KR101673777B1 - Apparatus for achieving the uniform cryogenic treatment - Google Patents
Apparatus for achieving the uniform cryogenic treatment Download PDFInfo
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- KR101673777B1 KR101673777B1 KR1020150079818A KR20150079818A KR101673777B1 KR 101673777 B1 KR101673777 B1 KR 101673777B1 KR 1020150079818 A KR1020150079818 A KR 1020150079818A KR 20150079818 A KR20150079818 A KR 20150079818A KR 101673777 B1 KR101673777 B1 KR 101673777B1
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- South Korea
- Prior art keywords
- cryogenic
- gas
- chamber
- temperature
- stirring
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/18—Hardening; Quenching with or without subsequent tempering
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Furnace Details (AREA)
Abstract
A cryogenic treatment apparatus according to the present invention comprises: a body made of a heat insulating material, wherein a chamber having a large conical columnar shape is formed at a central portion, and a gas charging path and a gas discharging path are formed in which cryogenic temperature processing gas is charged and discharged; A seating part for seating a cryogenic object to be processed at a central portion of the chamber; A gas supply unit for supplying the cryogenic process gas into the chamber using the gas inlet path and the gas outlet path; And a stirring part for stirring the cryogenic process gas introduced into the chamber.
According to such a cryogenic processing apparatus according to the present invention, the cryogenic processing gas injected into the chamber can be uniformly distributed using the agitating portion, thereby minimizing the thermal shock received by the object to be cryogenic. In addition, the automatic temperature control using the temperature control part and the excellent heat insulation property enable various cryogenic conditions to be stably maintained for a long time, thereby achieving a uniform cryogenic treatment.
Description
The present invention relates to a cryogenic treatment apparatus, and more particularly, to a cryogenic treatment apparatus capable of performing uniform cryogenic heat treatment immediately after Austenizing in order to improve mechanical properties of various steel materials.
Generally, the cryogenic treatment method is a method of cooling various steel materials to 0 DEG C or less after osteonizing. The cryogenic treatment method is divided into cold treatment (0 ~ -80 ℃), shallow cryogenic treatment (-80 ~ -160 ℃) and deep cryogenic treatment (-160 ~ -180 ℃) according to low temperature range.
By the cryogenic treatment as described above, wear resistance of the material surface can be increased, high mechanical strength can be obtained, and residual stress in the material can be reduced. As a result, various materials can be used to increase the lifetime of the rewritten product. This is due to the complete martensitic transformation of retained austenite and the formation of nano-eta ( h ) carbides.
Korean Patent Laid-Open No. 10-2009-0000957 discloses a technique relating to the above conventional cryogenic temperature treating apparatus.
However, the above conventional cryogenic temperature treatment apparatus is a method in which a refrigerant (such as liquefied nitrogen) at a cryogenic temperature is contained in a chamber, and the material is immersed in a cryogenic refrigerant to quench the refrigerant. In this method, the material directly comes into contact with the refrigerant, and the material is suddenly cooled, and the material is subjected to thermal shock. Therefore, defects may occur in the material during the cryogenic treatment.
Also, since the refrigerant in the chamber is difficult to maintain a stable temperature for a long time, there is a problem in that it is difficult to treat the cryogenic temperature according to various time parameters.
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to provide a cryogenic temperature control system capable of minimizing a thermal shock received by a material through atmosphere control in a chamber, And an object of the present invention is to provide a device.
According to an aspect of the present invention, there is provided a cryogenic temperature treating apparatus comprising: a chamber having a large conical columnar top surface at a central portion thereof; a gas inlet path and a gas discharge path through which cryogenic temperature processing gas is introduced and discharged, A body made of a heat insulating material; A seating part for seating a cryogenic object to be processed at a central portion of the chamber; A gas supply unit for supplying the cryogenic process gas into the chamber using the gas inlet path and the gas outlet path; And a stirring part for stirring the cryogenic process gas introduced into the chamber.
The cryogenic temperature treating apparatus may further include a temperature adjusting unit that adjusts the supply amount of the cryogenic process gas supplied through the gas inlet path to automatically adjust the temperature in the chamber. The temperature controller may include a control valve for controlling the amount of liquefied gas introduced through the gas inlet, a temperature meter for measuring the temperature in the chamber, and a control unit for controlling the temperature of the control valve And a control unit for controlling the opening and closing amount.
The seating part may include a support protruding from an inner wall of the chamber, and a mesh network having a porous structure seated on the support.
Further, it is preferable that the gas inlet passage communicates with the lower portion of the seat portion, and the gas discharge passage communicates with the upper portion of the seat portion.
Also, the stirring part may include a stirring fan disposed below the seating part, the stirring fan rotating to stir the cryogenic temperature gaseous gas, and a driving source for transmitting rotational power to the stirring fan.
In addition, the main body may include a lid provided on the upper side to open and close the inside of the chamber.
According to the cryogenic processing apparatus according to the present invention, the cryogenic processing gas injected into the chamber can be uniformly distributed using the agitating portion, so that the thermal shock received by the object to be cryogenic can be minimized.
In addition, the automatic temperature control using the temperature control part and the excellent heat insulation property enable various cryogenic conditions to be stably maintained for a long time, thereby achieving a uniform cryogenic treatment.
1 is a perspective view showing a cryogenic treating apparatus according to an embodiment of the present invention,
2 is a vertical sectional view of the cryogenic treating apparatus shown in Fig.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to this, terms and words used in the present specification and claims should not be construed as limited to ordinary or dictionary terms, and the inventor should appropriately interpret the concepts of the terms appropriately The present invention should be construed in accordance with the meaning and concept consistent with the technical idea of the present invention.
Therefore, the embodiments described in the present specification and the configurations shown in the drawings are merely the most preferred embodiments of the present invention, and not all of the technical ideas of the present invention are described. Therefore, at the time of the present application, It should be understood that variations can be made.
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a perspective view showing a cryogenic treating apparatus according to an embodiment of the present invention, and FIG. 2 is a vertical sectional view of the cryogenic treating apparatus shown in FIG.
1 and 2, the cryogenic
In the
In the
In addition, the
Meanwhile, the
The
The
The
The agitating
In the present invention as described above, the cryogenic
The
In addition, the
As described above, according to the cryogenic
Also, various temperature conditions can be stably maintained for a long period of time through automatic temperature control using the
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.
10: Cryogenic treatment apparatus 100:
101: chamber 111: gas inlet
112: gas discharge pathway 120: insulation material
130: lid 200:
210: support frame 220: wire mesh
300: gas supply part 400: stirring part
410: stirring fan 420: driving source
500: Temperature regulator 510: Regulating valve
520: Temperature meter 530:
T: cryogenic object
Claims (7)
A seating part for seating a cryogenic object to be processed at a central portion of the chamber;
A gas supply unit for supplying the cryogenic process gas into the chamber using the gas inlet path and the gas outlet path; And
And a stirring portion for stirring the cryogenic process gas introduced into the chamber,
Wherein the gas inlet passage communicates with a lower portion of the seat portion, the gas discharge passage communicates with an upper portion of the seat portion,
Wherein the agitating portion is disposed below the seating portion and moves the cryogenic process gas injected from the gas inlet passage to the upper portion by stirring.
Further comprising a temperature regulator for regulating a temperature of the chamber by regulating a supply amount of the cryogenic process gas supplied through the gas inlet path.
The temperature controller may include:
A regulating valve for regulating the amount of liquefied gas injected through the gas inlet,
A temperature measuring device for measuring a temperature in the chamber,
And a controller for controlling the opening and closing amount of the control valve in correspondence with the temperature measured by the temperature measuring device.
The seat (1)
A support protruding from the inner wall of the chamber,
And a wire net of a mesh structure which is seated on the support and has a porous structure.
An agitation fan rotating to agitate the cryogenic heating gas,
And a driving source for transmitting rotational power to the stirring fan.
The main body includes:
And a lid provided on the upper side to open and close the inside of the chamber.
Priority Applications (1)
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KR1020150079818A KR101673777B1 (en) | 2015-06-05 | 2015-06-05 | Apparatus for achieving the uniform cryogenic treatment |
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KR1020150079818A KR101673777B1 (en) | 2015-06-05 | 2015-06-05 | Apparatus for achieving the uniform cryogenic treatment |
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KR101673777B1 true KR101673777B1 (en) | 2016-11-08 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113621901A (en) * | 2021-08-09 | 2021-11-09 | 中国航空制造技术研究院 | Cryogenic heat treatment device |
KR102446028B1 (en) * | 2022-07-07 | 2022-09-23 | 디에이치 주식회사 | Cryogenic treatment apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4739622A (en) * | 1987-07-27 | 1988-04-26 | Cryogenics International, Inc. | Apparatus and method for the deep cryogenic treatment of materials |
-
2015
- 2015-06-05 KR KR1020150079818A patent/KR101673777B1/en active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4739622A (en) * | 1987-07-27 | 1988-04-26 | Cryogenics International, Inc. | Apparatus and method for the deep cryogenic treatment of materials |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113621901A (en) * | 2021-08-09 | 2021-11-09 | 中国航空制造技术研究院 | Cryogenic heat treatment device |
KR102446028B1 (en) * | 2022-07-07 | 2022-09-23 | 디에이치 주식회사 | Cryogenic treatment apparatus |
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