KR101001028B1 - Liquid crystal device display and the fabrication method thereof - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and to a liquid crystal display device capable of driving a liquid crystal even in a low temperature environment and a manufacturing method thereof.

The present invention provides a liquid crystal display device and a method of manufacturing the same, which can be driven in a cryogenic environment by applying a current by forming a conductive material on a color filter substrate and using the same as a heat generating layer in the liquid crystal display device.

In addition, the present invention does not need to provide a separate heating layer by using the black matrix of the upper substrate as a heating layer has the effect of reducing the manufacturing cost.

In addition, the liquid crystal display device having a built-in heater as in the present invention can use the liquid crystal display device well even in an extremely low temperature environment, thereby improving the product reliability of the user and improving the use environment.

Heating layer, low temperature drive, black matrix, silver dot (Ag dot)

Description

Liquid crystal display and its manufacturing method

1 is a schematic cross-sectional view of a liquid crystal display device having a conventional built-in heater.

2 is a partial cross-sectional view of a liquid crystal display according to an exemplary embodiment of the present invention.

3 is a process flowchart showing a process of manufacturing a color filter substrate of a liquid crystal display according to the present invention.

4 is a partial cross-sectional view of a liquid crystal display according to another exemplary embodiment of the present invention.

5 is a partial cross-sectional view of a liquid crystal display according to another exemplary embodiment of the present invention.

<Description of Signs of Major Parts of Drawings>

201, 301, 401, 202, 302, 402: substrate

210, 310, 410: upper substrates 212, 312, 412: black matrix

214, 314, 414: color filter 230, 330, 430: lower substrate

216, 316, 416: common electrode 232, 332, 432: gate electrode                 

234, 334, and 434 gate insulating films 236a, 336a, and 436a active layer

236b, 336b, and 436b: ohmic contact layer 238, 338, and 438: source electrode

240, 340, 440: drain electrodes 242, 342, 442: protective layer

244, 344, 444: drain contact holes 248, 348, 448: pixel electrodes

250, 350, 450: liquid crystal layer 252, 352, 452: silver contact point (Ag)

271, 371: heating layer 272, 372: buffer layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and to a liquid crystal display device capable of driving a liquid crystal even in a low temperature environment and a manufacturing method thereof.

Recently, with the rapid development of the information society, there is a need for a flat panel display having excellent characteristics such as thinning, light weight, and low power consumption. Among them, a liquid crystal display having excellent color reproducibility, etc. displays are actively being developed.

In general, a liquid crystal display device is formed by arranging two substrates having electrodes formed on one surface thereof so that the surfaces on which the two electrodes are formed face each other, injecting a liquid crystal material between the two substrates, and then applying voltage to the two electrodes. By moving the liquid crystal molecules by an electric field, the device expresses an image by the transmittance of light that varies accordingly.                         

Liquid crystal displays may be formed in various forms. Currently, an active matrix LCD (AM-LCD) having a thin film transistor and pixel electrodes connected to the thin film transistors arranged in a matrix manner has excellent resolution and video performance. It is the most noticeable.

The liquid crystal display has a structure in which a pixel electrode is formed on a lower array substrate and a common electrode is formed on a color filter substrate, which is an upper substrate, and drives liquid crystal molecules by an electric field in a direction perpendicular to an up and down substrate. to be. This is excellent in characteristics such as transmittance and aperture ratio, and the common electrode of the upper plate serves as a ground, thereby preventing the destruction of the liquid crystal cell due to static electricity.

When the polycrystalline liquid crystal display device configured as described above is driven at cryogenic temperatures, the image quality is poor because it is out of the driving range of the liquid crystal.

As described above, a transparent electrode is formed on the entire surface of the substrate as a built-in heater so as to be driven at a low temperature.

1 is a schematic cross-sectional view of a liquid crystal display device having a conventional built-in heater.

As shown in FIG. 1, the liquid crystal 133 is formed between the upper plate 150 and the lower plate 100, and a heating layer 110 is formed on the lower plate 100 using a transparent conductive electrode. .

The transparent conductive electrode may include indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO), and the like.                         

A buffer layer 111 having excellent thermal conductivity is formed on the heat generating layer, and a TFT array 120 is sequentially formed on the buffer layer 111.

As such, the heat generating layer 110 formed on the lowermost layer on the lower plate 100 is made of a transparent conductive electrode, and when current is applied from the outside, current flows to the transparent conductive electrode to generate heat.

However, in the case of a polycrystalline silicon liquid crystal display device, a high temperature process is essential in the process of forming a thin film transistor array like a crystallization process.

The transparent conductive electrode pre-formed with the heat generating layer has a problem in that damage occurs in a high temperature crystallization process which is performed in a subsequent process.

SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, which can be driven in a cryogenic environment by forming a conductive material on a color filter substrate in a liquid crystal display device and applying a current to the heat generating layer.

In order to achieve the above object, the present invention is a liquid crystal display device comprising an array substrate and a color filter substrate facing each other at a predetermined interval, and a liquid crystal layer formed between the substrate, the heat generating layer and the heat generation in the color filter substrate And a connection structure for applying a current to the layer.

The array substrate may have a gate wiring, a data wiring, and a thin film transistor formed at the crossing point, which cross each other to define pixels.

The color filter substrate may include a heat generating layer formed on the substrate; A buffer layer formed on the heat generating layer; A plurality of black matrices formed on the buffer layer; Red (R), green (G), and blue (B) color filters positioned between the black matrix; And a common electrode positioned on the color filter.

The color filter substrate may include a heat generating layer formed on one surface of the substrate; A plurality of black matrices formed on the other side of the substrate; Red (R), green (G), and blue (B) color filters positioned between the black matrix; And a common electrode positioned on the color filter.

The connection structure is characterized in that the silver contact (Ag dot) connecting the heating layer and the pad portion of the array substrate.

The heat generating layer is characterized by consisting of a transparent conductive electrode.

The heating layer is formed of any one material of indium tin oxide (ITO), indium zinc oxide (IZO), and indium tin zinc oxide (ITZO).

The heat generating layer is characterized by using a black matrix.

The black matrix is characterized in that the conductive material.

The heat generating layer is characterized in that it is driven at a voltage DC 5V or more.

The thickness of the heat generating layer is characterized in that several hundred kPa.                     

In addition, in order to achieve the above object, the manufacturing method of the liquid crystal display device according to the present invention is a liquid crystal display device comprising an array substrate and a color filter substrate facing each other at regular intervals, and a liquid crystal layer formed between the substrates. And forming a heat generating layer and a connection structure for applying current to the heat generating layer on the color filter substrate.

The color filter substrate may include forming a heating layer on the substrate; Forming a buffer layer on the heat generating layer; Forming a plurality of black matrices on the buffer layer; Forming red (R), green (G), and blue (B) color filters located between the black matrices; And forming a common electrode disposed on the color filter.

The color filter substrate may include forming a heating layer on one surface of the substrate; Forming a plurality of black matrices on the other side of the substrate; Forming red (R), green (G), and blue (B) color filters located between the black matrices; And forming a common electrode disposed on the color filter.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

<First Embodiment>

2 illustrates a partial cross-sectional view of an LCD according to an exemplary embodiment of the present invention.                     

As shown, the upper and lower substrates 210 and 230 are spaced apart from each other by a predetermined distance, and the liquid crystal layer 250 is interposed between the upper and lower substrates 210 and 230.

A gate electrode 232 is formed on the transparent substrate 201 of the lower substrate 230, a gate insulating film 234 is formed on the gate electrode 232, and a gate electrode on the gate insulating film 234. The semiconductor layer 236 in which the active layer 236a and the ohmic contact layer 236b are stacked in this order is formed at a position covering the 232, and the source and drain spaced apart from each other by a predetermined interval on the semiconductor layer 236. Electrodes 238 and 240 are formed, and a channel (ch; channel) exposing a portion of the active layer 236a is formed in the interval between the source and drain electrodes 238 and 240, and the gate electrode 232 is formed. The semiconductor layer 236, the source and drain electrodes 238 and 240, and the channel ch form a thin film transistor T.

Although not shown in the drawings, a gate line is formed in a first direction by being connected to the gate electrode 232, and a data line is formed in a second direction crossing the first direction and is connected to the source electrode 238. The area where the gate and the data line cross each other is defined as the pixel area P. FIG.

In addition, a passivation layer 242 having a drain contact hole 244 is formed on the thin film transistor T, and is connected to the drain electrode 240 in the pixel region P through a drain contact hole 244. The pixel electrode 248 is formed.

A heating layer 271 made of a conductive electrode is formed below the transparent substrate 201 of the upper substrate 210, and a buffer layer 272 is formed on the heating layer 271. have.                     

In addition, a color filter layer 214 is formed on the buffer layer 272 to filter only light of a specific wavelength band at a position corresponding to the pixel electrode 248, and a light leakage phenomenon and a thin film are formed at each color boundary of the color filter layer 214. A black matrix 212 is formed to block the influx of light to the transistor T.

A common electrode 216, which is another electrode for applying a voltage to the liquid crystal layer 250, is formed under the color filter layer 214 and the black matrix 212.

In addition, a silver contact point (Ag) 252 is dotting at a predetermined position between the upper and lower substrates 210 and 230 to be connected to the pad portion of the lower substrate to apply a signal to the heating layer.

In this case, the illustrated silver contact point 252 is for applying a signal to the heating layer 271. In addition, although not shown, a silver contact Ag for applying a signal to the common electrode 216 of the upper substrate is provided. It is provided separately.

Therefore, the silver contact 252 that applies current to the heat generating layer 271 is not connected to the common electrode 216.

Although not shown in the drawings, portions of the upper and lower substrates 210 and 230 that contact the liquid crystal layers 250 may further include upper and lower alignment layers to easily induce alignment of liquid crystals.

As such, when the heat generating layer 271 is formed on the upper substrate 210, the liquid crystal display may be normally driven even at a low temperature outside the driving range of the liquid crystal without affecting the transmittance and the aperture ratio of the liquid crystal display.                     

3 is a process flowchart illustrating a process of manufacturing a color filter substrate of a liquid crystal display according to the present invention.

As shown in FIG. 3A, a transparent conductive material is deposited on the transparent substrate 201 to form a heating layer 271.

The transparent conductive material includes indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO), and the like.

Subsequently, as shown in FIG. 3B, a buffer layer 272 having excellent thermal conductivity is formed as an insulating film on the heat generating layer 271.

The buffer layer 272 is later patterned to form a silver contact Ag for applying current to the heat generating layer 271.

As illustrated in FIG. 3C, a plurality of black matrices 212 are formed on the buffer layer 272 by being spaced apart from each other at a predetermined interval, and red, green, and blue color filters are disposed in the intervals between the black matrices 212. 214 is formed repeatedly.

The red, green, and blue color filters 214 selectively transmit light to express colors, and the black matrix 212 prevents color separation and light leakage by color.

The material forming the black matrix 212 is selected from a carbon-based organic material.

In this case, since the surface of the color filter 214 is uneven and the planarization property thereof is deteriorated, a separate overcoat layer may be formed on the color filter to compensate for this problem.

Subsequently, the common electrode 216 for driving the liquid crystal is formed on the entire surface of the substrate.

Here, the silver contact 252 is doped to apply a current to the heat generating layer 271, where the silver contact for applying the Vcom signal to the common electrode 216 is also doped separately.

Therefore, the current applied through the pad portion of the lower substrate 230 is applied to the heat generating layer 271 of the upper substrate through the silver contact 252 to generate heat.

&Lt; Embodiment 2 >

4 is a cross-sectional view of a liquid crystal display according to another exemplary embodiment of the present invention.

As shown in FIG. 4, since the structure of the liquid crystal display is the same as that described with reference to FIG. 2, detailed description of the same elements will be omitted.

A heat generating layer 371 made of a transparent conductive electrode is formed on the outer surface of the lower substrate 310 on which the color filter layer composed of the color filter 314 and the black matrix 312 is formed.

Third Embodiment

 5 is a cross-sectional view of a liquid crystal display according to another exemplary embodiment of the present invention.

As shown in FIG. 5, the heat generating layer 471 is formed using the black matrix 412 formed on the upper substrate 410.

Since the black matrix 412 includes a chromium (Cr) component, the black matrix 412 may generate heat when a current is applied.

A plurality of black matrices 412 are formed on the transparent substrate 401 by being spaced apart from each other by a predetermined interval, and red, green, and blue color filters 414 are repeatedly formed in the intervals between the black matrices 412. have.

The red, green, and blue color filters 414 selectively transmit light in order to express colors, and the black matrix 412 serves to prevent color separation and light leakage by color.

The material constituting the black matrix 412 is selected from a material containing a chromium (Cr) component.

In addition, the black matrix 412 allows one side of the black matrix where the silver contact point 452 is formed to contact the silver contact point so that a current can be applied from the pad portion of the lower plate.

In this case, since the surface of the color filter 414 is uneven and the planarization property thereof is deteriorated, a separate overcoat layer may be formed on the color filter to compensate for this problem.

Subsequently, the common electrode 416 for driving the liquid crystal is formed on the entire surface of the substrate.

Here, the black matrix 412 is used as a heat generating layer, and the silver contact 452 is doped to apply a current to the black matrix 412.                     

At this time, the silver contact for applying the Vcom signal to the common electrode 416 is also separately doped, so that there is no portion in contact with the black matrix 412.

Accordingly, the current applied through the pad portion of the lower substrate is applied to the heat generating layer of the upper substrate 410, that is, the black matrix 412 through the silver contact 452 to generate heat.

A gate electrode 432 is formed on the transparent substrate 402 of the lower substrate 430 facing the upper substrate 410, and a gate insulating layer 434 is formed on the gate electrode 432. The semiconductor layer 436 in which the active layer 436a and the ohmic contact layer 436b are sequentially stacked is formed at a position covering the gate electrode 432 on the gate insulating layer 434. Source and drain electrodes 438 and 440 spaced apart from each other are formed on the upper portion, and a channel (ch; channel) exposing a part of the active layer 436a is exposed in the separation section between the source and drain electrodes 438 and 440. The gate electrode 432, the semiconductor layer 436, the source and drain electrodes 438 and 440, and the channel ch form a thin film transistor T.

In addition, a passivation layer 442 having a drain contact hole 444 is formed on the thin film transistor T, and is connected to the drain electrode 440 through the drain contact hole 444 in the pixel region P. The pixel electrode 448 to be formed is formed.

Although the present invention has been described in detail through specific embodiments, this is for explaining the present invention in detail, and a liquid crystal display and a method of manufacturing the same according to the present invention are not limited thereto. It is apparent that modifications and improvements are possible by those skilled in the art.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display, and by forming a heat generating layer on an upper substrate, the liquid crystal can be driven even in a low temperature environment, thereby improving the reliability of the product.

In addition, the present invention does not need to provide a separate heating layer by using the black matrix of the upper substrate as a heating layer has the effect of reducing the manufacturing cost.

In addition, the liquid crystal display device having the built-in heater as in the present invention can use the liquid crystal display device even in an extremely low temperature environment, thereby improving the user's use environment.

Claims (18)

In a liquid crystal display device comprising an array substrate and a color filter substrate facing each other at a predetermined interval, and a liquid crystal layer formed between the substrates, A connection structure for applying a current to the heating layer and the heating layer in the color filter substrate, And the connection structure is an Ag dot connecting the heating layer to the pad of the array substrate. The method of claim 1, And the array substrate has a gate wiring, a data wiring, and a thin film transistor formed at the crossing point, which cross each other to define pixels. The method of claim 1, The color filter substrate, A heat generating layer formed on the substrate; A buffer layer formed on the heat generating layer; A plurality of black matrices formed on the buffer layer; Red (R), green (G), and blue (B) color filters positioned between the black matrix; And a common electrode disposed on the color filter. The method of claim 1, The color filter substrate, A heating layer formed on one surface of the substrate; A plurality of black matrices formed on the other side of the substrate; Red (R), green (G), and blue (B) color filters positioned between the black matrix; And a common electrode disposed on the color filter. delete The method of claim 1, And the heat generating layer is formed of a transparent conductive electrode. The method of claim 1, The heating layer is formed of any one of indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO). The method of claim 1, And the heat generating layer uses a black matrix. The method of claim 8, And the black matrix is a conductive material. The method of claim 1, And the heat generating layer is driven at a voltage of DC 5V or higher. delete In a liquid crystal display device comprising an array substrate and a color filter substrate facing each other at a predetermined interval, and a liquid crystal layer formed between the substrates, Forming a heat generating layer and a connection structure for applying a current to the heat generating layer on the color filter substrate; And forming an Ag dot connecting the heating layer to the pad portion of the array substrate. The method of claim 12, The color filter substrate, Forming a heating layer on the substrate; Forming a buffer layer on the heat generating layer; Forming a plurality of black matrices on the buffer layer; Forming red (R), green (G), and blue (B) color filters located between the black matrices; Forming a common electrode on the color filter; and manufacturing the liquid crystal display device. The method of claim 12, The color filter substrate, Forming a heating layer on one surface of the substrate; Forming a plurality of black matrices on the other side of the substrate; Forming red (R), green (G), and blue (B) color filters located between the black matrices; Forming a common electrode on the color filter; and manufacturing the liquid crystal display device. delete The method of claim 12, The heat generating layer is a method of manufacturing a liquid crystal display device, characterized in that the transparent conductive electrode. The method of claim 12, The heating layer is a method of manufacturing a liquid crystal display device, characterized in that formed of any one of indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO). The method of claim 12, And the heat generating layer uses a black matrix.

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