KR101267615B1 - A diffraction grating-based X-ray device - Google Patents

Abstract

The present invention discloses an X-ray apparatus based on a diffraction grating. The apparatus includes an x-ray source having at least one insulating post and emitting x-rays in a vacuum state; A diffraction grating for generating coherent X-rays by applying the emitted X-rays, transmitting the X-rays transmitted through the object located inside and forming a phase difference; And an X-ray detector for receiving the transmitted X-ray, converting the received X-ray into an electric signal, and transmitting the converted electric signal as digital image information.

Description

A diffraction grating-based X-ray device

The present invention relates to an X-ray apparatus, and more particularly, to an X-ray apparatus in which an X-ray phase difference is formed using a diffraction grating to cause optical interference to acquire an X-ray image capable of detecting an internal structure of a subject at high resolution, To an X-ray apparatus based on a diffraction grating which can reduce an amount of X-ray exposure to a low dose and easily control an electron trajectory change emitted from the emitter.

In general, an X-ray source, also called an X-ray tube, emits accelerated electrons under a high voltage by using a vacuum discharge tube, and collides the emitted electrons with a target metal plate to generate X-rays. These x-ray sources can be classified into a thermal cathode X-ray tube and a gas-filled X-ray tube depending on how the X-ray is made.

However, since the vacuum discharge tube used in the above-described X-ray source has a disadvantage that the volume thereof becomes very large in order to discharge a large amount of electrons, recently, as a electron emission source, a synchrotron (synchrotron A particle accelerator in which the oscillation frequency of a vibrator is changed to maintain a constant radius of the charged particles performing circular motion), a laser plasma accelerator using a high-power laser and a solid target, or a thermionic emission device.

However, since the X-ray fluoroscopic image technique which utilizes the difference in the absorption ability of the conventional X-ray and obtains a contrast image becomes smaller as the absorption ability of the X-ray becomes the light element, a sufficient contrast there is a problem that contrast can not be expected.

In addition, although the X-ray is strong in straightness and transparency, the X-ray also has an intrinsic refractive index with a minute difference for each substance. If these features are used well, the X-ray can also be condensed, and the X-ray optical element can be classified into the refractive type, the reflection type and the diffractive type. Among them, the X-ray grating of the present invention is a transmissive diffraction grating.

Since the wavelength of an X-ray is only a short wavelength of a few nm to a few Å, it can only measure shadows due to the absorption of an X-ray, so the resolution of the image by X-rays is generally limited to a few hundred micrometers to a few millimeters have.

In addition, it is difficult to distinguish changes in the soft tissues of shadows when a low-light source is used because X-rays with low texture and low permeability are less absorbed in the soft tissues. However, there was a problem that the changes in the soft tissues could not be measured.

On the other hand, there is a possibility that the radiation amount of the X-ray emitted from the X-ray source is excessively discharged in proportion to the current supplied to the X-ray source, and the severity of the damage to the subject and the measurer may become serious.

In addition, long-term use of X-ray equipment not only shortens the lifetime of the emitter in the X-ray source, but also changes the X-ray dose detected by the X-ray detector when the high voltage supplied from the high voltage generator to the X- So that the image of the subject is not consistently acquired.

In addition, since the energy of accelerated electrons is uneven in the conventional X-ray light sources, the quality of the electron beam or X-ray generated is very low, the electron emitting device of a desired size can not be provided, There has been a limitation in increasing the size of the cursor focusing electrode and the gate electrode.

It is an object of the present invention to provide a diffraction grating-based X-ray apparatus for generating an interlaced beam using a diffraction grating and forming an interferometer to generate a phase difference image, thereby obtaining an X-ray image with improved contrast and excellent sharpness.

Also provided is a diffraction grating-based x-ray apparatus for adjusting the fixed positions and spacing of electrodes through one or more insulating pillars provided on a cathode electrode in an x-ray source and easily controlling electron trajectory changes emitted from the emitters .

In addition, a diffraction grating-based x-ray device capable of adjusting the fixed positions of the electrodes and the distance between the electrodes through the at least one insulating column provided on the cathode electrode in the x-ray source and easily controlling the electron trajectory changes emitted from the emitters .

According to an aspect of the present invention, there is provided a diffraction grating-based X-ray apparatus comprising: an X-ray source having at least one insulating column and emitting X-rays in a vacuum state; A diffraction grating for generating coherent X-rays by applying the emitted X-rays, transmitting the X-rays transmitted through the object located inside and forming a phase difference; And an X-ray detector for receiving the transmitted X-ray, converting the received X-ray into an electric signal, and transmitting the converted electric signal as digital image information.

In order to achieve the above object, the diffraction grating of the diffraction grating-based X-ray apparatus of the present invention includes: an absorption grating for receiving the emitted X-rays and generating the concatenated X-rays; A phase grating which receives the concatenated X-rays and forms the phase difference to generate optical interference; And an analyzer grating for receiving the X-ray transmitted through the inspected object and transmitting the X-ray for detecting the internal structure of the inspected object according to a pattern appearing according to inter-grid spacing .

In order to achieve the above object, the phase grating of the diffraction grating-based X-ray apparatus according to the present invention is characterized in that X-rays having the same phase, satisfying the diffraction condition, .

In order to achieve the above object, the present invention provides a diffraction grating-based X-ray apparatus in which a multi-layered thin film is deposited on the phase grating to increase the diffraction gain by forming a grating surface having an increased reflectivity.

In order to achieve the above object, the X-ray transmitted through the inspected object of the diffraction grating-based X-ray apparatus of the present invention is refracted by the inspected object, the delta is a phase change value of the X- Ray absorption coefficient of the subject.

In order to achieve the above object, the phase shift value of the diffraction grating-based X-ray apparatus of the present invention is set to be one of the distances d1 and d2 between the diffraction gratings and the pitches P1, P2 and P3 of the diffraction gratings Or more.

In order to achieve the above object, the absorption coefficient of the diffraction grating-based X-ray apparatus of the present invention is adjusted according to at least one of the thickness and the constituent components of the absorption part of each of the diffraction gratings.

In order to achieve the above object, the X-ray source of the diffraction grating-based X-ray apparatus of the present invention is characterized by being one or two or more unit x-ray sources or gantry x-ray sources.

In order to achieve the above object, the x-ray source of the diffraction grating-based x-ray device of the present invention comprises a cathode electrode; An emitter formed on the cathode electrode; An anode electrode located on the emitter; A gate electrode positioned between the emitter and the anode electrode; And a focusing electrode positioned between the emitter and the anode electrode. The cathode electrode is provided with one or more insulating pillars capable of adjusting the positions of the gate electrode and the focusing electrode.

In order to achieve the above object, the gate electrode and the focusing electrode of the diffraction grating-based X-ray apparatus of the present invention are configured such that the at least one insulating column can be penetrated.

In order to achieve the above object, the emitter of the diffraction grating-based X-ray apparatus of the present invention is characterized in that it is at least one of a point light source type and a surface light source type.

In order to achieve the above object, the at least one insulating column of the diffraction grating-based X-ray apparatus of the present invention is formed in a hollow or filled column shape, and when the at least one insulating column is hollow, And the electric wire connected to the external power source is located inside the insulated pole.

In order to achieve the above object, each of the at least one insulating pillars of the diffraction grating-based X-ray apparatus of the present invention is provided with at least one first hole, each of the gate electrode and the focusing electrode is provided with at least one second hole, And power is applied to the gate electrode and the focusing electrode from the external power source through a power connection member that penetrates through the second hole and the first hole and contacts the electric wire.

In order to achieve the above object, the at least one insulating column of the diffraction grating-based X-ray apparatus of the present invention is formed of any one material selected from the group consisting of ceramic, quartz, glass, Teflon, polymer, do.

In order to achieve the above object, the diffraction grating-based X-ray apparatus of the present invention controls the loci of electrons emitted from the emitter by adjusting the fixing positions of the gate electrode and the focusing electrode through the at least one insulating column, .

According to another aspect of the present invention, there is provided a diffraction grating-based X-ray apparatus including a main vacuum chamber having one side of the X-ray source attached thereto and maintaining the inside of the X-ray source in a vacuum state.

According to the present invention, the spatial matching of the X-ray beam is increased and the X-rays of the same phase are propagated by the diffraction and interference effects of the X-rays to obtain images of high resolution and low dose, X-ray exposure can be significantly reduced compared to X-ray absorption.

In addition, it is possible to control the electron emission characteristics with high efficiency through adjustment of the positions of the electrodes through the insulating pillars in the X-ray source, to extend the lifetime of the equipment through stable electron emission and to reduce the maintenance cost, and to miniaturize the beam diameter of the X- It is easy to control the output and high resolution.

In addition, since the kinetic energy of the emitted electrons is almost constant and the electron emission direction is good because the X-ray source using the nanomaterial is used, the focus size can be easily controlled through the electrostatic lens and the like.

In addition, since the field emission type X-ray light source is used, it is possible to precisely control the X-ray focus size electrostatically, and the error due to the rotation axis clearance can be reduced so that the blurring of the boundary can be extremely reduced, Improvement can be obtained.

1 is a schematic cross-sectional view of a diffraction grating-based x-ray apparatus according to the present invention.
FIG. 2 is a manufacturing process diagram of the absorption grating 200 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.
FIG. 3 is a manufacturing process diagram of the phase grating 300 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.
FIG. 4 is a manufacturing process diagram of the analyzer grating 400 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.
FIG. 5A is a perspective view of an X-ray source 100 in a diffraction grating-based X-ray apparatus according to the present invention shown in FIG. 1, and FIG. 5B is a perspective view of a diffraction grating according to the present invention shown in FIG. Ray source 100 in the X-ray source.
FIG. 6 is a perspective view of an X-ray source 100 in a diffraction grating-based X-ray apparatus according to the present invention shown in FIG. 1 as viewed from below.
FIG. 7 is a view schematically showing an insulating column used in the X-ray source 100 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

Hereinafter, preferred embodiments of the diffraction grating-based X-ray apparatus according to the present invention will be described with reference to the accompanying drawings.

1 is a schematic cross-sectional view of a diffraction grating-based X-ray apparatus according to the present invention and includes an X-ray source 100, a main vacuum chamber 20, diffraction gratings 200, 300 and 400, and an X-ray detector 10 And the diffraction gratings include an absorption grating 200, a phase grating 300 and an analyzer grating 400.

The function of each block of the diffraction grating-based X-ray apparatus according to the present invention will be described with reference to FIG.

The x-ray source 100 has one or more insulating pillars and is attached to one side of the main vacuum chamber 20 to generate X-rays in a vacuum state.

Here, the x-ray source 100 is a polychromatic system that is effective for measuring fluorescence color or the like. The x-ray source 100 may be a linear, circular, arctic, or a polychromatic system depending on the type of the subject 40 to be photographed and the use environment of the x- The arrangement density thereof can be adjusted, and can be configured to be detachably attached from the main vacuum chamber 20 for maintenance and repair.

In addition, the x-ray source 100 may be a single unit x-ray source or a plurality of unit x-ray sources and may be a gantry x-ray source, which in the present embodiment is set to be a plurality of unit x-ray sources.

The main vacuum chamber 20 is arranged to be spaced apart from the X-ray detector 10 by a predetermined distance, and can be maintained at a high vacuum by using a vacuum pump or the like. That is, the X-ray source 100 emits electrons in a vacuum state to provide an appropriate environment for generating X-rays.

The absorption grating 200 receives the X-rays generated from the X-ray source 100 and forms a spatially coherent X-ray beam.

The phase grating 300 receives a focused X-ray beam formed in the absorption grating 200 to form a phase difference to cause optical interference.

The analyzer grating 400 detects the structure of the skeleton and the soft tissues of the subject 40 by analyzing the pattern that appears according to the interval of the crystal lattice layer when the X-ray beam with the optical interference is reflected and reflected from the grating .

The subject 40 may be spaced apart from the x-ray detector 10 and disposed at a specific angle with the x-ray source 100 from the center. It should be noted, however, that the distance and the specific angle may be changed according to the kind of the X-ray system and the use environment.

The specific configuration of the x-ray source 100 will be described later with reference to Figs. 5 to 7.

The X-ray detector 10 receives X-rays transmitted from the analyzer grating 400, converts the X-rays into visible light through an X-ray converter, converts the visible light back to an electric signal, And transmits the image information.

FIG. 2 is a manufacturing process diagram of the absorption grating 200 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

FIG. 3 is a manufacturing process diagram of the phase grating 300 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

FIG. 4 is a manufacturing process diagram of the analyzer grating 400 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

The manufacturing process of the absorption grating 200 in the diffraction grating-based X-ray apparatus according to the present invention will now be described with reference to FIGS. 2 to 4. FIG.

First, as shown in FIG. 2 (a), a polymer layer 240 is deposited on the substrate 220.

The substrate 220 includes a crystalline material such as silicon or quartz, or an amorphous material such as glass or acrylic. The substrate is determined according to the formation of the lattice, and the area of the substrate is determined according to the application.

Here, when silicon is used as the substrate 220, the thickness is preferably 100 to 500 mu m, and when the photosensitive resistor is used as the polymer layer 240, the thickness is preferably 1 to 5 mu m.

As shown in FIG. 2 (b), a photoresist pattern 245 is formed by patterning the deposited polymer layer 240 such that openings are formed at regular intervals.

The predetermined interval becomes the width A of the convex portion of the absorption grating 200 to be described later and the pitch P1 of the absorption grating 200 together with the width A ' It is an important factor to decide.

Here, the pitch P1 of the absorption grating 200 is determined by the distances d1 and d2 between the absorption grating 200, the phase grating 300, and the analyzer grating 400 shown in Fig. The distance d1 between the absorption grating 200 and the phase grating 300 is 130 cm and the distance d2 between the phase grating 300 and the analyzer grating 400 is 7 cm, it is preferably 127 [mu] m.

An etching process is performed on the substrate on which the photoresist pattern 245 is formed to etch the bottom of the region other than the region where the photoresist pattern 245 is formed, as shown in FIG. 2 (c). At this time, the etching depth is adjusted according to the x-ray absorption amount.

The etching process may be performed by wet etching or dry etching.

As shown in Figs. 2 (d) and 2 (e), the absorbing material 260 is laminated on the etched substrate, and the melting process is performed in a vacuum environment. Here, the absorbent material 260 may be lead, gold, silver, or the like.

The surface of the molten absorbent material 265 may be polished using a chemical mechanical polishing (CMP) process to increase the depth or height of the molten absorbent material 265, as shown in Figure 2 (f) . At this time, the surface of the substrate 220 can be polished depending on the application.

As shown in FIGS. 2 (g) and 2 (h), the chemical mechanical polishing process is performed until the surface of the substrate 220 is exposed, and then, through the selective etching process, The area is etched.

FIG. 3 is a manufacturing process diagram of the phase grating 300 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

A manufacturing process of the phase grating 300 in the diffraction grating-based X-ray apparatus according to the present invention will be described with reference to FIG.

First, as shown in FIG. 3A, a polymer layer 340 is deposited on the substrate 320, as shown in FIG. 3A.

The substrate 320 includes a crystalline material such as silicon, quartz, or an amorphous material such as glass or acrylic. The substrate is determined according to the formation of the lattice, and the area of the substrate is determined according to the application.

Here, in the case of using silicon as the substrate 320, the thickness is preferably 50 to 500 mu m, and in the case of using S1805 as the polymer layer 340, the thickness is preferably 0.5 to 2 mu m.

As shown in FIG. 2 (b), a photoresist pattern 345 is formed by patterning the deposited polymer layer 340 so as to form openings at regular intervals.

The predetermined interval becomes the width B of the protrusion of the phase grating 300 to be described later and becomes an important factor for determining the pitch P2 of the phase grating 300 together with the width B '

Here, the pitch P2 of the phase grating 300 is determined by the distances d1 and d2 between the absorption grating 200, the phase grating 300, and the analyzer grating 400 shown in Fig. The distance d1 between the absorption grating 200 and the phase grating 300 is 130 cm and the distance d2 between the phase grating 300 and the analyzer grating 400 is 7 cm, it is preferably 4.0 m.

3B and 3C, reactive ion etching (RIE) is performed on the upper surface of the substrate 320 and the photoresist pattern 345 to expose the substrate 320 and the photoresist pattern 345, The upper surface of the resist pattern 345 is etched by a certain depth.

Here, reactive ion etching refers to a technique of reacting active species present in a plasma of a reactive gas with atoms on the surface of an etching material to generate a volatile reaction product, which is removed from the material surface and etched. In the present invention, Using C ₄ F ₈ , SF _6, and O ₂ , and dry etching under a pressure of 10 Torr.

The photoresist pattern 345 is removed by performing an etching process on the upper surface of the substrate 320 and the upper surface of the photoresist pattern 345 on which the upper surface is etched by a certain depth. At this time, the photoresist pattern 345 may not be removed.

FIG. 4 is a manufacturing process diagram of the analyzer grating 400 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

The manufacturing process of the analyzer grating 400 in the diffraction grating-based X-ray apparatus according to the present invention will be described with reference to FIG.

First, as shown in Fig. 4A, by the same process as the manufacturing process of the phase grating 300 in the X-ray apparatus according to the present invention shown in Figs. 2A to 2G, Since the analyzer grating 400 is formed, the detailed process will not be described below.

The predetermined interval becomes the width C of the protruding portion of the analyzer grating 400 and is an important factor for determining the pitch P3 of the analyzer grating 400 together with the width C ' .

The pitch P3 of the analyzer grating 400 is determined according to the distances d1 and d2 between the absorption grating 200, the phase grating 300 and the analyzer grating 400 shown in Fig. 1, The distance d1 between the absorption grating 200 and the phase grating 300 is 130 cm and the distance d2 between the phase grating 300 and the analyzer grating 400 is set to be 3.8 to 4.2 μm, When it is 7 cm, it is preferably 4.0 m.

The operation of the diffraction grating-based X-ray apparatus according to the present invention will now be described with reference to FIGS. 1 to 4. FIG.

The diffraction grating-based X-ray apparatus according to the present invention generates a contrast based on the phase shift of the X-ray and the interference phenomenon of the diffraction grating.

That is, when the X-ray source 100 generates X-rays in a vacuum state, the X-ray beam is applied to the absorption grating 200 to form a spatially coherent X-ray beam, and a phase difference is formed in the phase grating 300, .

At this time, the absorption grating 200 is made of a material that absorbs X-rays, and a diffraction grating having a sufficient thickness is used.

When the phase grating 300 periodically modulates the phase of the X-ray, the X-ray intensity distribution after passing through the phase grating 300 reflects the shape of the phase grating 300.

When the spatially correlated field of the X-ray is larger than the pitch P2 of the phase grating 300, a high-contrast light-dark cycle period, i.e., a magnetic image appears at a constant position.

If the absorption grating 200 is disposed at a position where a magnetic image is formed, moiré streaks are generated due to overlapping of the magnetic image and the absorption grating 200.

The X-ray passing through the absorption grating 200 and the phase grating 300 is refracted by the inspected object 40, and the refractive index is expressed by a complex function as shown in the following equation (1).

Here,? Is a value representing the phase change of the X-ray and has a size of 10 ^-5 to 10 ^-7 . beta has a value of 10 ^-7 to 10 < ^-9 > as an X-ray absorption coefficient of the inspected object (40).

These values are about 1/10 to 1/100 of the value of each lattice pitch and are very small to measure changes in the same medium. In current commercial and clinical X-ray images, Therefore, it is possible to distinguish between the skeleton and the soft tissue of a living body.

However, if the X-ray image is measured using the phase change value (?), A value 10 to 100 times larger than the absorption coefficient value (?) Can be measured. That is, the photon amount of the X-ray light source can be reduced as much as possible, real-time measurement is possible, and the dose of the patient and the sample can be remarkably reduced to about 1/1000.

However, in order to use the phase change value [delta], the condition that the coherence of the X-ray light source should be very good is required.

Therefore, in the present invention, the distances d1 and d2 between the absorption grating 200, the phase grating 300 and the analyzer grating 400, and the pitches P1, P2 and P3 of the diffraction gratings are adjusted to obtain a phase change value δ) to obtain an X-ray phase difference image, and the intensity of the X-ray energy can be adjusted by varying the absorption coefficient value β according to the thickness and constituent components of the absorption part in each diffraction grating.

That is, the X-rays incident on each diffraction grating are diffracted by the grating, and the intensity and width of the diffracted X-rays are determined by the thickness of the grating absorber and the lattice spacing.

The X-ray having the intensity and width of the beam is propagated by overlapping the X-rays of the same phase satisfying the diffraction condition in each of the diffraction gratings, resulting in a condensed X-ray having a high luminance, The lattice fabricated by deposition increases the diffraction gain by forming a high reflectance lattice plane.

The X-ray thus obtained with high luminance is diffracted by increasing the diffraction gain, and transmitted through the inspected object 40 and refracted to form a magnetic image. The analyzer grating 400 receives the X- When the structure of the skeleton and the soft tissue is detected and transmitted, the x-ray detector 10 converts it into visible light, converts it into an electric signal, and transmits it as digital image information.

In order to detect a magnetic image generated from sufficient contrast, an X-ray X-ray detector having high spatial resolution performance is required. When it is desired to observe a magnetic image with a high resolution performance, the pitch of the phase grating 300 P2 is smaller.

FIG. 5A is a perspective view of an X-ray source 100 in a diffraction grating-based X-ray apparatus according to the present invention shown in FIG. 1, and FIG. 5B is a perspective view of a diffraction grating according to the present invention shown in FIG. Ray source 100 in the X-ray source.

FIG. 6 is a perspective view of an X-ray source 100 in a diffraction grating-based X-ray apparatus according to the present invention shown in FIG. 1 as viewed from below.

FIG. 7 is a view schematically showing an insulating column used in the X-ray source 100 in the diffraction grating-based X-ray apparatus according to the present invention shown in FIG.

5 to 7, a unit x-ray source 100 includes a cathode electrode 110, an emitter 120, an anode electrode 130, a gate electrode 140, a focusing electrode 150, (160). Note, however, that such a unit x-ray source 100 operates in vacuum without special mention.

The cathode electrode 110 is disposed on a top surface of a substrate (not shown) formed of glass, metal, quartz, silicon, or alumina. The cathode electrode 110 is formed on the cathode electrode 110 in the form of a point light source and / 120).

The cathode electrode 110 is provided with one or more insulating pillars 160 to easily separate and fix the position of the electrodes and the gap between them by separating and fixing the gate electrode 140 and the focusing electrode 150, Which will be described later.

The emitter 120 serves to emit electrons and is shown as having a point light source configuration.

The shape of the point light source emitter 120 is not particularly limited as long as the tip at which electrons are emitted has a pointed shape. However, it may be any one of a conical shape, a tetragonal shape, a cylindrical shape having a pointed tip and a polyhedral shape having a pointed tip.

The point light source emitter 120 has a bottom diameter of about 0.1 to about 4 mm and a height of about 0.5 to about 5 cm. This is because it is possible to effectively emit electrons as a point light source when the magnitude and the scale of the above-mentioned degree are achieved, and the effect according to the present invention can be achieved.

Further, the type of the emitter 120 is not particularly limited, but is preferably a conductive material composed of a metal or a carbon-based material.

It should be noted that the emitter 120 may be a surface light source type emitter as well as a point light source type in accordance with the performance of the desired x-ray source or the like, by adjusting the trajectory of the emitted electrons. In this case, it is preferable that the emitter of the surface light source type is a carbon structure or metal formed on silicon, metal, or carbon series.

The anode electrode 130 is located above the emitter 120.

The anode electrode 130 is provided with an electrode and / or a DC power supply (not shown) for applying power, but this is well known in the art and a detailed description thereof will be omitted herein.

The material of the anode electrode 130 is generally formed of a material selected from the group consisting of copper, tungsten, manganese, maldives, and combinations thereof. It is noted that in the case of the thin film type X-ray, the anode electrode 130 may be formed of a metal thin film.

With this configuration, when the emitter 120 emits electrons, the emitted electrons collide with the metal forming the anode electrode 130 and then generate X-rays while reflecting or passing through the metal. do.

The gate electrode 140 is positioned between the emitter 120 and the anode electrode 130. The gate electrode 140 increases the emission amount of the electrons emitted from the emitter 120 and accelerates the speed of the emitted electrons.

The focusing electrodes 150a and 150b are positioned between the gate electrode 140 and the anode electrode 130. [ This focusing electrode 150 allows electrons emitted from the emitter 120 to move toward the anode electrode 130 without being scattered or scattered.

Although there is one gate electrode 140 and two focusing electrodes 150a and 150b in the drawing, it is also possible to control the trajectory of the emitted electrons or to control the gate electrode 140 and / Note that the number of the focusing electrodes 150a and 150b may be variously changed.

In addition, the gate electrode 140 and the focusing electrodes 150a and 150b are configured to be detachable from one or more insulating pillars 160 to be described later, thereby facilitating their extraction.

The shape of the gate electrode 140 and the focusing electrodes 150a and 150b may be determined according to the trajectory of the electrons emitted from the emitter 120. Although the electrodes are shown as plate-like members having a uniform thickness with a circular hole, the electrodes may be shaped like a circular ring or a cylindrical cylinder having a hole therein, A plate-like shape having a predetermined thickness, and the like.

One or more insulating pillars 160 may be provided on the cathode electrode 110 or vertically inserted into the cathode electrode 110 to separate the gate electrode 140 and the focusing electrodes 150a and 150b And also serves to fix and adjust the position of the gate electrode 140 and the focusing electrodes 150a and 150b.

The principle of controlling the positions of the gate electrode 140 and the focusing electrodes 150a and 150b by the at least one insulating column 160 will be described in detail below.

One or more insulating pillars 160 are configured to pass through gate electrode 140 and focusing electrodes 150a and 150b. That is, through holes corresponding to the size and shape of the insulating pillars 160 are formed in the gate electrode 140 and the focusing electrodes 150a and 150b so that the insulating pillars 160 can pass therethrough. One or more first holes 162 are formed on the side surface of the insulating column 160 and one or more second holes 151 are formed on the side surfaces of the gate electrode 140 and the focusing electrodes 150a and 150b .

Although three first holes 162 are formed in the side surface of the cylindrical insulating column 160 in the figure, this is merely an example, and the side surfaces of each of the gate electrode 140 and the focusing electrodes 150a and 150b Note that four or more second holes 151 are formed, but these are merely illustrative.

A power connection member (not shown, for example, a certain type of screw or tightening member) capable of penetrating the second hole 151 and the first hole 162 is used to connect the insulating column 160 and each electrode The gate electrode 140 and the focusing electrodes 150a and 150b can be separated from each other and held at a constant position.

At this time, the interval between the electrodes can be easily controlled by selectively adjusting the positions of the first holes 162 formed in the insulating pillars 160.

7, one or more insulating pillars 160 may have a hollow interior with the interior of the one or more insulating pillars 160. In one embodiment of the present invention, And an electric wire 161 connected to an external power source is disposed inside the insulating column.

In this case, since the power connection member passes through the second hole 151 and the first hole 162 and contacts the electric wire located inside the insulating column 160, the gate electrode 140 and the focusing electrodes 150a, 150b, respectively.

For example, when there are one gate electrode 140 used for the unit x-ray source 100 and two focusing electrodes 150a and 150b, it is preferable that there are three insulating columns 160. [ At this time, it is preferable that the emitter 120 is positioned at the center of the cathode electrode 110 and the three insulating pillars are positioned to surround the emitter 120, but the positions of the three insulating pillars are not necessarily limited thereto do. When one additional focusing electrode is added, it is preferable that four insulating columns 160 are positioned.

Electric wires connected to an external power source are respectively located inside the three insulating pillars, one electrode per one insulating column is electrically connected through a second hole formed in each electrode and a first hole formed in each insulating column So that it is possible to apply appropriate power to each electrode.

On the other hand, in the case where the insulator pillar 160 has a column shape filled with the inside, a separate DC power supply (not shown) for applying power to each electrode is provided so as to apply power to each electrode .

Here, it is preferable that the shape of the at least one insulating column is at least one of a circle, an ellipse, a triangle, a square, a polyhedron, and a combination thereof.

It is also preferred that the at least one insulating column is made of a material selected from the group consisting of ceramic, quartz, glass, Teflon, polymer and mixtures thereof.

As described above, the diffraction grating-based x-ray apparatus according to the present invention generates diffraction grating-based x-ray diffraction grating-based x-ray diffraction gratings Ray diffraction and interference effects of X-ray beams, it is possible to obtain images of high resolution and low dose by propagating X-rays of the same phase by the diffraction and interference effect of X-rays, X-ray exposure can be significantly reduced.

Further, it is possible to control the electron emission characteristic of the high efficiency by easily controlling the change of the electron locus emitted from the emitter by adjusting the fixed positions and the interval between the electrodes through one or more insulating pillars provided on the cathode electrode in the X- , Stable electron emission can extend the lifetime of the equipment and reduce the maintenance cost, and it is easy to control the high resolution and output by miniaturizing the beam diameter of the X-ray.

In addition, by using a field emission type X-ray light source using a nano material in the x-ray source, the kinetic energy of the emitted electrons is almost constant and the electron emission direction is good, so that the focus size can be easily controlled through the electrostatic lens or the like. Ray image can be obtained, the X-ray focus size can be precisely controlled electrostatically, and the error due to the rotation axis clearance can be reduced, so that the blurring of the boundary can be extremely reduced, so that the quality improvement of the reconstructed image can be obtained do.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It will be understood that the present invention can be changed.

10: X-ray detector
20: main vacuum chamber
100: X-ray source
200: Absorption grating
300: phase grating
400: analyzer grating

Claims (16)

An x-ray source having one or more insulating pillars and emitting x-rays in a vacuum state;
A diffraction grating for generating coherent X-rays by applying the emitted X-rays, transmitting the X-rays transmitted through the object located inside and forming a phase difference; And
An X-ray detector for receiving the transmitted X-rays and converting the received X-rays into electric signals and transmitting them as digital image information;
And,
The diffraction gratings
An absorption grating that receives the emitted X-rays to generate the focused X-rays;
A phase grating which receives the concatenated X-rays and forms the phase difference to generate optical interference; And
And an analyzer grating for receiving the X-ray transmitted through the inspected object and transmitting the X-ray for detecting the internal structure of the inspected object according to a pattern appearing according to an interval between the gratings As a result,
Diffraction grating based x-ray device.
delete The method according to claim 1,
The phase grating
Rays of the same phase satisfying the diffraction condition are superposed and propagated to generate an X-ray with increased brightness.
Diffraction grating based x-ray device.
The method according to claim 1,
In the phase grating
Characterized in that the multilayer thin film is deposited to form a lattice surface with an increased reflectance, thereby increasing the diffraction gain.
Diffraction grating based x-ray device.
The method according to claim 1,
The phase difference of the X-rays transmitted through the inspected object is
A phase change value of the diffraction grating is generated and formed,
The energy intensity of the X-rays transmitted through the inspected object is
Characterized in that the absorption coefficients of the diffraction gratings are varied and adjusted.
Diffraction grating based x-ray device.
6. The method of claim 5,
The phase change value
And the pitches (P1, P2, P3) of the diffraction gratings are adjusted by adjusting the distances (d1, d2) between the diffraction gratings and the pitches (P1,
Diffraction grating based x-ray device.
6. The method of claim 5,
The absorption coefficient
And the thickness of the absorptive portion of each of the diffraction gratings and the constituent components thereof.
Diffraction grating based x-ray device.
The method according to claim 1,
The x-
One or more unit x-ray sources or gantry x-ray sources.
Diffraction grating based x-ray device.
The method according to claim 1,
The x-
A cathode electrode;
An emitter formed on the cathode electrode;
An anode electrode located on the emitter;
A gate electrode positioned between the emitter and the anode electrode; And
And a focusing electrode positioned between the emitter and the anode electrode,
Wherein the cathode electrode is provided with one or more insulating pillars capable of adjusting positions of the gate electrode and the focusing electrode.
Diffraction grating based x-ray device.
10. The method of claim 9,
The gate electrode and the focusing electrode
Wherein the at least one insulating column is configured to be penetrable.
Diffraction grating based x-ray device.
10. The method of claim 9,
The emitter
A point light source type, and a surface light source type.
Diffraction grating based x-ray device.
10. The method of claim 9,
The at least one insulating post
The inside thereof is formed in the form of a hollow or filled column, and
Wherein when at least one of the at least one insulating pillars is hollow, a wire connected to an external power source is located inside the at least one insulating pillars.
Diffraction grating based x-ray device.
13. The method of claim 12,
Wherein each of the one or more insulating pillars is provided with at least one first hole,
Wherein each of the gate electrode and the focusing electrode is provided with at least one second hole,
Wherein power is applied to the gate electrode and the focusing electrode from the external power source through a power connection member that penetrates through the second hole and the first hole and contacts the electric wire.
Diffraction grating based x-ray device.
10. The method of claim 9,
The at least one insulating post
Ceramic, quartz, glass, Teflon, a polymer, and a mixture thereof.
Diffraction grating based x-ray device.
10. The method of claim 9,
And controlling the locus of electrons emitted from the emitter by adjusting the fixing position of each of the gate electrode and the focusing electrode through the one or more insulating pillars.
Diffraction grating based x-ray device.
The method according to claim 1,
The diffraction grating-based x-ray device
A main vacuum chamber to which one side of the x-ray source is attached and keeps the inside thereof in a vacuum state;
Further comprising:
Diffraction grating based x-ray device.

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