KR101272895B1 - Electro wetting display device - Google Patents

Abstract

The present invention comprises a first substrate; A thin film transistor formed on the first substrate; A gate line and a data line connected to the thin film transistor on the first substrate and crossing each other to define a pixel area; A pixel electrode connected to the thin film transistor; A second substrate facing the pixel electrode of the first substrate; A color filter layer formed under the second substrate; A common electrode formed on an entire surface under the color filter layer; A hydrophobic film having hydrophobicity formed on the entire surface under the common electrode; A barrier rib formed under the hydrophobic layer in a lattice shape at a boundary of the pixel region; A nonpolar black oil layer formed in the partition wall under the hydrophobic film; An electro wetting display device including a liquid layer having a polarity interposed between the pixel electrode and the black oil layer is provided.

        Electro Wetting Display, Hydrophobic, Nonpolar, Polar, Hydrophilic

Description

Electro wetting display device

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a diagram for explaining the characteristics of electro wetting.

FIG. 2 is a cross sectional view of a region including multiple pixel regions of a conventional electro wetting display device; FIG.

3 is a cross-sectional view of a region including a plurality of pixel regions of an electro wetting display element according to a first embodiment of the present invention;

4 is a cross-sectional view of an area including a plurality of pixel areas of an electro wetting display device according to a second embodiment of the present invention.

5A to 5E are cross-sectional views of manufacturing processes of a color filter substrate for an electro wetting display device according to the present invention.

Description of the Related Art

100: electro-wetting display element

101: array substrate 115: gate electrode

118 gate insulating film 120 semiconductor layer

120a: active layer 120b: ohmic contact layer

135 source electrode 137 drain electrode

140: protective layer 145: drain electrode

150 pixel electrode 155 partition wall

161: color filter substrate 164: black matrix

167: color filter layer 170: overcoat layer

172 hydrophobic film 175 common electrode

178: bulkhead 180: (nonpolar) black oil layer

190: polar liquid layer

op: aperture P: pixel area

Tr: Thin Film Transistor TrA: Switching Area

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to flat panel displays, and more particularly to an electro wetting display using electrical wetting.

Recently, flat panel display devices having low power consumption, good portability, technology intensiveness, and light weight have replaced CRTs, which are the most common display devices.

As one of such lightweight flat panel display devices, an electro wetting display using an electric wettability characteristic has recently been attracting attention.

The electro wetting display device is characterized by applying the electro wetting property of the polar liquid as an optical switching tool.

1 is a view for explaining the characteristics of the electro wetting (electro wetting).

Electro wetting is a phenomenon in which the surface tension of an interface is changed by electric charges present at the interface and the contact angle of the liquid substance formed on the interface with the interface is changed.

As shown, the hydrophobic film having a hydrophobic characteristic formed on the electrode 11 formed on the front surface of the substrate 10, that is, a polarized liquid 15a such as H ₂ O is dropped onto the hydrophobic film 12. (12) and the wettability are not good, and have a large contact angle (θ1) is formed in the hydrophobic film (12). However, when an electric field is applied to the hydrophobic film 12, its own wettability property increases, and as shown in FIG. 1, a small contact angle θ2 <θ1 with respect to the hydrophobic film 12 is spread and is widely spread to maintain a relatively flat state. And the polar liquid film 15b is formed.

Electro wetting display is characterized by using the change in the wettability characteristics by the application of such an electric field.

2 is a cross-sectional view of an area including a plurality of pixel areas of a conventional electro wetting display device.

As shown in the drawing, the conventional electrowetting display element 21 is composed of the upper color filter substrate 51 and the lower array substrate 31.

First, referring to the structure of the lower array substrate 31, a gate wiring (not shown) and a data wiring (not shown) are formed to cross each other, and the pixel region P is surrounded by the two wirings (not shown). Although not shown in the drawing, a thin film transistor (not shown), which is a switching element, is formed in the pixel region P, and is connected to one electrode of the thin film transistor (not shown), and the pixel electrode 33 is each pixel. It is formed for each area P.

In addition, a hydrophobic film 37 having a hydrophobic characteristic is formed on the entire surface of the pixel electrode 33, and each of the pixel regions P is disposed on the boundary of each pixel region P above the hydrophobic film 37. The barrier ribs 39 are formed, and the black oil layers 41a and 41b have a non-polar characteristic on the hydrophobic layer 37 inside the barrier ribs 39 and open and close light transmission by an applied voltage. Is being formed.

Next, the cross-sectional structure of the color filter substrate 51 facing the array substrate 31 will be described. The red, green, and blue color filter patterns 55a and 55b may correspond to the pixel areas P under the substrate 51. , A color filter layer 55 having 55c is formed. In addition, a common electrode 58 is formed on the entire surface under the color filter layer 55.

In addition, a polar liquid layer 70 is formed between the array substrate 31 and the color filter substrate 51 by using a liquid having polarity characteristics, for example, H ₂ O. Although not shown in the drawing, the array substrate 31 is formed. ) And seal patterns (not shown) to prevent the liquid layer 70 of the polarity from leaking out along the edge of the color filter substrate 51 and to keep the two substrates 31 and 51 in one panel state. O) is formed.

In addition, although not shown in the drawing, a back-light (not shown) is provided on an outer surface of the array substrate 31 to supply light. The thin film transistor (not shown) may be provided to the gate wiring (not shown). On / off signals are sequentially scanned and applied to the pixel electrode 33 of the selected pixel region P to transfer the image signal of the data line (not shown). The nonpolar black oils 41a and 41b are opened and closed in each pixel region P by a vertical electric field with 58, so that various images can be displayed with a change in the transmittance of light.

 Referring to the driving of the electro wetting display element having such a configuration, when the voltage is off (see the pixel region having the blue color filter pattern), a prime number is placed on the top layer of the array substrate 31. As the film formation 37 is formed, the non-polar black oil 41b has a form that completely covers the pixel region P of the array substrate 31, thereby transmitting light from a lower backlight (not shown). It won't let you.

On the other hand, in the voltage on state (see a pixel region having a red color filter pattern), when a voltage is applied and an electric field is formed between the pixel electrode 33 and the common electrode 58, the hydrophobic film 37 ) Has a hydrophilic property by the electro wetting phenomenon, the polar liquid (H ₂ O) layer 70 that existed on the non-polar black oil (41a) is the black oil (41a) Is pushed to the side to form an opening area (op) to pass the light from the lower backlight (not shown), thereby displaying an image.

The electro wetting display element 21 having the above-described structure may apply a voltage to push the black oil 41a to the side by contacting the hydrophobic layer 37 with the polar liquid layer 70. At this time, the area of contact with the hydrophobic film 37 is reduced by being pushed to the side surface, but the thickness thereof is increased in proportion to the reduced contact area, so that the color filter substrate 51 array is sufficiently accommodated therein. The distance from the substrate 31 (hereinafter referred to as a cell gap) is usually set to 10 µm to 30 µm.

However, as the cell gap increases, when the voltage is applied to the opening op, the black oil 41a is pushed to the side, and light passing through the opening op formed by the black oil 41a is pushed to the side. As the color filter pattern 55b of () passes through, the color of the adjacent pixel region P is seen at the side view angle, thereby degrading the display quality.

That is, in the drawing, a voltage is applied to the pixel region P corresponding to the green color filter pattern 55b to turn it on, and the off state of the neighboring blue color filter pattern 55c is turned off. However, some light emitted through the pixel region P corresponding to the green color filter pattern 55b passes through the blue color filter pattern 55c, resulting in mixed color, thereby degrading display quality.

In order to solve the above problems, the present invention provides an electro wetting display device that prevents light passing through each pixel region from passing through neighboring pixel regions, thereby improving display quality through preventing color mixing. For that purpose.

An electrowetting display device according to the present invention for achieving the above object comprises a first substrate; A thin film transistor formed on the first substrate; A gate line and a data line connected to the thin film transistor on the first substrate and crossing each other to define a pixel area; A pixel electrode connected to the thin film transistor; A second substrate facing the pixel electrode of the first substrate; A color filter layer formed under the second substrate; A common electrode formed on an entire surface under the color filter layer; A hydrophobic film having hydrophobicity formed on the entire surface under the common electrode; A barrier rib formed under the hydrophobic layer in a lattice shape at a boundary of the pixel region; A nonpolar black oil layer formed in the partition wall under the hydrophobic film; And a liquid layer having a polarity interposed between the pixel electrode and the black oil layer.

At this time, the polar liquid layer is preferably H ₂ O.

In addition, a patterned spacer is further formed on the first substrate by overlapping a portion of the region where the thin film transistor or the gate wiring or data wiring is formed, and overlaps the gate and data wiring between the second substrate and the color filter layer. The black matrix is further formed, and the partition wall is formed to overlap the black matrix and is formed to have a width equal to or smaller than the width of the black matrix. In addition, the partition wall is configured to be in contact with the patterned spacer is characterized in that the first and second substrates to maintain the same separation interval.

In addition, the color filter layer is characterized by consisting of a red, green, blue color filter pattern is sequentially repeated, characterized in that the partition wall is formed on the boundary of the red, green, blue color filter pattern.

In addition, an overcoat layer is further formed between the color filter layer and the common electrode, and further includes a backlight on an outer surface of the first substrate.

Hereinafter, preferred embodiments according to the present invention will be described with reference to the drawings.

&Lt; Embodiment 1 >

3 is a cross-sectional view of an area including a plurality of pixel areas of an electrowetting display device according to a first embodiment of the present invention.

As shown, the electro wetting display device 100 according to the present invention includes an array substrate 111 having a plurality of thin film transistors Tr and corresponding red, green, and blue color filter patterns 167a. And a color filter substrate 161 including a color filter layer 167 including 167b and 167c, a common electrode 172, a hydrophobic film 175, and a non-polar oil layer 180, and two substrates 111 and 161. The polar liquid layer 190 is sealed by a seal pattern (not shown). In addition, although not shown in the drawing, a backlight unit (not shown) for supplying light is further configured under the array substrate 111.

First, the structure of the lower array substrate will be described. The array substrate 111 intersects with each other to define a pixel region P, and the gate for turning on / off the thin film transistor Tr. A wiring (not shown) and a data wiring (not shown) for supplying a signal voltage are formed, and a gate electrode 115, a gate insulating film 118, and a semiconductor layer are formed at intersections of the two wirings (not shown). A thin film transistor Tr, which is a switching element composed of a source 120 and a drain electrode 135 and 137 spaced apart from each other, is formed on the semiconductor layer 120. In this case, the gate electrode 115 of the thin film transistor Tr is connected to the gate line (not shown), and the source electrode 135 is connected to the data line (not shown).

In addition, a passivation layer 140 having a drain contact hole 145 exposing a portion of the drain electrode 137 is formed on the thin film transistor Tr and the data line (not shown). The pixel electrode 150 is formed on the upper portion 140 in contact with the drain electrode 137 through the drain contact hole 145 and is independently formed for each pixel region P. Referring to FIG.

In addition, a patterned spacer 155 is formed in the switching region TrA in which the thin film transistor Tr is formed to correspond to an upper partition wall 178. Although the patterned spacer 155 is formed in the switching region TrA in which the thin film transistor Tr is formed, the patterned spacer 155 may be formed to correspond to a portion of the gate line (not shown) or the data line (not shown). .

Next, the color filter substrate corresponding to the array substrate having such a structure will be described.

A black matrix 164 is formed below the color filter substrate 161 to correspond to a region in which a gate and a data line (not shown) and a thin film transistor Tr of the array substrate 111 are formed. The black matrix 164 is formed. ) And a color filter layer 167 having a form in which red, green, and blue color filter patterns 167a, 167b, and 167c are sequentially repeated for each pixel area P under the substrate 161.

In addition, an overcoat layer 170 for protecting the color filter layer 167 is formed on the entire surface of the color filter layer 167 under the color filter layer 167, and below the overcoat layer 170. The common electrode 172 is formed on the entire surface as a transparent conductive material. In this case, the overcoat layer 170 may not be formed.

In addition, a hydrophobic layer 175 is formed by applying or depositing a hydrophobic material under the common electrode 172 to the entire surface, and a gate line (not shown) and a data line under the hydrophobic layer 175. Corresponding to (not shown), a barrier rib 178 having a lattice shape in plan view and surrounding each of the color filter patterns 167a, 167b, and 167c is formed more precisely. At this time, the partition wall 178 is formed to have a width (w2 ≤ w1) less than or equal to the width (w1) of the black matrix 164, the upper portion of the partition wall 178 is a lower array substrate It is formed in contact with the patterned spacer 155 formed on the (111). Therefore, the gap between the arrayed substrate 111 and the color filter substrate 161 along with the patterned spacer 155 is maintained to be the same across the entire surface.

Next, a black oil layer 180 is formed under the hydrophobic layer 175 inside each of the partition walls 178 and has a non-polar characteristic and blocks light.

A liquid having polarity is interposed between the color filter substrate 161 and the array substrate 111 having such a configuration to form a polar liquid layer 190 and formed along an edge between the two substrates 161 and 111. By sealing by a seal pattern (not shown), the electrowetting display element 100 is formed.

In the present invention, the hydrophobic film 175, the partition wall 178, and the black oil layer 180 are formed on the color filter substrate 161 so that light from the backlight (not shown) passes through the lower array substrate 111. When the light is incident on the color filter substrate 161, when the black oil layer 180a is pushed toward the partition 178 to form an opening op by applying a voltage, light is emitted only through the opening op. The pixel region P is blocked by the barrier rib 178 through the neighboring pixel region P which is transmitted through the filter layer 167 and has an off state. It can be seen that the light is not transmitted because it is blocked by the black oil layer 180b formed to cover the whole.

Accordingly, although the black oil layer, which is a conventional problem, does not form an opening, display quality is improved by preventing light leakage that light having an unwanted color leaks out through the pixel region.

Furthermore, in the case of the present invention, the black matrix 164 is further formed at the boundary of each color filter pattern 167a, 167b, and 167c, more precisely, at the boundary of each pixel region P, where unwanted light leaks out. It is a feature that can be prevented more fundamentally.

The driving of the electro wetting display device according to the present invention is briefly described as proceeding similarly to the prior art.

When the signal voltage is applied to the pixel electrode 150 through the data line (not shown) by turning on the thin mart transistor Tr which is a switching element, the pixel electrode 150 is identified by the pixel electrode 150 and the common electrode 172. An electric field having an intensity is formed and the hydrophobic film 175 is changed to hydrophilic by the electric field having a specific intensity, and the polar liquid layer 190 moves the black oil layer 180a of the pixel region P. The light penetrates the side surface and comes into contact with the hydrophobic layer 175 to form an opening op to transmit light. In this case, the voltage across the common electrode 172 is constant and the intensity of the electric field is determined according to the magnitude of the signal voltage across the pixel electrode 150, and the polarity is dependent on the strength of the voltage across the pixel electrode 150. Since the liquid layer 190 is different from the area (s1 ≠ s2) in contact with the hydrophobic film 175, that is, the areas s1 and s2 in the pixel region P covered by the black oil layer 180a. This is differently formed to control the amount of light transmitted. Therefore, the gray scale can be changed while passing through the same color filter patterns 167a, 167b, and 167c.

Meanwhile, when the voltage is not applied to the pixel electrode 150 to maintain the off state, the hydrophobic layer 175 has a hydrophobic property. The polar liquid layer 190 is formed of the black oil layer ( The black oil layer 180b spreads thinly over the entire pixel region P surrounded by the partition wall 178 and covers the entire pixel region P. Light is emitted from the pixel region (180b). By not penetrating P), black is expressed.

&Lt; Embodiment 2 >

4 is a cross-sectional view of a plurality of pixel areas of an electro wetting display device according to a second embodiment of the present invention. The same components as those in the first embodiment are denoted by adding numerals to 100.

Since the structure of the array substrate of the second embodiment of the present invention is the same as that of the first embodiment described above, the description thereof will be omitted and only the structure of the color filter substrate will be described.

The color filter substrate 261 of the electro wetting display device 200 according to the second embodiment of the present invention may include a gate formed on the boundary of each pixel region P, more precisely, on the lower array substrate 211. The color filter layer 267 is disposed such that a black matrix is not formed in an area corresponding to the data line (not shown) and the thin film transistor Tr, and the boundary between the red, green, and blue color filter patterns 267a, 267b, and 267c is positioned. It is characterized by the formation.

Accordingly, the color filter substrate 261 is formed with a color filter layer 267 in which red, green, and blue color filter patterns 267a, 267b, and 267c are sequentially repeated for each pixel area P. A common electrode 272 is formed on the front under the filter layer 267 as a transparent conductive material, and a hydrophobic film 275 is formed on the front under the common electrode 272 as a material having hydrophobic characteristics. The barrier ribs (not shown) and data lines (not shown) formed on the lower array substrate 261 are more precisely bounded by the color filter patterns 267a, 267b, and 267c below the deposition layer 275. 278 is formed. In this case, the partition wall 278 is formed in a lattice shape in plan view, surrounding the edges of the color filter patterns 267a, 267b, and 267c of each color more precisely.

In addition, a non-polar black oil layer 280 is formed in each pixel region P under the hydrophobic film 275 inside the partition wall 278.

The second embodiment of the present invention is provided between the color filter substrate 261 having the above configuration and the corresponding array substrate 211 in a state in which the polar liquid layer 290 is sealed by a seal pattern (not shown). An electrowetting display device 200 is constructed.

Electro wetting display device 200 according to the second embodiment of the present invention is formed with a relatively simple configuration without the black matrix and overcoat layer compared to the first embodiment, it is possible to simplify the manufacturing process .

Since the black matrix is not formed, the step between the color filter patterns 267a, 267b, and 267c is smooth, so that an overcoat layer is not required. In the on state or the voltage off state, the light is not transmitted to the boundary portion of each pixel region P because the black oil layer 180 is always covered by the black oil layer 180. The second embodiment is characterized by simplification of the process without deterioration of display quality by utilizing these structural features.

<Manufacturing Method>

 A method of manufacturing an electro wetting display device according to each embodiment of the present invention will be described. In this case, the method for manufacturing the electro wetting display device according to the second embodiment of the present invention is included in the method for manufacturing the electro wetting display device according to the first embodiment of the present invention. For the second embodiment, only portions that differ from the first embodiment will be described briefly, and the first embodiment will be described.

First, the manufacturing method of an array substrate is briefly demonstrated with reference to FIG.

A first metal material is formed on the transparent insulating substrate by depositing a first metal material on the substrate 111 to form a first metal layer and pattern the first metal layer to form a gate wiring connected to the gate electrode 115 and extending in one direction.

Subsequently, a gate insulating film 118 is continuously formed on the entire surface of the inorganic insulating material, and pure amorphous silicon (a-Si), impurity amorphous silicon (n + a-Si), and By depositing and patterning two metal materials in succession, the ohmic contact layer 120b and the ohmic contact layer of impurity amorphous silicon spaced apart from each other on top of the active layer 120a of amorphous silicon corresponding to the gate electrode 115 Source and drain electrodes 135 and 137 are spaced apart from each other over 120b. In this case, the gate electrode 115, the gate insulating layer 118, the active layer 120a, the ohmic contact layer 120b, and the source and drain electrodes 135 and 137 form a thin film transistor Tr.

In addition, the pixel region P is connected to the source electrode 135 on the gate insulating layer 118 and crosses the gate wiring (not shown) by the same process in which the source and drain electrodes 135 and 137 are formed. A data line (not shown) defining a portion is formed.

Next, a protective layer 140 is formed by depositing an inorganic insulating material or applying an organic insulating material over the thin film transistor Tr and the data line (not shown), and then patterning the drain electrode 137. A drain contact hole 145 exposing a portion is formed.

Next, a transparent conductive material is deposited on the passivation layer 140 and patterned to form the pixel electrode 150 contacting the drain electrode 137 through the drain contact hole 145. An organic insulating material layer is coated on the organic insulating material to form and pattern the organic insulating material layer, thereby patterning the patterned spacers corresponding to the upper portion of the thin film transistor Tr or the upper portion of the gate wiring (not shown) or the data wiring (not shown). The array substrate 111 is completed by forming 155.

Next, a method of manufacturing a color filter substrate for an electro wetting display device according to the present invention will be described with reference to FIGS. 5A to 5E.

First, as illustrated in FIG. 5A, after depositing (or applying) a metal material or black resin on the front surface of the metal material or black resin, which blocks light such as chromium oxide (CrOx) on the transparent insulating substrate 161. By patterning, a black matrix 164 is formed corresponding to gates and data lines (not shown) on the array substrate (not shown) corresponding thereto, ie, having a lattice shape. In this case, in the case of the color filter substrate according to the second embodiment, the process of forming the black matrix is omitted.

Next, as shown in FIG. 5B, one of red, green, and blue, for example, red color resists is applied on the black matrix 164 or the substrate 161 to apply a red color filter layer (not shown). ), An exposure mask (not shown) having a portion through which light passes and a pattern for blocking light is placed on the red color filter layer, and then exposed and developed to form the red color filter pattern. Complete 167a.

Thereafter, the green and blue color resists 167b and 167c are formed on the substrate 161 in the same manner as in the method of forming the red color filter pattern 167a. In this case, the red, green, and blue color filter patterns 167a, 167b, and 167c are preferably formed in a repeating form.

Next, as illustrated in FIG. 5C, the organic insulating material is transparent to protect the color filter patterns 167a, 167b, and 167c and to compensate for the step difference over the red, green, and blue color filter patterns 167a, 167b, and 167c. Is applied to form the overcoat layer 170. In this case, the overcoat layer 170 may omit both the first and second embodiments.

Thereafter, an indium tin oxide (ITO) or an indium zinc oxide (IZO), which is a transparent conductive material, is deposited on the overcoat layer 170 or the color filter layer 167 to form a common electrode 172.

Next, as shown in FIG. 5D, the hydrophobic film 175 is formed by depositing or applying a hydrophobic material on the entire surface over the common electrode 172 on the entire surface of the common electrode 172, and subsequently organically forming the hydrophobic layer over the hydrophobic film 175. A barrier rib 178 having a width equal to or smaller than the width of the black matrix 164 corresponding to the boundary or the black matrix 164 of each color filter pattern 167a, 167b, and 167c by applying and patterning an insulating material. To form.

Next, as shown in FIG. 5E, the black oil layer 180 is applied by applying a non-polar black oil to a region where the color filter patterns 167a, 167b, and 167c of each color surrounded by the partition wall 178 are formed. By forming, the color filter substrate 161 is completed.

3, a seal pattern (not shown) having an injection hole is formed along an edge of the color filter substrate 161 or the array substrate 111, and these two substrates 161 and 111 are formed on the partition wall ( 178 and the patterned spacer 155 are brought into contact with each other to form a panel state having a predetermined spacing interval, and a polar liquid is injected into the separation regions of the two substrates 161 and 111 through the injection hole, and the injection hole is formed. The encapsulation of the electrowetting display device according to the present invention is completed.

Subsequently, an electro wetting display device 100 is completed by attaching a backlight unit (not shown) to the lower portion 111 of the array substrate of the panel for the electro wetting display device.

As described above, the electro-wetting display device according to the present invention forms a black oil layer on the color filter layer so that light passing through the pixel region corresponding to each color filter pattern is separated from the neighboring color filter pattern. By providing an electro wetting display device having a structural feature that does not pass, there is an effect of improving the display quality through the prevention of color mixing.

Claims (11)

A first substrate; A thin film transistor formed on the first substrate; A gate line and a data line connected to the thin film transistor on the first substrate and crossing each other to define a pixel area; A pixel electrode connected to the thin film transistor; A second substrate facing the pixel electrode of the first substrate; A color filter layer formed under the second substrate; A common electrode formed on an entire surface under the color filter layer; A hydrophobic film having hydrophobicity formed on the entire surface under the common electrode; A barrier rib formed under the hydrophobic layer in a lattice shape at a boundary of the pixel region; A nonpolar black oil layer formed in the partition wall under the hydrophobic film; A liquid layer of polarity interposed between the pixel electrode and the black oil layer Electro wetting display (electro wetting display) device comprising a. The method of claim 1, And wherein said polar liquid layer is H ₂ O. Electro Wetting display device. delete The method of claim 1, An electro wetting display device in which a patterned spacer is further formed on the first substrate so as to overlap a portion of an area where the thin film transistor or the gate wiring or the data wiring is formed. 5. The method of claim 4, An electro wetting display device in which a black matrix is further formed between the second substrate and the color filter layer to overlap the gate and data lines. 6. The method of claim 5, And the barrier rib is formed to overlap the black matrix and have a width equal to or smaller than the width of the black matrix. 6. The method of claim 5, And the barrier rib is configured to be in contact with the patterned spacer so that the first and second substrates maintain the same separation distance. The method of claim 1, And the color filter layer comprises a red, green, and blue color filter pattern which is sequentially repeated. 9. The method of claim 8, The electro wetting display device of claim 1, wherein the barrier rib is formed at a boundary between the red, green, and blue color filter patterns. The method of claim 1, An electro wetting display device, wherein an overcoat layer is further formed between the color filter layer and the common electrode. The method of claim 1, An electro wetting display device further comprising a backlight on the outer surface of the first substrate.

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