KR101409541B1 - N port feeding system for realizing broadband using a slot - Google Patents

Abstract

An N port feeding system capable of outputting power through a plurality of ports is disclosed. The feeding system includes a first substrate, first patterns that are conductors arranged on the first substrate, a second substrate that is spaced apart from the first substrate, and a second pattern that is a conductor arranged on the second substrate . Here, the second pattern connects the first patterns through an electrical coupling method, and at least one slot is formed in one of the first patterns and the second pattern.

Description

TECHNICAL FIELD [0001] The present invention relates to an n-port feeding system for realizing broadband using a slot,

The present invention relates to an N port feeding system capable of outputting power through a plurality of ports.

A feeding system feeds power inputted from the outside to another element, for example, radiation elements through an output terminal. For example, the feeding system includes a phase shifter (not shown) used in an antenna as shown in FIG. 1 Phase shifter.

1 is a view showing a general antenna.

1, the antenna includes a reflection plate 100, a plurality of phase shifters 102 formed on one side of the reflection plate 100, and a plurality of radiation elements 104 formed on the other side of the reflection plate 100 .

The phase shifter 102 adjusts the angle of the beam output from the radiation elements 104, that is, the tilt angle, by varying the phase of the power (RF signal) transmitted to the corresponding radiation elements 104.

In general, three phase shifters 102 are connected to three radiating elements 104, and thus, in order to supply power to a plurality of radiating elements 104, for example 15 radiating elements, that is, 15 Five phase shifters 102 are required to implement the port. As a result, five phase shifters 102 are inevitably arranged in series on one surface of the reflection plate 100, so that the size of the antenna is inevitably increased.

In addition, since each of the phase shifters 102 is controlled, it is not easy to control the inclination angle of the antenna at a desired angle, and it is inconvenient to control.

The present invention provides an N port feeding system that is convenient to use while reducing the size of the antenna.

According to an aspect of the present invention, there is provided a feeding system including: a first substrate; First patterns that are conductors arranged on the first substrate; A second substrate spaced apart from the first substrate; And a second pattern that is a conductor arranged on the second substrate. Here, the third pattern may be formed by connecting the first patterns through an electrical coupling method, forming a first slot in a specific first pattern, forming a second slot in the third pattern, A third slot is formed by the first pattern and the third pattern when positioned on the first pattern.

According to another aspect of the present invention, there is provided a feeding system comprising: a first substrate; First patterns that are conductors arranged on the first substrate; A second substrate spaced apart from the first substrate; And a second pattern that is a conductor arranged on the second substrate. Wherein the second pattern connects the first patterns through an electrical coupling manner, the first patterns each having a partially different width, the second pattern having a partially different width, Is arranged on the first pattern, at least one slot is formed by the first pattern and the second pattern.

According to another aspect of the present invention, there is provided a feeding system including: a first substrate; First patterns that are conductors arranged on the first substrate; A second substrate spaced apart from the first substrate; And a second pattern that is a conductor arranged on the second substrate. Here, the second pattern connects the first patterns through an electrical coupling method, and the number of slots formed by the first pattern and the second pattern when the first substrate or the second substrate moves The width is different from the number or the width of the slots generated by the first pattern and the second pattern before the first substrate or the second substrate moves.

The feeding system according to the present invention may be configured to electrically connect first patterns of a 'U' shape arranged in a plurality of stages using third patterns, and to electrically connect second patterns arranged in parallel with the first patterns For example, 15 ports by appropriately setting the number of the first patterns and the number of the second patterns by electrically connecting the first patterns and the fourth patterns. For example, one power supply can be supplied to 15 radiation elements at once using one feeding system. Therefore, the size of the antenna using the feeding system can be reduced.

In addition, since only one feeding system is controlled to control the multi-port, it is easy and convenient for the user to use the feeding system. In particular, since only one of the first substrate and the second substrate is linearly moved to adjust the tilt angle, the control of the feeding system is also simple.

In addition, since the slots are formed in the patterns to optimize the impedance matching, the antenna using the feeding system can be implemented in a wide band.

Moreover, since the feeding system delays or distributes the input power, the feeding system can be utilized variously as power dividers, delay elements, etc. as well as the phase shifter.

1 is a view showing a general antenna.
2 is a perspective view illustrating a feeding system according to an embodiment of the present invention.
FIG. 3 is a view schematically showing a feeding structure of the feeding system of FIG. 2. FIG.
4 is a diagram schematically illustrating a phase change process of a feeding system according to an embodiment of the present invention.
5 is an enlarged view of the portion "A" of Fig. 3 according to an embodiment of the present invention.
FIG. 6 is a diagram illustrating reflection loss characteristics of a feeding system according to an embodiment of the present invention.
7 is a diagram illustrating a power distribution scheme according to an embodiment of the present invention.
FIG. 8 is a diagram illustrating beam width characteristics according to the power distribution method of FIG.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a perspective view illustrating a feeding system according to an embodiment of the present invention.

The feeding system of the present embodiment refers to all elements that supply power input from the outside to other elements through an output terminal, and includes, for example, a phase shifter and a delay element.

Hereinafter, the structure and operation of the feeding system will be described using the phase shifter as an example.

Referring to FIG. 2, the feeding system of this embodiment includes a first feeding element 200 and a second feeding element 202 spaced from each other.

The first feeding element 200 includes a first dielectric substrate 204, at least one first pattern 210, one or more second patterns 212, an input pattern 214, distribution patterns 216 and 218, At least one fifth pattern (230) and at least one sixth pattern (232). Although not shown in FIG. 2, first coupling preventing elements, which are conductors, are further arranged between the first patterns 210 to prevent coupling between the first patterns 210, Second anti-coupling elements may be further arranged between the second patterns 212 to prevent coupling between the first and second patterns 212. [ For example, the coupling prevention element may be physically separated from the patterns by being arranged in a rectangular shape between the patterns.

The second feeding element 202 includes a second dielectric substrate 206, at least one third pattern 220, and at least one fourth pattern 222.

The first dielectric substrate 204 is, for example, arranged on one side of a reflector (not shown) and is made of a dielectric material having a predetermined dielectric constant. A ground plate may be formed on the back surface of the first dielectric substrate 204 as described later.

The first pattern 210 is formed on the first dielectric substrate 204 as a conductor. According to an embodiment of the present invention, the first pattern 210 may have a shape of 'U' inverted as shown in FIG. 2, that is, an inverted U 'shape. Of course, the first pattern 210 may be said to have a U-shape depending on the viewing angle. Here, the 'U' character shape means all the patterns consisting of the left pattern, the intermediate pattern and the right pattern as described later. Although only one first pattern 214 is shown in FIG. 2, a plurality of first patterns 210 are generally formed. In this case, the first patterns 210 may all have the same shape and size, and some may have different shapes or sizes. In addition, the first patterns arranged before and after the first patterns 210 may have a shape different from that of the intermediate first patterns. For example, the first patterns arranged in front of and behind the first patterns may have a straight bar shape, and the first patterns in the middle may have a reverse U shape.

The second pattern 212 is arranged as a conductor, facing the first pattern 210 on the first dielectric substrate 204 as shown in FIG. According to an embodiment of the present invention, the second pattern 212 may have a U-shape, that is, the first pattern 210 may be formed to face the first pattern 210 with the same shape. In FIG. 2, the second patterns 212 all have the same shape and size, but some may have different shapes or sizes. In addition, the second patterns arranged before and after the second patterns 212 may have a shape different from the intermediate second patterns. For example, the second patterns arranged in the front and the back may have a straight bar shape, and the middle second patterns may have a " U " shape.

The input pattern 214 may be connected to an internal conductor of a cable (not shown) that transfers power to the end portion of the input pattern 214, for example, as an externally supplied portion.

The distribution patterns 216 and 218 are electrically connected to the input pattern 214, the first pattern 210 and the second pattern 212 as shown in FIG. 2, And distributes the power to the first pattern 210 and the second pattern 212.

2, the distribution patterns 216 and 218 are connected to the pattern located at the leftmost of the first patterns 210 and the pattern located at the leftmost of the second patterns 212, 210 and 212, respectively.

2, the distribution patterns 216 and 218 are directly connected to the patterns 210 and 212, but they may be connected in a coupling manner.

The fifth pattern 230 is formed on the first dielectric substrate 204 as a conductor, and electrically connects the first pattern 210 and the corresponding radiation element. As a result, the powers input to the first patterns 210 are provided to the radiation elements via the corresponding fifth patterns 230, respectively, so that the radiation elements generate beams in a specific direction.

The sixth pattern 232 is formed on the first dielectric substrate 204 as a conductor and electrically connects the second pattern 212 and the corresponding radiation element. As a result, the powers input to the second patterns 212 are supplied to the radiation elements via the corresponding sixth patterns 232, respectively, so that the radiation elements generate beams in a specific direction.

According to an embodiment of the present invention, at least some of the phases of the powers (RF signals) flowing through the fifth patterns 230 and the sixth patterns 232 may be different.

According to another embodiment of the present invention, at least one of the fifth patterns 230 and the sixth patterns 232 may have an impedance different from the other fifth and sixth patterns. In another aspect, at least one of the patterns 230 and 232 may have a different size (width or length) than the other patterns. As a result, the magnitudes of the powers supplied to the respective radiation elements may be different. The impedances of these patterns 230 and 232 will be determined according to the characteristics of the beam to be implemented.

The second dielectric substrate 206 is made of a dielectric material having a predetermined dielectric constant and may have the same or different dielectric constant as the first dielectric substrate 204.

The third patterns 220 are formed as a conductor on the second dielectric substrate 206, for example, regularly. According to an embodiment of the present invention, the third pattern 220 may have a U-shape as shown in FIG.

The third patterns 220 electrically connect the first patterns 210.

The fourth patterns 222 are formed as conductors so as to face the third patterns 220 on the second dielectric substrate 206. According to an embodiment of the present invention, the fourth pattern 222 may have an inverted 'U' shape as shown in FIG.

The fourth patterns 222 electrically connect the second patterns 212.

However, as long as the third patterns 220 and the fourth patterns 222 electrically connect the first patterns 210 and the second patterns 212, the structure of the patterns 220 and 222 Is not limited to the structure of FIG. 2 and may be variously modified.

As shown in FIG. 2, the second feeding element 202 is spaced a predetermined distance from the first feeding element 200, so that the first feeding element 200 and the second feeding element 200 are separated from each other. Is placed on the feeding element 200 and moves, for example, linearly as shown in Fig. Of course, the first feeding element 200 may be configured to move while the second feeding element 202 is fixed. Also, the feeding element 200 or 202 moves linearly in the top, but may also move nonlinearly.

That is, the feeding system of the present invention electrically connects the first patterns 210 on the first dielectric substrate 204 using the third patterns 220 on the second dielectric substrate 206, The second patterns 212 are electrically connected to each other using the first and second patterns 222 and 222.

2, the feeding system is implemented by a two-stage structure in which the first patterns 210 are arranged on the first dielectric substrate 204 and the second patterns 212 are arranged on the lower side. However, .

Hereinafter, the feeding operation of the feeding system will be described in detail with reference to the accompanying drawings.

FIG. 3 is a view schematically showing a feeding structure of the feeding system of FIG. 2, and FIG. 4 is a view schematically showing a phase changing process of a feeding system according to an embodiment of the present invention. In FIG. 3, the dielectric substrates 204 and 206 are omitted for convenience of explanation.

3, the second dielectric substrate 206 is placed on the first dielectric substrate 204 such that the third patterns 220 face the first patterns 210, and the third patterns 220 220 electrically connect the first patterns 210 to each other. For example, the third pattern 220 electrically connects the right pattern of one of the first patterns 210 with the left pattern of the neighboring first pattern. As a result, some of the power input to the specific first pattern is transmitted through the third pattern 220 to the neighboring first pattern. And another part of the input power is transmitted to the corresponding radiation element 300 through the fifth pattern 230.

The fourth patterns 222 are arranged to face the second patterns 212 and the fourth patterns 222 electrically connect the second patterns 212. For example, the fourth pattern 222 electrically connects the right pattern of one of the second patterns 212 with the left pattern of the neighboring second pattern. As a result, some of the power input in the specific second pattern is transmitted through the fourth pattern 222 to the neighboring second pattern. And another part of the input power is transmitted to the corresponding radiation element 300 through the sixth pattern 232. [

According to an embodiment of the present invention, at least one slot may be formed in a part of each of the patterns 210, 212, 220 and 222 for a broadband implementation. For example, as shown in FIG. 4D, the slot 410 is formed in the right pattern of the first pattern 210a and the left pattern of the first pattern 210b adjacent to the first pattern 210a A slot 412 may be formed. 4 (E), a slot 420 may be formed in the left pattern 400a of the third pattern 220, and a slot 422 may be formed in the right pattern 400c. However, a slot may not be formed in the intermediate pattern 400b.

Referring to the phase change process using the patterns 210 and 220 of the structure, the third pattern 220 is located on the first patterns 210 as shown in FIG. 4A. Specifically, the left pattern 400a of the third pattern 220 is electrically connected to the first pattern 210a, and the right pattern 400c of the third pattern 220 is electrically connected to the first pattern 210b. Lt; / RTI > In this case, a new slot 430 is formed by overlapping the first pattern 210a and the left pattern 400a of the third pattern 220, and a new slot 430 is formed on the right side of the first pattern 210b and the third pattern 220 By overlapping the pattern 400c, a new slot 432 can be formed. That is, one slot 430 is formed while the first pattern 210a and the slots 410 and 420 of the left pattern 400a of the third pattern 220 are overlapped, and the first pattern 210b and third One slot 432 may be formed while the slots 412 and 422 of the right pattern 400c of the pattern 220 overlap.

When the phase of the RF signal transmitted to the radiation elements 300 is changed to tilt the beam of the antenna, the third pattern 220 may move downward as shown in FIG. 4B. As a result, a new slot 440 is created by overlapping the first pattern 210a and the third pattern 220, and the new slot 442 is formed by overlapping the first pattern 210b and the third pattern 220. [ ) Is generated. One slot 440 is formed by the first pattern 210a and the third pattern 220 and one slot 442 is formed by the first pattern 210b and the third pattern 220 One slot 430 is formed by the first pattern 210a and the third pattern 220 in FIG. 4A and one slot 430 is formed by the first pattern 210b and the third pattern 220, Lt; RTI ID = 0.0 > 432 < / RTI > However, the length of slot 440 is longer than slot 430 and the length of slot 442 is longer than slot 432. That is, the phase of the power (RF signal) input through the first pattern 210a and transmitted through the first pattern 210b is different in FIG. 4A and FIG. 4B. As a result, the beam output from the antenna can be tilted.

When the third pattern 220 is moved downward again as shown in FIG. 4C, the two slots 450 and 452 are formed by the first pattern 210a and the third pattern 220 And two slots 454 and 456 may be generated by the first pattern 210b and the third pattern 220. [ Slots 450 and 452 may have the same size and different sizes, and slots 454 and 456 may also have the same size and different sizes.

In other words, in the feeding system of the present invention, the size or the number of the slots generated by the first pattern 210 and the third pattern 220 may vary according to the degree of tilting of the antenna (inclination angle of the beam). The change of the slot may be performed by moving the third pattern 220 while the first pattern 210 is fixed and the first pattern 210 may be moved while the third pattern 220 is fixed ≪ / RTI >

Although only the slots generated by the first pattern 210 and the third pattern 220 are referred to above, the slot generated by the second pattern 212 and the fourth pattern 222 is also similar to that shown in FIG.

The size and the number of the slots are different for each tilting of the antenna in order to realize the wide band by performing the impedance matching at each tilting. That is, although the slots can perform various functions, they particularly perform impedance matching between patterns by frequency band. In other words, the slot can optimize the impedance matching for each frequency band. As described later, a broadband can be realized by using such a slot.

Although it is mentioned above that a slot is formed for each of the patterns 210, 212, 220 and 222, it may be said that the width of each pattern 210, 212, 220 and 222 is different from each other.

Hereinafter, the detailed structure when the patterns 210 and 220 are overlapped will be described in detail with reference to the accompanying drawings.

5 is an enlarged view of the portion "A" of Fig. 3 according to an embodiment of the present invention.

When the second feeding element 202 is placed on the first feeding element 200, the first patterns 210 and the third pattern 220 are overlapped as shown in FIG. 5A. The left pattern 400a of the specific third pattern 220 is overlapped with the right pattern of the first pattern 210a and the right pattern 400c of the third pattern 220 is overlapped with the right pattern of the first pattern 210a, And overlaps with the left pattern of the pattern 210b. As a result, the first pattern 210a is electrically connected to the first pattern 210b through the third pattern 220.

From a power point of view, the power input to the first pattern 210a is output as the first pattern 210b through the third pattern 220. [

If the first patterns (210a and 210b), the length of the side of the pattern as the length (the right side pattern, or left side pattern) l _m1, and the side of the third pattern 220, the pattern (the right side pattern, or left side pattern) l _m2 of La, The first pattern 210a or 210b and the third pattern 220 have a maximum _lm1 Or l _m2 ( l _m1 and l _m2 Lt; RTI ID = 0.0 > value). ≪ / RTI > In general, only the first pattern 210a or 210b and the third pattern 220 are partially overlapped as shown in FIG. 5A.

Assuming that the length of the non-overlapping pattern of the first pattern 210a or 210b is ls and _lm1 And l _m2 Is equal to 0 &_lt; = l _s &_lt; l _m1 .

)은 아래의 수학식 1과 같이 ls의 변화, 즉 전기적 길이(L)의 변화에 따라 가변된다. As described above, since the second feeding element 202 moves on the first feeding element 200, the size of the overlapping region of the first pattern 210a or 210b and the third pattern 220 is variable. As a result, ls and electric length L are changed in accordance with the movement. Therefore, the phase of the power (RF signal) output to the first pattern 210b

Is varied according to the change of ls, that is, the change of the electrical length L as shown in the following equation (1).

and? _g is the wavelength of the RF signal.

)은 ls의 길이 변화에 비례하여 변화됨이 확인된다. 여기서, 전기적 길이(L)는 ls에 비례하여 변화된다. Referring to Equation (1) above, the phase

) Is found to change in proportion to the length change of ls. Here, the electrical length L is changed in proportion to ls.

5A only considers the overlapped pattern of one of the patterns of FIG. 4, but actually, there are (n-1) / 2 overlapped patterns for each stage in the case of an n-port phase shifter having a two-stage structure. In this case, the electrical length (l _T ) of all the overlapped patterns is as shown in the following equation (2).

Here, λ _{g, max} means the largest wavelength in the bandwidth of the phase shifter, λ _{g, min} means the smallest wavelength in the bandwidth, and ε _r is the dielectric constant of the first substrate 210.

Referring to Equations (2) and (3), it is confirmed that the electrical length (1 _T ) of all the overlapped patterns is variable according to the wavelength depending on the number of ports and the bandwidth range.

5A, when the electrical length L is increased as the second feeding element 202 moves downward in FIG. 3, the first pattern 210b is formed as the first pattern 210b. The output power (RF signal) is delayed. That is, although the structure shown in FIG. 5A corresponds to a part of the phase shifter, it can function as a delay element by itself. That is, the feeding system of this embodiment can function as a delay element by overlapping the first patterns 210 and the third patterns 220. Here, the degree of delay will vary depending on the number of patterns 210 and 220 and the length of overlapping portions.

Hereinafter, the cross section of the structure shown in FIG. 5B will be described again.

A first pattern 210 is formed on the first dielectric substrate 204 and a third pattern 220 is formed on the second dielectric substrate 206 as shown in FIG. Also, a ground plate 502 is formed on the back surface of the first dielectric substrate 204.

According to an embodiment of the present invention, a dielectric layer 500 having a predetermined dielectric constant may be further present between the first pattern 210 and the third pattern 220. For example, a dielectric layer 500 is formed over the first patterns 210 and is used to reduce intermodulation distortion (PIMD) or to prevent corrosion.

Although not described above, the second patterns 212 and the fourth patterns 222 similarly operate. In addition, a dielectric layer may be further present between the second patterns 212 and the fourth patterns 222.

In summary, in the feeding system of the present embodiment, the electrical length of the overlapping portions between the first patterns 210 and the third patterns 220 and the overlap between the second patterns 212 and the fourth patterns 222 The electrical length of the parts is controlled to achieve the desired tilt angle. In particular, slots may be formed in the patterns 210, 212, 220, and 222 to realize a wide band.

Conventional antennas require many phase shifters to implement multiport, i.e., to supply power to multiple radiation elements. However, in the present embodiment, since multipoints can be implemented through a method of increasing the number of patterns 210 and 212 using one feeding system, the size of the antenna can be reduced. In particular, since the feeding system implements the patterns in a plurality of stages, the size of the antenna can be further reduced.

Further, if the patterns are embodied in a plurality of stages, the length of the cable can be shortened, which is more advantageous in terms of cost and aesthetics.

In addition, in the conventional antenna, it is inconvenient to adjust the tilt angle by controlling each of the phase shifters. However, the feeding system of the present invention is more convenient in use since the inclination angle can be adjusted by a simple operation of moving the second feeding element 202.

In addition, the feeding system of the present invention can be used as a phase shifter, but it can also be used as a delay element or the like, that is, various applications are possible.

In the above, although the first pattern and the second pattern exist as a distribution structure on the first dielectric substrate, only the first pattern may be formed on the first dielectric substrate. In this case, the feeding system does not include a distribution network.

FIG. 6 is a diagram illustrating reflection loss characteristics of a feeding system according to an embodiment of the present invention. 6A shows the reflection loss characteristic of a phase shifter using a pattern in which no slot is formed, and FIG. 6B shows a reflection loss characteristic of the phase shifter of the present invention using a pattern in which slots are formed . That is, the reflection loss characteristic was measured without forming a slot in the pattern, and the reflection loss characteristic was measured after forming a slot in the pattern.

Referring to FIG. 6 (A), it can be seen that the phase shifter using a pattern in which no slot is formed implements a frequency band of 1.7 GHz to 2.2 GHz based on -30 dB.

Referring to FIG. 6 (B), it can be seen that the phase shifter of the present invention using a slot-formed pattern realizes a frequency band of 1.7 GHz to 2.7 GHz based on -30 dB. That is, the frequency band of 500 MHz is extended.

7 is a view showing beam width characteristics according to a power distribution method. However, six phase shifters were used, and two beam emitters were connected to each phase shifter, and the beam width characteristics were tested.

As shown in FIG. 7 (B), when different powers are applied to different ports according to frequency bands as compared with when constant power is applied to each port regardless of the frequency band, A beam width variation of a low frequency and a high frequency in a beam width 802 at the time of applying a beam width is different from a beam width variation of a low frequency and a high frequency in a beam width 800 when constant power is applied to each port, It can be confirmed that it is improved by about 20%.

In summary, the feeding system of the present invention can improve the beam width by applying different power to each port according to the frequency band.

It will be apparent to those skilled in the art that various modifications, additions and substitutions are possible, without departing from the spirit and scope of the invention as defined by the appended claims. Should be regarded as belonging to the following claims.

200: first feeding element 202: second feeding element
204: first dielectric substrate 206: second dielectric substrate
210: first pattern 212: second pattern
216, 218: distribution pattern 220: third pattern
222: fourth pattern 230: fifth pattern
232: Pattern 6

Claims (9)

A first substrate;
First patterns that are conductors arranged on the first substrate;
A second substrate spaced apart from the first substrate; And
And a third pattern that is a conductor arranged on the second substrate,
Wherein the third pattern is formed by connecting the first patterns through an electrical coupling method, forming a first slot in a specific first pattern, forming a second slot in the third pattern, 1 pattern, the third slot is formed by the first pattern and the third pattern. delete The method according to claim 1, wherein, when the second substrate is moved while the first substrate is fixed, a fourth slot, in which the first pattern and the third pattern are formed by overlapping, Wherein the first pattern and the third pattern have a size different from a third slot generated by overlapping. The feeding system according to claim 1, wherein when the second substrate is moved while the first substrate is fixed, a plurality of fourth slots are formed by overlapping the first pattern and the third pattern. The method according to claim 1, wherein the number of the third patterns, in which the first pattern and the third pattern are formed by overlapping, varies depending on a degree of movement of one of the first substrate and the second substrate. system. The method of claim 1, further comprising forming second patterns on the first substrate opposite to the first patterns,
Wherein the first pattern has a reverse U shape and the second pattern has a U shape and power input to the feeding system is transmitted through the distribution network to the first patterns and the second patterns To the feeder system. A first substrate;
First patterns that are conductors arranged on the first substrate;
A second substrate spaced apart from the first substrate; And
And a second pattern that is a conductor arranged on the second substrate,
Wherein the second pattern connects the first patterns through an electrical coupling manner, each of the first patterns having a partially different width, the second pattern having a partially different width, Wherein at least one slot is formed by the first pattern and the second pattern when arranged on the first pattern. A first substrate;
First patterns that are conductors arranged on the first substrate;
A second substrate spaced apart from the first substrate; And
And a second pattern that is a conductor arranged on the second substrate,
Wherein the second pattern connects the first patterns through an electrical coupling method and the number or the width of the slots formed by the first pattern and the second pattern when the first substrate or the second substrate moves Wherein the first pattern or the second pattern is different from the number or the width of the slots generated by the first pattern and the second pattern before the first substrate or the second substrate moves. The feeding system according to claim 8, wherein each of the first patterns has a partially different width, and the second pattern has a partially different width.

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