KR101654043B1 - Method for manufacturing graphene - Google Patents
Method for manufacturing graphene Download PDFInfo
- Publication number
- KR101654043B1 KR101654043B1 KR1020160019552A KR20160019552A KR101654043B1 KR 101654043 B1 KR101654043 B1 KR 101654043B1 KR 1020160019552 A KR1020160019552 A KR 1020160019552A KR 20160019552 A KR20160019552 A KR 20160019552A KR 101654043 B1 KR101654043 B1 KR 101654043B1
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- Prior art keywords
- graphene
- film
- basic cleaning
- cleaning liquid
- cleaning solution
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- C01B31/0469—
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/044—Cleaning involving contact with liquid using agitated containers in which the liquid and articles or material are placed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/12—Carbonates bicarbonates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
The present invention relates to a graphene production method, and more particularly, to a graphene production method capable of producing high quality graphene by washing synthesized graphene through a cleaning process.
As is well known, graphene is a conductive material having a thickness of one layer of atoms, with the carbon atoms forming a honeycomb arrangement in a two-dimensional fashion. It has become an important model for studying various low-dimensional nano phenomena as graphite when accumulated in three dimensions, carbon nanotubes when dried one-dimensionally, and fullerene as a zero-dimensional structure when it is in a ball shape.
Graphene is not only very stable both structurally and chemically, but it is also known to be a very good conductor that can transport electrons 100 times faster than silicon and about 100 times more current than copper. The characteristics of graphene were experimentally confirmed in 2004, when the method of separating graphene from graphite was found.
Graphene is made of only carbon, which is a relatively light element, which makes it very easy to fabricate 1D or 2D nanopatterns, which can control the semiconductor-conductor properties. In addition, by using the variety of chemical bonds of carbon, it is possible to manufacture a wide variety of functional devices such as sensors and memories.
Graphene has the advantage of being able to be synthesized and patterned in a relatively simple manner while having excellent stretchability, flexibility and transparency. In OLEDs and organic solar cells, which are currently under widespread use, the use of conventional inorganic-based electrodes degrades electrode characteristics due to differences in work function of the contact sites. When graphene is used, the work function difference This problem can be solved easily because it is not large. Graphene transparent electrodes are expected to revolutionize the entire next-generation flexible electronic industry technology as well as import substitution effects through the establishment of mass production technology in the future.
Graphene is largely manufactured using mechanical stripping, chemical vapor deposition, epitaxial synthesis, or chemical stripping. Among them, the chemical vapor deposition method can control the number of graphene layers by controlling the type and thickness of the catalyst, the reaction time, the cooling rate, and the concentration of the reaction gas, and has a surface resistance and a transparency Graphene can be produced.
In a simple chemical vapor deposition method, copper or the like to be used as a catalyst layer is deposited on a substrate, and reacted with methane and hydrogen mixed gas at a high temperature of about 1000 degrees Celsius so that an appropriate amount of carbon is dissolved or adsorbed in the catalyst layer. After cooling, the carbon atoms contained in the catalyst layer are crystallized on the surface to form a graphene crystal structure. The graphene thus synthesized can be separated from the substrate by etching the catalyst layer and then used for a desired application.
During the production of graphene by chemical vapor deposition, foreign substances such as etchant ions and organic substances are likely to adhere to the graphene during the etching of the catalyst layer. However, since foreign materials such as organic substances can not be easily removed by a cleaning process using a cleaning liquid such as deionized water, graphene produced by a conventional manufacturing method has a problem of poor quality such as permeability.
Disclosure of Invention Technical Problem [8] Accordingly, the present invention has been made to solve the above problems occurring in the prior art, and it is an object of the present invention to provide a graphene fabrication method capable of effectively removing foreign substances on graphene by washing the graphene synthesized in the graphene production process with a basic cleaning solution .
According to an aspect of the present invention, there is provided a method of manufacturing a graphene comprising the steps of: (a) attaching a graphene to a film; (b) washing the graphene adhering to the film with a basic cleaning solution to remove foreign substances adhering to the graphene; (c) drying the graphene adhered to the film to remove the basic cleaning solution from the graphene; And (d) peeling the graphene from the film.
The basic cleaning liquid may include sodium carbonate (Na2CO3).
The basic cleaning liquid may contain 1-3 wt% sodium carbonate (Na 2 CO 3) and 97-99 wt% deionized water.
The step (b) may include immersing the graphene attached to the film in the basic cleaning solution.
The step (b) may further include flowing the basic cleaning liquid around the graphene immersed in the basic cleaning liquid.
In the step (b), the basic cleaning liquid may be flowed around the graphene by spraying the basic cleaning liquid toward the graphen with a nozzle installed so as to be submerged in the basic cleaning liquid.
The step (b) includes the step of winding the film with the graphene on a drum type jig and immersing the film in the basic cleaning solution, and flowing the basic cleaning solution around the graphene immersed in the basic cleaning solution can do.
In the step (b), the basic cleaning liquid may be flowed around the graphene by spraying the basic cleaning liquid toward the graphen with a nozzle installed so as to be submerged in the basic cleaning liquid.
The step (b) may rotate the drum type jig in which the film is wound to flow the basic cleaning liquid around the graphene.
The method of manufacturing graphene according to the present invention is a method of manufacturing a graphene film by cleaning an organic material such as a resin remaining in the film and graphene by washing the graphene adhered to the film with a basic cleaning liquid or an organic material such as a catalyst metal ion, ) Can be effectively removed. By removing various defects from the graphene, defects can be reduced when transferring the graphene to another substrate, and the transmittance of graphene can be improved.
FIG. 1 is a step-by-step view illustrating a method of manufacturing a graphene according to an embodiment of the present invention.
FIG. 2 is a front view of a process tank containing graphene to illustrate another embodiment of the graphene cleaning process in the method of manufacturing graphene according to the present invention.
Fig. 3 is a side view of the process tank containing graphene to explain the graphene cleaning process shown in Fig. 2. Fig.
Hereinafter, a method of manufacturing graphene according to the present invention will be described in detail with reference to the drawings.
FIG. 1 is a step-by-step view illustrating a method of manufacturing a graphene according to an embodiment of the present invention.
1, the method of manufacturing graphene according to an embodiment of the present invention includes the steps of synthesizing
In the step of synthesizing the
In the graphene synthesis step using the chemical vapor deposition method, first, a
After the synthesis of the
Next, the
After the etching process, a cleaning process is performed to remove defects of the
As the basic cleaning liquid (S), a solution containing various bases may be used. Since a strong basic solution may damage the graphene (10), a weakly basic solution is preferably used. As the basic cleaning liquid (S), a solution containing sodium carbonate (Na2CO3) may be used. Sodium carbonate (Na2CO3) can be added to deionized water to make a basic basic cleaning solution (S). A basic cleaning liquid (S) containing 1 to 3 wt% of sodium carbonate (Na 2 CO 3) and 97 to 99 wt% of deionized water can be used as the basic cleaning liquid (S) capable of improving the cleaning efficiency while preventing damage to the graphene have. The basic cleaning liquid having a sodium carbonate (Na2CO3) content of less than 1 wt% has a poor cleaning efficiency of
The basic cleaning liquid S is caused to flow around the
Organic materials such as resin remaining in the
When the cleaning process is completed, the
Various functional elements can be manufactured by separating the
FIGS. 2 and 3 illustrate graphene fabrication processes according to the present invention, in which graphene process tanks are cut from the front and side surfaces, respectively, in order to explain another embodiment of the graphene cleaning process.
2 and 3, the
During the cleaning process, the
The cleaning method using the
As a method of flowing the basic cleaning liquid S around the
In the case of the graphene manufacturing method using such a cleaning method, the
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. Those skilled in the art will appreciate that numerous modifications and variations can be made in the present invention without departing from the spirit and scope of the appended claims.
10: graphene 20: metal catalyst layer
30, 50:
45, 90: Nozzle 60: Drum type jig
80: Drum type jig driver 82:
S: Basic cleaning liquid
Claims (9)
(b) washing the graphene adhering to the film with a basic cleaning solution to remove foreign substances adhering to the graphene;
(c) drying the graphene adhered to the film to remove the basic cleaning solution from the graphene; And
(d) peeling the graphene from the film,
Wherein the basic cleaning liquid is a mixture of sodium carbonate (Na2CO3) and deionized water.
Wherein the basic cleaning solution contains 1-3 wt% sodium carbonate (Na2CO3) and 97-99 wt% deionized water.
Wherein the step (b) comprises dipping the graphene attached to the film in the basic cleaning solution.
Wherein the step (b) further comprises flowing the basic cleaning solution around the graphene immersed in the basic cleaning solution.
Wherein the step (b) comprises injecting the basic cleaning solution toward the graphene by a nozzle installed so as to be submerged in the basic cleaning solution, thereby flowing the basic cleaning solution around the graphene.
The step (b)
Winding the film with the graphene on a drum type jig and immersing the film in the basic cleaning liquid,
And flowing the basic cleaning liquid around the graphenes immersed in the basic cleaning liquid.
Wherein the step (b) comprises injecting the basic cleaning solution toward the graphene by a nozzle installed so as to be submerged in the basic cleaning solution, thereby flowing the basic cleaning solution around the graphene.
Wherein the step (b) comprises rotating the drum-type jig in which the film is wound to flow the basic cleaning liquid around the graphene.
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KR1020160019552A KR101654043B1 (en) | 2016-02-19 | 2016-02-19 | Method for manufacturing graphene |
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KR1020160019552A KR101654043B1 (en) | 2016-02-19 | 2016-02-19 | Method for manufacturing graphene |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113522816A (en) * | 2021-06-16 | 2021-10-22 | 苏州世沃电子科技有限公司 | Graphene cooling fin cleaning device for smart phone processing and cleaning method thereof |
Citations (3)
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KR20120052648A (en) * | 2010-11-16 | 2012-05-24 | 삼성테크윈 주식회사 | Apparatus for transferring graphene and method for transferring graphene |
JP2013245116A (en) * | 2012-05-23 | 2013-12-09 | Osaka Gas Co Ltd | Graphene sheet aqueous dispersion, method for producing the same, and graphene-containing structure |
KR101560029B1 (en) | 2012-05-07 | 2015-10-26 | 성균관대학교산학협력단 | Direct transfer methods of graphene |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20120052648A (en) * | 2010-11-16 | 2012-05-24 | 삼성테크윈 주식회사 | Apparatus for transferring graphene and method for transferring graphene |
KR101560029B1 (en) | 2012-05-07 | 2015-10-26 | 성균관대학교산학협력단 | Direct transfer methods of graphene |
JP2013245116A (en) * | 2012-05-23 | 2013-12-09 | Osaka Gas Co Ltd | Graphene sheet aqueous dispersion, method for producing the same, and graphene-containing structure |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN113522816A (en) * | 2021-06-16 | 2021-10-22 | 苏州世沃电子科技有限公司 | Graphene cooling fin cleaning device for smart phone processing and cleaning method thereof |
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