KR101308468B1 - Liquid Crystal Display Device and Method for Manufacturing the Same - Google Patents

Abstract

The present invention relates to a liquid crystal display device and a method of manufacturing the same, which prevents the seal burst by adjusting the pattern formation on the lower substrate side when connected through a conductive seal with the lower substrate to apply a signal to the common electrode of the upper substrate. The liquid crystal display device of the present invention includes a first substrate and a second substrate facing each other, each having a display area at the center and a non-display area at the outside thereof, and a display area on the first substrate. A plurality of gate lines and data lines formed to cross each other to define a plurality of pixel regions; a thin film transistor formed at an intersection of the gate lines and data lines; a pixel electrode formed at each pixel region; A common electrode formed entirely on the second substrate; a conductive seal pattern formed in a shape surrounding a non-display area of the first substrate or the second substrate; A common line pattern formed on the first substrate corresponding to the conductive seal pattern; And a transparent electrode pattern formed by overlapping the common line pattern and the insulating layer with a pattern equal to or smaller than the width of the common line pattern.

Sealing, UV Curing, Sealant, Common Electrode, Transparent Electrode Pattern

Description

[0001] The present invention relates to a liquid crystal display device and a method of manufacturing the same,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and in particular, to apply a signal to a common electrode of an upper substrate, in which a liquid crystal display is prevented by adjusting the pattern formation on the lower substrate side when connecting through a conductive seal with a lower substrate. An apparatus and a method of manufacturing the same.

(PDP), Electro Luminescent Display (ELD), Vacuum Fluorescent (VFD), and the like have been developed in recent years in response to the demand for display devices. Display) have been studied, and some of them have already been used as display devices in various devices.

Among them, the LCD is the most widely used in place of a CRT (Cathode Ray Tube) for the purpose of a portable image display device because of its excellent image quality, light weight, thinness and low power consumption, And a television monitor for receiving and displaying a broadcast signal and a computer monitor.

In order to use such a liquid crystal display as a general screen display device in various parts, it is a matter of how high quality images such as high definition, high brightness and large area can be realized while maintaining the characteristics of light weight, thinness and low power consumption. Can be.

Hereinafter, a liquid crystal display according to the related art will be described with reference to the accompanying drawings.

1 is a plan view of a conventional liquid crystal display, FIG. 2 is an enlarged view of a portion A of FIG. 1, and FIG. 3 is a cross-sectional view taken along line II ′ of FIG. 2.

As shown in FIG. 1, the liquid crystal display according to the related art has a lower plate 1 having a larger edge area than the upper plate 30 and the upper plate 30 for the pad portion, and between the upper plate 30 and the lower plate 1. It comprises a liquid crystal layer (not shown) filled in.

In addition, a display area (A / A: active area) is defined at the center of the lower plate 1 and the upper plate 30, and a seal pattern bonding the lower plate 1 and the upper plate 30 to the outside of the display area. 25 is formed to surround the edge of the display area A / A.

However, in the conventional liquid crystal display device, a poor seal rupture occurs due to the poor adhesion between the seal pattern 25 and the counter substrate (upper or lower plate) at a part of the seal pattern 25. Occurs. This seal burst may appear as light leakage in the area, and efforts have been made to solve this problem.

2 and 3 illustrate an enlarged portion A of the liquid crystal display according to the related art, and look at the cause of the seal burst failure through consideration of this portion.

On the lower plate 1, corresponding portions of the seal pattern 25 may include a common electrode pattern 20, a gate insulating layer 15 and a protective layer 16 covering the common electrode pattern 20, the gate insulating layer 15, By removing a portion of the passivation layer 16, the common electrode pattern 20 is exposed to define a contact hole 18 and a transparent electrode pattern connected to the common electrode pattern 20 through the contact hole 18. (13) is formed.

The black matrix layer 31, the overcoat layer 32, and the common electrode 33 are formed on the upper plate 30.

Here, the common electrode 33 and the transparent electrode pattern 13 are electrically connected to each other through a seal pattern 25 of a conductive material.

At this time, the seal pattern 25 is a photocurable and conductive material, and is cured by applying ultraviolet (UV) to the lower plate 1 or the upper plate 30. However, since the black matrix layer 31 is coated on the upper plate 30 side, and light is blocked at the seal pattern 25 forming portion, the lower plate 1 side is subjected to ultraviolet rays to cure the seal pattern 25. Is done.

By the way, the common electrode pattern 20 made of light-shielding metal is formed at a predetermined width or more on the lower plate 1 side, and the transparent electrode pattern 13 is wider than the common electrode pattern 13 on the upper side thereof. It is formed.

That is, although the transparent electrode is a material that is transparent in material, the transmittance is reduced by about 18% compared to the case where it is absent. As a result, when the UV is irradiated in the portion where the transparent electrode pattern is located, the total amount of light is not transmitted. It doesn't happen completely. As a result, the degree of sealant curing of the upper part of the transparent electrode pattern is lowered, and the effect thereof is increased in extreme environments, particularly at high temperatures, high humidity, and low temperatures of 60 ° C. or higher, thereby increasing the probability of occurrence of sealant failure. do.

In this case, the lower portion of the common electrode pattern 20 is shielded from light, and the seal pattern 25 on the upper portion thereof is not cured normally, and the transparent electrode pattern (some of the transparent electrode patterns 20) is formed at the remaining portions where the common electrode pattern 20 is not formed. 13) remains, the transmission amount of ultraviolet light is also reduced in this area, the degree of curing of the seal pattern 25 is reduced, thereby causing a problem that the uncured seal pattern 25 is spaced apart from the opposing substrate.

4 is a photograph showing a seal burst of a conventional liquid crystal display.

In FIG. 4, when a seal pattern (seal) is formed on the lower plate side, the seal pattern is lifted up from the upper plate, which is an opposite substrate. When the sealant is applied to the upper portion of the transparent electrode pattern on the lower plate side, when ultraviolet rays are applied from the lower plate side, sufficient amount of light is not transmitted from the common electrode pattern and the transparent electrode pattern, so that curing of the seal pattern is sufficient. Since the contact between the sealant upper side and the common electrode on the upper side of the sealant is poor, it can be seen that voids are generated. These voids show a continuous inflow of outside air resulting in a sealant burst failure.

In addition, the contact between the seal pattern and the common electrode pattern on the lower plate side is not sufficient contact, it can be seen that the phenomenon of the lifting part of the seal pattern occurs. As described above, this may be regarded as a problem caused by the low degree of light transmission during photocuring. When the thickness of the transparent electrode pattern is 40nm as shown in the figure, in this case, it is observed experimentally that the light transmittance decreases by 18% when the thickness is 40nm as compared with the case without the transparent electrode pattern. Could.

The conventional liquid crystal display device has the following problems.

The liquid crystal panel transmits the signal of the common electrode on the lower plate side to the common electrode on the upper plate using a photocurable / conductive seal pattern. At this time, as the width of the transparent electrode pattern under the sealant is wider, the transmittance is lowered, so that the photocuring of the sealant is not normally performed, and thus, curing failure occurs, which indicates that the seal failure occurs.

This seal burst occurs even if the width of the common electrode pattern of the lower plate is reduced, and it can be seen that the influence of the interposition of the common electrode pattern and the transparent electrode pattern on the lower plate side during curing is great.

The present invention has been made to solve the above problems, the liquid crystal that prevents the seal burst by adjusting the pattern formation on the lower substrate side when connecting through the conductive seal with the lower substrate to apply a signal to the common electrode of the upper substrate It is an object to provide a display device and a method of manufacturing the same.

According to an aspect of the present invention, there is provided a liquid crystal display device including: a first substrate and a second substrate facing each other, each having a display area at a center and a non-display area at its periphery; and a display on the first substrate. A plurality of gate lines and data lines formed in an area and crossing each other to define a plurality of pixel areas; a thin film transistor formed at an intersection of the respective gate lines and data lines; and pixel electrodes formed in the pixel areas; And a common electrode formed entirely on the second substrate; and a conductive seal pattern formed to surround a non-display area of the first substrate or the second substrate; and the first and second conductive seal patterns. A common line pattern formed on the substrate; And a transparent electrode pattern formed by overlapping the common line pattern and the insulating layer with a pattern equal to or smaller than the width of the common line pattern.

The common line pattern includes a plurality of fine lines in one direction spaced apart from each other in a width within the conductive seal pattern, and a common line connection pattern connecting the fine lines in a direction crossing the fine lines.

Here, the transparent electrode pattern is formed to correspond to a partial length in the longitudinal direction of the common line pattern. At this time, the transparent electrode pattern is preferably formed on the corresponding corresponding to each of the fine lines. In addition, the transparent electrode pattern is removed between the fine lines.

The common line pattern is formed of the same light blocking metal on the same layer as the gate line.

The transparent electrode pattern is made of the same transparent electrode on the same layer as the pixel electrode.

The transparent electrode pattern has a plurality of contact holes in the insulating layer and is connected to the fine lines.

Here, the fine lines are formed by spaced apart from the width of 5 ~ 50㎛ and 5 ~ 50㎛.

The conductive seal pattern includes a photocurable resin.

A black matrix layer is further formed on the corresponding second substrate of the conductive seal pattern.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of preparing a first substrate and a second substrate in which a display area is defined in the center and a non-display area in the outer area; and the first In the display area on the substrate, a plurality of gate lines and data lines that cross each other to define a plurality of pixel areas, and a thin film transistor formed at an intersection of the respective gate lines and data lines are formed, and the non-display on the first substrate is formed. Forming a common line pattern in a region, and forming a pixel electrode in each pixel region, and forming a transparent electrode pattern overlapping the common line pattern with a pattern equal to or smaller than a width of the common line pattern. And forming a front common electrode on the second substrate; and surrounding the non-display area on the first substrate or the second substrate. Forming a conductive seal pattern; and forming a liquid crystal layer on the first substrate or the second substrate, and bonding the first and second substrates to each other; and UV light from the lower side of the first substrate. It is another feature that is made, including the step of curing the conductive seal pattern by irradiation.

The forming of the common line pattern may include forming fine lines in one direction spaced apart from each other in a width within the conductive seal pattern and a common line connection pattern connecting the fine lines in a direction crossing the fine lines. Form to include.

The forming of the transparent electrode pattern may correspond to a part of a length in the longitudinal direction of the common line pattern. In addition, the forming of the transparent electrode pattern may be formed on the fine line corresponding to the fine line.

Meanwhile, the curing of the conductive seal is performed by transmitting ultraviolet light through a region where the fine lines are not formed.

The preparing of the second substrate may include forming a black matrix layer corresponding to the gate line, the data line, the thin film transistor, and the non-display area of the display area on the second substrate and at least in the display area. The method may further include forming a color filter layer corresponding to the pixel region.

In addition, the insulating layer having a contact hole exposing a portion of the upper portion of the fine line, further interposed between the common line pattern and the transparent electrode pattern, the step of forming the transparent electrode pattern, the fine line and The contact hole is formed to be connected.

The liquid crystal display of the present invention as described above and a method of manufacturing the same have the following effects.

A common line pattern overlapping the seal pattern is formed as a fine line pattern, and a transparent electrode pattern is formed by connecting a transparent electrode pattern with a width equal to or smaller than the common line pattern, and passes through a portion where the common line pattern is not formed during the photocuring process. All the light to be used for photocuring can improve hardening of a seal pattern.

In particular, by increasing the amount of light irradiation it is possible to improve the adhesion evenly on the upper and lower substrates after the curing of the seal pattern to prevent the seal burst failure even in a harsh environment of high temperature or high humidity.

As a result, display defects can be prevented.

Hereinafter, a liquid crystal display device and a method of manufacturing the same according to the present invention will be described in detail with reference to the accompanying drawings.

5 is a plan view illustrating a liquid crystal display of the present invention, FIG. 6 is an enlarged view of a portion B of FIG. 5, and FIG. 7 is an enlarged view of a portion C of FIG. 6. 8 is a cross-sectional view taken along line II-II 'of FIG. 7.

As shown in FIGS. 5 to 8, the liquid crystal display of the present invention includes a first substrate 100 and a first substrate 100, each having a display area (A / A) in the center and a non-display area in the outer portion thereof. A plurality of gate lines GL and data lines DL formed in a display area on the second substrate 200, a display area on the first substrate 100, and defining a plurality of pixel areas, and the gate lines ( The thin film transistor TFT formed at the intersection of the GL and the data line DL, the pixel electrode P formed in each of the pixel regions, the common electrode 203 formed on the second substrate 200 and the entire surface thereof. And a seal pattern 250 formed in a shape surrounding the non-display area of the first substrate 100 or the second substrate 200, and corresponding to the seal pattern 250 on the first substrate 100. The common line pattern 101 and a pattern equal to or smaller than the width of the common line pattern 101 are formed in the common line pattern ( 101 and the transparent electrode pattern 113 formed by overlapping the insulating layers 111 and 112.

In addition, a liquid crystal layer (not shown) is filled in the space between the first and second substrates 100 and 200 in the seal pattern 250.

Here, the seal pattern 250 is hardened and adhered between the first and second substrates 100 and 200 bonded to each other, and the seal pattern 250 includes a photocurable resin, and the inside thereof. Conductive balls are contained in the material having conductivity. Accordingly, the electrical connection between the common electrode 203, the transparent electrode pattern 113, and the common line pattern 101 is achieved through the seal pattern 250.

Here, referring to the lower structure of the common electrode 203 on the second substrate 200, a black matrix layer is formed in a region corresponding to the gate line, the data line, and the thin film transistor at a portion corresponding to the display area A / A. A 201 is formed, and a color filter layer (not shown) is formed corresponding to at least the pixel areas.

In some cases, the overcoat layer 202 may be further formed on the entire surface to offset the step difference between the black matrix layer and the color filter layer.

On the second substrate 200 corresponding to the non-display area (the outer portion of the A / A), the black matrix layer 201 extends from the display area A / A to partially or partially form the seal pattern 250. Overall overlap.

Recently, the liquid crystal display has a demand for a narrow bezel, and accordingly, the non-display area is gradually decreasing. In particular, the boundary between the display area and the non-display area should be hidden to prevent light leakage. The black matrix layer extends from the boundary between the display area and the non-display area to the non-display area. The seal pattern 250 overlaps the extended black matrix layer 201. For this reason, in the hardening process of the seal pattern 250 which is conductive photocurable resin, the projection of the light at the time of irradiation from the side of the 2nd board | substrate 200 in which the black-matrix layer 201 was formed was hardly made into the seal pattern 250, Therefore, irradiation from the lower side of the first substrate 100 side was inevitable.

Accordingly, in the liquid crystal display of the present invention, the lower configuration of the first substrate 100 is changed so as to minimize the loss of light transmittance during photocuring.

Hereinafter, the configuration of the common line pattern 101 and the transparent electrode pattern 113 connected to the non-display area of the first substrate 100 will be described in detail.

As shown in FIGS. 6 and 7, the common line pattern 101 is formed in the form of a plurality of fine lines in one direction spaced apart from each other in a width in the conductive seal pattern, and the fine lines in a direction crossing the fine lines. A common line connection pattern 101a for connecting the lines is provided. Here, the reason why the common line connection pattern 101a is provided is to apply the same common voltage signal to the common lines 101 as the fine lines, and the common voltage value is the common voltage via the seal pattern 250. To be delivered to the electrode 203.

As shown in FIG. 5, the length of the transparent electrode pattern 113 is formed to correspond to a partial length of a predetermined portion in the longitudinal direction of the common line pattern 101. That is, the common line pattern 101 is formed along the seal pattern 250, and the transparent electrode pattern 113 is selectively formed only in a predetermined region.

At this time, the transparent electrode pattern 113 is formed on the upper part of the common line pattern 101 as the fine line corresponding to a width equal to or smaller than the width of the common line pattern 101. That is, the transparent electrode pattern 113 is removed between the fine lines.

In this case, the common line patterns 101 formed of the fine lines are formed with a width of 5-50 μm and a distance of 5-50 μm from each other.

The common line pattern 101 is formed of the same light blocking metal on the same layer as the gate line GL.

The transparent electrode pattern 113 is formed of the same transparent electrode on the same layer as the pixel electrode P.

A gate insulating layer 111 is further formed between the gate line GL and the data line DL, and a passivation layer 112 is further formed between the data line DL and the pixel electrode P. The gate insulating layer 111 and the passivation layer 112 are formed in both the display area A / A and the non-display area. That is, the gate insulating layer 111 and the passivation layer 112 are also formed between the transparent electrode pattern 113 and the common line pattern 101.

7 and 8, the transparent electrode pattern 113 is provided with a contact hole 115 in the passivation layer 112 and the gate insulating layer 111 to be connected to the common line pattern 101. .

5-8, the manufacturing method of the liquid crystal display device of this invention is demonstrated.

First, a first substrate 100 and a second substrate 200 having a display area A / A at the center and a non-display area at the outside thereof are prepared.

Subsequently, a plurality of gate lines GL and data lines DL that cross each other and define a plurality of pixel regions in the display area on the first substrate 100, and each of the gate lines GL and data lines ( A thin film transistor TFT formed at an intersection of the DLs is formed, and a common line pattern 101 is formed in the non-display area on the first substrate 100. The gate line GL and the common line pattern 101 are formed of the same light blocking metal on the same layer.

Here, the common line pattern 101 is formed of fine lines in one direction spaced apart from each other in a width within a region where the conductive seal pattern 250 is to be formed, and is formed when the common line pattern 101 is formed. It includes a common line connection pattern (101a) for connecting the common line pattern 101 in a direction intersecting the fine lines.

The forming of the transparent electrode pattern may correspond to a part of a length in the longitudinal direction of the common line pattern. In addition, the forming of the transparent electrode pattern may be formed on the fine line corresponding to the fine line.

A gate insulating layer 111 is formed between the gate line GL and the data line DL, and a passivation layer 112 is formed on the data line DL. In this case, the gate insulating layer 111 and the passivation layer 112 are extended to cover the upper portion of the common line pattern 111.

Subsequently, predetermined portions of the passivation layer 112 and the gate insulating layer 111 are removed to form the contact hole 115.

Subsequently, a pixel electrode P is formed in each pixel area, and a transparent electrode pattern 113 overlapping the common line pattern 101 is formed to be smaller than or equal to the width of the common line pattern 101.

Subsequently, the black matrix layer 201 corresponds to the gate line GL, the data line DL, the thin film transistor TFT, and the non-display area of the display area A / A on the second substrate 200. To form. Here, the black matrix layer 201 of the non-display area is formed to extend to a part of the non-display area from the outside of the display area AA to prevent light leakage.

Subsequently, a color filter layer (not shown) is formed in the display area AA corresponding to at least the pixel area. Here, the color filter layer may be formed to overlap with the black matrix layer 201 in the display area, or may be formed to correspond to only the pixel area.

Subsequently, an overcoat layer 202 is formed on the black matrix layer 201 and the color filter layer on the second substrate 200.

Next, the common electrode 203 is formed on the entire surface of the second substrate 200.

The conductive seal pattern 250 is formed on the first substrate 100 or the second substrate 200 to surround the non-display area.

Subsequently, a liquid crystal layer (not shown) is formed on the first substrate 100 or the second substrate 200, and the first and second substrates 100 and 200 are opposed to each other.

Subsequently, ultraviolet light is irradiated from the lower side of the first substrate 100 to cure the conductive seal pattern 250. In this case, ultraviolet light is transmitted between the plurality of fine common line patterns 101 and at an outer portion where the common line pattern 101 is not formed, thereby curing the seal pattern 250. Here, since the transparent electrode pattern 113 is formed only as wide as or less than the width of the common line pattern 101, the amount of light is transmitted through the total amount of the seal pattern 250 in the remaining areas other than the common line pattern 101. The amount of light used in curing can be maximized.

As such, the width of the transparent electrode pattern 113 is formed to be equal to or smaller than that of the common line pattern 101 so that the area of the transparent electrode pattern 113 is reduced so that the transparent electrode pattern 113 is positioned. It is intended to increase the transmittance of light by increasing the aperture ratio at the portion not shown. As a result, when the conductive seal pattern 250 is cured, the amount of ultraviolet rays is increased in a portion where the transparent electrode pattern 113 is not present, thereby increasing the curing rate of the conductive seal pattern 250, and thus the conductive seal pattern ( 250) can increase the adhesion on the opposite surface of the substrate.

In some cases, the transparent electrode pattern 113 may be formed with a process margin from the left and right side with respect to the common line pattern 101 in consideration of the degree of intermetallic overlap margin. Even in this case, the gap between the common line patterns 101 is formed to maintain the transparent electrode pattern 113 as well.

Here, the common electrode pattern 101 is connected to a common line (not shown) formed on the same layer as the gate line, and the common electrode pattern 101 receives a common electrode signal from a pad side to receive a transparent electrode pattern. The common electrode signal is transmitted to the common electrode 203 through the conductive seal pattern 250 through 113.

The transparent electrode pattern 113 in the liquid crystal display device and a manufacturing method thereof of the present invention is formed in a plurality of fine patterns spaced apart in the width of the conductive seal pattern 250, overlapping the conductive seal pattern 250 By reducing the area is to increase the transmittance of light during the ultraviolet curing of the conductive seal pattern 250.

As such, forming the transparent electrode pattern 113 and the common electrode pattern 101 to have a fine width maximizes the amount of light during UV curing, thereby improving the curing of the conductive seal pattern, thereby improving panel adhesion and sealant in an extreme environment. This is to prevent the burst failure.

As a result, it was confirmed that there was no abnormality such as seal rupture under the ultra-accelerated condition (about 70 hours at 70 ° C., humidity of 90% or more).

In addition, in the case where only the common electrode pattern is a fine pattern and the transparent electrode pattern of one pattern shape is formed thereon, the adhesive strength after curing of the conductive seal pattern is 1.746 kgf, as in the liquid crystal display device of the present invention. When the common electrode pattern and the transparent electrode pattern were all applied in a fine line shape, the adhesive force of the conductive seal pattern was improved to 1.833 kgf after curing.

While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Will be apparent to those of ordinary skill in the art.

1 is a plan view of a conventional liquid crystal display device

2 is an enlarged view of a portion A of FIG.

3 is a cross-sectional view taken along line II ′ of FIG. 2.

4 is a photo showing the seal burst of the conventional liquid crystal display

5 is a plan view showing a liquid crystal display of the present invention.

6 is an enlarged view of a portion B of FIG. 5;

7 is an enlarged view of a portion C of FIG. 6.

FIG. 8 is a cross-sectional view taken along line II-II ′ of FIG. 7.

Description of the Related Art [0002]

100: first substrate 101: common electrode pattern

101a: common electrode connection pattern 111: gate insulating film

112: protective film 113: transparent electrode pattern

115: contact hole 200: second substrate

201: black matrix layer 202: overcoat layer

203: common electrode 250: seal pattern

Claims (19)

A first substrate and a second substrate opposed to each other, each having a display area at a center and a non-display area at an outside thereof; A plurality of gate lines and data lines formed in the display area on the first substrate and defining a plurality of pixel areas crossing each other; A thin film transistor formed at an intersection of each of the gate lines and the data lines; Pixel electrodes formed in the pixel areas; A common electrode formed entirely on the second substrate; A conductive seal pattern formed in a shape surrounding the non-display area of the first substrate or the second substrate and including conductive balls; Corresponding to the conductive seal pattern, a plurality of fine lines in one direction spaced apart from each other in a width within the conductive seal pattern on the first substrate, and connecting the fine lines in a direction crossing the fine lines. A common line pattern including a common line connection pattern; A plurality of transparent electrode patterns overlapping and connected to the upper sides of the fine lines in a pattern smaller than the width of each of the fine lines; And And an insulating layer interposed between the common line pattern and the transparent electrode pattern and having a contact hole at a connection portion between the fine line and the transparent electrode pattern. delete The method of claim 1, The transparent electrode pattern is a liquid crystal display, characterized in that formed corresponding to the partial length of the length direction of the fine line. delete delete The method of claim 1, And the common line pattern is formed of the same light blocking metal on the same layer as the gate line. The method of claim 1, And the transparent electrode pattern is formed of the same transparent electrode on the same layer as the pixel electrode. The method of claim 1, A plurality of contact holes are provided for each fine line. The method of claim 1, The fine lines are formed by separating the width of 5 ~ 50㎛ and the interval of 5 ~ 50㎛. The method of claim 1, The conductive seal pattern comprises a photocurable resin, characterized in that the liquid crystal display device. The method of claim 1, And a black matrix layer is further formed on the corresponding second substrate of the conductive seal pattern. Preparing a first substrate and a second substrate each having a display area at a center and a non-display area at an outside thereof; A plurality of gate lines and data lines defining a plurality of pixel regions that cross each other and a thin film transistor formed at an intersection of each of the gate lines and the data lines in a display region on the first substrate, and forming the first substrate Forming a common line pattern corresponding to a non-display area of the image, the common line pattern including a plurality of spaced apart fine lines and a common line connection pattern connecting the fine lines in a direction crossing the fine lines; Forming an insulating film on each of the fine lines, the insulating film having a contact hole exposing a portion of an upper portion of the fine line, on the common line pattern; Forming a pixel electrode in each of the pixel regions, and forming a plurality of transparent electrode patterns overlapping the fine lines and connected to the fine lines through the contact holes, respectively, in a pattern smaller than the width of the fine lines; Forming a front common electrode on the second substrate; Forming a conductive seal pattern including conductive balls in a non-display area on the first substrate or the second substrate and covering the plurality of fine lines within a width thereof; Forming a liquid crystal layer on the first substrate or the second substrate, and bonding the first and second substrates together; And And irradiating ultraviolet light from the lower side of the first substrate to cure the conductive seal pattern. delete 13. The method of claim 12, The forming of the transparent electrode pattern may be performed in correspondence with a partial length in a length direction of the common line pattern. delete 13. The method of claim 12, Hardening the conductive seal may include transmitting ultraviolet light through a region where the fine lines are not formed. 13. The method of claim 12, Preparing the second substrate, Forming a black matrix layer corresponding to the gate line, the data line, the thin film transistor, and the non-display area of the display area on the second substrate; And And forming a color filter layer in the display area corresponding to at least the pixel area. delete delete

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