body includes:
And a lid provided on the upper side to open and close the inside of the chamber.