KR101634797B1 - Photo mask transfering system - Google Patents

Photo mask transfering system Download PDF

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Publication number
KR101634797B1
KR101634797B1 KR1020150040840A KR20150040840A KR101634797B1 KR 101634797 B1 KR101634797 B1 KR 101634797B1 KR 1020150040840 A KR1020150040840 A KR 1020150040840A KR 20150040840 A KR20150040840 A KR 20150040840A KR 101634797 B1 KR101634797 B1 KR 101634797B1
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KR
South Korea
Prior art keywords
photomask
loading
pressure
unit
shipping box
Prior art date
Application number
KR1020150040840A
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Korean (ko)
Inventor
김선각
최길웅
Original Assignee
주식회사 네오세미텍
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Priority to KR1020150040840A priority Critical patent/KR101634797B1/en
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Publication of KR101634797B1 publication Critical patent/KR101634797B1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0331—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers for lift-off processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773—Conveying cassettes, containers or carriers

Abstract

The present invention a photo mask transferring system to effectively automate a photo mask loading system to prevent a haze generated in a photo mask used for a semiconductor manufacturing process. The photo mask transferring system comprises: a packing conclusion device to pack and load the packed photo mask; a transferring device to automatically transfer the packed photo mask from the packing conclusion device; and an air conditioning device to maintain an atmosphere inside the packing conclusion device and the transferring device as a nitrogen atmosphere and to equally maintain pressure of the packing conclusion device and the transferring device. The photo mask transferring system recognizes and equally maintains external pressure and internal pressure by using a sensor when the photo mask is inserted into the transferring device and the packing conclusion device. Therefore, the photo mask transferring system provides an effect capable of reducing a waiting time in the mass production of a wafer by removing a bending generated in a pellicle.

Description

[0001] PHOTO MASK TRANSFERING SYSTEM [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photomask transfer system for preventing bending phenomenon of a pellicle, which is a film for protecting a pattern (Reticle, Photo Mask, Mask), and haze of a surface of a photomask, When a pellicle bending phenomenon occurs, a photomask is applied to the exposure equipment of the semiconductor manufacturing process, and when the IRIS of the photomask surface is executed, if the bending phenomenon occurs, an error occurs (error occurs) The haze of the surface of the photomask, which is caused by the haze phenomenon of the surface of the photomask, which is a circuit substrate in the exposure equipment of the semiconductor manufacturing process, Chip defect phenomenon is accompanied. The wafer chip defect is caused by the haze phenomenon of the photomask, that is, the circuit pattern In order to prevent pellicle bending phenomenon and haze phenomenon, it is necessary to efficiently automate the photomask stacking system to prevent the pellicle bending phenomenon and the haze phenomenon, as the sharpness of the wafer pattern is low due to the transmittance of a laser or a light source, To a photomask transfer system having a function of preventing a pellicle banding phenomenon and a function of cutting off unnecessary gas ions which is a source of a haze phenomenon.

In general, a reticle refers to a photomask used in exposure equipment for a semiconductor process, and is a circuit board for producing a large number of semiconductor chips on a wafer. A large number of semiconductor chips are completed by exposing an original plate of a semiconductor circuit and reducing the original plate of the circuit using an optic to form a circuit pattern received on the wafer.

1 is a view showing the structure of a conventional photomask. Referring to FIG. 1, a photomask 10 used in an exposure apparatus includes a quartz substrate 20 having a circuit pattern (not shown) for shielding light on one surface thereof, and a quartz substrate 20 for attaching a pellicle A pellicle frame (30) (30), and a pellicle (32) in the form of a transparent film attached to the pellicle frame (30).

The pellicle frame 30 and the pellicle 32 are provided on the surface of the quartz substrate 20 on which the circuit pattern is formed so as to prevent particles from adhering to the circuit pattern. The shape of the broken line of the particle shape is irradiated to cause a pattern defect on the wafer. In addition, if a haze phenomenon occurs in the photomask circuit pattern, it causes a defect on the wafer circuit as well. An air hole 31 is formed on the side surface of the pellicle frame 30 so as to communicate with the outside air to prevent bending phenomenon of the pellicle due to temperature or atmospheric pressure.

The air holes 31 control the pressure in the pellicle 32 and serve to discharge the gas generated from the bonding surface of the pellicle 32 or the glass substrate 20 to the outside. The air hole 31 is formed not only by discharging gas from the inside of the pellicle 32 but also by discharging carbon dioxide (CO 2 ), ammonia (NH 3 ), nitrogen dioxide (NO 2 ), sulfurous acid gas (SO 2 ) SO 4 ) and the like serve as passages for entering the inside of the pellicle 32. If such a gas enters the pellicle 32 from the outside and is frequently exposed to the exposure light, a chemical reaction is caused to generate a salt in the vicinity of the circuit pattern 21, causing a haze defect, There is a problem in that the shape of the circuit pattern 21 in the circuit pattern 21 is deformed.

The haze generated in the above-described photomask is generated when the photomask is transported and loaded in a general environment (oxygen, nitrogen, carbon dioxide, etc.), particularly at the time of transport, loading and packaging . In addition, outgassing exists in the photomask storage box, the clip for fixing the box, and the packaging paper for packaging the storage box, which may cause haze phenomenon.

There is also a problem that labor is lost due to loading, transfer, stacking and packaging of the photomask depending on the manpower of a series of processes.

In order to eliminate such haze, the salt generated in the vicinity of the circuit pattern 21 can be cleaned with a water-soluble solution. However, when cleaning is performed, a failure occurs in the circuit pattern 21 of the photomask, There is a problem that manpower is wasted.

2 is a cross-sectional view of a photomask for explaining that bending occurs in a pneumatic pressure condition in general. Referring to FIG. 2, when the photomask 10 flowing out to the outside is introduced into the transfer device and the package unit (trans unit and stocker unit), the external pressure and the internal pressure are different and the pellicle 32 A bending banding phenomenon occurs. Therefore, the shipped photomask 10 is subjected to an IRIS (Internal Rotary Inspection System) inspection just before the wafer is produced, and an inspection error due to the banding of the pellicle 30 may occur during the inspection. That is, the pellicle 30 can not be used immediately and the bellied pellicle 30 must be restored to a normal state for about two hours.

SUMMARY OF THE INVENTION Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art, and it is an object of the present invention to provide a transfer device and a package fastening device that can be integrated in a single device so that internal pressure and external pressure, The present invention aims to provide a photomask transfer system which can reduce the waiting time at the time of mass production of wafers by allowing bending occurring in the pellicle to be eliminated by allowing the external pressure and the internal pressure to be recognized and kept the same.

In addition, the present invention automatically performs a series of operations (transport and packaging) in a space where the photomask is transported and packed in a work space, that is, the inside of the apparatus is present only in the most stable N2 (99% In order to prevent the haze phenomenon by blocking the gas absorption on the surface of the photomask and the gas inflow into the pellicle, a box for storing the photomask, a clip for fixing the box, and a packaging paper containing the tightened box are generated in the parts through heating And a source of the haze phenomenon is removed in advance by forcibly discharging the exhaust gas to the photomask transfer system.

Another object of the present invention is to provide a photomask transfer system in which transferring, box fastening, and packaging operations are constituted by a single integrated device, thereby improving work efficiency, loss due to operator error, and production maximization.

According to an aspect of the present invention, there is provided a photomask transfer system comprising: a loading unit for loading materials necessary for photomask packaging; A package fastening device for packaging the photomask in a shipping box; A transfer device for automatically transferring the packaged photomask between the package fastening device and the loading part; And an air conditioning device for maintaining the atmosphere inside the package fastening device and the transfer device in a nitrogen atmosphere and keeping the pressure of the package fastening device and the transfer device equal to the external pressure.

Further, the package fastening apparatus according to the present invention includes: a loading section for loading a padded package with a photomask; An opening portion for opening the pad transferred from the loading portion; A fastening part for inserting the photomask into the shipping box, covering the photomask inserted in the shipping box with a lid, and fastening the clip transferred from the loading part to the four corners of the packed shipping box; A plastic bag packaging unit for packing the shipping box into plastic bags; And an unloading unit for withdrawing the shipping box transferred from the plastic bag packing unit.

Wherein the loading section comprises: a box loading section for loading the shipping box; A clip loading unit for loading the clip for fixing to the edge of the shipping box; And a vinyl pack loading unit for loading the vinyl pack. The heating unit and the heating unit for removing the gas are respectively provided at upper and lower portions of the box loading unit, the clip loading unit, and the vinyl pack loading unit, And a cooling unit for performing the cooling operation.

The transfer device includes: an arm which can grasp and lift the photomask; And a robot for moving the photomask sequentially between the loading part, the opening part, the heating part, the cooling part, the insertion part, the plastic packing part, and the unloading part, And a rail.

The air conditioner includes: a pressure sensor unit for sensing pressure inside and outside; A nitrogen supply valve for supplying nitrogen according to a pressure sensed by the pressure sensor; A discharge unit for discharging the air inside the photomask automatic loading system according to the pressure sensed by the pressure sensor unit; And a control unit for receiving the pressure information from the pressure sensor unit and controlling the amount of nitrogen introduced through the nitrogen supply valve and the amount of the nitrogen discharged to the discharge unit so that the pressure inside and outside the photomask automatic loading system are equal to each other .

Wherein the control unit adjusts the pressure by operating the fan when the pressure of the photomask automatic loading system is high and controls the amount of nitrogen introduced by opening the valve of the nitrogen supply valve when the nitrogen ratio of the photomask automatic loading system is low And the amount is adjusted and kept constant.

The photomask transfer system according to the present invention having the above-described structure can recognize the external pressure and the internal pressure using the sensor when the photomask is drawn into the transfer device and the package fastener, So that it is possible to reduce waiting time at the time of wafer production.

In addition, the photomask transfer system of the present invention automates the transfer device and the inside of the package fastening apparatus in a nitrogen atmosphere to prevent haze from occurring, and at the same time, It prevents the phase and provides the effect of making quick work without depending on manpower.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view showing the structure of a conventional photomask. FIG.
FIG. 2 is a cross-sectional view of a photomask for explaining that a photomask generally undergoes banding under external air pressure conditions. FIG.
3 is a system configuration diagram schematically showing the configuration of a photomask automatic loading system for preventing haze prevention and pellicle banding according to an embodiment of the present invention.
4 is a block diagram showing a configuration of a transporting device and a package fastening device of FIG. 3 according to an embodiment of the present invention;
5 is a schematic view of the configuration of the air conditioning system of FIG. 3 according to an embodiment of the present invention.
FIG. 6 is a table comparing a conventional photomask transfer system according to an embodiment of the present invention. FIG.

Embodiments in accordance with the concepts of the present invention can make various changes and have various forms, so that specific embodiments are illustrated in the drawings and described in detail in this specification or application. It is to be understood, however, that it is not intended to limit the embodiments according to the concepts of the present invention to the particular forms of disclosure, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

It is to be understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between. Other expressions that describe the relationship between components, such as "between" and "between" or "neighboring to" and "directly adjacent to" should be interpreted as well.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, the terms "comprises ",or" having ", or the like, specify that there is a stated feature, number, step, operation, , Steps, operations, components, parts, or combinations thereof, as a matter of principle.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a detailed description of preferred embodiments of the present invention will be given with reference to the accompanying drawings. In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings showing embodiments of the present invention.

3 is a system configuration diagram schematically showing a configuration of a photomask automatic loading system for preventing haze according to an embodiment of the present invention. 3, the photomask transfer system according to the present invention includes a package fastening apparatus 100, a transfer apparatus 200, a package fastening apparatus 100, a transfer apparatus 200, And an air conditioner 300 for controlling the internal pressure.

The package fastening apparatus 100 packages the manufactured photomask in an automated procedure in a nitrogen atmosphere.

The transfer device 200 transfers or transports the photomasks packaged between the package fasteners 100 according to an automated algorithm.

The air conditioning apparatus 300 holds the package fastening apparatus 100 and the transfer apparatus 200 in a nitrogen atmosphere. For example, the air conditioning apparatus 300 maintains the atmosphere in the package fastening apparatus 100 and the transfer apparatus 200 in a nitrogen atmosphere of 99% or more in the same pressure state as the external pressure.

FIG. 4 is a block diagram showing the configuration of the transporting device and the package fastening device of FIG. 3 according to an embodiment of the present invention. 4, the package fastening apparatus 100 includes a loading unit 102, an opening 104, a heating unit 106, a cooling unit 108, a fastening unit 112, a clip loading unit 114, And a unloading unit 122. The transfer device 200 includes an arm 210 and a robot rail 220, , And all such devices are controlled by the control unit 240.

The loading unit 102 draws a pod having a photomask thereon for loading into the package fastening apparatus 100. At this time, the position of the loading part 102 where the fade is arranged is arranged at a designated position where the arm 210 can transport the photomask along the robot rail 220 in the package fastening device 100. At this time, one side of the loading unit 102 is configured to be openable and closable so that the photomask manufactured from the outside can be closed after being pulled into the inside of the package fastening apparatus and the transfer apparatus 200.

When the fade is transferred by the arm 210 from the loading unit 102, the opening 104 is opened to expose the photomask.

On the other hand, the incoming shipping box has a heating portion 106 for heating and removing harmful liquid or gas contained in the solvent and the shipping box contained in the shipping box. For example, the heating unit 106 generates electric heat to burn gas such as a solvent contained in the shipping box for packaging the photomask. The heating unit 106 is fixed and configured so that the loaded shipping box is placed.

The cooling portion 108 is formed on the upper portion of the heating portion 106. The heating unit 106 is configured such that when the shipping box in a heated state in the heating unit 106 is transported by the arm 210 and the robot rail 220, Lower the heat of. The cooling unit 108 lowers the temperature of the shipping box to make it in a state of being able to be packed.

When the photomask is packed by the shipping box, the clip loading unit 114 loads a clip for fixing to the four corners of the shipping box. When the clip is fastened, the clip is tightened while rotating the shipping box on which the photomask is placed, so that the clip can be fastened to all four corners.

The vinyl pack loading portion 118 loads the vinyl pack for vinyl packing of the shipping box fixed by the clip.

The box loading section 120 loads the shipping box for packing the box of the reticle into the shipping box.

On the other hand, a heating part (not shown) and a cooling part (not shown) are formed on the top and bottom of the clip mounting part 114, the vinyl pack mounting part 118 and the box mounting part 120, respectively. The heating portion discharges the gases in the clip loading portion 114, the vinyl pack loading portion 118, and the box loading portion 120 from the packaging material. The cooling part can discharge the gas discharged by the heating to the outside and cool the heat of the heated clip mounting part 114, the vinyl pack mounting part 118 and the box mounting part 120.

When the coupling part 112 is transferred from the cooling part 108 to the arm 210 and the robot rail 220, the coupling part 112 is inserted into a shipping box for packaging the photomask. The shipping box is formed in the form of a container so that the transferred reticules can be individually inserted into the pack and then wrapped and packed. The fastening part 112 covers the photomask contained in the box for shipment and covers the lid. In addition, the fastening part 112 receives the clip from the clip mounting part 114, and rotates the packed shipping box, thereby fastening the clip to the four corners to seal the clip. The clip is in the form of a band with elasticity and fastened in the diagonal direction of the four corners of the pack to bind and seal the shipping box and the lid of the shipping box. The robot arm is automatically placed in the photomask container by using a robot arm (not shown) or the like so as to cover the photomask container for exposure. It can be concluded.

The vacuum packaging section 116 covers the vinyl package wrapped in the shipping box sealed by the clip conveyed by the arm 210 and the robot rail 220 from the clip loading section 114 and then the air inside the vinyl package is taken out And pack it tightly. The vacuum packaging unit 116 can be packed while holding the shipping box and rotating the shipping box at the time of packaging.

The shipping boxes loaded in the box loading section 120 are transferred to the unloading section 122 by the arm 210 and the robot rail 220 by the operator's command. The unloading unit 122 can be opened and closed at one side like the loading unit 102 so that photomasks that are automatically packaged and transported inside can be taken out of the package fastening apparatus and the transfer apparatus 200 have.

The arm 210 is controlled to move on the robot rail 220 under the control of the control unit 240. That is, the arm 210 holds the photomask or shipping box according to each step in accordance with the control of the control unit 240 and controls the loading unit 102, the opening unit 104, the heating unit 106, The vinyl packing unit 118, the box loading unit 120, and the unloading unit 122 are sequentially moved while moving the cartridge loading unit 108, the coupling unit 112, the vinyl pack packing unit 116, the clip loading unit 114, the vinyl pack loading unit 118, .

The robot rail 220 is rotated by the control unit 240 so that the arm 210 rotates the loading unit 102, the opening unit 104, the heating unit 106, the cooling unit 108, the coupling unit 112, The clip loading unit 114, the vinyl pack loading unit 118, the box loading unit 120, and the unloading unit 122. The unloading unit 122 is provided with a moving path that can be sequentially moved. That is, both the arm 210 and the robot rail 220 play a role of holding the photomask under the control of the controller 240 and sequentially arranging the photomask at a corresponding position of the loading unit 102.

The control unit 240 controls the transfer of the photomask by controlling the arm 210 and the robot rail 220 and controls the transfer of the photomask to / from the outside through the loading unit 102 or the unloading unit 122, And the like.

The control unit 240 controls the opening of the opening of the opening 104. Further, the heating time and the heating temperature of the heating unit 106 are controlled. The controller 240 controls the cooling time and the cooling temperature of the cooling unit 108. The control unit 240 controls the coupling unit 112 to enclose the photomask in the shipping box and to seal the four corners of the shipping box with a clip and to package the shipping box in which the plastic package unit 116 is packed, So as to be vacuum-packed.

FIG. 5 is a view schematically showing a configuration of the air conditioning system of FIG. 3 according to an embodiment of the present invention. Referring to FIG. 5, the air conditioning apparatus 300 of the present invention is characterized by including pressure sensors 302, 304, and 306, a discharge unit 310, and a control unit 240.

The pressure sensors 302 and 306 include a first pressure sensor 302 and a second pressure sensor 306.

The first pressure sensor 302 is disposed outside the photomask automatic loading system and detects the pressure outside the photomask automatic loading system.

The second pressure sensor 306 is disposed on one side of the package fastening device 200 and detects the pressure inside the package fastening device 100. And is preferably disposed at a central portion of the package fastening apparatus 100.

If the pressure inside the automatic photomask packaging system is high according to the pressure information inputted from each of the pressure sensors 302 and 306, the control unit 240 operates the fan through the discharging unit 310, And when the pressure of the photomask automatic loading system is low, the valve of the nitrogen supply valve 308 is opened to increase the amount of nitrogen introduced to keep the pressure constant. As described above, the first pressure sensor 302 senses the external pressure of the photomask automatic loading system, and the second pressure sensor 306 senses the pressure inside the package fastening apparatus 100. At this time, since the nitrogen is drawn in the automatic packaging system of the photomask and the nitrogen is drawn out again, the pressure difference may occur even in the closed area. Therefore, the controller 240 may include pressure sensors (Not shown) to measure an internal pressure value, calculate an average value of the pressure value, and recognize the pressure value inside the photomask automatic loading system.

FIG. 6 is a table comparing a conventional photomask transfer system according to an embodiment of the present invention. Referring to FIG. 6, the photomask transfer system of the prior art requires 21 steps by gravity, whereas the photomask transfer system of the present invention takes two steps by gravity. First, a step in which the user draws the photomask into the loading section and a step in which the user fetches the packaged photomask from the unloading section 122 are processed by the user.

Although the prior art photomask loading system requires at least three people, the photomask loading system of the present invention requires one person. That is, a worker is a step of inserting a photomask into the loading unit, and the user takes a process of pulling out the packaged photomask from the unloading unit.

Since the photomask loading system of the related art works in an open space rather than at least a closed space, haze may be generated by exposure to ammonia (NH 3 ) and sulfate ions (SO 4 ), etc. However, in the photomask automatic loading system of the present invention Haze can be prevented by working in a confined space in a nitrogen atmosphere at the same pressure as the outside air.

The prior art photomask loading system does not have an air venting system because it works in at least an open space, but in the automatic photomask loading system of the present invention, Haze can be prevented.

In the description of the present invention, the control unit 240 controls the package fastening apparatus 100, the conveying apparatus 200 and the air conditioner 300. However, in actual implementation, The processor may be separately configured to control the package fastening apparatus 100, the transfer apparatus 200, and the air conditioner 300. [

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. will be. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

100: package fastening device 102: loading part
104: opening part 106: heating part
108: cooling unit 110:
112: fastening part 114: clip mounting part
116: Vinyl pack packing part 118: Vinyl pack loading part
120: box loading part 122: unloading part
200: transfer device 210: arm
220: robot rail 240:
300: air conditioner 302, 304, 306: sensor
308: Nitrogen supply valve 310:

Claims (6)

A loading section for loading materials necessary for photomask packaging;
A package fastening device for packaging the photomask in a shipping box;
A transfer device for automatically transferring the packaged photomask between the package fastening device and the loading part; And
And an air conditioning device for maintaining the atmosphere inside the package fastening device and the transfer device in a nitrogen atmosphere and keeping the pressure of the package fastening device and the transfer device equal to an external pressure,
The package fastening device includes:
A loading unit for loading a padded photomask;
An opening portion for opening the pad transferred from the loading portion;
A fastening part for inserting the photomask into the shipping box, covering the photomask inserted in the shipping box with a lid, and fastening the clip transferred from the loading part to the four corners of the packed shipping box;
A plastic bag packaging unit for packing the shipping box into plastic bags; And
And an unloading unit for unloading the shipping box transferred from the plastic packaging unit.
delete The image forming apparatus according to claim 1,
A box loading section for loading the shipping box;
A clip loading unit for loading the clip for fixing to the edge of the shipping box;
And a vinyl pack loading unit for loading the vinyl pack,
Wherein the box mounting part, the clip mounting part, and the vinyl pack mounting part are provided with a heating part for removing gas and a cooling part for cooling the heated heat and discharging the removed gas, respectively. Transfer system.
The image forming apparatus according to claim 1,
An arm which can grasp and lift the photomask; And
The photomask held by the arm is provided to the arm so as to sequentially transfer the photomask between the loading section, the opening section, the heating section, the cooling section, the insertion section, the vinyl pack packaging section, and the unloading section And a robot rail.
The air conditioner according to claim 1,
A pressure sensor unit for sensing pressure inside and outside;
A nitrogen supply valve for supplying nitrogen according to a pressure sensed by the pressure sensor;
A discharge unit for discharging the air inside the photomask automatic loading system according to the pressure sensed by the pressure sensor unit; And
And a control unit for receiving the pressure information from the pressure sensor unit and controlling the amount of nitrogen introduced through the nitrogen supply valve and the amount discharged to the discharge unit so that the pressure inside and outside of the photomask automatic loading system are equal to each other Wherein the photomask transfer system comprises:
6. The apparatus of claim 5,
Adjusting the pressure by operating the fan when the pressure of the photomask automatic loading system is higher than the external pressure, and adjusting the pressure of the nitrogen supply valve when the nitrogen ratio of the photomask automatic loading system falls below 99% To increase the amount of nitrogen introduced into the photomask transfer system.
KR1020150040840A 2015-03-24 2015-03-24 Photo mask transfering system KR101634797B1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100739834B1 (en) * 2007-03-09 2007-07-13 정일반도체(주) A reticle vacuum packaging apparatus
KR20090050198A (en) * 2007-11-15 2009-05-20 (주)티이에스 An apparatus for storing pod of semiconductor fabrication line
KR20110068355A (en) * 2009-12-16 2011-06-22 엘지디스플레이 주식회사 Apparatus for exposure including gas circulation system
KR20130108676A (en) * 2005-09-27 2013-10-04 엔테그리스, 아이엔씨. Reticle pod

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130108676A (en) * 2005-09-27 2013-10-04 엔테그리스, 아이엔씨. Reticle pod
KR100739834B1 (en) * 2007-03-09 2007-07-13 정일반도체(주) A reticle vacuum packaging apparatus
KR20090050198A (en) * 2007-11-15 2009-05-20 (주)티이에스 An apparatus for storing pod of semiconductor fabrication line
KR20110068355A (en) * 2009-12-16 2011-06-22 엘지디스플레이 주식회사 Apparatus for exposure including gas circulation system

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