KR101637122B1 - Method of manufacturing planar heating element for high temperature - Google Patents

Abstract

Disclosed is a method for manufacturing a high temperature planar heating element. The method for manufacturing the high temperature planar heating element includes the steps of: forming an insulating layer on a substrate; forming a heat-generating layer on the insulation layer; and forming an electrode on the heat-generating layer. The step of forming the heat-generating layer can include the steps of: preparing a paste containing at least one selected from the group consisting of metal, metal ally, metal oxide, ceramic material and precursor thereof; coating the paste on the insulating layer; drying the coated paste; and irradiating a white light of ultra-short wave to the dried paste to photo-sinter the dried paste. Therefore, the whole process time can be significantly reduced by applying the white light of ultra-short wave in the forming process of the insulating layer. Further, the possibility of mass production of the heating element products can be high, and the big advantage in the reduction of the production cost can be realized, thereby enhancing the competitive price.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method for manufacturing a high-

The present invention relates to a method of manufacturing a high-temperature area heating element, and more particularly, to a method of manufacturing a high-temperature area heating element using a photo-sintering method.

Due to the depletion of energy resources, countries around the world are investing heavily in energy conservation. In line with this trend, surface heating elements, which have recently been emphasized, are 20 ~ 40% less electric power than general electric heating elements, and it is expected that electric energy saving and economic ripple effects will be great.

Generally, the surface heating element utilizes the radiant heat generated by the electric power supply, and it is easy to control the temperature, does not pollute the air, has advantages in hygiene and noise, and has been used in bedding such as heating mat and pad. In addition, it can be applied to various kinds of industrial heating equipment such as floor heating, office and workplace heating of houses, painting and drying, plastic houses, housing facilities, agricultural facilities, automobile gray mulchers, freezing prevention equipment for parking lots, Is widely used.

Especially, the surface heating element has been used recently to replace a lot of housing heating in Europe, and it is being exported not only to the domestic but also to the domestic market as new materials that can be applied to industrial dryer, agricultural product drier, It is evaluated as a product that can be focused on.

Generally, the surface heat generating element is composed of a metal heating element obtained by etching a thin metal plate such as iron, nickel, chromium, or platinum, and a non-metallic heating element such as silicon carbide, zirconium or carbon. However, they have been pointed out that the heat and durability are weak and difficult to manufacture.

Multilayer heating elements in the form of layered products having conductive layers, both of which are insulated with insulating layers, are well known. It also has a heat reflecting layer of metal or metal polymer film on one side of the surface of the heating element. It is known that the conducting layer is fabricated on the basis of coal-fiber paper and the insulating layers are made of thermoplastic polymer film material.

Also known is the method for producing polymeric electro-oven. In the manufacturing process, a conductive layer made of carbon, graphite, modified phenol formaldehyde resin is coated to form a resistance element in such a manner that the insulating substrate is impregnated with an insulating material. Over it, a layer of absorbing epoxy phenol or phenol formaldehyde binder is applied to form an insulating coating and all layers are pressed under appropriate temperature, time and pressure. The resistive element is then heat treated (cured) with the similar resistive elements prior to the resist coating thereon and in a separate form at 130 DEG C to 140 DEG C for 10 to 12 minutes per millimeter of laminate thickness.

Existing surface heating elements were not easy to control the temperature accurately, and even after rising to a certain boiling point temperature, the same power was maintained at the boiling temperature continuously, resulting in excessive energy loss. Therefore, among the surface heating elements, it is required not only to apply a specific power, but also to make it easy to control a specific temperature range while improving the efficiency of power use.

Further, in the manufacturing process of the area heating element, the conventional technique requires a high-temperature heat treatment for firing a metal alloy, a metal oxide, a ceramic material, etc., which requires a long processing time and thus has a limitation in mass production. Also, in order to heat treatment at a high temperature for a long time, an isolated system such as an inner heat insulating material is required, and heat is conducted to the outer wall to increase the temperature, so that contaminants of the outer wall and the inner heat insulating material may be deposited on the surface heating body.

Korean Patent Publication No. 10-2012-0028026

SUMMARY OF THE INVENTION The present invention provides a method of manufacturing a planar heating element using a light sintering method capable of reducing the processing time and increasing the mass production possibility.

According to an aspect of the present invention, there is provided a method of manufacturing a high temperature surface heating element. The method for manufacturing a high temperature surface heating element includes the steps of forming an insulating layer on a substrate, forming a heating layer on the insulating layer, and forming an electrode on the heating layer, Comprising the steps of preparing a paste containing at least one selected from the group consisting of a metal, a metal alloy, a metal oxide, a ceramic material and a precursor thereof, coating the paste on the insulating layer, drying the coated paste And photo-sintering the dried paste by irradiating ultrafine white light to the dried paste.

And the heating layer is formed to a thickness of 10 nm to 1 mm.

The heating layer has a pattern structure. The pattern may include solid, circular, or zigzag shapes.

The metal material, the metal alloy material or the metal oxide material may be at least one selected from the group consisting of Ag, Pd, Li, Na, K, Rb, Cs, (Fe), beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), titanium (Ti), zirconium (Zr), hafnium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), manganese (Mn), technetium (Tc), rhenium (Re) (Au), cadmium (Co), cadmium (Co), rhodium (Rh), iridium (Ir), nickel (Ni), palladium (Pd), platinum (Cd), mercury (Hg), boron (B), potassium (Ca), indium (In), thallium (Ti), silicon (Si), germanium (P), arsenic (As), antimony (Sb), bismuth (Bi), lanthanum (La), naderium (Nd) and praseodymium (Pr) Or oxides of these combinations.

The ceramic material may be any one selected from silicon carbide (SiC), molybdenum silicide (MoSi ₂ ), lanthanum chromite (LaCrO ₂ ), and tungsten carbide (WC).

The step of irradiating the dried paste with extreme ultraviolet-white light and photo-sintering is characterized by irradiating energy of 50 J / cm ² to 60 J / cm ² .

In the step of irradiating the dried paste with extreme ultraviolet light and photo-sintering, the surface resistance value of the sintered exothermic layer is adjusted according to the amount of energy irradiated in the range of 50 J / cm ² to 60 J / cm ² .

In addition, the step of irradiating the dried paste with extreme ultraviolet light and photo-sintering is characterized in that the surface resistance value of the sintered heat generating layer decreases as the amount of energy to be irradiated increases.

The step of irradiating the dried paste with extreme ultraviolet light and photo-sintering may be performed in one step or in several steps.

The step of photo-sintering may include a first step of irradiating the dried paste with preliminary light for preheating or solvent drying, and a step of sintering the particles of the paste And a second step of irradiating light for increasing the crystallinity.

The step of irradiating the dried paste with light of extreme ultraviolet light and photo-sintering may include irradiating light with a light intensity of 0.1 J / cm ² to 80 J / cm ² upon irradiation with light, an irradiation time of 0.01 ms to 10 ms, The pulse gap may be 0.01 ms to 20 ms, and the pulse number may be 1 to 100 times.

According to another aspect of the present invention, there is provided a high temperature surface heating element. The high temperature surface heating element may include a substrate, an insulating layer disposed on the substrate, a heating layer positioned on the insulating layer, and an electrode positioned on the heating layer, wherein the heating layer is formed of a metal, Wherein a paste containing at least one selected from the group consisting of a metal, an alloy, a metal oxide, a ceramic material and a precursor thereof is coated and dried and then photo-sintered by irradiating extreme ultraviolet-white light.

The thickness of the heating layer is 10 nm to 1 mm.

Also, the surface resistance value of the heat generating layer may be 9.93 K? /? To 10.29 K? / ?.

According to the present invention, the extreme ultraviolet light is applied to the heating process of the heat generating layer such as the metal alloy, the metal oxide, and the ceramic, thereby greatly reducing the entire process time. Therefore, since it greatly increases the possibility of mass production of heating element products, it has a great advantage in reducing the production unit cost, so that it can be advantageous in price competitiveness.

In addition, because light sintering is used to convert light energy into thermal energy, nanoparticles, precursors, or pastes of the material that constitutes the heat generating layer can be applied, thereby widening the range of the manufacturing process of the surface heating element.

In addition, because the surface is fired only, a substrate material having a low thermal stability at a high temperature at which firing is performed at 700 ° C or more can be applied, so that the selection range of the substrate on which the heating layer is deposited can be broadened according to the characteristics of the product.

The technical effects of the present invention are not limited to those mentioned above, and other technical effects not mentioned can be clearly understood by those skilled in the art from the following description.

1 is a flowchart illustrating a method of manufacturing a hot surface heating element according to an embodiment of the present invention.
2 is a flowchart showing a step of forming a heat generating layer.
FIG. 3 is a schematic diagram showing a process of forming a heat generating layer by performing a photo-sintering process and a pulse intensity graph of the irradiated light.
4 is a cross-sectional view of a high-temperature surface heating element according to an embodiment of the present invention.
5 is a graph showing the surface resistance value of the heat generating layer formed according to light irradiation energy.
6 is an image of the surface of the heating layer before performing the light sintering.
FIG. 7 is an image of the surface of the heating layer after light sintering at an energy of 10 J / cm ² .
8 is a surface image of the heating layer after light sintering at an energy of 60 J / cm ² .
9 is an image of the surface of the heating layer after light sintering at an energy of 70 J / cm ² .
FIG. 10 is a diagram illustrating a simulation of heat generation on the surface of a LaSrMnO ₃ heat generating layer after photo-sintering at an energy of 50 J / cm ² .
11 is a graph showing the change in crystallinity of the LaSrMnO ₃ heating layer before and after irradiation with light at an energy of 50 J / cm ² .

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

While the invention is susceptible to various modifications and alternative forms, specific embodiments thereof are shown by way of example in the drawings and will herein be described in detail. Rather, the intention is not to limit the invention to the particular forms disclosed, but rather, the invention includes all modifications, equivalents and substitutions that are consistent with the spirit of the invention as defined by the claims.

It will be appreciated that when an element such as a layer, region or substrate is referred to as being present on another element "on," it may be directly on the other element or there may be an intermediate element in between .

Although the terms first, second, etc. may be used to describe various elements, components, regions, layers and / or regions, such elements, components, regions, layers and / And should not be limited by these terms.

The term "high temperature surface heating element " used in the present invention means a surface heating element capable of generating heat at about 600 DEG C or higher.

1 is a flowchart illustrating a method of manufacturing a hot surface heating element according to an embodiment of the present invention.

Referring to FIG. 1, a method of manufacturing a high-temperature area heating element according to an exemplary embodiment of the present invention includes forming an insulating layer on a substrate (S100), forming a heating layer on the insulating layer (S200) And forming an electrode on the layer (S300).

First, an insulating layer is formed on a substrate (S100).

The substrate may be selected from various materials capable of supporting the substrate. Particularly, it is possible to apply a substrate material having a low thermal stability as well as a high-temperature sintering process.

The insulating layer at this time may be any material having heat resistance and insulating properties. For example, the insulating layer can be formed of a nitrogen compound ceramic material such as boron nitride (BN) or aluminum nitride (AlN), or an oxygen compound ceramic such as aluminum oxide (Al ₂ O ₃ ), zirconium oxide (ZrO ₂ ) Or other ceramic material may be used.

Such an insulating layer can be formed using various known methods. For example, an insulating layer can be formed on a substrate by sputtering.

Next, a heat generating layer is formed on the insulating layer (S200).

With reference to the step of forming the heating layer, Fig. 2 will be described as an example. 2 is a flowchart showing the step of forming a heat generating layer.

Referring to FIG. 2, the step of forming a heating layer may include preparing a paste S210, coating the paste on the insulating layer S220, drying the coated paste S230, And irradiating the dried paste with extreme ultraviolet-white light to photo-sinter (S240).

First, a paste is prepared to form a heating layer (S210). Such a paste may include at least one selected from the group consisting of a metal, a metal alloy, a metal oxide, a ceramic material and a precursor thereof.

For example, the metal material, the metal alloy material, or the metal oxide material may be at least one selected from the group consisting of Ag, Pd, Li, Na, K, Rb, Cs, (Fe), beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), titanium (Ti), zirconium (Zr), hafnium (Hf) (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), manganese (Mn), technetium (Tc), rhenium (Re) (Au), silver (Au), gold (Au), silver (Au), silver (Au), silver (Au), osmium (Os), cobalt (Co), rhodium (Rh), iridium (Ir), nickel (Ni), palladium Cadmium, mercury, boron, potassium, indium, thallium, silicon, germanium, tin, lead, (P), phosphorus (P), arsenic (As), antimony (Sb), bismuth (Bi), lanthanum (La), naderium (Nd) and praseodymium Or oxides thereof or oxides thereof.

In addition, the ceramic material may be any one selected from silicon carbide (SiC), molybdenum silicide (MoSi2), lanthanum chromite (LaCrO ₂₎ and tungsten carbide (WC).

Examples of the precursors include lanthanum nitrate, lanthanum acetate, strontium acetate precursor of strontium (Sr), or manganese (Mn), which is a precursor of lanthanum (La) Manganese acetate, a precursor, can be used.

Next, the paste is coated on the insulating layer (S220). For example, the paste may be coated on the insulating layer by performing a spray coating method, a spin coating method, an immersion coating method, a screen printing method, a gravure printing method, or a slit die coating method.

The coating of such a paste can be coated to a thickness of 10 nm to 1 mm. That is, the thickness of the heating layer may be 10 nm to 1 mm. If the thickness of the exothermic layer is less than 10 nm, the exothermic effect may not be sufficiently exhibited, and peeling and cracking may occur due to thermal problems during heat generation. Further, when the thickness of the heat generating layer exceeds 1 mm, the heat generating efficiency may be lowered.

Next, the coated paste is dried (S230).

For example, the coated paste can be dried at a temperature of 120 ° C to 200 ° C.

Then, the dried paste is irradiated with extreme ultraviolet-white light and photo-sintered (S240).

For example, extreme ultraviolet white light emitted from a xenon lamp may be irradiated to a dried paste and photo-sintered. This is because the paste can be sintered while receiving the light energy by the extreme ultraviolet light.

In step S240 of irradiating the dried paste with extreme ultraviolet light and photo-sintering, the intensity of light is 0.1 J / cm ² to 80 J / cm ² , the irradiation time is 0.01 ms to 10 ms, The pulse interval may be 0.01 ms to 20 ms, and the pulse number may be 1 to 100 times.

Particularly, it is possible to set to irradiate an energy of 50 J / cm ² to 60 J / cm ² by adjusting the light irradiation condition.

For example, after the paste containing LaSrMnO ₃ material is coated and dried, the heat generating layer can be formed by photo-sintering by irradiation with energy of 50 J / cm ² to 60 J / cm ² . If an energy of less than 50 J / cm ² is irradiated, the sheet resistance of the heating layer may not be lowered to a desired resistance value. In addition, when energy exceeding 60 J / cm ² is irradiated, the microstructure of the heating layer may be adversely affected, so that the sheet resistance of the heating layer is rather increased. As a result, the desired heating efficiency can not be obtained, have.

Further, the surface resistance value of the sintered heating layer is controlled according to the amount of energy irradiated in the range of 50 J / cm ² to 60 J / cm ² .

In the conventional sintering process by high temperature heat treatment, the surface resistance values for the same material were the same. However, when the light sintering method is performed, the surface resistance value of the sintered heating layer may vary depending on the amount of light energy to be irradiated. Therefore, it is possible to control the surface resistance value of the heat generating layer formed by controlling the amount of light energy irradiated.

For example, in the case of a LaSrMnO ₃ material, the surface resistance value of the sintered exothermic layer can be adjusted according to the amount of energy irradiated in the range of 50 J / cm ² to 60 J / cm ² . In particular, as the amount of energy irradiated from 50 J / cm ² to 60 J / cm ² is increased, the surface resistance value of the sintered heating layer may decrease.

Therefore, by using the same material, a high-temperature planar heating element having various surface resistance values can be produced.

Meanwhile, the step S230 of irradiating the dried paste with extreme ultraviolet-white light and photo-sintering may be performed in a single step or a multi-step.

For example, an example of performing the light sintering step (S230) in multiple steps may include a first step of preliminary light irradiation for preheating or solvent drying and a second step of light irradiation for particle sintering of the paste have.

In the first step of irradiating the preliminary light, it is a step of performing the removal of organic substances through pyrolysis of the paste. For example, such a preliminary light irradiation condition may be a light intensity of 50 J / cm ² , an irradiation time of 10 ms, a pulse interval of 10 ms, and a pulse number of 5 times.

In the second step of light irradiation for sintering the particles of the paste, the intensity of light is 0.1 J / cm ² to 80 J / cm ² , the irradiation time is 0.01 ms to 10 ms, and the pulse gap is 0.01 ms to 20 ms, and the number of pulses can be irradiated under the condition of 1 to 100 times. Particularly, it is possible to set to irradiate an energy of 50 J / cm ² to 60 J / cm ² by adjusting the light irradiation condition.

Referring again to FIG. 1, an electrode is formed on the heating layer (S300). The formation of such an electrode can be performed using various known methods. For example, an electrode can be formed by sputtering.

In addition, the electrode may be electrically connected to the heating layer in parallel in some cases.

FIG. 3 is a schematic diagram showing a process of forming a heat generating layer by performing a photo-sintering process and a pulse intensity graph of the irradiated light.

And a heat generating layer 300 coated on the substrate 100 using a xenon lamp. First, a paste including a heating layer material may be coated on the substrate 100, dried, and photo-sintered using a xenon lamp.

At this time, when the xenon lamp is placed on the substrate as shown in Fig. 3 (a), a reflector may be provided on the upper part of the xenon lamp in order to increase the light irradiation efficiency of the lower part of the xenon lamp. Further, for example, the pulse duration as shown in Fig. 3 (b) can be checked with 10 ms.

Therefore, when the substrate is irradiated with flash light from a xenon lamp, the paste coated by the light energy is sintered to lower the surface resistance value, thereby forming a hot surface heating element.

4 is a cross-sectional view of a high-temperature surface heating element according to an embodiment of the present invention.

4, the high temperature surface heating element according to an exemplary embodiment of the present invention may include a substrate 100, an insulating layer 200, a heating layer 300, and an electrode 400.

4 shows a structure in which an insulating layer 200, a heating layer 300, and an electrode 400 are sequentially stacked on a substrate 100.

The substrate 100 is formed by a photo-sintering process, not a high-temperature sintering process, so that various materials can be used without limitation of the material.

The insulating layer 200 is located on the substrate 100. The insulating layer 200 may be any material having heat resistance and insulating properties. For example, the insulating layer can be formed of a nitrogen compound ceramic material such as boron nitride (BN) or aluminum nitride (AlN), or an oxygen compound ceramic such as aluminum oxide (Al ₂ O ₃ ), zirconium oxide (ZrO ₂ ) Or other ceramic material may be used.

The heating layer 300 is located on the insulating layer 200. The heating layer 300 may use various materials as described above with reference to FIG. For example, the heating layer 300 may include at least one selected from the group consisting of a metal, a metal alloy, a metal oxide, and a ceramic material.

The heat generating layer 300 may be formed by coating and drying a paste containing at least one selected from the group consisting of a metal, a metal alloy, a metal oxide, a ceramic material and a precursor thereof on an insulating layer, . Therefore, since the metal salt can be used as the precursor when the light sintering is used, it is possible to form a heating element using various metals in which the metal salt exists without limiting the specific metal salt. In addition, it has an advantage that various materials can be produced as a heating element through the combination of various metals, metal oxides, or ceramics.

The thickness of the heating layer 300 is 10 nm to 1 mm.

In addition, the surface resistance value of the heat generating layer 300 may be 9.93 K? /? To 10.29 K? / ?. The surface resistance value of the heating layer 300 is controlled according to the amount of light energy irradiated during the light sintering process. For example, the LaSrMnO ₃ heat generating layer can be adjusted to have a surface resistance value of 9.93 K? /? To 10.29 K? /? According to the amount of light energy irradiated during light sintering.

The heating layer 300 may have a pattern structure. For example, the pattern may include a solid shape, a circular shape, or a zigzag shape.

The electrodes 400 may be connected in various known shapes as long as they are electrically connected to the heating layer. For example, the electrode 400 may be located on the heating layer 300 or may be connected in parallel with the heating layer 300.

5 is a graph showing the sheet resistance of a heating layer formed according to light irradiation energy.

Referring to FIG. 5, the result of baking of the LaSrMnO ₃ heating layer using extreme ultraviolet light (Flash light). The surface resistance of the LaSrMnO ₃ heating layer, which had a surface resistance of 20 MΩ / □ before firing, was irradiated with ultrafine white light of 10 J / cm ² to 80 J / cm ² , respectively, to increase the surface resistance from 20 MΩ / □ to 9.93 KΩ / □ The result was shrinking.

In addition, when the ultraviolet ray of 60 J / cm ² was irradiated, the best firing effect was obtained as a result of the surface resistance. When irradiating more than 60 J / cm ^{2 of} energy, the surface resistance value is rather increased.

The result of the above 60 J / cm ² irradiation condition is very similar to the surface resistance of 8 kΩ / □, which is the result of the high temperature calcination at 700 ° C. Thus, the calcination using the extreme white- , It can be said that the same firing effect as the conventional method is exhibited in a very short time.

Further, 50 J / cm ² , The surface resistance of the sintered heating layer may decrease as the amount of energy irradiated at 60 J / cm ² is increased. Therefore, it can be understood that the surface resistance value of the sintered heating layer can be adjusted depending on the amount of energy to be irradiated.

6 is an image of the surface of the exothermic layer before light sintering (before sintering). FIG. 7 is an image of the surface of the heating layer after light sintering at an energy of 10 J / cm ² . 8 is a surface image of the heat generating layer after light sintering at an energy of 60 J / cm ² . 9 is an image of the surface of the heat generating layer after light sintering at an energy of 70 J / cm ² .

6 to 9, it can be seen that the microstructure of the surface of the exothermic layer changes according to the extreme ultraviolet-white light irradiation conditions. When the ultrafine white light having a predetermined energy or more is irradiated to the surface microstructure of the initial heating layer having a dense structure before the extreme ultraviolet-white light irradiation, organic substances existing in the exothermic layer are removed to remove the organic substances present on the surface of the exothermic layer Remains of traces of organisms similar to shape are removed.

Removal of these organic materials is an indispensable process for crystallizing the exothermic layer in a specific crystal direction through light sintering and decreasing the surface resistance. As shown in FIG. 7, when the appropriate light irradiation condition is not applied, Can not be achieved. For this reason, proper setting of the light irradiation condition and proper removal of the organic material are necessary to reduce the surface resistance through light sintering.

FIG. 10 is a diagram illustrating a simulation of heat generation on the surface of a LaSrMnO ₃ heat generating layer after photo-sintering at an energy of 50 J / cm ² .

Referring to FIG. 10, the test was conducted under the conditions of a voltage of 240 V, a current of 3.387 A, a terminal resistance of 70.85? And a power of 813 W.

As a result, when a voltage of 240 V was applied to the LaSrMnO ₃ heating layer, the maximum exothermic temperature was 613 ° C. Therefore, LaSrMnO ₃ produced by photo-sintering In the case of the heating layer, it can be seen that it is heated to a high temperature of 600 ° C or more.

11 is a graph showing the change in crystallinity of the LaSrMnO ₃ heating layer before and after irradiation with light at an energy of 50 J / cm ² .

Referring to FIG. 11, it can be seen that the amorphous layer shows crystallinity before light irradiation on the LaSrMnO ₃ layer. On the other hand, it can be confirmed that crystal growth in a specific perovskite direction is observed after light irradiation at an energy of 50 J / cm ² . It can be said that the increase of the crystallinity has a direct influence on the change of the surface resistance in Fig.

According to the present invention, the extreme ultraviolet light can be applied to the firing step of the heat generating layer such as a metal alloy, a metal oxide, a ceramic, etc., and the entire process time can be greatly reduced. Therefore, since it greatly increases the possibility of mass production of heating element products, it has a great advantage in reducing the production unit cost, so that it can be advantageous in price competitiveness.

In addition, because light sintering is used to convert light energy into thermal energy, nanoparticles, precursors, or pastes of the material that constitutes the heat generating layer can be applied, thereby widening the range of the manufacturing process of the surface heating element.

In addition, because the surface is fired only, a substrate material having a low thermal stability at a high temperature at which firing is performed at 700 ° C or more can be applied, so that the selection range of the substrate on which the heating layer is deposited can be broadened according to the characteristics of the product.

It should be noted that the embodiments of the present invention disclosed in the present specification and drawings are only illustrative of specific examples for the purpose of understanding and are not intended to limit the scope of the present invention. It will be apparent to those skilled in the art that other modifications based on the technical idea of the present invention are possible in addition to the embodiments disclosed herein.

100: substrate 200: insulating layer
300: heat generating layer 400: electrode

Claims (15)

Forming an insulating layer on the substrate;
Forming a heating layer on the insulating layer; And
Forming an electrode on the heating layer,
The step of forming the heating layer may include:
Preparing a paste comprising at least one selected from the group consisting of a metal, a metal alloy, a metal oxide, a ceramic material and a precursor thereof;
Coating the paste on the insulating layer;
Drying the coated paste; And
Irradiating the dried paste with extreme ultraviolet light and photo-sintering the paste,
The step of photo-sintering the dried paste by irradiating extreme ultraviolet-
A first step of irradiating preliminary light for preheating or solvent drying; And
And a second step of irradiating light to sinter the particles of the paste. The method according to claim 1,
Wherein the heating layer is formed to a thickness of 10 nm to 1 mm. The method according to claim 1,
Wherein the heating layer has a pattern structure. The method of claim 3,
Wherein the pattern includes a solid shape, a circular shape, or a zigzag shape. The method according to claim 1,
The metal, the metal alloy or the metal oxide may be at least one selected from the group consisting of Ag, Pd, Li, Na, K, Rb, Cs, (Ba), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), manganese (Mn), technetium (Tc), rhenium (Re), iron (Fe), ruthenium (Ru), osmium (Co), Rh, Rh, Ni, Pd, Pt, Cu, Ag, Au, Cd, (H), boron (B), potassium (Ca), indium (In), thallium (Ti), silicon (Si), germanium (Ge), tin (Sn), lead (Pb) , A combination of at least one of arsenic (As), antimony (Sb), bismuth (Bi), lanthanum (La), naderium (Nd) and praseodymium (Pr) Wherein the oxide is an oxide of a transition metal element. Forming an insulating layer on the substrate;
Forming a heating layer on the insulating layer; And
Forming an electrode on the heating layer,
The step of forming the heating layer may include:
Preparing a paste containing at least one selected from the group consisting of a ceramic material and a precursor thereof;
Coating the paste on the insulating layer;
Drying the coated paste; And
Irradiating the dried paste with extreme ultraviolet light and photo-sintering the paste,
Wherein the ceramic material is any one selected from the group consisting of silicon carbide (SiC), molybdenum silicide (MoSi2), lanthanum chromite (LaCrO2), and tungsten carbide (WC). The method according to claim 6,
Wherein the step of irradiating the dried paste with extreme ultraviolet light and photo-sintering is performed by irradiating energy of 50 J / cm ² to 60 J / cm ² . The method according to claim 6,
In the step of irradiating the dried paste with extreme ultraviolet light and photo-sintering, the surface resistance value of the sintered heat generating layer is controlled according to the amount of energy irradiated in a range of 50 J / cm ² to 60 J / cm ² Wherein the method comprises the steps of: 9. The method of claim 8,
Wherein the step of irradiating the dried paste with light of extreme ultraviolet light and photo-sintering decreases the surface resistance value of the sintered heat generating layer as the amount of energy to be irradiated is increased. delete delete The method according to claim 6,
The step of irradiating the dried paste with light of extreme ultraviolet light and photo-sintering may include irradiating light with a light intensity of 0.1 J / cm ² to 80 J / cm ² upon irradiation with light, an irradiation time of 0.01 ms to 10 ms, Wherein the pulse interval is 0.01 ms to 20 ms and the pulse number is 1 to 100 times. Board;
An insulating layer disposed on the substrate;
A heating layer disposed on the insulating layer; And
And an electrode positioned on the heating layer,
Wherein the heat generating layer is formed by coating a paste containing at least one selected from the group consisting of a ceramic material and a precursor thereof on the insulating layer and then sintering the paste by irradiating extreme ultraviolet and white light,
Wherein the ceramic material is any one selected from the group consisting of silicon carbide (SiC), molybdenum silicide (MoSi ₂ ), lanthanum chromite (LaCrO ₂ ), and tungsten carbide (WC). 14. The method of claim 13,
Wherein the thickness of the heating layer is 10 nm to 1 mm. 14. The method of claim 13,
Wherein a surface resistance value of said heating layer is 9.93 K? /? To 10.29 K? / ?.

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