KR100807454B1 - Aromatic carboxylic acids, acid halides thereof and processes for preparing both - Google Patents

Aromatic carboxylic acids, acid halides thereof and processes for preparing both Download PDF

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KR100807454B1
KR100807454B1 KR1020037007032A KR20037007032A KR100807454B1 KR 100807454 B1 KR100807454 B1 KR 100807454B1 KR 1020037007032 A KR1020037007032 A KR 1020037007032A KR 20037007032 A KR20037007032 A KR 20037007032A KR 100807454 B1 KR100807454 B1 KR 100807454B1
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isophthalic acid
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KR20040014421A (en
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오카누마마사코
이시다유이치
하세요코
히가시다노부히로
에노키다카시
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스미토모 베이클리트 컴퍼니 리미티드
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C63/00Compounds having carboxyl groups bound to a carbon atoms of six-membered aromatic rings
    • C07C63/64Monocyclic acids with unsaturation outside the aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C65/00Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C65/21Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing ether groups, groups, groups, or groups
    • C07C65/28Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing ether groups, groups, groups, or groups having unsaturation outside the aromatic rings

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Abstract

고분자 화합물 특히 내열성이 우수한 축합계 고분자 화합물의 원료등으로서 유용한 신규 방향족 카르복실산 및 그 산할로겐화물 유도체 및 그의 제조방법이 개시되어 있다.A novel aromatic carboxylic acid, an acid halide derivative thereof and a method for producing the same, which are useful as a raw material for a high molecular compound, particularly a condensed polymer compound having excellent heat resistance, are disclosed.

본 발명의 방향족 카르복실산 및 그 산할로겐화물 유도체는 각각 일반식 (1) 및 (2)The aromatic carboxylic acid and acid halide derivatives thereof of the present invention are represented by general formulas (1) and (2), respectively.

Figure 112006084353845-pct00048
Figure 112006084353845-pct00048

Figure 112006084353845-pct00049
Figure 112006084353845-pct00049

[A는 -C ≡C-R1 또는[A is -C ≡CR 1 or

Figure 112006084353845-pct00050
Figure 112006084353845-pct00050

(단, R1은 수소 원자,알킬기 또는 방향족기,R2는 알킬기 또는 방향족기) 로 표시된 기, X는 할로겐 원자를 나타낸다.](Wherein R 1 is a hydrogen atom, an alkyl group or an aromatic group, R 2 is an alkyl group or an aromatic group), and X represents a halogen atom.]

로 표시되는 구조를 가진다. 이들 화합물은 본 발명에 의하면 이소프탈산 디알킬 에스테르 유도체와 아세틸렌 유도체를 이용하여 특정의 공정을 행함으로써 우수한 효율로 제조할 수 있다.It has a structure represented by. According to the present invention, these compounds can be produced with excellent efficiency by carrying out specific processes using isophthalic acid dialkyl ester derivatives and acetylene derivatives.

Description

방향족 카르복실산, 그의 산할로겐화물 유도체 및 그의 제조방법 {AROMATIC CARBOXYLIC ACIDS, ACID HALIDES THEREOF AND PROCESSES FOR PREPARING BOTH}Aromatic carboxylic acid, acid halide derivative thereof and preparation method thereof {AROMATIC CARBOXYLIC ACIDS, ACID HALIDES THEREOF AND PROCESSES FOR PREPARING BOTH}

본 발명은 방향족 카르복실산, 그의 산할로겐화물 유도체 및 그의 제조방법에 관한 것이다. 더욱 상세하게는, 본 발명은 고분자 화합물, 특히 내열성이 우수한 축합계 고분자 화합물의 원료 등으로서 유용한 방향족 카르복실산 및 그의 산 할로겐화물 유도체, 또한 이것을 효율적으로 제조하는 방법에 관한 것이다.The present invention relates to aromatic carboxylic acids, acid halide derivatives thereof and methods for their preparation. More specifically, the present invention relates to aromatic carboxylic acids and acid halide derivatives thereof useful as raw materials for high molecular compounds, particularly condensed polymer compounds having excellent heat resistance, and the like, as well as methods for efficiently preparing the same.

1개의 분자 중에 2개의 카르복실기를 가진 방향족 카르복실산 및 그의 산할로겐화물은, 방향족 폴리아미드 수지, 폴리알릴레이트 수지, 폴리벤조옥사졸 수지, 폴리벤조티아졸 수지 등의 원료로서 사용되고, 그의 용도에 따라 다양한 구조를 가진 수지를 제조, 사용하고 있다.Aromatic carboxylic acids having two carboxyl groups and acid halides thereof in one molecule are used as raw materials for aromatic polyamide resins, polyallylate resins, polybenzoxazole resins, polybenzothiazole resins, and the like. Accordingly, resins having various structures are manufactured and used.

한편, 이러한 수지는 일반적으로 열가소성 고분자 화합물이나, 우수한 내열성을 가지며 고온에 필요한 용도에 널리 사용되고 있다. 이에 의하여 내열성을 향상시키는 수단으로서 열경화 가능한 치환기를 도입하는 시도가 이루어지고 있으며, 따라서 이러한 방법에 사용되는 원료가 요망되고 있다.On the other hand, these resins are generally thermoplastic polymer compounds, but have excellent heat resistance and are widely used for high temperature applications. As a result, attempts have been made to introduce thermosetting substituents as a means to improve heat resistance, and thus raw materials used in such methods have been desired.

이러한 사정에 따라, 본 발명의 제1 목적은 고분자 화합물 특히 내열성이 우 수한 축합계 고분자 화합물의 원료 등으로서 유용한 방향족 카르복실산 및 그의 유도체를 제공하는 것이고, 제2 목적은 우수한 효율로 이들을 제조하는 것이다.In view of these circumstances, the first object of the present invention is to provide aromatic carboxylic acids and derivatives thereof useful as raw materials for polymer compounds, especially condensed polymer compounds having excellent heat resistance, and the second object is to produce them with excellent efficiency. will be.

본 발명자들은 상술한 목적을 달성하기 위하여 연구를 거듭한 결과, 특정의 구조를 가진 방향족 카르복실산 및 그의 산할로겐화물 유도체에 의하여 제1 목적을 달성할 수 있고, 이들은 특정한 공정을 실시함으로써 우수한 효율로 제조할 수 있어, 제2 목적을 달성할 수 있음을 발견하였다. 본 발명은,이러한 지견에 근거하여 완성한 것이다.The present inventors have conducted research to achieve the above-mentioned object, and as a result, the first object can be achieved by the aromatic carboxylic acid and the acid halide derivative thereof having a specific structure, and these have excellent efficiency by performing a specific process. It has been found that the present invention can be prepared in the above, and the second object can be achieved. This invention is completed based on such knowledge.

즉,본 발명은 ,That is, the present invention,

(1) 일반식(1)(1) General formula (1)

Figure 112003018647610-pct00001
Figure 112003018647610-pct00001

[식 중에서 A는 다음의 식[Wherein A is the following equation

-C ≡C-R1 ...(a)-C ≡CR 1 ... (a)

또는or

Figure 112003018647610-pct00002
Figure 112003018647610-pct00002

(단, R1은 수소 원자,알킬기 또는 방향족기,R2는 알킬기 또는 방향족기이다.) 로 표시된 기를 나타낸다.] Wherein R 1 represents a hydrogen atom, an alkyl group or an aromatic group, and R 2 represents an alkyl group or an aromatic group.

로 표시되는 구조를 가지는 것을 특징으로 하는 방향족 카르복실산,Aromatic carboxylic acid, characterized by having a structure represented by

(2) 일반식(2)(2) General formula (2)

Figure 112003018647610-pct00003
Figure 112003018647610-pct00003

[식 중에서 A는 다음의 식[Wherein A is the following equation

-C ≡C-R1 ...(a)-C ≡CR 1 ... (a)

또는or

Figure 112003018647610-pct00004
Figure 112003018647610-pct00004

(단, R1은 수소 원자,알킬기 또는 방향족기,R2는 알킬기 또는 방향족기이다.)로 표시된 기, X는 할로겐원자를 나타낸다.](Wherein R 1 is a hydrogen atom, an alkyl group or an aromatic group, R 2 is an alkyl group or an aromatic group), and X represents a halogen atom.]

로 표시되는 구조를 갖는 것을 특징으로 하는 방향족 카르복실산의 산할로겐화물 유도체,Acid halide derivatives of aromatic carboxylic acids, having a structure represented by

(3) 일반식(3)(3) General formula (3)

Figure 112003018647610-pct00005
Figure 112003018647610-pct00005

[식 중에서 D는 탈리기, R은 저급알킬기를 나타낸다.][Wherein D represents a leaving group and R represents a lower alkyl group]

로 표시되는 화합물과, 일반식(4) Compound represented by and general formula (4)                 

HC ≡C-E ...(4)HC ≡C-E ... (4)

[식 중에서 E는 트리메틸실릴기, 히드록시프로필기, 알킬기 또는 방향족기를 나타낸다.][Wherein E represents a trimethylsilyl group, a hydroxypropyl group, an alkyl group or an aromatic group.]

로 표시되는 화합물을 반응시켜서 다음의 일반식(5),Reacting the compound represented by the following general formula (5),

Figure 112003018647610-pct00006
Figure 112003018647610-pct00006

[식 중에서 R 및 E는 상기의 의미와 같다][Wherein R and E have the same meanings as above]

로 표시되는 화합물을 생성한 뒤, 알칼리금속 수산화물의 존재하에서 처리함으로써, 일반식(6)After the compound represented by the above formula was produced and treated in the presence of an alkali metal hydroxide, the general formula (6)

Figure 112003018647610-pct00007
Figure 112003018647610-pct00007

[식 중에서 R1은 수소원자, 알킬기 또는 방향족기, M은 알칼리금속을 나타낸다.] 로 표시되는 화합물을 생성하고 이어서 산처리하는 것을 특징으로 하는 일반식(1-1)[Wherein R 1 represents a hydrogen atom, an alkyl group or an aromatic group, and M represents an alkali metal.] A compound represented by the following formula is produced, followed by acid treatment.

Figure 112003018647610-pct00008
Figure 112003018647610-pct00008

[식 중에서 R1은 상기의 의미와 같다.] [Wherein, R 1 is as defined above.]

로 표시되는 방향족 카르복실산의 제조방법,Method for producing an aromatic carboxylic acid represented by

(4) 일반식(7)(4) General formula (7)

Figure 112003018647610-pct00009
Figure 112003018647610-pct00009

[식 중에서 D는 탈리기, R은 저급알킬기를 나타낸다.][Wherein D represents a leaving group and R represents a lower alkyl group]

로 표시되는 화합물과, 일반식(8)Compound represented by general formula (8)

HC ≡C-R2 ...(8)HC ≡CR 2 ... (8)

[식 중에서 R2는 알킬기 또는 방향족기를 나타낸다.][Wherein, R 2 represents an alkyl group or an aromatic group.]

로 표시되는 화합물을 반응시켜서, 일반식(9)By reacting the compound represented by the formula (9)

Figure 112003018647610-pct00010
Figure 112003018647610-pct00010

[식 중에서 R 및 R2는 상기의 의미와 같다.][Wherein R and R 2 are the same as defined above.]

로 표시되는 화합물을 수득한 후 알칼리금속 수산화물의 존재하에서 처리함으로써, 일반식(10)After obtaining the compound represented by the general formula (10) by treating in the presence of an alkali metal hydroxide

Figure 112003018647610-pct00011
Figure 112003018647610-pct00011

[식 중에서 M은 알칼리금속을 나타내고, R2는 상기의 의미와 같다.][Wherein M represents an alkali metal and R 2 is as defined above.]

로 표시되는 화합물을 생성하고 이어서 산처리하는 것을 특징으로 하는, 일반식(1-2)General formula (1-2), characterized in that the compound represented by

Figure 112003018647610-pct00012
Figure 112003018647610-pct00012

[식 중에서 R2는 상기의 의미와 같다.][Wherein, R 2 is as defined above.]

로 표시되는 방향족 카르복실산의 제조방법,Method for producing an aromatic carboxylic acid represented by

(5) 일반식(1-1)(5) General formula (1-1)

Figure 112003018647610-pct00013
Figure 112003018647610-pct00013

[식 중에서 R1는 수소원자, 알킬기 또는 방향족기를 나타낸다.][Wherein, R 1 represents a hydrogen atom, an alkyl group or an aromatic group.]

로 표시되는 화합물, 또는 일반식(6)Compound represented by or General formula (6)

Figure 112003018647610-pct00014
Figure 112003018647610-pct00014

[식 중에서 M은 알칼리금속을 나타내고, R1은 상기의 의미와 같다.][Wherein M represents an alkali metal and R 1 is as defined above.]

로 표시되는 화합물을 할로겐화제로 처리하는 것을 특징으로 하는 일반식(2-1)Formula (2-1), characterized in that the compound represented by the treatment with a halogenating agent

Figure 112003018647610-pct00015
Figure 112003018647610-pct00015

[식 중에서 X은 할로겐원자를 나타내고, R1은 상기의 의미와 같다.][Wherein X represents a halogen atom and R 1 is as defined above.]

로 표시되는 방향족 카르복실산의 산할로겐화물 유도체의 제조방법, 및 A method for producing an acid halide derivative of an aromatic carboxylic acid represented by

(6) 일반식(1-2)(6) General formula (1-2)

Figure 112003018647610-pct00016
Figure 112003018647610-pct00016

[식 중에서 R2은 알킬기 또는 방향족기를 나타낸다.][Wherein, R 2 represents an alkyl group or an aromatic group.]

로 표시되는 화합물, 또는 일반식(10)Compound represented by or General formula (10)

Figure 112003018647610-pct00017
Figure 112003018647610-pct00017

[식 중에서 M은 알칼리금속을 나타내고, R2는 상기의 의미와 같다.][Wherein M represents an alkali metal and R 2 is as defined above.]

로 표시되는 화합물을 할로겐화제로 처리하는 것을 특징으로 하는 일반식(2-2)Formula (2-2), characterized in that the compound represented by the treatment with a halogenating agent

Figure 112003018647610-pct00018
Figure 112003018647610-pct00018

[식 중에서 X는 할로겐원자를 나타내고, R2는 상기의 의미와 같다.][Wherein X represents a halogen atom and R 2 is as defined above.]

로 표시되는 방향족 카르복실산의 산할로겐화물 유도체의 제조방법을 제공하는 것이다.It is to provide a method for producing an acid halide derivative of an aromatic carboxylic acid represented by.

발명을 실시하기 위한 최선의 형태
본 발명의 방향족 카르복실산 및 방향족 카르복실산의 산할로겐화물 유도체는 각각 일반식(1) 및 일반식(2)
Best Mode for Carrying Out the Invention
The aromatic carboxylic acid and the acid halide derivative of the aromatic carboxylic acid of the present invention are represented by general formula (1) and general formula (2), respectively.

Figure 112003018647610-pct00019
Figure 112003018647610-pct00019

Figure 112003018647610-pct00020
Figure 112003018647610-pct00020

로 표시되는 구조를 가진 지금까지의 문헌에서 공지되지 않은 신규한 화합물이다.It is a novel compound which is not known in the literature until now with the structure represented by.

상기 일반식(1) 및 일반식(2)에 있어서,A는 식In the formulas (1) and (2), A is a formula

-C ≡C-R1 ...(a)-C ≡CR 1 ... (a)

또는or

Figure 112003018647610-pct00021
Figure 112003018647610-pct00021

[단, R1은 수소원자, 알킬기 또는 방향족기, R2는 알킬기 또는 방향족기이다.][Wherein R 1 is a hydrogen atom, an alkyl group or an aromatic group, and R 2 is an alkyl group or an aromatic group.]

로 표시되는 기를 나타내고, 일반식(2)에 있어서의 X는 할로겐원자를 나타낸다.The group represented by is represented and X in General formula (2) represents a halogen atom.

즉, 상기 일반식(1)로 표시되는 방향족 카르복실산에는 일반식(1-1)That is, to the aromatic carboxylic acid represented by the said General formula (1), General formula (1-1)

Figure 112003018647610-pct00022
Figure 112003018647610-pct00022

[식 중에서 R1은 상기의 의미와 같다.][Wherein, R 1 is as defined above.]

로 표시되는 방향족 카르복실산과, 일반식(1-2)Aromatic carboxylic acid represented by general formula (1-2)

Figure 112003018647610-pct00023
Figure 112003018647610-pct00023

[식 중에서 R2는 상기의 의미와 같다.][Wherein, R 2 is as defined above.]

로 표시되는 방향족 카르복실산이 있고, 또한 상기 일반식(2)로 표시되는 방향족 카르복실산의 산할로겐화물 유도체에는 일반식(2-1)There is an aromatic carboxylic acid represented by the above, and the acid halide derivatives of the aromatic carboxylic acid represented by the above general formula (2) include general formula (2-1)

Figure 112003018647610-pct00024
Figure 112003018647610-pct00024

[식 중에서 R1은 상기의 의미와 같다.][Wherein, R 1 is as defined above.]

로 표시되는 방향족 카르복실산의 산할로겐화물 유도체와, 일반식(2-2)Acid halide derivatives of the aromatic carboxylic acid represented by the general formula (2-2)

Figure 112003018647610-pct00025
Figure 112003018647610-pct00025

[식 중에서 R2는 상기의 의미와 같다][Wherein R 2 is as defined above]

로 표시되는 방향족 카르복실산의 산할로겐화물 유도체가 있다.There is an acid halide derivative of an aromatic carboxylic acid represented by.

상기 일반식(2-1) 및 (2-2)로 표시되는 방향족 카르복실산의 산할로겐화물 유도체에 있어서, X가 염소원자인 산염화물 유도체가 실용적인 측면에서 바람직하다.In the acid halide derivatives of the aromatic carboxylic acids represented by the general formulas (2-1) and (2-2) above, an acid chloride derivative whose X is a chlorine atom is preferable in view of practical use.

상기 일반식(1) 및 일반식(2)에 있어서, R1중의 알킬기 및 방향족기, R2 로 나타나는 알킬기 및 방향족기로는 알킬기로서 에틸기, 프로필기, 부틸기 등을, 방향족기로서 페닐기, 나프틸기, 안트릴기, 퀴놀릴기, 퀴녹살릴기 등을 들 수 있다.The general formula (1) and in the formula (2), R 1 a phenyl group with an ethyl group, a propyl group, a butyl group such as an alkyl group and an aromatic group, an alkyl group and aromatic group represented by R 2 in are an alkyl group, an aromatic group, a naphthyl And a methyl group, anthryl group, quinolyl group, and quinoxalyl group.

다음은 이러한 화합물의 제조 방법에 관하여 설명한다. The following describes the preparation of such compounds.                 

먼저,상기 일반식(1-1)으로 표시된 방향족 카르복실산 및 일반식(2-1)으로 표시된 방향족 카르복실산의 산할로겐화물 유도체는 아래와 같은 루트에 의하여 제조할 수 있다.First, the acid halide derivatives of the aromatic carboxylic acid represented by the general formula (1-1) and the aromatic carboxylic acid represented by the general formula (2-1) can be produced by the following routes.

Figure 112003018647610-pct00026
Figure 112003018647610-pct00026

일반식(3)에 있어서, D는 탈리기를, 일반식(3) 및(5)에 있어서 R은 저급알킬기,바람직하게는 메틸기를,일반식(4) 및(5)에 있어서 E는 트리메틸 실릴기,히드록시 프로필기,알킬기 또는 방향족기를,일반식(6)에 있어서 M은 알칼리금속을,일반식(6),(1-1) 및 (2-1)에 있어서, R1은 수소 원자,알킬기 또는 방향족기를 ,일반식(2-1)에 있어서, X는 할로겐 원자,바람직하게는 염소 원자를 나타낸다.In formula (3), D is a leaving group, in formulas (3) and (5), R is a lower alkyl group, preferably methyl group, and in formulas (4) and (5), E is trimethyl silyl In the formula (6), M represents an alkali metal, and in formulas (6), (1-1) and (2-1), R 1 represents a hydrogen atom. In the general formula (2-1), X represents a halogen atom, preferably a chlorine atom.

먼저,출발원료로서 일반식(3)으로 나타낸 벤젠 고리상의 제5위치가 탈리기 D로 치환된 이소프탈산의 디알킬에스테르 화합물과 아세틸렌의 한쪽이 E기로 치환된 화합물〔일반식(4)〕로 커플링 반응시킴으로써, 일반식(5)으로 나타나는 화합물을 얻을 수 있다.상기 커플링 반응은 촉매를 이용하는 것이 바람직하고,예를 들면,팔라듐 등의 전이금속 촉매를 이용할 수 있다.상기 탈리기 D로는, 이 촉매하의 커플링 반응에서 용이하게 방향족 고리로부터 이탈하는 기가 바람직하고,불소,염소,브롬,요오드 등의 할로겐, 트리플루오로메탄 술포닐옥시기 등을 바람직하게 들 수 있다.또,치환기 E로는 보호기 역할을 하는 기를 들 수 있고,이 경우 바람직한 것은 트리메틸 실릴기,히드록시 프로필기 등이 선택되고 또한,치환기 E로는 방향족기 또는 알킬기를 들 수 있고,방향족기로는 페닐기,나프틸기,안트릴기,퀴놀릴기,퀴녹살릴기 등을 들 수 있다.First, as starting materials, a dialkyl ester compound of isophthalic acid in which the fifth position on the benzene ring represented by the general formula (3) is substituted with the leaving group D and a compound in which one of the acetylenes are substituted with the E group [General formula (4)] By coupling reaction, the compound represented by General formula (5) can be obtained. It is preferable to use a catalyst as said coupling reaction, For example, transition metal catalysts, such as palladium, can be used. In the coupling reaction under this catalyst, a group which is easily separated from the aromatic ring is preferable, and halogen, trifluoromethane sulfonyloxy group such as fluorine, chlorine, bromine and iodine, and the like are preferable. The group which acts as a protecting group is preferable, In this case, a trimethyl silyl group, a hydroxy propyl group, etc. are selected, and Substituent E is an aromatic group, There may be mentioned an alkyl group, an aromatic group include a phenyl group, a naphthyl group, an anthryl group, quinolyl group, quinoxaline save group.

다음,이 화합물을 알칼리금속 수산화물을 이용하여 카르복실산 에스테르기로부터 탈알킬반응을 행하고, 또한 일반식(5)으로 표시되는 화합물에 있어서, E 기가 보호기인 경우는 탈보호처리를 동시에 행함으로서,일반식(6)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 얻을 수 있다.Next, the compound is subjected to dealkylation reaction from a carboxylic ester group using an alkali metal hydroxide, and in the compound represented by the general formula (5), when the E group is a protecting group, the deprotection treatment is performed simultaneously. The alkali metal salt of the isophthalic acid derivative represented by general formula (6) can be obtained.

나아가,일반식(6)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 산처리하여 일반식(1-1)으로 표시되는 방향족 카르복실을,또한, 할로겐화제,바람직하게는 염소화제로 처리함으로써 일반식(2-1)으로 표시되는 산할로겐화물 유도체,바람직하게는 산염화물 유도체를 얻을 수 있다.Furthermore, by treating the alkali metal salt of the isophthalic acid derivative represented by the general formula (6) with an acid and treating the aromatic carboxyl represented by the general formula (1-1) with a halogenating agent, preferably a chlorinating agent, An acid halide derivative and preferably an acid chloride derivative represented by 2-1) can be obtained.

일반식(3)으로 나타낸 벤젠 고리상의 제5위치가 D로 치환된 이소프탈산 디알킬에스테르는 탈리기 D가 트리플루오로메탄 술포닐옥시기인 경우,아래와 같은 반응식The isophthalic acid dialkyl ester in which the fifth position on the benzene ring represented by the general formula (3) is substituted with D is the following reaction formula when the leaving group D is a trifluoromethane sulfonyloxy group.

Figure 112003018647610-pct00027
Figure 112003018647610-pct00027

[R은 저급알킬기이다.] R is a lower alkyl group.

에 따르고,5-히드록시 이소프탈산 디알킬 에스테르〔식(11)〕를 트리플루오로 메탄 술폰산 무수물〔식(12)〕로 에스테르화함으로써, 5-트리플루오로메탄 술포닐옥시 이소프탈산 디알킬 에스테르〔식(3-1)〕를 얻을 수 있다.5-trifluoromethane sulfonyloxy isophthalic acid dialkyl ester by esterifying 5-hydroxy isophthalic acid dialkyl ester [formula (11)] with trifluoromethane sulfonic anhydride [formula (12)]. Formula (3-1) can be obtained.

또,아래와 같은 반응식In addition, the following reaction formula

Figure 112003018647610-pct00028
Figure 112003018647610-pct00028

[D1은 할로겐원자,R은 저급알킬기이다.] 로 표시되도록, 5-아미노 이소프탈산〔식(13)〕을 원료에 이용하여,디아조늄염〔식(14)〕을 경유하여 진행하는 Sandmeyer 반응을 행함으로써, 상기 탈리기가 할로겐인 식(15)로 나타나는 이소프탈산을 제조할 수 있다.이어서,카르복실산을 알킬에스테르화함으로써,상기 탈리기 D가 할로겐인 식(3-2)로 나타나는 이소프탈산 디알킬에스테르를 용이하게 얻을 수 있다.Sandmeyer proceeding via a diazonium salt [formula (14)] using 5-amino isophthalic acid [formula (13)] as a raw material so as to be represented by [D 1 is a halogen atom, R is a lower alkyl group]. By reacting, the isophthalic acid represented by Formula (15) in which the leaving group is halogen can be produced. Then, by alkyl esterifying carboxylic acid, the leaving group D is represented by Formula (3-2) in which halogen is represented. Isophthalic acid dialkyl ester can be obtained easily.

이하,상기의 일반식(1-1)으로 표시되는 방향족 카르복실산 및 일반식(2-1)으로 표시되는 방향족 카르복실산의 산할로겐화물 유도체의 제조방법의 예에 관하여 설명한다.Hereinafter, the example of the manufacturing method of the acid halide derivative of aromatic carboxylic acid represented by the said General formula (1-1) and aromatic carboxylic acid represented by General formula (2-1) is demonstrated.

5-브로모 이소프탈산 디알킬 에스테르〔식(3)에 있어서,D=Br〕를 이용한 예로는, 먼저 5-브로모 이소프탈산 디알킬에스테르는 5-아미노 이소프탈산〔식(13)〕과 브롬화수소산 및 아질산나트륨을 반응시킴으로써, 디아조늄 브롬산염〔식(14)에 있어,D1=Br〕를 얻는다.이것을 브롬화제1구리와 반응시킴으로써 질소가스가 발생하고,5-브로모 이소프탈산〔식(15)에 있어,D1=Br〕을 얻을 수 있다.이어서,질소,아르곤,헬륨 등의 불활성 가스 분위기에서 황산 등의 산성 촉매 존재하에서,저급알코올을 가하고 환류시킴으로써 저급알코올과 카르복실산이 에스테르화 반응하여 5-브로모 이소프탈산 디알킬 에스테르〔식(3-2)에 있어,D1=Br〕를 얻을 수 있다.이 때,저급 알코올의 양은 반응평형을 생성물 측으로 이동시키기 위해 과잉량으로 이용하는 것이 바람직하다.또,계중의 수분량을 적게 하기 위해, 미리 저급 알코올은 증류시키는 것이 좋다.As an example using 5-bromo isophthalic acid dialkyl ester [D = Br] in formula (3), first, 5-bromo isophthalic acid dialkyl ester is brominated with 5-amino isophthalic acid (formula (13)]. By reacting hydrochloric acid and sodium nitrite, diazonium bromate [D 1 = Br in formula (14) is obtained. Nitrogen gas is generated by reacting this with cuprous bromide, and 5-bromo isophthalic acid is used. 15), D 1 = Br] can be obtained. Subsequently, lower alcohols and carboxylic acids are esterified by adding and refluxing lower alcohols in the presence of an acidic catalyst such as sulfuric acid in an inert gas atmosphere such as nitrogen, argon, and helium. By reaction to obtain 5-bromo isophthalic acid dialkyl ester [D 1 = Br] in formula (3-2). The amount of lower alcohol is used in excess to shift the reaction equilibrium to the product side. In addition, in order to reduce the amount of water in the system, it is better to distill the lower alcohol in advance.

또한, 5-트리플루오로메탄 술포닐옥시 이소프탈산 디알킬 에스테르〔식(3)에 있어,D=트리플루오로메탄 술포닐옥시기〕를 이용하는 경우는, 먼저 5-히드록시 이소프탈산 디알킬 에스테르〔식(11)〕와 염기를 용매에 용해하고, -78℃∼10℃ 정도로 냉각한 용액에 트리플루오로메탄 술폰산 무수물〔식(12)〕을 가하고 0℃ 내지 용매의 비등점 이하 정도의 온도 범위에서 반응시킨다.이 때,반응 시간은 특별히 제한되지 않는다.또 상기 반응에 있어 트리플루오로메탄 술폰산 무수물의 첨가전에 냉각을 행하는 것은 반응이 발열 반응이기 때문이고, 이것 이상의 온도에서는 반응이 급격하게 진행하여 용매가 갑자기 비등할 위험성이 있기 때문이다.In addition, when 5-trifluoromethane sulfonyloxy isophthalic-acid dialkyl ester [in Formula (3), D = trifluoromethane sulfonyloxy group] is used, first 5-hydroxy isophthalic-acid dialkyl ester [ Formula (11)] and a base are dissolved in a solvent, trifluoromethane sulfonic anhydride [Formula (12)] is added to the solution cooled to about -78 degreeC-10 degreeC, and it is the temperature range of 0 degreeC-below the boiling point of a solvent. At this time, the reaction time is not particularly limited. The cooling is performed before the addition of trifluoromethane sulfonic anhydride in the above reaction because the reaction is exothermic, and the reaction proceeds rapidly at a temperature higher than this. This is because there is a risk of the solvent suddenly boiling.

이와 같이 하여 얻어진 반응 생성물에 통상의 분리 수단,예를 들면 추출,분액,농축 등의 조작을 행하여 5-트리플루오로메탄 술포닐옥시 이소프탈산 디알킬에스테르를 얻을 수 있다.The reaction product thus obtained can be subjected to usual separation means, for example, extraction, separation, concentration and the like, to obtain 5-trifluoromethane sulfonyloxy isophthalic acid dialkyl ester.

또한 이것을 필요에 따라,재결정,컬럼 크로마토그래피 등에 의하여 정제할 수 있다. Moreover, this can be refine | purified by recrystallization, column chromatography, etc. as needed.

트리플루오로메탄 술폰산 무수물의 사용량으로는 5-히드록시 이소프탈산 디알킬 에스테르에 대하여,1∼1.5 당량배가 바람직하다.As a usage-amount of trifluoromethane sulfonic anhydride, 1-1.5 equivalent times is preferable with respect to 5-hydroxy isophthalic-acid dialkyl ester.

염기로는 3급아민으로 활성 수소를 갖지 않는 아민이 바람직하고,구체적인 예로는 피리딘,메틸피리딘 등의 피리딘류, 트리에틸아민,트리부틸아민 등의 트리알킬아민류 등을 들 수 있고,이들의 사용량은 5-히드록시 이소프탈산 디알킬 에스테르와 트리플루오로메탄 술폰산 무수물의 합계량에 대하여 1∼1.5 당량배를 이용하는 것이 바람직하다.Preferred examples of the base include tertiary amines having no active hydrogen, and specific examples include pyridines such as pyridine and methylpyridine, trialkylamines such as triethylamine and tributylamine, and the like. It is preferable to use 1-1.5 equivalent times with respect to the total amount of 5-hydroxy isophthalic-acid dialkyl ester and trifluoromethane sulfonic anhydride.

용매로는 벤젠,톨루엔,n-헥산,시클로헥산,석유에테르, 에틸에테르,테트라하이드로푸란,디클로로메탄,1,2-디클로로메탄, 클로로포름 등의 방향족 탄화수소,탄화수소,에테르,할로겐화 탄화수소 등의 반응에 불활성인 용매의 단독 또는 이들의 혼합물을 들 수 있고,그 사용량에 관해서는 특별히 제한되지 않다.Examples of the solvent include reactions of aromatic hydrocarbons such as benzene, toluene, n-hexane, cyclohexane, petroleum ether, ethyl ether, tetrahydrofuran, dichloromethane, 1,2-dichloromethane and chloroform, hydrocarbons, ethers and halogenated hydrocarbons. The inert solvent alone or a mixture thereof can be mentioned, and the amount of the inert solvent is not particularly limited.

또한, 용매중에 수분이 존재하면 반응 시약인 트리플루오로메탄 술폰산 무수물과 부수적인 반응을 일으켜 실제의 반응 당량비가 변하기 때문에,무수용매를 이용하거나,미리 포함된 수분량을 파악하여 사용량을 조정하고 이론적인 당량보다 많은 양을 넣는 것이 바람직하다.In addition, the presence of water in the solvent causes an additional reaction with trifluoromethane sulfonic anhydride, the reaction reagent, and the actual reaction equivalence ratio changes. Therefore, use an anhydrous solvent or determine the amount of water contained in advance to adjust the amount used. It is desirable to put more than equivalent amount.

다음,일반식(5)로 표시된 화합물을 얻는 방법으로는 상기에서 얻은 5-브로모 이소프탈산 디알킬에스테르 또는 5-트리플루오로메탄 술포닐옥시 이소프탈산 디알킬에스테르와 일반식(4)로 표시된 아세틸렌의 한쪽이Next, as a method of obtaining the compound represented by the general formula (5), the 5-bromo isophthalic acid dialkyl ester or 5-trifluoromethane sulfonyloxy isophthalic acid dialkyl ester obtained above is represented by the general formula (4). One side of acetylene

보호기 E,알킬기 또는 방향족기 E로 치환된 화합물을 촉매 존재하에서 질소,아르곤,헬륨 등의 불활성 가스 분위기 중에서 20∼150℃ 정도의 온도 범위에서 커플링 반응함에 따라 반응 생성물을 얻을 수 있다.이 때,반응 시간은 특별히 제한되지 않는다.이와 같이 하여 얻어진 반응 생성물에 대하여,농축,재침전 등의 분리 조작을 행함으로써 일반식(5)로 표시되는 화합물을 얻을 수 있고,필요에 따라 컬럼 크로마토그래피,재결정 등에 의하여 정제할 수 있다.The reaction product can be obtained by coupling the compound substituted with the protecting group E, the alkyl group or the aromatic group E in the presence of a catalyst in an inert gas atmosphere such as nitrogen, argon or helium at a temperature range of about 20 to 150 ° C. The reaction time is not particularly limited. The reaction product obtained in this way can be subjected to separation operations such as concentration and reprecipitation to obtain the compound represented by the general formula (5). It can be refined by recrystallization.

일반식(4)로 표시된 아세틸렌의 한쪽이 보호기 E로 보호된 화합물로는, 보호기 E가 알칼리금속의 수산화물로 탈보호될 수 있는 화합물이라면 특별히 제한되지 않으나 보호기 E가 트리메틸실릴기인 트리메틸실릴 아세틸렌이나 히드록시 프로필기인 3-메틸-1-부틴-3-올이 매우 적합하다.일반식(4)로 표시되는 화합물은 일반식(3)으로 표시되는 화합물에 대하여 계산상으로 1 당량배면 충분하나,반응을 완전하게 진행시키기 위해서는 1∼2 당량배의 범위에서 첨가량을 조절하여도 된다.The compound in which one side of the acetylene represented by the general formula (4) is protected by the protecting group E is not particularly limited as long as the protecting group E is a compound which can be deprotected by the hydroxide of an alkali metal, but the protecting group E is trimethylsilyl acetylene or a hydride group 3-Methyl-1-butyn-3-ol, which is a hydroxypropyl group, is very suitable. The compound represented by the general formula (4) is sufficient to calculate the equivalent of 1 equivalent by weight to the compound represented by the general formula (3). In order to proceed completely, the addition amount may be adjusted in the range of 1 to 2 equivalent times.

촉매계로는, 통상 탄소-탄소 결합을 형성할 수 있는 촉매계라면 특별히 제한없이 이용할 수 있지만 디클로로비스(트리페닐포스핀)팔라듐과 요오드화구리 및 트리페닐포스핀으로 이루어진 촉매계를 이용하는 것이 바람직하다.디클로로비스(트리페닐포스핀)팔라듐의 첨가량은 특별히 규정되지 않지만 일반식(5)로 표시된 화합물에 대하여,0.1∼1몰%,트리페닐포스핀은 디클로로 비스(트리페닐포스핀)팔라듐에 대하여 1∼20 당량배,요오드화구리는 1∼5 당량배의 범위가 바람직하다.As the catalyst system, any catalyst system capable of forming a carbon-carbon bond can be used without particular limitation, but it is preferable to use a catalyst system composed of dichlorobis (triphenylphosphine) palladium, copper iodide and triphenylphosphine. Although the addition amount of (triphenylphosphine) palladium is not specifically defined, 0.1-1 mol% with respect to the compound represented by General formula (5), Triphenyl phosphine is 1-20 with respect to dichloro bis (triphenylphosphine) palladium. Equivalent pear, copper iodide is preferably in the range of 1 to 5 equivalents.

이 반응에 사용된 용매로는 발생한 산을 포착하여 촉매 반응을 촉진하기 위해 아민계의 용매가 바람직하게 사용되다. 이러한 용매로는 디에틸아민,트리에틸아민,부틸아민,트리부틸아민 등의 3급아민류,피리딘,피페리딘 등의 고리형 아민류 등을 들 수 있다.이들 용매는 단독 또는 2종 이상을 조합하여 사용한다.그 사용량은 특별히 한정되지 않지만 원료에 대하여 2∼50 중량배가 바람직하다.또,이들 용매는 부수적 반응이나 촉매 활성의 상실 등을 막기 위해 미리 증류해 두는 것이 바람직하다.As the solvent used in this reaction, an amine solvent is preferably used to capture the generated acid and promote the catalytic reaction. Such solvents include tertiary amines such as diethylamine, triethylamine, butylamine and tributylamine, and cyclic amines such as pyridine and piperidine. These solvents may be used alone or in combination of two or more thereof. Although the amount of use thereof is not particularly limited, it is preferably 2 to 50 times by weight based on the raw materials. In addition, it is preferable to distill these solvents in advance to prevent side reactions and loss of catalytic activity.

다음에,일반식(6)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 얻는 방법으로는 일반식(5)로 표시된 화합물을 용매중에서 알칼리금속 수산화물 존재하에 처리하여 카르복실산 에스테르기의 탈알킬반응을 행하고, 또한 일반식(5)로 표시되는 화합물에 있어서,E기가 트리메틸실릴기,히드록시 프로필기 등의 보호기인 경우 에티닐기의 탈보호도 동시에 행함으로써,반응생성물을 얻는다.이 때,반응온도 및 반응시간은 특별히 제한되지 않지만 반응 온도에 관해서는,실온 내지 용매의 환류 온도의 범위가 바람직하다.얻어진 반응 생성물을 냉각하여 석출한 결정을 분리하고,메탄올,에탄올,부탄올,이소프로판올 등의 알코올계 용매로 세정하고,그 후 건조함으로써 일반식(6)으로 표시된 이소프탈산 유도체의 알칼리금속염을 얻을 수 있다. Next, as a method of obtaining an alkali metal salt of an isophthalic acid derivative represented by the general formula (6), the compound represented by the general formula (5) is treated in the presence of an alkali metal hydroxide in a solvent to dealkylate the carboxylic ester group. And in the compound represented by the general formula (5), in the case where the E group is a protecting group such as trimethylsilyl group, hydroxypropyl group or the like, deprotection of the ethynyl group is also performed simultaneously to obtain a reaction product. And the reaction time is not particularly limited, but the reaction temperature is preferably in the range of room temperature to the reflux temperature of the solvent. The obtained crystals are cooled to separate the precipitated crystals, and alcohols such as methanol, ethanol, butanol and isopropanol are used. By washing with a solvent and then drying, an alkali metal salt of isophthalic acid derivative represented by the general formula (6) can be obtained. have.

알칼리금속 수산화물으로는, 수산화칼륨,수산화나트륨이 바람직하고,첨가량은 일반식(5)로 표시된 화합물에 대하여 3 당량배 이상이 바람직하다.As alkali metal hydroxide, potassium hydroxide and sodium hydroxide are preferable, and addition amount is 3 or more times more preferable with respect to the compound represented by General formula (5).

반응 용매로는, 알칼리금속 수산화물과 반응하는 에스테르류를 제외하면 특별히 제한되지 않으나 알칼리금속 수산화물의 용해성이 높은 메탄올,에탄올,부탄올, 이소프로판올 등의 알코올계 용매가 바람직하다.용매의 양은 특별히 제한되지 않지만 조작성의 문제를 고려하여 일반식(5)로 표시되는 화합물에 대하여 5∼50 중량배의 범위가 좋다.The reaction solvent is not particularly limited except for esters reacting with the alkali metal hydroxide, but alcohol solvents such as methanol, ethanol, butanol, and isopropanol, which have high solubility of the alkali metal hydroxide, are preferable. The amount of the solvent is not particularly limited. Considering the problem of operability, the range of 5 to 50 times by weight with respect to the compound represented by the general formula (5) is good.

본 발명의 일반식(1-1)로 표시되는 방향족 카르복실산은 상기에서 얻어진 이소프탈산 유도체의 알칼리금속염[식(6)]을 물에 용해하고,염산,황산,질산 등의 산으로 바람직하게는 pH1까지 산성화 처리하여 석출물을 얻고 이것을 취하여 세정, 건조하여 얻을 수 있다.이 경우,강산성 하에서 장시간 두면 에티닐 부위가 부가 반응이나 중합 등의 부수적 반응을 받는 경우가 있기 때문에 단시간에 처리하는 것이 바람직하다.The aromatic carboxylic acid represented by the general formula (1-1) of the present invention dissolves the alkali metal salt [formula (6)] of the isophthalic acid derivative obtained above in water, and is preferably an acid such as hydrochloric acid, sulfuric acid or nitric acid. The precipitate is obtained by acidification to pH1, which can be taken, washed and dried. In this case, if left for a long time under strong acidity, the ethynyl moiety may receive side reactions such as addition reaction or polymerization, and therefore it is preferable to treat it for a short time. .

본 발명의 일반식(2-1)로 표시되는 상기 카르복실산의 산할로겐화물 유도체는 상기에서 얻어진 이소프탈산 유도체의 알칼리금속염〔식(6)〕을 용매 중에서 또는 과잉량의 할로겐화제를 용매로서 이용하여 0∼70℃ 정도의 온도 범위에서 할로겐화제와 반응시킨 후 용매를 제거하고,수득된 고형물을 용매로 세정하고,계속해서 재결정시켜 얻을 수 있다.또,일반식(6)으로 표시된 이소프탈산 유도체의 알칼리금속염 대신에,일반식(1-1)로 표시되는 방향족 카르복실산을 이용해도 된다.The acid halide derivatives of the carboxylic acid represented by the general formula (2-1) of the present invention may be obtained by using the alkali metal salt [formula (6)] of the isophthalic acid derivative obtained above in a solvent or an excess of a halogenating agent as a solvent. It can be obtained by reacting with a halogenating agent at a temperature in the range of about 0 to 70 ° C., then removing the solvent, washing the obtained solid with a solvent, and subsequently recrystallizing. In addition, isophthalic acid represented by the general formula (6) is obtained. Instead of the alkali metal salt of the derivative, an aromatic carboxylic acid represented by the general formula (1-1) may be used.

할로겐화제로는, 할로겐화 티오닐,할로겐화 옥살릴 등이 바람직하고,할로겐화제의 사용량은 일반식(6)으로 표시된 이소프탈산 유도체의 알칼리금속염에 대하여,통상 2당량배 이상이며 특별히 상한값은 없다.또,용매를 이용하지 않는 경우에는 10당량배 이상의 과잉량으로 이용해도 무방하다.As the halogenating agent, thionyl halide, oxalyl halide and the like are preferable, and the amount of the halogenating agent is usually 2 equivalents or more to the alkali metal salt of the isophthalic acid derivative represented by the general formula (6), and there is no particular upper limit. When the solvent is not used, it may be used in excess of 10 equivalents or more.

용매는 특별히 한정되지 않지만 예를 들면 벤젠,톨루엔, 크실렌 등의 방향족 탄화수소,펜탄,헥산,시클로헥산,석유에테르 등의 탄화수소,디클로로메탄, 클로로포름,4염화탄소,1,2-디클로로에탄,클로로벤젠 등의 할로겐화 탄화수소 등을 들 수 있다.이들은 일반식(6)으로 표시되는 이소프탈산 유도체의 알칼리금속염에 대하여,임의의 양으로서 사용할 수 있다.The solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, hydrocarbons such as pentane, hexane, cyclohexane and petroleum ether, dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane and chlorobenzene Halogenated hydrocarbons, and the like. These may be used as arbitrary amounts with respect to the alkali metal salt of the isophthalic acid derivative represented by the general formula (6).

이 때 반응을 촉진하기 위해 N,N-디메틸 포름아미드,피리딘 등의 염기를 첨가해도 된다.At this time, in order to accelerate the reaction, a base such as N, N-dimethyl formamide or pyridine may be added.

또한 에티닐 부위에서의 중합을 억제하기 위해 히드로퀴논,히드로퀴논 모노메틸 에테르 등의 중합 금지제를 첨가해도 된다.Moreover, you may add polymerization inhibitors, such as hydroquinone and a hydroquinone monomethyl ether, in order to suppress superposition | polymerization in an ethynyl site | part.

더욱,일반식(6)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 산처리하여 수득한 일반식(1-1)로 표시되는 방향족 카르복실산을 할로겐화제로 처리하여 일반식(2-1)로 표시되는 산할로겐화물 유도체를 얻을 수 있다.상기 할로겐화제로는 실용적인 면에서 염소화제가 바람직하다.Furthermore, the aromatic carboxylic acid represented by the general formula (1-1) obtained by acid treatment of the alkali metal salt of the isophthalic acid derivative represented by the general formula (6) is treated with a halogenating agent and represented by the general formula (2-1). An acid halide derivative can be obtained. As the halogenating agent, a chlorinating agent is preferable from the practical point of view.

다음,상기 일반식(1-2)로 표시되는 방향족 카르복실산 및 일반식(2-2)으로 표시되는 방향족 카르복실산의 산할로겐화물 유도체는 아래와 같은 루트에 의하여 제조할 수 있다.Next, the acid halide derivatives of the aromatic carboxylic acid represented by the general formula (1-2) and the aromatic carboxylic acid represented by the general formula (2-2) can be produced by the following routes.

Figure 112003018647610-pct00029
Figure 112003018647610-pct00029

일반식(7)에 있어서, D는 탈리기를, 일반식(8),(9),(10),(1-2) 및 (2-2)에 있어서 R2는 알킬기 또는 방향족기를,일반식(10)에 있어서 M은 알칼리금속을,일반식(2-2)에 있어서 X는 할로겐 원자,바람직하게는 염소원자를,각 식에 있어서 R은 저급알킬기,바람직하게는 메틸기를 나타낸다.In general formula (7), D is a leaving group, and in general formula (8), (9), (10), (1-2) and (2-2), R <2> is an alkyl group or an aromatic group, In (10), M represents an alkali metal, in formula (2-2), X represents a halogen atom, preferably a chlorine atom, and in each formula, R represents a lower alkyl group and preferably a methyl group.

먼저,출발 원료로서 식(11)로 표시되는 히드록시 이소프탈산 디알킬에스테르와 식(16)으로 표시되는 플루오로 니트로벤젠과,탄산칼륨이나 탄산나트륨 등의 염기를 이용한 에테르결합 생성 반응에 의하여,식(17)로 표시되는 5-(니트로페녹시)이소프탈산 디알킬에스테르를 얻을 수 있다.First, as a starting material, an ether bond formation reaction using a hydroxy isophthalic acid dialkyl ester represented by the formula (11) and a fluoro nitrobenzene represented by the formula (16) and a base such as potassium carbonate or sodium carbonate is used. 5- (nitrophenoxy) isophthalic acid dialkyl ester represented by (17) can be obtained.

이 화합물을 수소 분위기 하에서 팔라듐-활성탄 또는 백금-활성탄 등으로 처리 또는 산성 조건하에서 주석이나 염화주석 등으로 처리하여,식(18)로 표시된 5-(아미노페녹시)이소프탈산 디알킬에스테르를 얻는다.The compound is treated with palladium-activated carbon or platinum-activated carbon in a hydrogen atmosphere or with tin or tin chloride under acidic conditions to obtain 5- (aminophenoxy) isophthalic acid dialkyl ester represented by formula (18).

이 화합물은 산성용액 중에서 아질산나트륨을 가함으로써 디아조화하고 요오드화칼륨,요오드화나트륨,브롬화구리 또는 염화구리를 가함으로써, 일반식(7)로 표시되는 화합물에 있어서,탈리기 D가 할로겐인 5-(요오드페녹시)이소프탈산 디알킬에스테르, 5-(브로모페녹시)이소프탈산 디알킬에스테르 또는 5-(클로로페녹시)이소프탈산 디알킬에스테르를 얻을 수 있다.This compound is diazotized by adding sodium nitrite in an acidic solution, and is added to potassium iodide, sodium iodide, copper bromide or copper chloride to give a compound represented by the general formula (7). Iophenphenoxy) isophthalic acid dialkyl ester, 5- (bromophenoxy) isophthalic acid dialkyl ester, or 5- (chlorophenoxy) isophthalic acid dialkyl ester can be obtained.

또다른 방법으로서,식(18)로 표시되는 화합물을 아질산나트륨으로 디아조화하여 산성 조건하에서 가열함으로써,식(19)로 표시된 화합물의 5-(히드록시페녹시)이소프탈산 디알킬에스테르를 얻을 수 있다.이 화합물을 트리플루오로메탄 술폰산 무수물로 에스테르화함으로써,일반식(7)으로 표시되는 화합물에 있어서 탈리기 D가 트리플루오로메탄 술포닐옥시기인 5-(트리플루오로메탄 술포닐옥시페녹시)이소프탈산 디알킬에스테르를 얻을 수 있다.As another method, 5- (hydroxyphenoxy) isophthalic acid dialkyl ester of the compound represented by formula (19) can be obtained by diazotizing the compound represented by formula (18) with sodium nitrite and heating under acidic conditions. By esterifying this compound with trifluoromethane sulfonic anhydride, 5- (trifluoromethane sulfonyloxyphenoxy in which the leaving group D is a trifluoromethane sulfonyloxy group in the compound represented by the general formula (7). Isophthalic acid dialkyl ester can be obtained.

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상기와 동일하게 하여, 일반식(7)로 표시되는 디알킬에스테르 화합물과 일반식(8)로 표시되는 아세틸렌의 한쪽이 R2 기로 치환된 화합물로 커플링 반응시켜 일반식(9)로 표시되는 화합물을 얻을 수 있다.또한 여기에서, 치환기 R2로는 방향족기 또는 알킬기를 들 수 있고,방향족기로는 페닐기,나프틸기,안트릴기,퀴놀릴기,퀴녹살릴기 등이,알킬기로는 에틸기,프로필기,부틸기 등을 들 수 있다.In the same manner as described above, one of the dialkyl ester compound represented by the general formula (7) and the acetylene represented by the general formula (8) is reacted with a compound substituted with a R 2 group to represent the general formula (9). In addition, the substituent R 2 includes an aromatic group or an alkyl group. Examples of the aromatic group include a phenyl group, a naphthyl group, an anthryl group, a quinolyl group, a quinoxalyl group, and an alkyl group as an alkyl group. A propyl group, a butyl group, etc. are mentioned.

다음,이 화합물을 알칼리금속 수산화물을 이용하여 카르복실산 에스테르기로부터 탈알킬반응을 행하여 일반식(10)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 얻을 수 있다.This compound is then dealkylated from a carboxylic ester group using an alkali metal hydroxide to obtain an alkali metal salt of an isophthalic acid derivative represented by the general formula (10).

또한,일반식(10)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 산처리하여일반식(1-2)으로 표시되는 방향족 카르복실산을, 또한 할로겐화제,바람직하게는 염소화제로 처리하여일반식(2-2)으로 표시되는 할로겐화물 유도체,바람직하게는 산염화물 유도체를 얻을 수 있다.In addition, the acid treatment of the alkali metal salt of the isophthalic acid derivative represented by the general formula (10) to the aromatic carboxylic acid represented by the general formula (1-2) with a halogenating agent, preferably a chlorinating agent, The halide derivative represented by 2-2), preferably an acid chloride derivative, can be obtained.

이하,상기 일반식(1-2)로 표시되는 방향족 카르복실산 및 일반식(2-2)로 표시되는 방향족 카르복실산의 산할로겐화물 유도체의 제조법의 예에 관하여 설명한다.Hereinafter, the example of the manufacturing method of the acid halide derivative of aromatic carboxylic acid represented by the said General formula (1-2) and aromatic carboxylic acid represented by General formula (2-2) is demonstrated.

상기 제조예에 있어서,식(17)로 표시되는 5-(니트로페녹시)이소프탈산 디알킬에스테르는 5-히드록시 이소프탈산 디알킬에스테르〔식(11)〕와 플루오로니트로벤젠〔식(16)〕으로부터, N,N-디메틸 포름아미드,N,N-디메틸 아세트아미드,N-메틸-2-피롤리돈,디메틸 설폭시드 등의 극성용매 중에서,탄산칼륨이나 탄산나트륨 같은 염기의 존재하에 100℃∼200℃ 정도의 온도 범위에서 반응시킬 수 있다.이 때,반응시간은 특별히 제한되지 않는다.상기 용매량은 특별히 제한되지 않는다.또한 상기 염기의 사용량으로는 5-히드록시 이소프탈산 디알킬 에스테르에 대하여 1∼10 당량배가 바람직하다.In the above production example, the 5- (nitrophenoxy) isophthalic acid dialkyl ester represented by the formula (17) is a 5-hydroxy isophthalic acid dialkyl ester [formula (11)] and fluoronitrobenzene [formula (16) ), 100 ° C. in the presence of a base such as potassium carbonate or sodium carbonate in a polar solvent such as N, N-dimethyl formamide, N, N-dimethyl acetamide, N-methyl-2-pyrrolidone or dimethyl sulfoxide. The reaction time is not particularly limited. The amount of the solvent is not particularly limited. The amount of the base is used in 5-hydroxy isophthalic acid dialkyl ester. 1-10 equivalent times is preferable.

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또한,식(18)로 표시되는 5-(아미노페녹시)이소프탈산 디알킬에스테르는 5-(니트로페녹시)이소프탈산 디알킬에스테르〔식(17)〕를 테트라하이드로푸란,테트라하이드로푸란/에탄올 (또는 메탄올 등의 알코올계) 혼합 용매,N,N-디메틸 포름아미드 같은 용매중에서,수소 분위기하에 팔라듐-활성탄이나 백금-활성탄 같은 촉매로 처리하여 수득된다.이 때,반응 시간이나 상기 용매양은 특별히 제한되지 않는다.또한,상기 촉매의 사용량으로는 5-(아미노페녹시)이소프탈산 디알킬에스테르에 대하여 0.1∼10몰%가 바람직하다.In addition, 5- (aminophenoxy) isophthalic acid dialkyl ester represented by Formula (18) is a 5- (nitrophenoxy) isophthalic acid dialkyl ester [formula (17)] tetrahydrofuran, tetrahydrofuran / ethanol It is obtained by treating with a catalyst such as palladium-activated carbon or platinum-activated carbon in a hydrogen atmosphere, in a mixed solvent such as methanol or a solvent such as N, N-dimethyl formamide. At this time, the reaction time and the amount of the solvent are particularly The amount of the catalyst used is preferably 0.1 to 10 mol% relative to 5- (aminophenoxy) isophthalic acid dialkyl ester.

또는 5-(니트로페녹시)이소프탈산 디알킬에스테르를 산성 조건하에서, 주석 또는 염화 주석 등으로 처리하여 5-(아미노페녹시)이소프탈산 디알킬 에스테르를 얻을 수 있다.Alternatively, 5- (nitrophenoxy) isophthalic acid dialkyl ester may be treated with tin or tin chloride or the like under acidic conditions to obtain 5- (aminophenoxy) isophthalic acid dialkyl ester.

일반식(7)로 표시된 화합물에서, 탈리기 D가 요오드인 5-(요오드페녹시)이소프탈산 디알킬에스테르의 예로는, 먼저 5-(요오드페녹시)이소프탈산 디알킬 에스테르는 상기 5-(아미노페녹시)이소프탈산 디알킬에스테르〔식(18)〕와 광산 수용액 및 아질산나트륨을 반응시켜서 디아조늄 광산염을 얻고 이것을 요오드화칼륨 또는 요오드화나트륨과 반응시킴으로써 질소가스가 발생하여 5-(요오드페녹시)이소프탈산 디알킬에스테르를 얻을 수 있다.상기 광산으로는 황산,염산,질산,브롬화수소산 등을 들 수 있고 그 사용량은 특별히 제한되지 않는다.상기 아질산나트륨 및 상기 요오드화칼륨 또는 요오드화나트륨의 사용량은 5-(아미노페녹시)이소프탈산 디알킬에스테르에 대하여 1∼2 당량배가 바람직하다.In the compound represented by the general formula (7), examples of the 5- (iodinephenoxy) isophthalic acid dialkyl ester in which the leaving group D is iodine include, first, 5- (iodinephenoxy) isophthalic acid dialkyl ester Aminophenoxy) isophthalic acid dialkyl ester [formula (18)] reacts with an aqueous solution of mineral acid and sodium nitrite to obtain a diazonium mineral acid salt, which is then reacted with potassium iodide or sodium iodide to generate nitrogen gas. The isophthalic acid dialkyl ester can be obtained. Examples of the mine include sulfuric acid, hydrochloric acid, nitric acid, hydrobromic acid, and the like, and the amount thereof is not particularly limited. The amount of sodium nitrite and potassium iodide or sodium iodide is 5 It is preferably 1 to 2 equivalents based on-(aminophenoxy) isophthalic acid dialkyl ester.

일반식(7)로 표시되는 화합물에서, 탈리기 D가 브롬 및 염소인 5-(브로모페녹시)이소프탈산 디알킬에스테르 및 5-(클로로페녹시)이소프탈산 디알킬에스테르의 예로는 상기 반응예에 있어서 요오드화칼륨 또는 요오드화나트륨 대신 브롬화구리 및 염화구리를 이용함으로써 각각 수득할 수 있다.In the compound represented by the general formula (7), examples of 5- (bromophenoxy) isophthalic acid dialkyl ester and 5- (chlorophenoxy) isophthalic acid dialkyl ester in which leaving group D is bromine and chlorine are mentioned in the above reaction. In the example, it can obtain by using copper bromide and copper chloride instead of potassium iodide or sodium iodide, respectively.

또한,탈리기 D가 트리플루오로메탄 술포닐옥시기인 5-(트리플루오로메탄 술포닐옥시페녹시)이소프탈산 디알킬에스테르의 예로는, 먼저 5-(아미노페녹시)이소프탈산 디알킬에스테르〔식(18)〕와 광산 및 아질산나트륨을 반응시켜서 디아조늄 광산염을 수득하고,이것을 산성 조건하에서 가열함으로써 5-(히드록시페녹시)이소프탈산 디알킬 에스테르〔식(19)〕를 얻는다.Further, examples of the 5- (trifluoromethane sulfonyloxyphenoxy) isophthalic acid dialkyl ester in which the leaving group D is a trifluoromethane sulfonyloxy group include, firstly, 5- (aminophenoxy) isophthalic acid dialkyl ester [ The diazonium mine salt is obtained by reacting photoacid and sodium nitrite, and this is heated under acidic conditions to obtain 5- (hydroxyphenoxy) isophthalic acid dialkyl ester [formula (19)].

상기 광산으로는 황산,염산,질산 등을 들 수 있고 그 사용량은 제한되지 않는다.상기 아질산나트륨의 사용량은 5-(아미노페녹시)이소프탈산 디알킬에스테르에 대하여 1∼2 당량배가 바람직하다.Examples of the mine include sulfuric acid, hydrochloric acid, nitric acid, and the like. The amount thereof is not limited. The amount of sodium nitrite is preferably 1 to 2 equivalents based on 5- (aminophenoxy) isophthalic acid dialkyl ester.

계속해서,5-(히드록시페녹시)이소프탈산 디알킬 에스테르〔식(19)〕와 염기를 용매에 용해하고,-78℃∼10℃ 정도에 냉각한 용액에 트리플루오로메탄 술폰산 무수물을 가하여,0℃ 내지 용매의 비등점 이하 정도의 온도 범위에서 반응시킨다.이와 같이 하여 얻어진 반응 생성물에 통상의 분리 수단,예를 들면 추출,분액,농축 등의 조작을 행하여 5-(트리플루오로메탄 술포닐옥시페녹시)이소프탈산 디알킬에스테르를 얻을 수 있다.Subsequently, 5- (hydroxyphenoxy) isophthalic acid dialkyl ester [formula (19)] and a base were dissolved in a solvent, trifluoromethane sulfonic anhydride was added to a solution cooled to about -78 ° C to 10 ° C. It is made to react in the temperature range of 0 degreeC-below the boiling point of a solvent. The reaction product obtained in this way is subjected to normal separation means, for example, extraction, separation, concentration, and the like, to give 5- (trifluoromethane sulfonyl Oxyphenoxy) isophthalic acid dialkyl ester can be obtained.

또,이것을 필요에 따라,재결정,컬럼크로마토그래피 등에 의하여 정제할 수 있다.Moreover, this can be refine | purified by recrystallization, column chromatography, etc. as needed.

상기 트리플루오로메탄 술폰산 무수물의 사용량으로는, 5-(히드록시페녹시)이소프탈산 디알킬에스테르에 대하여 1∼1.5 당량배가 바람직하다.As a usage-amount of the said trifluoromethane sulfonic anhydride, 1-1.5 equivalent times with respect to 5- (hydroxyphenoxy) isophthalic-acid dialkyl ester is preferable.

상기 염기로는 3급아민으로 활성수소를 갖지 않는 아민이 바람직하고, 구체적인 예로는 피리딘,메틸피리딘 등의 피리딘류,트리에틸아민,트리부틸아민 등의 트리알킬아민류 등을 들 수 있고, 이들의 사용량은 5-(히드록시페녹시)이소프탈산 디알킬에스테르와 트리플루오로메탄 술폰산 무수물의 합계량에 대하여 1∼1.5 당량배의 범위가 바람직하다.As the base, an amine having no active hydrogen as a tertiary amine is preferable, and specific examples thereof include pyridines such as pyridine and methylpyridine, trialkylamines such as triethylamine and tributylamine, and the like. The amount used is preferably in the range of 1 to 1.5 equivalent times the total amount of 5- (hydroxyphenoxy) isophthalic acid dialkyl ester and trifluoromethane sulfonic anhydride.

상기 용매로는 벤젠, 톨루엔,n-헥산,시클로헥산,석유에테르,에틸에테르,테트라하이드로푸란,디클로로메탄,1,2-디클로로메탄,클로로포름 등의 방향족 탄화수소,탄화수소,에테르,할로겐화 탄화수소 등의 반응에 불활성인 용매 단독 또는 이들의 혼합물을 들 수 있고,이들의 사용량에 있어서는 특별히 제한되지 않는다.Examples of the solvent include reactions of aromatic hydrocarbons such as benzene, toluene, n-hexane, cyclohexane, petroleum ether, ethyl ether, tetrahydrofuran, dichloromethane, 1,2-dichloromethane and chloroform, hydrocarbons, ethers, and halogenated hydrocarbons. A solvent alone or a mixture thereof may be mentioned, and the amount thereof is not particularly limited.

다음,일반식(9)로 표시되는 화합물을 얻는 방법으로는 상기에서 얻은 5-(요오드페녹시)이소프탈산 디알킬에스테르 또는 5-(트리플루오로메탄 술포닐옥시페녹시)이소프탈산 디알킬에스테르와 일반식(8)로 표시되는 아세틸렌의 한쪽이 알킬기 또는 방향족기 R2로 치환된 화합물을 상기의 일반식(5)로 표시되는 화합물과 동일한 방식으로 커플링 반응을 실행함으로써 얻을 수 있다.Next, as a method of obtaining the compound represented by General formula (9), the 5- (iodine phenoxy) isophthalic acid dialkyl ester or 5- (trifluoromethane sulfonyloxy phenoxy) isophthalic acid dialkyl ester obtained above is obtained. And a compound in which one of acetylene represented by formula (8) is substituted with an alkyl group or aromatic group R 2 can be obtained by carrying out a coupling reaction in the same manner as the compound represented by formula (5).

여기에서 일반식(8)로 표시되는 화합물으로는, 에티닐벤젠,에티닐 나프탈렌,에티닐 안트라센,에티닐 퀴놀린,에티닐 퀴녹살린,1-부틴,1-펜틴,3,3-디메틸-1-부틴,1-헥신 등을 들 수 있고,그 사용량은 일반식(7)로 표시되는 화합물에 대하여 1∼1.5 당량배가 바람직하다.Examples of the compound represented by the general formula (8) include ethynylbenzene, ethynyl naphthalene, ethynyl anthracene, ethynyl quinoline, ethynyl quinoxaline, 1-butyne, 1-pentine, 3,3-dimethyl-1 -Butyne, 1-hexyne, etc. are used, The usage-amount is 1-1.5 equivalent times with respect to the compound represented by General formula (7).

다음,일반식(10)으로 표시되는 이소프탈산 유도체의 알칼리금속염을 얻는 방법으로는 일반식(9)로 표시되는 화합물을 상기의 일반식(6)으로 표시되는 화합물과 동일한 방식에 따라 탈알킬화를 실행하여 얻을 수 있다.Next, as a method of obtaining the alkali metal salt of the isophthalic acid derivative represented by the general formula (10), dealkylation of the compound represented by the general formula (9) is carried out in the same manner as the compound represented by the general formula (6). You can get it by running

여기에서,알칼리금속 수산화물의 첨가량으로는 일반식(9)로 표시되는 화합물에 대하여,통상 2 당량배 이상이다.Here, as an addition amount of an alkali metal hydroxide, it is normally 2 equivalent times or more with respect to the compound represented by General formula (9).

일반식(1-2)로 표시되는 방향족 카르복실산은 상기에서 수득된 일반식(10)으로 표시되는 이소프탈산 유도체의 알칼리금속염으로부터 상기의 일반식(1-1)로 표시되는 방향족 카르복실산과 동일하게 하고,산성화 처리하여 얻어진다.또한,일반식(2-2)로 표시되는 상기 카르복실산의 산할로겐화물 유도체는 상기에서 얻어진 일반식(10)으로 표시된 이소프탈산 유도체의 알칼리금속염을 상기와 동일하게 하여 용매중에서 또는 과잉량의 할로겐화제를 용매로 하여 반응시켜서 얻을 수 있다. 또한,일반식(10)으로 표시되는 이소프탈산 유도체의 알칼리금속염 대신에,일반식(1-2)으로 표시되는 방향족 카르복실산을 이용해도 된다.상기 할로겐화제로는 실용적인 면에서, 염소화제가 바람직하다.The aromatic carboxylic acid represented by the general formula (1-2) is the same as the aromatic carboxylic acid represented by the above general formula (1-1) from the alkali metal salt of the isophthalic acid derivative represented by the general formula (10) obtained above. The acid halide derivative of the carboxylic acid represented by the general formula (2-2) may be prepared by combining the alkali metal salt of the isophthalic acid derivative represented by the general formula (10). Similarly, it can obtain by making it react in a solvent or an excess amount of halogenating agents as a solvent. In addition, an aromatic carboxylic acid represented by the general formula (1-2) may be used instead of the alkali metal salt of the isophthalic acid derivative represented by the general formula (10). Do.

이하에서, 본 발명을 실시예에 따라 더욱 상세히 설명하나,본 발명은 이들 예에 의하여 어떠한 형태로든 한정되지는 않는다.Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited in any way by these examples.

수득된 화합물은 특성 평가를 위해,융점측정,1H-NMR,13C-NMR,MS의 각종 스펙트럼의 측정 및 원소 분석을 행하였다.각 특성의 측정 조건은 다음과 같이 하였다.The obtained compound was subjected to melting point measurement, 1 H-NMR, 13 C-NMR, and measurement of various spectra and elemental analysis for characterization. The measurement conditions for each characteristic were as follows.

시험 방법Test Methods

(1) 융점: 세이코 전자제 DSC-200형 시차주사열량계(DSC)를 이용하여,10℃/분의 승온 속도에 따라 측정하였다.(1) Melting | fusing point: It measured with the temperature increase rate of 10 degree-C / min using the Seiko electronic DSC-200 type differential scanning calorimeter (DSC).

(2) 핵자기 공명 스펙트럼 분석(1H-NMR,13C-NMR): 일본전자(주)제 JNM-GSX400 형을 이용하여 측정하였다.1H-NMR은 공명주파수 400MHz, 13C-NMR은 공명주파수 10OMHz로 각각 측정하였다.측정 용매는 5-에티닐 이소프탈산은 중수소화 용매인 중수소화 디메틸 설폭시드 DMSO-d6,5- (2-페닐에티닐)이소프탈산은 중수소화 용매인 중수소화 아세톤(CD3)2CO,5-에티닐 이소프탈산 염화물, 5-(2-페닐에티닐)이소프탈산 염화물은 중수소화 용매인 중수소화 클로로포름 CDCl3을 각각 이용하였다.(2) Nuclear magnetic resonance spectrum analysis ( 1 H-NMR, 13 C-NMR): Measured using JNM-GSX400 manufactured by Nippon Electronics Co., Ltd. 1 H-NMR was measured at a resonance frequency of 400 MHz and 13 C-NMR at a resonance frequency of 10 MHz, respectively. Determination of 5-ethynyl isophthalic acid as a deuterated solvent, deuterated dimethyl sulfoxide DMSO-d 6 , 5- (2 -Phenylethynyl) isophthalic acid is deuterated acetone (CD 3 ) 2 CO, 5-ethynyl isophthalic acid chloride, 5- (2-phenylethynyl) isophthalic acid chloride is a deuterated solvent, deuterated chloroform CDCl 3 was used respectively.

(3) 적외분광 분석(IR): 일본전자(주)제 JIR-5500 형을 이용하여 KBr 정제법에 의하여 측정하였다.(3) Infrared spectroscopic analysis (IR): It measured by KBr purification method using JIR-5500 type | mold by Nippon Electronics.

(4) 질량 분석(MS): 일본전자(주)제 JMS-700형을 이용하여 필드탈착(FD)법으로 측정하였다.(4) Mass spectrometry (MS): It measured by field desorption (FD) method using JMS-700 type | mold by Japan Electronics.

(5) 원소 분석: 탄소 및 수소는 PERKIN ELMER사제 2400 형을 이용하고 염소는 프라스코 연소 적정법으로 측정하였다.(5) Elemental analysis: Carbon and hydrogen were measured by PERKIN ELMER 2400 type, and chlorine was measured by the Frasco combustion titration method.

(실시예 1)(Example 1)

[5-히드록시이소프탈산 디메틸으로부터 5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸의 제조] [Preparation of 5-trifluoromethane sulfonyloxy isophthalate dimethyl from 5-hydroxyisophthalic acid dimethyl]

온도계,짐로트 냉각관,염화칼슘관,교반기를 구비한 5리터의 4구 플라스크에 5-히드록시 이소프탈산 디메틸 190.0g (0.904몰),탈수 톨루엔 3리터,탈수 피리딘 214.7g (2.718몰)를 넣고 교반하면서 -30℃까지 냉각하였다.여기에 무수 트리플루오로메탄 술폰산 510.2g (1.808몰)를 온도가 -25℃ 이상으로 상승하지 않도록 주의하면서 천천히 적하하여 첨가하였다.이 경우,적하가 종료되기까지는 1시간을 필요로 하였다.첨가후,반응온도를 0℃로 승온하여 1시간, 또한 실온으로 승온하여 5시간 반응하였다.얻어진 반응 혼합물을 4리터의 얼음물에 붓고,수층과 유기층으로 분리하였다.계속해서 수층을 500ml의 톨루엔으로 2회 추출하고,이것을 앞의 유기층에 더하였다.이 유기층을 물 3L로 2회 세정하고,무수 황산 마그네슘 100g으로 건조, 여과시켜서 무수 황산 마그네슘을 제거하고 로터리 증발기로 톨루엔을 제거,감압 건조함으로써,담황색 고체의 5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸을 294.0g 수득했다 (수율 95%).이 조생성물을 헥산으로 재결정하여 백색 침상 결정을 얻고 이것을 다음 반응에 이용하였다.Into a 5-liter four-necked flask equipped with a thermometer, a cooling tube, a calcium chloride tube and a stirrer, 190.0 g (0.904 mol) of 5-hydroxy isophthalate, 3 liters of dehydrated toluene and 214.7 g (2.718 mol) of dehydrated pyridine were placed. The mixture was cooled to -30 DEG C while stirring. Here, 510.2 g (1.808 mol) of trifluoromethane anhydrous anhydrous acid was slowly added dropwise, taking care not to increase the temperature above -25 DEG C. In this case, until the dropping was completed. One hour was required. After the addition, the reaction temperature was raised to 0 deg. C for 1 hour, and the reaction temperature was raised to room temperature for 5 hours. The obtained reaction mixture was poured into 4 liters of ice water and separated into an aqueous layer and an organic layer. The aqueous layer was extracted twice with 500 ml of toluene and this was added to the preceding organic layer. The organic layer was washed twice with 3 L of water, dried over 100 g of anhydrous magnesium sulfate, filtered and anhydrous. 294.0 g of pale yellow solid 5-trifluoromethane sulfonyloxy isophthalate was obtained by removing magnesium sulfate, removing toluene by rotary evaporation (yield 95%). The crude product was recrystallized from hexane. White needle crystals were obtained and used for the next reaction.

삭제delete

[5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸로부터 4-(3, 5-비스(메톡시카르보닐)페닐)-2-메틸-3-부틴-1-올의 제조][Preparation of 4- (3,5-bis (methoxycarbonyl) phenyl) -2-methyl-3-butyn-1-ol from 5-trifluoromethane sulfonyloxy isophthalic acid dimethyl]

온도계,짐로트 냉각관,질소 도입관,교반기를 구비한 1리터의 4구 플라스크에 상기에서 얻은 5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸 125g(0.365몰),트리페닐포스핀 1.1g(0.00419몰),요오드화구리 0.275g(0.00144몰),3-메틸-1부틴-3-올 33.73g(0.401몰)를 넣고, 질소를 흐르게 하였다.탈수 트리에틸아민 375m1 및 탈수 피리딘 200m1을 가하여 교반용해하였다.1시간 동안 질소를 계속 흐르게 한 후,디클로로비스(트리페닐포스핀)팔라듐 0.3g(0.000427몰)을 재빠르게 첨가하고 유조(oil bath)에서 1시간 가열 환류하였다.그 후 트리에틸아민 및 피리딘을 감압 유거(留去)하여 점성이 있는 갈색용액을 얻었다. 이것을 물 500m1에 붓고 여기에서 석출된 고형물을 취한 후 다시 물 500ml,5몰/L 염산 500m1,물 500m1로 각각 2회 세정하였다.이 고형물을 50℃에서 감압 건조하여,98.8g의 4-(3,5-비스(메톡시카르보닐)페닐)-2-메틸-3-부틴-1-올을 얻었다 (수율 98%).125 g (0.365 mol) of dimethyl 5-trifluoromethane sulfonyloxy isophthalate obtained above and 1.1 g of triphenylphosphine in a 1 liter four-necked flask equipped with a thermometer, a gym lotion tube, a nitrogen introduction tube, and a stirrer. 0.00419 mol), 0.275 g (0.00144 mol) of copper iodide, and 33.73 g (0.401 mol) of 3-methyl-1butyn-3-ol were added thereto, and nitrogen was flowed. 375 m1 of dehydrated triethylamine and 200 m1 of dehydrated pyridine were added thereto, followed by stirring. After nitrogen was continuously flowed for 1 hour, 0.3 g (0.000427 mol) of dichlorobis (triphenylphosphine) palladium was added quickly and heated to reflux for 1 hour in an oil bath. Thereafter, triethylamine and The pyridine was distilled off under reduced pressure to obtain a viscous brown solution. This was poured into 500m1 of water, and the solid precipitated therefrom was taken out and washed twice with 500ml of water, 500m1 of 5 mol / L hydrochloric acid and 500m1 of water, respectively. The solid was dried under reduced pressure at 50 ° C, and 98.8g of 4- (3 , 5-bis (methoxycarbonyl) phenyl) -2-methyl-3-butyn-1-ol (yield 98%).

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[4-(3,5-비스(메톡시카르보닐)페닐)-2-메틸-3-부틴-1-올로부터 5-에티닐 이소프탈산 2칼륨염의 제조][Preparation of 5-ethynyl isophthalic acid dipotassium salt from 4- (3,5-bis (methoxycarbonyl) phenyl) -2-methyl-3-butyn-1-ol]

온도계,짐로트 냉각관,교반기를 구비한 5L의 4구 플라스크에 n-부탄올 3리터,수산화칼륨(85%) 182g(2.763몰)을 넣고,가열환류하여 용해하였다.여기에, 합성된 4-(3,5 비스(메톡시카르보닐)페닐)-2-메틸-3-부틴-1-올 95g(0.344몰)을 가하여 30분간 가열 환류하였다.이것을 빙욕에서 냉각하여 석출한 결정을 취하였다.이 결정을 에탄올 1리터로 2회 세정하고 60℃에서 감압 건조함으로써,88.87g의 5-에티닐 이소프탈산 2칼륨염을 얻었다 (97%).Into a 5-liter four-necked flask equipped with a thermometer, a cooling tube, and a stirrer, 3 liters of n-butanol and 182 g (2.763 mol) of potassium hydroxide (85%) were dissolved in a heated reflux solution. 95 g (0.344 mole) of (3,5 bis (methoxycarbonyl) phenyl) -2-methyl-3-butyn-1-ol was added thereto, followed by heating to reflux for 30 minutes. This was cooled in an ice bath to precipitate crystals. The crystals were washed twice with 1 liter of ethanol and dried under reduced pressure at 60 DEG C to obtain 88.87 g of 5-potynyl isophthalic acid dipotassium salt (97%).

[5-에티닐 이소프탈산 2칼륨염으로부터 5-에티닐 이소프탈산의 제조] [Preparation of 5-ethynyl isophthalic acid from 5-ethynyl isophthalic acid dipotassium salt]

5-에티닐 이소프탈산 2칼륨염 5g(0.019몰)을 20m1의 이온교환수로 용해하고 5C 여과지로 여과함으로써 불용물을 제거하였다.이 여과액에 5몰/L 염산을 pH가 1이 될 때까지 교반하면서 가하였다.석출한 고형물을 취하고, 이온교환수로 세정 및 여과를 2회 더 반복하였다.수득된 고형물을 50℃에서 감압 건조함으로써 5-에티닐 이소프탈산 3.6g를 얻었다 (수율99.5%).Insoluble matter was removed by dissolving 5 g (0.019 mol) of 5-ethynyl isophthalic acid dipotassium salt in 20m1 of ion-exchanged water and filtering with a 5C filter paper. When 5 mol / L hydrochloric acid had a pH of 1 The precipitated solid was taken out and washed and filtered twice with ion-exchanged water twice. The obtained solid was dried under reduced pressure at 50 ° C. to obtain 3.6 g of 5-ethynyl isophthalic acid (yield 99.5%). ).

[5-에티닐 이소프탈산 2칼륨염으로부터 5-에티닐 이소프탈산 2염화물의 제조] [Preparation of 5-ethynyl isophthalic acid dichloride from 5-ethynyl isophthalic acid dipotassium salt]

온도계,짐로트 냉각관,교반기를 구비한 2L의 4구 플라스크에 5-에티닐 이소프탈산 2칼륨염 80g(0.3몰),클로로포름 400미리리터를 넣고,0℃로 냉각하였다. 이것에 염화티오닐 391g(4.5몰)을 5℃ 이하에서 1시간에 걸쳐 적하하였다.그 후 디메틸 포름아미드 4m1,히드로퀴논 4g를 가하여 45∼50℃로 3시간동안 교반했다. 냉각뒤 여과시켜 결정을 제거하고 이 결정을 클로로포름 150m1로 세정하였다.여과액과 세정액을 합쳐서 40℃ 이하에서 감압 농축하고,수득된 잔사물을 디에틸에테르 200ml로 2회 추출여과 하였다.추출액으로부터 디에틸에테르를 감압 유거하여 반고체의 조생성물을 얻었다. 이것을 무수 n-헥산으로 세정하고,계속해서 디에틸에테르로 재결정하여 13g의 5-에티닐 이소프탈로일 디클로라이드를 얻었다 (수율 19%).Into a 2-liter four-necked flask equipped with a thermometer, a zigzag cooling tube, and a stirrer, 80 g (0.3 mol) of 5-ethynyl isophthalic acid dipotassium salt and 400 milliliters of chloroform were added and cooled to 0 deg. 391 g (4.5 mol) of thionyl chlorides were dripped at this at 5 degrees C or less over 1 hour. Then, 4 ml of dimethyl formamide and 4 g of hydroquinone were added, and it stirred at 45-50 degreeC for 3 hours. After cooling, the crystals were removed by filtration, and the crystals were washed with 150m1 of chloroform. The filtrate and the washing liquid were combined and concentrated under reduced pressure at 40 ° C or below, and the obtained residue was extracted twice with 200 ml of diethyl ether. Ethyl ether was distilled off under reduced pressure to obtain a semi-solid crude product. This was washed with anhydrous n-hexane, and then recrystallized with diethyl ether to obtain 13 g of 5-ethynyl isophthaloyl dichloride (yield 19%).

수득된 5-에티닐 이소프탈산 및 5-에티닐이소프탈산 2염화물의 스펙트럼 데이터를 다음과 같이 나타낸다.이들 데이터는 수득된 화합물이 목적물인 것을 지지하고 있다.The spectral data of the 5-ethynyl isophthalic acid and 5-ethynyl isophthalic acid dichloride obtained are shown as follows. These data support that the obtained compound is the target product.

[5-에티닐 이소프탈산(C10H6O4)][5-Ethynyl Isophthalic Acid (C 10 H 6 O 4 )]

외관: 백색 분말Appearance: white powder

융점: 106.2℃ (DSC, 10℃/분)Melting Point: 106.2 ° C (DSC, 10 ° C / min)

1H-NMR (400MHz, DMSO-d6): δ8.16(s,2H), 8.45(s,1H) 1 H-NMR (400 MHz, DMSO-d 6 ): δ 8.16 (s, 2H), 8.45 (s, 1H)

13C-NMR (100MHz, DMSO-d6): δ81.5, 82.6, 122.7, 130.0, 131.9, 135.9, 165.7 13 C-NMR (100 MHz, DMSO-d 6 ): δ 81.5, 82.6, 122.7, 130.0, 131.9, 135.9, 165.7

IR(KBr, cm-1): 3272, 3081, 1797, 1741, 1438, 1265, 800, 761IR (KBr, cm -1 ): 3272, 3081, 1797, 1741, 1438, 1265, 800, 761

MS(FD)(m/z): 190(M+)MS (FD) (m / z): 190 (M + )

원소 분석: Elemental Analysis:

이론치 C:63.16% H:3.18% O:33.66%Theoretical C: 63.16% H: 3.18% O: 33.66%

실측치 C:63.24% H:3.09% O:33.67%Found C: 63.24% H: 3.09% O: 33.67%

[5-에티닐 이소프탈산 2염화물 (C10H4O2Cl2)][5-Ethynyl Isophthalic Acid Dichloride (C 10 H 4 O 2 Cl 2 )]

외관: 백색 고체Appearance: white solid

융점: 49℃ (DSC,10℃/분) Melting Point: 49 ℃ (DSC , 10 ℃ / min)                 

1H-NMR (400MHz, CDCl3): δ8.47(s, 2H), 8.77(s, 1H) 1 H-NMR (400 MHz, CDCl 3 ): δ 8.47 (s, 2H), 8.77 (s, 1H)

13C-NMR (100MHz, CDCl3): δ80.0, 81.6, 124.9, 133.0, 134.7, 139.8, 166.6 13 C-NMR (100 MHz, CDCl 3 ): δ 80.0, 81.6, 124.9, 133.0, 134.7, 139.8, 166.6

IR(KBr, cm-1): 3465, 3077, 1766, 1736, 1151, 1022, 802, 740IR (KBr, cm -1 ): 3465, 3077, 1766, 1736, 1151, 1022, 802, 740

MS(FD)(m/z): 190(M+-2Cl)MS (FD) (m / z): 190 (M + -2Cl)

원소 분석:Elemental Analysis:

이론치 C:52.86% H:1.77% C1:31.21% O:14.08%Theoretical C: 52.86% H: 1.77% C1: 31.21% O: 14.08%

실측치 C:52.74% H:1.70% C1:30.89% O:14.67%Found C: 52.74% H: 1.70% C1: 30.89% O: 14.67%

(실시예 2)(Example 2)

[5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸로부터 1-(3,5-비스(메톡시카르보닐)페닐)2-페닐에틴의 제조][Preparation of 1- (3,5-bis (methoxycarbonyl) phenyl) 2-phenylethine from 5-trifluoromethane sulfonyloxy isophthalic acid dimethyl]

온도계,짐로트 냉각관,질소 도입관,교반기를 구비한 1리터의 4구 플라스크에 실시예 1와 똑같이 하여 수득된 5-트리플루오로메탄 술포닐옥시이소프탈산 디메틸 125g(0.365몰),트리페닐 포스핀 1.1g(0.00419몰),요오드화구리 0.275g(0.00144몰),에티닐벤젠 40.95g(0.401몰)을 넣고,질소를 흐르게 하였다.탈수 트리에틸아민 375ml 및 탈수 피리딘 200ml을 가하여,교반용해하였다.1시간 동안 질소를 계속 흐르게 한 후,디클로로비스(트리페닐포스핀)팔라듐 0.3g(0.000427몰)을 재빠르게 첨가하여,유조 내에서 1시간동안 가열 환류하였다.그 후 트리에틸아민 및 피리딘을 감압 유거하여 점성의 갈색용액을 얻었다. 이것을 물 500m1에 넣어 석출한 고형물을 취하고, 또한 물 500m1,5몰/L 염산 500m1,물 500m1로 각각 2회 세정하였다.이 고형물을 50℃에서 감압 건조하여 80.8g의 1-(3,5-비스(메톡시카르보닐)페닐)-2-페닐에틴을 얻었다 (수율 75%).125 g (0.365 mole) of dimethyl 5-trifluoromethane sulfonyloxyisophthalate obtained in the same manner as in Example 1 in a one-liter four-necked flask equipped with a thermometer, a gym lotion tube, a nitrogen inlet tube, and a stirrer; 1.1 g (0.00419 mol) of phosphine, 0.275 g (0.00144 mol) of copper iodide, 40.95 g (0.401 mol) of ethynylbenzene were added, and nitrogen was flowed. 375 ml of dehydrated triethylamine and 200 ml of dehydrated pyridine were added and stirred and dissolved. After continuously flowing nitrogen for 1 hour, 0.3 g (0.000427 mol) of dichlorobis (triphenylphosphine) palladium was added quickly, and the mixture was heated to reflux for 1 hour in an oil bath. Thereafter, triethylamine and pyridine were added. Distillation under reduced pressure gave a viscous brown solution. The precipitated solid was taken out in 500m1 of water, and washed twice with 500m1 of water, 500m1 of 5 mol / L hydrochloric acid and 500m1 of water, respectively. The solid was dried under reduced pressure at 50 ° C and 80.8g of 1- (3,5- Bis (methoxycarbonyl) phenyl) -2-phenylethine was obtained (yield 75%).

[(3,5-비스(메톡시카르보닐)페닐)-2-페닐에틴으로부터 5-(2-페닐에티닐)이소프탈산 2칼륨염의 제조][Preparation of 5- (2-phenylethynyl) isophthalic acid dipotassium salt from (3,5-bis (methoxycarbonyl) phenyl) -2-phenylethine]

온도계,짐로트 냉각관,교반기를 구비한 5L의 4구 플라스크에 n-부탄올 3리터,수산화칼륨(85%) 180g(2.72몰)을 넣고,가열 환류하여 용해하였다.이것에 합성된 (3,5-비스(메톡시카르보닐)페닐)-2-페닐에틴 80g (0.272몰)를 가하고 30분간 가열 환류하였다.이것을 빙욕에서 냉각 석출한 결정을 취하였다. 이 결정을 에탄올 1리터로 2회 세정하고,60℃에서 감압 건조함으로써 90.35g의 5-(2-페닐에티닐)이소프탈산 2칼륨염을 얻었다 (97%).In a 5-liter four-necked flask equipped with a thermometer, a cooling tube and a stirrer, 3 liters of n-butanol and 180 g (2.72 moles) of potassium hydroxide (85%) were dissolved under heating and refluxed. 80 g (0.272 mol) of 5-bis (methoxycarbonyl) phenyl) -2-phenylethine was added thereto, and the mixture was heated to reflux for 30 minutes. This was crystallized by cooling precipitated in an ice bath. The crystals were washed twice with 1 liter of ethanol and dried at 60 ° C. under reduced pressure to obtain 90.35 g of 5- (2-phenylethynyl) isophthalic acid dipotassium salt (97%).

[5-(2-페닐에티닐)이소프탈산 2칼륨염으로부터 5-(2-페닐에티닐)이소프탈산의 제조][Production of 5- (2-phenylethynyl) isophthalic acid from 5- (2-phenylethynyl) isophthalic acid dipotassium salt]

5-(2-페닐에티닐)에티닐 이소프탈산 2칼륨염 6.5g(0.019몰)을 20m1의 이온교환수에 용해하고 5C 여과지로 여과하여 불용물을 제거하였다.이 여과액에 5몰/L 염산을 pH가 1이 될 때까지 교반하면서 가하였다.석출한 고형물을 취하고, 이온교환수로 세정,여과를 2회 더 반복하였다.수득된 고형물을 50℃에서 감압 건조하여 5-(2-페닐에티닐)이소프탈산 5.0g를 얻었다 (수율 99.5%).6.5 g (0.019 mol) of 5- (2-phenylethynyl) ethynyl isophthalic acid dipotassium salt was dissolved in 20 ml of ion-exchanged water and filtered through a 5C filter paper to remove insoluble materials. 5 mol / L Hydrochloric acid was added with stirring until pH was 1. The precipitated solid was taken, washed with ion-exchanged water and filtered twice more. The obtained solid was dried under reduced pressure at 50 ° C. to obtain 5- (2-phenyl). Etinyl) isophthalic acid 5.0g was obtained (yield 99.5%).

[5-(2-페닐에티닐)이소프탈산 2칼륨염으로부터 5-(2-페닐에티닐)이소프탈산 2염화물의 제조][Preparation of 5- (2-phenylethynyl) isophthalic acid dichloride from 5- (2-phenylethynyl) isophthalic acid dipotassium salt]

온도계,짐로트 냉각관,교반기를 구비한 2L의 4구 플라스크에 5-(2-페닐에티닐)이소프탈산 2칼륨염 82.1g(0.24몰),1,2-디클로로에탄 400리터를 넣고 0℃로 냉각하였다.이것에 염화티오닐 391g(4.5몰)을 5℃ 이하에서 1시간에 걸쳐 적하하였다.그 후,디메틸 포름아미드 4m1,히드로퀴논 4g를 가하여,45∼50℃에서 3시간동안 교반하였다. 냉각 후 여과하여 결정을 제거하고, 이 결정을 클로로포름 150m1로 세정하였다.여과액과 세정액을 합쳐서 40℃ 이하에서 감압 농축하고,수득된 잔사물을 디에틸에테르 200m1로 2회 추출 및 여과하였다.추출액으로부터 디에틸에테르를 감압 유거하여 반고체의 조생성물을 얻었다. 이것을 무수 n-헥산으로 세정하고,계속해서 디에틸에테르로 재결정하여 13.8g의 5- (2-페닐에티닐)이소프탈로일 디클로라이드를 얻었다 (수율 19%).Into a 2-liter four-necked flask equipped with a thermometer, a zigzag cooling tube, and a stirrer, 82.1 g (0.24 mol) of dipotassium 5- (2-phenylethynyl) isophthalic acid salt and 400 liters of 1,2-dichloroethane were added to 0 ° C. 391 g (4.5 mol) of thionyl chloride was added dropwise over 1 hour at 5 DEG C or lower. Thereafter, 4 ml of dimethyl formamide and 4 g of hydroquinone were added, followed by stirring at 45 to 50 DEG C for 3 hours. After cooling, the crystals were removed by filtration, and the crystals were washed with 150m1 of chloroform. The filtrate and washings were combined, concentrated under reduced pressure at 40 占 폚 or lower, and the obtained residue was extracted and filtered twice with 200m1 of diethyl ether. The diethyl ether was distilled off under reduced pressure from the semi-solid crude product. This was washed with anhydrous n-hexane, and then recrystallized with diethyl ether to obtain 13.8 g of 5- (2-phenylethynyl) isophthaloyl dichloride (yield 19%).

수득된 5-(2-페닐에티닐)이소프탈산 및 5-(2-페닐 에티닐)이소프탈산 2염화물의 스펙트럼 데이터를 아래와 같이 나타낸다.이들 데이터는 수득된 화합물이 목적물인 것을 뒷받침하고 있다.The spectral data of 5- (2-phenylethynyl) isophthalic acid and 5- (2-phenylethynyl) isophthalic acid dichloride obtained are shown below. These data support that the obtained compound is the target product.

[5-(2-페닐에티닐)이소프탈산 (C16H10O4)][5- (2-phenylethynyl) isophthalic acid (C 16 H 10 O 4 )]

외관: 백색 분말Appearance: white powder

융점: 99.7℃(DSC, 10℃/분)Melting Point: 99.7 ° C (DSC, 10 ° C / min)

1H-NMR (400MHz, (CD3)2CO): δ7.44(m, 3H), 7.64(m, 2H), 8.35(d, 2H, J=1.6Hz), 8.63(t, 1H, J=1.6Hz) 1 H-NMR (400 MHz, (CD 3 ) 2 CO): δ 7.44 (m, 3H), 7.64 (m, 2H), 8.35 (d, 2H, J = 1.6 Hz), 8.63 (t, 1H, J = 1.6 Hz)

13C-NMR (100MHz, (CD3)2CO): δ88.0, 91.7, 123.2, 125.0, 129.5,129.5, 129.9, 131.0, 132.5, 132.7, 132.7, 136.8, 166.2 13 C-NMR (100 MHz, (CD 3 ) 2 CO): δ 88.0, 91.7, 123.2, 125.0, 129.5, 129.5, 129.9, 131.0, 132.5, 132.7, 132.7, 136.8, 166.2

IR(KBr, cm-1): 3549, 2968, 2365, 1722, 1492, 1446, 1276, 917, 756, 674IR (KBr, cm -1 ): 3549, 2968, 2365, 1722, 1492, 1446, 1276, 917, 756, 674

MS(FD)(m/z): 266(M+)MS (FD) (m / z): 266 (M + )

원소 분석:Elemental Analysis:

이론치 C:72.18% H:3.79% O:24.04%Theoretical C: 72.18% H: 3.79% O: 24.04%

실측치 C:70.86% H:3.64% O:25.50%Found C: 70.86% H: 3.64% O: 25.50%

[5-(2-페닐에티닐)이소프탈산 2염화물 (C16H8O2Cl2)][5- (2-phenylethynyl) isophthalic acid dichloride (C 16 H 8 O 2 Cl 2 )]

외관: 백색 고체Appearance: white solid

융점:124℃ (DSC,10℃/분)Melting Point: 124 ℃ (DSC , 10 ℃ / min)

1H-NMR (400MHz, CDC13): δ7.40(m, 3H), 7.57(m, 2H), 8.50(d, 2H, J=1.6Hz), 8.73(t, 2H, J=1.6Hz) 1 H-NMR (400 MHz, CDC1 3 ): δ 7.40 (m, 3H), 7.57 (m, 2H), 8.50 (d, 2H, J = 1.6 Hz), 8.73 (t, 2H, J = 1.6 Hz)

13C-NMR (100MHz, CDC13): δ85.7, 93.6, 121.6, 126.2, 128.6, 129.5, 131.9, 132.2, 134.6, 139.2, 166.8 13 C-NMR (100MHz, CDC1 3 ): δ85.7, 93.6, 121.6, 126.2, 128.6, 129.5, 131.9, 132.2, 134.6, 139.2, 166.8

IR(KBr, cm-1): 3489, 3075, 2216, 1756, 1580, 1489, 1440, 1329, 1218, 1145, 1000, 819, 690 IR (KBr, cm -1 ): 3489, 3075, 2216, 1756, 1580, 1489, 1440, 1329, 1218, 1145, 1000, 819, 690

MS(FD)(m/z): 266(M+-2C1)MS (FD) (m / z): 266 (M + -2C1)

원소 분석:Elemental Analysis:

이론치 C:63.39% H:2.66% C1:23.39% O:10.56%Theoretical C: 63.39% H: 2.66% C1: 23.39% O: 10.56%

실측치 C:63.04% H:2.49% Cl:22.69% O:11.78%Found C: 63.04% H: 2.49% Cl: 22.69% O: 11.78%

(실시예 3)(Example 3)

[5-브로모이소프탈산의 제조][Production of 5-bromoisophthalic acid]

온도계,교반기,적하 로트를 구비한 1리터의 4구 플라스크에 5-히드록시 이소프탈산 99.18g(0.55몰)과 48중량% 브롬화수소산 165m1,증류수 150m1을 넣고 교반하였다.플라스크를 5℃ 이하까지 냉각하고,여기에 아질산나트륨 39.4g(0.57몰)을 증류수 525ml에 용해한 것을 1시간에 걸쳐 적하하여 디아조늄염 수용액을 얻었다. 온도계,짐로트 냉각관,적하 로트,교반기를 구비한 3리터의 4구 플라스크에 브롬화 제1구리 94.25g(0.66몰)와 48중량% 브롬화수소산 45ml을 넣고 교반하였다. 플라스크를 0℃ 이하로 냉각하고,상기의 디아조늄염 수용액을 2시간 동안 적하하였다.적하 종료후 실온에서 30분간 교반하고 계속하여 30분 환류시켰다.방냉 후,석출물을 취하여 증류수 2L로 2회 세정하고,얻어진 백색 고체를 50℃에서 2일간 감압건조하여 조생성물 117g 을 얻었다. 이를 정제하지 않고 다음 반응에 이용하였다.Into a one-liter four-necked flask equipped with a thermometer, agitator, and dropping lot, 99.18 g (0.55 mol) of 5-hydroxy isophthalic acid, 165 m1 of 48 wt% hydrobromic acid, and 150 m1 of distilled water were stirred. The flask was cooled to 5 ° C or lower. Then, what dissolved 39.4 g (0.57 mol) of sodium nitrite in 525 ml of distilled water was dripped here over 1 hour, and the diazonium salt aqueous solution was obtained. Into a 3-liter four-necked flask equipped with a thermometer, a gym lotion tube, a dropping lot, and a stirrer, 94.25 g (0.66 mol) of cuprous cup bromide and 45 ml of 48% by weight hydrobromic acid were added and stirred. The flask was cooled to 0 ° C. or lower, and the diazonium salt solution was added dropwise for 2 hours. After completion of the dropwise addition, the flask was stirred at room temperature for 30 minutes and then refluxed for 30 minutes. After cooling, the precipitate was taken out and washed twice with 2 L of distilled water. And the white solid obtained was dried under reduced pressure at 50 degreeC for 2 days, and 117 g of crude products were obtained. It was used for the next reaction without purification.

[5-브로모 이소프탈산으로부터의 5-브로모 이소프탈산 디메틸의 제조][Preparation of 5-bromo isophthalic acid dimethyl from 5-bromo isophthalic acid]

교반기, 짐로트 냉각관을 구비한 500m1 플라스크에 상기에서 얻어진 5-브로모 이소프탈산 110g,메탄올 500m1,농축황산 10g를 넣고, 6시간 동안 환류시켰다.방냉 후,증류수 1L에 적하하고 이것을 5중량% 탄산수소나트륨 수용액으로 중화하였다.석출물을 취하여 증류수 2L로 2회 세정한 후,얻어진 백색 고체를 50℃에서 2일간 감압 건조하여 5-브로모 이소프탈산 디메틸 109g(0.4몰)을 얻었다 (수율 89%).  110 g of 5-bromo isophthalic acid, 500 m1 of methanol and 10 g of concentrated sulfuric acid were added to a 500 m1 flask equipped with a stirrer and a chilled cooling tube, and refluxed for 6 hours. After cooling, the mixture was dropped into 1 L of distilled water and this was 5% by weight. The precipitate was taken out and washed twice with 2 L of distilled water, and the obtained white solid was dried under reduced pressure at 50 ° C. for 2 days to obtain 109 g (0.4 mol) of dimethyl 5-bromo isophthalate (yield 89%). ).

[5-브로모 이소프탈산 디메틸로부터의 4-(3,5-비스(메톡시 카르보닐)페닐)-2-메틸-3-부틴-1-올의 제조] [Preparation of 4- (3,5-bis (methoxy carbonyl) phenyl) -2-methyl-3-butyn-1-ol from 5-bromo isophthalic acid dimethyl]

실시예 1에 있어서,5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸 125g(0.365몰)을 5-브로모 이소프탈산 디메틸 99.7g (0.365몰)로 대체한 것 이외에는 실시예 1과 똑같이 하여 98.8g의 4-(3,5-비스(메톡시카르보닐)페닐)-2- 메틸-3-부틴-1-올을 얻었다 (수율 98%).In Example 1, 98.8 g was carried out similarly to Example 1 except having replaced 125 g (0.365 mol) of 5-dimethyl sulfonyloxy isophthalic acid dimethyls with 99.7 g (0.365 mol) of 5-bromo isophthalic-acids. 4- (3,5-bis (methoxycarbonyl) phenyl) -2-methyl-3-butyn-1-ol was obtained (yield 98%).

이하,실시예 1과 똑같이 하여 5-에티닐 이소프탈산2칼륨염,5-에티닐 이소프탈산,5-에티닐 이소프탈산 2염화물을 얻을 수 있다.5-에티닐 이소프탈산 및 5-에티닐 이소프탈산 2염화물의 외관,융점 및 1H-NMR, 13C-NMR, IR, MS, 원소 분석의 스펙트럼 데이터는 모두 실시예1과 일치하여 동일 화합물이 수득된 것을 나타내고 있다.In the same manner as in Example 1, 5-ethynyl isophthalic acid dipotassium salt, 5-ethynyl isophthalic acid and 5-ethynyl isophthalic acid dichloride can be obtained. 5-ethynyl isophthalic acid and 5-ethynyl iso The appearance, melting point and spectral data of 1 H-NMR, 13 C-NMR, IR, MS, and elemental analysis of the phthalic acid dichloride were all in agreement with Example 1 to show that the same compound was obtained.

(실시예 4)(Example 4)

[1-(3,5-비스(메톡시카르보닐)페닐)-2-페닐에틴의 제조] [Preparation of 1- (3,5-bis (methoxycarbonyl) phenyl) -2-phenylethine]

실시예 2에 있어서,5-트리플루오로메탄 술포닐옥시 이소프탈산 디메틸 125g(0.365몰)을 실시예 3과 동일하게 하여 수득한 5-브로모 이소프탈산 디메틸 99.7g(0.365몰)로 한 것 이외에는 동일하게 하여 80.8g의 1-(3,5-비스(메톡시 카르보닐)페닐)-2-페닐에틴을 얻었다.(수율 75%).In Example 2, 125 g (0.365 mol) of 5-trifluoromethane sulfonyloxy isophthalic acid dimethyl was used in the same manner as in Example 3, except that 99.7 g (0.365 mol) of 5-bromo isophthalic acid dimethyl was obtained. In the same manner, 80.8 g of 1- (3,5-bis (methoxy carbonyl) phenyl) -2-phenylethine was obtained. (Yield 75%).

이하,실시예 2와 동일하게 하여, 5-(2-페닐에티닐)이소프탈산2칼륨염, 5-(2-페닐에티닐)이소프탈산,5-(2-페닐에티닐)이소프탈산 2염화물을 얻을 수 있다.5-(2-페닐에티닐)이소프탈산 및 5-(2-페닐에티닐)이소프탈산 2염화물의 외관,융점과 1H-NMR, 13C-NMR, IR, MS, 원소 분석의 스펙트럼 데이터는 모두 실시예2와 일치하여 동일한 화합물이 얻어진 것을 나타내고 있다.In the same manner as in Example 2, 5- (2-phenylethynyl) isophthalic acid dipotassium salt, 5- (2-phenylethynyl) isophthalic acid and 5- (2-phenylethynyl) isophthalic acid dichloride Appearance, melting point and 1 H-NMR, 13 C-NMR, IR, MS, element of 5- (2-phenylethynyl) isophthalic acid and 5- (2-phenylethynyl) isophthalic acid dichloride The spectral data of the analysis all showed that the same compound was obtained in accordance with Example 2.

(실시예 5)(Example 5)

[5-(4-니트로페녹시)이소프탈산 디메틸의 제조][Production of 5- (4-nitrophenoxy) isophthalic acid dimethyl]

온도계,교반기,딘스택 증류기를 구비한 2L의 4구 플라스크에 5-히드록시 이소프탈산 디메틸 133.24g(0.63몰)과 4-플루오로 니트로벤젠 107.33g(0.76몰),N, N-디메틸 포름아미드 760m1,톨루엔 190m1을 넣고,부산물인 물을 톨루엔으로 공비제거하면서 165℃에서 4시간 동안 교반하였다. 냉각 후,반응액을 3L의 이온교환수에 투입하여 생성물을 석출시켰다.석출물을 취하고 이온교환수,에탄올로 세정한 뒤 수득된 담황색 고체를 50℃에서 1일간 감압 건조하여 생성물 142.01g를 얻었다 (수율 68%).133.24 g (0.63 mol) of 5-hydroxy isophthalic acid and 107.33 g (0.76 mol) of 4-fluoro nitrobenzene in a 2 L four-necked flask equipped with a thermometer, stirrer and Dean Stack distillation, N, N-dimethyl formamide 760 m 1 and 190 m 1 of toluene were added thereto, and the byproduct water was stirred at 165 ° C. for 4 hours while azeotropically removing the byproduct water. After cooling, the reaction solution was poured into 3 L of ion-exchanged water to precipitate the product. The precipitate was taken, washed with ion-exchanged water and ethanol, and the resulting pale yellow solid was dried under reduced pressure at 50 ° C. for 1 day to obtain 142.01 g of the product ( Yield 68%).

[5-(4-아미노 페녹시)이소프탈산 디메틸의 제조][Preparation of 5- (4-Aminophenoxy) isophthalic Acid Dimethyl]

1L 나스 플라스크에 상기에서 얻은 생성물인 5-(4-니트로페녹시) 이소프탈산 디메틸 66.24g(0.2몰)과 10중량%의 팔라듐-활성탄 6.39g,테트라하이드로푸란 440m1,에탄올 220m1을 넣고,수소 분위기 하에서 24 시간 교반하였다.반응액을 셀라이트로 여과하고,여과액을 감압 농축하였다.이것에 헥산을 가하여,석출물을 취하여 수득한 백색 고체를 50℃에서 1일간 감압 건조하여,생성물 55.96g를 얻었다 (수율 93%).Into a 1 L Nasu flask, 66.24 g (0.2 mol) of 5- (4-nitrophenoxy) isophthalic acid dimethyl, 6.39 g of 10% by weight of palladium-activated carbon, 440 m1 of tetrahydrofuran, 220 m1 of ethanol were added thereto. The reaction mixture was stirred for 24 hours. The reaction solution was filtered through celite, and the filtrate was concentrated under reduced pressure. To this was added hexane, and the precipitate was taken, and the white solid obtained was dried under reduced pressure at 50 ° C for 1 day to obtain 55.96 g of a product. (Yield 93%).

[5-(4-요오드페녹시)이소프탈산 디메틸의 제조][Production of 5- (4-iodinephenoxy) isophthalic acid dimethyl]

온도계,교반기,적하 로트를 구비한 1L의 4구 플라스크에 이온 교환수 450m1,농축황산 75m1,상기에서 얻은 5-(4-아미노페녹시)이소프탈산디메틸 45.20g(0.15몰)을 넣고,교반하였다. 플라스크를 5℃ 이하까지 냉각하고,여기에 아질산나트륨 12.42g(0.18몰)을 이온교환수 25m1에 용해한 것을 20분 동안 적하하고,5℃ 이하에서 40분간 교반하여 디아조늄염 수용액을 얻었다. 이 용액에 요오드화 칼륨 27.39g(0.165몰)을 이온교환수 33m1에 용해한 것을 가하였다.계속하여 5℃ 이하에서 1시간,실온에서 1시간 동안 교반하였다. 석출물을 취하여 아세트산에틸 300m1에 용해한 후 10중량% 아황산수소나트륨 수용액 200ml로 2회,이온교환수 200ml로 2회 세정하였다.유기층을 무수 황산마그네슘으로 건조한 후,용매를 감압 유거하고 소량의 헥산을 가하여 갈색의 조생성물을 석출시켰다.속실렛 추출기를 이용하여 생성물을 헥산으로 추출하고,용매 제거후에 메탄올로 재결정하여,담황색 고체를 얻었다. 분리된 고체를 50℃에서 1일간 감압 건조하여 생성물 25.40g를 얻었다 (수율 41%).In a 1 L four-necked flask equipped with a thermometer, agitator, and dropping lot, 450 m 1 of ion-exchanged water, 75 m 1 of concentrated sulfuric acid, and 45.20 g (0.15 mol) of 5- (4-aminophenoxy) isophthalic acid dimethyl obtained above were stirred. . The flask was cooled to 5 ° C. or lower, and 12.42 g (0.18 mol) of sodium nitrite was added dropwise to 25 ml of ion-exchanged water for 20 minutes, and stirred at 5 ° C. or lower for 40 minutes to obtain an aqueous diazonium salt solution. To this solution, 27.39 g (0.165 mol) of potassium iodide was dissolved in 33 m1 of ion-exchanged water. Then, the mixture was stirred at 5 ° C. or lower for 1 hour and at room temperature for 1 hour. The precipitate was taken up, dissolved in 300m1 of ethyl acetate, and then washed twice with 200 ml of 10% by weight aqueous sodium hydrogen sulfite solution and twice with 200 ml of ion-exchanged water. The organic layer was dried over anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure and a small amount of hexane was added. A brown crude product was precipitated. The product was extracted with hexane using a Soxhlet extractor, recrystallized with methanol after removal of the solvent to give a pale yellow solid. The separated solid was dried under reduced pressure at 50 ° C. for 1 day to obtain 25.40 g of a product (yield 41%).

[5-(4-(2-페닐 에티닐)페녹시)이소프탈산 디메틸의 제조][Preparation of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dimethyl]

온도계, 짐로트 냉각관,질소 도입관을 구비한 500m1의 4구 플라스크에 상기에서 얻은 5-(4-요오드페녹시)이소프탈산 디메틸 24.73g(0.06몰), 트리페닐 포스핀 0.79g(0.003몰),요오드화구리 0.23g(0.0012몰),에티닐벤젠 6.74g (0.066mo1),탈수 트리에틸아민 72ml 및 탈수 피리딘 38m1,디클로로 비스(트리페닐포스핀)팔라듐 0.25g(0.00036mo1)를 넣고 질소를 유동시키면서 105℃에서 1시간 동안 가열 환류하였다.그 후 트리에틸아민 및 피리딘을 감압 유거하여 점성있는 갈색 용액을 얻었다. 이것에 물 200m1,염산 5m1을 주입하여 석출한 고형물을 취하였다. 또한 물 500m1로 세정하였다.이 고형물을 50℃에서 1일간 감압 건조함으로써,생성물 17.39g를 얻었다 (수율 75%).In a 500m1 four-necked flask equipped with a thermometer, a cooling tube and a nitrogen inlet tube, 24.73 g (0.06 mol) of 5- (4-iodinephenoxy) isophthalate obtained above, 0.79 g (0.003 mol) of triphenyl phosphine ), 0.23 g (0.0012 mol) of copper iodide, 6.74 g (0.066 mo1) of ethynylbenzene, 72 ml of dehydrated triethylamine, 38 m1 of dehydrated pyridine, 0.25 g of dichloro bis (triphenylphosphine) palladium, and nitrogen. The mixture was heated to reflux at 105 DEG C for 1 hour while flowing. Triethylamine and pyridine were distilled off under reduced pressure to obtain a viscous brown solution. 200m1 of water and 5m1 of hydrochloric acid were injected into this, and the precipitated solid substance was taken out. Furthermore, it washed with 500m <1> of water. The solid was dried under reduced pressure at 50 degreeC for 1 day, and the product 17.39g was obtained (yield 75%).

[5-(4-(2-페닐에티닐)페녹시)이소프탈산 2칼륨염의 제조][Preparation of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dipotassium salt]

1L의 나스 플라스크에 n-부탄올 450ml,수산화칼륨(85중량%) 47.53g (0.32몰)을 넣고 가열 환류 및 용해하였다.이것에 합성된 상기에서 얻은 5-(4-(2-페닐에티닐)페녹시)이소프탈산 디메틸 15.46g(0.04몰)을 가하고 30분간 가열 환류하였다.이것을 빙욕에서 냉각하여 석출된 결정을 취하였다. 이 결정을 이소프로판올 200m1로 2회 세정하여 취한 후, 50℃에서 감압 건조함으로써,생성물 16.86g를 얻었다 (수율 97%).450 ml of n-butanol and 47.53 g (0.32 mole) of potassium hydroxide (85% by weight) were added to a 1 L Nasu flask, and the mixture was heated to reflux and dissolved. 5- (4- (2-phenylethynyl) obtained as described above. Phenoxy) 15.46 g (0.04 mol) of dimethyl isophthalic acid were added and heated to reflux for 30 minutes. This was cooled in an ice bath to precipitate precipitated crystals. The crystals were washed twice with 200m &lt; 1 &gt; of isopropanol, and then dried under reduced pressure at 50 deg. C to obtain 16.86 g of a product (yield 97%).

[5-(4-(2-페닐에티닐)페녹시)이소프탈산 2칼륨염으로부터 5-(4-(2-페닐에티닐)페녹시)이소프탈산의 제조][Preparation of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid from 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dipotassium salt]

상기에서 얻은 5-(4-(2-페닐에티닐)페녹시 이소프탈산 2칼륨염 8.69g (0.02몰)을 40ml의 이온교환수에 용해하고 5C 여과지로 여과함으로써 불용물을 제거하였다.이 여과액에 염산을 pH가 1이 될 때까지 교반하면서 첨가하였다.석출한 고형물을 취하고 계속해서 이온교환수로 세정,여과를 2회 반복하였다.수득된 고형물을 50℃에서 감압건조하여,생성물 6.88g를 얻었다 (수율 96%).8.69 g (0.02 mol) of 5- (4- (2-phenylethynyl) phenoxy isophthalic acid dipotassium salt obtained above was dissolved in 40 ml of ion-exchanged water and filtered with 5C filter paper to remove insoluble matters. Hydrochloric acid was added to the solution with stirring until the pH became 1. The precipitated solid was taken, and then washed with ion-exchanged water and filtered twice. The obtained solid was dried under reduced pressure at 50 ° C and the product was 6.88 g. Was obtained (yield 96%).

[5-(4-(2-페닐에티닐)페녹시)이소프탈산 2칼륨염으로부터 5-(4-(2-페닐에티닐)페녹시)이소프탈산 디클로라이드의 제조][Preparation of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dichloride from 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dipotassium salt]

온도계,짐로트 냉각관을 구비한 500m1의 4구 플라스크에 상기에서 얻은 5-(4-(2-페닐에티닐)페녹시)이소프탈산 2칼륨염 15.2g(0.035mol),클로로포름 90m1을 넣고 0℃까지 냉각하였다.이것에 염화티오닐 62.46g (0.525몰)을 5℃ 이하에서 15분간 적하하였다.그 후,디메틸포름아미드 0.7m1,히드로퀴논 0.7g를 가하여,45∼50℃에서 3시간 동안 교반하였다.냉각 후,여과하여 결정을 분리하고 이 결정을 클로로포름 50m1로 세정하였다.여과액과 세정액을 합쳐서,40℃ 이하에서 감압 농축하고,얻어진 잔사물을 n-헥산으로 추출 재결정하였다.얻어진 고체를 감압 건조하여 생성물 3.44g를 얻었다 (수율 25%).In a 500m1 four-necked flask equipped with a thermometer and a cooling tube, 15.2 g (0.035 mol) of 2-potassium isophthalic acid salt, 90m1 of chloroform was added. 62.46 g (0.525 mol) of thionyl chloride was dripped at 5 degrees C or less for 15 minutes. Then, 0.7 m1 of dimethylformamide and 0.7 g of hydroquinone were added and stirred at 45-50 degreeC for 3 hours. After cooling, the crystals were separated by filtration, and the crystals were washed with 50 m1 of chloroform. The filtrate and the washing liquid were combined, concentrated under reduced pressure at 40 ° C or lower, and the obtained residue was extracted and recrystallized with n-hexane. Drying under reduced pressure afforded 3.44 g of product (yield 25%).

삭제delete

[5-(4-(2-페닐에티닐)페녹시)이소프탈산으로부터 5-(4-(2-페닐에티닐)페녹시)이소프탈산 디클로라이드의 제조][Preparation of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dichloride from 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid]

온도계,짐로트 냉각관을 구비한 500m1의 4구 플라스크에 상기에서 얻은 5-(4-(2-페닐에티닐)페녹시)이소프탈산 12.54g(0.035몰),1,2-디클로로에탄 100ml,염화티오닐 9.16g(0.077몰),염화벤질 트리에틸암모늄 8.0mg(0.00035몰)을 넣고 3시간 동안 가열환류하였다.용액을 熱時(열시) 여과하고,여액을 감압 농축 후 헥산을 가하여 재결정하였다.수득된 고체를 감압 건조하여,생성물 6.33g를 얻었다 (수율 46%).In a 500m1 four-necked flask equipped with a thermometer and a cooling tube for cooling, 12.54 g (0.035 mol) of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid, 100 ml of 1,2-dichloroethane, 9.16 g (0.077 mole) of thionyl chloride and 8.0 mg (0.00035 mole) of benzyl triethylammonium chloride were added thereto, and the mixture was heated to reflux for 3 hours. The solution was filtered under heat (heating), the filtrate was concentrated under reduced pressure, and recrystallized by adding hexane. . The obtained solid was dried under reduced pressure and 6.33 g of product was obtained (yield 46%).

수득된 5-(4-(2-페닐에티닐)페녹시)이소프탈산 및 5-(4-(2-페닐에티닐)페녹시)이소프탈산 디클로라이드의 스펙트럼 데이터를 다음과 같이 나타낸다.이들 데이터는 수득된 화합물이 목적물인 것을 뒷받침하고 있다.The spectral data of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid and 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dichloride obtained are shown as follows. Supports that the obtained compound is the target product.

[5-(4-(2-페닐에티닐)페녹시)이소프탈산(C22H14O5)][5- (4- (2-phenylethynyl) phenoxy) isophthalic acid (C 22 H 14 O 5 )]

외관: 백색 고체Appearance: white solid

융점: 320℃ 이하에서 관찰되지 않음 (DSC,10℃/분)Melting point: Not observed below 320 ° C (DSC, 10 ° C / min)

1H-NMR (400MHz, DMSO-d6): δ13.47(br),8.25(s, 1H),7.71(s, 2H),7.61(d, 2H), 7.53(m, 2H), 7.40(m, 3H),7.13(d, 2H) 1 H-NMR (400 MHz, DMSO-d 6 ): δ 13.47 (br), 8.25 (s, 1H), 7.71 (s, 2H), 7.61 (d, 2H), 7.53 (m, 2H), 7.40 ( m, 3H) , 7.13 (d, 2H)

13C-NMR (100MHz, DMSO-d6): δ166.12,156.96,156.29,133.79,133.54,131.54,128.95,125.29,123.11,122.51,119.82,118.45,89.37, 88.90 13 C-NMR (100 MHz, DMSO-d 6 ): δ 166.12, 156.96, 156.29, 133.79, 133.54, 131.54, 128.95, 125.29, 123.11, 122.51, 119.82, 118.45, 89.37, 88.90

IR(KBr, cm-1) : 3424,2826,2568,1713,1589,1504,1466,1419,1322, 1284,1241,1206,1165,1102,977,846,758,691IR (KBr, cm -1 ): 3424, 2826, 2568, 1713, 1589, 1504, 1466, 1418, 1322, 1284, 1241, 1206, 1165, 1102, 197, 846, 758, 691

MS(FD)(m/z): 358.2(M+)MS (FD) (m / z): 358.2 (M + )

원소 분석:Elemental Analysis:

이론치 C:73.74% H:3.94% Theoretical C: 73.74% H: 3.94%                 

실측치 C:73.31% H:3.84%Found C: 73.31% H: 3.84%

[5-(4-(2-페닐에티닐)페녹시)이소프탈산 디클로라이드 (C22H12O3Cl2)][5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dichloride (C 22 H 12 O 3 Cl 2 )]

외관: 연한 황색 고체Appearance: Light Yellow Solid

융점: 130℃ (DSC,10℃/분)Melting Point: 130 ℃ (DSC , 10 ℃ / min)

1H-NMR (400MHz, CDC13) : δ8.56(s, 1H),7.98(s, 2H),7.59(d, 2H),7.52(m, 2H),7.35(m, 3H),7.04(d, 2H) 1 H-NMR (400MHz, CDC1 3 ): δ8.56 (s, 1H), 7.98 (s, 2H), 7.59 (d, 2H), 7.52 (m, 2H), 7.35 (m, 3H), 7.04 ( d, 2H)

13C-NMR (100MHz, CDCl3): δ166.65,158.27,154.82,135.78,133.77,131.54,128.41,128.35,127.90,125.96,122.87,120.40,119.54, 89.84,88.14 13 C-NMR (100 MHz, CDCl 3 ): δ 166.65, 158.27, 154.82, 135.78, 133.77, 131.54, 128.41, 128.35, 127.90, 125.96, 122.87, 120.40, 119.54, 89.84, 88.14

IR(KBr,cm-1) : 3446,1754,1588,1506,1443,1202,1218,1145,991,846,824,764,737,694,683IR (KBr, cm -1 ): 3446,1754,1588,1506,1443,1202,1218,1145,991,846,824,764,737,694,683

MS(FD)(m/z): 394.2(M+)MS (FD) (m / z): 394.2 (M + )

원소 분석:Elemental Analysis:

이론치 C:67.20% H:3.08% C1:17.52%Theoretical C: 67.20% H: 3.08% C1: 17.52%

실측치 C:66.65% H:2.99% Cl:17.99%Found C: 66.65% H: 2.99% Cl: 17.99%

(실시예 6)(Example 6)

[5-(4-히드록시페녹시)이소프탈산 디메틸의 제조] [Production of 5- (4-hydroxyphenoxy) isophthalic acid dimethyl]                 

온도계,교반기,적하로트를 구비한 1L의 4구 플라스크에 이온교환수 450m1,농축황산 75m1,실시예 5와 동일하게 하여 얻은 5-(4-아미노페녹시)이소프탈산 디메틸 45.20g(0.15몰)을 넣고 교반하였다.플라스크를 5℃ 이하까지 냉각하고,여기에 아질산나트륨 12.42g(0.18몰)을 증류수 25ml에 용해한 것을 20분에 걸쳐 적하하고,5℃ 이하에서 40분,100℃에서 2시간 교반하였다. 석출물을 취하여 메탄올 중에서 활성탄으로 처리하여 재결정하였다.여과 고체를 50℃에서 1일간 감압 건조하여 생성물 23.58g를 얻었다 (수율 52%).45 L 20-dimethyl dimethyl 5- (4-aminophenoxy) isophthalate obtained in the same manner as in Example 5 in a 1 L four-necked flask equipped with a thermometer, stirrer, and dropping lot. The flask was cooled to 5 ° C. or lower, and 12.42 g (0.18 mol) of sodium nitrite was added dropwise to 25 ml of distilled water over 20 minutes, and stirred at 40 ° C. or lower for 40 minutes and stirred at 100 ° C. for 2 hours. It was. The precipitate was taken, treated with activated carbon in methanol, and recrystallized. The filtered solid was dried under reduced pressure at 50 ° C. for 1 day to obtain 23.58 g of a product (yield 52%).

[5-(4-트리플루오로메탄 술포닐옥시페녹시)이소프탈산 디메틸의 제조][Preparation of 5- (4-trifluoromethane sulfonyloxyphenoxy) isophthalic acid dimethyl]

온도계,짐로트 냉각관,염화칼슘관,교반기를 구비한 1L의 4구 플라스크에,상기에서 얻은 5-(4-히드록시페녹시)이소프탈산 디메틸 21.26g(0.07몰),탈수 톨루엔 300m1,탈수 피리딘 16.61g(0.21몰)을 넣고 교반하면서 30℃까지 냉각하였다.여기에 무수 트리플루오로메탄 술폰산 39.50g (0.14몰)을 온도가 -25℃ 이상으로 상승하지 않도록 주의하면서 천천히 적하 첨가하였다.첨가 후,반응온도를 0℃로 승온하여 1시간 또한 실온으로 승온하여 5시간동안 반응하였다.얻어진 반응 혼합물을 400m1의 빙수에 넣어 수층 및 유기층으로 분리하였다.계속해서, 수층을 100m1의 톨루엔으로 2회 추출하고 이것을 앞의 유기층과 합하였다.이 유기층을 물 300ml로 2회 세정하고,무수 황산마그네슘으로 건조,용매를 감압 유거하고,헥산으로 재결정하였다.여과한 고체를 50℃에서 1일간 감압 건조하여 생성물 26.14g를 얻었다 (수율 86%).In a 1 L four-necked flask equipped with a thermometer, a zigzag cooling tube, a calcium chloride tube and a stirrer, 21.26 g (0.07 mol) of 5- (4-hydroxyphenoxy) isophthalate dimethyl obtained above, 300 m1 of dehydrated toluene and dehydrated pyridine 16.61 g (0.21 mol) was added and cooled to 30 DEG C while stirring. Here, 39.50 g (0.14 mol) of trifluoromethane sulfonic anhydride was slowly added dropwise, taking care not to increase the temperature to -25 DEG C or higher. The reaction temperature was raised to 0 ° C. for 1 hour and the reaction temperature was increased to room temperature for 5 hours. The obtained reaction mixture was poured into 400 m 1 of ice water and separated into an aqueous layer and an organic layer. Subsequently, the aqueous layer was extracted twice with 100 m 1 of toluene. The organic layer was washed twice with 300 ml of water, dried over anhydrous magnesium sulfate, distilled off the solvent under reduced pressure, and recrystallized with hexane. It dried under reduced pressure at 1 degreeC for 1 day, and obtained 26.14 g of products (yield 86%).

[5-(4-(2-페닐에티닐)페녹시)이소프탈산 디메틸의 제조] [Production of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dimethyl]                 

실시예 5에 있어서,5-(4-요오드페녹시)이소프탈산 디메틸 24.73g (0.06몰)을 상기에서 얻은 5-(4-트리플루오로메탄 술포닐옥시페녹시)이소프탈산 디메틸 26.06g(0.06몰)로 한 것 이외는 실시예 5와 동일하게 하여 5- (4-(2-페닐에티닐)페녹시)이소프탈산 디메틸을 얻었다. In Example 5, 24.73 g (0.06 mol) of 5- (4-iodinephenoxy) isophthalic acid dimethyl 26.06 g (0.06) of 5- (4-trifluoromethane sulfonyloxyphenoxy) isophthalic acid obtained above Mole) was obtained in the same manner as in Example 5 to obtain 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dimethyl.

이하,실시예 5와 동일하게 하여 5-(4-(2-페닐에티닐)페녹시)이소프탈산 2칼륨염,5-(4-(2-페닐에티닐)페녹시)이소프탈산,5-(4-(2-페닐에티닐)페녹시)이소프탈산 디클로라이드가 수득되었다. 5-(4-(2-페닐에티닐)페녹시)이소프탈산 및 5-(4-(2-페닐에티닐)페녹시)이소프탈산 디클로라이드의 외관,융점과 1H-NMR, 13C-NMR, IR, MS, 원소 분석의 스펙트럼 데이터는 모두 실시예 5와 일치하여 동일한 화합물이 얻어진 것을 나타낸다.In the same manner as in Example 5, 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dipotassium salt, 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid, 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dichloride was obtained. Appearance, melting point and 1 H-NMR, 13 C- of 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid and 5- (4- (2-phenylethynyl) phenoxy) isophthalic acid dichloride The spectral data of NMR, IR, MS, and elemental analysis were all in agreement with Example 5 to show that the same compound was obtained.

본 발명에 따르면,고분자 화합물 특히 내열성이 우수한 축합계 고분자 화합물의 원료 등으로서 유용한 방향족 카르복실산 및 그 산할로겐화물 유도체를 용이하게 제공할 수 있다.According to the present invention, an aromatic carboxylic acid and an acid halide derivative thereof useful as a raw material of a polymer compound, especially a condensed polymer compound having excellent heat resistance, and the like can be easily provided.

Claims (11)

일반식 (1)General formula (1)
Figure 112007076127767-pct00030
Figure 112007076127767-pct00030
[식 중에서 A는 다음의 식[Wherein A is the following equation -C ≡C-R1 ...(a)-C ≡CR 1 ... (a) 또는or
Figure 112007076127767-pct00031
Figure 112007076127767-pct00031
(단, R1은 수소 원자,에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기,R2는 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기이다.) 로 표시된 기를 나타낸다.](Wherein R 1 is an alkyl group selected from the group consisting of a hydrogen atom, an ethyl group, a propyl group and a butyl group or an aromatic group selected from the group consisting of a phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group, and R 2 is Alkyl group selected from the group consisting of ethyl group, propyl group and butyl group or aromatic group selected from the group consisting of phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group.). 로 표시되는 구조를 가지는 것을 특징으로 하는 방향족 카르복실산.Aromatic carboxylic acid, characterized by having a structure represented by.
일반식 (2)General formula (2)
Figure 112007076127767-pct00032
Figure 112007076127767-pct00032
[식 중에서 A는 다음의 식[Wherein A is the following equation -C ≡C-R1 ...(a)-C ≡CR 1 ... (a) 또는or
Figure 112007076127767-pct00033
Figure 112007076127767-pct00033
(단, R1은 수소 원자,에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기,R2는 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기이다.)로 표시된 기, X는 할로겐원자를 나타낸다.](Wherein R 1 is an alkyl group selected from the group consisting of a hydrogen atom, an ethyl group, a propyl group and a butyl group or an aromatic group selected from the group consisting of a phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group, and R 2 is An alkyl group selected from the group consisting of an ethyl group, a propyl group and a butyl group or an aromatic group selected from the group consisting of a phenyl group, a naphthyl group, an anthryl group, a quinolyl group and a quinoxalyl group.), X represents a halogen atom .] 로 표시되는 구조를 갖는 것을 특징으로 하는 방향족 카르복실산의 산할로겐화물 유도체.An acid halide derivative of an aromatic carboxylic acid having a structure represented by.
제2항에 있어서,The method of claim 2, 일반식(2)에 있어서 X가 염소원자인 것을 특징으로 하는 방향족 카르복실산의 산할로겐화물 유도체.An acid halide derivative of an aromatic carboxylic acid, wherein in formula (2), X is a chlorine atom. 일반식 (3)General formula (3)
Figure 112007076127767-pct00034
Figure 112007076127767-pct00034
[식 중에서 D는 탈리기, R은 메틸기를 나타낸다.][Wherein D represents a leaving group and R represents a methyl group] 로 표시되는 화합물과, 일반식(4)Compound represented by and general formula (4) HC ≡C-E ...(4)HC ≡C-E ... (4) [식 중에서 E는 트리메틸실릴기, 히드록시프로필기, 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기를 나타낸다.][Wherein E is an aromatic group selected from the group consisting of an alkyl group selected from the group consisting of trimethylsilyl group, hydroxypropyl group, ethyl group, propyl group and butyl group or phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group Represents a group.] 로 표시되는 화합물을 반응시켜서 다음의 일반식(5),Reacting the compound represented by the following general formula (5),
Figure 112007076127767-pct00035
Figure 112007076127767-pct00035
[식 중에서 R 및 E는 상기의 의미와 같다][Wherein R and E have the same meanings as above] 로 표시되는 화합물을 수득한 후, 알칼리금속 수산화물의 존재하에서 처리함에 의하여, 일반식(6)After obtaining the compound represented by the following formula (6) by treating in the presence of an alkali metal hydroxide
Figure 112007076127767-pct00036
Figure 112007076127767-pct00036
[식 중에서 R1은 수소원자, 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기, M은 알칼리금속을 나타낸다.] 로 표시되는 화합물을 생성하고 이어서 산처리하는 것을 특징으로 하는, 일반식(1-1)[Wherein R 1 is an alkyl group selected from the group consisting of hydrogen atom, ethyl group, propyl group and butyl group or aromatic group selected from the group consisting of phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group, M is alkali A metal is represented.] General formula (1-1), characterized in that the compound represented by the above is produced and subsequently acid treated.
Figure 112007076127767-pct00037
Figure 112007076127767-pct00037
[식 중에서 R1은 상기의 의미와 같다.][Wherein, R 1 is as defined above.] 로 표시되는 방향족 카르복실산의 제조방법.Method for producing an aromatic carboxylic acid represented by.
제4항에 있어서,The method of claim 4, wherein 일반식(3)으로 표시되는 화합물과, 일반식(4)로 표시되는 화합물의 반응에 있어서, 전이금속 촉매를 이용하는 것을 특징으로 하는 방향족 카르복실산의 제조방법.In the reaction of a compound represented by the general formula (3) with a compound represented by the general formula (4), a transition metal catalyst is used. 일반식 (7)General formula (7)
Figure 112007076127767-pct00038
Figure 112007076127767-pct00038
[식 중에서 D는 탈리기, R은 메틸기를 나타낸다.][Wherein D represents a leaving group and R represents a methyl group] 로 표시되는 화합물과, 일반식(8)Compound represented by general formula (8) HC ≡C-R2 ...(8)HC ≡CR 2 ... (8) [식 중에서 R2는 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기를 나타낸다.][Wherein R 2 represents an alkyl group selected from the group consisting of ethyl group, propyl group and butyl group or an aromatic group selected from the group consisting of phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group.] 로 표시되는 화합물을 반응시켜서, 일반식(9)By reacting the compound represented by the formula (9)
Figure 112007076127767-pct00039
Figure 112007076127767-pct00039
[식 중에서 R 및 R2는 상기의 의미와 같다.][Wherein R and R 2 are the same as defined above.] 로 표시되는 화합물을 수득한 후 알칼리금속 수산화물의 존재하에서 처리하여, 일반식(10)After obtaining a compound represented by the following treatment in the presence of an alkali metal hydroxide, a general formula (10)
Figure 112007076127767-pct00040
Figure 112007076127767-pct00040
[식 중에서 M은 알칼리금속을 나타내고, R2는 상기의 의미와 같다.][Wherein M represents an alkali metal and R 2 is as defined above.] 로 표시되는 화합물을 생성하고 이어서 산처리하는 것을 특징으로 하는, 일반식(1-2)General formula (1-2), characterized in that the compound represented by
Figure 112007076127767-pct00041
Figure 112007076127767-pct00041
[식 중에서 R2는 상기의 의미와 같다.][Wherein, R 2 is as defined above.] 로 표시되는 방향족 카르복실산의 제조방법.Method for producing an aromatic carboxylic acid represented by.
제6항에 있어서,The method of claim 6, 일반식(7)로 표시되는 화합물과, 일반식(8)로 표시되는 화합물의 반응에 있어서, 전이금속 촉매를 이용하는 방향족 카르복실산의 제조방법.The manufacturing method of the aromatic carboxylic acid using a transition metal catalyst in reaction of the compound represented by General formula (7), and the compound represented by General formula (8). 일반식 (1-1)General formula (1-1)
Figure 112007076127767-pct00042
Figure 112007076127767-pct00042
[식 중에서 R1는 수소원자, 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기를 나타낸다.][Wherein R 1 represents an alkyl group selected from the group consisting of a hydrogen atom, an ethyl group, a propyl group and a butyl group or an aromatic group selected from the group consisting of a phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group.] 로 표시되는 화합물, 또는 일반식(6)Compound represented by or General formula (6)
Figure 112007076127767-pct00043
Figure 112007076127767-pct00043
[식 중에서 M은 알칼리금속을 나타내고, R1은 상기의 의미와 같다.][Wherein M represents an alkali metal and R 1 is as defined above.] 로 표시되는 화합물을, 할로겐화제로 처리하는 것을 특징으로 하는, 일반식(2-1)General formula (2-1) characterized by treating the compound represented by the halogenating agent
Figure 112007076127767-pct00044
Figure 112007076127767-pct00044
[식 중에서 X은 할로겐원자를 나타내고, R1은 상기의 의미와 같다.][Wherein X represents a halogen atom and R 1 is as defined above.] 로 표시되는 방향족 카르복실산의 산할로겐화물 유도체의 제조방법.Method for producing an acid halide derivative of aromatic carboxylic acid represented by.
제8항에 있어서,The method of claim 8, 할로겐화제가 염소화제이고, 일반식(2-1)에 있어서 X가 염소원자인 방향족 카르복실산의 산할로겐화물 유도체의 제조방법.A process for producing an acid halide derivative of an aromatic carboxylic acid wherein the halogenating agent is a chlorinating agent and X is a chlorine atom in the general formula (2-1). 일반식 (1-2)General formula (1-2)
Figure 112007076127767-pct00045
Figure 112007076127767-pct00045
[식 중에서 R2은 에틸기, 프로필기 및 부틸기로 이루어진 군으로부터 선택되는 알킬기 또는 페닐기, 나프틸기, 안트릴기, 퀴놀릴기 및 퀴녹살릴기로 이루어진 군으로부터 선택되는 방향족기를 나타낸다.][Wherein R 2 represents an alkyl group selected from the group consisting of an ethyl group, a propyl group and a butyl group or an aromatic group selected from the group consisting of a phenyl group, naphthyl group, anthryl group, quinolyl group and quinoxalyl group.] 로 표시되는 화합물, 또는 일반식(10)Compound represented by or General formula (10)
Figure 112007076127767-pct00046
Figure 112007076127767-pct00046
[식 중에서 M은 알칼리금속을 나타내고, R2는 상기의 의미와 같다.][Wherein M represents an alkali metal and R 2 is as defined above.] 로 표시되는 화합물을 할로겐화제로 처리하는 것을 특징으로 하는 일반식(2-2)Formula (2-2), characterized in that the compound represented by the treatment with a halogenating agent
Figure 112007076127767-pct00047
Figure 112007076127767-pct00047
[식 중에서 X는 할로겐원자를 나타내고, R2는 상기의 의미와 같다.][Wherein X represents a halogen atom and R 2 is as defined above.] 로 표시되는 방향족 카르복실산의 산할로겐화물 유도체의 제조방법.Method for producing an acid halide derivative of aromatic carboxylic acid represented by.
제10항에 있어서,The method of claim 10, 할로겐화제가 염소화제이고, 일반식(2-2)에 있어서 X가 염소원자인 방향족 카르복실산의 산할로겐화물 유도체의 제조방법.A process for producing an acid halide derivative of an aromatic carboxylic acid wherein the halogenating agent is a chlorinating agent and X is a chlorine atom in the general formula (2-2).
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