KR101251013B1 - Patterned reproduction metal panel - Google Patents

Abstract

A pattern replica metal panel is provided. Pattern Duplicate Metal Panel is a duplicated pattern on the mold surface, and has a ten point average roughness (Rz) of 10 μm to 40 μm, a centerline average roughness (Ra) of 3 μm to 8 μm, and an amount of light reflection between 10000 and 45000. Has a value.

Description

Pattern Replica Metal Panel {PATTERNED REPRODUCTION METAL PANEL}

The present invention relates to a pattern replica metal panel, and more particularly, to a pattern replica metal panel in which a pattern or pattern on a mold surface is replicated.

Various attempts have been made to continuously reproduce patterns, creative patterns or patterns existing in the natural state. In particular, when a beautiful pattern existing in the natural state, for example, a silk or leather surface pattern is replicated on the surface of the metal panel to realize the natural texture and gloss on the metal surface, the design is superior to the general metal panel. A high utilization metal panel with high added value but maintaining a constant strength or hardness may be provided. For example, it can be used in all fields where metal panels, such as interior and exterior building materials, are applied. In this case, since a desired pattern or pattern is formed without a separate surface treatment, it is possible to provide an improved appearance in terms of design simply by replacing an existing metal panel.

In general, in order to continuously reproduce such a pattern or pattern, an emboss roller having an embossed or engraved pattern of a desired pattern is used on its outer surface. The pattern for the emboss roller was formed by mechanical machining or etching or by engraving a pattern or pattern directly on the roller. However, in the case of forming a pattern on the emboss roller through mechanical processing, there is a problem of the difficulty of the machining and the increase in cost and productivity decrease due to the long time processing. Alternatively, if the pattern is directly sculpted on the workpiece, it takes a long time, it is impossible to duplicate many of the same shape as the original. In particular, it was not possible to replicate the nano-sized or micro-sized patterns for both the emboss roller or the workpiece.

The present invention has been conceived based on these points, and the problem to be solved by the present invention is to provide a pattern replica metal panel in which a desired pattern is formed on the surface of the workpiece.

Another object of the present invention is to provide a pattern replica metal panel in which nano- or micro-sized patterns are replicated on the surface of the workpiece.

Another object of the present invention is to provide a pattern replica metal panel having a high value-added value and high utilization by forming a desired pattern on the surface of the workpiece.

The problems of the present invention are not limited to the above-mentioned problems, and other problems not mentioned can be clearly understood by those skilled in the art from the following description.

Pattern replica metal panel according to an embodiment of the present invention for solving the above problems is that the pattern of the mold surface is duplicated, the ten point average roughness (Rz) is 10㎛ to 40㎛, the centerline average roughness (Ra) is 3 It is 8 micrometers-8 micrometers, the replication rate of the pattern of the mold surface and the replicated pattern is 40% or more, and the amount of light reflection has a value between 10000 and 30000.

The pattern replica metal panel according to another embodiment of the present invention for solving the above problems is that the pattern of the master surface is duplicated, the ten-point average roughness (Rz) is 19㎛ to 36㎛, the centerline average roughness (Ra) is 3 It is 8 micrometers-8 micrometers, the replication rate of the pattern of the master surface and the replicated pattern is 65% or more, and the amount of light reflection has a value between 13000 and 25000.

The details of other embodiments are included in the detailed description and drawings.

According to embodiments of the present invention has at least the following effects.

According to the embodiments of the present invention, it is possible to provide a pattern replica metal panel in which a desired pattern is formed on a surface of a workpiece, and more specifically, a pattern replica metal panel in which nano or micro size patterns are replicated on a surface of a workpiece. Can provide.

In addition, according to the embodiments of the present invention, a desired pattern is formed on the surface of the workpiece to provide a pattern replica metal panel with high added value and high utilization.

The effects according to the present invention are not limited by the contents exemplified above, and more various effects are included in the present specification.

1 illustrates a pattern replica metal panel according to embodiments of the present invention.
2 is a flowchart illustrating a process of manufacturing a pattern replica metal panel according to an embodiment of the present invention.
FIG. 3 is a flowchart illustrating a mold manufacturing process of FIG. 2 in detail.
4 shows an exemplary centerline average roughness curve Ra.
5 shows an exemplary ten point average roughness curve Rz.
6 is a graph illustrating an exemplary light reflection distribution.
7 is a view showing a process of rolling a pattern replica metal panel according to embodiments of the present invention.
8 is an actual photograph of a pattern replica metal panel replicating a pattern of a wood surface in embodiments of the present invention.
9 is an actual photograph of a pattern replica metal panel replicating a pattern of a leather surface in embodiments of the present invention.
10 is an actual photograph of a pattern replica metal panel replicating a pattern of a silk surface in embodiments of the present invention.

Advantages and features of the present invention and methods for achieving them will be apparent with reference to the embodiments described below in detail with the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims.

The terms spatially relative, "below", "beneath", "lower", "above", "upper" And can be used to easily describe a correlation between an element and other elements. Spatially relative terms should be understood in terms of the directions shown in the drawings, including the different directions of components at the time of use or operation. For example, when inverting an element shown in the figures, an element described as "below" or "beneath" of another element may be placed "above" another element . Thus, the exemplary term "below" can include both downward and upward directions.

Hereinafter, with reference to the accompanying drawings will be described embodiments of the present invention.

1 is a diagram illustrating a pattern replica 10, a mold 20, and a replica object 30 according to an embodiment of the present invention. Pattern replica 10 according to an embodiment of the present invention is a pattern of the surface of the mold 20 is duplicated, the ten point average roughness (Rz) is 10㎛ to 40㎛, the centerline average roughness (Ra) is 3㎛ to 8 micrometers, the replication rate of the pattern of the mold surface and the replicated pattern is 40% or more, and the light reflection amount has a value between 10000-30000.

The mold 20 is fabricated from the original of the object to be reproduced 30 in which the pattern 31 to be reproduced is formed, and the mold 11 is formed using the mold 20 in which the pattern 21 is formed. A pattern replica 10 is obtained. Such a series of processes will be described later in detail with reference to the drawings. The pattern 11 formed on the surface of the pattern replica 10 is reproduced intaglio when the pattern 21 formed on the surface of the mold 20 is embossed, and is reproduced in relief when the pattern 21 of the mold 20 is engraved. The pattern 21 of the mold 20 is replicated to the surface of the pattern replica 10 as it is. The pattern 31 to be duplicated may be a pattern, a created pattern, or an artificial pattern existing in a natural state, but is not limited thereto. As will be described later, in manufacturing the mold 20 having the pattern 21, the mold 20 can be produced using the electroplating method, so that the pattern, the size, and the reproduction object of the pattern 31 as the target object ( Regardless of the material in 30, all patterns can be duplicated.

A process of manufacturing the pattern replica 10 according to an embodiment of the present invention is shown in FIG. 2. First, a mold in which a replication target pattern is formed is manufactured (S100). There is no restriction on the method of manufacturing the mold, and preferably, the mold 20 having the pattern 21 formed on the surface thereof may be manufactured through the electroplating process illustrated in FIG. 3. Although the material of the mold 20 is not limited, since the pressing operation is repeatedly performed, nickel or nickel alloys having excellent wear resistance and durability and high hardness, such as nickel-cobalt alloys and nickel-iron alloys, may be used. . However, the present invention is not limited thereto, and may be replaced with another metal having high hardness.

When the mold 20 having the pattern to be reproduced is formed on the surface, the workpiece to be processed into the pattern replica 10 is aligned with the mold 20 (S200). The workpiece, that is, the material of the pattern replica 10 is not limited, but the pattern 11 is replicated by pressing by the embossment (protrusion) of the mold 20, so that the metal having a lower hardness than the metal forming the mold 20 Preferably, the pattern replica 10 may be made of a metal such as aluminum or magnesium or an alloy thereof. After the alignment operation, the mold 20 is pressed to the workpiece side to duplicate the pattern 11 (S300). The pressing process may vary depending on the manufacturing form of the mold 20. That is, in the case where the mold 20 is a mold manufactured in the form of a flat plate, the workpiece is placed between the mold 20 and the support by a press device and pressed up and down to form the pattern 11 in a limited area of the workpiece. When the replica 10 is manufactured and the mold 20 is formed in a cylindrical shape, the workpiece 11 passes through the two rollers spaced apart from each other by approximately the thickness of the finished product as in the general rolling process, thereby transferring the pattern 11. Pattern replica 10 can be produced in the form. After finishing the pressing process, a finishing operation such as a planarization operation of flattening the patterned replica 10 having a curvature formed on the surface by a rolling process or a press process is performed (S400), and the pattern replica 10 is completed (S500). A desired pattern 11 is formed on the surface of the pattern replica 10 manufactured according to the above process, and specifically, the pattern 11 may be nano size or micro size.

Next, with reference to Figure 3, a specific mold manufacturing process (S100) will be described. Each step of the specific mold fabrication process (S100) to be described later is merely exemplary, it is possible to manufacture the mold 20 by other methods in addition to the method described below. Method of manufacturing a mold 20 according to an embodiment of the present invention comprises the step of pre-processing the replica 30 (S110), the step of nanoimprinting the pre-processed replica 30 to the polymer sheet (S120), Metallizing the surface of the nanoimprinted polymer sheet (S130), manufacturing a raw mold by plating a metallized polymer sheet on the surface (S140), and plating the raw mold (S150) Include.

First, the step (S110) of preprocessing the object to be replicated (S110) includes a process of selecting and preprocessing the object to be replicated (30). As the object to be reproduced 30, all objects having a fine pattern or a specific pattern on the surface, such as artificial or natural objects, can be selected and used without particular limitation. However, due to the application of constant heat and pressure during pattern duplication, it is easily deformed by heat or pressure, so that the fine patterns or patterns are not damaged by heat or pressure, rather than Au, Pt, Ni, Metals such as Cu, Co, Pd, semiconductors such as Si, Ge, C, Ga, Sn, In, SiGe, GaAs, AlGaP, or natural or artificial leather, wood, synthetic fibers or artificial fabrics in which patterns or patterns are formed Preference is given to using fibers.

The specific pretreatment may vary depending on the selected replication target 30. First, in the case where the object to be duplicated 30 is metal, degreasing and washing are performed to remove dust or foreign matter on the metal surface. When degreasing, a metal degreasing agent is used to immerse degreasing at 25 ° C. to 50 ° C. for 10 minutes. In order to increase the degreasing effect, the degreasing agent is filtered and the pump is stirred. Meanwhile, after degreasing, three-stage spray washing is performed with pure water at room temperature (20 ° C. or higher) for 30 seconds, followed by drying for 5 minutes with hot air of 60 ° C. or higher.

When the object to be replicated 30 is leather, pretreatment is performed to facilitate peeling, and air is first washed with dry air to remove dust or foreign matter on the surface of the leather. After washing, the release agent is treated. As a release agent, a silicone release agent such as KF96-SPRAY Shin-Etsu Co., Ltd. is used, and the release agent is evenly sprayed on the leather surface to be applied to the entire surface of the leather. The silicone release agent is then left in the air for 5 minutes to penetrate the leather surface. After 5 minutes, the silicone release agent is evenly applied to the entire leather surface. After that, it is left in the air for 5 minutes to finish the pretreatment by infiltrating the silicone mold release agent.

On the other hand, when the object to be replicated 30 is a fiber is subjected to pre-treatment so as to be easily peeled, as in the case of the leather, first, the fiber product is washed and dried to remove dust or foreign matter on the surface of the fiber. Dry the textiles and iron them to make them wrinkled. If the wrinkles are not straightened, the wrinkles may be duplicated on the polymer sheet after imprinting. After ironing, each layer of the fiber may be pressed, resulting in poor pattern replication during imprinting. Therefore, pure water is sprayed to restore each ol to its original state. If left for 10 minutes after pure spray, each oar is restored to its original state. After the release agent treatment. As the release agent, a silicone release agent such as KF96-SPRAY Shin-Etsu Co., Ltd. is used, and the release agent is evenly sprayed on the fiber surface to be applied to the entire surface of the fiber. Leave in air for 2 minutes to allow the silicone release agent to penetrate the fiber surface. After that, the silicone release agent is evenly applied to the entire surface again. After that, it is left in the air for 5 minutes to let the silicone release agent soak in to finish the pretreatment.

Next, when the object to be replicated 30 is made of wood to facilitate the pre-treatment similar to the leather and fibers to facilitate peeling, first, the surface is air-washed with dry air to remove dust or foreign matter on the surface of the wood. After washing, the release agent is treated. As the release agent, a silicone release agent such as KF96-SPRAY Shin-Etsu Co., Ltd. is used, and the release agent is evenly sprayed on the wood surface to be applied to the entire surface of the wood. The silicone release agent is then left in the air for 10 minutes to seep into the wood surface. After 10 minutes, the silicone release agent is evenly applied to the entire wood surface. After that, it is left in the air for 10 minutes to let the silicone release agent soak in to finish the pretreatment.

Nano-imprinting the pre-processed replica 30 to the polymer sheet (S120) is a step of replicating the pattern 31 of the replica 30 to the polymer sheet.

The polymer may be acrylonitrile-butadiene-styrene (ABS) plastic, polyacetate, polysulfone, polycarbonate, polystyrene, polyamide, polypropylene, polyvinyloxide, polyvinylchloride, polyethylene-terephthalate, cellulose- Although acetate etc. can be used, A shape etc. are not specifically limited, It is preferable to use the polymer sheet which is preferably 2 mm or more and 5 mm or less in thickness.

In this step, a conventional nanoimprinting apparatus may be used, for example, the following process may be performed.

First, the Teflon sheet is placed on the bottom plate of the nanoimprinting apparatus, and then the replication object is placed on the Teflon sheet. After placing the polymer sheet on the replica, the top plate of the nanoimprinting apparatus is closed, and heat and pressure are applied to nanoimprint the micropattern or pattern on the surface of the replica to the polymer sheet.

The nanoimprinting process can be carried out at a pressure of 5 atm or more and 20 atm or less and a temperature of 50 ° C. or more and 150 ° C. or less. On the other hand, the nanoimprinting process may be made in two steps. In the first imprinting step, the initial pressure is set to 1 atm or more and 2 atm or less, preferably 1 atm, and the replication object and the polymer sheet are fixed so as not to be pushed, and then the temperature of the heating plate is heated to 50 ° C. or less. The second imprinting step is a step in which the pressure is set to 5 atm or more and 20 atm or less and heated to 50 ° C or more and 150 ° C or less within 1 hour or more and 4 hours or less. Next, the pressure is removed and cooled using a cooling water until the temperature of the heating plate becomes 25 ° C or lower. Then open the top of the nano imprinting apparatus and take out the object and the duplicate to separate.

Next, metallization of the surface of the nanoimprinted polymer sheet (S130) is a step of forming a metal layer on the surface of the sheet. In this step, after completion of nanoimprinting, the surface of the separated polymer sheet is etched using a surface etchant. Subsequently, after surface activation using a surface activator, a silver (Ag) solution and a reducing agent are sprayed to form a silver surface layer on the surface of the replica.

The etching process is a process of roughening or chemically modifying the surface of the polymer to facilitate adhesion between the silver surface layer formed on the surface of the polymer sheet and the polymer. Etching agents include inorganic acids such as hydrogen fluoride (HF), nitric acid (HNO 3), phosphoric acid, acetic acid (CH 3 COOH), oxalic acid, sulfuric acid, hydrogen peroxide, and the like; Chromic acid; Chromosulfuric acid; Acidic or alkaline permanganate solutions; And it may be selected from the group consisting of a mixed solution thereof. The etchant is sprayed on the replica surface of the polymer for 5-10 seconds. After etching, pure water is sprayed onto the polymer sheet for 5 to 10 seconds to wash.

Subsequently, an activator such as colloidal palladium, ionic palladium, silver colloid, partially soluble sulfide, and polysulfide is sprayed on the etched polymer for 5 to 10 seconds to activate the surface of the polymer, and then 5 to 10 pure water is used. Spray by cleaning for a second.

The silver solution and the reducing agent are sequentially sprayed onto the surface-activated polymer for 5 to 10 seconds to form a silver surface layer on the surface of the replica surface of the polymer.

In this case, the silver solution may be prepared by dissolving silver nitrate in ultrapure water as a solvent, and the reducing agent may be sodium hypophosphite, dimethylamino borate, hydrazine, hydrazine hydrate, hydroxylammonium sulfate, sulfite or formate, and the like. Can be used.

Pure water is sprayed on the polymer sheet on which the silver surface layer is formed for 5 to 10 seconds to wash and dry the surface. This drying step can be performed in 55 minutes or more and 60 degrees C or less in 10 minutes or more and 15 minutes or less.

Next, the step of preparing the raw mold by plating the polymer sheet metallized surface (S140) is a step of manufacturing the raw mold by plating the polymer sheet of the metal surface.

First, the polymer sheet on which the silver surface layer is formed is attached to a brass plate which is well energized. At this time, the silver surface layer of the polymer sheet and the brass plate may be connected to each other using copper tape so that the current flows well. Next, the part which does not need to plate is masked using masking tape. The brass plate with the polymer sheet is degreased with a metal degreasing agent such as caustic soda, sodium carbonate, sodium silicate and alkaline salt of sodium phosphate and then washed with pure water. Next, the polymer sheet on which the silver surface layer is formed is placed in an electrolytic plating bath and subjected to electroplating. Electrolytic plating can be performed until the metal plating layer formed becomes 500 micrometers or more and 1000 micrometers or less which is the thickness which can be used as a raw mold.

When the electroplating is completed, the plated brass plate is taken out of the plating bath, washed with pure water and dried. In addition, the replica surface of a polymer sheet and a plating layer are isolate | separated, and the separated plating layer is used as a raw mold of a flat rolling mold. In this case, the plating bath may be appropriately selected and used depending on the type of plating metal to be formed, and specifically, an acidic copper bath or a nickel bath may be used.

Finally, the step (S150) of plating the raw mold is a step of manufacturing the final mold 20 by plating the raw mold. In this step, electrolytic plating or electroless plating can be performed.

Looking at the case of electroplating first, in this step, as a pretreatment for manufacturing the mold 20, a part of the edge of the raw mold is cut off and attached to the brass plate. At this time, the raw mold and the brass plate are connected by using copper tape so that the electricity is better. The parts that do not need to be plated are masked with masking tape, and the raw mold surface is degreased with a metal degreaser and washed with pure water. As an optional process after washing, the raw mold may be immersed in a release agent to form a release layer on the surface of the raw mold so that the raw mold and the plating layer are easily separated. After forming the release layer, the raw mold is washed with pure water and dried. As the release agent, the same ones as described above can be used. Next, the raw mold in which the mold release layer was formed is put into an electrolytic plating tank, and electrolytic plating is performed. Electrolytic plating is performed until the metal plating layer becomes 200 micrometers or more and 500 micrometers or less which is the thickness which can be used for the mold 20. FIG. When the plating is completed, the plated raw mold is taken out of the plating bath, washed with pure water, and the raw mold and the plating layer are separated. A separate metal plating layer is provided to the completed mold 20.

As another method for manufacturing the mold 20 in this step, there is a method of additionally performing electroless plating after electrolytic plating. First, a part of the edge of the raw mold is cut out and attached to the brass plate using copper tape, and then the portion that does not need to be plated is masked using masking tape. After masking, the surface of the raw mold is degreased with a metal degreasing agent, for example, an all-metal alkali degreasing agent 1090 manufactured by Shin Pung Metal Co., Ltd. A release layer is formed on the surface. After forming the release layer, it is washed with pure water, the raw mold is placed in an electrolytic plating bath, and connected to a power source to thinly, for example, electroplated to a thickness of 1 μm or more and 2 μm or less. In this case, the plating bath is a nickel sulfamate plating bath, which contains nickel sulfamate 320g / L or more and 480g / L, nickel chloride 0.5g / L or more and 3g / L or less, boric acid 35g / L or more and 60g / L or less It may be 3.5 or more and 4.5 or less. Next, the raw mold is taken out of the plating bath, washed with pure water and placed in an electroless plating bath to perform electroless plating. Electroless plating is performed for a long time until it becomes a thickness which can be used as a mold, for example, 200 micrometers or more and 500 micrometers or less. After electroless plating is completed, the raw mold is removed from the plating bath and washed with pure water. After washing, the raw mold and the finally completed mold 20 are separated. After separation, the raw mold and the completed mold 20 are washed with pure water and dried. The dried mold 20 can be used as a replica mold.

The electroless plating bath used here uses YSH-3000 series from Yushin Technopia, and YSH-3000 series is YSH-3000M (dry bath), YSH-3000A (Ni bath) and replenishment solution, and YSH-3000B (reducing agent supply). It may be composed of YSH-3000C, a pH adjuster. To dry 1 liter of electroless plating bath, 200 ml of dry bath YSH-3000M and 50 ml of Ni dry bath and replenishment YSH-3000A are added to 500 ml of pure water to make 1 liter of pure water. At this time, the Ni concentration of the electroless plating bath is 5.0 g / L. Use sulfuric acid or caustic soda to adjust the pH to 4.5 and plate while maintaining the temperature at 90 ° C. In this case, the plating rate is about 10-12 μm / hr, and the hardness of the resulting plated layer is about 500 Hv (micro Vickers hardness) and about twice the electroplating hardness (about 200-250 Hv).

Therefore, the replica mold made of electroless plating is harder than the mold made of electrolytic plating, so the deformation rate is small and the service life is long when rolling. The plating bath temperature can be maintained above 85 ° C and below 95 ° C. If the plating bath temperature is 85 ° C. or lower, there is a problem that the plating rate drops to about 5 to 7 μm / hr and productivity is lowered. If the plating bath temperature is 95 ℃ or more, the plating speed is increased to about 15 ~ 17㎛ / hr, but the plating bath is not stable, so the plating is not possible for a long time.

The pH can be maintained above 4.0 and below 5.0. If the pH is 4.0 or less, the plating rate decreases to 6-8 μm / hr, and the productivity decreases. If the pH is 5.0 or more, the plating rate greatly increases to 18-20 μm / hr. Symptoms may occur. Furthermore, there is a problem that plating cannot be performed for a long time. Therefore, the above numerical range must be maintained. For example, electroless plating at a pH of 4.5 and a plating bath temperature of 90 ° C. can produce a mold 20 having a lower strain rate and a longer life than that produced by electrolytic plating.

Referring to FIG. 2 again, the mold 20 manufactured as described above is pressed on the workpiece to transfer the pattern to complete the pattern replica 10. As such, the pattern 11 of the pattern replica 10 in which the pattern 21 of the mold 20 is replicated may be defined as surface roughness, replication rate, and light reflectance. First, the surface roughness is a numerical value representing the degree of unevenness of the surface of the test object, and is represented by a center line average roughness Ra and a ten-point average roughness Rz.

First, as shown in FIG. 4, the center line average roughness Ra corresponds to the xy coordinate of the cross section of the test object to set the concave-convex direction (thickness direction) of the test object to the y-axis, and in any length section L. The surface roughness curve f (x) corresponding to the uneven shape of the surface of is shown. A curve graph is shown, which arbitrarily determines the centerline (y = 0) of the surface roughness curve f (x) and then curves up and down relative to the centerline. In order to find the area of the curve and the center line, the absolute value of the surface roughness curve is integrated from 0 to L and the integral is divided by L to find the average value. The average value thus obtained corresponds to the center line average roughness Ra.

As shown in FIG. 5, the ten-point average roughness Rz corresponds to the xy coordinate of the cross section of the test object to set the concave-convex direction (thickness direction) of the test object to the y-axis and the surface in an arbitrary length section L. The surface roughness curve g (x) corresponding to the concave-convex shape of is shown. Unlike the graph of FIG. 4, the centerline at y = 0 is the bottom of the test object. Therefore, a graph in which the cross section of the test object is directly corresponded to the xy coordinate is used. The average height of the graph is obtained to show the average line, and the average value (S) of the distance between the average line of the five highest coordinates and the average value of the distance between the average line of the five lowest coordinates among the coordinates lower than the average line (V). The sum is obtained to obtain the ten-point average roughness Rz.

The center line average roughness Ra and the ten point average roughness Rz are calculated as average values of the measured values after repeatedly performing in different areas of the test object. Such surface roughness can be easily measured through a commercially available surface roughness measuring device.

The replication rate is a numerical value indicating how much the pattern 21 of the mold 20 has been replicated in the pattern replica 10, and the ten-point average roughness Rz of the mold 20 and the ten-point average roughness Rz of the pattern replica 10. It is expressed as a percentage of). That is, when the pattern 21 of the mold 20 is perfectly replicated, since the ten point average roughness Rz of the pattern replica 10 and the ten point average roughness Rz of the mold 20 will be the same, the replication rate is 100%. Indicates.

The light reflection amount is an optical characteristic measured using a photonometer, and the light reflection amount is expressed by quantifying a result of measuring the degree of gloss of the test object. Specifically, the light is irradiated to the test object to measure the intensity reflected by the irradiation at this time when the light irradiation while changing the angle from -90 ° to 90 °. Therefore, the intensity of light reflected from each angle can be measured and a light reflection distribution graph as shown in FIG. 6 can be obtained. The intensity of the reflected light is expressed as a relative ratio to maximum reflection. This distribution can be summed to derive the total amount of light reflection. 6, the light reflection distribution can be roughly understood. Specifically, when the graph area is wide and large, the reflection is uniform, which means that the gloss value is large. In addition, it can be understood that the light reflection distribution graph of the pattern to be duplicated and the light reflection distribution graph of the duplicated pattern replica show similar glossiness.

Hereinafter, the physical properties defining the pattern replica 10 according to the embodiments of the present invention will be described based on specific experimental examples and experimental results. As described above, the mold 20 may be manufactured in the form of a flat plate or a roll. Hereinafter, a method of forming a pattern by a rolling process by manufacturing a roll for convenience of description will be described.

A mold 20 produced by replicating a pattern, for example, a silk pattern, of a desired object to be replicated is prepared. The width of the produced rolling mold 20 is about 150 mm, and the thickness of the rolling mold 20 is 300 µm. As shown in Table 1 below, the rolling material to be the pattern replica 10 is made of aluminum, but different types of aluminum are prepared according to Experimental Examples 1 to 7.

That is, in Experimental Example 1, Al 5052 having a thickness of 800 µm was used as the pattern replica 10, and in Experimental Examples 2 to 4, Al 3003 was used, but the thicknesses were varied from 400 µm, 560 µm, and 700 µm. In Experimental Example 5, Al 1050 having a thickness of 500 µm was used, Al 8079 having a thickness of 700 µm was used in Experimental Example 6, and Al 1235 having a thickness of 800 µm was used in Experimental Example 7.

Experimental Example 1 Experimental Example 2 Experimental Example 3 Experimental Example 4 Experimental Example 5 Experimental Example 6 Experimental Example 7 Al class 5052 3003 3003 3003 1050 8079 1235 Al thickness 800㎛ 400 μm 560 ㎛ 700 ㎛ 500 탆 700 ㎛ 800㎛ Al hardness 63.40 Hv 38.90Hv 39.20Hv 41.70Hv 33.50Hv 24.80Hv 23.40Hv Rolling pressure 2.56t 2.15t 2.27t 3.2t 2.7t 3.05t 2.85t Rz measurement 19.08 21.88 22.96 26.00 26.78 29.19 35.60 Replication rate 41.52% 47.64% 49.98% 56.58% 58.29% 63.53% 77.47% Light reflectance 15597 16859 14638 20660 18649 24981 22994

When performing the rolling process, the width of the mold and the rolled material should match, so that the mold 20 or the aluminum sheet is cut so that the width of the mold 20 and the aluminum sheet used in Experimental Examples 1 to 7 match.

Next, as shown in Figure 7, after matching the width, the rolling material is inserted between the rolling roll 100 and the width of the upper and lower rolls (110, 120) is adjusted. The method for adjusting the width is set to the gap of the rolling roll 100 to a value of 50% or less of the sum of the total thickness of the rolling mold 20 and the rolling material 10, and the gap is determined in consideration of the hardness of the rolling material. Can be modified. For example, in Experimental Example 1, the thickness of the rolled material is 800 µm, the thickness of the mold is 300 µm, and thus the total thickness is 1100 µm. Therefore, 440 µm, which is 40% of this value, is determined as the gap between the rolling rolls 100. Then, the screw (not shown) of the rolling roll 100 is rotated so that the gap between the lower roll 120 and the upper roll 110 in which the rolling mold 20 is interposed is 440 μm. When the gap between the rolling rolls 100 is 50% or more of the total thickness, the pattern replication rate is lowered because it is not sufficiently pressurized.

When the gap setting of the rolling roll 100 is completed, the rolling material is inserted between the rolling mold 20 and the lower roll 120. The rolling roll 100 is driven by power and the linear speed at which the rolled sheet is rolled is adjusted to 90 cm / min or the RPM per minute of the rolling mold 20 to 250. The rolling speed can be adjusted according to the material and the replication pattern. As the rolling roll 100 is driven, fine patterns and three-dimensional patterns of silk fibers are continuously formed on the rolling plate 10. At this time, the rolling force applied between the roll 100 and the rolled sheet 10 is different depending on the gap between the roll roll 100, the rolled sheet 10 and the rolled mold 20, but the general rolling process about 1 to 10 tons Lower than Subsequently, the rolled sheet material which was bent at the time of rolling while passing through the flattening roll is flattened. When the planarization is completed, a flat pattern replica 10 in which the micropattern and the three-dimensional pattern of the rolled mold are formed may be obtained.

The actual photograph of the pattern replica 10 thus obtained is shown in FIGS. 8 to 10. FIG. 8 shows a pattern replica 10 in which a surface pattern 31 of wood, which is a replica 30, is duplicated, and FIG. 9 shows a pattern replica 10 in which a surface pattern 31 of leather, a replica 30, is replicated. 10 shows a pattern replica 10 in which a surface pattern 31 of silk, which is a replica 30, is replicated. The same texture and gloss as the object to be replicated 30 is realized by the pattern 11 of the nano or micro unit formed on the pattern replica 10 of FIGS. 8 to 10, thereby providing a pattern value metal panel with high added value and high utilization. Can be.

The ten-point average roughness Rz of the pattern replica 10 obtained under the conditions of Experimental Examples 1 to 7 has a value ranging from 19.08 to 35.60. In particular, the ten point average roughness value was measured in Experimental Example 7, it is determined that the hardness of Al 1235 is lower than the hardness of the aluminum used in the other experiments. The pattern replication rate is a percentage of the ten-point average roughness of the pattern 21 of the mold 20, and when the replication rate is 100%, the mold pattern 21 is completely replicated in the pattern replica 10. Since the ten point average roughness of the mold pattern 21 used in Experimental Examples 1 to 7 was 45.95, the replication rate was calculated based on this and it was found to have a range between 41.52% and 77.47%.

Meanwhile, the light reflection amounts of Experimental Examples 1 to 7 range from 14638 to 24981. The light reflection amount of the silk fabric, which is the target of the present experimental examples, has a light reflection amount of 40000 or more as shown in Table 2 below.

Kinds Overall fabric average Fabric Fabric Light reflectance 46,160 49,990 40,668

The pattern replica 10 has a light reflection amount of 31.7% to 54.1% compared to the light reflection amount of the replication object 30. As described above, the light reflection amount is an objective quantification of the inherent gloss of the pattern 31 of the actual object to be reproduced. As a result, the amount of light reflection lost is compensated so that the gloss of the actual replica 30 can be reproduced on the surface of the pattern replica 10 equally or more.

Next, as shown in Table 3 below, looks at the experimental example when the rolling material to be the pattern replica 10 is magnesium. In the case of magnesium, AZ31B-O was used, and the thickness was tested with two types of 1000 μm and 2000 μm.

Experimental Example 8 Experimental Example 9 Experimental Example 10 Experimental Example 11 Mg thickness 1000 ㎛ 1000 ㎛ 1000 ㎛ 2000 탆 Rolling gap 40% 30% 20% 40% Rolling pressure 2.8t 3.4t 3.9 t 4.9t Ra measurement 4.06 4.33 4.80 4.59 Rz measurement 17.31 18.85 19.97 19.43 Replication rate (Rz) 61.4% 66.8% 70.8% 68.9% Light reflectance 40394 44188 42907 40300

The thickness of the mold 20 used in Experimental Examples 8 to 11 is 400 μm, and the rolling gap represents the ratio of the rolling gap to the total thickness of the sum of the thickness of the mold 20 and the thickness of the rolling material as described above. . For example, in Example 8, the thickness of the magnesium panel is 1000 μm, and the thickness of the mold is 400 μm, so that the total thickness is 1400 μm and 40% thereof. Thus, the gap between the rolling rolls 100 in Example 8 is set to 560 μm. do. As can be seen in Table 3, as the rolling gap becomes narrower than the total thickness, it can be seen that the rolling pressure applied to the rolling material increases.

In Experimental Examples 8 to 10, the range of the centerline average roughness Ra is 4.06 to 4.80, and the range of the ten-point average roughness Rz is 17.31 to 19.97.

That is, generally, the narrower the gap between the rolling rolls 100, the higher the rolling pressure, and thus, the values of the ten-point average roughness and the centerline average roughness also increase in proportion to this, and thus, the replication rate is improved. However, when the gap between the rolling rolls 100 is narrowed, the pressure applied to the rolling rolls 100 is greatly increased, thereby increasing the energy input to maintain the pressure, thereby increasing the production cost. Since the pattern replica 10 may be damaged when the external force exceeds the threshold value, it is desirable to set the appropriate gap between the roll roll 100 in consideration of the hardness of the rolled material within the range in which the pattern of the pattern replica 10 exhibits the desired gloss. desirable.

As shown in FIGS. 8 to 10, the pattern replica metal panel 10 having such characteristics has a high value-added value and high utilization by forming a desired pattern on the surface, specifically, a nano-sized or micro-sized pattern. Since it can be replicated repeatedly by using, there is an advantage that can produce a large number of copies at a low cost. In addition, since the pattern of the object to be replicated 30 can be replicated with high precision, sophisticated pattern reproduction is possible.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

10: Pattern Replica Metal Panel
11: Pattern of Pattern Replica Metal Panel
20: Mold
21: pattern of mold
30: replication target
31: pattern of the object to be replicated

Claims (8)

A metal panel comprising a fine pattern or pattern on the surface,
Ten-point average roughness (Rz) of the fine pattern or pattern of the surface is 10㎛ to 40㎛,
The fine pattern or pattern of the metal panel is formed by duplicating the fine pattern or pattern formed on the surface of the mold,
The ten point average roughness (Rz) in the fine pattern or pattern of the metal panel is 40% or more of the ten point average roughness (Rz) in the fine pattern or pattern of the mold. A metal panel comprising a fine pattern or pattern on the surface,
The center line average roughness Ra of the fine pattern or pattern on the surface is 3 μm to 8 μm,
The fine pattern or pattern of the metal panel is formed by duplicating the fine pattern or pattern formed on the surface of the mold,
The center line average roughness (Ra) in the fine pattern or pattern of the metal panel is 40% or more of the center line average roughness (Ra) in the fine pattern or pattern of the mold. A metal panel having fine patterns or patterns formed on the surface thereof with curved irregularities.
Ten-point average roughness (Rz) of the fine pattern or pattern of the surface is 10㎛ to 40㎛,
The center line average roughness Ra of the fine pattern or pattern on the surface is 3 μm to 8 μm,
The fine pattern or pattern of the metal panel is formed by duplicating the fine pattern or pattern formed on the surface of the mold,
The ten point average roughness (Rz) in the fine pattern or pattern of the metal panel is 40% or more of the ten point average roughness (Rz) in the fine pattern or pattern of the mold. 4. The method according to any one of claims 1 to 3,
The metal panel having a light reflection amount in the fine pattern or pattern of the surface between 10000 and 45000. 4. The method according to any one of claims 1 to 3,
The metal panel is one or more metals or alloys thereof selected from the group consisting of magnesium or aluminum. 4. The method according to any one of claims 1 to 3,
The fine pattern or pattern of the surface is a metal panel having a fine concave-convex shape of the intaglio and embossed. delete delete

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