KR101467215B1 - Liquid crystal disply device having in cell retardation film and method for fabricating the same - Google Patents

Abstract

A method of manufacturing a liquid crystal display device includes forming a gate wiring and a gate electrode on a transparent insulating substrate. Forming a gate insulating film, an active layer, an ohmic contact layer, a source / drain electrode, a data line, and a common electrode on the gate wiring and the gate electrode; Forming a protective film on the resultant and exposing the drain electrode; Forming a pixel electrode electrically connected to the drain electrode on the protective film; Forming an alignment film on the pixel electrode and the protective film; And forming a compensation film on the alignment film, the compensation film being divided into regions having different retardation values.

Inchel compensation film, retardation, orientation film, degree of hardening

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device having a compensating film,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a liquid crystal display device and a manufacturing method thereof, and more particularly, to a liquid crystal display device having a compensation film inside a cell and a manufacturing method thereof.

Recently, as the age of information society has progressed rapidly, a display field for processing and displaying a large amount of information has been developed.

In particular, in recent years, in order to respond to the era of thinning, light weight, low power consumption, and the like, a flat panel display has been required, and accordingly, a thin film transistor liquid crystal display Transistor Liquid Crystal Display) was developed.

Such a display method of a liquid crystal display device utilizes the optical anisotropy and the polarizing property of the liquid crystal molecules because the liquid crystal molecules have a thin and long structure and have a pretilt angle having a directivity in the arrangement thereof, When the voltage is applied to the liquid crystal, the alignment direction of the liquid crystal molecules can be controlled by varying the line inclination angle of the liquid crystal molecules. By applying an appropriate voltage to the liquid crystal layer, the alignment direction of the liquid crystal molecules can be arbitrarily adjusted, And arbitrarily modulates the polarized light by the optical anisotropy possessed by such liquid crystal to express a desired image.

At present, active matrix liquid crystal displays (LCDs) in which a thin film transistor and pixel electrodes connected to the thin film transistor are arranged in a matrix manner are receiving the most attention because of their excellent resolution and video realization capability.

In a liquid crystal panel, which is a basic element constituting a general liquid crystal display device, a color filter substrate on the upper side and an array substrate on the lower side are opposed to each other with a predetermined space therebetween. A liquid crystal including liquid crystal molecules is filled between these two substrates .

An electrode for applying a voltage to the liquid crystal becomes a common electrode located on the color filter substrate and a pixel electrode located on the array substrate. When a voltage is applied to the two electrodes, a vertical electric field And the direction of the liquid crystal molecules positioned therebetween is controlled.

However, as described above, when the common electrode and the pixel electrode are vertically formed and the liquid crystal is driven by the vertical electric field generated by the vertical electric field, there is an advantage that the characteristics such as the transmittance and the aperture ratio are excellent. However, In order to overcome such disadvantages, an in-plane switching type liquid crystal display device using a horizontal electric field has been proposed.

However, the transverse electric field type liquid crystal display device realizing such a wide viewing angle has a disadvantage that the color shift in the viewing angle direction becomes prominent.

Therefore, in order to solve such a problem, a technique has been proposed in which a compensation film is attached to the outer surface of either one substrate or both substrates of a transverse electric field liquid crystal display device.

From this point of view, a conventional liquid crystal display device having a compensation film on the outer surface of a substrate and a method of manufacturing the same will be described with reference to FIG.

1 is a schematic cross-sectional view of a liquid crystal display device having a compensation film on an outer surface of a lower array substrate according to the related art.

1, a lower array substrate (thin film transistor substrate) and an upper array substrate (color filter substrate) are provided so as to face each other with a predetermined space therebetween, and between these substrates, A liquid crystal layer 41 is interposed.

Here, in the lower array substrate, gate wirings (not shown) and data wirings (not shown) are formed in the form of a matrix on the inner surface of one of the first transparent substrates 11.

A TFT (thin film transistor) functioning as a switching element is formed at the intersection of the gate line and the data line, and the pixel electrode 27 in the positive direction, which is in contact with the drain electrode 23 of the TFT, A common electrode 24 is formed at a predetermined interval from the drain electrode 23 and a lower alignment layer (not shown) is formed on the pixel electrode 27 .

On the other hand, the other second transparent substrate 31 (color filter substrate) opposite to the first transparent substrate 11 on which the plurality of pixel electrodes 27 are formed is formed of a black matrix (BM) 33, a color filter layer 35, and an upper alignment film 37 are formed.

A compensation film 51 is attached to the back surface of the first transparent substrate 11 to reduce the change of the retardation with respect to the change of the viewing direction.

When a voltage is applied to each of the gate wirings and the data wirings of the liquid crystal display device constructed as described above, only the TFT to which the voltage is applied is turned on, and the drain electrode 23 of the on- A telephone is accumulated in the pixel electrode 27 connected to the common electrode 24 to generate a horizontal electric field with the common electrode 24 to change the arrangement of the liquid crystal molecules.

A method of manufacturing a liquid crystal display device according to the related art having the above-described structure will now be described with reference to FIG. 1.

First, a gate electrode 13 is formed on a first transparent substrate 11, and a gate insulating film 15 is formed on the gate electrode 13 by PECVD (Plasma Enhanced Chemical Vapor Deposition).

Next, amorphous silicon doped with amorphous silicon and phosphorus is deposited, and then patterned by a photoetching process to form an active layer 17 and an ohmic contact layer 19.

Then, a metal material is deposited on the active layer 17 and the ohmic contact layer 19, and the source / drain electrodes 21 and 23 and the common electrode 24 are selectively etched by using a source / .

Then, a protective film 25 is formed on the entire surface of the substrate using an inorganic film, and a pixel electrode 27 is formed of ITO (Indium Tin Oxide) on the protective film 25.

On the other hand, a photoresist film made of carbon black or titanium oxide having light shielding properties is applied on the second transparent substrate 31, and the photoresist film is exposed to a predetermined pattern using a mask.

Further, the photoresist layer is developed according to the exposed pattern, and the developed photoresist layer is cured to form a black matrix 33.

Next, a photoresist film made of an azo red pigment or the like is coated on the second transparent substrate 31 on which the black matrix 33 is formed, and the photoresist film is exposed to a predetermined pattern using a mask.

Then, the photosensitive film is developed in accordance with the exposed pattern, and the developed photosensitive film is cured to form a red color.

Next, a photoresist film made of a protarcyanide green pigment is applied on the second transparent substrate 31 on which the red color is formed, and the photoresist film is exposed to a predetermined pattern using a mask.

Then, the photosensitive film is developed in accordance with the exposed pattern, and the developed photosensitive film is cured to form a green color.

Next, a blue color is formed on the second transparent substrate 31 on which the green color is formed by curing a photoresist layer made of a phthalocyanine blue pigment or the like to complete the color filter layer 35.

Then, an upper alignment layer 37 is formed on the color filter layer 35 so that the liquid crystal molecules are aligned in a predetermined direction.

Then, the lower array substrate and the upper array substrate manufactured as described above are cemented to secure a certain cell gap, and a liquid crystal is interposed therebetween.

Finally, the compensation film 51 for reducing the change in the retardation with respect to the change in the viewing direction is attached to the rear surface of the first transparent substrate 11 of the lower array substrate.

The liquid crystal molecules injected from the lower array substrate and the upper array substrate are birefringent with different refractive indices in the major axis direction and the minor axis direction. The viewing angle varies depending on the viewing position of the liquid crystal display device due to the birefringence.

This is because the polarized state of linearly polarized light passes through the liquid crystal and the viewing angle is changed due to a difference in the amount of light and color characteristics when viewed from the front and side positions.

Accordingly, the liquid crystal display device exhibits a phenomenon such as brightness, contrast ratio, color shift, and gray inversion depending on the viewing angle.

Therefore, a multidomain technique in which a pixel is divided into a plurality of regions and the orientation of the liquid crystal molecules is made different for each region so that the characteristic of the pixel becomes an average value in the characteristics of various regions in the pixel, A phase compensation technique has been proposed as described above that reduces the variation of the phase difference with respect to the change of the viewing direction by using a film.

As shown in FIG. 1, a case where a compensation film 51 is used to apply a phase compensation technique for reducing a change in phase difference with respect to a change in the viewing direction will be described.

The compensation film 51 is formed on the back surface of the first transparent substrate 11 (or the second transparent substrate 11) in order to compensate for the phase difference generated in the liquid crystal material.

This compensates the phase shift of the light inside the liquid crystal in the opposite direction in the retardation compensation film 51.

However, when the compensation film is attached to the back surface of the first transparent substrate (i.e., the thin film transistor substrate) or the second transparent substrate (color filter substrate) of the liquid crystal display device as described above, There is a lot of possibility to work again, which is a burden on the process.

Further, since the first transparent substrate or the second transparent substrate is attached to the back surface, there arises a problem that there is a limit in reducing the thickness of the liquid crystal display device.

DISCLOSURE Technical Problem Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art, and it is an object of the present invention to provide an in-cell compensation film in a color filter substrate or a thin film transistor substrate of a liquid crystal display, A liquid crystal display device provided with a compensation film capable of forming a liquid crystal display device, and a manufacturing method thereof.

Another object of the present invention is to provide a liquid crystal display device having a compensating film capable of arbitrarily controlling a retardation value for each region by causing an exposure compensation amount for each UV wavelength region by forming an in- A display device and a method of manufacturing the same.

According to another aspect of the present invention, there is provided a method of manufacturing a compensation film, including: coating a compensation film on a transparent insulation substrate; And forming a compensating film pattern having a first region and a second region different in retardation value by irradiating UV light onto the compensating film and thermally curing the compensating film using a target mask having an ITO pattern formed on a quartz substrate plate, And the like.

According to an aspect of the present invention, there is provided a liquid crystal display device including a compensation film, including: a gate wiring and a gate electrode formed on a transparent insulating substrate; A gate insulating film formed on the gate wiring and the gate electrode, an active layer, an ohmic contact layer, a source / drain electrode, a data line, and a common electrode; A protective film formed on the resultant; A pixel electrode formed on the protective film and electrically connected to the drain electrode; An alignment film formed on the pixel electrode and the protective film; And a compensating film formed on the alignment layer and composed of regions having different retardation values.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device including a compensating film, the method comprising: forming a gate line and a gate electrode on a transparent insulating substrate; Forming a gate insulating film, an active layer, an ohmic contact layer, a source / drain electrode, a data line, and a common electrode on the gate wiring and the gate electrode; Forming a protective film on the resultant and exposing the drain electrode; Forming a pixel electrode electrically connected to the drain electrode on the protective film; Forming an alignment film on the pixel electrode and the protective film; And forming a compensation film composed of regions having different retardation values on the alignment film.

According to an aspect of the present invention, there is provided a liquid crystal display device including a compensation film, including: a black matrix formed on a transparent insulating substrate; A color filter layer formed on the black matrix and consisting of red, green and blue colors sequentially; An alignment layer formed on the color filter layer; And a compensating film formed on the alignment layer and composed of regions having different retardation values.

According to an aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device including a compensation film, the method comprising: forming a black matrix on a transparent insulating substrate; Forming a color filter layer composed of red, green, and blue colors sequentially on the black matrix; Forming an alignment layer on the color filter layer; And forming a compensation film composed of regions having different retardation values on the alignment film.

The liquid crystal display device provided with the compensation film according to the present invention and the manufacturing method thereof have the following effects.

The liquid crystal display device and the method of manufacturing the same equipped with the compensation film according to the present invention are characterized in that when a retardation compensation is required, a retardation film is formed in a cell using a mask having an ITO pattern, It is possible to change the degree of curing of the insensely compensating film by causing a variation in exposure amount per region.

Since the retention retention ratio according to thermal bias is different according to the degree of curing, retardation value finally obtained after heating can be controlled arbitrarily, so that it is possible to form individual retardation by region do.

Further, since it is attached to the inner surface of the first insulating substrate or the second insulating substrate, the thickness of the liquid crystal display device can be reduced.

Hereinafter, a liquid crystal display device having a compensation film according to a preferred embodiment of the present invention and a method of manufacturing the same will be described with reference to the accompanying drawings.

2A to 2C are cross-sectional views illustrating a process of forming an in-cell compensation film in a liquid crystal display device and a method of manufacturing the same according to the present invention.

FIG. 3 is a graph showing changes in the degree of curing of the compensation film according to the amount of UV exposure at the time of application of an in-cell compensation film in the liquid crystal display device and the manufacturing method thereof according to the present invention.

4A and 4B are graphs showing retention retention ratios according to the curing rate of a compensation film when an in-cell compensation film is applied in the liquid crystal display device and the manufacturing method thereof according to the present invention, A compensation film having a curing rate is applied, and Fig. 4B shows a case where a compensation film having a low curing rate is applied.

First, a process for forming an in-plane retardation film on the inner surface of a substrate according to the present invention will be described.

As shown in FIG. 2A, an anisotropic liquid crystal material is coated on the transparent substrate 101 to form an in-cell retardation film 103.

Then, an ITO film is first deposited on a quartz substrate 121 and selectively patterned through a photolithography process and an etching process to irradiate the Inx compensation film 103 with UV light, An ITO pattern 123 is formed on the substrate 121 to manufacture the target mask 120 of the compensation film 103.

After the target mask 120 is positioned on the compensation film 103, the compensation film 103 is irradiated with UV light through the target mask 120, and thermal curing is performed for a predetermined period of time )do.

At this time, the quartz substrate 101 through which only a part of the light passes through the ITO pattern 123 of the target mask 120 and is transmitted through a portion of the compensation film 103 positioned below the ITO pattern 123, And the light passed through the portion is transmitted to the portion of the compensation film 103 located below. At this time, the light transmittance that passes through the quartz substrate 101 and passes through the ITO pattern 123 and passes through the compensation film 103 is lower than the light transmittance through the compensation film 103.

Therefore, the UV light transmittance of each region of the compensation film 103, that is, the first region 103a and the second region 103b, is varied. As a result, as shown in FIG. 3, There is a difference in the conversion ratio. At this time, the UV exposure amount is equal to the value obtained by multiplying the UV illuminance by time.

Particularly, in the case of the compensation film 103, the retention rate of the retardation value which was initially formed after the heating and firing according to the degree of curing is different as shown in Figs. 4A and 4B.

That is, as shown in Fig. 4A, the retardation change rate (DELTA nd) due to thermal stress of the compensation film having a high curing rate hardly changes, but as shown in Fig. 4B, The change in retardation (DELTA nd) due to the thermal stress of the substrate is largely changed.

The retention retention ratio of the exposed area of the pattern area, that is, the second area 103b of the compensation film 103 is lower than the retardation retention rate of the non-pattern area, that is, the exposed area of the first area 103a, It is possible to impart individual values to the first area 103a and the second area 103b of the in-cell retardation film by irradiating UV light using the target mask 120 through the heating condition control .

On the other hand, it is possible to control the transmittance to the UV wavelength region using a general transparent substrate not using the ITO pattern without UV exposure of the compensation film using the ITO pattern, that is, the target mask causing the transmittance deviation, A filter may be used for each wavelength region.

On the other hand, in Table 2 and Table 3 of the present invention in which the ITO pattern is provided, Table 3 shows the results of the case where the target mask does not have a filter (quartz substrate) 1, 2, 3) are shown in the following table.

Here, UVA is a wavelength range of 380 to 420 nm, UVB is a wavelength range of 280 to 360 nm, and UVC is a wavelength band of 240 to 280 nm.

[Table 1]

[Table 2]

[Table 3]

[Table 4]

As shown in [Table 2], it can be seen that the UV transmittance is higher when a general substrate is used than when a substrate on which an ITO pattern is formed as a target mask is used.

Also, as shown in Table 3, the substrate on which the ITO pattern is formed can not transmit UVC, but the UVC is transmitted through the substrate. However, the UVC transmittance is low.

Hereinafter, a lower array substrate and a method of manufacturing the same according to another embodiment of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 5 is a cross-sectional view illustrating a case where an insensitive compensation film is formed on the inner surface of a lower array substrate (thin film transistor substrate) in a liquid crystal display device having a compensation film according to an embodiment of the present invention and a method of manufacturing the same.

5, an array substrate of a liquid crystal display device provided with a compensation film according to the present invention includes gate lines (not shown) formed by applying a gate metal film to a transparent insulating substrate 201, and; A gate insulating film 205, an active layer 207, and an ohmic contact layer 209 sequentially formed on a substrate on which the gate wiring (not shown) and the gate electrode 203 are formed; Source / drain electrodes 211 and 213, a common electrode 215 and a data line (not shown); A protection film 217 applied on the resultant to protect the device; A pixel electrode 219 formed on the protective film 217 and electrically connected to the drain electrode 213; A lower alignment layer 221 formed on the pixel electrode 219 and the passivation layer 217; And a compensation film 223 formed on the lower alignment film 221.

A method of manufacturing a lower array substrate of a liquid crystal display device having the compensation film according to the present invention will be described with reference to FIGS. 6A to 6E.

6A to 6E are cross-sectional views illustrating a method of manufacturing a lower array substrate of a liquid crystal display device having a compensation film according to an embodiment of the present invention.

6A, a gate metal film is first deposited on a transparent insulating substrate 201, and then selectively patterned through a photolithography process and an etching process to form a gate wiring (not shown) and a gate electrode (not shown) 203 are formed.

6B, a gate insulating layer 205, an active layer 207, an ohmic contact layer 209, and source / drain electrodes 211 and 213 (not shown) are sequentially formed on a substrate having the gate electrode 203 formed thereon. ), A data wiring (not shown), and a common electrode 215 are formed.

More specifically, the gate insulating layer 205 is deposited by PECVD (Plasma Enhanced Chemical Vapor Deposition) on the gate line and the gate electrode 201, and amorphous silicon and phosphorus-doped amorphous silicon Layer is deposited and then patterned through a photolithography process and an etching process to form an active layer 207 and an ohmic contact layer 209.

Then, source and drain forming metal materials are deposited on the substrate including the active layer 207 and the ohmic contact layer 209 and then patterned through a photolithography process and an etching process to form the source / drain electrodes 211 and 213, A data line (not shown), and a common electrode 215 are formed.

Then, as shown in FIG. 6C, a passivation layer 217 is deposited by using an inorganic film to protect the device on the resultant, and selectively patterned through a photolithography process and an etching process to form a pixel electrode A contact hole (not shown) is formed.

Next, a transparent conductive material such as ITO or IZO for forming a pixel electrode is deposited on the protective film 217 including the contact hole, and then patterned through a photolithography process and an etching process to form the pixel electrode 219.

Next, a lower alignment film 221 for aligning the liquid crystal molecules in a predetermined direction is formed on the protective film 217 including the pixel electrode 219.

6D, an anisotropic liquid crystal material is coated on the lower alignment layer 221 to form an in-cell film 223.

In order to irradiate the compensation film 223 with UV light, an ITO film is first deposited on a quartz substrate 231, and the ITO film is selectively patterned through a photolithography process and an etching process to form the quartz substrate 231 231 to form the ITO pattern 233 to manufacture the target mask 230 of the compensation film 223.

After the target mask 230 is positioned on the compensation film 223, the compensation film 223 is irradiated with UV light through the target mask 230, and thermal curing is performed for a predetermined time. The first region 223a and the second region 223b having different transmissivities are formed to manufacture a compensation film interposed in the cell, thereby completing the fabrication of the lower array substrate of the liquid crystal display device according to the present invention.

At this time, only a part of the light passes through the ITO pattern 233 of the target mask 230 and is transmitted to the second region 223b of the compensation film 223 located below the ITO pattern 233. The ITO pattern 233 is present The light passed through the quartz substrate 231 is transmitted through the first region 223a of the compensation film 223 located below the quartz substrate 231. Therefore, the light transmittance through the ITO pattern 233 and transmitted through the compensation film 223 is lower than the light transmittance directly transmitted through the quartz substrate 231 and transmitted to the compensation film 223.

In addition, an upper array substrate of a liquid crystal display device having a compensation film inside a cell according to another embodiment of the present invention will be described with reference to the accompanying drawings.

FIG. 7 is a cross-sectional view illustrating a case where a compensation film is formed on the inner surface of an upper array substrate (color filter substrate) in a liquid crystal display device and a method of manufacturing the same, according to another embodiment of the present invention.

7, an upper array substrate of a liquid crystal display device having a compensation film according to another embodiment of the present invention includes a black matrix 253 formed of a chromium metal film formed on a transparent insulating substrate 251; A color filter layer 255 formed by sequentially applying red, green, and blue photoresist layers on the black matrix 253, and performing exposure and development; An upper alignment layer 257 formed on the substrate on which the color filter layer 255 is formed and a compensation film 261 formed on the upper alignment layer 257.

A method of manufacturing an upper array substrate according to the present invention will be described with reference to FIGS. 8A to 8E.

8A to 8E are cross-sectional views illustrating a method of manufacturing an upper array substrate of a liquid crystal display device having a compensation film according to another embodiment of the present invention.

First, as shown in FIG. 8A, a photoresist film made of carbon black or titanium oxide having light shielding properties is applied on a transparent insulating substrate 251, and the photoresist film is exposed to a predetermined pattern using a mask.

Then, the photoresist layer is developed according to the exposed pattern, and the developed photoresist layer is cured to form a black matrix 253.

Next, a photoresist film made of an azo-based red pigment or the like is coated on the insulating substrate 251 on which the black matrix 253 is formed, and the photoresist film is exposed to a predetermined pattern using a mask.

Then, the photosensitive film is developed in accordance with the exposed pattern, and the developed photosensitive film is cured to form a red color.

Next, a photoresist film made of a protarocyanine green pigment or the like is coated on the transparent substrate on which the red color is formed, and the photoresist film is exposed to a predetermined pattern using a mask.

Then, the photosensitive film is developed in accordance with the exposed pattern, and the developed photosensitive film is cured to form a green color.

Next, as shown in FIG. 8B, a blue color is formed by curing a photosensitive film made of phthalocyanine blue pigment or the like on the insulating substrate 251 on which the green color is formed, thereby completing the color filter layer 255.

Next, as shown in FIG. 8C, an upper alignment layer 257 is formed on the color filter layer 255 so that the liquid crystal molecules are aligned in a predetermined direction.

Then, as shown in FIG. 8D, a liquid crystal material having anisotropy is coated on the upper alignment layer 257 to form an in-cell film 261.

In order to irradiate the compensation film 261 with UV light, an ITO film is first deposited on a quartz substrate 271, and the ITO film is selectively patterned through a photolithography process and an etching process to form the quartz substrate 271 ITO pattern 273 is formed on the substrate 271 to manufacture a target mask 270.

8E, after the target mask 270 is positioned above the compensation film 261, UV light is irradiated onto the compensation film 261 through the target mask 270, A first region 261a and a second region 261b having different transmissivities are formed by performing thermal curing treatment for a predetermined period of time to manufacture a compensation film interposed in the cell, The manufacturing is completed.

At this time, only a part of the light passes through the ITO pattern 273 of the target mask 270 and is transmitted to the second region 261b of the compensation film 261 located below the ITO pattern 273. The ITO pattern 273 is present The light passed through the quartz substrate 271 is transmitted through the first region 261a of the compensation film 261 located below the quartz substrate 271.

Therefore, the light transmittance through the ITO pattern 273 and transmitted through the compensation film 261 is lower than the light transmittance directly transmitted through the quartz substrate 271 and transmitted to the compensation film 261.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments.

Therefore, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concept of the present invention defined in the following claims are also within the scope of the present invention.

1 is a schematic cross-sectional view of a liquid crystal display device having a compensation film on an outer surface of a lower array substrate according to the related art.

2A to 2C are cross-sectional views illustrating a process of forming an in-cell compensation film in a liquid crystal display device and a method of manufacturing the same according to the present invention.

FIG. 3 is a graph showing changes in the degree of curing of the compensation film according to the amount of UV exposure at the time of application of an in-cell compensation film in the liquid crystal display device and the manufacturing method thereof according to the present invention.

4A and 4B are graphs showing retention retention ratios according to the curing rate of a compensation film when an in-cell compensation film is applied in the liquid crystal display device and the manufacturing method thereof according to the present invention, A compensation film having a curing rate is applied, and Fig. 4B shows a case where a compensation film having a low curing rate is applied.

FIG. 5 is a cross-sectional view showing a case where a compensation film is formed on the inner surface of a lower array substrate (thin film transistor substrate) in a liquid crystal display device and a method of manufacturing the same according to an embodiment of the present invention.

6A to 6E are cross-sectional views illustrating a method of manufacturing a lower array substrate of a liquid crystal display device having a compensation film according to an embodiment of the present invention.

FIG. 7 is a cross-sectional view illustrating a case where a compensation film is formed on the inner surface of an upper array substrate (color filter substrate) in a liquid crystal display device and a method of manufacturing the same, according to another embodiment of the present invention.

8A to 8E are cross-sectional views illustrating a method of manufacturing an upper array substrate of a liquid crystal display device having a compensation film according to another embodiment of the present invention.

DESCRIPTION OF THE REFERENCE SYMBOLS

101: substrate 103: compensation film

103a: first region 103b: second region

120: target mask 121: quartz substrate

123: ITO pattern

Claims (8)

delete delete delete Forming a gate wiring and a gate electrode on a transparent insulating substrate; Forming a gate insulating film, an active layer, an ohmic contact layer, a source / drain electrode, a data line, and a common electrode on the gate wiring and the gate electrode; Forming a protective film exposing the drain electrode on the data line and the common electrode, the source / drain electrode, the active layer, and the gate insulating film; Forming a pixel electrode electrically connected to the drain electrode on the protective film; Forming an alignment film on the pixel electrode and the protective film; Forming an in-cell compensation film on the alignment layer; Disposing a target mask on which an ITO pattern is formed on a quartz substrate, on the transparent insulating substrate on which the in-cell compensation film is formed; UV light is irradiated to the first region of the in-cell compensation film so that the first region of the compensation film passes through only the quartz substrate directly through the target mask, and the second region of the in- Irradiating the target mask through the ITO pattern and the quartz substrate so as to be transmitted therethrough and then thermally curing the first mask and the second mask to form first and second regions having different retardation values on the in- The method of manufacturing a liquid crystal display device according to claim 1, delete delete Forming a black matrix on the transparent insulating substrate; Forming a color filter layer composed of red, green, and blue colors sequentially on the black matrix; Forming an alignment layer on the color filter layer; Forming an in-cell compensation film on the alignment layer; Disposing a target mask on which an ITO pattern is formed on a quartz substrate, on the transparent insulating substrate on which the in-cell compensation film is formed; UV light is irradiated to the first region of the in-cell compensation film so that the first region of the compensation film passes through only the quartz substrate directly through the target mask, and the second region of the in- Irradiating the target mask through the ITO pattern and the quartz substrate so as to be transmitted therethrough and then thermally curing the first mask and the second mask to form first and second regions having different retardation values on the in- The method of manufacturing a liquid crystal display device according to claim 1, delete

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