KR100971511B1 - Substrate tray, apparatus for manufacturing LCD and method of transporting substrate using the same - Google Patents

Abstract

The present invention includes a frame surrounding the opening portion of the substrate is placed, the susceptor passes while moving up and down; A movement support connected to the frame to support a substrate at the opening; It provides a substrate tray comprising a movement support drive means for moving the movement support.

In another aspect, the present invention provides an LCD manufacturing apparatus for transporting a substrate using such a substrate tray, the load lock chamber for temporarily storing the substrate; A buffer chamber connected to one side of the load lock chamber and temporarily storing a substrate; Provided is an LCD manufacturing apparatus including a process chamber connected to the load lock chamber or the buffer chamber and including a susceptor on which a substrate is placed.

The present invention also provides a method for transporting a substrate using a substrate tray, and a method for placing or separating the substrate in the substrate tray.

According to the present invention, it is possible to remove the lift pin from the susceptor of the process chamber, to prevent the film quality degradation due to the pin mark, to significantly improve the production per hour, as well as to reduce the manufacturing cost of the equipment.

Board Tray, Moving Support, Roller, Lift Pin, LCD

Description

Substrate tray, apparatus for manufacturing LCD and method for transferring substrate using same {Substrate tray, apparatus for manufacturing LCD and method of transporting substrate using the same}             

1 is a block diagram of a conventional cluster

2 is a cross-sectional view of the load lock chamber;

3 to 5 are cross-sectional views illustrating a process of loading a substrate in a conventional process chamber.

6 is a block diagram of an LCD manufacturing apparatus according to an embodiment of the present invention

7 and 8 are a perspective view and a plan view of a substrate tray according to an embodiment of the present invention

9 is a detailed configuration of the moving support

10 is a configuration diagram showing a step formed in the frame

11 is a configuration diagram showing a roller guide groove formed in the frame

12 to 14 is a configuration diagram of the moving support drive means

15 to 18 is a block diagram showing the movement of the susceptor detection rod according to the movement of the susceptor in the substrate tray according to the present invention

19 and 20 are a cross-sectional view and a plan view of a process chamber included in the LCD manufacturing apparatus according to the present invention.

21 and 22 are cross-sectional views showing the substrate is loaded in the process chamber

23 is a plan view of a load lock chamber and a buffer chamber included in the LCD manufacturing apparatus according to the present invention;

24 and 25 are plan views showing the types of substrate trays to be loaded in the load lock chamber.

26 and 27 are cross-sectional view showing a horizontal roller in the load lock chamber in the vertical movement

28 is a cross-sectional view showing a holder insertion groove formed in the substrate tray.

29 to 36 are diagrams showing the process of replacing the four substrates

37 is a plan view illustrating the substrate loading unit and the tray storage unit;

38 to 40 are diagrams showing a state in which the substrate is placed in the substrate tray in the substrate loading unit

* Description of the symbols for the main parts of the drawings *

100: process chamber 110: susceptor

112: susceptor protrusion 120: gas supply pipe

130: showerhead 140: shadow frame

142: frame support 150: process chamber door

160, 520: roller 162: roller drive shaft                 

200: load lock chamber 210, 310: second door

220, 320: tray holder 230: third door

240, 340: Horizontal roller 250, 350: Vertical roller

260, 360: vertical roller support 270, 370: horizontal roller support

280: first door 300: buffer chamber

400: tray storage unit 500: substrate loading unit

510: substrate lifting device 600: substrate

700: robot arm 800: substrate tray

810: frame 812: step

814: roller insertion groove 816: holder insertion groove

820: opening 830: moving support

831: support rod 832: moving support roller

833: slip guard 840: first guide groove

850: insertion groove 860: second guide groove

870; Third guide groove 880: susceptor detection rod

910: drive gear 920: first pulley

922: 3rd pulley 930: planetary gear

940: driven gear 950: second pulley

960: first connection line 970: second connection line

972: 3rd connecting line 981, 982, 983: 1, 2, 3 pulley                 

990: spring

The present invention relates to a substrate tray for loading a substrate and an LCD manufacturing apparatus for transporting the substrate using the substrate tray.

In general, to manufacture a substrate, a thin film deposition process for depositing a dielectric material or the like on a substrate as a thin film, a photolithography process for exposing or concealing a selected region of the thin films using a photosensitive material, and a thin film of the selected region The etching process of removing and patterning as desired and the cleaning process to remove residues should be repeated several times.

In addition, each of these processes must be carried out in a process chamber in which an optimal environment for the process is established. In particular, in recent years, a plurality of process chambers for processing a large amount of substrates in a short time, and transfer the substrates to the process chamber or Clusters are frequently used as a hybrid apparatus including a transfer chamber for returning and a load lock chamber for temporarily storing a substrate and connected to the transfer chamber. Process chambers constituting such clusters include process chambers such as plasma chemical vapor deposition (PECVD) and dry etching (Dry Etcher).

1 illustrates a schematic configuration of a general cluster, in which a cluster includes a load lock chamber 20, a transfer chamber 40, and a plurality of process chambers 30, and the load lock chamber 20 includes a plurality of load lock chambers 20. It is connected to the substrate storage 10 capable of loading the substrate 50.

The transfer chamber robot arm 42 is installed in the transfer chamber 40 to transfer the substrate 50 between the load lock chamber 20 and the process chamber 30, and the substrate storage unit 10 has a substrate 50. ) Into the load lock chamber 20 or the storage robot arm 12 is installed to carry the substrate 50 from the load lock chamber 20.

On the other hand, if necessary in the process, some of the process chamber 30 may be used as a preheating chamber for preheating the substrate before bringing the substrate into the process chamber, the number of the load lock chamber 20 or the process chamber 30 Can vary.

FIG. 2 is a cross-sectional view illustrating the load lock chamber 20 used in such a cluster, in which the storage robot arm 12 rests the substrate 50 on the plate 26 and the plate 26. On the upper surface of the substrate supporting pins 21 for placing the substrate 50 protrude. Reference numerals 22 and 24 denote storage doors and a transfer chamber door, respectively.

3 shows a schematic configuration of a conventional process chamber 30, and a process chamber door 32 through which a substrate enters and exits by a robot arm is formed on one side wall, and a susceptor for placing the substrate therein and moving up and down. (31), a gas inlet pipe (35) connected to an external gas tank to introduce a process gas, and a shower connected to the gas inlet pipe (35) to uniformly inject the process gas into the process chamber (30). A head 36 and a shadow frame 34 positioned on the frame support 33 on the inner wall of the process chamber 30 are included. In addition, although not shown, the PECVD apparatus may include an RF power source and an RF electrode for plasma generation.                         

Meanwhile, a plurality of lift pin holes 38 are formed in the susceptor 31, and the lift pins 37 protrude upward through the lift pin holes 38.

4 illustrates a state in which the transfer chamber robot arm 42 carries the substrate 50 into the process chamber 30 and rests on the lift pin 37.

5 shows the susceptor 31 ascending and loading the substrate 50 to the upper process position. The shadow frame 34 is raised while pressing the edge of the substrate 50 during the ascending.

Hereinafter, a process of loading the substrate 50 of the substrate storage unit 10 to the process position of the process chamber 30 will be described with reference to FIGS. 1 to 5.

First, the storage robot arm 12 carries the substrate 50 into the load lock chamber 20 from the substrate storage unit 10, where the load lock chamber 20 is at atmospheric pressure, and the transfer chamber side door 24 is moved. ) Is in the closed state.

When the substrate 50 is seated on the plate 26, and the storage robot arm 12 exits from the load lock chamber 20, the storage side door 22 is closed and the inside of the load lock chamber 20 is vacuumed. Venting is carried out to make the furnace.

When the inside of the load lock chamber 20 is in the same vacuum as the process chamber 30 or the transfer chamber 40, the transfer chamber side door 24 is opened, and the transfer chamber robot arm 42 is the plate 26. Transfer the unprocessed substrate 50 in the process chamber 30.

When the substrate 50 is brought into the process chamber 30, the susceptor 31 is positioned at the home position as shown in FIG. 3, and when the susceptor 31 is at this position, the substrate 50 is supported. The lift pin 37 protrudes upward from the susceptor 31 through a lift pin hole 38 formed in the susceptor 31.

After the transfer chamber robot arm 42 rests the substrate 50 on the lift pins 38 and exits the process chamber 30, the process chamber door 32 closes and the susceptor moves the substrate to the process position. 31 is raised, the upward movement of the susceptor 31 is made by a driving device not shown.

As the susceptor 31 rises, the head of the lift pin 37 is caught by the latching jaw of the lift pin hole 38 so that the substrate 50 comes into close contact with the susceptor 31. On the other hand, when the lift pin 37 is driven by a separate driving device, in addition to the above method, the lift pin 37 on which the substrate 50 is placed is lowered to lower the substrate 50 onto the upper surface of the susceptor 31. It can be enshrined.

As the susceptor 31 is further raised, the shadow frame 34 lying on the frame support 33 on the inner wall of the process chamber 30 is raised to the process position while pressing the edge of the substrate 50 together. Shown in 5. The shadow frame 34 prevents rocking of the substrate 50 during the process and prevents burning of the back surface of the substrate 50.

After the substrate 50 placed on the susceptor 31 is raised to the process position as described above, the necessary process is performed to exhaust the residual gas through the exhaust port not shown, and to carry out the substrate 50. This is in reverse order.

That is, as the susceptor 31 descends, the shadow frame 34 is positioned on the frame support 33 again, and when the susceptor 31 descends to the home position, the susceptor 31 protrudes toward the upper part of the susceptor 31. The substrate 50 is separated from the susceptor 31 by the lift pin 37. Next, when the transfer chamber robot arm 42 enters the process chamber 30 and takes out the substrate 50, and is placed on the plate 26 of the load lock chamber 20, the storage robot arm 12 is moved. This is carried out to the substrate storage unit 10.

In the case of processing the substrate through such a process in the conventional cluster, the throughput per hour (throughput), as shown in Figure 1, assuming that it is composed of six process chambers, one transfer chamber, one load lock chamber, 1500mm × The sixth generation substrate having a size of 1850 mm is about 50 sheets, and the seventh generation substrate having a size of 1870 mm x 2200 mm reaches about 40 sheets.

By the way, in the cluster having such a configuration, the transfer chamber 40 not only has the largest price share in the entire equipment, but also has the largest occupied area. Recently, the transfer chamber has also grown due to the large area of the substrate. Not only did the overall price of equipment increase significantly, but the size of the transfer chamber caused a big problem in air transportation.

As a result, equipment manufacturers are actively engaged in research efforts to lower equipment prices, improve production per hour, and minimize the size of equipment.

On the other hand, the process chamber 30 in the conventional cluster configuration has a lift pin 37 in the susceptor 31 to settle the substrate 50 in the susceptor 31 or to carry the substrate 50 out of the process chamber 30. However, the temperature difference caused by the pin scratch of the back surface of the substrate 50 caused by the lift pin 37 or the difference in thermal conductivity between the lift pin 37 and the susceptor 31 is bad in the process uniformity. Since it affects the film quality of the board | substrate 50, the situation is also required to provide the improvement plan.

The present invention has been made to solve such a problem, and to provide an LCD manufacturing apparatus capable of improving the hourly yield of a large area LCD substrate and eliminating the lift pin of the susceptor.

In order to achieve the above object, the present invention includes a frame surrounding the opening portion of which the edge of the substrate is placed and the susceptor passes while moving up and down; A movement support connected to the frame to support a substrate at the opening; It provides a substrate tray comprising a movement support drive means for moving the movement support.

The height of the frame provides a substrate tray that is 50mm or more and 200mm or less.

First guide grooves are formed on opposite first inner walls of the frame to insert and move both ends of the moving support, and a second inner wall adjacent to the first inner wall is connected to the first guide grooves. And a substrate tray having an insertion groove into which the moving support drawn by the moving support driving means is inserted.

A second guide groove is formed in the first inner wall of the frame in the movement direction of the susceptor, and a third guide groove is formed in each of the inner walls of the second guide groove in the movement direction of the susceptor; Provide a tray.

A substrate tray having a curved portion formed on an upper portion of the third guide groove is provided.

The inner side of the upper edge of the frame provides a substrate tray which is formed with a step for placing the substrate.

The lower portion of the frame provides a substrate tray is formed with a roller guide groove is inserted into the roller is rotated.

A lower portion of the frame provides a substrate tray in which a cradle insertion groove into which a portion of the tray cradle is inserted is formed.

The movable support provides a substrate tray including a plurality of freely rotating rollers, and a support rod penetrating the rollers.

The movable support provides a substrate tray consisting of two.

The distance between the moving support is provided with a substrate tray of 500mm or more and 1000mm or less.

The diameter of the support bar provides a substrate tray that is 5mm or more and 20mm or less.

The movable support drive means, the susceptor detecting means for moving up and down by the susceptor; A first pulley; A first connection line connecting the susceptor detecting means and the first pulley and wound around the first pulley; A drive gear coupled to the first pulley and coaxial; A driven gear driven by the drive gear; A second pulley coupled coaxially with the driven gear; A second connection line having one end connected to a second pulley and the other end connected to the moving support; A spring coupled to the drive gear to give a restoring force to the drive gear; Provided is a substrate tray comprising a moving support restoring means for restoring the moving support to a set position.

The susceptor detecting means may include a second guide groove formed on the first inner wall in the movement direction of the susceptor, and a third guide groove formed on the inner walls of the second guide groove facing each other in the movement direction of the susceptor. In each of the frames formed, both ends are inserted into the third guide groove to move up and down by a susceptor, one end is provided to the substrate tray is a susceptor sensing rod connected to the first connecting line.

A substrate tray is provided between the drive gear and the driven gear, where a planetary gear is positioned to match the rotational direction of the drive gear and the driven gear.

The moving support restoring means provides a substrate tray including a third pulley which is coaxially coupled to the drive gear, and a third connection line connecting the third pulley and the moving support.

The third pulley provides a substrate tray integrally formed with the first pulley.

A part of the first connection line, the second connection line, or the third connection line is provided with a substrate tray to which a pulley fixed to the frame is coupled.

The moving support restoring means provides a substrate tray including a spring having one end connected to an end of the moving support and the other end connected to the frame.

The present invention also provides a load lock chamber for temporarily storing a substrate; A buffer chamber connected to one side of the load lock chamber and temporarily storing a substrate; Provided is an LCD manufacturing apparatus including a process chamber connected to the load lock chamber or a buffer chamber and including a susceptor on which a substrate is placed.

In the load lock chamber and the buffer chamber, there is provided an LCD manufacturing apparatus is provided with a plurality of rollers for transporting the substrate tray.

The plurality of rollers provide an LCD manufacturing apparatus consisting of one or more horizontal rollers and one or more longitudinal rollers.

Some of the plurality of rollers provide an LCD manufacturing apparatus to which a roller driving shaft is connected.

An interior of the load lock chamber and the buffer chamber is provided with an LCD manufacturing apparatus in which at least one tray holder is mounted on a substrate tray and moves up and down.

The load lock chamber and the buffer chamber provide an LCD manufacturing apparatus in which the same number of tray holders are installed.

The tray holder provides an LCD manufacturing apparatus is installed four.

One side of the buffer chamber provides an LCD manufacturing apparatus connected to the second buffer chamber.

In the process chamber, there is provided an LCD manufacturing apparatus in which a plurality of rollers for transporting the substrate tray are installed around the susceptor.

Some of the plurality of rollers provide an LCD manufacturing apparatus to which a roller driving shaft is connected.

The susceptor provides an LCD manufacturing apparatus in which a protrusion is formed to vertically move the susceptor detecting rod of the substrate tray.

The process chamber provides four LCD manufacturing apparatus.

On one side of the load lock chamber, there is provided an LCD manufacturing apparatus connected to the substrate loading unit for placing an unprocessed substrate in the substrate tray or to separate the substrate from the substrate tray.

The substrate loading unit provides an LCD manufacturing apparatus including a substrate lifting apparatus for vertically moving the substrate holding the substrate, and a plurality of rollers for transporting the substrate tray.

The plurality of rollers provide an LCD manufacturing apparatus including one or more horizontal rollers and one or more longitudinal rollers.

One side of the substrate loading unit, a substrate cassette for storing a plurality of substrates, and a substrate storage unit including a robot arm for transporting the substrate between the substrate cassette and the substrate loading unit provides an LCD manufacturing apparatus.

On the other side of the substrate loading unit, there is provided an LCD manufacturing apparatus for storing one or more substrate trays, the tray storage unit including a plurality of rollers for transporting the substrate tray therein.

The substrate loading unit provides an LCD manufacturing apparatus including a rotation means for rotating the loaded substrate tray.

In another aspect, the present invention provides a LCD manufacturing apparatus comprising the steps of: carrying a substrate tray on which an unprocessed substrate is placed into the load lock chamber; Transferring a substrate tray on which a substrate having finished processing is placed, from the process chamber to the buffer chamber; It provides a substrate transfer method using a substrate tray comprising the step of transferring the substrate tray on which the substrate is finished, the substrate tray from the buffer chamber to the load lock chamber.

The step of bringing the substrate tray on which the unprocessed substrate is placed into the load lock chamber provides a method of transferring a substrate using a substrate tray that carries two or more substrate trays on which the unprocessed substrate is placed.

After transferring the substrate tray in which the substrate having finished the process is placed in the buffer chamber, the substrate tray further comprising the step of transferring the substrate tray on which the unprocessed substrate is placed from the load lock chamber to the process chamber Provided is a substrate transfer method.

After the step of bringing the substrate tray in which the unprocessed substrate is placed into the load lock chamber, there is provided a substrate transfer method using a substrate tray for venting the load lock chamber into a vacuum state.

Transferring the substrate using a substrate tray for pumping to bring the load lock chamber to atmospheric pressure after the step of bringing the substrate tray, the substrate tray having the process is completed into the load lock chamber from the buffer chamber Provide a method.

In another aspect, the present invention provides a substrate loading unit comprising: a substrate tray being loaded from a tray storage unit connected to one side of the substrate loading unit; A robot arm having a substrate placed therein from the substrate storage portion connected to the other side of the substrate loading portion and positioned above the substrate tray; Lifting a substrate lifting device through the opening of the substrate tray to separate the substrate from the robot arm; Exiting the robot arm; The substrate lifting apparatus is lowered to provide a method of placing a substrate in a substrate tray comprising the step of placing the substrate in the substrate tray.

In another aspect, the present invention provides a substrate loading unit comprising: a substrate tray having a substrate having a process completed therefrom being loaded from a load lock chamber; Lifting a substrate lifting device through the opening of the substrate tray to separate the substrate from the substrate tray; A robot arm entering from a substrate storage portion connected to one side of the substrate loading portion and positioned at a lower portion of the substrate lifting apparatus; Placing the substrate on the robot arm while the substrate lifting device is lowered; The robot arm provides a method of carrying out a substrate from a substrate tray comprising the step of carrying out the substrate to the substrate storage.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

Figure 6 schematically shows the configuration of the LCD manufacturing apparatus according to the present invention, the process chamber 100 is connected to the opposite side of the load lock chamber 200, the buffer chamber for exchanging the substrate on one side ( 300 is connected, and the process chamber 100 is also connected to the opposite side of the buffer chamber 300.

The substrate loading part 500 is connected to the other side of the load lock chamber 200, and the substrate loading part 500 serves to exchange the load lock chamber 200 and the substrate 600. That is, in the substrate loading unit 500, when the substrate 600 is loaded from the cassette (not shown) by the robot arm 700, the substrate loading unit 500 is placed in the substrate tray supplied from the tray storage unit 400, or the load lock chamber is finished after the process. Unloading the substrate 600 in the substrate tray taken out from the (200).

Although the drawing shows that the process chamber 100 is located only on opposite sides of the buffer chamber 300, the process chamber may be connected to the remaining empty side. In addition, two or more buffer chambers may be configured according to the number of substrates to be exchanged.

Comparing this system configuration with the conventional cluster, it can be seen that the transfer chamber and the transfer chamber robot arm were omitted while the buffer chamber 300 was newly introduced. It is based on the premise of moving inside.

Therefore, hereinafter, the substrate tray which is a means for transporting the substrate in the LCD manufacturing apparatus according to the present invention will be described first, and then each component of the system will be described in detail.

7 and 8 illustrate a perspective view and a plan view of a substrate tray 800 according to an embodiment of the present invention. The substrate tray 800 includes a frame 810 having a substrate placed on an upper surface thereof, and the frame 810. It is configured to include a moving support 830 connected to support the center portion of the substrate.

Since the frame 810 is a portion where the edge of the substrate is placed, the size or shape may vary depending on the substrate to be placed. In addition, since the opening portion 820 formed in the center is a space where the susceptor passes while moving up and down, the shape of the frame 810 or the opening portion 820 preferably has a square shape. It may vary. A plurality of first guide grooves 840 in a transverse direction are formed on the first inner side walls of the frame 810, and both ends of each moving support 830 are inserted into the first guide grooves 840. Done. In order to stably hold the substrate even while the moving support 830 moves, it is preferable to form the first guide groove 840 horizontally, but the slope may be formed to some extent.

An insertion groove 850 is formed in the second inner wall of the frame 810 adjacent to the first inner wall to insert the moving support 830 moved from the set position of the opening 820.

Meanwhile, a second guide groove 860 is formed in the first inner wall in the movement direction of the susceptor, and a third guide groove 870 is in the movement direction of the susceptor in the opposite inner wall of the second guide groove 860. Both ends of the susceptor detecting rod 880 are inserted into the third guide groove 870 to move up and down by the susceptor. The upper portion of the third guide groove 870 is curved, which is to provide a space from which the susceptor detecting rod 880 moves upward by the susceptor to escape from the upper surface of the susceptor. do.

Since the frame 810 should be located between the susceptor and the upper process position in the process chamber, the height is preferably limited to within 200 mm, and in order to convert the vertical motion of the susceptor protrusion into the movement of the moving support, at least 50 mm. It is preferable to have the above height, but is not necessarily limited thereto.                     

Moving support 830 is composed of a support rod 831 and a plurality of rollers 832 coupled to the support rod 831, the roller 832 is fixed to the support rod 831 to rotate with the support rod 831 Although FIG. 9 is configured to rotate freely apart from the supporting rod 831 as shown in FIG. 9, it is preferable to install anti-slip 833 at both edges of the roller to fix the position of the roller 832. . In addition, although only one moving support 830 may be installed, it is preferable to configure two to support the substrate on the upper surface stably.

In the case where two moving supporters 830 are provided, it is preferable that the distance between each moving supporter 830 is set within a range of 500 mm to 1000 mm. This is because the risk of breakage increases.

For example, a 7th generation substrate (1870 mm * 2200 mm) is preferably maintained at about 600 mm to about 700 mm between the moving support 330. If the distance is maintained at 650 mm, the moving support 830 may vary depending on the type of substrate. The substrate appears to sag by about 10 mm to 30 mm, which is not a problem in the process.

The moving support 830 also has a longer length as the substrate becomes larger, and the bending occurs due to the weight of the substrate placed on the upper surface and its own weight.

As a result of the experiment, the diameter of the supporting rod 831 was found to be preferably 5 mm or more and 20 mm or less, because when it is too thin, it interferes with the process due to the bending, and when the thickness is too thick, the load on the driving means becomes large.

On the other hand, since the substrate tray 800 moves the inside of the apparatus while the substrate is placed on the upper surface, a step 812 is formed inside the upper surface of the frame in order to secure the substrate more stably so that the substrate is placed there. You may. In addition, since the inside of the apparatus is moved using a roller, it is preferable that a roller guide groove 814 is inserted into the lower surface as shown in FIG. 11.

The driving force for driving the moving support 830 from the set position located in the center of the opening portion 820 to the insertion groove 850 of the inner wall, which is the home position, is provided through the moving support driving means. Like the dotted line 8, the movable support unit is formed inside the frame 810.

In addition, in the drawing, one moving support unit is configured to be connected to each end of the moving support 830. However, the present invention is not limited thereto, and one driving means may be connected to both ends of the moving support 830. .

12 and 13 illustrate a cross section according to AA of FIG. 7 to illustrate the moving support drive means according to an embodiment of the present invention, and FIG. 12 shows a set of moving supports 830 in the middle of the opening 820. FIG. 13 shows the moving support 830 being pulled toward the home position of the inner wall of the frame 810. 14 is a cross-sectional view taken along line B-B of FIG. 13.

According to the drawings, the moving support drive means is supported by the susceptor to move up and down, the susceptor detection rod 880, the first pulley 920, the susceptor detection rod 880 and the first movement A first connecting line 960 connecting the first pulley 920, a drive gear 910 coupled to the first pulley 920, and a driven gear 940 receiving rotational force from the drive gear 910; , A second pulley 950 coupled to the driven gear 940 coaxially, a second connection line 970 connected to the second pulley and the other end connected to the moving support 830, and a driving gear 910. And a spring 990 coupled to the driving gear 910 for restoring the driving gear 910, and moving support returning means for returning the moving support 830 to its original set position.

In the drawing, since the planetary gear 930 located between the driving gear 910 and the driven gear 940 is to match the rotation direction of the driving gear 910 and the driven gear 940, the planetary gear 930 is omitted. In this case, the second connection line 970 should be wound as opposed to the case where the planetary gear 930 is present.

In order to allow the first connection line 960 to smoothly rotate the driving gear 910 by using the upward motion of the susceptor detecting rod 880, the first pulley 981 in the middle of the first connection line 960 as shown in the drawing. ) Is preferable.

In addition, in order to convert the rotational movement of the driven gear 950 into the horizontal movement of the movable support 830, the second connecting line 970 is provided with a second pulley 982 in the middle of the second connecting line 970 as shown in the figure. It is desirable to.

Referring to the operation sequence of the movable support drive means having such a configuration, in the state in which the movable support 830 is in the set position in the middle of the opening portion 820, the susceptor detecting rod 880 moves upward by the susceptor. Start, the first connection line 960 connected to the susceptor detecting rod 880 rotates the first pulley 920 and the drive gear 910 at the same time, the rotational force of the drive gear 910 is a planetary gear 930 Rotating the driven gear 940 and the second pulley 950 through the), and the second connecting line 970 is wound around the second pulley 950, the moving support 830 of the inner wall of the substrate tray 800 It is pulled toward the home position.

On the contrary, when the susceptor detecting rod 880 moves downward, the driving gear 910 rotates in the opposite direction due to the restoring force of the spring 990, so that the second connecting line 970 pulling the movable support 830 may be rotated. When the tension is released, the movable support 830 is returned to the original set position by the above-mentioned restoring means.

12 to 14 restore the moving support by the third pulley 922 coupled to the drive gear 910 and coaxially, and the third connecting line 972 connecting the third pulley 922 and the moving support 830. The third connecting line 972 connected to the third pulley 922 sets the movable support 830 as the driving gear 910 reverses as the susceptor detecting rod 880 moves downward. Pulled. Similarly to the second connection line 970, the third connection line 972 smoothly converts the rotational movement of the drive gear 910 into the horizontal movement of the movement support 830, as shown in the middle of the third connection line 972. It is preferable to provide the 3rd pulley 983 in the side.

According to FIG. 14, the third pulley 922 is positioned on the opposite side of the first pulley 920 based on the driving gear 910. However, since the third pulley 922 is only an example, the first pulley 920 and the third pulley 922 are provided. It may be located on the same side or formed integrally.

In addition, the third pulley 922 and the third connecting line 972 are omitted, and one end is connected to the moving support 830 and the other end constitutes the moving support return means by a spring fixed to the inner wall of the frame, thereby driving the gear 910. It is also possible to anticipate a method of restoring the moving support 830 to the set position using only the restoring force of the spring, without using the reverse rotational power of.

Meanwhile, in order to horizontally move the movable support 830 from the vertical movement of the susceptor detecting rod 880 by the required distance, the gear ratio of the drive gear 910 and the driven gear 940 or the first and second pulleys 920 and 950 may be adjusted. The diameter should be appropriately adjusted, which is typical and thus the detailed description will be omitted.

The vertical movement of the susceptor detecting rod 880 is made by the protrusion 112 attached to the side of the susceptor 110 which is raised and lowered through the center opening of the substrate tray 800, FIGS. 15 to 18. As such, the susceptor detecting rod 880 is moved by the vertical movement of the susceptor 110, and the substrate 600 is placed on the upper surface of the susceptor 110.

First, after the substrate 600 is placed in the substrate tray 800, when the susceptor 110 positioned below the substrate tray 800 is raised, the protrusion 112 formed on a part of the side surface of the susceptor 110 is formed. Ascending along the second guide groove 860 formed on the inner wall of the substrate tray 800. (FIG. 15)

The susceptor protrusion 112 raises the susceptor detecting rod 880 along the third guide groove 870 formed on the inner wall of the second guide groove 860 facing the susceptor detecting rod 880. As it rises, the movable support 830 is horizontally moved by the driving mechanism as described with reference to FIGS. 12 and 13 and inserted into the insertion groove 850 of the inner wall of the substrate tray 800, and simultaneously supported by the movable support. The substrate 600 is placed on the upper surface of the susceptor 110 rising while sagging downward from the center portion (FIG. 16).

Before and after the movement point 830 is completely inserted into the insertion groove which is the home position, the substrate 600 is completely in close contact with the susceptor 110 (FIG. 17).

On the other hand, the susceptor detecting rod 880 continues to rise along the third guide groove 870 by the susceptor protrusion 112, from the upper surface of the susceptor protrusion 112 at the curved portion of the upper end of the third guide groove 870. The susceptor 110 rises to the process position and stays at the upper curved portion until the process is completed (Fig. 18).

When the susceptor 110 is lowered after finishing the process, first, the edge of the substrate 600 is placed on the upper surface of the substrate frame 800, and starts to be separated from the susceptor. It is located on the upper surface of the susceptor protrusion 112 again and descends together, which again becomes as shown in FIG. 16.

As the susceptor detecting rod 880 descends, the driving gear operates in the opposite direction due to the restoring force of the spring connected to the driving gear and the moving support 830, and the moving support 830 is inserted into the inner side of the substrate tray 800. It exits from and moves to the set position toward the open portion 820. The moving support 830 moves to the set position to separate the substrate 600 from the susceptor 110, which may be illustrated as shown in FIG. 15.

The configuration of the substrate tray 800 according to the present invention has been described above. Hereinafter, the LCD manufacturing apparatus using the substrate tray 800 described above and a method of loading or unloading a substrate using the same will be described in detail. Let's do it.                     

19 and 20 are cross-sectional views and a plan view showing the interior of the process chamber 100 according to an embodiment of the present invention, the process chamber 100 is a susceptor 110 for placing a substrate and the transport of the substrate tray A plurality of rollers 160 formed around the susceptor 110, a gas inlet pipe 120 for introducing a process gas into the chamber, and a shower head 130 connected to the gas inlet pipe 120. And a shadow frame 140 for pressing the edges of the substrate when loading the substrate, a frame support 142 installed on the inner wall of the chamber and supporting the shadow frame 140, and a part of the sidewall for accessing the substrate tray. It includes a process chamber door 150 installed in.

A plurality of protrusions 112 are formed on the side of the susceptor 110 to support the susceptor detecting rod 880 of the substrate tray 800 to move up and down.

The plurality of rollers 160 are preferably inserted into the roller guide grooves 814 of the substrate tray and rotated for stable transportation of the substrate tray. In addition, in consideration of the width of the substrate tray frame 810, it is preferable that the rollers 160 are arranged in a row.

In order to actively move the substrate tray, some rollers must be driven by a separate driving device. In the drawing, the roller driving shaft 162 is connected to the roller 160 at the end, but the present invention is not limited thereto. .

Looking at the state in which the substrate 600 is loaded to the process position using the substrate tray 800 in the process chamber 100, first, the roller is loaded from the adjacent load lock chamber 200 or the buffer chamber 300. The substrate tray 800 is positioned on the susceptor 110. (Figure 21)

Next, the process chamber door 150 is closed and the susceptor 110 starts to rise. At this time, the susceptor support rod of the substrate tray 800 is formed by the susceptor protrusion 112 formed on the side of the susceptor 110. 880 also rises with it. The upward movement of the susceptor support rod 880 pulls the movable support 830 to the home position of the inner wall according to the driving mechanism of FIGS. 12 and 13, and the center of the substrate 600 supported by the movable support 830. The portion is placed on the upper surface of the rising susceptor 110.

As the susceptor 110 is raised, the edge of the substrate 600 is separated from the frame 810 of the substrate tray and the entire substrate 600 is placed on the upper surface of the susceptor 110. As the susceptor 110 rises further, the shadow frame 140 rises together to the process position while pressing the edges of the substrate, and the process gas is sprayed through the shower head 130 at the process position to perform the thin film deposition or etching process. (FIG. 22)

After the process is completed, the process proceeds in the reverse order. When the susceptor 110 descends, first, the shadow frame 140 is separated from the substrate 600 while being caught by the frame support 142, and then the substrate 600. The edge of is placed in the frame 810 of the substrate tray. Subsequently, as the susceptor detecting rod 880 descends, the driving gear operates in the reverse direction by the restoring force of the spring connected to the driving gear, and the moving support 830 moves toward the set position of the substrate tray opening 820. ) From the susceptor 110.

When the susceptor 110 is completely lowered to the home position, the process chamber door 170 is opened, and the roller driving shaft 162 is driven again to move the substrate tray 800 on which the substrate is placed, to the adjacent load lock chamber 200 or the buffer. It is carried out to the chamber 300.

FIG. 23 illustrates a plan view of the load lock chamber 200 and the buffer chamber 300 which play an important role in transporting the substrate tray 800 in the LCD manufacturing apparatus according to the present invention.

Looking at the load lock chamber 200 first, a plurality of horizontal rollers 240 and the vertical rollers 250 are disposed therein, the horizontal rollers 240 are supported by the horizontal roller support 270, The longitudinal roller 250 is supported by the longitudinal roller support 260. In this case, unlike the horizontal roller 240, the longitudinal roller 250 has two rollers arranged in pairs, which are different in length from the major axis and the short axis of the substrate tray. The outer longitudinal roller 251 is used to enter the load lock chamber 200 from the side, and the inner longitudinal roller 252 may be used when entering from the short side as shown in FIG.

A roller driving device (not shown) is connected to some of the plurality of rollers as described in the process chamber 100 to control the transport of the substrate tray 800 by driving the rollers.

Meanwhile, in FIG. 23, a plurality of doors are formed on sidewalls of the load lock chamber 220 to serve as passages through which the substrate tray moves. A third door 230 is shown, which is connected to the two doors 210a and 210b and the buffer chamber 300.

At the inner wall edge of the load lock chamber 200, a plurality of tray holders 220 moving up and down while mounting a substrate tray are installed, and the tray holder 220 is provided with a substrate tray between the load lock chamber 200 and the surrounding chamber. It is necessary to exchange, and the specific action will be described later.

Although the buffer chamber 300 is configured separately from the load lock chamber 200, its role is to provide a preliminary space for exchanging the substrate, and thus basically has the same configuration as the load lock chamber 200. That is, it includes a horizontal roller 340, a vertical roller 350, roller supports 360, 370, a plurality of tray holder 320, a plurality of doors (310a, 310b, 310c) connected to the process chamber is formed on the side do.

26 and 27 illustrate cross-sectional views of the load lock chamber 200. In FIG. 26, when the substrate tray moves in the direction of the substrate loading part or the buffer chamber, the vertical roller 250 should be used. ) Is positioned below the longitudinal roller 250, and in Fig. 27, in order to move the substrate tray in the direction of the process chamber on the side of the load lock chamber 200, the horizontal roller 240 must be used. 240 is positioned above the longitudinal roller 250. Thus, in order for the horizontal roller 240 or the vertical roller 250 to move up and down, at least one of the horizontal roller support 260 and the vertical roller support 270 should be able to be driven up and down. For this purpose, a separate driving device is required.

In addition, an alignment groove 816 is formed on the bottom surface of the substrate tray 800 as shown in FIG. 28, and the tray holder 220 moves the substrate tray 800 upward and downward in the load lock chamber 200 or the buffer chamber 300. When moving, it is possible to easily align the substrate tray 800.

In the LCD manufacturing apparatus in which rollers are installed in each chamber for transporting the substrate tray 800 in which the substrate 600 is placed as described above, the process of replacing the substrate 600 will be described with reference to the drawings. .

29 to 36 illustrate a load lock chamber 200 positioned on one side of the substrate loading unit 500 and a buffer chamber adjacent to the load lock chamber 200 in the LCD manufacturing apparatus of FIG. 6. 300 and process chambers 100a, 100b, 100c, and 100d connected to opposite sides of the load lock chamber 200 and the buffer chamber 300, respectively, showing four substrates in four process chambers at once. The process of exchange is shown.

For convenience of description, the substrates 600a, 600b, 600c, and 600d that have been processed in the process chamber 100 are shaded to be distinguished from the unprocessed substrate 600 introduced from the load lock chamber 200. In addition, since the plurality of substrate trays 800 are stacked in the load lock chamber 200 and the buffer chamber 300 up and down, for convenience, the load lock chamber 200 and the buffer chamber 300 are cross-sectional. The process chambers 100a, 100b, 100c and 100d are shown in plan view.

First, in the state where the substrates 600a, 600b, 600c, and 600d which have completed the process and the substrate trays 800a, 800b, 800c and 800d which place the substrates are placed in the process chambers 100a, 100b, 100c and 100d, Four substrate trays 600 in which a new substrate 600 is placed into the load lock chamber 200 are sequentially loaded. In this case, the tray holder 220 is temporarily stored in the upper portion of the load lock chamber 200 in the order of carrying in.

When the substrate tray 800 is carried in, all the doors except the first door that passes through the substrate loading part among the doors of the load lock chamber 200 are closed, and the load lock chamber 200 is at atmospheric pressure. Fig. 29)                     

When the four substrates of the unprocessed substrate 600 are completed, the first door is closed and then vented to make a vacuum state, and after the vacuum atmosphere is formed, a third door communicating with the buffer chamber 300; The second door communicating with the first process chamber 100a is opened. After finishing the process in the first process chamber 100a, the substrate 600a once exits to the load lock chamber 200 and then moves back to the buffer chamber 300. (FIG. 30) In this case, smooth movement of the substrate tray 800a is achieved. The horizontal load rollers 240 and 340 of the load lock chamber 200 and the buffer chamber 300 are shangdong as shown in FIGS. 26 and 27 according to the moving direction of the substrate tray. Is located at the top, and in the case of moving vertically, the longitudinal rollers may be adjusted so as to be located at the top, so a detailed description thereof will be omitted below.

Next, the unprocessed substrate 600 is loaded into the empty first process chamber 100a, and at the same time, the substrate 600b which has finished the process in the second process chamber 100b is taken out through the load lock chamber 200 and the buffer chamber. Transfer to 300, (FIG. 31)

The unprocessed substrate 600 is loaded into the empty second process chamber 100b, and the substrate 600c which has finished the process in the third process chamber 100c positioned at the side of the buffer chamber 300 is buffer chamber 300. Export to (Figure 32).

After completing the process, the substrate 600c is moved to the upper portion of the buffer chamber 300 by using the tray holder 320, and the unprocessed substrate 600 is transferred from the load lock chamber 200 to the buffer chamber 300. Figure 33)

The transferred unprocessed substrate 600 is carried into the empty third process chamber 100c, and at the same time, the finished substrate 600d is taken out of the fourth process chamber 100d.

Subsequently, the last unprocessed substrate 600 remaining in the load lock chamber 200 is loaded into the fourth process chamber 100d via the buffer chamber 300 (FIG. 35), and the tray holder 320 of the buffer chamber 300 is provided. The substrate trays 800a, 800b, 800c, and 800d on which the substrates 600a, 600b, 600c, and 600d that have been mounted are placed are transferred to the load lock chamber.

Subsequently, the door between the load lock chamber 200 and the buffer chamber 300 is closed, and a pumping process for converting the inside of the load lock chamber 200 to an atmospheric pressure state is performed. Then, the substrates 600a and 600b are used by rollers. The substrate trays 800a, 800b, 800c, and 800d having 600 c and 600 d placed therein are sequentially carried out to the substrate loading unit 500.

In the above process, the buffer chamber 300 plays a role similar to that of the load lock chamber 200 as a preliminary space for replacing the substrate, but the venting or pumping process for pressure control is performed only in the load lock chamber 200. There is a difference in that. However, since this is to minimize the space because the internal space must be small to efficiently venting or pumping, it is recommended to perform the venting or pumping operation while opening the door between the buffer chamber 300 and the load lock chamber 200. It is not excluded.

Summarizing the above process of exchanging the substrate, the step of bringing all of the unprocessed substrates into the load lock chamber 200 once, carrying them into the respective process chambers 100 and finishing the process from each process chamber 100 While carrying out the process of carrying out the substrate in parallel, the step of collecting the finished substrate to the buffer chamber 300, and transferring it from the buffer chamber 300 to the load lock chamber 200, and finished the process The substrate is transported from the load lock chamber 200 to the substrate loading part 500, which is similarly applied to the exchange of two substrates.

For example, in FIG. 29, when there are substrates that have finished the process only in the first process chamber 100a and the second process chamber 100b, in order to exchange them with the unprocessed substrate, the unloaded substrate ( 600) two of them are temporarily stored in the upper portion using the tray holder 220, and then the substrate 600a of the first process chamber 100a is moved to the buffer chamber 300 via the load lock chamber 200. Let's do it. Next, one of the unprocessed substrates 600 of the load lock chamber 200 is loaded into the first process chamber 100a and the substrate 600b is taken out of the second process chamber 100b to the buffer chamber 300. The substrate 600 remaining in the load lock chamber 200 is brought into the second process chamber 100b.

After this process, the two unprocessed substrates 600 are placed in the first and second process chambers, respectively, and the two substrates 600a and 600b that have been processed are positioned in the buffer chamber 300. The substrates 600a and 600b that have completed the above process may be moved from the buffer chamber 300 to the load lock chamber 200, and after being pumped to convert to atmospheric pressure, the substrates 600a and 600b may be taken out to the external substrate loading unit 500. .

Meanwhile, in the above-described LCD manufacturing apparatus including four process chambers, one load lock chamber, and one buffer chamber, a process of exchanging four substrates at once is described, but as shown in FIG. When composed of eight process chambers, two load lock chambers, two buffer chambers, and one substrate loading part, the hourly production amount was about 80 sheets based on the seventh generation.

The conventional cluster consisting of six process chambers, one transfer chamber, and one load lock chamber has an installation area similar to that of the system of FIG. 6, but the production per hour is only about 40 sheets. An example is an improvement of about 200% in hourly production.

In addition, even when only two substrates are exchanged, since about 55 sheets are produced per hour, the LCD manufacturing apparatus of the present invention can be said to have significantly improved the yield per hour compared to the conventional cluster method.

FIG. 37 illustrates a plan view of a substrate loading part 500 connected to the load lock chamber 200 and a tray storage part 400 supplying the substrate tray 800 to the substrate loading part 500. The unit 400 may include a plurality of rollers 410 for transporting the substrate tray, and may include a storage cassette (not shown) for storing the substrate tray.

 The substrate loading part 500 supplies a plurality of rollers (not shown) for transporting the substrate tray 800 and a substrate 600 supplied by the robot arm 700 from an external substrate storage part (not shown). It includes a substrate lifting device 510 is received from the robot arm 700 and placed in the substrate tray 800. Since the substrate lifting device 510 is to take over the substrate from the robot arm 700, the substrate lifting device 510 should be a structure capable of moving up and down without contacting the moving support or the robot arm 700 of the substrate tray 800.

Since the substrate loading unit 500 needs to change the movement direction of the substrate tray, it is preferable to include both the horizontal roller and the vertical roller as in the load lock chamber 200. In addition, when the substrate tray in which the substrate is placed in the substrate loading unit 500 enters the load lock chamber 200, as shown in FIG. 24 or FIG. 25, the substrate tray may enter from the long side and from the short side. Therefore, it may be provided with a rotating means for rotating the substrate tray 90 °.

This rotation means is not installed in the substrate loading unit 500, but installed in the tray storage unit 400, the tray storage unit 400 may be expected to be carried in the substrate loading unit 500 after rotating the substrate tray in advance. have.

Referring to the process of placing the substrate in the substrate tray in such a configuration, as shown in Figure 38, when the substrate tray 800 is located in the substrate loading unit 500 from the tray storage unit using the roller 520, the robot arm 700 ) Positions the substrate 600 above the substrate tray 800. Subsequently, as shown in FIG. 39, when the substrate lifting device 510 is raised to separate the substrate 600 from the robot arm 700, and the robot arm 700 exits from the substrate loading unit 500, the substrate lifting device 510 is removed. While the lowering, the substrate 600 placed on the upper surface is placed in the substrate tray 800. (FIG. 40) When the placement of the substrate 600 is completed, the process is performed through the load lock chamber and the process chamber. do.

On the contrary, when the substrate 600 and the substrate tray 800 which have been processed are taken out from the load lock chamber 200 to the substrate loading part 500, the substrate is unloaded in the reverse order of the above process, ie, the substrate loading part 500. When the substrate lifting device 510 is lifted from the lower portion of the substrate tray 800 located at the bottom of the substrate tray 800 to separate the substrate 600 from the substrate tray 800, the robot arm 700 enters the substrate storage part and enters the substrate 600. Located at the bottom Subsequently, as the substrate lifting device 510 is lowered, the substrate 600 is positioned on the robot arm 700, and the robot arm 700 having the substrate 600 placed thereon is placed in a substrate cassette (not shown). You will complete the exchange.

In the above description, the LCD manufacturing apparatus for loading or unloading a substrate using a substrate tray has been described with reference to the arrangement of FIG. 6, but the feature of the present invention omits the transfer chamber and the transfer chamber robot arm in the existing cluster method. In order to lower the manufacturing cost and improve throughput, the arrangement of the process chamber, the load lock chamber, and the buffer chamber can be variously changed, and the change is included in the technical spirit of the present invention.

According to the present invention, it is possible to remove the lift pin from the susceptor of the process chamber, to prevent the film quality degradation due to the pin mark, to significantly improve the production per hour, as well as to reduce the manufacturing cost of the equipment.

Claims (44)

A frame enclosing the edge of the substrate and surrounding the opening through which the susceptor passes while moving up and down; A movement support connected to the frame to support a substrate at the opening; Moving support driving means for moving the moving support Substrate tray comprising a. delete The method of claim 1, First guide grooves are formed on opposite first inner walls of the frame to insert and move both ends of the moving support, and a second inner wall adjacent to the first inner wall is connected to the first guide grooves. And an insertion groove into which the moving support drawn by the moving support driving means is inserted. The method of claim 3, A second guide groove is formed in the first inner wall of the frame in the movement direction of the susceptor, and a third guide groove is formed in the inner wall of the second guide groove in the movement direction of the susceptor, respectively; tray. The method of claim 4, wherein A substrate tray having a curved portion formed on the third guide groove. The method of claim 1, The substrate tray is formed on the inner edge of the upper portion of the frame is a step for placing the substrate. The method of claim 1, Substrate tray is formed in the lower portion of the frame is a roller guide groove is formed by rotating the roller. The method of claim 1, Substrate tray is formed in the lower portion of the frame is a cradle insertion groove for inserting a portion of the tray cradle. The method of claim 1, The moving support is a substrate tray comprising a plurality of freely rotating rollers, and a support rod penetrating the rollers. The method according to claim 1 or 9, The substrate support is composed of two trays. The method of claim 10, The substrate tray has a gap between the moving support is 500mm or more and 1000mm or less. 10. The method of claim 9, The substrate tray has a diameter of 5mm or more and 20mm or less. The method of claim 1, The moving support drive means, Susceptor sensing means for vertically moving by the susceptor; A first pulley; A first connection line connecting the susceptor detecting means and the first pulley and wound around the first pulley; A drive gear coupled to the first pulley and coaxial; A driven gear driven by the drive gear; A second pulley coupled coaxially with the driven gear; A second connection line having one end connected to a second pulley and the other end connected to the moving support; A spring coupled to the drive gear to give a restoring force to the drive gear; Moving support restoring means for restoring the moving support to the set position Substrate tray comprising a. The method of claim 13, The susceptor detecting means, In the frame in which the second guide grooves are formed in the movement direction of the susceptor on the first inner wall, and the third guide grooves are formed in the movement direction of the susceptor, respectively on the inner wall facing each other of the second guide groove. And both ends of the substrate tray being inserted into the third guide groove and vertically moving by a susceptor, and one end of which is a susceptor detecting rod connected to the first connection line. delete delete delete delete The method of claim 13, The moving support restoring means, one end is connected to the end of the movable support, the other end substrate tray comprising a spring connected to the frame. A load lock chamber for temporarily storing a substrate; A buffer chamber connected to one side of the load lock chamber and temporarily storing a substrate; A process chamber connected to the load lock chamber or the buffer chamber and including a susceptor on which a substrate is placed; In order to transport the substrate in the load lock chamber and the buffer chamber, a frame surrounding the substrate, the edge of the substrate is placed, the susceptor is passed through the vertical movement, and connected to the frame and the opening A substrate tray comprising a movement support for supporting the substrate and a movement support driving means for moving the movement support LCD manufacturing apparatus comprising a. 21. The method of claim 20, An LCD manufacturing apparatus, wherein a plurality of rollers are installed in the load lock chamber and the buffer chamber for transporting a substrate tray. The method of claim 21, The plurality of rollers are LCD manufacturing apparatus consisting of one or more horizontal rollers and one or more longitudinal rollers. The method of claim 21 or 22, LCD manufacturing apparatus that the roller driving shaft is connected to some of the plurality of rollers. 21. The method of claim 20, Inside the load lock chamber and the buffer chamber, the LCD manufacturing apparatus is mounted on the substrate tray, one or more tray holder to move up and down. The method of claim 24, LCD manufacturing apparatus, the tray lock chamber of the same number is installed in the load lock chamber and the buffer chamber. The method of claim 24 or 25, Four tray holder is installed LCD manufacturing apparatus. 21. The method of claim 20, LCD manufacturing apparatus connected to the second buffer chamber on one side of the buffer chamber. 21. The method of claim 20, In the process chamber, the LCD manufacturing apparatus is provided with a plurality of rollers for transporting the substrate tray around the susceptor. The method of claim 28, LCD manufacturing apparatus that the roller driving shaft is connected to some of the plurality of rollers. 21. The method of claim 20, The susceptor LCD manufacturing apparatus is formed with a projection for vertically moving the susceptor detection rod of the substrate tray. 21. The method of claim 20, The process chamber is four LCD manufacturing apparatus. 21. The method of claim 20, One side of the load lock chamber, LCD substrate manufacturing apparatus is connected to the substrate loading unit for placing an unprocessed substrate in the substrate tray or separating the substrate from the substrate tray. 33. The method of claim 32, The substrate loading unit includes a substrate lifting device that moves up and down while the substrate is placed, and a plurality of rollers for transporting the substrate tray. 34. The method of claim 33, The plurality of rollers comprises at least one horizontal roller and at least one longitudinal roller. 33. The method of claim 32, One side of the substrate loading portion, a substrate cassette for storing a plurality of substrates, and the LCD substrate manufacturing apparatus connected to the substrate storage including a robot arm for transporting the substrate between the substrate cassette and the substrate loading portion. 33. The method of claim 32, Another side of the substrate loading unit, the LCD manufacturing apparatus connected to a tray storage unit for storing one or more of the substrate tray, the tray storage including a plurality of rollers for transportation of the substrate tray therein. 33. The method of claim 32, The substrate loading unit LCD manufacturing apparatus including a rotating means for rotating the loaded substrate tray. The LCD manufacturing apparatus of claim 20, Bringing a substrate tray having an untreated substrate placed therein into the load lock chamber; Transferring a substrate tray on which a substrate having finished processing is placed, from the process chamber to the buffer chamber; Transferring the substrate tray on which the substrate after processing is placed from the buffer chamber to the load lock chamber; Transfer method of the substrate using a substrate tray comprising a. 39. The method of claim 38, The step of bringing the substrate tray in which the unprocessed substrate is placed in the load lock chamber, the substrate transfer method using a substrate tray for carrying two or more substrate trays in which the unprocessed substrate is placed. 39. The method of claim 38, After transferring the substrate tray in which the substrate having finished the process is placed in the buffer chamber, the substrate tray further comprising the step of transferring the substrate tray on which the unprocessed substrate is placed from the load lock chamber to the process chamber Board transfer method. 39. The method of claim 38, And transferring the substrate tray on which the unprocessed substrate is placed into the load lock chamber, and venting the vacuum in the load lock chamber. 39. The method of claim 38, Transferring the substrate using a substrate tray for pumping to bring the load lock chamber to atmospheric pressure after the step of bringing the substrate tray, the substrate tray having the process is completed into the load lock chamber from the buffer chamber Way. The substrate loading portion of claim 33, Loading a substrate tray from a tray storage portion connected to one side of the substrate loading portion; A robot arm having a substrate placed therein from the substrate storage portion connected to the other side of the substrate loading portion and positioned above the substrate tray; Lifting a substrate lifting device through the opening of the substrate tray to separate the substrate from the robot arm; Exiting the robot arm; The substrate lifting apparatus is lowered, and the substrate is placed in the substrate tray Method of placing a substrate in a substrate tray comprising a. The substrate loading portion of claim 33, Loading a substrate tray on which a substrate having been finished from the load lock chamber is placed; Lifting a substrate lifting device through the opening of the substrate tray to separate the substrate from the substrate tray; A robot arm entering from a substrate storage portion connected to one side of the substrate loading portion and positioned at a lower portion of the substrate lifting apparatus; Placing the substrate on the robot arm while the substrate lifting device is lowered; The robot arm takes out the substrate to the substrate storage unit Method for carrying out the substrate from the substrate tray comprising a.

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