KR101642845B1 - Facility for gas treatment - Google Patents

Facility for gas treatment Download PDF

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Publication number
KR101642845B1
KR101642845B1 KR1020160030921A KR20160030921A KR101642845B1 KR 101642845 B1 KR101642845 B1 KR 101642845B1 KR 1020160030921 A KR1020160030921 A KR 1020160030921A KR 20160030921 A KR20160030921 A KR 20160030921A KR 101642845 B1 KR101642845 B1 KR 101642845B1
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South Korea
Prior art keywords
filling layer
target gas
distributor
treatment liquid
liquid
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KR1020160030921A
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Korean (ko)
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지현우
정용원
안의섭
임경인
장근수
황덕윤
이철재
정제호
김학성
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지에스건설 주식회사
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Priority to KR1020160030921A priority Critical patent/KR101642845B1/en
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Publication of KR101642845B1 publication Critical patent/KR101642845B1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/14—Disinfection, sterilisation or deodorisation of air using sprayed or atomised substances including air-liquid contact processes
    • A61L9/145—Disinfection, sterilisation or deodorisation of air using sprayed or atomised substances including air-liquid contact processes air-liquid contact processes, e.g. scrubbing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/14—Packed scrubbers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B63—SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
    • B63B—SHIPS OR OTHER WATERBORNE VESSELS; EQUIPMENT FOR SHIPPING 
    • B63B35/00—Vessels or similar floating structures specially adapted for specific purposes and not otherwise provided for
    • B63B35/44—Floating buildings, stores, drilling platforms, or workshops, e.g. carrying water-oil separating devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B63—SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
    • B63B—SHIPS OR OTHER WATERBORNE VESSELS; EQUIPMENT FOR SHIPPING 
    • B63B35/00—Vessels or similar floating structures specially adapted for specific purposes and not otherwise provided for
    • B63B35/44—Floating buildings, stores, drilling platforms, or workshops, e.g. carrying water-oil separating devices
    • B63B2035/448—Floating hydrocarbon production vessels, e.g. Floating Production Storage and Offloading vessels [FPSO]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Animal Behavior & Ethology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • Ocean & Marine Engineering (AREA)
  • Gas Separation By Absorption (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The present invention relates to a facility for gas treatment, capable of uniformly distributing liquid into a filling layer even in a shaking state. Specifically, according to an embodiment of the present invention, the facility for the gas treatment includes: a treatment liquid introducing part in which treatment liquid for treating target gas is introduced; a gas introducing part in which the target gas is introduced; a first filling layer in which the target gas is introduced inside the first filling layer to encounter with the treatment liquid; a second filling layer in which the target gas is introduced inside the second filling layer to encounter with the treatment liquid which has passed through the first filling layer; a first distributor for distributing the treatment liquid introduced from the treatment liquid introducing part; and a second distributor for distributing the treatment liquid introduced from the first filling layer. In addition, the second distributor includes: a plurality of target gas inlets introducing the target gas from the second filling layer; a treatment liquid outlet for effusing the treatment liquid to the second filling layer; a cover member for preventing the treatment liquid flowing out of the first filling layer from effusing to the target gas inlet; and a partition wall disposed in a space between a plurality of the target gas inlets.

Description

{FACILITY FOR GAS TREATMENT}

The present invention relates to a gas treatment facility.

In the offshore structure, a packing layer such as a distillation tower and an absorption tower to which distillation, absorption, and cooling principles are applied can be installed to remove harmful gases or organic substances generated in oil refining, petrochemical and fine chemical processes. And a gas-liquid contacting device such as a filling layer may be provided. Gas-liquid contact devices are used in the refinery and petrochemical industries for various types of gas treatment. However, the tray is unsuitable due to the flooding of the fluid when the flow of the filling layer occurs, and thus, the packing layer is usually used in an offshore structure, and a structured packing is generally used instead of a random packing. It is widely known that the use of structured packing layers in a packed bed has many advantages when low pressure drop is important.

The performance of the packed bed depends on how uniformly the formation and maintenance of the distribution of liquid downflow and gas upflow that occur locally in the packed bed (gas-liquid contact apparatus). The distribution of the liquid and gas in such a filler layer is influenced by the initial amount of liquid supplied to the filler layer and the individual characteristics of the filler layer.

On the other hand, the filling layer, together with the filling layer, includes a liquid distributor, wherein the initial amount of liquid supplied to the filling layer depends on this liquid distributor. The uniformity of the liquid level in the opening of the liquid distributor is the minimum condition for the flow from the main water inlet to be uniform.

However, in reality, the liquid level of the liquid distributor is uniformly formed, and it is difficult for the liquid distributor to uniformly provide the initial liquid distribution to the filling layer. There are a variety of factors that can affect such as, for example, hydrodynamic resistance in a liquid distributor, misalignment during dispenser installation, and tilting of the fill layer.

In particular, several factors are considered in the design of the liquid distributor installed in the filling layer of the offshore structure. For example, wind, waves and algae cause considerable motion in the packed bed of the ship deck. It is of interest that the packed bed is tilted from the vertical position due to the oscillating motion of the marine structure and the liquid in the liquid distributor is rocked. Conventionally, the uniformity of the liquid level in the liquid distributor can be considerably deteriorated due to the movement of the vessel. If the uniformity of the liquid level becomes worse, the flow from the water inlet becomes uneven and eventually the uniformity of the liquid distributed to the filling layer is poor .

Accordingly, there is a demand for a method in which the liquid in the liquid distributor can be uniformly distributed into the filling layer even if the filling layer is rocked or tilted due to the swinging motion of the sea structure.

Embodiments of the present invention are intended to provide a liquid distributor for a filling layer capable of even distribution of liquid into the filling layer even in the rocking state.

According to an aspect of the present invention, there is provided a plasma processing apparatus including: a processing solution inlet through which a processing solution for processing a target gas flows; A gas inflow portion into which the target gas flows; A first filling layer introduced into the interior of the target gas so as to meet with the processing solution; A second filling layer which is provided so that the target gas flows into the inside and meets the treating solution passing through the first filling layer; A first distributor for distributing the treatment liquid introduced from the treatment liquid inflow portion; And a second distributor for distributing the treatment liquid introduced from the first filling layer, wherein the second distributor comprises: a plurality of target gas inlets into which the target gas flows from the second filling layer; A treatment liquid outlet port through which the treatment liquid flows out into the second filling layer; A cover member for blocking a process liquid flowing from the first filling layer from flowing out to the target gas inlet; And a partition provided in a space between the plurality of target gas inlets.

The object gas inlet is formed upward from the bottom of the second distributor and includes elongated holes extending in one direction, the partition wall staggered with the bottom, and the object gas inlet is extended A gas treatment facility provided in a direction different from the gas treatment facility can be provided.

Also, the partition may be provided with a gas treatment facility provided to be spaced apart from the bottom of the second distributor.

Also, the second distributor may include a column outer plate, and a gas treatment facility may be provided in which a connecting wall is provided between the target gas inlet and the column outer plate.

Further, the treatment liquid outlet may be provided with an elongated member extending upward from the bottom portion, and a gas treatment facility in which a through hole is formed in the side surface of the elongate member.

Also, the height of the partition wall may be lower than the height of the target gas inlet, and may be higher than the height of the through hole.

In addition, the processing solution outlet and the partition wall may be provided in plural, and at least a part of the processing solution outlet and at least a part of the partition wall may be arranged with a predetermined pattern.

Further, a gas treatment facility having an auxiliary plate extending upward may be provided at an edge of the cover member.

According to the embodiments of the present invention, even if the filling layer is inclined, there is an effect that the non-uniform distribution of the liquid due to the fluctuation of the filling layer can be suppressed.

1 schematically shows a gas processing apparatus according to an embodiment of the present invention.
2 is a perspective view of the liquid distributor of Fig.
3 is an exploded perspective view of the liquid distributor of FIG.
4 is a top view of the liquid distributor of Fig.
5 is an enlarged view of a portion A in Fig.
Figure 6 is a side view of the liquid distributor of Figure 2;
Fig. 7 is an enlarged view of a portion B in Fig.
Fig. 8 (a) shows the flow of the process liquid in the liquid distributor provided with the partitions of Fig. 2, and Fig. 8 (b) shows the flow of the process liquid in the liquid distributor without the partitions.
9 is an enlarged view of a top surface of a partition according to another embodiment of the present invention.
10 is an enlarged side view of the partition wall of Fig.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

And terms including ordinals such as first, second, etc. may be used to describe various elements, but the constituent elements are not limited by such terms. These terms are used only to distinguish one component from another. It is also to be understood that when an element is referred to as being "connected" to another element, it may be directly connected to the other element, although other elements may be present in between. Also, the terms used in the present application are used only to describe certain embodiments and are not intended to limit the present invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. It should be noted that the expressions of the upper, lower, side, front, rear, and the like in the present specification are described based on the drawings in the drawings and can be expressed differently when the directions of the objects are changed.

Hereinafter, a gas treatment facility 10 according to an embodiment of the present invention will be described with reference to FIGS. 1 to 8. FIG. 1 is a perspective view of the liquid distributor of FIG. 1, FIG. 3 is an exploded perspective view of the liquid distributor of FIG. 2, and FIG. 4 is a cross- FIG. 5 is an enlarged view of a portion A of FIG. 4, FIG. 6 is a side view of the liquid distributor of FIG. 2, and FIG. 7 is an enlarged view of portion B of FIG. Fig. 8 (a) shows the flow of the process liquid in the liquid distributor provided with the partitions of Fig. 2, and Fig. 8 (b) shows the flow of the process liquid in the liquid distributor without the partitions.

Referring to FIGS. 1 to 8, the offshore structure may include a gas treatment facility 10. The offshore structure may be, for example, an offshore plant, a offshore platform, a floating structure that can be moved at sea, or a vessel, but the idea of the present invention is not limited to the form of an offshore structure.

 The gas treatment facility 10 according to one embodiment of the present invention is installed in the above-described offshore structure. In this gas treatment facility 10, a gas (hereinafter referred to as a "target gas") that requires treatment such as removal of harmful substances may react with a liquid such as a medicine (hereinafter referred to as a "treatment liquid"). As an example, the gas treatment facility 10 may be an absorption tower. The gas treatment facility 10 includes a process liquid inlet 100, a gas inlet 200, a first distributor 300, a first filler layer 400, a second distributor 500, a second filler layer 600, a treatment liquid discharge portion 700, and a gas discharge portion 800.

The processing liquid flows into the gas processing facility 10 through the processing liquid inlet portion 100. The treatment liquid inflow section 100 may include an inflow pipe, a drain section, and a dispensing section. Further, the treatment liquid inflow section 100 may be provided on the upper part of the gas treatment facility 10. [ The treatment liquid inflow section 100 may include a jetting device capable of supplying the treatment liquid to the first distributor 300 and having a pressurizing device and a nozzle for uniform supply of the treatment liquid.

The target gas is introduced into the gas treatment facility 10 through the gas inlet portion 200. The gas inlet 200 may include a blower for transferring the target gas, an inlet pipe and a distributor, and may be provided at a lower portion of the gas processing facility 10. However, this is merely an example, and the present invention is not limited thereto.

The target gas that has undergone the reaction with the treatment liquid in the first filling layer 400 is discharged to the outside of the gas treatment facility 10 through the gas discharge portion 800. The gas discharge unit 800 may include a gas collecting unit and a discharge pipe, and may be provided on the upper part of the gas treatment facility 10. [ However, this is merely an example, and the present invention is not limited thereto.

The first distributor 300 uniformly distributes the treatment liquid introduced from the treatment liquid inflow section 100. The first distributor 300 may be disposed between the processing liquid inlet 100 and the first filling layer 400. The first distributor 300 includes a target gas inlet, a target gas outlet, a processing solution inlet, and a processing solution outlet. The first distributor 300 can uniformly receive the treatment liquid from the treatment liquid inflow section 100 by the pressurizing device and the nozzle of the treatment liquid inflow section 100. Therefore, in the first distributor 300, a uniform distribution of the processing liquid can be relatively easily performed. The treatment liquid uniformly distributed in the first distributor 300 flows to the first filling layer 400 through the treatment liquid outflow portion.

The target gas and the treatment liquid meet each other in the first filling layer 400. The process liquid passing through the target gas in the first filling layer 400 flows to the second distributor 500 through the outflow portion of the first filling layer 400. The first fill layer 400 may include a first fill layer passageway 410 with a gas outlet and a process fluid inlet. Since the first filling layer 400 corresponds to a conventional distillation filling layer for separating a desired substance through gas-liquid contact, detailed description thereof will be omitted. However, the first filling layer 400 may not be provided with a separate pressurizing device or a spraying device for discharging the process liquid. In other words, the processing liquid flowing out of the first filling layer 400 is freely dropped by the force of gravity, so that the processing liquid can flow out to the second distributor 600.

The second distributor 500 receives the treatment liquid discharged from the first filling layer passage 410 of the first filling layer 400. In addition, the second distributor 500 can receive the processing liquid that is introduced from the first filling layer 400, and can distribute the processing liquid to be uniformly introduced into the second filling layer. And the second distributor 500 distributes the treatment liquid dispensed from the first distributor 300 again. In other words, in the second distributor 500, redistribution of the treatment liquid is performed. The second distributor 500 may be provided at a lower portion of the first filling layer 400 so that the processing liquid dropped from the first filling layer 400 may be introduced into the second distributor 500 . In addition, the second distributor 500 may be provided between the first filling layer 400 and the second filling layer 600. The second distributor 500 includes a bottom portion 510 and a columnar plate 520. The column outer plate 520 may function as a side wall of the second distributor 500.

The second distributor 500 may also include a target gas inlet 530, a cover member 540, a process liquid outlet 550, a partition 560 and a connecting wall 570. The components of the second distributor 500 are provided inside the column shell 520 of the second distributor 500.

The target gas is introduced from the second filling layer 600 to the second distributor 500 through the target gas inlet 530. Such a target gas inlet 530 may be provided in a plurality. The object gas inlet 530 may also include an elongate member disposed upwardly from the bottom portion 510 and some or all of the object gas inlet 530 may be disposed such that the elongate member is oriented in one direction . Also, at least two or more target gas inlets 530 may be arranged in parallel. Also, the target gas inlet 530 may be a duct, a channel, or a pipe including an inlet formed in one direction, and the cross-section of the target gas inlet 530 may have a rectangular shape elongated in one direction. However, such a shape is merely an example, and the shape is not limited thereto. Meanwhile, the target gas introduced into the second distributor 500 is discharged from the second distributor 500 through the first filling layer passage 410 of the first filling layer 400.

The cover member 540 prevents the processing liquid from flowing out to the target gas inlet 530 when the processing liquid flows out of the first filling layer 400. The cover member 540 may be provided on the upper portion of the target gas inlet 530 and may cover the target gas inlet 530. An auxiliary plate 541 extending upward from the cover member 540 may be provided at an edge of the cover member 540. The auxiliary plate 541 prevents the process liquid that has fallen on the cover member 540 from bypassing the edge of the cover member 540 and flowing into the lower surface of the cover member 540, It is possible to prevent the flow of the process liquid from dropping into the target gas inlet 530 due to water droplets.

 The cover member 540 is disposed apart from the object gas inlet 530 in order to prevent the entrance of the object gas inlet 530 from being blocked due to the cover member 540. [ For this arrangement, the cover member 540 may be supported by a support 542 connected to the target gas inlet 530, spaced apart from the target gas inlet 530. In other words, for the support of the cover member 540, a support portion 542 may be provided between the target gas inlet 530 and the cover member 540. However, this is merely an example, and the spirit of the present invention is not limited thereto. The cover member 540 is connected to the column outer plate 520 and the column outer plate 520. The cover member 540 is connected to the column outer plate 520 of the second distributor 500 by being formed long in one direction when viewed from above, Lt; / RTI >

The processing liquid flows out of the second distributor 500 through the processing liquid outlet 550. The plurality of processing solution outlets 550 may be provided. The treatment liquid outlet 550 may be formed to extend upward from the bottom portion 510 of the second distributor 500 and the treatment liquid outlet 550 may include an elongate member extending upward from the bottom portion have. For example, the process fluid outlet 550 may be one or more of a duct, a pipe, or an orifice. A through hole 551 may be formed in the treatment liquid outlet 550. The treatment liquid in the treatment liquid outlet 550 may escape through the through hole 551 to the outside. This through hole 551 may be formed, for example, on the side of the process liquid outlet 550. The processing liquid that has escaped from the second distributor 500 flows into the second filling layer 600.

The through hole 551 of the treatment liquid outlet 550 may be formed at a predetermined height h2 from the bottom portion 510. [ The processing liquid 550 separated from the bottom portion 510 is accumulated at a height h2 or more of the through hole 551 and discharged through the through hole 551 until it is accumulated up to the height h2 of the through hole 551 Do not. Further, the height h2 of the through hole may be lower than the height h1 of the treatment liquid outlet 550. On the other hand, the plurality of through holes 551 may be provided in one processing solution outlet 550. When the through hole 551 having the highest position is formed at the height h2 'and the hole 551 having the lowest position is formed at the height h2' ', the height h2' 'May be lower than the height h1 of the treatment liquid outlet 550. Further, the height h4 of the gap may be formed to be lower than the height h2 " of the through hole at the lowest position. Further, when the treatment liquid accumulates at the height h2 '' of the lowest position, it is discharged to the outside of the second distributor 500 through the treatment liquid outlet.

The partition 560 may be disposed in a direction staggered with the bottom portion 510. At the same time, the direction in which the barrier ribs 560 are disposed may be in a direction staggered with the direction in which the target gas inlet port 530 extends. For example, the partition 560 may form an angle of about 90 ° with the bottom portion 510 and may be formed upward from the bottom portion 510. At the same time, it can form an angle of about 90 with the target gas inlet 530. In addition, when a plurality of target gas inflow ports 530 are provided, the barrier ribs 560 may be provided in a space between the plurality of target gas inflow ports 530. The partition 560 is disposed in a direction opposite to the target gas inlet 530 so that the partition 560 can form one or more cells 561 together with the target gas inlet 530. In other words, as shown in FIG. 5, two spaced apart object gas inlets 530 arranged in one direction and two spaced apart partition walls 560 arranged in the other direction can form a cell 561.

Further, the partition 560 may be disposed apart from the bottom portion 510. One or both sides of the partition 560 may be connected to the target gas inlet 530, but the present invention is not limited thereto. The plurality of cells 561 can communicate with each other through the gap 562 formed between the partition wall 560 and the bottom portion 510. In other words, the processing liquid contained in any one of the cells 561 can move to the other cell 561 through the gap 562 between the partition 560 and the bottom portion 510. Further, the partition 560 may be formed from the bottom portion 510 to a predetermined height h3. The height h3 of the partition wall 560 may be lower than the height of the target gas inlet 530 and higher than the height h2 of the through hole of the treatment liquid outlet 550. [ Further, the height h4 of the gap may be formed to be lower than the height h2 of the through hole.

The partition wall 560 and the target gas inlet 530 may form a cell 561 on the second distributor 500 and all or a part of the cell 561 may be formed in a certain pattern. Also, the arrangement of at least some of the process liquid outflow ports 550 in the cell 561 may have a certain pattern. In other words, the cell 561 has a first object gas inlet 531, a second object gas inlet 532 opposed to the first object gas inlet 531, a first partition 563 and a first partition 563, A part or the whole of the process liquid outlet port 550 is connected to the first and second gas inlet ports 531 and 532 and the first and second barrier ribs 563 and 564, And can be disposed apart from each other by a predetermined distance. For example, when four process liquid outlets 550 are disposed in two or more cells 561, the first process liquid outflow port 552 is connected to the first target gas inlet port 531 And may be spaced apart from the first bank 563 by a first distance d1. The second processing liquid outlet 553 is disposed closer to the first object gas inlet 531 than the second object gas inlet 532 and is spaced apart from the second partition 564 by a second distance d2 . The third treatment liquid outlet 554 is disposed closer to the second object gas inlet 532 than the first object gas inlet 531 and is spaced apart from the first partition 563 by a second distance d2 . The fourth treatment liquid outlet 555 is disposed closer to the second object gas inlet 532 than the first object gas inlet 531 and is spaced apart from the second partition wall 564 by the first distance d1 . Here, the first distance d1 may be longer than the second distance d2. The first distance d1 may be shorter than half of the distance d3 between the first barrier rib 563 and the second barrier rib 564. [ The first processing liquid outlet 552 and the second processing liquid outlet 553 may be disposed adjacent to the first target gas inlet 531 and the third processing liquid outlet 554 and the fourth processing liquid outlet 553 may be disposed adjacent to each other. (555) may be disposed adjacent to the second target gas inlet (532).

The connection wall 570 may be provided in a space between the target gas inlet 530 and the column outer plate 520 of the second distributor 500. When the cross-section of the target gas inlet 530 has a shape elongated in one direction, when viewed from above, the connecting wall 570 extends in the same direction as the direction in which the target gas inlet 530 extends . In addition, the connection wall 570 may be formed in a direction staggered with the bottom portion 510. For example, the connecting wall 570 may be disposed parallel to the target gas inlet 530, while the connecting wall 570 may be disposed to form an angle of approximately 90 with the bottom portion 510. In addition, the connecting wall 570 may be spaced from the bottom portion 510. In other words, a gap 562 may be formed between the connection wall 570 and the bottom portion 510.

The target gas and the processing liquid are brought into mutual contact with each other in the second filling layer 600. The treatment liquid that has passed through the target gas in the second filling layer 600 flows to the treatment liquid discharge portion 700. The second filling layer 600 corresponds to a conventional distillation filling layer for separating a desired substance through gas-liquid contact, so that detailed description thereof will be omitted. The gas treatment facility according to the present embodiment can be installed in a marine platform or a ship which requires a uniform liquid distribution even in a rocking state or a tilted state. The second filling layer 600 may be substantially the same as the first filling layer 400 described above and the first filling layer 400 may be provided on the upper portion of the gas processing apparatus 10, 2 filling layer 600 may be provided under the gas processing apparatus 10, but the present invention is not limited thereto. The processing liquid having passed through the target gas in the second filling layer 600 flows out to the processing liquid discharging portion 700 through the outflow portion of the second filling layer 600.

The process liquid discharged from the gas treatment facility 10 through the target gas is discharged through the treatment liquid discharge unit 700. In other words, the target gas can be discharged to the outside of the gas treatment facility 10 through the treatment liquid discharge portion 700. The treatment liquid discharged through the treatment liquid discharge unit 700 is subjected to a reaction with the target gas in the first and second filling layers 400 and 600. The treatment liquid discharging portion 700 may be provided downstream of the second filling layer 600. The treatment liquid discharging portion 700 may include, but is not limited to, a filter and a duct.

The target gas treated by the treatment liquid is discharged from the gas treatment facility 10 through the gas discharge portion 800. In other words, the treatment liquid can be discharged to the outside of the gas treatment facility 10 through the gas discharge portion 800. The target gas discharged through the gas discharging portion 800 is subjected to the reaction with the treatment liquid in the first and second filling layers 400 and 600. The gas exhaust part 800 may be provided on the upper part of the gas treatment facility 10. [ In addition, the gas outlet 800 may include, but is not necessarily limited to, a filter and a duct.

Hereinafter, the operation and effects of the gas treatment facility 10 will be described. The gas processing apparatus 10 includes a processing liquid inlet portion 100 through which the processing liquid flows into the gas processing apparatus 10. The introduced treatment liquid is uniformly distributed in the first distributor 300 and then flows into the first filling layer 400. At this time, the treatment liquid may be uniformly injected into the first distributor 300 through the nozzle and may be introduced into the upper part of the first filling layer 400. The target gas passing through the second filling layer 600 and the second distributor 500 may also flow into the first filling layer 400 through the first filling layer passage 410. At this time, the target gas flowing into the first filling layer 400 is elevated from the second distributor 500 to the first filling layer passage 410. The first filling layer passageway 410 may be provided below the first filling layer 400 so that the upward flow of the target gas is facilitated.

In the first filling layer 400, the process liquid and the target gas are mixed or contacted with each other, and then separated from each other to exit the first filling layer 400. The contact and separation between the target gas and the processing solution in the first filling layer 400 corresponds to the conventional material separation process, and thus a detailed description thereof will be omitted. Thereafter, the treatment liquid and the target gas escape to the outside of the first filling layer 400. The processing liquid that has escaped from the first filling layer 400 through the first filling layer passage 410 flows into the second distributor 500 and the target gas that has escaped from the first filling layer 400 flows into the gas discharging portion 800 to the outside of the gas processing apparatus 10.

The processing liquid discharged from the first filling layer passage 410 may flow into the second distributor 500 and the processing liquid L flowing into the second distributor 500 may drop freely. A part of the processing liquid L falling freely to the second distributor 500 may drop to the bottom part 510 of the second distributor 500 and the rest may fall to the cover member 540 of the second distributor 500 . The cover member 540 prevents the process liquid L from falling to the target gas inlet 530. The processing liquid L that has fallen to the cover member 540 flows to the edge of the cover member 540 and falls to the bottom portion 510 of the distributor 500. [ The processing liquid in the bottom portion 510 is accumulated. The processing liquid L flows from the second distributor 500 through the through hole 551 when the level of the processing solution reaches the height of the through hole 551 of the processing solution outlet 550, I'm going. On the other hand, the target gas G flowing into the second distributor 500 through the target gas inlet 530 rises upward by bypassing the cover member 540. The target gas G escapes from the second distributor 500 through the first filling layer passage 410 of the first filling layer 400.

The treatment liquid L that has flowed into the second distributor 500 is accumulated at a predetermined level in the bottom portion 510. The bottom portion 510 is provided with a partition wall 560. Therefore, even if the gas processing apparatus 10 is oscillated, fluctuation of the processing liquid in the second distributor 500 can be minimized. 8, the liquid level LL of the processing liquid in the second distributor 500 equipped with the partition 560 is the same as the liquid level LL of the processing liquid in the distributor not provided with the partition wall ') Can be formed more uniformly. Therefore, the initial supply of the treatment liquid to the second filling layer 600 can be made uniform.

The treatment liquid passing through the second distributor 500 flows into the second filling layer 600. Meanwhile, the target gas introduced from the gas inlet portion 200 may also flow into the second filling layer 600. For example, the processing liquid passing through the second distributor 500 flows into the upper portion of the second filling layer 600, and the target gas introduced from the gas inlet portion 200 flows into the lower portion of the second filling layer 600 Can be introduced. Since the contact between the target gas and the treatment liquid in the second filling layer 600 corresponds to a conventional material separation process, a detailed description thereof will be omitted. Then, the processing liquid that has passed through the second distributor 500 is discharged to the outside of the gas processing apparatus 10 through the processing liquid discharging portion 700.

In the meantime, although the partition wall 560 has been described as including one wall extending from below to below in the present embodiment, the idea of the present invention is not limited thereto. For example, according to another embodiment of the present invention, it is possible for the partition wall to further include an auxiliary member.

Hereinafter, another embodiment of the present invention will be described with reference to Figs. 9 and 10. Fig. FIG. 9 is an enlarged view of an upper surface of a partition according to another embodiment of the present invention, and FIG. 10 is an enlarged side view of the partition of FIG. In describing another embodiment of the present invention, there is a difference in that the partition wall 560 includes the auxiliary member 565 as compared with the above embodiment. Therefore, Reference numerals are abbreviated.

9 and 10, the partition 560 may include an auxiliary member 565 connected to the partition 560. The auxiliary member 565 may be connected in a direction deviating from the partition wall 560. The auxiliary member 565 may be provided in the cell 561 between the process liquid outlet on the first gas inlet 531 side and the process gas outlet on the second gas inlet 532 side. The auxiliary member 565 is disposed between the first processing solution outlet 552 on the first gas inlet 531 side and the second processing solution outlet 554 on the second gas inlet 532 side .

Further, the auxiliary member 565 can extend in a direction deviating from the direction in which the partition 560 extends. In addition, the auxiliary member 565 may extend from the partition 560 to the first distance d1 or beyond the first distance d1.

The auxiliary member 565 may be provided at a height h5 that is equal to or smaller than the height h2 of the through hole. On the other hand, when the treatment liquid outlet 550 has a plurality of through holes 551, the height h5 of the auxiliary member 565 may be lower than the height h2 '' of the lowest hole. Therefore, when the processing liquid received from the bottom portion is received at a height equal to or higher than the height h5 at which the auxiliary member 565 is provided, the auxiliary member 565 can prevent the fluctuation of the processing liquid.

As described above, in the second distributor according to the present embodiment, the partition wall 560 and the auxiliary member 565 together minimize the fluctuation of the processing liquid in the second distributor 500, thereby suppressing the fluctuation of the processing liquid more easily .

While the present invention has been described with reference to specific embodiments thereof, it should be understood that the present invention is not limited thereto and should be construed as being within the broadest scope of the basic idea disclosed in the present specification . Skilled artisans may implement a pattern of features that are not described in a combinatorial and / or permutational manner with the disclosed embodiments, but this is not to depart from the scope of the present invention. It will be apparent to those skilled in the art that various changes and modifications may be readily made without departing from the spirit and scope of the invention as defined by the appended claims.

10: Gas processing apparatus 100: Process liquid inlet
200: gas inlet 300: first distributor
400: first filling layer 410: first filling layer passage
500: second distributor 510: bottom part
520: column outer plate 530: target gas inlet
531: first object gas inlet port 532: second object gas inlet port
540: cover member 541:
542: Support part 550: Process liquid outlet
551: through hole 552: first processing solution outlet
553: second treatment liquid outlet 554: third treatment liquid outlet
555: fourth processing solution outlet 561: cell
562: Clearance 563: First partition
564: second bulkhead 570: connecting wall
600: second filling layer 700:
800: gas discharge part h1: height of processing solution outlet
h2: height of the through hole h3: height of the partition wall
h4: height of the gap h5: height of the auxiliary member
G: target gas L: treatment liquid

Claims (8)

A treatment liquid inflow portion into which a treatment liquid for treating a target gas flows;
A gas inflow portion into which the target gas flows;
A first filling layer introduced into the interior of the target gas so as to meet with the processing solution;
A second filling layer which is provided so that the target gas flows into the inside and meets the treating solution passing through the first filling layer;
A first distributor for distributing the treatment liquid introduced from the treatment liquid inflow portion; And
And a second distributor for distributing the treatment liquid introduced from the first filling layer,
Wherein the second distributor comprises:
A plurality of target gas inlets into which the target gas flows from the second filling layer;
A treatment liquid outlet port through which the treatment liquid flows out into the second filling layer;
A cover member for blocking a process liquid flowing from the first filling layer from flowing out to the target gas inlet; And
And a partition provided in a space between the plurality of target gas inlets,
The object gas inlet is formed upward from the bottom of the second distributor and includes elongated holes extending in one direction,
Wherein the partition wall is staggered with the bottom portion and is provided in a direction staggered with a direction in which the target gas inlet extends. delete The method according to claim 1,
Wherein the partition is spaced apart from the bottom of the second distributor. The method according to claim 1,
And an auxiliary plate extending upward is provided at an edge of the cover member. The method according to claim 1,
Wherein the second distributor comprises a column shell,
And a connecting wall is provided between the target gas inlet and the column outer plate. The method according to claim 1,
The treatment liquid outlet is provided as an elongated member extending upward from the bottom portion,
And a through hole is formed in a side surface of the elongate member. The method according to claim 6,
Wherein a height of the partition wall is lower than a height of the target gas inlet and is higher than a height of the through hole. The method according to claim 1,
Wherein the processing solution outlet and the partition are provided in plural,
Wherein at least a part of the treatment liquid outlet and at least a part of the partition are arranged with a predetermined pattern.
KR1020160030921A 2016-03-15 2016-03-15 Facility for gas treatment KR101642845B1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0679103A (en) * 1989-12-14 1994-03-22 L'air Liquide Distributor of fluid for exchange of heat and substance particularly in packing column and collumn provided with said distributor
JPH10137531A (en) * 1996-11-14 1998-05-26 Nippon Sanso Kk Liquid collecting and distributing device for packed tower
KR20060134053A (en) * 2004-02-20 2006-12-27 고타베르켄 밀죠 에이비 Scrubber
KR20090019744A (en) * 2007-08-21 2009-02-25 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 Liquid collector and redistributor for packed columns

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0679103A (en) * 1989-12-14 1994-03-22 L'air Liquide Distributor of fluid for exchange of heat and substance particularly in packing column and collumn provided with said distributor
JPH10137531A (en) * 1996-11-14 1998-05-26 Nippon Sanso Kk Liquid collecting and distributing device for packed tower
KR20060134053A (en) * 2004-02-20 2006-12-27 고타베르켄 밀죠 에이비 Scrubber
KR20090019744A (en) * 2007-08-21 2009-02-25 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 Liquid collector and redistributor for packed columns

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