KR101418026B1 - Thermosetting ink composition - Google Patents

Thermosetting ink composition Download PDF

Info

Publication number
KR101418026B1
KR101418026B1 KR1020140013647A KR20140013647A KR101418026B1 KR 101418026 B1 KR101418026 B1 KR 101418026B1 KR 1020140013647 A KR1020140013647 A KR 1020140013647A KR 20140013647 A KR20140013647 A KR 20140013647A KR 101418026 B1 KR101418026 B1 KR 101418026B1
Authority
KR
South Korea
Prior art keywords
pattern
ink composition
thermosetting ink
curing agent
weight
Prior art date
Application number
KR1020140013647A
Other languages
Korean (ko)
Inventor
전지민
최용석
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020140013647A priority Critical patent/KR101418026B1/en
Application granted granted Critical
Publication of KR101418026B1 publication Critical patent/KR101418026B1/en
Priority to TW104102111A priority patent/TWI662086B/en
Priority to CN201510059664.XA priority patent/CN104834183B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Optical Filters (AREA)

Abstract

The present invention relates to a thermosetting ink composition. More particularly, the present invention relates to a thermosetting ink composition including a binder resin with a hydroxyl group, a curing agent expressed by chemical formula 1, a multifunctional monomer having an ethylenically non-saturated double bond and a solvent, and may be cured at low temperatures, thereby being applicable to a flexible display using a polymer resin film as a substrate to form a pattern without degradation of the film.

Description

열경화성 잉크 조성물 {THERMOSETTING INK COMPOSITION}[0001] THERMOSETTING INK COMPOSITION [0002]

본 발명은 보다 저온의 조건에서 경화가 가능한 열경화성 잉크 조성물에 관한 것이다.
The present invention relates to a thermosetting ink composition which can be cured at a lower temperature.

종래 액정표시장치, 플라즈마표시장치 등과 같은 화상표시장치 및 반도체 회로 소자에 적용되는 미세 패턴은 포토레지스트(photoresist)를 이용한 포토리소그래피(photolithography) 방법으로 형성되었다.2. Description of the Related Art Fine patterns applied to an image display device such as a liquid crystal display device, a plasma display device, and the like and a semiconductor circuit device have been formed by a photolithography method using a photoresist.

포토리소그래피 방법은 원하는 패턴을 정밀하게 얻을 수 있다는 장점이 있는 반면, 포토레지스트의 효과를 극대화하기 위해서 고가의 노광 장비, 고해상도의 마스크 등이 요구되며 공정 상에서 많은 양의 포토레지스트가 소모되어 비용 면에서 비효율적이다. 또한, 노광, 노광 후 베이크, 현상, 현상 후 베이크, 식각, 세정 등의 다단계 공정으로 이루어져 공정 시간이 오래 걸릴 뿐만 아니라 공정을 다수 회 반복해야 하므로 생산성이 저하되는 단점이 있다.The photolithography method has an advantage that a desired pattern can be precisely obtained. However, in order to maximize the effect of the photoresist, expensive exposing equipment and a high resolution mask are required, and a large amount of photoresist is consumed in the process, It is inefficient. In addition, since it is a multi-step process such as exposure, post-exposure baking, development, development, baking, etching, cleaning, etc., the process takes a long time and the process is repeated many times.

최근에는 포토리소그래피 방법을 대체하기 위한 방법 중 하나로 오프셋, 반전 오프셋, 롤-투-롤(roll to roll) 등의 인쇄 방법이나, 디스펜싱 노즐 등의 도포 방법이 제안되었다.In recent years, printing methods such as offset, inversion offset, roll-to-roll, and dispensing nozzles have been proposed as a method for replacing the photolithography method.

상기 방법들에 의해 수지 조성물을 기판에 도포하고 이를 가열 경화시킴으로써 소정의 패턴을 형성한다. 이러한 열경화 공정은 통상 230℃ 정도의 고온에서 수행된다.The resin composition is applied to the substrate by the above methods and is heated and cured to form a predetermined pattern. Such a heat curing process is usually carried out at a high temperature of about 230 캜.

한편, 디스플레이 분야가 점차 플렉서블 디스플레이로 넘어가면서 유연한 기판이 요구되어, 종래 사용되던 글라스 기판이 폴리이미드, 폴리에틸렌테레프탈레이트 필름 등의 고분자 수지 필름으로 대체되고 있는데, 상기 고온 공정의 경우 글라스 기판에 대하여 패턴을 형성하는 경우에는 별다른 문제가 되지 않으나, 고분자 수지 필름의 경우 고온의 열에 의해 수축되거나 열화되는 등의 문제가 발생한다.On the other hand, as the display field gradually moves to flexible displays, a flexible substrate is required, and conventionally used glass substrates are replaced by polymeric resin films such as polyimide and polyethylene terephthalate films. In the case of the high temperature process, There is no problem in forming the polymeric resin film. However, the polymeric resin film has problems such as shrinkage or deterioration due to heat at a high temperature.

따라서, 플렉서블 기판 등에 사용되는 고분자 수지 필름이 열화되지 않을 정도의 저온에서도 경화가 가능한 수지 조성물이 요구되는 실정이다.Accordingly, there is a demand for a resin composition which can be cured even at a low temperature such that the polymer resin film used for a flexible substrate or the like does not deteriorate.

한국공개특허 제2008-68286호에는 열경화형 오버코트 수지 조성물이 개시되어 있다.
Korean Patent Publication No. 2008-68286 discloses a thermosetting overcoat resin composition.

한국공개특허 제2008-68286호Korean Patent Publication No. 2008-68286

본 발명은 보다 저온에서 경화가 가능한 잉크 조성물을 제공하는 것을 목적으로 한다.
An object of the present invention is to provide an ink composition which can be cured at a lower temperature.

1. 히드록시기를 갖는 바인더 수지, 경화제, 에틸렌성 불포화 이중결합을 갖는 다관능성 단량체 및 용매를 포함하며,1. A resin composition comprising a binder resin having a hydroxy group, a curing agent, a polyfunctional monomer having an ethylenically unsaturated double bond and a solvent,

상기 경화제는 하기 화학식 1로 표시되는 화합물인, 잉크 조성물:Wherein the curing agent is a compound represented by the following Formula 1:

[화학식 1] [Chemical Formula 1]

Figure 112014011825972-pat00001
Figure 112014011825972-pat00001

(식 중, R1은 탄소수 1 내지 5의 알킬기,

Figure 112014011825972-pat00002
,
Figure 112014011825972-pat00003
또는
Figure 112014011825972-pat00004
이고;(Wherein, R 1 is an alkyl group having 1 to 5 carbon atoms,
Figure 112014011825972-pat00002
,
Figure 112014011825972-pat00003
or
Figure 112014011825972-pat00004
ego;

R2는 탄소수 1 내지 10의 알킬렌기이며;R 2 is an alkylene group having 1 to 10 carbon atoms;

R3 및 R4는 서로 독립적으로 탄소수 1 내지 5의 알킬기이며;R 3 and R 4 are independently of each other an alkyl group having 1 to 5 carbon atoms;

n은 1 내지 3의 정수임).and n is an integer of 1 to 3).

2. 위 1에 있어서, 상기 경화제는 조성물 총 중량 중 0.1 내지 5중량%로 포함되는, 잉크 조성물.2. The ink composition according to 1 above, wherein the curing agent is contained in an amount of 0.1 to 5% by weight based on the total weight of the composition.

3. 위 1에 있어서, 상기 바인더 수지는 노볼락 수지인, 잉크 조성물.3. The ink composition according to item 1 above, wherein the binder resin is a novolak resin.

4. 위 1에 있어서, 상기 바인더 수지는 조성물 총 중량 중 10 내지 20중량%로 포함되는, 잉크 조성물.4. The ink composition according to 1 above, wherein the binder resin is contained in an amount of 10 to 20% by weight based on the total weight of the composition.

5. 위 1 내지 4 중 어느 한 항의 조성물로 형성된 패턴.5. A pattern formed from the composition of any one of claims 1-4.

6. 위 5에 있어서, 컬러필터용 컬러 패턴, 블랙매트릭스 패턴, 블랙 컬럼 스페이서 패턴, 박막트랜지스터 패턴, 화상표시장치용 전극패턴 또는 격벽 패턴인, 패턴.
6. The pattern as set forth in 5 above, wherein the pattern is a color pattern for a color filter, a black matrix pattern, a black column spacer pattern, a thin film transistor pattern, an electrode pattern for an image display device, or a partition wall pattern.

본 발명의 잉크 조성물은 보다 저온에서도 경화가 가능하다. 따라서 고분자 수지 필름을 기판으로 사용하는 플렉서블 디스플레이 등에 적용되어, 필름의 열화 없이 패턴을 형성할 수 있다.
The ink composition of the present invention can be cured even at a lower temperature. Therefore, it can be applied to a flexible display using a polymeric resin film as a substrate, so that a pattern can be formed without deteriorating the film.

본 발명은 히드록시기를 갖는 바인더 수지, 화학식 1로 표시되는 경화제, 에틸렌성 불포화 이중결합을 갖는 다관능성 단량체 및 용매를 포함함으로써, 보다 저온에서도 경화가 가능하여, 고분자 수지 필름을 기판으로 사용하는 플렉서블 디스플레이 등에 적용되어, 필름의 열화 없이 패턴을 형성할 수 있도록 하는 열경화성 잉크 조성물에 관한 것이다.The present invention relates to a flexible display using a polymer resin film as a substrate, which can be cured even at a lower temperature by including a binder resin having a hydroxyl group, a curing agent represented by the formula (1), a polyfunctional monomer having an ethylenically unsaturated double bond, To a thermosetting ink composition capable of forming a pattern without deteriorating the film.

이하 본 발명을 상세히 설명하기로 한다.
Hereinafter, the present invention will be described in detail.

<열경화성 잉크 조성물>&Lt; Thermosetting ink composition >

본 발명의 열경화성 잉크 조성물은 히드록시기를 갖는 바인더 수지, 경화제, 에틸렌성 불포화 이중결합을 갖는 다관능성 단량체 및 용매를 포함한다.
The thermosetting ink composition of the present invention comprises a binder resin having a hydroxyl group, a curing agent, a polyfunctional monomer having an ethylenically unsaturated double bond, and a solvent.

바인더 수지Binder resin

본 발명에 따른 바인더 수지는 후술할 경화제와 반응할 수 있는 바인더 수지로서, 히드록시기를 갖는 것이라면 특별히 한정되지 않고 당 분야에서 통상적으로 사용되는 수지를 사용할 수 있다. 예를 들면, 노볼락 수지일 수 있다.The binder resin according to the present invention is not particularly limited as long as it has a hydroxyl group and can be reacted with a curing agent to be described later, and resins commonly used in the art can be used. For example, it may be a novolak resin.

노볼락 수지는, 적어도 1종의 페놀계 화합물과 알데히드계 화합물을 공중합함으로써 얻어지는 노볼락형의 페놀 수지이다.The novolak resin is a novolak type phenolic resin obtained by copolymerizing at least one phenolic compound and an aldehyde compound.

페놀계 화합물은 특별히 한정되지 않으며, 예를 들면, 페놀; p-크레졸, m-크레졸 및 o-크레졸 등의 크레졸류; 3,5-키실레놀, 2,5-키실레놀, 2,3-키실레놀, 3,4-키실레놀 등의 키실레놀류; 2,3-디메틸페놀, 2,4-디메틸페놀, 2,5-디메틸페놀, 2,6-디메틸페놀, 3 4-디메틸페놀, 3,5-디메틸페놀 등의 디메틸페놀류; 2,3,4-트리메틸페놀, 2,3,5-트리메틸페놀, 3,4,5-트리메틸페놀, 2,4,5-트리메틸페놀 등의 트리메틸페놀류; 2-t-부틸페놀, 3-t-부틸페놀, 4-t-부틸페놀 등의 t-부틸페놀류; o-클로로페놀, m-클로로페놀, p-클로로페놀, 2,3-디클로로페놀 등의 클로로페놀류; m-메톡시페놀, p-메톡시페놀, o-메톡시페놀, 2,3-디메톡시페놀, 2,5-디메톡시페놀, 3,5-디메톡시페놀 등의 메톡시 페놀류; p-부톡시페놀; o-에틸페놀, m-에틸페놀, p-에틸페놀, 2,3-디에틸페놀, 2,5-디에틸페놀, 3,5-디에틸페놀, 2,3,5-트리에틸페놀, 3,4,5-트리에틸페놀 등의 에틸 페놀류; 레조르시놀, 2-메틸레조르시놀, 4-메틸레조르시놀, 5-메틸레조르시놀 등의 레조르시놀류; p-이소프로필페놀; α-나프톨,β-나프톨 등의 나프톨류; 메틸렌비스페놀, 메틸렌비스 p-크레졸, 카테콜, 4-메틸레조르신 등을 들 수 있다. 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The phenolic compound is not particularly limited and includes, for example, phenols, cresols such as p-cresol, m-cresol and o-cresol, 3,5-xylenol, 2,5- - xylenol, 3,4-xylenol and the like; 2,3-dimethylphenol, 2,4-dimethylphenol, 2,5-dimethylphenol, 2,6-dimethylphenol, 3,4- Dimethylphenols such as phenol and 3,5-dimethylphenol; phenols such as 2,3,4-trimethylphenol, 2,3,5-trimethylphenol, 3,4,5-trimethylphenol and 2,4,5- Butylphenol such as trimethylphenol, 2-t-butylphenol, 3-t-butylphenol and 4-t-butylphenol, Chlorophenols such as phenol, etc .; chlorinated phenols such as m-methoxyphenol, p-methoxyphenol, o-methoxyphenol, 2,3-dimethoxyphenol, 2,5-dimethoxyphenol and 3,5- Phenoxyphenols; p-butoxyphenol; ethylphenol, m-ethylphenol, p-ethylphenol, 2,3-diethylphenol, 2,5-diethylphenol, 3,5-diethylphenol, 2,3,5-triethylphenol, 3 , Ethylphenols such as 4,5-triethylphenol, resorcinols such as resorcinol, 2-methyl resorcinol, 4-methyl resorcinol and 5-methyl resorcinol, p-isopropylphenol, Naphthols such as naphthol and? -Naphthol; and methylene bisphenol, methylene bis p-cresol, catechol, and 4-methylresorcin. These may be used alone or in combination of two or more.

알데히드 화합물도 특별히 한정되지 않으며, 예를 들면, 포름알데히드, 파라포름알데히드, 아세트알데히드, 프로필알데히드, 벤즈알데히드, 페닐알데히드, α-페닐프로필 알데히드, β-페닐프로필알데히드, o-히드록시벤즈알데히드, m-히드록시벤즈알데히드, p-히드록시벤즈알데히드, 글루타르 알데히드, 글리옥살, o-메틸벤즈알데히드, p-메틸벤즈알데히드 등을 들 수 있다. 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The aldehyde compound is not particularly limited, and examples thereof include formaldehyde, paraformaldehyde, acetaldehyde, propylaldehyde, benzaldehyde, phenylaldehyde,? -Phenylpropylaldehyde,? -Hydroxybenzaldehyde, Hydroxybenzaldehyde, p-hydroxybenzaldehyde, glutaraldehyde, glyoxal, o-methylbenzaldehyde, p-methylbenzaldehyde and the like. These may be used alone or in combination of two or more.

바인더 수지는 잉크 조성물 총 100중량% 중에 10 내지 20중량%로 포함될 수 있다. 이 함량 범위에서는 패턴 지지체의 역할과 패턴 전사율을 높여 수율 개선 및 공정 효율성을 향상시킬 수 있다The binder resin may be contained in an amount of 10 to 20% by weight in 100% by weight of the total ink composition. In this content range, the role of the pattern support and the pattern transfer rate can be improved to improve yield and process efficiency

경화제Hardener

본 발명에 따른 경화제는 하기 화학식 1로 표시된다:The curing agent according to the present invention is represented by the following Formula 1:

[화학식 1] [Chemical Formula 1]

Figure 112014011825972-pat00005
Figure 112014011825972-pat00005

(식 중, R1은 탄소수 1 내지 5의 알킬기,

Figure 112014011825972-pat00006
,
Figure 112014011825972-pat00007
또는
Figure 112014011825972-pat00008
이고;(Wherein, R 1 is an alkyl group having 1 to 5 carbon atoms,
Figure 112014011825972-pat00006
,
Figure 112014011825972-pat00007
or
Figure 112014011825972-pat00008
ego;

R2는 탄소수 1 내지 10의 알킬렌기이며;R 2 is an alkylene group having 1 to 10 carbon atoms;

R3 및 R4는 서로 독립적으로 탄소수 1 내지 5의 알킬기이며;R 3 and R 4 are independently of each other an alkyl group having 1 to 5 carbon atoms;

n은 1 내지 3의 정수임).and n is an integer of 1 to 3).

이소시아네이트기(-NCO)는 히드록시기(-OH)와 반응하는데, 이소시아네이트기를 갖는 경화제를 잉크 조성물에 사용하는 경우, 반응성이 매우 우수하여, 열경화 공정 이전의 상온에서도 히드록시기를 갖는 바인더 수지와의 반응이 일어나 일부 경화되어, 균일한 도포 및 미세 패턴의 형성이 어려운 문제가 있다.When an isocyanate group (-NCO) reacts with a hydroxyl group (-OH), when a curing agent having an isocyanate group is used in an ink composition, the reaction is very excellent and the reaction with a binder resin having a hydroxyl group even at a room temperature before the heat- There is a problem that it is difficult to uniformly coat and form a fine pattern.

따라서, 종래에는 중합성 화합물, 열개시제, 실란계 첨가제 등을 포함하는 잉크 조성물을 사용하여 약 230℃의 고온 경화 공정을 수행하여 패턴을 형성하였다.Therefore, conventionally, a high temperature curing process at about 230 캜 was performed using an ink composition including a polymerizable compound, a thermal initiator, a silane additive and the like to form a pattern.

그러나, 본 발명은 이소시아네이트기의 탄소 원자가 질소 원자와 이중 결합을 이루지 않고 다른 치환기에 의해 보호되어 있는 경화제를 포함한다.However, the present invention includes a curing agent in which the carbon atoms of the isocyanate group are not double-bonded to the nitrogen atom and are protected by other substituents.

본 발명에 따른 경화제는 상기 보호기에 의해, 상온에서는 히드록시기와의 반응이 일어나지 않고, 소정 온도 이상(약 120℃)의 열을 가하는 경우에 상기 보호기가 해리되어 이소시아네이트기가 활성을 가져 바인더 수지와 반응하여 이들을 가교함으로써 경화시키게 된다.When the curing agent according to the present invention does not react with a hydroxyl group at room temperature and applies heat at a predetermined temperature or higher (about 120 ° C), the protecting group is dissociated to react with the binder resin to activate the isocyanate group And they are cured by crosslinking.

즉, 본 발명의 잉크 조성물은 상기 경화제를 포함함으로써 약 120℃의 저온에서도 경화될 수 있고, 따라서, 플렉서블 디스플레이 등에 적용되는 패턴 형성에 사용될 수 있다.That is, the ink composition of the present invention can be cured even at a low temperature of about 120 캜 by including the curing agent, and thus can be used for pattern formation applied to a flexible display or the like.

경화제는 잉크 조성물 총 100중량% 중에 0.1 내지 5중량%로 포함될 수 있다. 함량이 0.1중량% 미만이면 가교 정도가 미미하여 패턴의 경화도가 떨어질 수 있고, 5중량% 초과이면 조성물의 저장안정성이 저하될 수 있다.
The curing agent may be included in an amount of 0.1 to 5% by weight based on 100% by weight of the ink composition. When the content is less than 0.1% by weight, the degree of crosslinking is insignificant and the degree of curing of the pattern may be deteriorated. If the content is more than 5% by weight, the storage stability of the composition may be deteriorated.

에틸렌성Ethylenic 불포화 이중결합을 갖는  Having an unsaturated double bond 다관능성Multifunctional 단량체 Monomer

에틸렌성 불포화 이중결합을 갖는 다관능성 단량체는 패턴의 강도를 강화시키기 위한 성분으로서, 1 내지 6관능성 단량체를 들 수 있다. 구체적인 예로는 노닐페닐카비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등의 1관능성 단량체; 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등의 2관능성 단량체; 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트 등의 3관능성 단량체; 펜타에리트리톨테트라(메타)아크릴레이트 등의 4관능성 단량체; 디펜타에리트리톨펜타(메타)아크릴레이트 등의 5관능성 단량체; 디펜타에리트리톨헥사(메타)아크릴레이트 등의 6관능성 단량체 등을 들 수 있다. 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The multifunctional monomer having an ethylenically unsaturated double bond is a component for enhancing the strength of the pattern and may include a monofunctional monomer. Specific examples include monofunctional compounds such as nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N- Monomer; (Meth) acrylates such as 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di Bifunctional monomers such as 3-methylpentanediol di (meth) acrylate; Trifunctional monomers such as trimethylolpropane tri (meth) acrylate and pentaerythritol tri (meth) acrylate; Tetrafunctional monomers such as pentaerythritol tetra (meth) acrylate; Pentafunctional monomers such as dipentaerythritol penta (meth) acrylate; And hexafunctional monomers such as dipentaerythritol hexa (meth) acrylate. These may be used alone or in combination of two or more.

에틸렌성 불포화 이중결합을 갖는 다관능성 단량체는 잉크 조성물 총 100중량% 중에 1 내지 10중량%로 포함될 수 있다. 이 함량 범위에서는 양호한 패턴 강도를 얻을 수 있다.
The multifunctional monomer having an ethylenically unsaturated double bond may be contained in an amount of 1 to 10% by weight based on 100% by weight of the ink composition. Good pattern strength can be obtained in this content range.

용매menstruum

용매는 용해성, 착색제의 분산성, 코팅성 등을 고려하여, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르 등의 에틸렌글리콜모노알킬에테르; 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르; 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜알킬에테르아세테이트; 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알킬렌글리콜알킬에테르아세테이트; 벤젠, 톨루엔, 자일렌 등의 방향족 탄화수소; 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등의 케톤; 에탄올, 메탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올; γ-부티로락톤 등의 고리형 에스테르 등을 들 수 있다. 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The solvent is preferably an ethylene glycol monoalkyl ether such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, or ethylene glycol monobutyl ether in consideration of solubility, dispersibility of the colorant, coating property, and the like; Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate; Aromatic hydrocarbons such as benzene, toluene and xylene; Ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; Alcohols such as ethanol, methanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerin; and cyclic esters such as? -butyrolactone. These may be used alone or in combination of two or more.

용매는 잉크 조성물 총 100중량% 중에 75 내지 90중량%로 포함될 수 있다. 함량이 75중량% 미만인 경우 고형분 함량이 많아지고 점도가 증가하여 코팅성이 저하될 수 있고, 90중량% 초과인 경우 고형분이 과도하게 적어져 코팅 상에 어려움이 따르고 건조시켜야 하는 용매의 양이 많아져 공정 면에서 좋지 못하다.
The solvent may be contained in an amount of 75 to 90% by weight based on 100% by weight of the ink composition. When the content is less than 75% by weight, the solid content is increased and the viscosity is increased to deteriorate the coating property. When the content is more than 90% by weight, the solid content is excessively decreased to cause difficulties in the coating phase and a large amount of solvent It is not good in terms of process.

착색제coloring agent

본 발명의 잉크 조성물은 당 분야에 공지된 착색제를 더 포함할 수 있다.The ink composition of the present invention may further comprise colorants known in the art.

착색제는 안료, 염료, 합성 또는 천연 색소와 같은 유기 착색제, 또는 금속 산화물, 금속 착염, 황산바륨(체질 안료) 등의 무기 착색제일 수 있다.The coloring agent may be an organic coloring agent such as pigment, dye, synthetic or natural coloring matter, or an inorganic coloring agent such as metal oxide, metal complex salt, barium sulfate (extender pigment).

착색제로는 칼라 인덱스(Color Index, The Society of Dyers and Colourists) 내에 안료 및 염료로서 분류된 화합물을 사용할 수 있으며, 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.As the colorant, compounds classified as pigments and dyes in the Color Index (The Society of Dyers and Colourists) may be used, and these may be used alone or in combination of two or more.

안료의 구체적인 예로는, C.I. 안료 황색 1호, 12호, 13호, 14호, 15호, 16호, 17호, 20호, 24호, 31호, 53호, 83호, 86호, 93호, 94호, 109호, 110호, 117호, 125호, 128호, 137호, 138호, 139호, 147호, 148호, 150호, 153호, 154호, 166호, 173호, 180호, 185호; C.I. 안료 오렌지색 13호, 31호, 36호, 38호, 40호, 42호, 43호, 51호, 55호, 59호, 61호, 64호, 65호, 71호, 73호; C.I. 안료 적색 9호, 97호, 105호, 122호, 123호, 144호, 149호, 166호, 168호, 176호, 177호, 180호, 192호, 215호, 216호, 224호, 242호, 254호, 255호, 264호, 265호; C.I. 안료 청색 15호, 15:3호, 15:4호, 15:6호, 60호; C.I. 안료 자주색 1호, 14호, 19호, 23호, 29호, 32호, 33호, 36호, 37호, 38호; C.I. 안료 녹색 7호, 10호, 15호, 25호, 36호, 47호; C.I. 안료 갈색 23호, 25호, 28호; C.I. 안료 블랙 1호, 7호, 카본 블랙 등을 들 수 있다.Specific examples of the pigment include C.I. Pigment yellow 1, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 180, 185; C.I. Pigment orange No. 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73; C.I. Pigment red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 215, 216, 224, 242, 254, 255, 264, 265; C.I. Pigment Blue 15, 15: 3, 15: 4, 15: 6, 60; C.I. Pigment purple No. 1, No. 14, No. 19, No. 23, No. 29, No. 32, No. 33, No. 36, No. 37, No. 38; C.I. Pigment Green 7, 10, 15, 25, 36, 47; C.I. Pigment brown No. 23, No. 25, No. 28; C.I. Pigment black No. 1, No. 7, carbon black, and the like.

염료의 구체적인 예로는, C.I. 솔벤트 황색 2호, 14호, 16호, 33호, 34호, 44호, 56호, 82호, 93호, 94호, 98호, 116호, 135호; C.I. 솔벤트 오렌지색 1호, 3호, 7호, 63호; C.I. 솔벤트 적색 1호, 2호, 3호, 8호, 18호, 23호, 24호, 27호, 35호, 43호, 45호, 48호, 49호, 91:1호, 119호, 135호, 140호, 196호, 197호; C.I. 솔벤트 자주색 8호, 9호, 13호, 26호, 28호, 31호, 59호; C.I. 솔벤트 청색 4호, 5호, 25호, 35호, 36호, 38호, 70호; C.I. 솔벤트 녹색 3호, 5호, 7호 등을 들 수 있다.Specific examples of the dye include C.I. Solvent yellow 2, 14, 16, 33, 34, 44, 56, 82, 93, 94, 98, 116, 135; C.I. Solvent Orange No. 1, No. 3, No. 7, No. 63; C.I. Solvent Red 1, 2, 3, 8, 18, 23, 24, 27, 35, 43, 45, 48, 49, 91: 1, 119, 135 No. 140, No. 196, No. 197; C.I. Solvent Purple No. 8, No. 9, No. 13, No. 26, No. 28, No. 31, No. 59; C.I. Solvent Blue No. 4, No. 5, No. 25, No. 35, No. 36, No. 38, No. 70; C.I. Solvent Green No. 3, No. 5, No. 7 and the like.

착색제는 요구되는 색 특성에 따라 그 함량이 조절될 수 있으며, 잉크 조성물 총 100중량% 중에 5 내지 20중량%로 포함될 수 있다.
The content of the coloring agent may be adjusted according to the required color characteristics, and may be included in an amount of 5 to 20% by weight based on 100% by weight of the ink composition.

첨가제additive

상기와 같은 성분을 포함하는 잉크 조성물은 밀착성 증진제, 산화방지제, 분산제, 계면활성제 등의 첨가제를 1종 이상 더 포함할 수 있다.
The ink composition containing the above-mentioned components may further contain at least one additive such as an adhesion promoter, an antioxidant, a dispersant, and a surfactant.

<패턴><Pattern>

또한, 본 발명은 상기 잉크 조성물로 제조된 패턴을 제공한다.The present invention also provides a pattern made from the ink composition.

본 발명의 패턴은 컬러필터용 컬러 패턴, 블랙매트릭스 패턴, 블랙 컬럼 스페이서 패턴, 박막트랜지스터 패턴, 화상표시장치용 전극패턴 또는 격벽 패턴일 수 있다.The pattern of the present invention may be a color pattern for a color filter, a black matrix pattern, a black column spacer pattern, a thin film transistor pattern, an electrode pattern for an image display device, or a barrier rib pattern.

패턴은 기판 상에 상기 잉크 조성물을 도포하고, 열경화시킴으로써 형성할 수 있다.The pattern can be formed by applying the ink composition on a substrate and thermosetting it.

도포 방법은 특별히 한정되지 않으며, 예를 들면 옵셋 인쇄, 리버스 옵셋 인쇄, 스크린 인쇄, 그라비아 인쇄, 디스펜싱, 스프레이, 캐스팅, 바 코팅, 다이 코팅, 스핀 코팅 등의 방법에 의할 수 있다.The coating method is not particularly limited and may be carried out by, for example, offset printing, reverse offset printing, screen printing, gravure printing, dispensing, spraying, casting, bar coating, die coating and spin coating.

도포된 도막을 경화시킴으로써 패턴을 형성한다.The coated film is cured to form a pattern.

본 발명의 잉크 조성물은 보다 저온에서도 경화가 가능하므로, 보다 완화된 조건에서 패턴 형성이 가능하다. 예를 들면, 120 내지 150℃의 온도에서 10 내지 30분간 경화하여 패턴을 형성할 수 있으나, 이에 제한되는 것은 아니다.Since the ink composition of the present invention can be cured at a lower temperature, it is possible to form a pattern under more relaxed conditions. For example, the pattern can be formed by curing at a temperature of 120 to 150 DEG C for 10 to 30 minutes, but is not limited thereto.

이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 이들 실시예는 본 발명을 예시하는 것일 뿐 첨부된 특허청구범위를 제한하는 것이 아니며, 본 발명의 범주 및 기술사상 범위 내에서 실시예에 대한 다양한 변경 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속하는 것도 당연한 것이다.
It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the present invention and are not intended to limit the scope of the appended claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

실시예Example 1 One

안료 카본블랙 30중량% 및 폴리에스테르계 분산제(Diperbyk-2010, BYK사) 3중량%를 혼합하여 밀베이스를 제조하였다.30% by weight of pigment carbon black and 3% by weight of polyester dispersant (Diperbyk-2010, BYK) were mixed to prepare a mill base.

그 다음, 위 밀베이스를 23℃에서 교반하면서 중량평균분자량(Mw)이 5,000인 바인더 수지(m-크레졸 및 p-크레졸이 6:4의 중량비로 포함되어 중합, 포름알데히드 공중합) 12중량%, 디펜타에리트리톨헥사아크릴레이트(Toagoesi사) 8중량%, 경화제로 BI-7963(baxenden사) 1.5중량%, 계면활성제(TF-1535, DIC사) 0.2중량%, 및 조성물의 총 함량이 100중량%가 되도록 프로필렌글리콜모노메틸아세테이트를 혼합하였다.Next, 12% by weight of a binder resin having a weight average molecular weight (Mw) of 5,000 (containing m-cresol and p-cresol in a weight ratio of 6: 4 and polymerizing, formaldehyde copolymerization) , 8 wt% of dipentaerythritol hexaacrylate (Toagoes), 1.5 wt% of BI-7963 (baxenden) as a curing agent, 0.2 wt% of a surfactant (TF-1535, DIC) % Of propylene glycol monomethyl acetate.

그 다음, 위 혼합물을 3시간 동안 교반하여 잉크 조성물을 제조하였다.
Then, the above mixture was stirred for 3 hours to prepare an ink composition.

실시예Example 2-3,  2-3, 비교예Comparative Example 1- 3 1- 3

상기 실시예 1과 동일하게 실시하되, 바인더 수지, 경화제의 종류 및 함량을 하기 표 1에서와 같이 사용하였다.The binder resin, the kind and content of the curing agent were used in the same manner as in Example 1, as shown in Table 1 below.

구분division 바인더 수지Binder resin 경화제Hardener 종류Kinds 함량
(중량%)
content
(weight%)
종류Kinds 함량
(중량%)
content
(weight%)
실시예 1Example 1 AA 1212 BI-7963BI-7963 1.51.5 실시예 2Example 2 AA 1212 BI-7963BI-7963 0.050.05 실시예 3Example 3 AA 1212 BI-7963BI-7963 5.55.5 실시예 4Example 4 AA 1212 BI-7983BI-7983 2.02.0 비교예 1Comparative Example 1 BB 1212 BI-7983BI-7983 0.50.5 비교예 2Comparative Example 2 AA 1212 BI-7641BI-7641 0.50.5 비교예 3Comparative Example 3 AA 1212 SI-100L
(삼신화학사)
SI-100L
(Samsin Chemistry)
0.50.5
A: 실시예 1에서 사용된 바인더 수지
B: 중량평균분자량(MW)이 8,000인 메타크릴산과 벤질 메타크릴레이트와의 공중합체
A: The binder resin used in Example 1
B: Copolymer of methacrylic acid and benzyl methacrylate having a weight average molecular weight (MW) of 8,000

실험예Experimental Example

(1) 패턴의 밀착성 평가(1) Evaluation of pattern adhesion

실시예 및 비교예의 잉크 조성물을 스핀 코터를 이용하여 유리기판 위에 코팅하고, 120℃에서 30분 동안 가열하여 경화시켰다. 경화된 도막을 JIS K5400을 이용한 테이프 필링 테스트를 실시하여, 총 100개의 격자 뜯김의 정도를 조사하였으며, 결과를 도면에 나타내었다.
The ink compositions of Examples and Comparative Examples were coated on a glass substrate using a spin coater and cured by heating at 120 DEG C for 30 minutes. The cured coating film was subjected to a tape peeling test using JIS K5400, and the degree of the total of 100 pieces of the grid-cut was examined. The results are shown in the drawing.

(2) 내화학성 평가(2) Chemical resistance evaluation

상기 실험예 (1)에서 제조된 도막을 1% 수산화칼륨 수용액(내알칼리성), MA-So2(동우화인켐 에천트)(내산성) 및 SAM-19(내박리액성)에 각각 50℃에서 2분간 침지하여 침지 전후의 밀착성 변화로 내화학성을 평가하였다.The coating film prepared in Experimental Example 1 was immersed in a 1% potassium hydroxide aqueous solution (alkali-resistant), MA-So2 (Dongwoo Fine Chemical Co., Ltd.) (acid resistance) and SAM-19 And the chemical resistance was evaluated by the change of adhesion before and after immersion.

<평가 기준><Evaluation Criteria>

○: 90 내지 100개의 격자무늬 존재 (양호)?: 90 to 100 presence of plaids (good)

△: 80 이상 내지 90개 미만의 격자무늬 존재 (보통)DELTA: Existence of lattice pattern of not less than 80 and not more than 90 (normal)

X: 80개 미만의 격자무늬 존재 (불량)
X: Less than 80 grid patterns (defective)

(3) 저장안정성 평가(3) Evaluation of storage stability

실시예 및 비교예의 잉크 조성물의 초기 점도를 측정하고 5℃에 각각 1개월간 보관한 후 점도를 측정하여 그 점도 변화를 관찰하였다. 점도는 25℃에서 브룩필드 점도계(Brookfield Viscometer DVI+, BROOKFIELD사 제조)로 측정하였다. 측정 결과는 하기 표 1에 나타내었다.The initial viscosity of the ink compositions of Examples and Comparative Examples was measured and stored at 5 占 폚 for one month, respectively, and the viscosity was measured to observe the viscosity change. The viscosity was measured with a Brookfield viscometer (Brookfield Viscometer DVI +, manufactured by BROOKFIELD) at 25 ° C. The measurement results are shown in Table 1 below.

◎: 점도 변화 3% 이하◎: Viscosity change 3% or less

○: 점도 변화 3% 초과 내지 5% 이하?: Viscosity change from more than 3% to less than 5%

△: 점도 변화 5% 초과 내지 10%?: Change in viscosity exceeding 5% to 10%

×: 점도 변화 10% 초과
×: Viscosity change exceeding 10%

구분division 밀착성Adhesiveness 내화학성Chemical resistance 저장안정성Storage stability 내알칼리성Alkali resistance 내산성Acid resistance 내박리액성My peeling liquor 실시예 1Example 1 실시예 2Example 2 실시예 3Example 3 실시예 4Example 4 비교예 1Comparative Example 1 XX 비교예 2Comparative Example 2 XX 비교예 3Comparative Example 3 XX XX

상기 표 2를 참조하면, 120℃의 저온 경화 공정을 거쳐 패턴을 형성하였지만, 실시예 1 내지 4의 잉크 조성물로 제조된 패턴은 기재와의 밀착성이 우수하고, 우수한 내화학성을 나타내었다.Referring to Table 2, a pattern was formed through a low-temperature curing process at 120 ° C. However, the patterns prepared from the ink compositions of Examples 1 to 4 exhibited excellent adhesion to a substrate and excellent chemical resistance.

그러나, 비교예 1 내지 3의 조성물로 제조된 패턴은 기재와의 밀착성 및 내화학성이 불량하였다.However, the patterns prepared with the compositions of Comparative Examples 1 to 3 had poor adhesion to the substrate and poor chemical resistance.

Claims (6)

노볼락 수지, 하기 화학식 1로 표시되는 경화제, 에틸렌성 불포화 이중결합을 갖는 다관능성 단량체 및 용매를 포함하는, 저온 경화형 열경화성 잉크 조성물:
[화학식 1]
Figure 112014052210616-pat00009

(식 중, R1은 탄소수 1 내지 5의 알킬기,
Figure 112014052210616-pat00010
,
Figure 112014052210616-pat00011
또는
Figure 112014052210616-pat00012
이고;
R2는 탄소수 1 내지 10의 알킬렌기이며;
R3 및 R4는 서로 독립적으로 탄소수 1 내지 5의 알킬기이며;
n은 1 내지 3의 정수임).
Curable thermosetting ink composition comprising a novolak resin, a curing agent represented by the following formula (1), a polyfunctional monomer having an ethylenically unsaturated double bond, and a solvent:
[Chemical Formula 1]
Figure 112014052210616-pat00009

(Wherein, R 1 is an alkyl group having 1 to 5 carbon atoms,
Figure 112014052210616-pat00010
,
Figure 112014052210616-pat00011
or
Figure 112014052210616-pat00012
ego;
R 2 is an alkylene group having 1 to 10 carbon atoms;
R 3 and R 4 are independently of each other an alkyl group having 1 to 5 carbon atoms;
and n is an integer of 1 to 3).
청구항 1에 있어서, 상기 경화제는 조성물 총 중량 중 0.1 내지 5중량%로 포함되는, 저온 경화형 열경화성 잉크 조성물.
The low temperature curable thermosetting ink composition according to claim 1, wherein the curing agent is contained in an amount of 0.1 to 5% by weight based on the total weight of the composition.
삭제delete 청구항 1에 있어서, 상기 노볼락 수지는 조성물 총 중량 중 10 내지 20중량%로 포함되는, 저온 경화형 열경화성 잉크 조성물.
The low temperature curable thermosetting ink composition according to claim 1, wherein the novolak resin is contained in an amount of 10 to 20% by weight based on the total weight of the composition.
청구항 1, 2 및 4 중 어느 한 항의 조성물로 형성된 패턴.
A pattern formed from the composition of any one of claims 1, 2 and 4.
청구항 5에 있어서, 컬러필터용 컬러 패턴, 블랙매트릭스 패턴, 블랙 컬럼 스페이서 패턴, 박막트랜지스터 패턴, 화상표시장치용 전극패턴 또는 격벽 패턴인, 패턴.The pattern according to claim 5, wherein the pattern is a color pattern for a color filter, a black matrix pattern, a black column spacer pattern, a thin film transistor pattern, an electrode pattern for an image display device, or a barrier rib pattern.
KR1020140013647A 2014-02-06 2014-02-06 Thermosetting ink composition KR101418026B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020140013647A KR101418026B1 (en) 2014-02-06 2014-02-06 Thermosetting ink composition
TW104102111A TWI662086B (en) 2014-02-06 2015-01-22 Thermosetting ink composition
CN201510059664.XA CN104834183B (en) 2014-02-06 2015-02-04 Thermosetting ink composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140013647A KR101418026B1 (en) 2014-02-06 2014-02-06 Thermosetting ink composition

Publications (1)

Publication Number Publication Date
KR101418026B1 true KR101418026B1 (en) 2014-08-08

Family

ID=51748705

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140013647A KR101418026B1 (en) 2014-02-06 2014-02-06 Thermosetting ink composition

Country Status (3)

Country Link
KR (1) KR101418026B1 (en)
CN (1) CN104834183B (en)
TW (1) TWI662086B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160139985A (en) * 2015-05-29 2016-12-07 동우 화인켐 주식회사 Low-temperature thermosetting composition for printing, flexible color filter and method for preparing flexible color filter using the same
CN108264798A (en) * 2016-12-30 2018-07-10 怡凌股份有限公司 Thermosetting ink and the method using its manufacture film
US10042253B2 (en) 2016-01-11 2018-08-07 Samsung Display Co., Ltd. Photosensitive resin composition, film prepared by using the photosensitive resin composition, and organic light-emitting display device including the film
US10775698B2 (en) 2017-04-10 2020-09-15 Samsung Display Co., Ltd. Photosensitive resin composition and electronic device including cured product of pattern-forming composition including the photosensitive resin composition
WO2024048893A1 (en) * 2022-08-30 2024-03-07 삼성에스디아이 주식회사 Photosensitive resin composition, photosensitive resin layer manufactured using same, and color filter

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009505156A (en) * 2005-08-19 2009-02-05 イーストマン コダック カンパニー Condensed polymer photoconductive element
JP2012103472A (en) 2010-11-10 2012-05-31 Toyo Ink Sc Holdings Co Ltd Ink jet ink composition
KR20130135094A (en) * 2012-05-31 2013-12-10 주식회사 엘지화학 Thermosetting resin composition, thermosetting material manufactured by using the thermosetting resin composition, display device having the thermosetting material and method for manufacturing color filter

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000267270A (en) * 1999-03-19 2000-09-29 Clariant (Japan) Kk Photosensitive resin composition for roll coating and roll coating method
JP3844236B2 (en) * 2002-11-25 2006-11-08 Azエレクトロニックマテリアルズ株式会社 Photosensitive resin composition containing photosensitive resin composition coatability improver
KR101839397B1 (en) * 2010-03-17 2018-03-16 도레이 카부시키가이샤 Silane coupling agent, negative-type photosensitive resin composition, curable film and touch panel component
BR112012026240B1 (en) * 2010-04-16 2021-08-03 Swimc Llc ARTICLE, METHOD, AND, COATING COMPOSITION
JP6028478B2 (en) * 2011-10-14 2016-11-16 Jsr株式会社 Colorant, coloring composition, color filter and display element

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009505156A (en) * 2005-08-19 2009-02-05 イーストマン コダック カンパニー Condensed polymer photoconductive element
US7541124B2 (en) 2005-08-19 2009-06-02 Eastman Kodak Company Condensation polymer photoconductive elements
JP2012103472A (en) 2010-11-10 2012-05-31 Toyo Ink Sc Holdings Co Ltd Ink jet ink composition
KR20130135094A (en) * 2012-05-31 2013-12-10 주식회사 엘지화학 Thermosetting resin composition, thermosetting material manufactured by using the thermosetting resin composition, display device having the thermosetting material and method for manufacturing color filter

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160139985A (en) * 2015-05-29 2016-12-07 동우 화인켐 주식회사 Low-temperature thermosetting composition for printing, flexible color filter and method for preparing flexible color filter using the same
KR102322286B1 (en) * 2015-05-29 2021-11-04 동우 화인켐 주식회사 Low-temperature thermosetting composition for printing, flexible color filter and method for preparing flexible color filter using the same
US10042253B2 (en) 2016-01-11 2018-08-07 Samsung Display Co., Ltd. Photosensitive resin composition, film prepared by using the photosensitive resin composition, and organic light-emitting display device including the film
CN108264798A (en) * 2016-12-30 2018-07-10 怡凌股份有限公司 Thermosetting ink and the method using its manufacture film
US10775698B2 (en) 2017-04-10 2020-09-15 Samsung Display Co., Ltd. Photosensitive resin composition and electronic device including cured product of pattern-forming composition including the photosensitive resin composition
WO2024048893A1 (en) * 2022-08-30 2024-03-07 삼성에스디아이 주식회사 Photosensitive resin composition, photosensitive resin layer manufactured using same, and color filter

Also Published As

Publication number Publication date
TW201531536A (en) 2015-08-16
TWI662086B (en) 2019-06-11
CN104834183B (en) 2019-11-12
CN104834183A (en) 2015-08-12

Similar Documents

Publication Publication Date Title
KR101418026B1 (en) Thermosetting ink composition
TWI461843B (en) Photosensitive resin composition being curable at low temperature
KR101631059B1 (en) Color resist composition and color filter using the same
JP4988457B2 (en) Photoresist composition and method for producing color filter substrate using the same
KR101491269B1 (en) Colored photosensitive resin composition, color filter and liquid crystal display
CN101490170A (en) Curable resin composition and method for forming cured coating film
CN102591148A (en) Colored photosensitive resin composition for touch panel, touch panel and display device
CN101374878B (en) Positive photosensitive resin composition and cured film obtained therefrom
CN101770172A (en) Organic layer photosensitive resin composition and organic layer fabricated using same
JP6925807B2 (en) A photosensitive resin composition, a film produced from the photosensitive resin composition, and an organic light emitting display device containing the film.
CN108693712B (en) Photosensitive resin composition and electronic device including the same
CN105938298A (en) Negative-type photosensitive resin composition, photocuring pattern using the composition and image display device
CN106959579A (en) Photosensitive composition, colour filter and the image display device for possessing it
JP5969166B2 (en) Photosensitive colorant-dispersed resin composition for color filter, color filter and image display device
TWI416174B (en) Resit composition for color filter, method for making such composition and color filter using such composition
US8492459B2 (en) Ink composition and method of forming a pattern using the same
TW201942146A (en) Alkali developable photocurable thermosetting resin composition
KR102180283B1 (en) Black photosensitive resin composition, cured film thereof, and colour filter or touch panel made by using that film
CN106959582B (en) Photosensitive resin composition, film prepared using the same, and OLED device including the film
TWI439498B (en) Fluoro-containing novalac resin, fluoro-series surfactant, fluoro-series surfactant composition and resin composition
TW201619296A (en) Curable resin composition, dry film, cured article, and printed wiring board
KR20090062510A (en) Ink composition
US10527936B2 (en) Low Dk/Df solder resistant composition use for printed circuit board
CN109244104A (en) The optical filter of organic luminescent device and organic luminescent device including it
KR102084218B1 (en) composition for forming patterns of non-display part

Legal Events

Date Code Title Description
AMND Amendment
AMND Amendment
X701 Decision to grant (after re-examination)
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20170621

Year of fee payment: 4