KR101094633B1 - Ceramic Organic-Inorganic Hybrid Coating Materials Composed of Metal Oxide Sol for Monolayer Anti-Reflective Film And Fabrication Method Thereof - Google Patents

Abstract

The present invention provides a single layer coating composition for an antireflection film which exhibits a reflective film characteristic of a multilayer structure by applying a single layer by adjusting the orientation of nanoparticles composed of heterogeneous inorganic materials with a linearly polarized ultraviolet light photoresponsive liquid crystal polymer, and a method of manufacturing the same. An object of the present invention is to provide a produced antireflection film. The present invention is a high refractive index backbone acrylic oligomer comprising a first inorganic material; A low refractive index main chain acrylic oligomer comprising a second inorganic material; And a linearly polarized ultraviolet response liquid crystal polymer solution, wherein the refractive index of the acrylic oligomer is controlled by the refractive indices of the first and second inorganic fine particles. According to the present invention, a liquid crystal may be provided with an antireflection film having different refractive indices by applying a single layer by combining inorganic particles having different compositions and a linearly polarized ultraviolet response liquid crystal polymer solution.

Description

Organic-Inorganic Hybrid Coating Materials Composed of Metal Oxide Sol for Monolayer Anti-Reflective Film And Fabrication Method Thereof}

The present invention relates to a cathode ray tube (CRT), a liquid crystal display (LCD), a plasma display panel (PDP), a field emission display of an all-flat computer monitor or television as a display device. The present invention relates to an organic-inorganic hybrid coating composition for a single layer antireflective film used in an emission display (FED) and the like and a manufacturing method thereof.

Such as cathode ray tubes (CRTs), liquid crystal displays (LCDs), plasma display panels (PDPs), and field emission displays (FEDs) in fully flat computer monitors and televisions. The display device is mostly used in an environment where external light is incident, regardless of indoor / outdoor, and therefore, an image is inevitable due to the external light. Due to this phase condensation, problems such as deterioration of visibility are caused in the screen display device, and various anti-reflection films have been proposed to solve this phenomenon and are widely used.

In the production of the antireflection film, characteristics of light that can reduce reflectance are used, and the characteristics of the antireflection film are induction of diffuse reflection of light on the surface of the display device and offset interference by diffraction of light. The most typical method of inducing diffuse reflection is to provide unevenness to the surface of an image display device. This method is characterized by low cost of manufacturing and is still widely used for manufacturing solar cells and other optical components. However, when the antireflection film using the unevenness is applied to the image labeling device, a problem occurs in the image display depending on the size, height, and shape of the unevenness. In other words, problems with resolution, sharpness, and visibility due to irregularities may occur.

Therefore, the method currently widely used as the method of providing the anti-reflective property of the screen display device uses a destructive interference by diffraction of light, and a film of a multi-layer type is required. Vacuum deposition, sputtering, chemical vapor deposition (CVD), wet coating, etc. are used to manufacture the multilayer antireflection film, and a plurality of materials having different refractive indices are used. Background Art [0002] Film design and fabrication have been carried out to prepare multilayer laminated films of thin films and to reduce reflectance in the visible region. However, dry manufacturing methods such as vacuum deposition, sputtering, and chemical vapor deposition (CVD) have significantly higher equipment and manufacturing costs (vacuum installations, target materials). Therefore, in recent years, the production of an antireflection film using a wet coating in terms of cost has been prevalent.

In general, an antireflection film manufactured by a dry method or a wet coating has a structure in which a hard coat layer, a high refractive layer, and a low refractive layer are sequentially stacked on a transparent substrate such as glass, plastic film, or sheet. Have Conventional multilayer anti-radiation films include zirconium oxide (ZrO ₂ ), titanium dioxide (TiO ₂ ), zinc sulfide (ZnS), antimony trioxide (Sb ₂ O ₃ ), zinc dioxide (Zinc oxide: ZnO ₂ ), indium oxide doped tin (ITO), antimony-tin composite oxide (ATO), titanium-antimony-tin composite oxide (TiO ₂ , Sb doped SnO ₂ ), Various inorganic metals with a refractive index of 1.9 or more such as cerium oxide (CeO), selenium dioxide (SeO ₂ ), dialuminum trioxide (Al ₂ O ₃ ), yttrium trioxide (Y ₂ O ₃ ), and antimony-zinc composite oxide (AZO) The oxide and sulfide particles are usually laminated with a high refractive index layer having a refractive index of 1.6 or more. In the case of the low refractive layer, a layer having a refractive index of 1.3 to 1.5 is laminated on the high refractive layer by using silica (SiO ₂ ), magnesium fluoride (MgF ₂ ), fluoro-resin, or the like. As such, the refractive index of the high refractive index layer and the refractive index of the low refractive layer are limited, respectively, and are stacked in various forms and various combinations according to the antireflection required.

Two factors that are important in the design of antireflective films in the production of multilayer antireflective films are the refractive indices of each layer and the other is the layer thickness of each layer. These two factors can be adjusted to produce the antireflective film with the lowest reflection at the desired wavelength.

Korean Patent Laid-Open Publication No. 1999-0072670 discloses a hard coat film including a buffer layer made of a curable resin of an acrylate-based functional group, and a method of manufacturing the same. Korean Patent Laid-Open Publication No. 2005-0045873 discloses an optical film in which a hard coating layer made of a curable resin layer and an ionizing radiation curable resin using a bifunctional urethane acrylate oligomer having a weight average molecular weight of 3,000 or more is sequentially laminated.

As described above, there are two important factors in the design of the antireflection film in the production of the antireflection film of the multilayer structure, that is, the refractive index of the layer and the thickness of the layer. This is because the multilayer antireflection film is manufactured according to the optical design while controlling the refractive index and thickness of each layer. However, in the manufacture of a multilayer anti-reflection film using a solution coating method, although the layer thickness control technology is at a considerably high level due to the development of various coating techniques, there is a limit in controlling the refractive index itself. Therefore, it has been considered very difficult to implement a multi-layered antireflection film by single coating by the solution coating method. Attempts to overcome the implementation by a single coating of such a multilayer antireflection film structure by chemical means are of great industrial importance.

This chemical approach has led to the latest research trends (see Optical thin-film materials with low reflactive index for broadband elimination of Fresnel reflection, J.-Q. Xi, Martin F. Schubert, Jong Kyu Kim, E.). According to Fred Schubert, Minfeng Chen, Shawn-Yu Lin, W. Liu, JA Smart, Nature Photonics, 2007, 1, 176-179), the pillars of silica and titania are alternately arranged by means of vacuum deposition. A new thin film coating having a refractive index of 1.05 was reported to the academic world, and according to Korean Patent Publication No. 193-0016495, the photopolarized crystal suspension was dispersed into a polymer resin which was not reactive with the suspension composition to form a film by ultraviolet curing (solidification). The manufacturing method for the novel concept variable transmittance film that can realize the liquid crystal characteristics by applying an electric field is disclosed. There are many difficulties in the process to apply to the anti-reflection film production by applying such an electric field. Although the process of applying an electric field to the film manufacturing process is difficult, the application of the process by irradiation of light sources (ultraviolet rays and infrared rays) is common, and infrared (IR) vibrations such as discotic liquid crystals (C6OTP, C4OTP) using triphenylene as a nucleus Japanese Patent Application No. 2005-205242, which is photo-aligned using its characteristics, is a notable feature.

Accordingly, the concept of orienting low molecular liquid crystals by photo-alignment of photosensitive polymers has recently been introduced. Orientation of polymers due to trans-cis photoisomerization of azobenzene as a photo-alignment method has been studied a lot. It is becoming a lot. It has been reported since 2000 that the liquid crystal copolymer of methacrylate having a photosensitive group and methacrylate having a mesogenic group is better in photoalignment than the liquid crystal homopolymer of methacrylate having only a photosensitive group.

In the manufacture of a multilayer antireflection film, it is known that the greater the difference in refractive index between the high refractive index layer and the low refractive index layer, the better the antireflection performance. That is, the higher the refractive index of the high refractive index layer is preferable, for this purpose, inorganic particles having a high refractive index are currently used in the production of the antireflection film. However, in such a high refractive layer, the refractive index is lower than the refractive index of the inorganic particles used because of the distribution shape of the inorganic particles and the resin used for coating.

Therefore, the present inventors adhered to the liquid crystal polymer with titanium dioxide (TiO ₂ ) and silica (SiO ₂ ), which are inorganic nanoparticles having different refractive indices, from each other. Instead of the wet friction method, a photo-alignment method is used to provide a single layer coating composition having vertical reflection film formation having high reflection ring characteristics.

In order to solve the above problems of the prior art, the present invention controls the orientation of nanoparticles composed of heterogeneous inorganic materials with a linearly polarized UV light-responsive liquid crystal polymer, thereby applying a single layer coating to exhibit a reflective film characteristic of a multilayer structure. An object of the present invention is to provide a layer coating composition, a method for producing the same, and an antireflection film produced thereby.

In order to achieve the above technical problem, the present invention, a high refractive index main chain acrylic oligomer comprising a first inorganic material; A low refractive index main chain acrylic oligomer comprising a second inorganic material; And a linearly polarized ultraviolet response liquid crystal polymer solution, wherein the refractive index of the acrylic oligomer is controlled by the refractive indices of the first and second inorganic fine particles.

In the composition of the present invention, the first inorganic material is zirconia, titanium dioxide, zinc sulfide, antimony oxide, ITO, ATO, titanium-antimony-tin composite oxide, antimony-zinc composite oxide (AZO), cerium oxide, selenium dioxide, At least one compound selected from the group consisting of dialuminum trioxide and yttrium trioxide, and the second inorganic material is preferably at least one compound selected from the group consisting of silica and magnesium fluoride.

In addition, the present invention provides a single layer antireflection film formed by applying the above-described composition to a substrate and irradiating with ultraviolet rays.

In addition, to achieve the above another technical problem, the present invention comprises the steps of preparing a high refractive index main chain acrylic oligomer precursor solution comprising a first inorganic particulate sol, a photocurable acrylic resin, a photocuring agent and an organic solvent; UV irradiation of the precursor to prepare a high refractive index backbone acrylic oligomer; Preparing a low refractive index main chain acrylic oligomer precursor solution including a second inorganic fine particle sol, a photocurable acrylic resin, a photocuring agent, and an organic solvent; Irradiating the precursor with ultraviolet rays to prepare a main chain acrylic oligomer for low refractive index; And it provides a method for producing a coating composition for a single layer anti-reflection film comprising the step of mixing the high refractive index and low refractive index acrylic oligomer in a linearly polarized ultraviolet response liquid crystal polymer solution.

In the production method of the present invention, the acrylic resin of the low refractive index main chain acrylic oligomer precursor solution preferably includes a modified silicone acrylate resin containing fluorine.

According to the present invention, a liquid crystal may be provided with an antireflection film having different refractive indices by applying a single layer by combining inorganic particles having different compositions and a linearly polarized ultraviolet response liquid crystal polymer solution.

1 is a schematic cross-sectional view of an antireflection film according to the present invention.
Figure 2 schematically illustrates the principle of a single layer antireflective coating according to the present invention.
3 is a graph showing the reflective properties of a single layer antireflective coating according to the present invention.

Hereinafter, the present invention will be described in detail by explaining preferred embodiments of the present invention.

The antireflective film coating composition of the present invention comprises a heterogeneous inorganic material, a resin containing an acrylic group, a curing agent having a functional group capable of reacting with an acrylic group, and an organic solvent.

More specifically, 10 to 15 parts by weight of inorganic particles having different compositions with respect to 100 parts by weight of solvent, 10 to 50 parts by weight of a resin containing acryl-fluorine-modified silicone, and a vertical orientation in which high and low refractive index nanoparticles are fixed Regarding the composition for coating a single layer for manufacturing an antireflection film comprising 5 to 10 parts by weight of a linearly polarized ultraviolet light photoresponsive liquid crystal polymer capable of controlling film formation and 2 to 10 parts by weight of an ultraviolet polymerization initiator capable of initiating polymerization of an acryl group. will be.

Specific examples of the inorganic material included in the composition of the present invention include zirconium dioxide (ZrO ₂ ), titanium dioxide (TiO ₂ ), zinc sulfide (ZnS), and antimony trioxide (Sb ₂ O ₃ ) , Zinc oxide (ZnO ₂ ), indium tin oxide (ITO), antimony-tin composite oxide (ATO), titanium-antimony-tin composite oxide (TiO ₂ , Sb doped SnO ₂ ), cerium oxide (CeO), selenium dioxide (SeO ₂ ), dialuminum trioxide (Al ₂ O ₃ ), yttrium trioxide (Y ₂ O ₃ ), antimony-zinc composite oxide (AZO), and the like. , At least one of these inorganic oxides is selected and used by mixing two or more different kinds.

These inorganic particles can control the refractive index of the composition after curing with a relatively small amount of addition to 1.5 or more, but it is more preferable to use conductive metal oxide particles having a refractive index of 1.9 or more in order to impart an antireflective function and an antistatic function. Specifically, it is preferable to use zirconium dioxide, tin oxide, antimony-tin composite oxide, titanium dioxide, zinc dioxide, indium-tin composite oxide, and the like.

The amount of the inorganic oxide particles is preferably added in an amount of 10 to 50 parts by weight of the total coating liquid, and more preferably in an amount of 25 to 35 parts by weight, based on 100 parts by weight of the solvent.

The average size of the inorganic oxide particles to easily achieve the object of the present invention is in the range of 10 ~ 100nm, more preferably 15 ~ 70nm. In particular, when the particle size range exceeds 100 nm, it becomes difficult to uniformly disperse the inorganic oxide particles in the laminate of the antireflective film, and there is a fear that the inorganic oxide particles precipitate in the coating liquid composition, resulting in a lack of storage stability, and the transparency of the obtained antireflection film. This is because the lowering or the haze may rise.

When preparing the composition for coating a single layer of the present invention, the ratio of mixing inorganic oxide particles having different average particle diameters is not particularly limited, and those skilled in the art can be adjusted in any range as necessary. For example, in the inorganic oxide particles exemplified above, particles having an average particle diameter of 15 nm, 25 nm, and 45 nm, respectively, may be mixed in a ratio of 1: 1: 1 to form a composition for coating a single layer.

In the present invention, the ultraviolet light-responsive liquid crystal polymer used in the antireflective film coating composition can be used as the photoresponsive polymer having cinnamoyl group, coumarin group, styrylpyridine group, and has methacrylate (SPMA) and mesogen group. The copolymer of the form obtained by copolymerizing methacrylate (MPMA), a fluorine or cyan-based liquid crystal polymer containing a phenyl group, and a liquid crystal polymer using polyimide can be used alone or in combination of two or more thereof.

In the present invention, the resin used in the antireflection film coating composition may be any of thermosetting and photocurable resins including acrylic groups, and specifically, polyacrylic resins, polyepoxyacrylic resins, polyurethane acrylic resins, and polymethyl resins. Metaacryl-type resin etc. can be used individually or in combination of 2 or more types. The amount of the resin added in the single layer coating composition is added in an amount of 10 to 50 parts by weight based on 100 parts by weight of the solvent in consideration of the adhesion of the single layer coating composition to the hard coat layer. Since the amount of particles relative to each other decreases, it causes a decrease in refractive index, and at the same time, control of the high refractive index becomes difficult. In addition, a modified silicone-acrylate resin containing fluorine may be used as the resin for forming the low refractive index layer in order to induce anisotropy of the liquid crystal polymer.

The curing agent used in the composition for coating a single layer of the antireflective film of the present invention is divided into a thermosetting type and a photosetting type curing agent according to the curing method of the coating layer, and is determined by the curing method of the resin. However, the curing method is not particularly limited. The thermosetting curing agent may be selected from at least one of isocyanate, melamine formaldehyde, urea formaldehyde, polyaziridine, titanate, zirconium composite, and epoxy curing agent. Moreover, as a photocurable hardening | curing agent, a benzene, a benzene ether compound, a benzyl ketal compound, the (alpha)-hydroxyalkyl phenone compound, the (alpha), (alpha)-dialkoxy acetophenone derivative compound, the (alpha)-hydroxy alkyl phenone compound, and the (alpha)-amino alkyl phenone derivative compound , α-hydroxyalkyl phenone polymer compound, acryl phosphine pin oxide compound, halogen compound, phenylglyxoxolate compound, banjophenone derivative compound, thioxanthone derivative compound, 1,2-diketone compound, water-soluble aromatic ketone compound, air Copolymer polymer compounds, amine co-curing agents, or tinanocene compounds are used, and the photo-curable cationic photo-curing agent is a diazonium salt, an iodoim salt, a sulfonium salt , Metal complexes, arylsilanol-aluminum complexes, or pyridinium salts can be used. The amount of the curing agent used is preferably in the range of 2 to 10 parts by weight based on 100 parts by weight of the solvent, and the addition of a curing agent other than this range causes problems in the hardness of the coating layer due to the difference in degree of curing. Therefore, it is more preferable to use a photocurable hardening | curing agent as a hardening | curing agent used for the single layer coating composition of the antireflective film of this invention.

Specific examples of the organic solvent used in the single layer coating composition of the antireflection film of the present invention include alcohols such as methyl alcohol, ethyl alcohol, isopropyl alcohol, propanol, ketones such as methyl isobutyl ketone and methyl ethyl ketone, and methyl acetate. Esters such as ethyl acetate, aromatic compounds such as toluene, xylene, benzene, and ethers such as diethyl ether, and the like. By using two or more kinds of mixed solvents in the solvent, vertical alignment of the single-layer curable composition is easy and excellent antireflection performance or transparency can be obtained.

1 is a view schematically showing an antireflection film using the coating composition of the present invention. A single layer anti-reflective coating layer (3) formed by forming a conventional hard coating layer (2) on a transparent base film (1), such as glass, plastic film, sheet, and coating and curing the composition of the present invention on the hard coating layer (2). ) Is formed.

2 is a diagram conceptually illustrating the behavior of the composition for coating a single layer of the present invention and the composition after irradiating polarized ultraviolet rays after applying the same. As shown in the left figure, the high refractive index oligomer, the low refractive index oligomer is bonded to each side of the liquid crystal polymer, the liquid crystal is oriented when the applied film is irradiated with ultraviolet rays, the low refractive index oligomer containing a fluorine group Oriented to come to the surface.

Example

Preparation of high refractive index backbone acrylic oligomer

First, 12.2 parts by weight of hexamethylcyclotrisiloxane (Hexamethylcyclotrisiloxane), 1,4-bis (hydroxydimethylsilyl) benzene [1,4-Bis (hydroxydimethylsilyl) to synthesize a high refractive index backbone containing a pendant functional group capable of ultraviolet curing ) 9.1 parts by weight of benzene, 10.6 parts by weight of 3-acryloxypropylmethyldimethoxysilane, 10.0 parts by weight of n-butylacrylate, 3.0 parts by weight of ultraviolet photoinitiator (Ciba-Geigy), and an average particle diameter of 30 nm. TiO ₂ nano sol (trade name of Dio Co., Ltd .: 20 wt% of NanoX sol solids) was mixed with 45 parts by weight of methyl ethyl ketone (MEK) and exposed to an ultraviolet irradiation device (10 minutes, 10 mW / cm ² at 365 nm). 100 parts by weight of oligomers of a high refractive backbone were synthesized. The molecular weight of the high refractive index backbone is about Mw 30,000 ~ 45,000, the refractive index is 1.9 ~ 2.2 (25 ^° C), the viscosity is 400 ~ 500 cps (25 ^° C).

Preparation of low refractive index backbone acrylic oligomer

The low refractive index main chain is 16.6 parts by weight of n-butylacrylate, 2,2,3,3,4,4,4-heptafluorobutylacrylate (2,2,3,3,4,4 , 4-heptafluoro butyl acrylate) 8.1 parts by weight, 2-hydroxyethyl acrylate (5.0 parts by weight), 1-hexane thiol (4.1 parts by weight), t-butylperoxybenzoate (t- butylperoxybenzoate) 2.2 parts by weight, 19.0 parts by weight of SiO ₂ nanosol (20 wt% of NanoX sol solids) of DIO having an average particle diameter of 20 nm was added to 45 parts by weight of methyl ethyl ketone (MEK) to perform room temperature polymerization. To synthesize 100 parts by weight of the low refractive index main chain oligomer. The product has a molecular weight of about 400 to 600 Mw, a refractive index of 1.2 to 1.4 (25 ^o C) and a viscosity of 400 to 500 cps (25 ^o C).

Preparation of Coating Composition

4-10 parts by weight of the polyimide linearly polarized ultraviolet-responsive liquid crystal polymer solution was added to 100 parts by weight of the mixed solution in which the high refractive index and the low refractive index main chain acrylic oligomer were mixed at a weight ratio of 1: 1 to complete the final coating composition. The mixing ratios of the coating compositions used in Examples 1 and 2 are shown in Table 1.

Preparation of Anti-Reflection Film

Subsequently, the coating composition was placed on the surface of PET film (Toray Saehan) as a base film and uniformly applied so that the thickness of the hard coating layer after curing by using a bar coater (6-14 # bar) was 5 占 퐉. 40W / cm ^2, a polarized ultraviolet ray of light conditions of 1mJ / cm ² 30 ^o angles of incidence, and dried (80 ~ 130 ℃) for 30 to 180 seconds in the pre-irradiation with the ultraviolet ray region to the. After drying, a single layer anti-reflection film was prepared by UV curing using a mercury lamp under a condition of illuminance of 80 W / cm ² and light quantity of 400 mJ / cm ² , and the results of the measurement of the physical properties are shown in Table 1 below.

Comparative Example 1

As shown in Table 1, a hard coating film was prepared in the same manner as in Example, except that the polyimide linearly polarized ultraviolet response liquid crystal polymer solution was not used for the high refractive index and low refractive index mixed solution. After the preparation, the physical properties thereof were measured and the results are shown in Table 1 together.

Comparative Example 2

As shown in Table 1 below, after purchasing a commercially available antireflection film (Toray Saehan) manufactured with the composition of the multilayer film (high refractive layer and low refractive layer), the physical properties thereof were measured and the results are shown in Table 1 below. Indicated.

[Measurement of physical properties]

(1) Haze and transmittance: The haze and transmittance were measured using a Nippon Denshoku Kogyo Co.

(2) Reflectance: Measured using a UV-vis spectrophotometer (Perkin-Elmer). The sample for measurement was prepared as follows. The back side of the coated side of the sample was polished with sandpaper (# 1000) and then flat black paint was applied to minimize the reflected light on the back side of the sample. The reflectance was measured by integrating a sphere with the light inclined by 8 ° and measuring the total sum of the reflectance values. The average reflectance was measured using the average number of visible light regions.

(3) Scratches: After rubbing in 10 round trips with a load of 1000 g using steel wool, it was determined whether or not scratches.

(4) Pencil hardness: Using a pencil hardness tester (Shinto Scientific, Heidon) with a Mitsubishi evaluation pencil was drawn 10 times five times at a load of 1kg / cm ² and confirmed the presence of a wound.

3 is a graph measuring reflection characteristics of the films 31 and 32 made of the coating composition of the present invention. In FIG. 3, 32 shows the film reflection characteristic before ultraviolet irradiation, and 31 shows the film reflection characteristic after ultraviolet irradiation. For reference, the reflective properties 34 of the conventional multilayer reflective coating composition and the reflective properties 33 of the one-component ceramic wet coating are shown together. As shown, in the case of the film 31 made of the composition of the present invention, the reflectance is low, and it can be seen that it exhibits uniform reflection characteristics in a wide wavelength band (broadband).

Claims (5)

A high refractive index backbone acrylic oligomer comprising a first inorganic material;
A low refractive index main chain acrylic oligomer comprising a second inorganic material; And
Contains a linearly polarized ultraviolet response liquid crystal polymer solution,
The refractive index of the acrylic oligomer is a coating composition for a single layer antireflection film, characterized in that controlled by the refractive index of the first and second inorganic fine particles.
The method of claim 1,
The first inorganic material is zirconia, titanium dioxide, zinc sulfide, antimony trioxide, ITO, ATO, titanium-antimony-tin composite oxide, antimony-zinc composite oxide (AZO), cerium oxide, selenium dioxide, aluminum trioxide and trioxide At least one compound selected from the group consisting of yttrium, and the second inorganic material is at least one compound selected from the group consisting of silica and magnesium fluoride. The single layer antireflection film formed by irradiating the composition of Claim 1 to ultraviolet rays. Preparing a high refractive index main chain acrylic oligomer precursor solution comprising a first inorganic particulate sol, a photocurable acrylic resin, a photocuring agent, and an organic solvent;
UV irradiation of the precursor to prepare a high refractive index backbone acrylic oligomer;
Preparing a low refractive index main chain acrylic oligomer precursor solution including a second inorganic fine particle sol, a photocurable acrylic resin, a photocuring agent, and an organic solvent;
Irradiating the precursor with ultraviolet rays to prepare a main chain acrylic oligomer for low refractive index;
Method for producing a coating composition for a single layer anti-reflection film comprising the step of mixing the high refractive index and low refractive index acrylic oligomer in a linearly polarized ultraviolet response liquid crystal polymer solution. The method of claim 4, wherein
The acrylic resin of the low-refractive index main chain acrylic oligomer precursor solution is a fluorine-modified silicone acrylate resin, the coating composition production method for a single layer antireflection film.

Images