KR100873669B1 - 초점조절수단이 구비된 반도체 패키지 검사장치 및 그를이용한 반도체 패키지 검사방법 - Google Patents
초점조절수단이 구비된 반도체 패키지 검사장치 및 그를이용한 반도체 패키지 검사방법 Download PDFInfo
- Publication number
- KR100873669B1 KR100873669B1 KR1020070050521A KR20070050521A KR100873669B1 KR 100873669 B1 KR100873669 B1 KR 100873669B1 KR 1020070050521 A KR1020070050521 A KR 1020070050521A KR 20070050521 A KR20070050521 A KR 20070050521A KR 100873669 B1 KR100873669 B1 KR 100873669B1
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor package
- pad
- camera module
- vision camera
- focus
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
- G02B7/09—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted for automatic focusing or varying magnification
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B30/00—Camera modules comprising integrated lens units and imaging units, specially adapted for being embedded in other devices, e.g. mobile phones or vehicles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67271—Sorting devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8809—Adjustment for highlighting flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Signal Processing (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
Claims (5)
- 반도체 패키지의 외관을 비전카메라모듈을 이용하여 촬영하고 촬영된 영상 분석을 통해 불량 여부를 판별 한 후 불량 여부 판별 결과에 따라 양품 또는 불량품으로 분류하는 반도체 패키지 검사장치에 있어서,상기 비전카메라모듈(60)의 하부에는 촬영 영상의 초점 위치 조절을 위해 반도체 패키지는 승강시키는 초점조절수단(90)을 더 구비하되,상기 초점조절수단(90)은,반도체 패키지(1)가 수납된 트레이가 로딩되는 지그(91)와,상기 지그(91)의 하부에 구비되며 반도체 패키지(1)를 진공 흡착하는 진공패드(921)가 구비된 다수의 패드모듈(92)과,상기 패드모듈(92)이 상부에 구비되는 패드블록(93)과,상기 패드블록(93)의 하부에 구비되어 상기 패드블록(93)을 지지하는 지지블록(94), 및상기 지지블록(94)을 상승 또는 하강시키는 승강수단(95)을 포함하며,상기 초점조절수단(90)은;상기 다수의 패드모듈(92)에 연결되어 각 패드모듈(92)의 하부로 공급되는 유체를 개별적으로 제어하여 각 패드모듈(92)의 승강을 개별적으로 제어하는 개별 승강 제어장치를 더 구비함을 특징으로 하는 초점조절수단이 구비된 반도체 패키지의 검사 장치.
- 삭제
- 삭제
- 비전카메라모듈의 하부에 구비되어 반도체 패키지를 진공 흡입하는 다수의 패드모듈을 구비한 초점조절수단을 구비하여 반도체 패키지의 외관을 비전카메라모듈을 이용하여 촬영하고 촬영된 영상 분석을 통해 불량 여부를 판별 한 후 불량 여부 판별 결과에 따라 양품 또는 불량품으로 분류하는 반도체 패키지 검사방법에 있어서,반도체 패키지를 비전카메라모듈의 하부로 이송하는 단계와,이송된 반도체 패키지를 비전카메라모듈 하부에 구비된 다수의 진공패드모듈을 이용하여 진공 흡착하는 단계와,상기 진공 흡착된 반도체 패키지를 상승시켜 비전카메라모듈을 통해 촬상되는 영상의 초점 위치를 조절하는 단계를 포함하여 구성되되,상기 각각의 진공패드모듈의 높이 조절은 개별적으로 이루어짐을 특징으로 하는 반도체 패키지 검사방법.
- 삭제
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070050521A KR100873669B1 (ko) | 2007-05-23 | 2007-05-23 | 초점조절수단이 구비된 반도체 패키지 검사장치 및 그를이용한 반도체 패키지 검사방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070050521A KR100873669B1 (ko) | 2007-05-23 | 2007-05-23 | 초점조절수단이 구비된 반도체 패키지 검사장치 및 그를이용한 반도체 패키지 검사방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080103351A KR20080103351A (ko) | 2008-11-27 |
KR100873669B1 true KR100873669B1 (ko) | 2008-12-12 |
Family
ID=40288765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070050521A KR100873669B1 (ko) | 2007-05-23 | 2007-05-23 | 초점조절수단이 구비된 반도체 패키지 검사장치 및 그를이용한 반도체 패키지 검사방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100873669B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR200447751Y1 (ko) * | 2009-06-22 | 2010-02-16 | 제너셈(주) | 3d 비전 인스펙션장치의 초점조절장치 |
CN113917651B (zh) * | 2021-09-29 | 2022-10-04 | 中国科学院西安光学精密机械研究所 | 一种低温光学系统的调焦装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60167424A (ja) * | 1984-02-10 | 1985-08-30 | Hitachi Ltd | 検査装置 |
KR20060041454A (ko) * | 2004-11-09 | 2006-05-12 | 삼성전자주식회사 | 칩 외관 자동검사 장치 |
-
2007
- 2007-05-23 KR KR1020070050521A patent/KR100873669B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60167424A (ja) * | 1984-02-10 | 1985-08-30 | Hitachi Ltd | 検査装置 |
KR20060041454A (ko) * | 2004-11-09 | 2006-05-12 | 삼성전자주식회사 | 칩 외관 자동검사 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20080103351A (ko) | 2008-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100709991B1 (ko) | 카메라 모듈 검사 장치 | |
JP2007163453A (ja) | イメージセンサーパッケージの検査装置、その検査ユニット及び検査方法 | |
KR101074394B1 (ko) | 엘시디 검사장치 | |
KR20180103701A (ko) | 다이 본딩 장치 및 반도체 장치의 제조 방법 | |
KR20160096021A (ko) | 박리 장치, 박리 시스템, 박리 방법 및 컴퓨터 판독 가능 정보 기억 매체 | |
CN101069100A (zh) | 电子器件处理装置和不良端子确定方法 | |
SG194276A1 (en) | Semiconductor package inspection apparatus and semiconductor package inspection method using the same | |
JP2006329714A (ja) | レンズ検査装置 | |
TW201432252A (zh) | 基板之缺陷檢查方法、基板之缺陷檢查裝置、程式及電腦記憶媒體 | |
KR100949130B1 (ko) | 관찰 장치 및 전자 장치의 제조 방법 | |
KR20140070464A (ko) | 기판의 결함 검사 방법, 기판의 결함 검사 장치 및 컴퓨터 기억 매체 | |
KR100873669B1 (ko) | 초점조절수단이 구비된 반도체 패키지 검사장치 및 그를이용한 반도체 패키지 검사방법 | |
JP2010062508A (ja) | ベアチップ用両面検査設備 | |
KR100769691B1 (ko) | 탭 검사장치 및 이를 이용한 탭 검사방법 | |
TW201925725A (zh) | 感測器封裝結構的檢測方法、與檢測設備及其對焦式擷取器 | |
CN115372375A (zh) | 晶圆检测装置及检测方法 | |
JP2010261965A (ja) | 部品認識装置、表面実装機および部品検査装置 | |
JP2020061419A (ja) | 基板処理装置及び検査方法 | |
JP2020061417A (ja) | 基板処理装置及び検査方法 | |
CN111725086B (zh) | 半导体制造装置以及半导体器件的制造方法 | |
US11151709B2 (en) | Inspection device and inspection method | |
JP2014169911A (ja) | ハンドラー、検査装置、ハンドラー用カメラおよびハンドラーカメラ用制御装置 | |
JP2010157539A (ja) | 部品検査装置および部品移載装置 | |
JP5825268B2 (ja) | 基板検査装置 | |
JP2003322625A (ja) | 半導体チップ検査方法及び半導体チップ検査装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121206 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20131204 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20141205 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20151207 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20161205 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20171204 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20181206 Year of fee payment: 11 |