KR101162510B1 - PECVD including shower head - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing apparatus for a semiconductor device or a liquid crystal display device (LCD), and more particularly, to a chemical vapor deposition apparatus including a shower head.

It is an object of the present invention, the chemical vapor deposition equipment including a shower head and a shower head that can improve the manufacturing cost increases as the shower head is enlarged, and even if a defect occurs in a part of the shower head and the shower head can be improved In providing.

The present invention includes an injector having a plurality of injection holes for uniformly injecting a reaction gas onto a substrate, and a diffuser cover covering the injector, wherein the chemical vapor deposition is divided into n (n ≧ 2) planes in plan view. Provide a shower head for the equipment.

The present invention is configured by dividing the shower head mounted on the chemical vapor deposition apparatus into a plurality of partitions. Therefore, in the manufacturing of the shower head, since each of the divided parts is manufactured separately, the supply and demand of raw materials is easy, and the flexibility of changing the size of the shower head can be secured with respect to the change of the substrate size.

Description

Chemical vapor deposition apparatus including a shower head {PECVD including shower head}             

1 is a plan view showing a shower head of a conventional chemical vapor deposition apparatus, a view showing the bottom of the shower head.

FIG. 2 is a cross-sectional view taken along the line II-II of FIG. 1.

3 is a cross-sectional view of a chemical vapor deposition apparatus (PECVD) including a shower head according to an embodiment of the present invention.

4 and 5 are plan views showing the combined state and the pre-engagement state of the shower head having a quadrant structure according to an embodiment of the present invention, respectively, illustrating a bottom surface of the shower head;

6 and 7 are cross-sectional views showing cut lines VI-VI and VI-VII, respectively.

8 and 9 are enlarged cross-sectional views of " B " and " B "

<Description of the symbols for the main parts of the drawings>

132: shower head 132a: first partition

132b: second divider 132c: third divider                 

132d: fourth division

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing apparatus for a semiconductor device or a liquid crystal display device (LCD), and more particularly, to a chemical vapor deposition apparatus including a shower head.

Recently, as society has developed into an information age, a display field for processing and displaying a large amount of information has been rapidly developed.

In particular, with the development of thin-film transistor liquid crystal display devices that can meet the needs of thinning, light weight, low power consumption, etc., a conventional cathode-ray tube (CRT) ) And is forming a new mainstream in the display field.

In general, a liquid crystal display device displays an image by using optical anisotropy and polarization of liquid crystal. That is, the molecular structure of the liquid crystal is thin and long, and has optical anisotropy having directionality in the array and polarization property in which the arrangement direction changes when an electric field is artificially applied. The liquid crystal display device applies an appropriate voltage to the liquid crystal molecules. The alignment direction of the liquid crystal molecules is artificially changed, and the image is expressed by the light refracted accordingly.                         

The liquid crystal display may be classified into a driving system that outputs information about an image to be expressed largely, a circuit unit for converting the image information into an appropriate electrical signal, and a liquid crystal panel displaying an image through these electrical signals. .

In particular, the liquid crystal panel has a liquid crystal panel in which the molecular arrangement direction is changed according to an electrical signal, and displays a desired image to the user through a change in the transmittance of light, and is simply an electric field on one surface of a transparent substrate such as glass. After having an upper substrate and a lower substrate provided with various electrical elements including a production electrode, the electrodes are disposed to face each other and have a liquid crystal filled therebetween.

In this case, the field generating electrode and various electrical elements included in each of the upper and lower substrates are repeatedly formed by repeatedly depositing a thin film on the upper surface of the transparent substrate and then etching and patterning the thin film. Process such as or etching is performed in chemical vapor deposition equipment for manufacturing a substrate for a liquid crystal display device.

1 is a plan view showing a shower head of a conventional chemical vapor deposition apparatus, Figure 1 is a view showing the bottom of the shower head. 2 is a cross-sectional view taken along the line II-II of FIG. 1.

The chemical vapor deposition apparatus includes a shower head 32 on the upper side and a stage (not shown) facing the bottom of the shower head. A substrate (not shown) is mounted on the stage, and thermal energy is supplied to the substrate in the process of depositing a thin film on the substrate.

The shower head 32 functions to uniformly inject a reaction gas required for deposition onto the substrate. The shower head 32 is composed of a diffuser cover 34 and an injector 33. The reaction gas is supplied from the outside to the space between the diffuser cover 34 and the injector 33, and the reaction gas is uniformly injected onto the substrate through the plurality of injection holes 35 formed in the injector 33.

The shower head as described above is manufactured integrally with a plane and mounted on a chemical vapor deposition apparatus.

However, as the liquid crystal display becomes larger in size, the size of the substrate becomes larger. As the substrate is enlarged, the size of the constituent members included in the chemical vapor deposition apparatus is also increased, but the size of the shower head is also increased.

As the size of the shower head becomes larger, problems arise in supply and demand of raw materials, and the cost increases, such as an increase in time for manufacturing the shower head.

In addition, the shower head reacts with the reaction gas in the thin film deposition process, and arcing or scratching occurs to cause defects. Even when some of the defects occur, the shower head must be disposed of. There is.

An object of the present invention for solving the above problems is a shower head that can improve the problem that the manufacturing cost increases as the shower head is enlarged, and even if a defect occurs in a part of the shower head, a problem that must be discarded; The present invention provides a chemical vapor deposition apparatus including a shower head.

In order to achieve the object as described above, the present invention includes an injector having a plurality of injection holes for uniformly injecting the reaction gas on the substrate, and a diffuser cover covering the injector, planar n (n≥2 Provided is a shower head for chemical vapor deposition equipment divided into three divisions.

Here, the i-th and j-th divisions coupled to each other of the n divisions have an i-th injector and a diffuser cover, a j-th injector and a diffuser cover, respectively, and the contact surfaces of the i-th injector and the j-th injector correspond to each other. It can have more than one step. The contact surface of the j-th injector may further include a sealing means having a recess groove recessed therein and inserted into the recess groove. The sealing means may be made of a sealing material containing a non-ferrous metal, rubber. The contact surfaces of the first diffuser cover and the second diffuser cover may each be flat.

In another aspect, the invention provides a chamber body and a chamber lid defining a closed reaction zone; A susceptor having a stage on which a substrate is placed and a support for moving the stage up and down; An injector having a plurality of injection holes for uniformly injecting a reaction gas onto the substrate, and a shower head including a diffuser cover covering the injector and divided into n (n ≧ 2) planes in plan view. Provides vapor deposition equipment.

Here, the i-th, j-th divisions coupled to each other among the n divisions of the shower head each have an i-th injector and a diffuser cover, a j-th injector and a diffuser cover, and the contact surfaces of the i-th injector and the j-th injector are mutually It may have one or more steps. The contact surface of the j-th injector may further include a sealing means having a recess groove recessed therein and inserted into the recess groove. The sealing means may be made of a sealing material containing a non-ferrous metal, rubber. The contact surfaces of the first diffuser cover and the second diffuser cover may each be flat.

The present invention will be used by dividing the shower head mounted on the chemical vapor deposition equipment. Therefore, in manufacturing the shower head, each of the divided parts is manufactured separately, so that supply and demand of raw materials is easy, and when a defect occurs in a part, the cost may be reduced by replacing a defective part.

Hereinafter, a chemical vapor deposition apparatus including a shower head according to an embodiment of the present invention will be described.

In the embodiment of the present invention, a quadrant shower head is described as an example.

3 is a cross-sectional view of a chemical vapor deposition apparatus (PECVD) including a shower head according to an embodiment of the present invention.

As shown in FIG. 3, the chemical vapor deposition apparatus 100 according to the embodiment of the present invention has a box-shaped chamber body 120 having an opening installed thereon, and a lid role for closing the chamber body 120. And a chamber lid 130. The chamber body 120 and the chamber lead 130 are made of a metal material. An enclosed reaction area A in which the substrate 5 to be deposited is placed is defined in the chemical vapor deposition apparatus.

In addition, the chemical vapor deposition apparatus 100 includes an inlet pipe 131 for inducing a reaction gas supplied from the outside into the reaction zone A, and the inlet pipe 131 penetrates a point of the chamber lid 130. It is pulled into the inside.

In the reaction zone A, a shower head 132 having a quadrant structure disposed inside the chamber lid 130 is provided. The shower head 132 is seated on the inner surface of the chamber lid 130 with the interposing means 160 interposed therebetween. The interposition means 160 uses, for example, an insulating sealing material such as Teflon. The shower head 132 functions to evenly spray the reaction gas required for deposition on the substrate 5.

The shower head 132 has an injector 133 as a first plate and a diffuser cover 134 as a second plate covering the injector 133 thereon. The reaction gas is supplied from the outside through the inlet pipe 132 to the internal space S between the diffuser cover 134 and the injector 133.

A plurality of injection holes 150 are formed in the injector 133 in a direction facing the substrate 5 to uniformly inject the reaction gas to the entire surface of the substrate.

A diffuser hole 151 connected to the inlet pipe 131 is formed in the diffuser cover 134 to receive the reaction gas. The diffuser cover 134 is made of aluminum, for example.

The diffuser plate 180 is formed in the shower head 132 as a third plate. The diffuser plate 180 is interposed between the diffuser cover 134 and the injector 133 to assist the reaction gas flowing from the inlet pipe 131 to diffuse in the lateral direction of the interior space S of the shower head 132. Done.

The susceptor 140 includes a susceptor support 141 which moves up and down through the bottom of the chamber body 120 and a stage 142 on which the substrate 5 is seated. The stage 142 faces substantially parallel to the showerhead 132.

After the substrate 5 is seated on the upper surface of the stage 142 of the susceptor, when the gas in the reaction zone A is forcibly discharged through the outlet 122 and the vacuum atmosphere is formed, the reaction is supplied through the inlet pipe 131. The chemical reaction of the gas forms a thin film on the transparent substrate 5.

In order to more easily generate a chemical reaction with the reactant gas inside the susceptor 140, a heat generating heater 143 is mounted therein to heat the transparent substrate 5.

In the susceptor 140, a ground electrode 144 grounded to the outside is formed. The ground electrode 144 together with the diffuser cover 134 serving as an RF electrode causes plasma of the reaction gas.

For example, a time-varying electric field is generated in the reaction region A by the RF electrode as the second electrode connected to the ground electrode 144 and the RF power source 170 as the first electrode grounded in the chemical vapor deposition apparatus. The plasma is generated by supplying the reaction gas to the reaction region A to dissociate the molecules of the reaction gas. Such a method is a capacitively coupled plasma (CCP) generation method, and various other methods may be used to generate the plasma.

Hereinafter, a four-part structure shower head according to an embodiment of the present invention will be described in detail with reference to FIGS. 4 to 9.

4 and 5 are plan views showing the coupling state and the pre-engagement state of the shower head having a quadrant structure according to the embodiment of the present invention, respectively, and showing the bottom surface of the shower head. The bottom of the shower head is the face of the shower head opposite the substrate.

6 and 7 are cross-sectional views illustrating a coupling state and a pre-coupling state of a shower head having a four-divided structure according to an embodiment of the present invention, respectively. It is a figure which shows along FIG.

8 and 9 are cross-sectional views illustrating enlarged and pre-engaged states of the shower head having a four-divided structure according to the embodiment of the present invention, respectively, in FIGS. 6 and 7. Is an enlarged view.

As shown in Figs. 4 and 5, the shower head 132 is divided into first, second, third and fourth divisions 132a, 132b, 132c, and 132d. Each of the first, second, third, and fourth divisions 132a, 132b, 132c, and 132d includes two neighboring sides including edges of the shower head 132.

On the other hand, the shower head may be divided into four different forms as shown in Figs. For example, it may be divided into four sections along the long side or the short side of the shower head.

As shown in Figs. 6 and 7, each of the first and second divisions 132a and 132b includes divided first and second injectors 133a and 133b and first and second diffuser covers 134a and 134b. .

Although not shown, the third and fourth divisions (see 132c and 132d of FIG. 3) also include divided third and fourth injectors and third and fourth diffuser covers.                     

As shown in FIGS. 8 and 9, the contact surfaces 135a and 135b of the first and second injectors 133a and 133b to which the first and second divisions 132a and 132b are coupled and in contact have a step corresponding to each other. To have. That is, the protruding surface 137a of the contact surface 135a of the first injector corresponds to the concave indentation surface 137b of the contact surface 135b of the second injector to be contacted at the time of engagement, and the recessed surface of the first injector contact surface 135a ( 138a corresponds to the protruding surface 138b of the contact surface 135b of the second injector and is in contact with each other when engaged. The stepped surface 136a of the first injector contact surface 135a corresponds to the protruding surface 136b of the contact surface 135b of the second injector to be contacted when engaged.

8 and 9 illustrate that the contact surfaces 135a and 135b of each of the first and second injectors have one corresponding step, but may have a plurality of steps. In the case of having a plurality of steps, the area of the contact surface is increased so that the shower head internal space S can be tightly sealed.

In addition, a concave concave groove 139 is formed in the protruding surface 137b of the contact surface 135b of the second injector. The recessed groove 139 is formed along the longitudinal direction of the contact surface 135b of the second injector. A sealing means 155 is inserted into the concave groove 139 to seal the shower head internal space S more firmly. When the inner space S is effectively sealed, the reaction gas located in the inner space during the thin film deposition may be prevented from leaking into the reaction space along the bonding surface of the partition. The sealing means 155 is made of, for example, a sealing material such as a nonferrous metal and rubber having a heat resistance.

On the other hand, the contact surfaces of the first and second diffuser covers 134a and 134b are flat without steps.

Although not shown, the engaging portion of the second, third, third, fourth, fourth, and first divisions has the same coupling structure as that of the aforementioned first and second divisions, respectively. For example, the fourth and first division parts are coupled to correspond to the first and fourth division parts shown in FIGS. 7 and 8, respectively.

In the exemplary embodiment of the present invention as described above, the shower head is divided into four, but may have a multi-division structure of two or more.

The present invention is configured by dividing the shower head mounted on the chemical vapor deposition apparatus into a plurality of partitions. Therefore, in the manufacturing of the shower head, since each of the divided parts is manufactured separately, the supply and demand of raw materials is easy, and the flexibility of changing the size of the shower head can be secured with respect to the change of the substrate size. In addition, when a defect occurs in a part of the shower head during the process, the manufacturing cost may be reduced by replacing the partition in which the defect occurs.

Embodiment of the present invention as described above is an example of the present invention, various modifications are possible. It is apparent to those skilled in the art that such modifications fall within the scope of the present invention, within the scope included in the spirit of the present invention.

The present invention is configured by dividing the shower head mounted on the chemical vapor deposition apparatus into a plurality of partitions. Therefore, in the manufacturing of the shower head, since each of the divided parts is manufactured separately, the supply and demand of raw materials is easy, and the flexibility of changing the size of the shower head can be secured with respect to the change of the substrate size. In addition, when a defect occurs in a part of the shower head during the process, the manufacturing cost may be reduced by replacing the partition in which the defect occurs.

Claims (10)

An injector having a plurality of injection holes for uniformly injecting the reaction gas onto the substrate, and a diffuser cover covering the injector, and formed by combining n (n ≧ 2) divided parts divided in a plane; The i-th and j-th divisions coupled to each other of the n divisions each have an i-th injector and a diffuser cover, a j-th injector and a diffuser cover, and the contact surfaces of the i-th injector and the j-th injector correspond to one or more steps Shower head for chemical vapor deposition apparatus having a. delete The method of claim 1, The contact surface of the j th injector has a concave groove recessed therein, and further includes a sealing means inserted into the concave groove. The method of claim 3, wherein The sealing means is a shower head for chemical vapor deposition equipment made of a sealing material comprising a non-ferrous metal, rubber. The method of claim 1, The contact surface of the i-diffuser cover and the j-diffuser cover is a flat shower head, respectively. A chamber body and a chamber lid defining a closed reaction zone; A susceptor having a stage on which a substrate is placed and a support for moving the stage up and down; An injector having a plurality of injection holes for uniformly injecting a reaction gas onto the substrate, a shower head including a diffuser cover covering the injector and having n (n ≧ 2) divided parts divided in a plane; , The i and j divisions coupled to each other among the n divisions of the shower head have an i-th injector and a diffuser cover, and a j-th injector and a diffuser cover, respectively, and the contact surfaces of the i-th injector and the j-th injector correspond to each other. Chemical vapor deposition equipment having one or more steps. delete The method of claim 6, The contact surface of the j-th injector has a recessed groove recessed therein, and further comprises a sealing means inserted into the recess groove. The method of claim 8, The sealing means is a chemical vapor deposition equipment consisting of a sealing material containing a non-ferrous metal, rubber. The method of claim 6, The vapor deposition apparatus of claim 1, wherein the contact surfaces of the i-th diffuser cover and the j-th diffuser cover are flat.

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