KR101394109B1 - Substrate processing apparatus and Substrate processing system - Google Patents

Abstract

The present invention relates to a substrate processing apparatus and a substrate processing system, including a chamber having a reaction space, a plurality of substrate seating sections provided in the reaction space, a plurality of seating driving sections rotating the plurality of substrate seating sections, And a main driving unit for rotating and lifting the seat driving unit. The plurality of substrates can be directly seated on the substrate seating portion by rotating the seating driving portions for rotating and elevating the plurality of substrate seating portions on which the substrates are seated through the main driving portion.

Substrate, seat, drive, rotation, heating, loading

Description

[0001] DESCRIPTION [0002] Substrate processing apparatus and substrate processing system [

The present invention relates to a substrate processing apparatus and a substrate processing system, and more particularly, to a substrate processing apparatus of a batch type capable of simultaneously processing a plurality of substrates.

Background Art [0002] A batch type substrate processing apparatus is a device for placing a plurality of substrates on a plurality of substrate seating means and treating them simultaneously. That is, a thin film is simultaneously formed on a plurality of substrates, or a plurality of substrates are simultaneously etched.

In order to place a plurality of substrates on a plurality of substrate placing means in a conventional batch type substrate processing apparatus, a substrate holder for temporarily supporting a plurality of substrates is used above the substrate placing means. The substrate holder is provided with a plurality of substrate holding grooves, and can rotate or rotate in a predetermined direction to load or unload a plurality of substrates. That is, when one substrate is seated in the substrate support groove, the substrate holder rotates so that the empty substrate support groove is positioned in the region adjacent to the substrate exit. Through this, another substrate is held in an empty substrate support groove. The above operation can be repeated a plurality of times to load a plurality of substrates into the substrate processing apparatus. After the plurality of substrates are respectively placed in the plurality of substrate holding grooves, the substrate holding means is raised or the substrate holder is lowered to place the substrate on the substrate holding means.

However, this increases the manufacturing cost of the apparatus due to the addition of a separate substrate holder inside the substrate processing apparatus, and causes a problem that the substrate is damaged by the byproducts generated in the substrate holder. Further, there is a problem that the heat of the substrate placing means can not be transferred to the substrate during the loading of the substrate.

SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a substrate processing apparatus and a substrate processing system of a batch type capable of reducing the production cost and production of by-products and effectively heating the substrate.

The present invention includes a chamber having a reaction space, a plurality of substrate seating portions provided in the reaction space, a plurality of seating driving portions for rotating the plurality of substrate seating portions, and a main driving portion for rotating and elevating the plurality of seating driving portions And a substrate processing apparatus.

Preferably, the plurality of seat driving units raise and lower the plurality of corresponding seat seating units.

Each of the seating driving portions includes a seating driving shaft connected to the corresponding substrate seating portion, and a power portion for rotating and lifting or rotating the seating driving shaft.

A receiving member for receiving and fixing the plurality of seat driving units, and a plurality of lift pin units respectively mounted on the plurality of the seat receiving units and supporting the substrate.

The main driving unit may include a main driving shaft connected to the central area of the receiving member and a main driving unit rotating and lifting the main driving shaft.

Wherein each of the substrate seating portions includes a plate-shaped seating body portion, heating means for heating the seating body portion, and a plurality of pin grooves provided in the seating body portion, wherein each of the plurality of lift- A plurality of lift pins are provided.

Further comprising: a lift plate that is positioned in a lower region of the plurality of substrate seating portions to support the plurality of lift pin portions, and the accommodating member includes a plate rotating portion attached to and detached from the lift plate to lift and rotate the lift plate effective.

And a plurality of lift pin portions corresponding to the plurality of substrate seating portions and supporting the substrate, and a lift plate for supporting and fixing the plurality of lift pin portions.

Wherein each of the substrate seating portions includes a plate-shaped seating body portion, heating means for heating the seating body portion, and a plurality of pin grooves provided in the seating body portion, wherein each of the plurality of lift pin portions passes through the plurality of pin grooves It is possible to provide a plurality of lift pins.

Wherein the main driving unit includes a main driving shaft connected to the center of the lift plate and a central area of the receiving member, and a main power unit for lifting and rotating the main driving shaft, .

The lift plate is preferably fixed to a protruding portion protruding inward from a side wall surface of the chamber.

The main driving unit may further include a main driving unit for rotating and lifting the main driving shaft and the main driving shaft, and a plurality of connecting units for connecting and fixing the main driving shaft and the plurality of seating driving units.

The chamber preferably has a plurality of substrate outlets.

And a gas supply unit for supplying a process gas to the substrate mounted on the substrate seating unit.

In addition, the present invention provides a reaction chamber comprising a chamber having a reaction space, a plurality of substrate seating sections provided in the reaction space, a plurality of seating driving sections rotating the plurality of substrate seating sections, At least one substrate processing apparatus including a driving section, a transfer apparatus to which the substrate processing apparatus is attached, and a shielding section for coupling and sealing the substrate processing apparatus and the transfer apparatus.

The substrate processing apparatus includes a plurality of lift fin portions that are respectively mounted on the plurality of substrate seating portions and support the substrate, a lift plate that is positioned in a lower region of the plurality of substrate seating portions and supports the plurality of lift pin portions, Wherein the main driving part includes a main driving shaft connected to the center area of the receiving member and a main driving shaft connected to the main driving shaft for rotating and lifting the main driving shaft, And the like.

The substrate processing apparatus includes a plurality of lift fin portions disposed corresponding to the plurality of substrate seating portions and supporting the substrate, a lift plate for holding and fixing the plurality of lift pin portions, The main driving unit may include a main driving shaft connected to the center of the lift plate and a central area of the receiving member, and a main power unit for rotating the main driving shaft.

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The transfer device preferably includes a transfer unit for transferring a plurality of substrates.

As described above, according to the present invention, a plurality of substrates can be directly placed on a substrate seating portion by rotating a seating driving portion for rotating and elevating a plurality of substrate seating portions on which the substrates are placed, through the main driving portion.

In addition, the present invention can maintain the thermal equilibrium of the substrate by rotating the plurality of substrate seating portions through the seat driving portion, and can efficiently load and unload a plurality of substrates by revolving the plurality of substrate seating portions through the main driving portion.

In addition, since the present invention loads and unloads a plurality of substrates at the same time, loading and unloading time can be reduced.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It will be apparent to those skilled in the art that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know. Wherein like reference numerals refer to like elements throughout.

1 is a cross-sectional view of a substrate processing apparatus according to an embodiment of the present invention. 2 is a perspective view of a substrate processing apparatus according to an embodiment. 3 is a schematic plan view of a substrate processing apparatus according to an embodiment. 4 to 7 are cross-sectional views for explaining a substrate processing method of the substrate processing apparatus according to an embodiment. 8 and 9 are sectional views of a substrate processing apparatus according to a modification of the embodiment.

1 to 3, the substrate processing apparatus according to the present embodiment includes a chamber 100 having a reaction space, a plurality of substrate seating units 200 provided in the chamber, and a plurality of substrate seating units 200 A plurality of lift pin portions 400 corresponding to the plurality of substrate seating portions 200 and supporting the substrate 10; And a main driving unit 600 for lifting and rotating the lift plate 500, the plurality of seating driving units 300, and the substrate seating unit 200. As shown in FIG. 1, the apparatus further includes a gas supply unit 800 for supplying a process gas to the reaction space.

Here, the chamber 100 includes an upper chamber part 110 and a lower chamber part 120 forming a reaction space as shown in FIGS. Here, it is effective that the upper chamber part 110 is a chamber lead.

The chamber 100 further includes a plurality of outlets 131, 132, 130 through which the substrate 10 enters and exits. So that a plurality of substrates can be transferred to the inside and outside of the chamber 100 at one time. 2 and 3, two outlets (i.e., first and second outlets 131 and 132) are provided in one side area of the lower chamber part 120. In this embodiment, Whereby the two substrates 10 can be simultaneously moved in and out. As shown in FIG. 2, the first and second outlets 131 and 132 are formed as grooves passing through one side wall of the lower chamber part 120. At this time, the length of the groove in the major axis direction is preferably larger than the diameter of the substrate as shown in Fig. This allows smooth entry and exit of the substrate. It is effective that the first and second entrance / exit ports 131 and 132 are located at the same height. Where the height refers to the height from the bottom of the chamber. Of course, the height of the first and second access ports 131 and 132 may be different from each other. Although not shown, the present embodiment may further include a plurality of gate valve portions for opening and closing the first and second outlets 131 and 132, respectively. Of course, it is also possible to open and close the first and second entrance ports 131 and 132 using a single gate valve unit. Further, although not shown, the chamber 100 may further include an exhaust unit for exhausting gas inside the chamber 100.

A plurality of substrate seating portions 200a, 200b, 200c, 200d 200 are provided in the reaction space of the chamber 100. In the present embodiment, as shown in Figs. 1 to 3, four substrate seating portions (i.e., first to fourth substrate seating portions 200a, 200b, 200c, and 200d) are provided. However, the present invention is not limited thereto, and more or fewer substrate seating parts 200 may be provided. In this case, since two substrates are simultaneously moved in and out through the two outlets 130 in this embodiment, it is effective that the number of the substrate seating parts 200 is an even number. However, the present invention is not limited to this, and the number of the substrate seating parts 200 may be an odd number when a single substrate enters and exits through the respective entrance 130.

Each of the substrate seating parts 200 includes a plate-shaped seating body part 210, a plurality of pin grooves 220 provided in the seating body part 210, heating means 230 for heating the seating body part 210 ). Although not shown, the substrate seating part 200 may further include cooling means and temperature sensing means. In addition, concave grooves or protrusions for preventing slippage of the substrate 10 may be provided on the seating body portion 210.

In this embodiment, the substrate 10 is seated on the seating body 210. Preferably, the seating body 210 is formed in the same shape as the substrate 10. Of course, as shown in FIGS. 1 and 3, the size of the seating body 210 may be larger than the size of the substrate 10.

The substrate 10 loaded through the entrance 130 is first placed on the lift pin 400 mounted on the pin groove 220 and then the seating body 210 is raised to move the substrate 10 It seats. Of course, the substrate seating portion 200 of this embodiment can use an electrostatic force or a suction force for seating the substrate. That is, the electrostatic chuck can be used as the substrate seating unit 200 described above. The heating means 230 is provided inside the seating body portion 210 and can heat the substrate 10 placed on the seating body portion 210 by heating the seating body portion 210. A heating wire extending inside the seating body 210 by the heating means 230 may be used. That is, the seat heating body 210 can be heated by applying power to the heating wire to generate heat. As the heating means 230, heating means using various thermal energy such as light energy as well as heating means using such electric energy can be used.

Of course, in the present embodiment, the substrate 10 that has been loaded (loaded) inside the chamber 100 is not placed on a separate substrate-seating member but is directly seated on the seating body 210 by a lift pin. This is because the plurality of substrate seating parts 200 rotate (i.e., revolve) in the same direction by the above-mentioned driving part. A detailed description thereof will be described later.

In addition, each of the plurality of substrate seating portions 200 is rotated (i.e., rotated) by the plurality of seating driving portions 300. That is, in this embodiment, four seat driving units 300 corresponding to the first to fourth board seating units 200 are provided.

The seat driving part 300 includes a seat driving shaft 310 connected to the seat seating part 200 and a power part 320 for rotating the seating driving shaft 310. The seating drive shaft 310 is connected to the center region of the substrate seating portion 200. The power unit 320 includes a rotation unit that rotates the seat driving shaft 310, though not shown. At this time, a motor can be used as the rotating portion. However, the present invention is not limited to this, and the power unit 320 may include a lifting unit for lifting the seating driving shaft 320. Here, a gear, a motor, an LM guide, or a cylinder may be used as the elevating portion.

The seat mounting portion 200 can be independently rotated by the rotation of the seat driving shaft 310 by the power unit 320. That is, in the present embodiment, four substrate seating parts 200 are provided, and the substrate seating parts 200 can rotate independently at fixed positions. 1 to 3, one side of the substrate seating portion is adjacent to the sidewall surface of the chamber 100, and the other side is adjacent to the central region of the chamber 100. At this time, the temperature of the chamber 100 side wall surface is relatively lower than that of the central region. That is, heat is concentrated in the center of the chamber 100 due to the heating of the heating means of the plurality of substrate seating portions 200, and heat is taken away from the side walls of the chamber 100. Therefore, the heat applied to the substrate 10 placed on the substrate seating portion 200 also causes the sidewall region of the chamber 100 to be lowered. Accordingly, in this embodiment, the substrate seating unit 200 is rotated (i.e., rotated) at a fixed position. That is, each of the substrate seating parts 200 rotates in one direction (that is, clockwise or counterclockwise) with respect to the center of the seating body part 210. Whereby the heat of the substrate 10 can be uniformly maintained.

In this embodiment, a plurality of lift pin portions 400 are mounted on the pin grooves 220 of the plurality of substrate seating portions 200. That is, four lift pin portions 400 corresponding to four substrate seating portions 200 are provided. At this time, each of the plurality of lift pin portions 400 includes at least three lift pins. That is, the substrate 10 transferred into the chamber 10 through the three lift pins can be stably supported. As shown in the figure, the upper portion of the lift pin portion 400 is larger in size than the lower portion. So that the lift pin unit 400 can be mounted on the substrate seating unit 200. Accordingly, the pin groove 200 of the substrate seating portion 200 corresponds to the size of the upper region (that is, the upper surface region of the substrate seating portion 200) larger than the lower region. 1, since the plurality of lift pins of the lift pin unit 400 are fixed to the pin grooves 220, the area of the pin grooves 200 is penetrated to expose the lower side of the substrate 10 .

In this embodiment, the substrate mounting part 200 is moved up and down so that the substrate 10 on the lift pin part 400 is placed on the upper surface of the substrate mounting part 200 or the substrate 10 mounted on the upper surface of the substrate mounting part 200 (10) on the lift pin portion (400). That is, when the substrate seating part 200 rises, the lift fin 400 is fixed to the pin groove 200 of the substrate seating part 200. Therefore, it moves together with the raised lift pin portion 400. When the substrate mounting part 200 is lowered, the lift pin part 400 is supported and fixed by the lower substrate mounting part 200 and the lift plate 500. Whereby the substrate 10 can be positioned on the lift pin portion 400.

2 and 3, the lift plate 500 includes a round plate-like lift body 510 and a plurality of through-holes 520 provided in the lift body 510. [ That is, the lift plate 500 is positioned in the lower region of the substrate seating portion 200 as shown in FIG. Therefore, the seat driving shaft 310 of the seat driving part 300 passes through the through groove 520. In this embodiment, four through-holes 520 are provided in the lift body 510. A plurality of lift pin portions 400 are correspondingly arranged around the through-holes 520.

Here, the lift plate 500 is fixed to the chamber 100. That is, as shown in FIG. 1, the chamber 100 has a protrusion 121 protruding inward (in an inner space) in a lower side area of the side wall, and the protrusion 121 on the protrusion 121 The lift plate 500 is fixed to the protruding end surface. So that the lift plate 500 and the lift pin unit 400 positioned above the lift plate 500 can be fixed.

In the present embodiment, the plurality of substrate seating parts 200 can be rotated in one direction (for example, clockwise or counterclockwise) through the main driver 600. [ That is, the centers of the plurality of substrate seating portions 200 are spaced apart from each other at the center of the inner space of the chamber 100 by the same distance. The main driving unit 600 rotates clockwise or counterclockwise with respect to the center of the inner space.

At this time, each of the plurality of substrate seating portions 200 is fixedly coupled to the seating driving portion 300, and the plurality of the lift fin portions 400 are fixed to the corresponding substrate seating portion 200. Accordingly, the main drive unit 600 of this embodiment rotates the seat driving unit 300 and the lift plate 500.

In this embodiment, the main driving unit 600 further includes a receiving member 700 for rotating the plurality of seating driving units 300 and the lift plate 500 simultaneously. Here, the plurality of seat driving parts 300 are separately manufactured. The housing member 700 includes a housing body 710 for housing a plurality of seat driving parts 300 and a plate rotating part 720 mounted on the lift plate 500 and rotating the same.

The plurality of seat driving parts 300 are fixed to the bottom surface of the housing body 710. Accordingly, the main driving unit 600 rotates the housing body 710 of the receiving member 700, so that the plurality of seating driving units 300 can be rotated at the same time. 1, the housing body 710 is formed in an empty box shape, and the seating driving shaft 310 of the seating driving unit 300 passes through a space where the seating driving unit 300 is mounted Holes are provided. A plate rotating part 720 for rotating the lift plate 500 is provided in the center area on the upper side of the housing body 710. As shown in FIG. 1, the plate rotating unit 720 includes a plurality of protrusions. At this time, a plurality of projections are drawn into the concave groove provided in the lower central region of the plate rotating portion 720. The rotational force transmitted from the main driving unit 600 to the plate rotating unit 720 through the housing body 710 can be transmitted to the lift plate 500. [

The main driving unit 600 includes a main driving shaft 610 coupled to the receiving member 700 provided with the seat driving unit 300 and a main power unit 620 for raising and lowering the main driving shaft 610. The end of the main drive shaft 610 is fixedly coupled to the bottom surface of the housing body 710 of the housing member 700. At this time, the main drive shaft 610 and the receiving member 700 are preferably coupled so that the lifting and rotating force of the main driving shaft 610 can be transmitted to the receiving member 700. That is, the housing member 700 and the main drive shaft 610 can be coupled through welding or through a predetermined coupling member.

The main power section 620 can be separately manufactured by the rotating section and the elevating section. 1, the lifting unit of the main power unit 620 lifts and holds the receiving member 700 through the main driving shaft 610 and moves the lifting plate 700 through the plate rotating unit 720 of the receiving member 700, (500).

1, the lift plate 500 is fixed to the protrusion 121 of the chamber 100 to improve the stability and efficiency of the substrate processing apparatus, and the housing member 700 is fixed to the main power unit 620 (Not shown). Of course, the housing body 710 may be seated on the bottom surface of the chamber 100. In this embodiment, the lift plate 500 and the storage member 700 fixed in this manner must be rotated at the same time. Therefore, in order to simultaneously rotate the receiving member 700 and the lift plate 500, the lift plate 500 must be spaced apart from the protrusion 121, and the receiving member 700 is spaced from the bottom surface of the chamber 100 do. The housing body 710 is lifted by the main drive shaft 610 and the plate rotating portion 720 of the receiving member 700 pushes up the lift plate 500. [ So that the lift plate 500 and the accommodation member 700 can be easily rotated.

That is, the rotating part of the main power unit 620 can rotate the lift plate 500 and the receiving member 700 simultaneously as shown in FIG. At this time, since the lift plate 500 is spaced apart from the element that fixedly supports the lift plate 500, the lift plate 500 and the accommodation member 700 can be easily rotated by a small force. The plurality of seating power sections 300 on the inner side of the housing body 710 are rotated together with the rotation of the seating section 700. When the seating power section 300 is rotated through the rotation of the plurality of seating power sections 300, A plurality of substrate seating parts 200 coupled to the main driving part 600 are rotated about the main driving shaft 610 of the main driving part 600. In addition, the plurality of lift pin portions 400 mounted on the substrate seating portion 200 also rotate. Also, the lift plate 500 can rotate in the same manner as the housing body 710. In this embodiment, a brush-type connection wiring is used to supply power to the seat driving part 300 in the housing body 710 of the housing member 700. That is, since the housing member 700 rotates away from the bottom surface of the chamber 100, the wiring extends from one side of the housing member 700, and the bottom surface of the chamber 100 corresponding to the turning radius of the extended wiring And a pad electrically connected to the extension wiring may be provided. Also, the present invention is not limited to this, and power for driving the seat driving unit 300 may be provided through the main driving shaft 610 of the main driving unit 600. In addition, power may be supplied to the seat driving part 300, which rotates using liquid metal.

In this embodiment, as shown in FIG. 3, the substrate 10 is first placed on the two substrate seating parts 200, and then the substrate seating part 200 is rotated so as to be placed on the remaining two substrate seating parts 200 Each of the substrates 10 is seated. Therefore, it is preferable that the substrate seating portion 200 is rotated by about 180 degrees. Of course, if necessary, it may be rotated at intervals of 90 degrees or 270 degrees.

As described above, in the present embodiment, the substrate 10 can be directly mounted on the plurality of substrate seating parts 200 located in the chamber 100 by rotating the substrate seating part 200 directly. The substrate 10 can be heated through the substrate seating part 200 simultaneously with the loading of the substrate 10.

In the following, the operation of the substrate processing apparatus having the above-described structure will be described with reference to Figs. 4 to 7. Fig.

4, the housing body 710 is lowered through the main driving unit 600 and the lift plate 500 is placed on the protrusion 121 of the chamber 100. At this time, At this time, the seat driving part 300 is lowered due to the lowering of the housing body part 710. Therefore, the substrate seating part 200 connected to the seat driving part 300 is lowered. As a result, the lift pin part 400, which has been mounted in the pin groove 220 of the substrate mounting part 200, protrudes to the area above the substrate mounting part 200. That is, if the bottom of the lift pin part 400 comes into contact with the lift plate 500 while the substrate seating part 200 descends and the lift fin part 400 also descends, the lift fin part 400 does not descend anymore, Only the substrate seating portion 200 is lowered. So that the lift pin portion 400 protrudes from the substrate seating portion 200. At this time, the lower side of the lift pin unit 400 is fixed by the lift plate 500 and the substrate seating unit 200 as shown in FIG.

A plurality of substrates 10, that is, two substrates 10 are loaded through an entrance 130 of the chamber 100. At this time, the loaded substrate 10 is placed on the lift pin portion 400 protruding upward from the two substrate seating portions 200 adjacent to the entrance 130 as shown in FIG.

Next, as shown in FIG. 5, the housing body 710 of the receiving member 700 is lifted up first through the main driving unit 600 so that the substrate 10 is seated on the substrate seating unit 200. That is, when the housing body 710 is raised through the main driving unit 600, the seat driving unit 300 in the housing body 710 is lifted and the seat seating unit 200 is lifted by the seat driving unit 300 . At this time, due to the rise of the substrate seating part 200, the lift fin 400 is inserted into the pin groove 220 of the substrate seating part 200, so that the substrate 10, which is supported on the upper side of the lift fin 400, And is seated on the substrate seating portion 200 as shown in Fig. 5, the lift pin part 400 is mounted on the pin groove 220 of the substrate mounting part 200 and is lifted together with the substrate mounting part 200 to be separated from the lift plate 500.

6, the main driving unit 600 is further lifted so that the lift plate 500 is separated from the protrusion 121 of the chamber 100. As shown in FIG. 6, the protrusion of the plate rotating portion 720 of the receiving member 700 is inserted into the concave groove of the lift plate 500 (see FIG. 6) , And then the lift plate 500 is lifted. Subsequently, the main drive unit 600 rotates the main drive shaft 610. The rotation of the main drive shaft 610 causes the housing body 710 and the plate rotating portion 720 of the receiving member 700 to rotate. The plurality of seat driving parts 300 located inside the housing body 710 are rotated. As a result, the plurality of substrate seating parts 200 coupled to the seat driving part 300 also rotate. Then, the rotational force of the main drive shaft 610 is directly transmitted to the lift plate 500 by the plate rotation unit 720, so that the lift plate 500 also rotates together.

The substrate seating part 200 in which the substrate 10 is not placed is disposed adjacent to the substrate entrance 130 of the chamber 10. 4 and 5 are performed again to mount the substrate 10 on the remaining two substrate seating parts 200 to seat the substrate 10 on all four substrate seating parts 200 . Then, a plurality of substrate seating parts 200 are disposed at process positions through the main driving part 600. Subsequently, a gas is supplied to the substrate 10 through the gas supply unit 800 to perform a substrate processing process. At this time, the gas supply unit 800 provides a uniform process gas to the plurality of substrates 10.

Although not shown, the unloading process of the substrate can be performed by performing an operation opposite to the loading process described above. That is, for example, the substrate mounting part 200 is lowered through the main driving part 600 so that the substrate 10 placed on the substrate mounting part 200 is supported by the lift fin part 400, The substrate 10 supported by the lift pin portion 400 can be discharged to the outside of the chamber 100 through the transfer device. The main drive part 600 is lifted to raise the accommodation member 700 and the lift plate 500 and rotate them to rotate the substrate seating part 200 on which the substrate 10 is placed to the substrate entrance / (130). Subsequently, the substrate mounting part 200 is lowered to support the substrate 10 with the lift pin part 400, and then the substrate 10 can be discharged to the outside of the chamber 100 by the transfer device.

Further, the substrate processing apparatus of the present invention is not limited to the above description, and various modifications are possible.

That is, the lift pin unit 400 may be fixed to the lift plate 500 without being mounted on the substrate mount 200 as in the modification shown in FIG. Thus, the lift pin portion 400 can be prevented from shaking or gaping. In the modification of Fig. 8, each of the plurality of seat driving units 300 can be raised and lowered. In other words, each of the plurality of seat driving units 300 is lifted and rotated, and thus the plurality of seat seating units 200 can be lifted and rotated independently. The main driving shaft 610 of the main driving unit 600 may be coupled to the bottom surface of the lift plate 500 through the receiving member 700. Accordingly, the main housing 600 can lift and rotate the receiving member 700 and the lift plate 500 at the same time.

9, the seat driving part 300 may be fixed to the main driving shaft 610 of the main driving part 600 directly by the connecting part 750 without being fixed in the receiving member 700 have. In addition, as shown in FIG. 5, the exhaust unit 900 may be provided on the sidewall of the chamber 100. Thereby allowing unreacted gases and reaction residues within the chamber 100 to be evacuated to the side of the chamber 100. At this time, it is effective that the exhaust part 900 is located in the upper region of the lift plate 500. Although not shown, the lift pin portion 400 may be lifted or lowered. That is, in the above embodiment, the substrate seating part 200 is moved up and down by the seat driving part 300. However, the present invention is not limited thereto. The substrate seating part 200 is fixed on a predetermined fixing plate fixed to the main driving shaft 610 of the main driving part 600, and the lift pin part 400 is elevated It may be raised or lowered by a member. At this time, the elevating member may be rotated by the main drive shaft 610. Here, it is effective that the substrate seating portion 200 is rotated.

Further, although not shown, the substrate processing apparatus of the present embodiment may further include a separate plasma generation unit for generating plasma in the reaction space of the chamber 100. This can increase the process efficiency of substrate processing processes (e.g., thin film deposition and thin film etching).

The above-described substrate processing apparatus can be applied in various substrate processing systems.

10 is a schematic plan view of a substrate processing system according to an embodiment of the present invention.

Referring to FIG. 10, the substrate processing system according to the present embodiment includes a substrate processing apparatus 1000 and a transfer apparatus 2000 connected to the substrate processing apparatus 1000 to transfer the substrate 10. The apparatus further includes a shielding unit 3000 that connects the substrate processing apparatus 1000 and the transfer apparatus 2000 and seals the substrate processing apparatus 1000 as necessary. The shielding means 3000 is located in the region of the substrate entrance 130 of the substrate processing apparatus 1000 and is opened when the substrate 10 is moved in and out. 130). A gate valve can be used as this shielding means 3000.

The transfer device 2000 has a transfer unit 2100 for transferring a plurality of substrates. At this time, the robot arm can be used as the transfer unit 2100. The transfer device 2000 of this embodiment transfers two substrates to the substrate processing apparatus 1000 at the same time. Therefore, the robot arm used as the transfer unit 2100 is provided with two substrate supporting plates on which the substrate 10 is placed.

A load lock chamber can be used for the transfer device 2000 of this embodiment. Although not shown, the transport apparatus 2000 may further include a predetermined cassette section for accommodating the plurality of substrates 10 and an aligning section for aligning the substrate 10. [

11 is a schematic plan view of a substrate processing system according to another embodiment of the present invention.

As shown in Fig. 11, the cluster type can be used as the substrate processing system of this embodiment. That is, the substrate processing system of this embodiment includes a transfer apparatus 2000, a plurality of substrate processing apparatuses 1000 connected to the transfer apparatus 2000, and a load lock chamber 4000 connected to the transfer apparatus 2000 do. The inner space of the substrate processing apparatus 1000 and the transfer apparatus 2000 and the transfer chamber 2000 and the load lock chamber 4000 are respectively communicated with each other by the shielding means 3000 or separated or sealed with each other.

7, the transfer apparatus 2000 is formed in a hexagonal shape, and the substrate processing apparatus 1000 is mounted on each of the hexagonal three-sided regions, and the load lock chamber 3000 is mounted on the other one side region do. However, the present invention is not limited to this, and the transfer device 2000 may be formed into a polygonal shape or a circular shape. A plurality of substrate processing apparatuses 1000 may be connected to the transfer apparatus 2000. In this embodiment, three substrate processing apparatuses 1000a, 1000b, 1000c, and 1000 are connected to the transfer apparatus 2000. At this time, each of the substrate processing apparatuses 1000 can perform the same operation. However, the present invention is not limited to this, and different processing operations may be performed.

At this time, the transfer device 2000 of this embodiment preferably maintains a pressure similar to the internal pressure of the substrate processing apparatus 1000. The transport apparatus 2000 includes a plurality of transport units 2100a and 2100b. That is, a plurality of robot arms capable of transferring two substrates can be used. As described above, in the present embodiment, a plurality of substrate processing apparatuses 1000 are disposed in a single transfer apparatus 2000 to load or unload a substrate in the one substrate processing apparatus 1000, The substrate processing process can be performed. This can improve the efficiency of the process.

Although the present invention has been described with reference to the accompanying drawings and the preferred embodiments described above, the present invention is not limited thereto but is limited by the following claims. Accordingly, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope of the present invention as defined by the appended claims.

1 is a cross-sectional view of a substrate processing apparatus according to an embodiment of the present invention;

2 is a perspective view of a substrate processing apparatus according to an embodiment;

3 is a schematic plan view of a substrate processing apparatus according to an embodiment;

4 to 7 are cross-sectional views for explaining a substrate processing method of a substrate processing apparatus according to an embodiment.

8 and 9 are cross-sectional views of a substrate processing apparatus according to a modification of an embodiment.

10 is a schematic plan view of a substrate processing system according to an embodiment of the present invention;

11 is a schematic plan view of a substrate processing system according to another embodiment of the present invention;

Description of the Related Art

10: substrate 100: chamber

200: substrate mounting part 230: heating means

300: seat driving part 400: lift pin part

500: Lift plate 600: Main drive part

700: storage member 800: gas supply part

900: exhaust part 1000: substrate processing device

2000: transfer device 3000: shielding part

4000: Load lock chamber

Claims (19)

A chamber having a reaction space; A plurality of substrate seating portions provided in the reaction space; A plurality of seat driving units for rotating the plurality of seat seating units respectively; A housing member for housing and fixing the plurality of seat driving portions; A plurality of lift pin portions that are respectively mounted on the plurality of substrate seating portions and support the substrate; A lift plate that is provided between the plurality of substrate seating portions and the accommodating member and supports the plurality of lift pin portions; And And a main driving unit for rotating and elevating the plurality of seat driving units, Wherein the accommodating member includes a plate rotating portion that is attached to and detached from the lift plate to move up and down and rotate the lift plate. The method according to claim 1, Wherein the plurality of seat driving portions elevate the corresponding plurality of substrate seating portions. The method of claim 2, Wherein each of the seating driving portions includes a seating driving shaft connected to the corresponding substrate seating portion and a power portion for rotating and elevating the seating driving shaft. delete The method according to claim 1, Wherein the main driving unit includes a main driving shaft connected to a central area of the receiving member, and a main driving unit rotating and lifting the main driving shaft. The method according to claim 1, Each of the substrate seating portions includes a plate-shaped seating body, heating means for heating the seating body, and a plurality of pin grooves provided in the seating body, Wherein each of the plurality of lift pin portions includes a plurality of lift pins that are held in the plurality of pin grooves. delete delete delete delete The method according to claim 1, Wherein the lift plate is fixed to a protruding portion protruding inward from a side wall surface of the chamber. The method of claim 5, Further comprising a plurality of connection portions for connecting and fixing the main drive shaft and the plurality of seat driving portions. The method according to claim 1, Wherein the chamber has a plurality of substrate outlets. The method according to claim 1, Further comprising a gas supply unit for supplying a process gas to the substrate mounted on the substrate mount. A plurality of seat seating portions provided in the reaction space; a plurality of seat driving portions for rotating the plurality of seat seating portions; a housing member for receiving and fixing the plurality of seat driving portions; A plurality of lift pin portions that are respectively mounted on the substrate seating portions and that support the substrate; a lift plate that is provided between the plurality of substrate seating portions and the accommodation member and supports the plurality of lift pin portions; And a main driving unit that rotates and elevates the plurality of seat driving units, wherein the receiving member includes a plate rotating unit that is attached to and detached from the lift plate to lift and rotate the lift plate; A transfer device to which the substrate processing apparatus is connected; And And a shield for coupling and sealing the substrate processing apparatus and the transfer apparatus. 16. The method of claim 15, Wherein the main driving unit includes a main driving shaft connected to a central area of the receiving member, and a main power unit for rotating and lifting the main driving shaft. delete delete 16. The method of claim 15, Wherein the transfer device has a transfer part for transferring a plurality of substrates.

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