KR101509473B1 - Synthetic Resin Electro-less Intenna Plating Method and Rear Case thereof - Google Patents

Synthetic Resin Electro-less Intenna Plating Method and Rear Case thereof Download PDF

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KR101509473B1
KR101509473B1 KR20140184273A KR20140184273A KR101509473B1 KR 101509473 B1 KR101509473 B1 KR 101509473B1 KR 20140184273 A KR20140184273 A KR 20140184273A KR 20140184273 A KR20140184273 A KR 20140184273A KR 101509473 B1 KR101509473 B1 KR 101509473B1
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plating
protrusion
synthetic resin
catalyst
flecking
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Korean (ko)
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김광종
박중형
박종근
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(주) 우진 더블유.티.피.
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemically Coating (AREA)

Abstract

A synthetic resin electro-less intenna plating method and a rear case thereof are provided to simplify the process, to improve adhesion of a plating layer, to induce an eco-friendly enviornment, and to achieve economic feasibility, reliability of product, and eco-friendly property. The method comprises: a laser processing step of irradiating a laser to an area to be plated on the surface of synthetic resin materials, to form bumps, and to create circuit patterns; an ultrasonic wave cleaning and penetration step of infiltrating a cleaning solution into the floor with the bumps and performing cleaning using ultrasonic waves; an activation step of infiltrating a catalyst into the floor with the bumps with a guiding means so that the catalyst can be adsorbed to the guiding means; a plating step of plating circuit patterns with the bumps with copper and nickel; and a post-processing step of post-processing the nickel-coated surface.

Description

합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스 {Synthetic Resin Electro-less Intenna Plating Method and Rear Case thereof}TECHNICAL FIELD [0001] The present invention relates to a method of plating a synthetic resin electroless stainless steel and a rear case using the same,

본 발명은 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스 에 관한 것으로, 특히, 종래의 도금 공정을 개선한 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공하는 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a synthetic resin electroless innene plating method and a rear case therefor, and more particularly to a synthetic resin electroless innene plating method which improves a conventional plating process and a rear case therefor.

일반적으로 송수신기기 혹은 휴대폰의 외부로 돌출된 안테나를 구비한 스마트폰과 같은 모바일기기는 그 디자인의 다양화와 슬림화가 어려워 안테나를 모바일기기 하우징 내부에 인쇄회로기판과 연결시켜 놓아 외부에 돌출부가 없으면서 안테나 특성을 유지하도록 설계된 것을 안테나 중에서도 인테나(Intenna)라고 한다.Generally, a mobile device such as a smart phone having an antenna protruding to the outside of a transmission / reception device or a mobile phone has difficulty in diversification and slimming of the design, so that the antenna is connected to the printed circuit board inside the mobile device housing, Among antennas, what is designed to maintain antenna characteristics is called an antenna.

이러한 인테나는 모바일기기의 디자인을 다양하게 설계할 수 있을 뿐만 아니라 모바일기기의 두께를 줄여 슬림화할 수 있는 장점을 제공한다.These intenna not only can design various designs of mobile devices, but also provide advantages of slimming down the thickness of mobile devices.

인테나는 현재 크게 두, 세 가지 방법으로 제조하고 있으며 이들 방법은 다음과 같다.Intenna is manufactured by two methods in three ways. These methods are as follows.

하나의 방법은 모바일기기 설계에 따라 하우징과 인쇄회로기판이 배치되며 인테나 내장 공간이 정해지고 이에 대응한 플라스틱 사출금형을 제작하여 사출 성형된 베이스에 인테나 회로 패턴에 대응한 프레스 금형을 제작하여 동 박판이나 스테인레스 박판 등으로 타발하고 절곡하여 베이스에 끼워 열융착으로 고정시켜 인테나의 기능을 부가하는 방법으로 현재에도 사용되고 있다.In one method, a housing and a printed circuit board are disposed according to the design of a mobile device, a space for installing the intenna is determined, a plastic injection mold corresponding to the space is formed, a press mold corresponding to the intenna circuit pattern is formed on the injection- Or a stainless steel thin plate or the like, bending it, sandwiching it on the base, and fixing it by thermal fusion to add the function of intenna.

다른 방법은 이중 사출법으로 인테나 내장 공간의 형태에 따라 설계된 베이스에 회로패턴을 설계한 후 베이스 사출금형과 회로패턴 사출금형을 연계하여 제작하여 이중사출기를 사용하여 베이스와 회로패턴의 사출재료를 각기 다른 성분의 플라스틱 재료로 이중사출하면서 베이스에 회로패턴을 형성하는 방법이다. 이중사출품의 회로패턴 부위에만 무전해 도금을 실시하여 인테나를 제조한다. 그러나, 이중 사출법은 금형 제작 기간에 시간과 비용이 많이 소요되며 금형 개발 등에 시간이 많이 걸린다는 단점을 갖는다.Another method is to design a circuit pattern on the base designed according to the shape of the internal space of the intenna by the double injection method, and then to fabricate the base injection mold and the circuit pattern injection mold in conjunction with each other, And a circuit pattern is formed on the base while being double injected with a plastic material of another component. Electroless plating is performed only on the circuit pattern portion of the double-printed product to manufacture the intenna. However, the double injection method has a disadvantage in that it takes a lot of time and cost in the mold making period and it takes much time for the mold development.

또 다른 방법은 플라스틱 원재료에 도금이 될 수 있도록 활성제인 금속성분 및 충진제를 혼입하여 사용하는 레이저(Laser) 방식이다. 이 방법은 사출성형품에 회로패턴을 레이저로 가공하여 인테나를 제조하므로 엘디에스(이하에서 LDS라 함, Laser Direct Structuring)법이라고 하며 개발 내지 제조과정에서 시간을 절감할 수 있어 경제성을 향상시킬 수 있는 최신 기술의 하나이다. 즉, 도금의 씨앗(seed)인 금속 성분이 원재료(Resin)에 혼입되어 있어 이중사출법에 따른 공정과 비교하면 에칭공정, 중화공정, 활성공정 등이 생략되어 제조 시간을 절감할 수 있다는 장점을 갖는다. 이러한 엘디에스 도금방법에 대한 일예가 대한민국 등록특허 제10-1167568호에 개시되어 있다.Another method is a laser method in which a metal component and a filler, which are active agents, are mixed and used so as to be plated with a plastic raw material. This method is called Laser Direct Structuring (LDS) method because it manufactures intenna by processing a circuit pattern on an injection molded product with a laser, and it can save time in development or manufacturing process, It is one of the latest technologies. In other words, since the metal component, which is the seed of the plating, is mixed in the resin, the etching time, the neutralization process, and the activation process are omitted compared to the process according to the double injection method, . An example of such an ELISA plating method is disclosed in Korean Patent No. 10-1167568.

또 다른 방법은 일반 범용 합성수지에 레이저를 조사하여 무전해 도금한다. 대표적인 합성수지로는 PC(Poly Carbonate)을 예로 들 수 있다. 그러나 이러한 종래의 방법은 합성수지에 레이저를 가공시 레이저의 열에 의해서 발생된 PC 잔존물(이하 레이저 가공 후 융털돌기)이 남아 도금용액이 레이저 가공 바닥면까지 침투되지 못하고 레이저 가공 표면에서만 도금이 완료되어 도금 후 신뢰성 시험항목인 밀착력테스트에서 불량이 발생한다는 문제점을 갖는다.Another method is electroless plating by irradiating a general-purpose synthetic resin with a laser. A typical synthetic resin is PC (Poly Carbonate). However, in this conventional method, when the laser is applied to the synthetic resin, the PC remnants generated by the heat of the laser (hereinafter referred to as " laser hair after the laser processing ") remain, and the plating solution can not penetrate to the bottom surface of the laser processing. There is a problem that defects occur in the adhesion test, which is a reliability test item.

즉, 종래의 도금 방법은 프리에칭과 에칭을 실시하였으나, 레이저 가공 바닥면까지 침투되어 못하여 표면에서 도금이 진행되어 밀착력 부족으로 불량이 반복적으로 발생될 우려를 가지며 다양한 에칭 방법을 통해 이러한 문제점을 해결하려고 노력하고 있다. 또한 에칭용액은 크롬산(CrO3)과 황산(H2SO4)으로 유독물질로 위험성과 환경유해물질로 지정되어 있다. 이러한 종래기술의 일예가 대한민국 특허등록번호 제10-1258145호 (2013.04.26. 공개)이다.That is, although the conventional plating method has been pre-etched and etched, it is difficult to penetrate to the bottom surface of the laser processing so that plating is progressed on the surface, resulting in repeated failure due to insufficient adhesion. Various etching methods solve this problem I am trying to. The etching solution is chromic acid (CrO3) and sulfuric acid (H2SO4), which are toxic substances and are designated as hazardous and environmentally hazardous substances. An example of such a conventional technique is Korean Patent Registration No. 10-1258145 (published on March 26, 2013).

본 발명의 목적은, 공정을 간단하고 편리하게 단축할 수 있는 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공하는 것이다.An object of the present invention is to provide a method of plating a synthetic resin electroless intenna capable of shortening the process simply and conveniently and a rear case therefor.

또한, 본 발명의 목적은, 레이저 가공시 형성된 융털돌기를 손상시키지 않고 융털돌기의 바닥면까지 도금층이 침투될 수 있는 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공하는 것이다.It is also an object of the present invention to provide a method of plating a synthetic resin electroless intenna capable of penetrating a plating layer to a bottom surface of a molten hair protrusion without damaging the molten hair protrusion formed in laser processing, and a rear case therefor.

또한, 본 발명의 다른 목적은, 도금된 부분의 밀착성을 향상시킬 수 있는 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공하는 것이다.Another object of the present invention is to provide a synthetic resin electroless innene plating method capable of improving the adhesion of a plated portion and a rear case therefor.

또한, 본 발명의 또 다른 목적은, 환경 유해물질을 사용하지 않아 친환경적인 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공하는 것이다.Still another object of the present invention is to provide an environmentally friendly synthetic resin electroless innene plating method without using environmentally harmful substances and a rear case therefor.

본 발명의 목적은, 합성수지 무전해 도금 방법에 있어서, 합성수지 소재 표면의 도금을 할 영역에 레이저를 조사하여 가공하여 융털돌기를 형성하여 회로패턴을 생성하는 레이저 가공 단계와; 상기 융털돌기가 형성된 바닥면까지 세척액을 침투시켜 초음파를 이용하여 세척하는 초음파 세척 및 침투 단계와; 상기 융털돌기가 형성된 바닥면까지 촉매가 안내될 수 있도록 안내하는 안내수단으로 침투시키고 촉매가 상기 안내수단에 흡착되어 환원되는 활성화 단계와; 상기 융털돌기가 형성된 회로패턴에 동도금과 니켈도금을 하는 도금 단계와; 니켈도금 표면을 후처리하는 후처리 단계;를 포함하는 것을 특징으로 하는 합성수지 무전해 도금 방법에 의하여 달성된다.An object of the present invention is to provide a method of manufacturing a synthetic resin electroless plating method, which comprises: a laser processing step of irradiating a region to be plated on the surface of a synthetic resin material with a laser to form a furrow- An ultrasonic cleaning and infiltrating step of infiltrating the cleaning liquid into the bottom surface of the flecking protrusion and cleaning the ultrasonic cleaning liquid by ultrasonic waves; An activating step of introducing the catalyst into the bottom surface of the flecking protrusion and guiding the catalyst so that the catalyst can be guided to the bottom surface of the fleeing protrusion; A plating step of performing copper plating and nickel plating on the circuit pattern on which the fur protrusions are formed; And a post-treatment step of post-treating the nickel-plated surface.

또한, 상기 초음파 세척 및 침투 단계(S115)는 순수 30 ~ 50wt%, 메탄올(Methanol, CH3OH) 50 ~ 70 wt%의 혼합액이고, 처리용액의 온도를 20 ~ 50℃ 범위로 유지시킨 상태에서 1 ~ 5분 정도 소재를 침지시켜 초음파로 세척하는 것이 바람직하다.The ultrasonic cleaning and infiltration step S115 is a mixed solution of pure water 30 to 50 wt% and methanol 50 to 70 wt%, and the temperature of the treatment solution is maintained at 20 to 50 DEG C, It is preferable to immerse the material for about 5 minutes and clean it with ultrasonic waves.

또한, 상기 활성화 단계에서 상기 안내수단은, 상기 융털돌기의 표면장력을 극복하고 상기 융털돌기가 형성된 바닥면까지 침투 가능하게 마련된 용액으로 디메틸글리옥심를 포함하는 금속이온 환원제를 포함하는 것이 바람직하다.In addition, in the activating step, the guiding means preferably includes a metal ion reducing agent containing dimethylglyoxime as a solution that overcomes the surface tension of the flecking protrusion and is permeable to the bottom surface on which the fleeing protrusion is formed.

또한, 상기 안내수단은 에탄올(Ethanol)과 혼합되는 것이 바람직하다.In addition, the guide means is preferably mixed with ethanol.

한편, 본 발명의 목적은, 합성수지 무전해 도금 방법에 의해 제조된 인테나를 포함하는 전자기기용 리어 케이스에 의해서도 달성된다.On the other hand, the object of the present invention is also achieved by a rear case for an electromagnetic device including intenna manufactured by a method of electroless plating of synthetic resin.

본 발명에 따르면, 종래의 프리에칭 공정 또는/및 에칭 공정을 없앨 수 있어 공정이 단축되고 작업 시간을 단축할 수 있어 경제성을 향상시킬 수 있으며, 도금된 부분의 밀착성과 을 향상시켜 고온다습한 환경에서 들뜸 현상을 예방할 수 있어 제품의 품질과 신뢰성을 향상시킬 수 있고, 환경 유해물질을 사용하지 않아 친환경적인 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공할 수 있다.According to the present invention, since the conventional pre-etching process and / or etching process can be eliminated, the process can be shortened, the working time can be shortened and the economical efficiency can be improved and the adhesion of the plated portion can be improved, It is possible to improve the quality and reliability of the product, and it is possible to provide an environmentally friendly synthetic resin electroless innene plating method without environmentally harmful substances, and a rear case therefor.

도 1은 본 발명의 일실시예에 따른 무전해 도금 방법의 개략 공정도,
도 2는 본 발명의 다른 실시예에 따라 레이저 가공 단계 이후 절단한 단면 확대한 사진,
도 3a 및 도 3b는 레이저 가공 단계 이후의 평면을 확대한 사진 및 종래의 프리에칭 및 에칭 공정 후의 평면을 확대한 사진,
도 4는 초음파 세척 및 침투 단계 이후의 평면을 확대한 사진,
도 5a 및 도 5b는 종래의 무전해 도금 방법 및 본 발명에 따른 무전해 도금 방법의 접착력 테스트 결과 비교 사진이다.
1 is a schematic process diagram of an electroless plating method according to an embodiment of the present invention,
2 is a cross-sectional enlarged photograph taken after the laser processing step according to another embodiment of the present invention,
FIGS. 3A and 3B are photographs showing enlargement of a plane after the laser processing step and photographs of enlarged planes after the conventional pre-etching and etching process,
FIG. 4 is a photograph showing an enlarged plane after the ultrasonic cleaning and penetration step,
5A and 5B are comparative photographs of adhesive force test results of a conventional electroless plating method and an electroless plating method according to the present invention.

본 발명의 일실시예에 따른 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스에 대하여 도 1 내지 도 5b를 참조하여 구체적으로 설명하면 다음과 같다.The synthetic resin electroless innate plating method and the rear case therefor according to an embodiment of the present invention will be described in detail with reference to FIGS. 1 to 5B.

도 1은 본 발명의 일실시예에 따른 무전해 도금 방법의 개략 공정도이고, 도 2는 본 발명의 다른 실시예에 따라 레이저 가공 단계 이후 절단한 단면 확대한(20배) 사진이며, 도 3a 및 도 3b는 레이저 가공 단계 이후의 평면을 확대한(100배) 사진 및 종래의 프리에칭 및 에칭 공정 후의 평면을 확대한(100배) 사진이고, 도 4는 초음파 세척 및 침투 단계 이후의 평면을 확대한 사진이며, 도 5a 및 도 5b는 종래의 무전해 도금 방법 및 본 발명에 따른 무전해 도금 방법의 접착력 테스트 결과 비교 사진이다.FIG. 1 is a schematic process diagram of an electroless plating method according to an embodiment of the present invention, FIG. 2 is a magnified (20 times) photograph taken after a laser processing step according to another embodiment of the present invention, FIG. 3B is an enlarged (100 times) plane after the laser processing step and an enlarged (100X) plane after the conventional pre-etching and etching process, and FIG. 4 is an enlarged view of the plane after the ultrasonic washing and penetrating step 5A and 5B are comparative photographs of adhesive force test results of a conventional electroless plating method and an electroless plating method according to the present invention.

본 발명의 일실시예에 따른 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스(이하에서 '무전해 도금 방법'이라 함)에 대하여 도 1을 참조하여 구체적으로 설명하면 다음과 같다.The synthetic resin electroless innate plating method according to one embodiment of the present invention and the rear case (hereinafter, referred to as 'electroless plating method') will be described in detail with reference to FIG.

무전해 도금 방법은, 도 1에 도시된 바와 같이, 레이저 가공 단계(S110), 초음파 세척 및 침투 단계(S115), 활성화 1단계(S120), 활성화 2단계(S125), 니켈 스트라이크 단계(S130), 동도금 단계(S135), 니켈 활성화 단계(S160), 니켈 도금 단계(S170), 후처리 단계(S180)를 포함하는 것이 바람직하다.The electroless plating method includes a laser processing step S110, an ultrasonic cleaning and infiltration step S115, an activation step S120, an activation step S125, a nickel strike step S130, , A copper plating step (S135), a nickel activation step (S160), a nickel plating step (S170), and a post-processing step (S180).

레이저 가공 단계(S110)에서는 일반 범용 합성수지 - 예를 들면, PC (Poly Carbonate) - 에서 도금을 하고자 하는 영역에 Laser가 조사된다. 합성수지에 레이저를 조사하면 레이저의 열에 의해서 발생된 PC 잔존물(이하 레이저 가공 후 융털돌기)가 합성수지의 표면에서부터 일정한 깊이로 형성되어, 예를 들면, 인테나 기능을 할 수 있는 도금 회로 패턴이 된다(도 2 및 도 3a 참조).In the laser processing step (S110), a laser is irradiated to a region to be plated in a general-purpose synthetic resin (for example, PC (Poly Carbonate)). When the synthetic resin is irradiated with a laser beam, PC residuals (hereinafter referred to as " fur hair projections ") generated by the heat of the laser are formed at a certain depth from the surface of the synthetic resin so that the plating circuit pattern can function as an intenna 2 and Fig. 3A).

종래의 이중 사출 도금 방법의 에칭공정에서 ABS 레진의 B성분인 부타디엔이 녹아 미세한 기공이 생성되고 그 기공 속에 금속성분이인 파라듐이 흡착되어 동도금 및 니켈도금을 가능하게 한다.In the etching process of the conventional double injection plating method, butadiene, which is the B component of the ABS resin, is melted to form fine pores, and palladium, which is a metallic component, is adsorbed in the pores to enable copper plating and nickel plating.

또한, 종래의 LDS 도금 방법에서는 레진 속에 금속 성분을 혼합하여 사용하므로 레이저 가공 후 금속입자가 레진에 박혀 있어 도금의 씨앗 역할을 하여 동도금 및 니켈도금을 가능하게 한다.In addition, in the conventional LDS plating method, a metal component is mixed in a resin and used, so that metal particles are embedded in the resin after the laser processing, thereby playing a role of a seed of plating, thereby enabling copper plating and nickel plating.

반면, 본 발명에서는 합성수지 표면에 레이저를 조사하여 표면에 융털돌기를 형성시켜 도금되는 영역을 지탱시켜주는 기초 내지 뿌리를 생성시킨다. 그러나 이러한 융털돌기는 이후의 도금 공정에서 도금 용액이 레이저 가공 바닥면까지 침투하지 못하도록 방해하는 역할을 한다. 그 이유는 융털돌기의 빈도수와 표면장력 때문이다. 따라서, 종래에는 이러한 도금액 침투를 방해하는 융털돌기의 빈도수를 줄이는 방법으로 프리 에칭 공정 및 에칭 공정을 진행하였다. 이러한 에칭 공정에서 사용되는 에칭제의 성분은 크롬산, 황산을 포함하여 산(acid)으로 에칭시 합성수지의 융털돌기 빈도수를 효과적으로 줄이지 못하여 용액 침투성이 낮아 효과가 그리 크지 못하다. 한편, 융털돌기가 현저하게 줄어드는 방법을 강구하더라도 도금을 지탱해주는 기초가 되는 융털돌기가 거의 없어 바람직하지 않다(도 3b 참조).On the other hand, in the present invention, the surface of the synthetic resin is irradiated with a laser to form a furrow protrusion on the surface to form a base or a root for supporting a plated region. However, such a molten projections prevent the plating solution from penetrating to the laser processing floor in the subsequent plating process. The reason is due to the frequency and surface tension of the molts. Therefore, a pre-etching process and an etching process have conventionally been carried out as a method of reducing the frequency of the fringe protrusions that hinder penetration of the plating liquid. The etchant used in such an etching process contains chromic acid and sulfuric acid and is not effective in reducing the permeability of the solution because it does not effectively reduce the frequency of the flounder of the synthetic resin when etching into an acid. On the other hand, even if a method of significantly reducing the flecking protrusions is taken, it is not preferable because there are few fringe protrusions serving as a base for supporting the plating (see Fig. 3B).

초음파 세척 및 침투 단계(S115)에서는 레이저 가공 단계(S110)에서 발생된 융털돌기로 인하여 발생되는 표면장력을 극복하고 레이저 가공 바닥면까지 침투시킬 수 있도록 처리한다. 이 단계(S115)에서 사용되는 처리용액은 순수 30 ~ 50wt%, 메탄올(Methanol, CH3OH) 50 ~ 70 wt%의 혼합액이고, 처리용액의 온도를 20 ~ 50℃ 범위로 유지시킨 상태에서 1 ~ 5분 정도 소재를 침지시켜 세척 및 침투효과를 극대화하고, 초음파의 주파수 파장은 약 28 ~ 45KHz로 조절하여 미세한 부분까지 침투될 수 있도록 하는 것이 바람직하다. 이러한 초음파 세척 및 침투 단계S115)를 거친 소재의 표면을 확대한 사진이 도 4에 도시되어 있다.In the ultrasonic cleaning and infiltration step (S115), the surface tension generated due to the molten hair protrusion generated in the laser processing step (S110) is overcome and processed so as to penetrate to the bottom surface of the laser processing. The treatment solution used in this step S115 is a mixed solution of 30 to 50 wt% of pure water and 50 to 70 wt% of methanol (methanol, CH3OH), and the treatment solution is maintained at a temperature of 20 to 50 DEG C, Min to immerse the material in order to maximize the effect of washing and penetration, and to adjust the frequency of the ultrasonic wave to about 28 to 45 KHz so as to penetrate the fine portion. FIG. 4 is a photograph showing an enlarged view of the surface of the material that has undergone the ultrasonic cleaning and infiltration step S115.

활성화 단계(S120, 125)는 활성화 1단계(S120)와 활성화 2단계(S125)로 구분된다.The activation steps S120 and 125 are divided into an activation step S120 and an activation step S225.

활성화 1단계(S120)는 융털돌기의 표면장력이 소진된 상태로 유지하여 레이저 가공 바닥면에 디메틸글리옥심(dimethyl-glyoxime)을 침투시켜 다음 단계인 활성화 2단계(S125)에서 금속 팔라듐이온 흡착되면 침전시켜 도금을 쉽게 할 수 있도록 한다. 에탄올(Ethanol)을 사용하여 디메틸글리옥심을 용해시켜 농도를 조절하여 사용이고 이러한 디메틸글리옥심은 후술하는 촉매를 흡착하여 환원시킨다. 여기서, 디메틸글리옥심을 예시하였지만 본 발명은 디메틸글리옥심 외 금속이온 환원제를 포함하는 것이 바람직하다.In the activation step S120, the surface tension of the molten hair protrusion is maintained in a state of being exhausted, so that dimethyl-glyoxime penetrates the bottom surface of the laser processing, and the metal palladium ion is adsorbed in the next step of activation step S125 So that plating can be easily performed. Ethanol (Ethanol) is used to dissolve dimethylglyoxime to control its concentration. This dimethylglyoxime adsorbs and reduces the catalyst described below. Here, dimethylglyoxime is exemplified, but it is preferable that the present invention includes a dimethylglyoxime metal ion reducing agent.

침투액의 구성 비율은 디메틸글리옥심(dimethyl-glyoxime) 500ml/liter(이하에서 'liter'를 'l' 또는 'L'로 표시함),에탄올(Ethanol) 500ml/l을 혼합하여 순수 30 ~ 50 wt%, 혼합액 50 ~ 70 wt% 비율로 작업온도 10~30℃, 작업시간은 3~15분이다.The composition ratio of the permeate is 30 to 50 wt% pure water mixed with 500 ml / liter of dimethyl-glyoxime (hereinafter referred to as 'liter' or 'L') and 500 ml / %, Mixture liquid 50 ~ 70 wt%, working temperature 10 ~ 30 ℃, working time 3 ~ 15 minutes.

활성화 2단계(S125)는 PC 레이저 가공면을 금속화시키기 위하여 촉매를 부가하는 단계이다. 부가되는 촉매는 일반적으로 가장 많이 사용하는 팔라듐(Pd)이고, 그 효과도 매우 우수하며, 촉매의 형태는 이온(Ion)이다. 이러한 촉매를 포함한 용액은 팔라듐 0.8~1.0g/l,황산(H2SO4) 100~450ml/l, 순수 550~900ml/l이고, 이 단계(S125)에서의 작업온도 20~30℃, 작업시간은 1~5분이다.Activation step 2 (S125) is a step of adding a catalyst to metallize the PC laser machining surface. The catalyst to be added is generally palladium (Pd) which is the most commonly used, and its effect is also excellent, and the form of the catalyst is ion (Ion). The solution containing the catalyst is 0.8-1.0 g / l of palladium, 100-450 ml / l of sulfuric acid (H2SO4), and 550-900 ml / l of pure water. The working temperature in this step (S125) ~ 5 minutes.

즉, 활성화 1단계(S120)에서 활성화 2단계(S125)의 촉매가 융털돌기의 바닥면까지 침투할 수 있도록 하는 안내자 역할을 하며, 이러한 안내자(전술한 디메틸글리옥심)가 촉매(파라듐)를 융털돌기의 깊은 곳까지 안착시켜 후술하는 도금층의 밀착력을 우수하게 유지할 수 있다.That is, the catalyst serves as a guide for allowing the catalyst of the activation step 2 (S125) to infiltrate to the bottom surface of the molten hair protrusion in the first activation step (S120), and the guide (dimethylglyoxime) The adhesion of the plating layer, which will be described later, can be excellently maintained.

니켈스트라이크 단계(S130)는 레이저 가공되어 표면이 다소 거친 회로 패턴에 촉매를 부여하여 니켈도금을 진행하는 단계로 가공된 회로 패턴에 니켈입자가 형성된 형상을 확인하고 검증한다. 니켈스트라이크 단계(S130)의 건욕비는 다음과 같다. 순수 700 ~ 850g/l, 니켈 5g/l(4.4~5.2g/l), pH 5.5(4.5~7.0), 온도 65(55 ~ 75), 도금두께 1 ~ 5, 차아인산나트륨 및 안정제 25g/l(22 ~ 30g/l)이다.The nickel strike step (S130) is a step of laser-machining and applying a catalyst to a slightly coarse circuit pattern to conduct nickel plating, thereby confirming and verifying the shape in which the nickel particles are formed on the processed circuit pattern. The tub bath ratio of the nickel strike step S130 is as follows. (5 to 7 g / l), pH 5.5 (4.5 to 7.0), temperature 65 (55 to 75), plating thickness 1 to 5, sodium hypophosphite and stabilizer 25 g / l (22 to 30 g / l).

동도금 단계(S135)에서 도금 용액은 순수 700 ~800ml/L, 금속동 3 ~5g/L(예를 들면, ELC 1000-M 110ml/m), 안정제 및 촉진제 20 ~40ml/L(예를 들면, ELC 1000-B 20 ~40ml/l), 수산화나트륨(NaOH) 8 ~10g/L,포르말린(HCHO) 3 ~5g/L 로 혼합하여 이루어지고, 용액의 온도를 40 ~60℃ 범위로, 180 ~300분 정도 충분하게 소재를 침지시킨다. 동도금 후 동 두께를 확인하며, 동 두께의 일예로 6~15㎛가 바람직하다. In the copper plating step (S135), the plating solution may contain pure water 700 to 800 ml / L, metal copper 3 to 5 g / L (for example, ELC 1000-M 110 ml / m), stabilizer and accelerator 20 to 40 ml / ELC 1000-B 20 to 40 ml / l), sodium hydroxide (NaOH) 8 to 10 g / L and formalin (HCHO) 3 to 5 g / Dip material for about 300 minutes. The copper thickness after copper plating is confirmed, and a copper thickness of 6 to 15 mu m is preferable.

도금완료 후 도금용액을 분석하여 부족한 성분을 보충하여 주는 것이 바람직하고, 사용되는 보충액은 평균 5 ~20ml/L(예를 들면, ELC 1000-A )정도로 사용한다.After plating, it is preferable to analyze the plating solution to supplement the deficient components, and the replenishing solution to be used is used in an average of about 5 to 20 ml / L (for example, ELC 1000-A).

니켈 활성화 단계(S160)에서 처리용액으로 파라듐 촉매인 우진WTP 촉매 50 ~ 100ml/L, 황산(H2SO4) 50 ~ 100ml/L, 순수 800 ~ 900ml/L 로 혼합하여 이루어지고 온도를 20 ~ 50℃ 범위로, 2 ~ 7분 정도 소재를 침지시킨다. 이 단계(S160)에서 동도금층 표면에서 특히 파라듐 촉매 이온의 활성화가 왕성하게 일어나 후 공정인 무전해 니켈도금 단계(S170)에서 니켈이온이 금속입자로 석출되어 균일한 니켈도금층을 얻을 수 있게 한다.(100 to 100 ml / L), 50 to 100 ml / L of sulfuric acid (H2SO4) and 800 to 900 ml / L of pure water as a treatment solution in the nickel activation step (S160) , Soak the material for 2 to 7 minutes. In this step S160, activation of the palladium catalyst ions particularly on the surface of the copper plating layer is vigorously activated, so that nickel ions are precipitated as metal particles in an electroless nickel plating step (S170) as a post-process to obtain a uniform nickel plating layer .

니켈 도금 단계(S1170)에서는 회로 패턴 상에 니켈 금속막이 형성되며. 건욕비는 다음과 같다. 순수 700 ~ 850g/l, 니켈 5g/l(4.4~5.2g/l), pH 7.3(7.0~7.5), 온도 84(82 ~ 86)℃, 도금두께 1 ~ 5㎛, 건욕비율은 (Gem ENI Black A) 50g/l(44 ~ 52g/l), 차아인산나트륨 및 안정제(Gem ENI Black B) 25g/l(22 ~ 30g/l)이다. 또한 광택을 좌우하는 인 함량은 1~3%로 저인에 속하며 광택은 유광과 무광 사이에 반광으로 나타난다.In the nickel plating step S1170, a nickel metal film is formed on the circuit pattern. The tub bath costs are as follows. (Gem ENI (germanium oxide)) was used as the anode active material, and the thickness of the plating bath was 1 to 5 탆. (22 ~ 30 g / l), 50 g / l (44-52 g / l) of sodium hypophosphite, and 25 g / l of stabilizer (Gem ENI Black B). In addition, the content of phosphorus, which affects the luster, is 1 to 3%, belonging to the dwarf, and the luster appears as a reflex between luster and matt.

후처리 단계(S180)은 무전해 도금이 완료되면 니켈이 대기 중의 산소와 결합하여 산화가 발생되어 백색 표면 색상이 변하게 되는데 이러한 변색 현상을 예방하기 위한 과정이다. 후처리 단계(S180)에서 사용되는 용액은 이소프로필알콜(Isopropyl Alcohol) 10 ~ 15g/L, 프로필렌글리콜(Propylene Glycol) 13 ~ 25g/L, 지방산 유기화합물 6 ~ 10g/L, 순수 900 ~ 950mg/L로 이루어지고, 후처리 단계(S180)에서는 pH는 중성인 6.0 ~ 7.5, 온도를 25 ~ 55℃ 범위로 유지한 상태에서 1 ~ 5분 동안 소재가 용액에 침지되는 것이 바람직하다.In the post-treatment step (S180), when the electroless plating is completed, nickel is bonded with oxygen in the atmosphere and oxidation occurs to change the color of the white surface. This is a process for preventing the discoloration phenomenon. The solution used in the post-treatment step S180 is a solution containing 10 to 15 g / L of isopropyl alcohol, 13 to 25 g / L of propylene glycol, 6 to 10 g / L of fatty acid organic compound, 900 to 950 mg / L, and in the post-treatment step (S180), it is preferable that the material is immersed in the solution for 1 to 5 minutes while the pH is maintained at a neutral pH of 6.0 to 7.5 and a temperature of 25 to 55 ° C.

그리고, 최종 마무리 과정인 포장 단계(미도시)는 세척 및 건조 공정을 통해 제품이 세척되고 건조된 후 최종적으로 포장되어 출고된다.The final stage of the packaging process (not shown) is a process of washing and drying the product, washing the product, drying the product, and finally packaging the product.

본 발명에 따른 고온다습 환경(온도 70~80도, 습도 80~90%, 24~96시간 지속)에 노출시킨 후 상온에서 1시간 건조하고 투명테이프(3M-610)를 도금표면에 부착시켜 손톱으로 밀착시켜 기포를 제거하고 테이프를 적당한 힘을 주어 떼어서, 도금된 도금면이 떨어지는 정도를 파악하여 도금층(면)의 밀착력 테스를 하였다. 이러한 밀착력 테스트 결과 사진이 도 5b에 도시되어 있으며, 종래기술에 따라 프리에칭 및 에칭 공정을 통해 도금된 비교예가 도 5a에 도시되어 있다.(3M-610) was attached to the surface of the plating to expose the exposed surface of the nail plate (3M-610) at room temperature for 1 hour after exposed to the high temperature and high humidity environment (temperature 70-80 degrees, humidity 80-90% , The bubbles were removed, and the tape was separated with a proper force to determine the extent of the plated surface being dropped, and the adhesion test of the plated layer (surface) was performed. A photograph of this adhesion test result is shown in FIG. 5B, and a comparative example plated through a pre-etching and etching process according to the prior art is shown in FIG. 5A.

본 발명에 따른 도 5b의 도금층은 종래기술의 도 5a의 도금층보다 원 소재인 합성수지에 훨씬 더 우수한 밀착력을 유지함을 알 수 있다.The plating layer of FIG. 5B according to the present invention maintains a much better adhesion to the synthetic resin, which is a raw material, than the plating layer of FIG. 5A of the prior art.

본 발명에 사용되는 합성수지는 PC(Poly Carbonate)를 사용하였지만 공지된 다양한 종류로 변경할 수 있음은 물론이다.Although PC (Poly Carbonate) is used for the synthetic resin used in the present invention, it is needless to say that it can be changed into various known types.

본 발명에 따르면 범용 합성수지에 무전해도금을 실시하는 경우 종래의 프리에칭 공정과 에칭공정을 거치지 않고 도금을 할 수 있는 방법으로 공정이 단순하고 도금층의 밀착력을 획기적으로 향상시킬 수 있다. 예을 들면, 스마트폰 등의 전자기기의 인테나를 제작하는 경우 도금된 패턴이 고온고습에서 들뜸 현상 등으로 발생할 수 있는 다양한 사고를 예방할 수도 있다. 또한, 밀착력이 우수하면서도 종래의 도금 공정에서 특히 유해한 에칭 공정을 없앨 수 있어 원가절감과 친환경을 동시에 도출할 수 있다.According to the present invention, when electroless plating is performed on a general-purpose synthetic resin, the process can be simplified and the adhesion of the plating layer can be remarkably improved by a method capable of plating without using a conventional pre-etching step and an etching step. For example, when manufacturing intenna of an electronic device such as a smart phone, it is possible to prevent a variety of accidents that may occur due to lifting of the plated pattern from high temperature and high humidity. In addition, it is possible to eliminate the etching process which is particularly harmful in the conventional plating process while having excellent adhesion, and cost reduction and environment friendliness can be simultaneously obtained.

전술한 바와 같이 본 발명에 따르면, 종래의 프리에칭 공정 또는/및 에칭 공정을 없앨 수 있어 공정이 단축되고 작업 시간을 단축할 수 있어 경제성을 향상시킬 수 있으며, 도금된 부분의 밀착성과 을 향상시켜 고온다습한 환경에서 들뜸 현상을 예방할 수 있어 제품의 품질과 신뢰성을 향상시킬 수 있고, 환경 유해물질을 사용하지 않아 친환경적인 합성수지 무전해 인테나 도금 방법 및 이에 의한 리어 케이스를 제공할 수 있다.As described above, according to the present invention, since the conventional pre-etching process and / or etching process can be eliminated, the process can be shortened and the working time can be shortened, thereby improving the economical efficiency and improving the adhesiveness of the plated portion It is possible to prevent the lifting phenomenon in a high temperature and high humidity environment, thereby improving the quality and reliability of the product, and it is possible to provide an environmentally friendly synthetic resin electroless innene plating method without use of environmentally harmful substances and a rear case therefor.

그리고, 이러한 방법으로 제조, 생산된 인테나와 인테나를 포함하는 휴대폰을 포함하는 전자기기용 리어 케이스도 동일한 효과를 가짐은 물론이다.It goes without saying that the rear case for an electromagnetic device including a cellular phone including intenna and intenna manufactured and manufactured by this method has the same effect.

여기서, 본 발명의 여러 실시예를 도시하여 설명하였지만, 본 발명이 속하는 기술 분야의 통상의 지식을 가진 당업자라면 본 발명의 원칙이나 정신에서 벗어나지 않으면서 본 실시예를 변형할 수 있음을 알 수 있을 것이다. 발명의 범위는 첨부된 청구항과 그 균등물에 의해 정해질 것이다.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art without departing from the scope and spirit of the invention. will be. The scope of the invention will be determined by the appended claims and their equivalents.

Claims (5)

합성수지 무전해 도금 방법에 있어서,
합성수지 소재 표면의 도금을 할 영역에 레이저를 조사하여 가공하여 융털돌기를 형성하여 회로패턴을 생성하는 레이저 가공 단계와;
상기 융털돌기가 형성된 바닥면까지 세척액을 침투시켜 초음파를 이용하여 세척하는 초음파 세척 및 침투 단계와;
상기 융털돌기가 형성된 바닥면까지 촉매가 안내될 수 있도록 안내하는 안내수단으로 침투시키고 촉매가 상기 안내수단에 흡착되어 환원되는 활성화 단계와;
상기 융털돌기가 형성된 회로패턴에 동도금과 니켈도금을 하는 도금 단계와;
니켈도금 표면을 후처리하는 후처리 단계;를 포함하고,
상기 활성화 단계에서 상기 안내수단은, 상기 융털돌기의 표면장력을 극복하고 상기 융털돌기가 형성된 바닥면까지 침투 가능하게 마련된 용액으로 디메틸글리옥심를 포함하는 금속이온 환원제를 포함하는 것
A method for electroless plating a synthetic resin,
A laser processing step of irradiating a region of the synthetic resin material to be plated with a laser beam to form a furrow protrusion to generate a circuit pattern;
An ultrasonic cleaning and infiltrating step of infiltrating the cleaning liquid into the bottom surface of the flecking protrusion and cleaning the ultrasonic cleaning liquid by ultrasonic waves;
An activating step of introducing the catalyst into the bottom surface of the flecking protrusion and guiding the catalyst so that the catalyst can be guided to the bottom surface of the fleeing protrusion;
A plating step of performing copper plating and nickel plating on the circuit pattern on which the fur protrusions are formed;
A post-treatment step of post-treating the nickel plated surface,
In the activating step, the guiding means may include a metal ion reducing agent containing dimethylglyoxime as a solution that overcomes the surface tension of the flecking protrusion and is permeable to the bottom surface on which the fleeing protrusion is formed
합성수지 무전해 도금 방법에 있어서,
합성수지 소재 표면의 도금을 할 영역에 레이저를 조사하여 가공하여 융털돌기를 형성하여 회로패턴을 생성하는 레이저 가공 단계와;
상기 융털돌기가 형성된 바닥면까지 세척액을 침투시켜 초음파를 이용하여 세척하는 초음파 세척 및 침투 단계와;
상기 융털돌기가 형성된 바닥면까지 촉매가 안내될 수 있도록 안내하는 안내수단으로 침투시키고 촉매가 상기 안내수단에 흡착되어 환원되는 활성화 단계와;
상기 융털돌기가 형성된 회로패턴에 동도금과 니켈도금을 하는 도금 단계와;
니켈도금 표면을 후처리하는 후처리 단계;를 포함하며,
상기 초음파 세척 및 침투 단계(S115)는 순수 30 ~ 50wt%, 메탄올(Methanol, CH3OH) 50 ~ 70 wt%의 혼합액이고, 처리용액의 온도를 20 ~ 50℃ 범위로 유지시킨 상태에서 1 ~ 5분 정도 소재를 침지시켜 초음파로 세척하고,
상기 활성화 단계에서 상기 안내수단은, 상기 융털돌기의 표면장력을 극복하고 상기 융털돌기가 형성된 바닥면까지 침투 가능하게 마련된 용액으로 디메틸글리옥심를 포함하는 금속이온 환원제를 포함하는 것을 특징으로 하는 합성수지 무전해 도금 방법.
A method for electroless plating a synthetic resin,
A laser processing step of irradiating a region of the synthetic resin material to be plated with a laser beam to form a furrow protrusion to generate a circuit pattern;
An ultrasonic cleaning and infiltrating step of infiltrating the cleaning liquid into the bottom surface of the flecking protrusion and cleaning the ultrasonic cleaning liquid by ultrasonic waves;
An activating step of introducing the catalyst into the bottom surface of the flecking protrusion and guiding the catalyst so that the catalyst can be guided to the bottom surface of the fleeing protrusion;
A plating step of performing copper plating and nickel plating on the circuit pattern on which the fur protrusions are formed;
A post-treatment step of post-treating the nickel plated surface,
The ultrasonic cleaning and infiltration step S115 is a mixed solution of 30 to 50 wt% of pure water and 50 to 70 wt% of methanol, and the temperature of the treatment solution is maintained at 20 to 50 DEG C for 1 to 5 minutes The material is immersed and washed with ultrasonic waves,
Wherein the guide means comprises a metal ion reducing agent containing dimethylglyoxime as a solution that overcomes the surface tension of the flecking protrusion and is permeable to the bottom surface on which the fleeing protrusion is formed, Plating method.
삭제delete 제1항 또는 제2항에 있어서,
상기 안내수단은 에탄올(Ethanol)과 혼합되는 것을 특징으로 하는 합성수지 무전해 도금 방법.
3. The method according to claim 1 or 2,
Wherein the guide means is mixed with ethanol. ≪ RTI ID = 0.0 > 8. < / RTI >
제1항 또는 제2항의 합성수지 무전해 도금 방법에 의해 제조된 인테나를 포함하는 전자기기용 리어 케이스.A rear case for an electromagnetic device comprising an intenna manufactured by the method of the electroless plating of synthetic resin according to claim 1 or 2.
KR20140184273A 2014-12-19 2014-12-19 Synthetic Resin Electro-less Intenna Plating Method and Rear Case thereof KR101509473B1 (en)

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Publication number Priority date Publication date Assignee Title
CN112251739A (en) * 2020-10-23 2021-01-22 哈尔滨工业大学 Aluminum-induced chemical plating method for pre-plating copper film

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Publication number Priority date Publication date Assignee Title
KR100235850B1 (en) 1994-12-27 1999-12-15 엔도 마사루 Pretreatment solution for electroless plating, electroless plating bath and electroless plating method
KR100931248B1 (en) 2007-08-01 2009-12-11 주식회사 에스에이피 Method of manufacturing antenna function using copper plating, nickel plating and gold plating on circuit pattern by double injection method of transceiver housing
KR100975012B1 (en) 2007-08-01 2010-08-09 주식회사 에스에이피 The manufacturing method of the antenna function which uses the no electrolysis copper plating, no electrolysis nickel plating in the circuit pattern due to the duplex shooting out of handset housing
KR101250932B1 (en) 2013-02-01 2013-04-03 이도연 An antenna for mobile electronics and the producing method thereof

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Publication number Priority date Publication date Assignee Title
KR100235850B1 (en) 1994-12-27 1999-12-15 엔도 마사루 Pretreatment solution for electroless plating, electroless plating bath and electroless plating method
KR100931248B1 (en) 2007-08-01 2009-12-11 주식회사 에스에이피 Method of manufacturing antenna function using copper plating, nickel plating and gold plating on circuit pattern by double injection method of transceiver housing
KR100975012B1 (en) 2007-08-01 2010-08-09 주식회사 에스에이피 The manufacturing method of the antenna function which uses the no electrolysis copper plating, no electrolysis nickel plating in the circuit pattern due to the duplex shooting out of handset housing
KR101250932B1 (en) 2013-02-01 2013-04-03 이도연 An antenna for mobile electronics and the producing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112251739A (en) * 2020-10-23 2021-01-22 哈尔滨工业大学 Aluminum-induced chemical plating method for pre-plating copper film
CN112251739B (en) * 2020-10-23 2021-09-03 哈尔滨工业大学 Aluminum-induced chemical plating method for pre-plating copper film

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