KR101166996B1

KR101166996B1 - Substrate for manufacturing flat panel display device

Info

Publication number: KR101166996B1
Application number: KR20100137918A
Authority: KR
Inventors: 남시녕; 이주엽
Original assignee: 하이디스 테크놀로지 주식회사
Priority date: 2010-12-29
Filing date: 2010-12-29
Publication date: 2012-07-24
Also published as: KR20120075977A

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for manufacturing a display device, wherein a substrate for manufacturing a display device according to the present invention is divided into unit area sizes of each exposure of an exposure process during a photolithography process, and at least two array substrates are formed. A subregion in which the regions are arranged with a space between them; And at least two alignment marks formed in the spaced space between the array substrate forming regions. As a result, a substrate for manufacturing a display device that can prevent a difference in contrast between alignment marks arranged on both sides is provided.

Description

Substrate for manufacturing flat panel display device

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for manufacturing a display device, and more particularly to a substrate for manufacturing a display device, which can prevent misalignment due to a contrast difference between alignment marks arranged for alignment of substrates between processes during manufacturing of the display device substrate. It is about.

In general, a display device displays an image by using a capacitor or a switching element such as a thin film transistor (TFT) that controls each pixel and electrodes disposed on each pixel, and the elements are arranged. The formed substrate is called an array substrate.

Electrodes or elements of an array substrate of a display device are generally implemented through a process such as a thin film forming process, a photolithograpy process, and an etching process.

Such an array substrate of a display panel includes a plurality of individual array substrates simultaneously formed on a main substrate for convenience of a process, and a plurality of display panel panels are obtained through a cutting process after the process.

Furthermore, in order to manufacture a small display panel for a cell phone or a PDA having a small size of an individual array substrate, the main substrate is divided into sub areas of each mask unit in the photolithography process, and each sub area is used. In the process, a plurality of individual array substrates are arranged to facilitate the process.

1 is an example of a panel for a small display device, in which a main substrate 10 is divided into a plurality of sub-regions 11, and a plurality of individual array substrate-forming regions 13 are formed in the sub-region 11. It is showing this arrangement. 1 shows that the main substrate 10 is divided into four sub-regions 11, but is not limited thereto.

In addition, each sub-region 11 is a region of each mask unit in the photolithography process, and accurately aligns a plurality of masks for forming a pattern of electrodes or elements on the array substrate forming region 13 with the sub-regions 11. In order to achieve this, an alignment mark 20 is required, and the alignment mark 20 is generally formed on both outer sides of the subregion 11 as shown in FIG. 1.

However, when the alignment mark 20 is formed, deposition is uneven for each position of the main substrate 10, so that the alignment mark 20 is recognized by the aligner as the alignment equipment. A recognition error may occur, and as a result, an alignment error occurs in which the mask is not aligned at the correct position in each subregion 11.

Therefore, an object of the present invention is to solve such a conventional problem, by placing the alignment mark in the space between the array substrate forming regions arranged in each sub-region, between the alignment marks arranged on both sides It is an object of the present invention to provide a substrate for manufacturing a display device which can prevent a contrast difference caused by an exposure decolor.

In addition, the alignment mark is formed by setting the negative mark and the positive mark as one set, and the negative mark is disposed so as to face the edge in the array substrate forming area, so that the recognition rate of the alignment mark is reduced even when the contrast difference due to the exposure decolor is generated. It is to provide a substrate for manufacturing a display device that can prevent the degradation.

According to the present invention, in the substrate for manufacturing a display device, the subdivision is divided into the unit area size of each exposure of the exposure process during the photolithography process, and at least two array substrate forming regions are arranged with the spaced apart space therebetween. domain; And at least two alignment marks formed in the spaced spaces of the array substrate forming region shies.

Here, it is preferable that the alignment mark is a set of a positive mark in an embossed form and a negative mark in an engraved form.

The positive mark may be disposed toward the center of the sub area, and the negative mark may be disposed toward the edge of the sub area.

In addition, the alignment mark preferably includes a first mark portion having a cross shape and a second mark portion having a zigzag shape disposed outside the first mark portion.

According to the present invention, there is provided a display device manufacturing substrate which can prevent the contrast difference caused by the exposure decolor between alignment marks arranged on both sides by placing the alignment mark in the sub-region.

In addition, the alignment mark is composed of a negative mark and a positive mark in one set, and the negative mark is disposed so that the negative mark faces the edge in the sub area, so that even if the contrast difference due to the exposure discolor occurs in the edge portion of the sub area, the alignment is aligned. Provided is a substrate for manufacturing a display device which can prevent the recognition rate of a mark from being lowered.

1 is a front view of a substrate for manufacturing a conventional display device;
2 is a front view of a substrate for manufacturing a display device of the present invention;
3 is a front view of a substrate for manufacturing a display device according to another embodiment of the present invention;
4 is an enlarged view of an alignment mark of a substrate for manufacturing a display device according to another exemplary embodiment of the present invention.

Prior to the description, components having the same configuration are denoted by the same reference numerals as those in the first embodiment. In other embodiments, configurations different from those of the first embodiment will be described do.

Hereinafter, a substrate for manufacturing a display device according to a first embodiment of the present invention will be described in detail with reference to the accompanying drawings.

2 is a front view of a substrate for manufacturing a display device of the present invention.

As shown in the drawing, the substrate for manufacturing a display device according to the present invention includes a main substrate 110 and an alignment mark 120 formed on the main substrate 110.

The main substrate 110 is divided into the unit area size of each exposure in the exposure process of the photolithography process, and at least two array substrate formation regions 113 are arranged with the separation space 114 interposed therebetween. ) Is defined. In FIG. 2, four sub-regions 111 are formed on the main substrate 110, but the present invention is not limited thereto, and the sub-regions 111 may be changed according to the setting area of each mask unit in the photolithography process.

The alignment mark 120 may include a first mark portion 121 having a 'double' shape, and a second mark portion 122 having a '口' shape disposed outside the first mark portion 121. Two or more are provided to be disposed on both sides of the sub-region 111, respectively, and are disposed in the space 114 between the array substrate forming regions 113.

As described above, when the alignment mark 120 is disposed in the separation space 114 formed between the array substrate forming regions 113 in the sub region 111, the array substrate forming region (located in the sub region 111) ( The circuit pattern 113 and the alignment mark 120 are exposed to the same environment.

In the present invention, since the contrast difference occurs due to the exposure decolor in the outer portion of the sub-region 111, the alignment mark 120 is positioned in the sub-region 111. The alignment mark 120 is frozen within the sub-region 111 as described above. When the in mark 120 is formed, an alignment error may be prevented because a contrast difference between the left and right alignment marks 120 does not occur as in the related art.

Therefore, the present invention reduces the error action time through the alignment error occurrence, thereby providing an effect of improving the overall process yield.

3 is a front view of a substrate for manufacturing a display device according to another embodiment of the present invention, and FIG. 4 is an enlarged view of an alignment mark of the substrate for manufacturing a display device according to another embodiment of the present invention.

As shown in FIG. 3, the substrate for manufacturing a display device according to another embodiment of the present invention has a positive mark in which an alignment mark 120 formed in a space 114 between the array substrate forming regions 113 is embossed. 120a) and a negative mark 120b having an intaglio form, which is different from the above-described embodiment in that it forms a set.

That is, in the present embodiment, the alignment mark 120 'is disposed on the outer side of the first mark portion 121 and the first mark portion 121 having a' double 'shape as in the above-described embodiment. A positive mark 120a having a second mark portion 122 having a 'shaped' shape, but having an exposed first mark portion 121 and a second mark portion 122 (see FIG. 4A). ) And a negative mark 120b (see (b) of FIG. 4) having an intaglio form in which peripheral portions of the first mark portion 121 and the second mark portion 122 are exposed are disposed to form a set.

Since the alignment mark 120 ′ is also formed in the space 114 formed between the array substrate forming regions 113 in the sub region 111, the alignment marks 120 ′ are aligned on both sides. The difference in contrast due to the discoloration does not occur in the mark 120 '.

In particular, in the alignment mark 120 'according to another embodiment of the present invention, the positive mark 120a constituting the align mark 120' is disposed toward the center of the sub-region, and the negative mark 120b is disposed. It is characterized by being disposed toward the rim. As described above, the negative mark 120b of the intaglio shape disposed in the inner region of the sub region 111 is exposed to the periphery of the first mark portion 121 and the second mark portion 122, and thus has excellent identification power. Therefore, the alignment mark 120 can be easily identified even when the contrast difference is caused by the deposition decolor.

In addition, since alignment is performed with the positive mark 120a as a set together with the negative mark 120b having excellent distinguishing power as described above, not only the alignment error rate is low but also an excellent alignment state can be provided.

In addition, alignment is performed by performing an alignment process by performing a first alignment using a negative mark 120b having excellent discrimination ability, and performing a second alignment using a positive mark 120a having excellent precision. It would be possible to lower the error rate.

The scope of the present invention is not limited to the above-described embodiments, but may be embodied in various forms of embodiments within the scope of the appended claims. Without departing from the gist of the invention claimed in the claims, it is intended that any person skilled in the art to which the present invention pertains falls within the scope of the claims described in the present invention to various extents which can be modified.

110: main substrate, 111: sub-region, 113: array substrate forming region, 114: separation space,
120: alignment mark, 121: first mark portion, 122: second mark portion, 120a: positive mark,
120b: negative mark

Claims

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In the display device manufacturing substrate,
A sub-region divided by a unit area size of each exposure in the exposure process of the photolithography process, wherein at least two array substrate forming regions are arranged with a separation space therebetween; And,
And an alignment mark for aligning at least two exposure masks formed in the spaced space between the array substrate forming regions.
The alignment mark is composed of a positive mark in an embossed form and a negative mark in an engraved form, and arranged symmetrically on both sides with respect to the center of the subregion.
And the negative mark is disposed closer to the center of the sub-region than to the positive mark.

The method of claim 3, wherein
The alignment mark is a substrate for manufacturing a display device, characterized in that it comprises a first mark portion having a cross shape and a second mark portion having a zigzag shape disposed outside the first mark portion.