KR101633009B1

KR101633009B1 - DOE lens manufacturing method for improving beam quality and DOE lens

Info

Publication number: KR101633009B1
Application number: KR1020160021044A
Authority: KR
Inventors: 류세훈
Original assignee: 주식회사 제이티에스인더스트리
Priority date: 2016-02-23
Filing date: 2016-02-23
Publication date: 2016-07-01

Abstract

More particularly, the present invention relates to a DOE pattern in which a spot array is formed on a translucent plate in a mask made of a soda lime glass material, After coating with chromium, a mask including the DOE pattern is placed on a quartz substrate or a substrate made of sapphire, exposed to ultraviolet light, and then AR coated on a DOE lens manufactured by dry etching to obtain a transmission loss And a DOE lens manufactured by the above manufacturing method is provided in a medical handpiece to provide a plurality of rectangular laser spot shapes so that a rectangular spot having improved beam quality is irradiated to a treatment object to be overlapped In order to prevent the overlap procedure Bimjil improved diohyi lens manufacturing method and thus for improving the diohyi lenses bimjil produced by and relates to its application.

Description

[0001] The present invention relates to a DOE lens for improving beam quality and a DOE lens for beam quality improvement,

The present invention relates to a Dio lens for beam quality enhancement and a diode lens for beam quality improvement manufactured thereby. More particularly, the present invention relates to a DIO lens for beam quality improvement, which comprises a DOE pattern having a spot array formed on a translucent plate with a mask made of soda lime glass, Thereafter, a mask including the DOE pattern is placed on a substrate made of a quartz substrate or a sapphire material, exposed to ultraviolet light, and then AR coated on a DOE lens manufactured by a dry etching method to attenuate transmission loss A DOE lens manufactured by the above manufacturing method is provided on a medical handpiece to provide a plurality of rectangular laser spot shapes to irradiate a rectangular spot having improved beam quality to a treatment object to form an overlapped portion Thereby preventing the overlap treatment, Diohyi for lens production process and thus the diohyi lenses bimjil improvement produced by the invention relates to its application.

Conventional medical therapy laser equipment is used to treat a patient's condition by producing a beam quality that is provided through a resonator in the optics to produce an excellent beam quality.

In particular, in ND: YAG laser, which is a pigment therapy laser, when a beam quality of energy is not formed according to the beam quality of a laser irradiated to the skin, side effects (Side Effect).

A typical side effect is PIH (Postinflanmatory Hypcrppingmentation), which leads to a loss of treatment to the affected part again after a few months.

On the other hand, in the treatment range of 500-1,400 nm, which is the near infrared wavelength range of the medical laser apparatus, the shape of the beam formed to be used as the treatment laser by constituting the laser resonator is a circular beam size of 0.5 to 15 mm in diameter Have.

And is formed to have a centralized Gaussian beam (TEM00) or a uniform Fluence such as TopHat in the center.

However, after the resonator formation, the beam quality does not ideally appear due to the influence of the ideal alignment, the coating of the lens element, and the material.

In order to treat the patient, the beam quality is distorted or deformed due to various propagation reflected beams, and the beams do not form an ideal Beam or TopHat beam quality.

Therefore, energy is concentrated in the center center part, energy is not uniformly distributed inside the beam quality, and a side effect is generated in the treatment of the patient.

As shown in FIG. 1, the overlapping (overlapped) procedure is performed by examining the empty space formed between the circular beam and the rounded portion when the circular beam is irradiated to the ringed portion, thereby further performing the postinflanmatory hypocorpmentation It is called.

This leads to second-line treatment on the treatment site, which can be a cause of patient complaints.

In addition, conventionally, a beam having a fixed array of spots such as 9 x 9 or 10 x 10 at regular intervals through a DOE lens has been used to help the dye treatment, There was no way to create a square beam to effect treatment.

Accordingly, the present invention provides a method for manufacturing a diopter lens for beam quality improvement, which improves beam quality through a medical handpiece using the manufactured diopter lens, and when a beam is shaped into a square shape, It is possible to prevent the overlapped operation and at the same time to pass the poor quality beam through the diode lens at the final stage to uniformize the energy distribution of the uneven beam quality to overcome the problems of side effects and secondary care during the procedure A method of manufacturing a Dio lens for beam quality improvement is proposed.

Korean Patent Publication No. 10-2012-0127564 (November 22, 2012)

DISCLOSURE Technical Problem The present invention has been made in view of the above-mentioned problems of the prior art, and it is a first object of the present invention to provide a chromium-doped DOE pattern in which a spot array is formed on a translucent plate of a mask made of soda lime glass, A DOE lens which irradiates ultraviolet light to expose a mask including the DOE pattern on a substrate or a substrate made of sapphire and then performs AR coating on a DOE lens manufactured by etching by a dry etching method, Method.

A second object of the present invention is to provide a DOE lens manufactured by the above manufacturing method in a medical handpiece to provide a rectangular square beam combining a plurality of laser spots, The overlapped portion is removed, thereby preventing the overlap operation.

According to an aspect of the present invention, there is provided a method for manufacturing a diopter lens for beam quality improvement,
A DOE (Diffractive Optical Elements) pattern is designed by computing a Fourier transform function of a subject with a two-dimensional spot as a subject, the size of the pattern being 10 to 20 μm, A DOE pattern designing step (SlOO) characterized in that the arrangement is a rectangular arrangement;
A step S200 of fabricating a mask made of soda lime glass material and applying a DOE pattern mask to the mask with chrome;
A substrate fabrication step S300 for fabricating a substrate using a quartz substrate or sapphire;
A photoresist is applied on the substrate, a DOE pattern mask is positioned, exposure is performed by irradiating ultraviolet light, the exposed photoresist portion is developed, and etched by a dry etching method, wherein the wavelength of the exposure light source is 248 nm and 193 nm (S400), wherein the dry etching is anisotropic etching so that the etching is progressed only in the vertical direction of the substrate so that a fine step can be formed on the surface of the lens.
A laser cutting step (S500) of obtaining a DOE lens by cutting a substrate having a DOE pattern formed thereon through a predetermined etching process using a laser cutter;

And an AR coating step (S600) in which the DOE lens is AR coated to attenuate the transmission loss with respect to the laser light wavelength of 500 to 1,400 nm.

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According to the method for manufacturing a Dio lens for beam quality improvement according to the present invention, the DOE pattern having the spot array formed on the light transmitting plate with the mask made of soda lime glass is coated with chromium, and then the quartz substrate or the sapphire material There is provided a method for manufacturing a diopter lens in which a mask including the DOE pattern is placed on a substrate to form a DOE lens which is exposed by irradiating ultraviolet rays and then etched by a dry etching method to attenuate transmission loss .

Further, the DOE lens manufactured by the manufacturing method is configured in a medical handpiece to provide a rectangular square beam in which a plurality of laser spots are combined, thereby removing a superimposed portion by irradiating a rectangular spot having improved beam quality to a treatment target, An effect of preventing overlap treatment can be exhibited.

In addition, when the Dio lens prepared through the manufacturing method of the present invention is applied to a handpiece for medical treatment, a beam having a poor beam quality is passed through the Dio lens at the final stage to uniformize the energy distribution of the uneven beam quality, It is possible to overcome the problems of side effects and secondary care.

In addition, when a cue switch Endian laser is used as a pigment therapy laser, a laser is irradiated to a lesion having a pigment (black series) distributed in the dermis of Tattoo and Nevus of Ota The first symptom is the destruction of the color of the pigment and pigment system, which can be treated by manifesting various symptoms such as petechiae, purple color, epidermal damage, hemorrhage, blistering, etc. At this time, In case of excessive irradiation on the treatment area with beam quality, it is possible to leave another scar besides the pigment, or after removing the pigment in the dermis after treatment, There are many cases.

Therefore, it is possible to prevent the side effects of treatment by using a uniform beam quality in all dye treatments, and to prevent secondary treatment and to achieve optimized treatment.

In order to solve this problem, a uniform laser beam and a minimum overlap (a method of superimposing a beam at the time of laser treatment) are applied to a laser treatment device requiring a uniform beam quality, To treat the lesion.

1 is a diagram illustrating an example of skin damage to a circular spot of a conventional handpiece.
2 is a process diagram of a method for manufacturing a diopter lens for beam quality improvement according to an embodiment of the present invention.
FIG. 3 is a cross-sectional view of a medical handpiece for beam quality enhancement to which a Dio lens manufactured by the method for manufacturing a beam collimator for beam quality improvement according to an embodiment of the present invention is applied. FIG. FIG. 5 is a view showing a plurality of laser spots passing through a spot array pattern of a medical hand piece for beam quality improvement, to which a Dio lens is applied. FIG.
6 is a perspective view of a Dio lens manufactured by the method for manufacturing a Dio lens for beam quality improvement according to an embodiment of the present invention.
FIG. 7 is a diagram illustrating an example of skin damage to a rectangular spot provided through a Dio lens of a medical handpiece for beam quality improvement, to which a Dio lens is applied according to an embodiment of the present invention. FIG. In the same manner as in the first embodiment.
Fig. 9 is a diagram showing an example of comparison between a conventional laser spot and a laser spot according to the present invention, Fig. 10 is an illustration showing a simplified exposure process, Fig. 11A is an inside view of the plasma device, FIG. 12 is an illustration showing an isotropic etching and anisotropic etching, and FIG. 13 is an example in which the surface of a DOE lens manufactured by the manufacturing method of the present invention is magnified by a microscope and is viewed by a computer.

The following merely illustrates the principles of the invention. Therefore, those skilled in the art will be able to devise various apparatuses which, although not explicitly described or illustrated herein, embody the principles of the invention and are included in the concept and scope of the invention.

Furthermore, all of the conditional terms and embodiments listed herein are, in principle, only intended for the purpose of enabling understanding of the concepts of the present invention, and are not to be construed as limited to such specifically recited embodiments and conditions do.

Hereinafter, a method of manufacturing a DOE (Diffractive Optical Elements) lens for beam quality improvement according to the present invention and a Dio lens for beam quality improvement and an application thereof produced by the method will be described in detail.

2 is a process diagram of a method for manufacturing a diopter lens for beam quality improvement according to an embodiment of the present invention.

2, the method for fabricating a diode lens for beam quality improvement according to the present invention includes a DOE pattern design step S100, a DOE pattern mask manufacturing step S200, a substrate manufacturing step S300, an exposure and etching step (S400), a laser cutting step (S500), and an AR coating step (S600).

The DOE pattern designing step S100 is a step of designing a DOE pattern by calculating a Fourier transform function for a subject using a two-dimensional spot as a subject.

In other words, the DOE pattern programmed through the computer is combined and the pattern is drawn in the mask.

The size of the pattern is 10 to 20 mu m and the diameter of the pattern arrangement is preferably 6 inches.

In order to enlarge the arrangement and secure a large amount of water, it is possible to use more than 4 inches.

In the DOE pattern mask manufacturing step (S200), a mask made of a soda lime glass material is fabricated, and the DOE pattern is coated on the mask with chrome.

A photomask can be regarded as a film of a photo.

A large number of DOE lenses can be made using photomasks, just as the same film can be printed with the original film.

As the type of the photomask, a soda lime material type and a film type are mainly used, but in the present invention, a soda lime glass material is preferably used.

This is because the resolution of the film type is 30 to 100 占 퐉 while the soda lime glass has 1 to 100 占 퐉.

At this time, the DOE lens of the present invention should be selected as soda lime glass since it is required to be processed and manufactured so as to maintain a high resolution pattern.

The reason for applying chrome on the photomask is to coat the desired pattern with chrome to shield the light during the exposure to leave a pattern on the transparent soda lime glass material.

On the other hand, according to the exposure apparatus, not only the circular array but also the rectangular arrangement can be provided. In case of the rectangular arrangement, the yield is increased.

That is, the DOE pattern can be formed using a circle, but it can also be formed using a quadrangle for increasing the yield.

At this time, the DOE pattern is drawn in a CAD pattern and is coated on the mask.

The substrate manufacturing step (S300) is to fabricate a substrate using a quartz substrate or sapphire.

Therefore, a feature of the present invention is to form a spot array pattern on a transmission plate through an exposure and etching process using a quartz substrate or sapphire.

That is, if the quartz substrate or the sapphire material is used, the loss ratio of the conventional lens can be reduced to 50% of the loss ratio to 10%.

Therefore, the Dio lens of the present invention should be constructed using a quartz wafer or sapphire.

Because the material determines the wavelength, a quartz substrate or sapphire should be used to use the wavelength of 500-1,400 nm, which is the most desirable wavelength.

In this case, in the case of the preferred embodiment,

A diameter of 4 to 6 inches, a thickness of 1,000 占 퐉, a double-side polished surface, a flatness of less than 20 占 퐉, a degree of warpage of less than 30 占 퐉 and a flat section of 57 mm or more.

In the step of exposure and etching (S400), a photoresist is coated on the substrate, a DOE pattern mask is positioned, exposure is performed by irradiating ultraviolet rays, the exposed photoresist portion is developed, and etched by a dry etching method .

That is, since the minimum line width is several hundreds of 탆, it is etched by the dry etching method.

Wet etching has a minimum line width of 3 탆, isotropic, and high etching rate.

However, dry etching has a minimum line width of 0.13 탆 or less, and is anisotropic and isotropic (adjustable).

Therefore, dry etching is used.

Meanwhile, as shown in FIG. 10, in the exposure process, a soup track is placed under a photomask in which a desired pattern is formed, and a light is shot, thereby causing a shadow to be formed on the soup tray.

At this time, 248 nm and 193 nm light sources are used for the ultraviolet wavelength region of the exposed light source.

A photosensitive material (photoresist) is applied over the supercrite so that the pattern remains on the southern trak.

In this case, if a photosensitive material (photoresist) that changes into a property that a light-receiving part is well melted is used, it is called a positive resist, and if a resist which has a property of melting well and becomes light- And the exposed portions of the pattern are separated and determined, and one of the two photosensitive materials is selected to perform the exposure process.

When the exposure process is completed, the resist is melted by etching on the supistrector so that a shadow pattern is left on the wafer. In this case, when the positive resist is coated, a pattern similar to the pattern of the mask is seen. Which is opposite to the pattern of FIG.

The equipment used for etching is etched using dry plasma equipment, the principle of which is generated by a radio frequency (RF) electric field and consists of molecules of energy and plasma particles, which are almost neutral polymers consisting of ions and electrons And the etched and exposed Substrate are chemically reacted and etched.

It is usually anisotropic etch, but isotropic if it is necessary or partial anisotropy.

When the bath track is aluminum, etching is performed with a plasma containing chlorine, and silicon and a compound material are etched with a plasma containing fluorine (F).

FIG. 11A shows the inside of the plasma apparatus, and FIG. 11B shows the etched 0.16 .mu.m pattern obtained by an electron microscope. It can be seen that the line width is very well adjusted even if the bottom surface is not flat.

Further, as shown in Fig. 12, the anisotropic etching proceeds only in the vertical direction of the sub-strike surface.

On the other hand, isotropic etching forms a round hill at the bottom.

This shows that the anisotropic etching can be performed at a precise step level rather than the result of the isotropic method.

Therefore, as shown in Fig. 13, it is possible to acquire a DOE lens of good quality with a precise boundary surface in the pattern formation of the lens surface in the anisotropic etching.

In the laser cutting step (S500), the substrate on which the DOE pattern is formed through the etching process is cut by a laser cutter to obtain a DOE lens.

Finally, the AR coating step (S600) is characterized in that AR coating is performed to attenuate the transmission loss for the laser light wavelength of 500 to 1,400 nm to the DOE lens. In order to obtain a lens with improved beam quality, the wavelength of a laser beam is preferably 550 to 1,400 nm. The AR coating is used to reduce the transmission loss of laser light of 550 to 1,400 nm to the Dio lens 400, Coating) coating.

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For example, by AR coating a laser light wavelength of 550 to 1,400 nm, transmission loss of about 10% to 15% can be attenuated.

When the DOE lens is formed, a spot array pattern is formed on the transparent plate, and laser light, which is supplied when the DOE lens is applied to a medical handpiece, is irradiated to a treatment object The plurality of laser spots passing through the spot array pattern are irradiated to the treatment target.

3 is a cross-sectional view of a medical hand piece for beam quality enhancement to which a Dio lens manufactured by the method for manufacturing a Dio lens for beam quality improvement according to an embodiment of the present invention is applied.

3, the medical handpiece for beam quality improvement using the Dio lens manufactured according to the present invention comprises a lens barrel 100, a focus lens unit 200, a Dio lens tip 300, a Dio lens 400, .

FIG. 4 is a view showing a circular beam and a square beam when adjusting the distance of a medical handpiece for beam quality improvement, to which a Dio lens is applied.

As shown in FIG. 4, the diopter lens tip is coupled to the outer circumferential surface of the lens barrel 100 so that the diopter lens tip is moved up and down. For example, Or counterclockwise, the Diode lens tip moves upward or downward relative to the lens barrel to adjust the distance from the lens barrel.

The focus lens unit 200 is formed inside the barrel, and fixing means for fixing the focus lens unit can be formed along the inner circumferential surface.

The size of the beam shape formed at the end of the diode lens tip 300 is determined according to the movement of the focus lens unit 200 of the laser beam of the present invention.

That is, as the distance of the focus is changed, the distance of the plurality of laser spots is widened to widen the arrangement of the spots, or the distance of the plurality of laser spots is narrowed and the distance of the spots is narrowed. A certain amount of energy must be concentrated on the substrate 300 to form a square beam.

The shape of the rectangular beam can not be formed by adjusting the spacing of the plurality of laser spots without using the focus lens unit 200 and the diode lens tip 300.

Accordingly, it is possible to provide a configuration for adjusting the distance of the Dio lens tip 300 so that a proper distance is changed in the focus lens unit 200 to be transmitted through the Dio lens 400 and a square beam is produced.

At this time, the focus lens unit forms a hemispherical convex lens in an inverted form, and the introduced laser light is provided as a Dio lens formed on the lower side.

Here, it is preferable that the laser beam is used as a medical laser light source to provide a power suitable for a single laser by coating a predetermined wavelength band for skin treatment, and Er: YAG laser, Nd: YAG laser and the like can be used.

The dioptric lens tip 300 is coupled to the outer circumferential surface of the lens barrel so as to move up and down. Preferably, the lens barrel 300 is vertically moved along the outer circumferential surface of the lens barrel.

Therefore, the distance between the lens barrel and the barrel is controlled through the up and down movement.

6 is a perspective view of a Dio lens manufactured by the method for manufacturing a Dio lens for beam quality improvement according to an embodiment of the present invention.

As shown in FIG. 6, the Dio lens 400 is formed inside the diode lens tip, and the spot array pattern 420 is formed on the transparent plate 410.

The focus lens unit 200 and the diopter lens tip 300 are provided on the outer circumference of the treatment object 10, and the laser beam passes through the spot array pattern. A plurality of spot array patterns are combined to form a rectangular beam, and output can be performed without overlapping the circular beam.

On the other hand, assuming that the two-dimensional spots shown in FIG. 5 are a single subject and computing a Fourier transform function for the subject, a complex two-dimensional pattern appears.

The Dio lens is a lens that changes the spatial amplitude of a pattern calculated in advance using a photolithography and etching process to form a spatial phase difference shape on a thin plate through which laser light can be transmitted.

When the distance between the focus lens unit 200 and the diopilot 400 is adjusted to 10 mm to 30 mm according to the present invention, a plurality of spot-shaped array intervals may be varied to form a density capable of forming a rectangular beam .

However, since a beam shape to be treated with a skin lesion such as a Nd: YAG laser such as a skin treatment laser is much better in beam quality than a circular shape, and the energy distribution of the square beam is uniform as shown in FIG. 7, It is possible to provide a uniform beam quality even if the beam quality is poor.

This is because the beam passed through the dioplex lens 400 is converted so as to have a uniform energy distribution by providing a plurality of laser spots at regular intervals.

On the other hand, when the distance between the focus lens unit 200 and the diopter lens 400 is adjusted to 31 mm to 80 mm,

A change in array spacing of a plurality of spot shapes can be made to create a density that can form a square beam of a plurality of laser spot features.

That is, the distance between the focus lens unit 200 and the diopter lens 400 is appropriately adjusted to deform the lens into a square beam having a high density. The square size is 2 x 2 mm, 3 x 3 mm, 4 x 4 mm , 5 x 5 mm, 6 x 6 mm, and 7 x 7 mm.

At this time, when the distance is out of the range, a square size can not be formed and uniform beam quality can not be obtained.

That is, if the handpiece is rotated to adjust the distance between the diopter lens and the focus lens unit to form a square-shaped beam, a uniform beam quality can be provided even with poor incoming beam quality.

In summary, it is possible to produce a square beam as shown in FIG. 8 by mechanically constructing a mechanism capable of adjusting the distance between the focus lens unit, the dioprene lens and the Dio lens tip to the treatment target, You can also change it.

At this time, the energy distribution of the outgoing square beam is uniform (from poor beam quality).

At this time, it is preferable to provide the beam of the most preferable rectangular size when the distance is maintained.

8 shows a process of deforming the focus lens unit, the dioprene lens and the diopter lens tip into a beam having a high density by appropriately adjusting the distance, and then the distance to the item When adjusted, the shape changes from circular to square depending on the distance, and the size and size are determined according to the adjustment distance.

Particularly, the plurality of laser spots manufactured are,

A 7 x 7 laser spot, or a 11 x 11 laser spot array.

That is, a laser spot based on a plurality of rectangular arrays, such as a 7 x 7 laser spot or an 11 x 11 laser spot, is provided, and the distance between the focus lens unit 200 and the diopter lens 400 is appropriately adjusted, It can be transformed into a square beam with a high square to produce square beams of various sizes.

As a result, the beam quality of the treatment target can be adjusted to the same energy as the size, preferably by forming a square beam, which can be solved, and the therapeutic effect is remarkably increased.

That is, the entire shape of the laser spot can be formed into a rectangular shape by adjusting the distance between the focus lens unit and the dioprene lens, thereby eliminating the overlapped portion, thereby preventing the overlapped operation.

In addition, as shown in FIG. 9, in the case of the conventional system, a spot in a circular state having a plurality of fixed arrays is provided. However, when the Dio lens manufactured by the present invention is applied to a medical handpiece, The advantage of the modification is that it offers the advantage of providing a uniform square beam that is adjustable.

However, in the case of the present invention, the distance between the diopter lens and the focus lens is adjusted to change the shape of the beam to a quadrangle, and the energy distribution And the size of the beam output from the square is also changed to be utilized for the treatment. Thus, it is possible to prevent the side effects and the secondary treatment at the time of the conventional treatment, thereby providing an excellent effect to the skin treatment.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, It should be understood that various modifications may be made by those skilled in the art without departing from the spirit and scope of the present invention.

100: lens barrel
200:
300: Dio Lens Tips
400: Dio lens

Claims

A method of manufacturing a diffractive optical element (DOE) lens,
A DOE (Diffractive Optical Elements) pattern is designed by computing a Fourier transform function of a subject with a two-dimensional spot as a subject, the size of the pattern being 10 to 20 μm, A DOE pattern designing step (SlOO) characterized in that the arrangement is a rectangular arrangement;
A step S200 of fabricating a mask made of soda lime glass material and applying a DOE pattern mask to the mask with chrome;
A substrate fabrication step S300 for fabricating a substrate using a quartz substrate or sapphire;
A photoresist is applied on the substrate, a DOE pattern mask is positioned, exposure is performed by irradiating ultraviolet light, the exposed photoresist portion is developed, and etched by a dry etching method, wherein the wavelength of the exposure light source is 248 nm and 193 nm (S400), wherein the dry etching is anisotropic etching so that the etching is progressed only in the vertical direction of the substrate so that a fine step can be formed on the surface of the lens.
A laser cutting step (S500) of obtaining a DOE lens by cutting a substrate having a DOE pattern formed thereon through a predetermined etching process using a laser cutter;
And an AR coating step (S600) of AR coating the DOE lens to attenuate a transmission loss with respect to a laser light wavelength of 500 to 1,400 nm. The DOE lens is manufactured through a transparent plate And a plurality of laser spots passing through the spot array pattern are irradiated to the treatment object when irradiating the treatment object with the laser beam. The DOE (Diffractive Optical Elements) lens for beam enhancement Gt;

The method according to claim 1,
The substrate may comprise:
(Diffractive Optical Elements) lens for beam quality improvement characterized by a diameter of 4 to 6 inches, a thickness of 1,000 占 퐉, a surface polished on both sides, a flatness of less than 20 占 퐉, a degree of warpage of less than 30 占 퐉, Gt;

A Diffractive Optical Elements (DOE) lens for beam quality improvement produced by the method for manufacturing a Dio lens for beam quality improvement according to claim 1.

A DOE (Diffractive Optical Elements) lens for beam quality improvement, produced by the method for manufacturing a diopter lens for beam quality improvement according to claim 2.