KR101246278B1 - Synthetic method of iminodiacetic acid - Google Patents

Synthetic method of iminodiacetic acid Download PDF

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KR101246278B1
KR101246278B1 KR1020120103413A KR20120103413A KR101246278B1 KR 101246278 B1 KR101246278 B1 KR 101246278B1 KR 1020120103413 A KR1020120103413 A KR 1020120103413A KR 20120103413 A KR20120103413 A KR 20120103413A KR 101246278 B1 KR101246278 B1 KR 101246278B1
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acid
weight
parts
iminodiacetic acid
acetic acid
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이상율
김삼수
김경환
김경철
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주식회사 천보
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C227/00Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C227/38Separation; Purification; Stabilisation; Use of additives
    • C07C227/40Separation; Purification
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C227/00Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C227/14Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton from compounds containing already amino and carboxyl groups or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/02Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C229/04Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C229/24Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having more than one carboxyl group bound to the carbon skeleton, e.g. aspartic acid

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Abstract

PURPOSE: A synthetic method of iminodiacetic acid is provided to improve the yield of iminodiacetic acid, and to minimize the generation of waste water and by-products in the synthetic process of iminodiacetic acid. CONSTITUTION: A synthetic method of iminodiacetic acid comprises a step of dropping 37%(w/w) formaldehyde into the mixture of H2O and glycine, and obtaining 2-(hydroxymethyl amino)acetic acid; a step of adding a sulfite and sodium cyanide into the 2-(hydroxymethyl amino)acetic acid in order, and obtaining 2-(cyanomethyl amino)acetic acid; a step of adding H2O and sulfuric acid into the 2-(cyanomethyl amino)acetic acid, and stirring the mixture to obtain iminodiacetic acid; and a step of purifying the iminodiacetic acid by methanol.

Description

이미노디아세트산의 합성방법{Synthetic Method of Iminodiacetic acid}Synthetic Method of Iminodiacetic Acid

본 발명은 이미노디아세트산의 합성방법에 관한 것으로서, 보다 상세하게는 LCD Etchant 에칭 첨가제인 이미노디아세트산의 합성 공정에서, 폐수 및 부생성물의 발생을 억제하고 수율을 향상시킬 수 있는 이미노디아세트산의 합성방법에 관한 것이다.
The present invention relates to a method for synthesizing iminodiacetic acid, and more particularly, in the synthesis process of iminodiacetic acid, which is an LCD etchant etching additive, synthesis of iminodiacetic acid which can suppress the generation of wastewater and by-products and improve the yield. It is about a method.

반도체 장치에서 기판상에 금속배선을 형성하기 위해서는 일반적으로 스퍼터링 등에 의한 금속막 형성공정, 상기 금속막 상에 소정의 패턴을 가진 포토레지스트 형성공정 및 상기 포토레지스트를 접촉 마스크로 하여 식각을 수행하는 에칭공정으로 이루어지는 바, 이 중 에칭 공정은 플라즈마 등을 이용한 건식식각이나, 식각용액을 이용하는 습식식각에 의해 수행된다. 건식식각의 경우, 고 진공을 요하는 등 식각 조건이 까다롭고 비용이 많이 소요되므로, 적절한 식각액이 존재하는 경우 습식 식각이 보다 유리하다.In order to form a metal wiring on a substrate in a semiconductor device, a metal film forming process by sputtering or the like, a photoresist forming process having a predetermined pattern on the metal film, and an etching process for etching using the photoresist as a contact mask The etching process is performed by dry etching using plasma or wet etching using an etching solution. In the case of dry etching, since etching conditions are difficult and expensive, such as requiring a high vacuum, wet etching is more advantageous when an appropriate etching solution is present.

한편, TFT-LCD 장치에서 금속배선막의 저항은 RC 신호지연을 유발하는 주요한 인자로서, 저저항의 금속 배선막 수득은 패널 크기 증가와 고해상도 구현에 관건이 되고 있다. 따라서, 종래 기술상 금속배선막의 재료로 사용되는 크롬, 몰리브데늄, 알루미늄니오디움 및 이들의 합금으 저항이 높아 대형 TFT-LCD에 사용되는 게이트 및 데이터 배선 등으로 이용하기에 바람직하지 않은 것으로 생각되어지고 있다.On the other hand, the resistance of the metallization film in the TFT-LCD device is a major factor causing the RC signal delay, and obtaining a low resistance metallization film is a key to increasing the panel size and high resolution. Therefore, in the prior art, chromium, molybdenum, aluminum nidium, and alloys thereof, which are used as materials for metal wiring films, have high resistance, and thus, they are not suitable for use as gates and data wirings used in large-sized TFT-LCDs. ought.

이와 관련하여, 알루미늄 또는 크롬 보다 저항이 현저하게 낮고 환경적으로 큰 문제가 없는 구리 금속이 저저항 배선막 재료로서 주목을 받고 있으나, 구리의 경우 그 금속막 위에 포토레지스트를 도포하여 패터닝하는 공정에 많은 어려운 점, 예를 들어, 유리기판 및 실리콘 절연막과의 접착력이 나빠지는 등의 문제가 있다. 이러한 문제를 해결하기 위해 구리를 단독으로 사용하기 보다는, 구리막과 하부 유리기판 또는 실리콘 절연막과의 접착력을 증대시키고 실리콘 막으로의 구리의 확산을 억제하기 위하여 중간 금속막을 함께 사용하는 기술이 제안되었는바, 이러한 중간 금속막으로는 티타늄, 몰리브데늄 또는 몰리브데늄 합금 등을 들 수 있다.In this regard, copper metals, which are significantly lower in resistance than aluminum or chromium and have no environmental problems, are attracting attention as low-resistance wiring film materials. However, in the case of copper, photoresist is applied to the metal film by patterning. There are many problems such as poor adhesion to the glass substrate and the silicon insulating film. Rather than using copper alone to solve this problem, a technique of using an intermediate metal film together to increase the adhesion between the copper film and the lower glass substrate or the silicon insulating film and to suppress the diffusion of copper into the silicon film has been proposed. The intermediate metal film may include titanium, molybdenum or molybdenum alloy.

금속 배선 중 구리에 대한 식각은 주로 염화제이철+염산, 과산화이황산암모늄과 같은 식각용액을 사용하여 이루어지고 있다. 이들 식각용액 대부분은 식각 속도가 빠르나 식각용액 조성물이 불안정하여 분해되기 쉬우며 구리 식각에 대한 선택성이 떨어져 티타늄, 몰리브덴 또는 몰리브덴 함금 등 식각액에 노출되는 다른 금속 막을 손상시키는 단점이 있다. 따라서 구리막에 대한 식각을 가지면서도 티타늄, 몰리브덴 또는 몰리브덴 합금 등의 다른 금속 막을 손상시키지 않는 고선택성 구리 식각용액 개발이 요구되는 실정이다.The etching of copper in the metal wiring is mainly performed using an etching solution such as ferric chloride + hydrochloric acid and ammonium persulfate. Most of these etching solutions have a high etching rate, but the etching solution composition is unstable and easily decomposed, and thus, the selectivity to copper etching is poor, thereby damaging other metal films exposed to the etching solution such as titanium, molybdenum, or molybdenum alloy. Therefore, there is a need to develop a highly selective copper etching solution that does not damage other metal films such as titanium, molybdenum, or molybdenum alloy while having an etching on the copper film.

대한민국공개특허공보 제10-2010-0040352호(2010.01.20.)에는 과산화수소수, 인산, 인산염, 킬레이트제, 고리형 아민 화합물, 물을 포함하는 고선택비를 갖는 구리 식각액이 제안되어 있고, 상기 킬레이트제로 이미노디아세트산을 사용하고 있다.Korean Patent Application Publication No. 10-2010-0040352 (2010.01.20.) Proposes a copper etchant having a high selectivity including hydrogen peroxide, phosphoric acid, phosphate, chelating agent, cyclic amine compound, and water. Iminodiacetic acid is used as a chelating agent.

한편, 미국등록특허 제7,064,235호(2006.06.20.)에는 이미노디아세트산을 합성하는 방법이 개시되어 있다.On the other hand, US Patent No. 7,064,235 (2006.06.20.) Discloses a method for synthesizing imino diacetic acid.

상기 합성방법은 이미노디아세트산을 낮은 비용으로 제조할 수 있고 순도가 높은 장점이 있지만, 합성 공정에서 폐수 및 부생성물이 발생되며 수율이 높지 않은 문제가 있다.
The synthesis method has the advantage of being able to produce imino diacetic acid at a low cost and high purity, but waste water and by-products are generated in the synthesis process, there is a problem that the yield is not high.

이에, 본 발명자들은 폐수 및 부생성물의 발생을 억제하고 수율을 향상시킬 수 있는 이미노디아세트산(Iminodiacetic acid)의 합성방법을 개발하였다.
Accordingly, the present inventors have developed a method for synthesizing iminodiacetic acid which can suppress the generation of wastewater and by-products and improve the yield.

KR 10-2010-0040352 A 2010.01.20.KR 10-2010-0040352 A 2010.01.20. US 7,064,235 B2 2006.06.20.US 7,064,235 B2 2006.06.20.

본 발명의 목적은 폐수 및 부생성물의 발생을 억제하고 수율을 향상시킬 수 있는 이미노디아세트산(Iminodiacetic acid)의 합성방법을 제공하는 것이다.
It is an object of the present invention to provide a method for synthesizing iminodiacetic acid which can suppress the generation of waste water and by-products and improve the yield.

상기 목적을 달성하기 위하여 본 발명은 다음과 같은 수단을 제공한다.In order to achieve the above object, the present invention provides the following means.

본 발명은 H2O 100중량부에 글리신(Glycine) 60~65중량부를 첨가하고 10분 동안 교반시킨 후, 37%(w/w) 포름알데하이드(Formaldehyde) 70~75중량부를 적하하고 60℃에서 1시간 동안 반응시켜 2-(hydroxymethylamino)acetic acid를 수득하는 단계(단계 1); 상기 2-(hydroxymethylamino)acetic acid 100중량부에 황산(H2SO4) 15~20중량부를 첨가하여 교반시킨 후에, 시안화나트륨(Sodium cyanide) 20~25중량부를 적하하고 50℃에서 1시간 동안 반응시켜 2-(cyanomethylamino)acetic acid를 수득하는 단계(단계 2); 상기 2-(cyanomethylamino)acetic acid 100중량부에 H2O 85~90중량부 및 황산(H2SO4) 10~15중량부를 첨가한 후, 40℃에서 5시간 동안 교반하여 Iminodiacetic acid를 수득하는 단계(단계 3); 및 상기 Iminodiacetic acid 100중량부에 1~5℃의 메탄올 2~7중량부를 투입하여 정제하는 단계(단계 4); 를 포함하는 것을 특징으로 하는 이미노디아세트산(Iminodiacetic acid)의 합성방법을 제공한다.In the present invention, 60 to 65 parts by weight of glycine (Glycine) is added to 100 parts by weight of H 2 O, followed by stirring for 10 minutes, and then 70 to 75 parts by weight of 37% (w / w) formaldehyde is added dropwise at 60 ° C. Reacting for 1 hour to obtain 2- (hydroxymethylamino) acetic acid (step 1); After stirring by adding 15-20 parts by weight of sulfuric acid (H 2 SO 4 ) to 100 parts by weight of 2- (hydroxymethylamino) acetic acid, 20-25 parts by weight of sodium cyanide was added dropwise and reacted at 50 ° C. for 1 hour. To obtain 2- (cyanomethylamino) acetic acid (step 2); After adding 85 to 90 parts by weight of H 2 O and 10 to 15 parts by weight of sulfuric acid (H 2 SO 4 ) to 100 parts by weight of 2- (cyanomethylamino) acetic acid, the mixture was stirred at 40 ° C. for 5 hours to obtain Iminodiacetic acid. Step (step 3); And purifying by adding 2-7 parts by weight of methanol at 1-5 ° C. to 100 parts by weight of the Iminodiacetic acid (step 4); It provides a method for synthesizing iminodiacetic acid (Iminodiacetic acid) comprising a.

상기 단계 1에서, 상기 37%(w/w) 포름알데하이드(Formaldehyde)는 N2 Purge 하에 25℃에서 30분 동안 적하하는 것을 특징으로 한다.In step 1, the 37% (w / w) formaldehyde (Formaldehyde) is characterized in that dropping for 30 minutes at 25 ℃ under N 2 Purge.

상기 단계 2에서, 상기 2-(hydroxymethylamino)acetic acid를 20℃로 냉각 후 황산(H2SO4)을 첨가하여 pH를 4~5로 맞추고 실온에서 10분 동안 교반시킨 후에, 시안화나트륨(Sodium cyanide)을 10~25℃에서 적하시키는 것을 특징으로 한다.In step 2, the 2- (hydroxymethylamino) acetic acid was cooled to 20 ° C., followed by addition of sulfuric acid (H 2 SO 4 ) to adjust the pH to 4-5, and stirred at room temperature for 10 minutes, followed by sodium cyanide. ) Is added dropwise at 10 ~ 25 ℃.

상기 단계 3에서, H2O에 황산(H2SO4)을 30분 동안 반응시킨 후, 상기 2-(cyanomethylamino)acetic acid에 20℃에서 적하시켜 pH를 1~2.5로 맞추는 것을 특징으로 한다.
In step 3, sulfuric acid (H 2 SO 4 ) is reacted with H 2 O for 30 minutes, and then dropwise added to the 2- (cyanomethylamino) acetic acid at 20 ℃ to adjust the pH to 1 ~ 2.5.

본 발명에 따른 이미노디아세트산(Iminodiacetic acid)의 합성방법은 수율 97.6% 및 순도 99.95%의 이미노디아세트산을 합성할 수 있는 장점이 있으며, 폐수 및 부생성물의 발생을 억제할 수 있는 효과가 있다.
The method for synthesizing iminodiacetic acid according to the present invention has the advantage of synthesizing the imino diacetic acid with a yield of 97.6% and a purity of 99.95%, and has the effect of suppressing the generation of wastewater and by-products.

도 1 및 본 발명에 따른 합성 반응의 메카니즘을 설명하는 화학반응식.
도 2는 본 발명의 합성방법으로 합성된 이미노디아세트산(Iminodiacetic acid)의 LC 분석 결과.
도 3은 이미노디아세트산(Iminodiacetic acid) - reference 의 IR 분석 결과.
도 4는 본 발명의 합성방법으로 합성된 이미노디아세트산(Iminodiacetic acid)의 IR 분석 결과.
도 5는 이미노디아세트산(Iminodiacetic acid) - STD 의 Proton NMR 분석 결과.
도 6은 본 발명의 합성방법으로 합성된 이미노디아세트산(Iminodiacetic acid)의 Proton NMR 분석 결과.
1 and a chemical scheme illustrating the mechanism of the synthesis reaction according to the present invention.
Figure 2 is an LC analysis of the iminodiacetic acid synthesized by the synthesis method of the present invention.
Figure 3 shows the IR analysis of iminodiacetic acid-reference.
Figure 4 is an IR analysis of the iminodiacetic acid synthesized by the synthesis method of the present invention.
5 is Proton NMR analysis of iminodiacetic acid-STD.
6 is a result of Proton NMR analysis of iminodiacetic acid synthesized by the synthesis method of the present invention.

이하, 본 발명을 상세히 설명하면 다음과 같다.
Hereinafter, the present invention will be described in detail.

이미노디아세트산(Iminodiacetic acid)은 반도체 및 TFT-LCD 분야에서 Etchant의 주원료인 과산수소수, 인산, 질산 등의 각 첨가제 간의 화학적 안정으로 에칭능력을 안정적으로 유지시킬 수 있으므로, 식각 효과를 높이기 위해 에칭 첨가제로 사용되고 있다.
Iminodiacetic acid can be etched to increase the etching effect because it can maintain the etching ability by chemical stability between each additive such as hydrogen peroxide, phosphoric acid and nitric acid, which are the main raw materials of Etchant, in semiconductor and TFT-LCD fields. It is used as an additive.

종래 합성방법으로 제조된 이미노디아세트산은 폐수 및 부생성물이 발생되며 수율이 높지 않은 단점이 있다.
Iminodiacetic acid prepared by the conventional synthetic method is a waste water and by-products are generated and has a disadvantage that the yield is not high.

본 발명에서는 폐수 및 부생성물의 발생을 억제하고 수율을 향상시킬 수 있는 이미노디아세트산(Iminodiacetic acid)의 합성방법을 제공함에 특징이 있다.
The present invention is characterized by providing a method for synthesizing iminodiacetic acid which can suppress the generation of waste water and by-products and improve the yield.

도 1은 본 발명에 따른 합성 반응의 메카니즘을 설명하는 화학반응식이다.
Figure 1 is a chemical reaction illustrating the mechanism of the synthesis reaction according to the present invention.

도 1을 참조하여, 본 발명에 따른 이미노디아세트산(Iminodiacetic acid)의 합성방법을 설명한다.
Referring to Figure 1, a method for synthesizing iminodiacetic acid according to the present invention will be described.

본 발명의 이미노디아세트산(Iminodiacetic acid)의 합성방법은,Synthesis method of iminodiacetic acid of the present invention,

H2O 100중량부에 글리신(Glycine) 60~65중량부를 첨가하고 10분 동안 교반시킨 후, 37%(w/w) 포름알데하이드(Formaldehyde) 70~75중량부를 적하하고 60℃에서 1시간 동안 반응시켜 2-(hydroxymethylamino)acetic acid를 수득하는 단계(단계 1);60 to 65 parts by weight of glycine (Glycine) was added to 100 parts by weight of H 2 O, followed by stirring for 10 minutes. Then, 70 to 75 parts by weight of 37% (w / w) formaldehyde was added dropwise thereto at 60 ° C. for 1 hour. Reacting to obtain 2- (hydroxymethylamino) acetic acid (step 1);

상기 2-(hydroxymethylamino)acetic acid 100중량부에 황산(H2SO4) 15~20중량부를 첨가하여 교반시킨 후에, 시안화나트륨(Sodium cyanide) 20~25중량부를 적하하고 50℃에서 1시간 동안 반응시켜 2-(cyanomethylamino)acetic acid를 수득하는 단계(단계 2);After stirring by adding 15-20 parts by weight of sulfuric acid (H 2 SO 4 ) to 100 parts by weight of 2- (hydroxymethylamino) acetic acid, 20-25 parts by weight of sodium cyanide was added dropwise and reacted at 50 ° C. for 1 hour. To obtain 2- (cyanomethylamino) acetic acid (step 2);

상기 2-(cyanomethylamino)acetic acid 100중량부에 H2O 85~90중량부 및 황산(H2SO4) 10~15중량부를 첨가한 후, 40℃에서 5시간 동안 교반하여 Iminodiacetic acid를 수득하는 단계(단계 3); 및After adding 85 to 90 parts by weight of H 2 O and 10 to 15 parts by weight of sulfuric acid (H 2 SO 4 ) to 100 parts by weight of 2- (cyanomethylamino) acetic acid, the mixture was stirred at 40 ° C. for 5 hours to obtain Iminodiacetic acid. Step (step 3); And

상기 Iminodiacetic acid 100중량부에 1~5℃의 메탄올 2~7중량부를 투입하여 정제하는 단계(단계 4);Purifying by adding 2-7 parts by weight of methanol at 1-5 ° C. to 100 parts by weight of Iminodiacetic acid (step 4);

를 포함한다.
.

상기 단계 1에서, 상기 37%(w/w) 포름알데하이드(Formaldehyde)는 N2 Purge 하에 25℃에서 30분 동안 적하하는 것이 바람직하다.In step 1, the 37% (w / w) formaldehyde (Formaldehyde) is preferably added dropwise for 30 minutes at 25 ℃ under N 2 Purge.

상기 단계 2에서, 상기 2-(hydroxymethylamino)acetic acid를 20℃로 냉각 후 황산(H2SO4)을 첨가하여 pH를 4~5로 맞추고 실온에서 10분 동안 교반시킨 후에, 시안화나트륨(Sodium cyanide)을 10~25℃에서 적하시키는 것이 바람직하다.In step 2, the 2- (hydroxymethylamino) acetic acid was cooled to 20 ° C., followed by addition of sulfuric acid (H 2 SO 4 ) to adjust the pH to 4-5, and stirred at room temperature for 10 minutes, followed by sodium cyanide. ) Is preferably added dropwise at 10 to 25 ° C.

상기 단계 3에서, H2O에 황산(H2SO4)을 30분 동안 반응시킨 후, 상기 2-(cyanomethylamino)acetic acid에 20℃에서 적하시켜 pH를 1~2.5로 맞추는 것이 바람직하다.
In step 3, after reacting H 2 O with sulfuric acid (H 2 SO 4 ) for 30 minutes, it is preferable to drop the 2- (cyanomethylamino) acetic acid at 20 ° C. to adjust the pH to 1 to 2.5.

본 발명의 합성방법은 수율 97.6% 및 순도 99.95%의 이미노디아세트산을 합성할 수 있는 장점이 있으며, 폐수 및 부생성물의 발생을 억제할 수 있는 효과가 있다.
Synthesis method of the present invention has the advantage of synthesizing the imino diacetic acid of 97.6% yield and 99.95% purity, there is an effect that can suppress the generation of waste water and by-products.

본 발명에 따른 합성방법을 하기 제조예 및 실시예를 통하여 자세히 설명한다.
The synthesis method according to the present invention will be described in detail through the following Preparation Examples and Examples.

[제조예 1][Production Example 1]

반응용기에 H2O 48g을 넣은 후 글리신(Glycine) 30g을 첨가해 준 다음 10분 동안 교반시킨 후, 37%(w/w) 포름알데하이드(Formaldehyde) 30~50g을 N2 Purge 하에 25℃에서 30분 동안 적하하고 50~60℃에서 1시간 동안 반응시켜 2-(hydroxymethylamino)acetic acid를 수득하였다. (단계 1)Add 48 g of H 2 O to the reaction vessel, add 30 g of glycine, and stir for 10 minutes. Then, 30-50 g of 37% (w / w) formaldehyde (formaldehyde) at 25 ° C. under N 2 Purge. It was added dropwise for 30 minutes and reacted for 1 hour at 50 ~ 60 ℃ to obtain 2- (hydroxymethylamino) acetic acid. (Step 1)

상기 2-(hydroxymethylamino)acetic acid를 20℃까지 냉각 후 황산(H2SO4) 5~40g을 천천히 첨가하여 pH 4~5로 맞춘 다음 실온에서 10분 동안 교반시킨 후에, 시안화나트륨(Sodium cyanide) 20~25g을 15℃에서 적하하고 50℃에서 1시간 동안 반응시켜 2-(cyanomethylamino)acetic acid를 수득하였다. (단계 2)After cooling the 2- (hydroxymethylamino) acetic acid to 20 ° C., slowly adding 5-40 g of sulfuric acid (H 2 SO 4 ) to pH 4-5, stirring at room temperature for 10 minutes, and sodium cyanide. 20-25 g was added dropwise at 15 ° C. and reacted at 50 ° C. for 1 hour to obtain 2- (cyanomethylamino) acetic acid. (Step 2)

H2O 30~180g에 황산(H2SO4) 0~70g을 30분 동안 반응시킨 후 상기 2-(cyanomethylamino)acetic acid에 20℃에서 적하시켜 pH 1~2.5로 맞추고, 40~80℃에서 4~7시간 동안 교반하여 Iminodiacetic acid를 수득하였다. (단계 3)After reacting 30-180 g of H 2 O with 0-70 g of sulfuric acid (H 2 SO 4 ) for 30 minutes, the mixture was added dropwise to 2- (cyanomethylamino) acetic acid at 20 ° C., adjusted to pH 1-2.5, at 40-80 ° C. Stirring for 4-7 hours gave Iminodiacetic acid. (Step 3)

상기 Iminodiacetic acid에 5℃의 메탄올, 아세톤 또는 물 중 어느 하나 0~20g을 투입하여 정제하였다. (단계 4)
0 to 20 g of methanol, acetone, or water at 5 ° C. was purified to the Iminodiacetic acid. (Step 4)

[실험예 1][Experimental Example 1]

제조예 1에서의 합성에 있어서, 단계 1의 포름알데하이드(Formaldehyde) 함량 조절, 단계 1의 반응온도 조절, 단계 2의 황산(H2SO4) 함량 조절, 단계 2의 시안화나트륨(Sodium cyanide) 함량 조절, 단계 3의 황산(H2SO4) 및 H2O 함량 조절, 단계 3의 반응온도 및 반응시간 조절, 단계 4의 washing제 종류 및 함량 조절에 따른 수율(Yield) 변화를 실험하여, 그 결과를 표 1에 나타내었다.
In the synthesis in Preparation Example 1, the formaldehyde content of step 1, the reaction temperature of step 1, the sulfuric acid (H 2 SO 4 ) content of step 2, the sodium cyanide content of step 2 Yield change was experimented by adjusting, adjusting sulfuric acid (H 2 SO 4 ) and H 2 O content of step 3, adjusting reaction temperature and reaction time of step 3, and adjusting the type and content of washing agent of step 4, The results are shown in Table 1.

G : 글리신(Glycine) G: Glycine

F : 포름알데하이드(Formaldehyde)F: Formaldehyde

T1 : 단계 1에서 반응온도T1: reaction temperature in step 1

S2 : 단계 2에서 황산(H2SO4) S2: sulfuric acid (H 2 SO 4 ) in step 2

N : 시안화나트륨(Sodium cyanide)N: Sodium cyanide

S3 : 단계 3에서 황산(H2SO4)S3: sulfuric acid (H 2 SO 4 ) in step 3

O : 단계 3에서 H2OO: H 2 O in step 3

T3 : 단계 3에서 반응온도T3: reaction temperature in step 3

H : 단계 3에서 반응시간H: reaction time in step 3

W : 단계 4에서 washingW: washing in step 4

a : washing제 acetonea: washing agent acetone

m : washing제 메탄올(MeOH)m: washing agent methanol (MeOH)

w : washing제 H2Ow: washing agent H 2 O

- : N/A
-: N / A

G
(g)
G
(g)
F
(g)
F
(g)
T1
(℃)
T1
(℃)
S2
(g)
S2
(g)
N
(g)
N
(g)
S3
(g)
S3
(g)
O
(g)
O
(g)
T3
(℃)
T3
(℃)
H
(hr)
H
(hr)
W
(g)
W
(g)
Yield
(%)
Yield
(%)
3030 3030 6060 55 2020 3535 150150 5050 44 a 10a 10 6565 3030 3030 6060 99 2020 3535 140140 5050 44 a 10a 10 6868 3030 3434 6060 33 2020 3838 160160 5050 44 m 10m 10 5656 3030 3434 6060 1515 2525 2121 160160 5050 55 m 10m 10 7575 3030 3434 6060 2020 2525 2020 140140 4040 55 m 10m 10 97.697.6 3030 3434 6060 2020 2525 2020 160160 4040 55 a 10a 10 9090 3030 3434 6060 2020 2525 2020 160160 4040 55 w 20w 20 8888 3030 3434 6060 2525 2525 1515 140140 4040 55 -- 6060 3030 3434 6060 2525 2525 1515 140140 4040 55 m 10m 10 6060 3030 3434 6060 2525 2525 1515 140140 4040 55 w 20w 20 6060 3030 3434 6060 2525 2525 1515 160160 4747 5.55.5 -- 8080 3030 3434 6060 2525 2525 2020 180180 4747 5.55.5 -- 8484 3030 3434 5050 4040 2525 1515 140140 5050 55 w 20w 20 7878 3030 3434 5050 4040 2525 1515 160160 5050 55 w 20w 20 7575 3030 3434 6060 4040 2525 1515 140140 5050 55 w 20w 20 7878 3030 3434 6060 4040 2525 1515 160160 7070 55 w 20w 20 7373 3030 3535 6060 2525 2525 1515 160160 4040 55 -- 6565 3030 3535 5050 2525 2525 1515 160160 5050 55 w 20w 20 7777 3030 3838 6060 1515 2020 2727 160160 5050 55 m 10m 10 7373 3030 3838 6060 1515 2525 2727 160160 5050 55 m 15m 15 8080 3030 3939 6060 44 2020 -- 4040 8080 66 a 10a 10 8080 3030 3939 6060 44 2020 -- 4040 6060 66 a 15a 15 7070 3030 3939 6060 44 2020 1515 4040 6060 66 a 15a 15 7070 3030 3939 6060 44 2020 1515 3535 6060 66 a 10a 10 7474 3030 3939 6060 44 2020 1515 3030 6060 66 a 10a 10 7979 3030 3939 6060 44 2020 1515 3535 5050 66 a 10a 10 7575 3030 3939 6060 44 2020 1515 3030 5050 66 a 15a 15 8282 3030 3939 6060 44 2020 3030 3030 5050 66 a 10a 10 7575 3030 3939 6060 44 2020 6060 4040 5050 66 a 10a 10 9090 3030 3939 6060 44 2020 7070 4040 5050 66 a 10a 10 8888 3030 3939 6060 88 2020 -- 4040 8080 66 a 10a 10 7575 3030 3939 6060 88 2020 -- 4040 6060 55 a 10a 10 7575 3030 3939 6060 88 2020 -- 4040 6060 66 -- 7575 3030 3939 6060 88 2020 -- 4040 6060 66 -- 6565 3030 3939 6060 1010 2020 -- 4040 8080 77 a 10a 10 8383 3030 3939 6060 1010 2020 -- 4040 6060 66 a 10a 10 8080 3030 3939 6060 1010 2020 -- 4040 6060 66 a 10a 10 8080 3030 3939 6060 3030 2020 -- 4040 6060 66 a 10a 10 6060 3030 4040 6060 3030 2020 3838 160160 5050 44 m 10m 10 6060 3030 4141 6060 44 2020 1515 4040 6060 66 a 10a 10 7373 3030 4141 6060 88 2020 -- 4040 8080 66 a 10a 10 7272 3030 4141 6060 88 2020 -- 4040 6060 66 a 10a 10 8080 3030 4141 6060 88 2020 -- 4040 6060 55 -- 6060 3030 4343 6060 1515 2525 2121 160160 5050 55 m 10m 10 7676

상기 표 1의 결과를 살펴보면, 단계 1의 포름알데하이드(Formaldehyde) 함량 34g, 단계 1의 반응온도 60℃, 단계 2의 황산(H2SO4) 20g, 단계 2의 시안화나트륨(Sodium cyanide) 25g, 단계 3의 황산(H2SO4) 20g 및 H2O 140g, 단계 3의 반응온도 60℃ 및 반응시간 5시간, 단계 4의 washing 메탄올 10g의 조건에서 합성하는 경우에 수율(Yield)이 97.6%로 가장 높은 것을 확인할 수 있다.
Looking at the results of Table 1, formaldehyde (Formaldehyde) content of step 1, 34g, reaction temperature of 60 ° C in step 1, 20g of sulfuric acid (H 2 SO 4 ) in step 2, sodium cyanide in step 2, 25g, Yield is 97.6% when synthesized under the conditions of 20 g of sulfuric acid (H 2 SO 4 ) in step 3 and 140 g of H 2 O, reaction temperature of 60 ° C. in step 3 and reaction time of 5 hours, and 10 g of washing methanol in step 4 It can be confirmed that the highest.

[제조예 2][Production Example 2]

시안화나트륨(Sodium cyanide) 대신 시안화칼륨(Potassium cyanide)을 사용한 것을 제외하고 나머지는 제조예 1과 동일하게 합성하였다.
Except for using sodium cyanide (Potassium cyanide) instead of sodium cyanide the remainder was synthesized in the same manner as in Preparation Example 1.

[실험예 2][Experimental Example 2]

제조예 2에서의 합성에 있어서, 단계 1의 포름알데하이드(Formaldehyde) 함량 조절, 단계 2의 황산(H2SO4) 함량 조절, 단계 2의 시안화칼륨(Potassium cyanide) 함량 조절, 단계 3의 황산(H2SO4) 조절, 단계 3의 반응온도 조절, 단계 4의 washing제 종류 및 함량 조절에 따른 수율(Yield) 변화를 실험하여, 그 결과를 표 2에 나타내었다.
In the synthesis in Preparation Example 2, the formaldehyde content of step 1, the sulfuric acid (H 2 SO 4 ) content of step 2, the potassium cyanide content of step 2, the sulfuric acid of step 3 Yield change according to the control of H 2 SO 4 ), the reaction temperature of step 3, the type and content of the washing agent of step 4 was tested, and the results are shown in Table 2.

K : 시안화칼륨(Potassium cyanide)
K: Potassium cyanide

G
(g)
G
(g)
F
(g)
F
(g)
T1
(℃)
T1
(℃)
S2
(g)
S2
(g)
K
(g)
K
(g)
S3
(g)
S3
(g)
O
(g)
O
(g)
T3
(℃)
T3
(℃)
H
(hr)
H
(hr)
W
(g)
W
(g)
Yield
(%)
Yield
(%)
3030 3434 6060 2525 2525 2020 160160 5050 55 w 16w 16 8080 3030 3434 6060 2525 2525 1515 160160 5050 55 w 16w 16 7272 3030 4040 6060 2525 2525 2020 160160 6060 55 -- 8080 3030 4040 6060 2525 2020 2020 160160 6060 55 a 10a 10 7070 3030 4545 6060 2525 2525 2020 160160 5050 55 w 16w 16 8787 3030 4545 6060 2525 2525 2020 160160 5050 55 m 10m 10 7575 3030 4545 6060 3838 2525 55 160160 5050 55 w 16w 16 7575 3030 4545 6060 2525 2323 2020 160160 5050 55 w 16w 16 8181 3030 4545 6060 3838 2121 2020 160160 5050 55 w 16w 16 7777 3030 5252 6060 2525 2525 2020 160160 5050 55 w 16w 16 8181 3030 4848 6060 2525 2525 2525 160160 5050 55 w 16w 16 7979 3030 4848 6060 2020 2020 2525 160160 5050 55 w 16w 16 7575

상기 표 2의 결과를 살펴보면, 시안화나트륨(Sodium cyanide) 대신 시안화칼륨(Potassium cyanide)을 사용하는 경우에 수율이 저하되는 것을 확인할 수 있다.
Looking at the results of Table 2, it can be seen that the yield is reduced when using potassium cyanide (Potassium cyanide) instead of sodium cyanide.

반응용기에 H2O 48g을 넣은 후 글리신(Glycine) 30g을 첨가해 준 다음 10분 동안 교반시킨 후, 37%(w/w) 포름알데하이드(Formaldehyde) 34g을 N2 Purge 하에 25℃에서 30분 동안 적하하고 60℃에서 1시간 동안 반응시켜 2-(hydroxymethylamino)acetic acid를 수득하였다. (단계 1)Add 48 g of H 2 O to the reaction vessel, add 30 g of glycine (glycine), and then stir for 10 minutes. Then, 34 g of 37% (w / w) formaldehyde (30 g) at 25 ° C. under N 2 purge for 30 minutes Was added dropwise and reacted at 60 ° C. for 1 hour to obtain 2- (hydroxymethylamino) acetic acid. (Step 1)

상기 2-(hydroxymethylamino)acetic acid를 20℃까지 냉각 후 황산(H2SO4) 20g을 천천히 첨가하여 pH 4~5로 맞춘 다음 실온에서 10분 동안 교반시킨 후에, 시안화나트륨(Sodium cyanide) 25g을 15℃에서 적하하고 50℃에서 1시간 동안 반응시켜 2-(cyanomethylamino)acetic acid를 수득하였다. (단계 2)After cooling the 2- (hydroxymethylamino) acetic acid to 20 ° C. and slowly adding 20 g of sulfuric acid (H 2 SO 4 ) to pH 4-5 and stirring at room temperature for 10 minutes, 25 g of sodium cyanide was added. The solution was added dropwise at 15 ° C. and reacted at 50 ° C. for 1 hour to obtain 2- (cyanomethylamino) acetic acid. (Step 2)

H2O 140g에 황산(H2SO4) 20g을 30분 동안 반응시킨 후 상기 2-(cyanomethylamino)acetic acid에 20℃에서 적하시켜 pH 1~2.5로 맞추고, 40℃에서 5시간 동안 교반하여 Iminodiacetic acid를 수득하였다. (단계 3)After reacting 20 g of sulfuric acid (H 2 SO 4 ) with 140 g of H 2 O for 30 minutes, it was added dropwise to the 2- (cyanomethylamino) acetic acid at 20 ° C., adjusted to pH 1˜2.5, and stirred at 40 ° C. for 5 hours to form Iminodiacetic. acid was obtained. (Step 3)

상기 Iminodiacetic acid에 5℃의 메탄올 10g을 투입하여 정제하였다. (단계 4)
10 g of methanol at 5 ° C. was purified to the Iminodiacetic acid. (Step 4)

[실험예 3][Experimental Example 3]

실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)의 순도를 알아보기 위해 Liquid Chromatography(LC)를 이용하여 분석하여, 도 2에 나타내었다. 도 2의 결과를 살펴보면, 실시예 1에서 합성한 이미노디아세트산의 순도는 99.95%인 것을 알 수 있다.
In order to determine the purity of the iminodiacetic acid synthesized in Example 1 was analyzed using Liquid Chromatography (LC), it is shown in FIG. Looking at the results of Figure 2, it can be seen that the purity of the imino diacetic acid synthesized in Example 1 is 99.95%.

[실험예 4][Experimental Example 4]

실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)의 중금속 함유정도를 파악하기 위해 ICP-OES 장비를 이용하여 분석하여 표 3에 나타내었다.
In order to determine the heavy metal content of the iminodiacetic acid synthesized in Example 1 using an ICP-OES equipment is shown in Table 3.

구분division 실시예 1 (ppm)Example 1 (ppm) 기준치 (ppm)Reference value (ppm) FeFe 33 55 PbPb 1One 1One CaCa 33 55 ClCl 500500 12001200 NaNa 500500 15001500 KK 1One 1One

상기 표 3의 결과를 살펴보면, 실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)은 중금속이 기준치 이하 포함되어 있는 것을 확인할 수 있다.
Looking at the results of Table 3, it can be seen that the iminodiacetic acid (Iminodiacetic acid) synthesized in Example 1 contains a heavy metal below the reference value.

[실험예 5][Experimental Example 5]

실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)을 IR을 이용하여 분석하였으며, 그 결과를 도 4에 나타내었다. Iminodiacetic acid synthesized in Example 1 was analyzed using IR, and the results are shown in FIG. 4.

도 3에 나타낸 Iminodiacetic acid(IDA) - reference의 피크(Peak)와 비교해 볼 때, 실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)은 시료 이외에 이물질이 검출되지 않은 것을 알 수 있다.
As compared with the peak of Iminodiacetic acid (IDA) -reference shown in FIG. 3, it can be seen that the iminodiacetic acid synthesized in Example 1 has not detected any foreign substances other than the sample.

[실험예 6]Experimental Example 6

실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)을 Proton NMR을 이용하여 분석하였으며, 그 결과를 도 6에 나타내었다. Iminodiacetic acid synthesized in Example 1 was analyzed using Proton NMR, and the results are shown in FIG. 6.

도 5에 나타낸 Iminodiacetic acid(IDA) - STD의 피크(Peak)와 비교해 볼 때, 실시예 1에서 합성한 이미노디아세트산(Iminodiacetic acid)은 시료 이외에 이물질이 검출되지 않은 것을 알 수 있다.As compared with the peak of Iminodiacetic acid (IDA) -STD shown in FIG. 5, it can be seen that the iminodiacetic acid synthesized in Example 1 was not detected in the foreign body other than the sample.

Claims (4)

H2O 100중량부에 글리신(Glycine) 60~65중량부를 첨가하고 10분 동안 교반시킨 후, 37%(w/w) 포름알데하이드(Formaldehyde) 70~75중량부를 적하하고 60℃에서 1시간 동안 반응시켜 2-(hydroxymethylamino)acetic acid를 수득하는 단계(단계 1);
상기 2-(hydroxymethylamino)acetic acid 100중량부에 황산(H2SO4) 15~20중량부를 첨가하여 교반시킨 후에, 시안화나트륨(Sodium cyanide) 20~25중량부를 적하하고 50℃에서 1시간 동안 반응시켜 2-(cyanomethylamino)acetic acid를 수득하는 단계(단계 2);
상기 2-(cyanomethylamino)acetic acid 100중량부에 H2O 85~90중량부 및 황산(H2SO4) 10~15중량부를 첨가한 후, 40℃에서 5시간 동안 교반하여 Iminodiacetic acid를 수득하는 단계(단계 3); 및
상기 Iminodiacetic acid 100중량부에 1~5℃의 메탄올 2~7중량부를 투입하여 정제하는 단계(단계 4);
를 포함하는 것을 특징으로 하는 이미노디아세트산(Iminodiacetic acid)의 합성방법.
60 to 65 parts by weight of glycine (Glycine) was added to 100 parts by weight of H 2 O, followed by stirring for 10 minutes. Then, 70 to 75 parts by weight of 37% (w / w) formaldehyde was added dropwise thereto at 60 ° C. for 1 hour. Reacting to obtain 2- (hydroxymethylamino) acetic acid (step 1);
After stirring by adding 15-20 parts by weight of sulfuric acid (H 2 SO 4 ) to 100 parts by weight of 2- (hydroxymethylamino) acetic acid, 20-25 parts by weight of sodium cyanide was added dropwise and reacted at 50 ° C. for 1 hour. To obtain 2- (cyanomethylamino) acetic acid (step 2);
After adding 85 to 90 parts by weight of H 2 O and 10 to 15 parts by weight of sulfuric acid (H 2 SO 4 ) to 100 parts by weight of 2- (cyanomethylamino) acetic acid, the mixture was stirred at 40 ° C. for 5 hours to obtain Iminodiacetic acid. Step (step 3); And
Purifying by adding 2-7 parts by weight of methanol at 1-5 ° C. to 100 parts by weight of Iminodiacetic acid (step 4);
Method for synthesizing iminodiacetic acid (Iminodiacetic acid) comprising a.
제 1항에 있어서, 상기 단계 1에서,
상기 37%(w/w) 포름알데하이드(Formaldehyde)는 N2 Purge 하에 25℃에서 30분 동안 적하하는 것을 특징으로 하는 이미노디아세트산(Iminodiacetic acid)의 합성방법.
2. The method according to claim 1, wherein, in step 1,
The 37% (w / w) formaldehyde (Formaldehyde) is a method for synthesizing iminodiacetic acid (Iminodiacetic acid), characterized in that dropping for 30 minutes at 25 ℃ under N 2 Purge.
제 1항에 있어서, 상기 단계 2에서,
상기 2-(hydroxymethylamino)acetic acid를 20℃로 냉각 후 황산(H2SO4)을 첨가하여 pH를 4~5로 맞추고 실온에서 10분 동안 교반시킨 후에, 시안화나트륨(Sodium cyanide)을 10~25℃에서 적하시키는 것을 특징으로 하는 이미노디아세트산(Iminodiacetic acid)의 합성방법.
The method of claim 1, wherein in step 2,
After cooling the 2- (hydroxymethylamino) acetic acid to 20 ° C. and adding sulfuric acid (H 2 SO 4 ) to adjust the pH to 4-5 and stirring at room temperature for 10 minutes, sodium cyanide is 10-25 A method for synthesizing iminodiacetic acid, which is added dropwise at ℃.
제 1항에 있어서, 상기 단계 3에서,
H2O에 황산(H2SO4)을 30분 동안 반응시킨 후, 상기 2-(cyanomethylamino)acetic acid에 20℃에서 적하시켜 pH를 1~2.5로 맞추는 것을 특징으로 하는 이미노디아세트산(Iminodiacetic acid)의 합성방법.
The method of claim 1, wherein in step 3,
After reacting sulfuric acid (H 2 SO 4 ) with H 2 O for 30 minutes, the mixture is added dropwise to the 2- (cyanomethylamino) acetic acid at 20 ° C. to adjust the pH to 1 to 2.5. Method of synthesis).
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KR20180056162A (en) * 2016-11-18 2018-05-28 동우 화인켐 주식회사 A method of iminodiacetic acid

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KR100266127B1 (en) 1995-06-07 2000-09-15 죤 에이치. 뷰센 Process for preparing n-phosphonomethyliminodiacetic acid
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KR19980702708A (en) * 1995-03-07 1998-08-05 가와무라요시부미 Process for preparing N-phosphonomethylglycine
KR100266127B1 (en) 1995-06-07 2000-09-15 죤 에이치. 뷰센 Process for preparing n-phosphonomethyliminodiacetic acid
KR20000053014A (en) * 1996-11-01 2000-08-25 죤 에이치. 뷰센 Use of monosodium iminodiacetic acid solutions in the preparation of n-phosphonomethyliminodiacetic acid
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180056162A (en) * 2016-11-18 2018-05-28 동우 화인켐 주식회사 A method of iminodiacetic acid
KR102652211B1 (en) * 2016-11-18 2024-03-29 동우 화인켐 주식회사 A method of iminodiacetic acid

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