KR100899627B1 - 횡전계모드 액정표시소자 - Google Patents
횡전계모드 액정표시소자 Download PDFInfo
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- KR100899627B1 KR100899627B1 KR1020020071742A KR20020071742A KR100899627B1 KR 100899627 B1 KR100899627 B1 KR 100899627B1 KR 1020020071742 A KR1020020071742 A KR 1020020071742A KR 20020071742 A KR20020071742 A KR 20020071742A KR 100899627 B1 KR100899627 B1 KR 100899627B1
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 78
- 230000005684 electric field Effects 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims description 46
- 239000010410 layer Substances 0.000 claims description 37
- 239000010409 thin film Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 8
- 239000010408 film Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000010287 polarization Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/121—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/123—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel
Abstract
Description
Claims (18)
- 제1기판 및 제2기판;상기 제1기판에 형성되어 복수의 화소를 정의하는 복수의 게이트라인 및 데이터라인;각각의 화소에 형성되어 상기 게이트라인 및 데이터라인과 접속되며, 기판위에 형성된 게이트전극과, 상기 게이트전극이 형성된 기판 전체에 걸쳐 적층된 게이트 절연층과, 상기 절연층 위에 형성된 반도체층과, 상기 반도체층 위에 형성된 소스전극 및 드레인전극과, 상기 소스전극 및 드레인전극이 형성된 기판 전체에 걸쳐 적층된 보호층으로 이루어진 박막트랜지스터;상기 데이터라인과 평행하게 배열되고 박막트랜지스터의 게이트전극과 동일한 금속으로 이루어진 공통전극;상기 공통전극과 평행하게 배열되어 상기 공통전극과 함께 횡전계를 생성하고 박막트랜지스터의 소스전극 및 드레인전극과 동일한 금속으로 형성된 화소전극;상기 화소의 중앙영역에 형성되어 상기 공통전극과 접속되는 공통라인;상기 화소의 중앙영역에 형성되어 상기 화소전극과 접속되며, 상기 공통라인과 오버랩되는 화소전극라인; 및상기 제1기판 및 제2기판에 형성된 제1배향막 및 제2배향막으로 구성되며,상기 데이터라인과 공통전극 및 화소전극은 한화소내에서 서로 일직선으로 평행하게 배열되고 게이트라인에 대해 일정 각도로 경사지게 형성되어 인접하는 화소의 데이터라인과 공통전극 및 화소전극과는 게이트라인을 중심으로 대칭되며, 상기 제1배향막 및 제2배향막의 배향방향은 게이트라인과 수직으로 형성되어 상기 배향방향과 공통전극 및 화소전극은 일정 각도를 이루는 것을 특징으로 하는 횡전계모드 액정표시소자.
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- 제1항에 있어서,제2기판에 형성된 컬러필터; 및상기 제1기판 및 제2기판 사이에 형성된 액정층을 추가로 포함하는 것을 특징으로 하는 횡전계모드 액정표시소자.
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- 제1항에 있어서, 상기 데이터라인은 게이트라인과 70°∼80°의 각도로 배열되는 것을 특징으로 하는 횡전계모드 액정표시소자.
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KR1020020071742A KR100899627B1 (ko) | 2002-11-18 | 2002-11-18 | 횡전계모드 액정표시소자 |
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KR1020020071742A KR100899627B1 (ko) | 2002-11-18 | 2002-11-18 | 횡전계모드 액정표시소자 |
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KR20040043485A KR20040043485A (ko) | 2004-05-24 |
KR100899627B1 true KR100899627B1 (ko) | 2009-05-27 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8659734B2 (en) | 2011-01-03 | 2014-02-25 | Samsung Display Co., Ltd. | Liquid crystal display and manufacturing method thereof |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101023362B1 (ko) * | 2004-05-31 | 2011-03-18 | 엘지디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
KR101171180B1 (ko) | 2005-07-15 | 2012-08-20 | 삼성전자주식회사 | 액정 표시 장치 |
JP5175127B2 (ja) | 2008-03-28 | 2013-04-03 | 株式会社ジャパンディスプレイウェスト | 液晶表示装置 |
CN106773378B (zh) * | 2017-01-20 | 2019-10-01 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示面板和显示装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH103092A (ja) * | 1996-06-14 | 1998-01-06 | Oobayashi Seiko Kk | 液晶表示装置 |
KR100246980B1 (ko) * | 1995-11-30 | 2000-03-15 | 모리시타 요이찌 | 액티브 매트릭스형 액정표시소자 |
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2002
- 2002-11-18 KR KR1020020071742A patent/KR100899627B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100246980B1 (ko) * | 1995-11-30 | 2000-03-15 | 모리시타 요이찌 | 액티브 매트릭스형 액정표시소자 |
JPH103092A (ja) * | 1996-06-14 | 1998-01-06 | Oobayashi Seiko Kk | 液晶表示装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8659734B2 (en) | 2011-01-03 | 2014-02-25 | Samsung Display Co., Ltd. | Liquid crystal display and manufacturing method thereof |
US9588385B2 (en) | 2011-01-03 | 2017-03-07 | Samsung Display Co., Ltd. | Liquid crystal display and manufacturing method thereof |
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