KR100777719B1 - Preparing apparatus of functional film - Google Patents

Abstract

In the present invention, in the manufacture of a black matrix, non-chromium non-toxic metals and dielectric materials are deposited on the substrate to have a concentration gradient, but the manufacturing cost is low, and can be continuously manufactured to improve productivity It has a vacuum chamber, the inside is maintained in a vacuum, and has an inlet and outlet on the other end has a deposition chamber, and supporting means for supporting the substrate to be deposited from above, the substrate is in the deposition chamber and the inlet and A substrate transfer means for penetrating through the outlet, and at least one mixture of pure SiO, which is a dielectric material, and a mixture of SiO and metal in different ratios, and a pure metal, which are installed under the deposition chamber and are disposed below the deposition chamber; Deposition means formed so as to deposit individually, and the deposition means being heated And a heating and temperature control means formed to maintain a constant temperature, and a supply means for supplying the pure SiO, at least one mixture of the SiO / metals, and the metal to the deposition means. Relates to a device.

Description

Preparing apparatus of functional film

1 is a view showing the distribution of components of the dielectric material and metal in the black matrix according to the present invention.

2 is a view showing an apparatus for producing a black matrix according to the present invention.

<Description of the symbols for the main parts of the drawings>

10: deposition chamber 12: inlet

14: outlet 20: vapor deposition means

22a, b, c, d, ...: deposition boat 24: separator

26a, b, c, d, ...: deposition space 30: substrate transfer means

32: support means 40: supply means

50: preliminary vacuum chamber 100: substrate

The present invention relates to an apparatus for producing a functional film, and more particularly, to an apparatus for producing a black matrix, which is a black coating layer surrounding pixels of a display element.                         

Between the fluorescent film of a color cathode ray tube or a similar type of display element, a black matrix, which is a light absorption black coating layer for the purpose of absorbing external light and absorbing scattered light from an adjacent pattern, is formed. This black matrix gives a unique appearance to the color pixels of the entire display and enhances the contrast of the display color image.

The black matrix of the color cathode ray tube is generally coated with a graphite dispersion, and then formed into a pattern through a photolithography process. Light absorption is performed by vacuum depositing metal oxides (MO, M = Cr, Ni) and metal on the inner surface of the display screen. The coating layer is formed, and is manufactured according to a method of patterning the same according to a photolithography process. In addition, as disclosed in U.S. Patent No. 5,976,639, a method of gradually increasing the content of metal components such as Cr, W, Ta, Ti, Fe, Ni, Mo, etc. in a direction in which light is incident by using a reactive sputtering method. Is being proposed. However, in this method, chromium (Cr) is mainly used as the metal component. In addition, the chromium is not only restricted as an environmental pollutant in recent years, but must be deposited in an oxygen atmosphere to make chromium and chromium oxide. do. In addition, an expensive target according to the sputtering method is required, and there is a disadvantage in that preheating is necessary to improve film quality.

In addition, as another method for producing a black matrix, a mixture of organic matter and chromium, such as SiO, is placed in a deposition boat, and the dielectric material SiO is deposited first as the deposition temperature is gradually increased. Finally, there is a method to cause the deposition of chromium components at the highest temperature. However, even in this method, chromium, which is a toxic substance, is not preferable in terms of environmental protection, and the non-uniform coating layer deposited on the unheated substrate has an internal stress and unstable mechanical properties. Therefore, in order to obtain a stable SiO <SiO / Cr> Cr coating layer without internal stress, the temperature of the substrate must be continuously changed during the deposition process, which requires much more complicated equipment than a general vacuum deposition apparatus.

In order to solve the above problems, the present invention deposits a non-toxic metal and a dielectric material other than chromium on a substrate to achieve a concentration gradient, and thus exhibits excellent adhesion to the substrate without undergoing an annealing process and does not generate internal stress. An object of the present invention is to provide an apparatus for producing a functional film having excellent properties, particularly a black matrix having good external light absorption effect.

Another object of the present invention is to provide an apparatus for producing a functional membrane, which is low in manufacturing cost and can be continuously manufactured, thereby improving productivity.

In order to achieve the above object, the present invention has a deposition chamber having an inlet at one end and an outlet at the other end and a support means for supporting a substrate to be deposited thereon, the inside of which is maintained in a vacuum. A substrate transfer means for allowing a substrate to penetrate the deposition chamber through the inlet and the outlet; pure SiO, which is a dielectric material on the lower surface of the substrate, is mixed with the SiO and the metal at different ratios; Deposition means formed to sequentially and individually deposit at least one or more mixtures and pure metals; Heating and temperature control means formed to heat and maintain the deposition means at a constant temperature; At least one mixture of the SiO / metal and a supply means for supplying a metal Provides a functional film production device, characterized in that made open.

At this time, the deposition means has deposition boats arranged in a continuous line, injecting pure SiO or metal into the first deposition boat toward the inlet, and then gradually increasing the metal or SiO component in the deposition boats. At least one or more mixtures of SiO / metal may be sequentially added, and the final deposition boat may be formed by depositing metal or pure SiO, and separating membranes may be formed between the deposition boats. .

In addition, a preliminary vacuum chamber may be further provided in front of the inlet of the vacuum chamber. At least one of the pure SiO, the SiO / metal mixture, and the metal may have a pellet shape, and the supply means may continuously supply the same. .

In the present invention, the metal may be at least one selected from the group consisting of Fe, Co, V and Ti.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.                     

The functional film of the present invention described above is a black matrix in the following embodiment, and the display elements employing the black matrix are, for example, color cathode ray tube (CRT), liquid crystal display element (LCD), plasma display element (PDP), and the like. Can be mentioned.

The black matrix should have high electrical conductivity and low reflectance on the outer surface of the display device panel. In order to satisfy these characteristics, the present invention forms a metal-dielectric material film structure whose composition varies depending on the thickness of the film. To obtain an achromatic black matrix film having

The black matrix of the present invention has a component distribution as shown in FIG.

Referring to FIG. 1, SiO in a black matrix formed on a panel of a display element is present in a distribution in which its concentration is gradually decreased in the direction in which external light is incident, and the metal component is gradually in the concentration in the direction of incidence of external light. In this case, SiO and metal are present in almost the same amount in about half of the thickness of the black matrix film. Since the black matrix having such a composition distribution is gradually deposited by using an inverse concentration gradient of dielectric material and metal, no layered structure is formed, and absorption is more than light reflection at the interface using refractive index gradient between dielectric material and metal. Compared with this, the reflectance is significantly reduced. In particular, SiO ₂ constituting the panel of the display element and SiO present in the region adjacent to the panel are almost similar in the refractive index of about 1.5. Therefore, rather than being reflected at the interface between the panel and the black matrix, transmission occurs and the refractive index gradually increases and the transmittance decreases in the direction of incidence of external light due to the concentration gradient in the black matrix. .

As described above, the black matrix having a non-uniform composition can be produced using the apparatus for producing a functional film of the present invention as shown in FIG.

First, the apparatus for manufacturing a black matrix according to an exemplary embodiment of the present invention includes a deposition chamber 10 in which deposition is performed as shown in FIG. 2, and a substrate transfer to transfer the substrate 100 to be deposited through the deposition chamber 10. Means 30, a vapor deposition means 20 for depositing on the substrate 100, heating and temperature control means (not shown), and a supply means 40. The preliminary vacuum chamber 50 may be further connected thereto to maintain the vacuum in the deposition chamber 10.

The inlet 12 is formed at one end of the deposition chamber 10, and the outlet 14 is formed at the other end of the deposition chamber 10 to allow the substrate to be deposited to enter and exit. In this case, the vacuum is to be maintained. Therefore, in order to maintain the vacuum in this way, the preliminary vacuum chamber 50 may be connected to the front end of the inlet 12 so as to maintain the airtightness.

In order to allow the substrate to penetrate the deposition chamber 10, the substrate transfer means 30 is provided in a continuous line from the inlet 12 to the outlet 14. The substrate transfer means 30 is provided with support means 32 so as to support the substrate 100. The support means 32 can support the substrate 100 from above or from below. When supporting from the bottom side, a separate design is needed to allow deposition from the bottom side.

Deposition means 20 is installed under the deposition chamber 10 to deposit on the lower surface of the substrate 100. The deposition means 20 comprises a plurality of deposition boats 22a, 22b, 22c, 22d,... Which are to contain the material to be deposited and a separator 24 separating the boats from each other. The separator 24 prevents mixing between materials evaporated from the respective deposition boats 22a, 22b, 22c, 22d, ..., so that the deposition boats 22a, 22b, 22c, 22d, respectively. In order to form separate deposition spaces 26a, 26b, 26c, 26d,..., It is desirable to extend to the bottom of the substrate 100 on which deposition is to be made.

Each of these deposition boats 22a, 22b, 22c, 22d, ... is provided with heating and temperature control means (not shown) to allow each boat to sublimate and / or evaporate the material contained therein.

Outside the deposition chamber 10 is provided with a supply means 40 for supplying the deposition material to the respective deposition boats (22a, 22b, 22c, 22d, ...).

Next, a method of manufacturing a black matrix by a manufacturing apparatus according to a preferred embodiment of the present invention configured as described above will be described with reference to FIG. 2.

First, metals having different melting points, dielectric materials, and mixtures thereof are separately added to the deposition boats 22a, 22b, 22c, 22d,... At this time, SiO, which is a pure dielectric material, is added to the first deposition boat 22a, and a mixture in which a small amount of metal is added to the second deposition boat 22b. Next, a mixture in which the amount of metal is further added to the third deposition boat 22c is added again, and only the metal is added to the seventh deposition boat 22g, for example, when all seven deposition boats are finally disposed. Be sure to The metal may be one or more selected from the group consisting of Fe, Co, V and Ti. In this case, the mixture of the metal-dielectric material is 50 to 80% by weight of the metal and 20 to SiO in the total weight of the metal and the deposition boats (22a, 22b, 22c, 22d, ...) of SiO. It is preferred to be 50% by weight. When the metal content exceeds 80% by weight, the black matrix has an optical density of less than 3.5, and the surface resistance is 10 ⁵ mA /? If it is increased to an extent and less than 20% by weight, the reflectance characteristic is lowered, which is not preferable.

The sequential introduction of the mixture from pure SiO to the metal may vary depending on the stacking state of the display device on which the substrate to be deposited is used. In some cases, the mixture may be introduced from the initial metal to pure SiO. have.

After injecting the material to be deposited into the deposition boats, the substrate 100 is mounted on the fixing means 32. The substrate 100 may be a panel of display elements. The substrate 100 mounted on the fixing means 32 is first passed through the preliminary vacuum chamber 50 to maintain the vacuum, and then transferred to the deposition chamber 10 to perform sequential deposition.

Meanwhile, the deposition boats 22a, 22b, 22c, 22d, ... are heated to a predetermined temperature by heating and temperature control means (not shown), respectively, to maintain this temperature. The heating temperatures of 22a, 22b, 22c, 22d, ...) will vary depending on the material contained therein. In other words, it must be a temperature that can evaporate or sublimate the materials introduced therein, and in boats loaded with a mixture of SiO and metal, the vapor pressure is maintained to a certain degree so that only SiO in the mixture is sublimed first.

The deposition boats 22a, 22b, 22c, 22d, ... on which the evaporation and / or sublimation takes place are transferred while transporting the substrate 100. Then, SiO, which is a dielectric component, begins to be deposited on the substrate 100 first. In addition, when the substrate 100 is transferred to the final deposition boat, the deposition is performed so that the metal component is gradually contained so that only the metal component is deposited. As a result, as shown in FIG. 1, SiO exists in a distribution that gradually decreases away from the direction of incidence of external light, and a metal component exists in a distribution that increases gradually away from the direction of incidence of external light.

Meanwhile, the above-described deposition boats 22a, 22b, 22c, 22d, ... are continuously supplied with materials to be introduced therein from the supply means 40, and the deposition materials are pelleted. It can be configured to supply continuously into the vacuum equipment.

When the deposition process of SiO and the metal is completed, the black matrix according to the preferred embodiment of the present invention is completed by patterning the resultant. Patterning is carried out through a photolithography process. The thickness of the thus formed black matrix is 0.2 to 0.6 mu m, particularly preferably 0.4 to 0.5 mu m. If the thickness of the black matrix is less than 0.2 mu m, the optical density characteristics are lowered, and if the thickness of the black matrix is more than 0.6 mu m, the material ratio is not preferable.

The photolithography process may use a direct photolithography method or a blast photolithography method.

According to the direct photolithography method, a positive photoresist is applied to a surface on which a black matrix is formed, and then exposed and developed through a shadow mask to form a photoresist pattern. Thereafter, the predetermined area of the black matrix is etched using the photoresist pattern, and then the black matrix pattern is completed by removing the remaining photoresist pattern.

On the other hand, according to the blast photolithography method, a photoresist is applied, and then exposed and developed to form a photoresist pattern. After the black coating layer is formed on the photoresist pattern, the black matrix pattern is completed by removing the photoresist pattern and the black coating layer of the unwanted region by etching.

The black matrix of the present invention can be applied to various display devices, and among them, it can be usefully used for liquid crystal display devices employing color cathode ray tubes or color filters, and can also be applied to plasma display panels.

Although the present invention has been described with reference to the above embodiments, it is merely illustrative, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. . Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Functional membranes prepared in accordance with the present invention, in particular black matrices, are excellent in thermal and chemical stability and are preferred from the standpoint of environmental protection using mixtures of non-toxic metals and dielectric materials. In addition, it exhibits excellent adhesion to the substrate without undergoing an annealing process and does not generate internal stress, thereby providing excellent mechanical properties and fine patterning of 1 μm or less. If such a black matrix is formed on the substrate of the display element, the external light absorption effect is excellent. Therefore, by employing such a black matrix, a display device having improved luminance and contrast characteristics can be obtained.

In addition, by using a pellet-type deposition material can be produced in a continuous line can significantly improve the productivity, it is not necessary to control the temperature at any time during the deposition process can be more stable deposition.

Claims (8)

A deposition chamber in which the inside is maintained in a vacuum and having an inlet at one end and an outlet at the other end; Substrate transfer means having support means for supporting a substrate on which deposition is to be made, and allowing the substrate to pass through the inlet and outlet through the deposition chamber; Deposition means disposed below the deposition chamber and configured to sequentially and individually deposit pure SiO, which is a dielectric material, at least one or more mixtures of SiO and metal mixed at different ratios and pure metal on a lower surface of the substrate; Heating and temperature control means configured to heat the deposition means and maintain the temperature at a constant temperature; And And a supply means for supplying the pure SiO, at least one mixture of the SiO / metal, and the metal to the deposition means. The method of claim 1, The deposition means has deposition boats arranged in a continuous line, injecting pure SiO into the first deposition boat toward the inlet, and subsequent deposition boats at least of SiO / metal with progressively increased component of the metal. Apparatus for producing a functional film, characterized in that the one or more mixtures are sequentially added, the final deposition boat to be deposited by adding a metal, the separation membrane is formed between each of the deposition boats. The method of claim 1, The deposition means includes deposition boats arranged in a continuous line, injecting metal into the first deposition boat toward the inlet, and subsequent deposition boats at least one of SiO / metal that gradually increases the composition of the SiO. The above mixture is sequentially added, and the final deposition boat is capable of depositing pure SiO by deposition, and the separation membrane is formed between each of the deposition boats, the apparatus for producing a functional film, characterized in that formed. The method of claim 1, An apparatus for producing a functional membrane, characterized in that the preliminary vacuum chamber is further provided at the front end of the inlet of the vacuum chamber. The method of claim 1, And the functional membrane is a black matrix. The method according to any one of claims 1 to 5, At least one of the pure SiO, SiO / metal mixture and the metal is in the shape of a pellet, the supply means is a device for producing a functional film, characterized in that for supplying it continuously. The method of claim 6, The metal is Fe, Co, V and Ti manufacturing apparatus of the functional film, characterized in that at least one selected from the group consisting of. The method according to any one of claims 1 to 5, The metal is Fe, Co, V and Ti manufacturing apparatus of the functional film, characterized in that at least one selected from the group consisting of.

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