KR101357012B1 - 공초점 펄스 스트레처 - Google Patents

공초점 펄스 스트레처 Download PDF

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Publication number
KR101357012B1
KR101357012B1 KR1020087026061A KR20087026061A KR101357012B1 KR 101357012 B1 KR101357012 B1 KR 101357012B1 KR 1020087026061 A KR1020087026061 A KR 1020087026061A KR 20087026061 A KR20087026061 A KR 20087026061A KR 101357012 B1 KR101357012 B1 KR 101357012B1
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South Korea
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resonators
pulse
laser
output pulse
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Korean (ko)
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KR20080110863A (ko
Inventor
파라슈 피. 다스
토마스 호프만
강 레이
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사이머 엘엘씨
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
KR1020087026061A 2006-03-31 2007-03-23 공초점 펄스 스트레처 Active KR101357012B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/394,512 US7415056B2 (en) 2006-03-31 2006-03-31 Confocal pulse stretcher
US11/394,512 2006-03-31
PCT/US2007/007201 WO2007126693A2 (en) 2006-03-31 2007-03-23 Confocal pulse stretcher

Publications (2)

Publication Number Publication Date
KR20080110863A KR20080110863A (ko) 2008-12-19
KR101357012B1 true KR101357012B1 (ko) 2014-02-03

Family

ID=38575191

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087026061A Active KR101357012B1 (ko) 2006-03-31 2007-03-23 공초점 펄스 스트레처

Country Status (5)

Country Link
US (1) US7415056B2 (https=)
JP (1) JP5738528B2 (https=)
KR (1) KR101357012B1 (https=)
TW (1) TWI343681B (https=)
WO (1) WO2007126693A2 (https=)

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US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7643529B2 (en) * 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7620080B2 (en) * 2007-08-23 2009-11-17 Corning Incorporated Laser pulse conditioning
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20090250637A1 (en) * 2008-04-02 2009-10-08 Cymer, Inc. System and methods for filtering out-of-band radiation in EUV exposure tools
DE102008036572B4 (de) * 2008-07-31 2013-12-05 Carl Zeiss Laser Optics Gmbh Vorrichtung zum Bearbeiten von optischen Impulsen
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
JP6270820B2 (ja) * 2013-03-27 2018-01-31 国立大学法人九州大学 レーザアニール装置
US9515446B2 (en) * 2013-07-18 2016-12-06 Mitsubishi Electric Corporation Gas laser device
US9525265B2 (en) * 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
US9357625B2 (en) 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
CN104319615B (zh) 2014-11-02 2017-12-26 中国科学院光电技术研究所 一种基于双分束元件的准分子激光脉冲展宽装置
US9709897B2 (en) 2015-10-28 2017-07-18 Cymer, Llc Polarization control of pulsed light beam
JP6762364B2 (ja) * 2016-07-26 2020-09-30 ギガフォトン株式会社 レーザシステム
CN109143559B (zh) * 2018-10-23 2023-07-25 广东华奕激光技术有限公司 一种小型化的脉冲展宽器
TWI842962B (zh) * 2019-10-16 2024-05-21 美商希瑪有限責任公司 光學脈衝拉伸器、擴展光學脈衝拉伸器、雷射源、微影裝置及用於產生及導引雷射束之方法
JP7784444B2 (ja) * 2021-11-24 2025-12-11 ギガフォトン株式会社 パルス伸張器及び電子デバイスの製造方法

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JPH03257983A (ja) * 1990-03-08 1991-11-18 Tokyo Electric Power Co Inc:The レーザ発振器
US20020191654A1 (en) * 2001-01-29 2002-12-19 Brian Klene Laser lithography light source with beam delivery
JP2005148550A (ja) 2003-11-18 2005-06-09 Gigaphoton Inc 光学的パルス伸長器および露光用放電励起ガスレーザ装置
US6928093B2 (en) 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher

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US6067311A (en) * 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6535531B1 (en) * 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
US6704340B2 (en) * 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7167499B2 (en) * 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US6798812B2 (en) * 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03257983A (ja) * 1990-03-08 1991-11-18 Tokyo Electric Power Co Inc:The レーザ発振器
US20020191654A1 (en) * 2001-01-29 2002-12-19 Brian Klene Laser lithography light source with beam delivery
US6928093B2 (en) 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
JP2005148550A (ja) 2003-11-18 2005-06-09 Gigaphoton Inc 光学的パルス伸長器および露光用放電励起ガスレーザ装置

Also Published As

Publication number Publication date
JP5738528B2 (ja) 2015-06-24
US20070237192A1 (en) 2007-10-11
JP2009532864A (ja) 2009-09-10
US7415056B2 (en) 2008-08-19
WO2007126693A2 (en) 2007-11-08
TW200742208A (en) 2007-11-01
KR20080110863A (ko) 2008-12-19
TWI343681B (en) 2011-06-11
WO2007126693A3 (en) 2008-11-27

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