KR100990381B1 - 휴대 전자기기 케이스의 고기능 블랙칼라 코팅층과코팅방법 및 그 장치 - Google Patents
휴대 전자기기 케이스의 고기능 블랙칼라 코팅층과코팅방법 및 그 장치 Download PDFInfo
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- KR100990381B1 KR100990381B1 KR1020070141493A KR20070141493A KR100990381B1 KR 100990381 B1 KR100990381 B1 KR 100990381B1 KR 1020070141493 A KR1020070141493 A KR 1020070141493A KR 20070141493 A KR20070141493 A KR 20070141493A KR 100990381 B1 KR100990381 B1 KR 100990381B1
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- thin film
- coating
- film layer
- chromium
- electronic device
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/4697—Generating plasma using glow discharges
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- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
- 휴대용 전자기기 케이스 표면(10)에 이온 플레이팅방법을 통해 크롬 박막층(20)을 증착시킴에 있어서,상기 이온 플레이팅을 이용한 크롬 박막층(20)을 형성할 때 요구되는 활성가스분위기는 아르곤 가스 분위기에서 실시하는 것과;상기 크롬 박막층(20)위에 아르곤 가스와 질소 가스의 비가 100:30으로 혼합된 활성가스분위기에서 크롬 질화물 박막층(30)을 추가로 더 증착하는 것과;상기 크롬 박막층(20), 크롬 질화물 박막층(30) 위에 아르곤 가스와 아세틸렌 가스의 비가 100:30으로 혼합된 활성가스분위기에서 크롬 카바이드 박막층(40)을 추가로 더 증착하는 것과;상기 크롬 박막층(20), 크롬 질화물 박막층(30), 크롬 카바이드 박막층(40) 위에 아르곤 가스와 아세틸렌 가스, 질소 가스의 비가 100:30:10으로 혼합된 활성가스분위기에서 크롬 질화 카바이드 박막층(50)을 추가로 더 증착하는 것과;상기 크롬 질화 카바이드 박막층(50) 표면에 지문방지, 표면조도 향상을 위해 폴리머 계열 투명 수지의 표면마감층(60)을 디핑방법으로 더 증착하여 마감하는 것;을 특징으로 한 휴대 전자기기 케이스의 고기능 블랙칼라 코팅방법.
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KR1020070141493A KR100990381B1 (ko) | 2007-12-31 | 2007-12-31 | 휴대 전자기기 케이스의 고기능 블랙칼라 코팅층과코팅방법 및 그 장치 |
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KR1020070141493A KR100990381B1 (ko) | 2007-12-31 | 2007-12-31 | 휴대 전자기기 케이스의 고기능 블랙칼라 코팅층과코팅방법 및 그 장치 |
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KR20090073525A KR20090073525A (ko) | 2009-07-03 |
KR100990381B1 true KR100990381B1 (ko) | 2010-10-29 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102282175B1 (ko) | 2021-04-12 | 2021-07-28 | 인터테크 주식회사 | 블랙 색상 코팅박막을 갖는 자동차용 부품 및 블랙 색상 코팅방법 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101252568B1 (ko) * | 2012-03-12 | 2013-04-09 | 유흥상 | 핸드폰 케이스 블랙색상코팅방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS60224773A (ja) * | 1984-04-24 | 1985-11-09 | Seiko Epson Corp | 装飾用部品 |
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Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS60224773A (ja) * | 1984-04-24 | 1985-11-09 | Seiko Epson Corp | 装飾用部品 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102282175B1 (ko) | 2021-04-12 | 2021-07-28 | 인터테크 주식회사 | 블랙 색상 코팅박막을 갖는 자동차용 부품 및 블랙 색상 코팅방법 |
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KR20090073525A (ko) | 2009-07-03 |
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