KR100761074B1 - Donor substrate for Laser Induced Thermal Imaging and method of fabricating thereof, and method of fabricating full color OLED using the same - Google Patents

Abstract

Provided are a donor substrate for laser transfer, a method for producing the same, and a method for producing a full color organic electroluminescent device using the same. The donor substrate for laser transfer is characterized in that at least two red, green, and blue light emitting layers are formed on the same plane of the donor substrate, respectively. The method of manufacturing a donor substrate for laser transfer includes forming a first light emitting layer, a second light emitting layer, and a third light emitting layer on a donor substrate. The method of manufacturing the full color organic electroluminescent device includes laminating a donor substrate having first, second and third light emitting layers formed thereon on a substrate on which pixel electrodes are formed, and then irradiating a laser to irradiate a first light emitting layer pattern and a second light emitting layer. And forming a pattern and a third light emitting layer pattern.

Donor Board, LITI, Light Emitting Layer

Description

A donor substrate for laser transfer, a method of manufacturing the same, and a method for manufacturing a full color organic electroluminescent device using the same, {Donor substrate for Laser Induced Thermal Imaging and method of fabricating etc, and method of fabricating full color OLED using the same}             

1A and 1B are a plan view and a front view illustrating a donor substrate for laser transfer according to the present invention;

2A to 2C are process drawings for explaining a method of manufacturing a donor substrate for laser transfer according to a first embodiment of the present invention;

3A to 3C are process drawings for explaining a method of manufacturing a donor substrate for laser transfer according to a second embodiment of the present invention;

4 is a process chart for explaining a method of manufacturing a full color organic electroluminescent device according to a first embodiment of the present invention;

5A to 5D are flowcharts illustrating a method of manufacturing a full color organic electroluminescent device according to a second embodiment of the present invention.

<Explanation of symbols for main parts of the drawings>

110, 220, 330, 420, 520: donor substrate for laser transfer

121, 241, 361, 431, 531: first light emitting layer

122, 242, 362, 432, 532 second light emitting layer

123, 243, 363, 433, 533: third light emitting layer

210, 310: vacuum chamber

231, 351: first deposition apparatus

232, 352: second deposition apparatus

233, 353: third deposition apparatus

451, 551: first light emitting layer pattern

452 and 552: second light emitting layer pattern

453 and 553: third light emitting layer pattern

The present invention relates to a laser transfer donor substrate, a method of manufacturing the same, and a method of manufacturing a full color organic electroluminescent device using the same, and more particularly, at least one red, green, and blue light emitting layer on the same plane of the donor substrate. The present invention relates to a laser transfer donor substrate, a method for producing the same, and a method for producing an organic electroluminescent device using the same.

In general, an organic EL device, which is a flat panel display device, includes an anode electrode and a cathode electrode, and organic layer layers interposed between the anode electrode and the cathode electrode.

The organic layer may include at least a light emitting layer, and may further include a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer in addition to the light emitting layer. The organic electroluminescent device is divided into a polymer organic electroluminescent device and a low molecular organic electroluminescent device according to the material and the process forming the organic layer, in particular the light emitting layer.

In the organic electroluminescent device, in order to realize full colorization, the light emitting layer must be patterned. As a method for patterning the light emitting layer, ink-jet printing or laser thermal induced thermal imaging (Laser Induced Thermal Imaging) LITI has the advantage of being able to finely pattern the light emitting layer, to be used for a large area, and to be advantageous for high resolution, whereas the ink-jet printing is a wet process. This has the advantage of being a dry process.

Such a method of forming the light emitting layer pattern by LITI requires at least a light source, an organic EL device substrate, and a donor substrate. The patterning of the light emitting layer on the substrate is performed while light emitted from the light source is absorbed by the light-heat conversion layer of the donor substrate and converted into thermal energy, and the material constituting the light emitting layer is transferred onto the substrate by the thermal energy. This is disclosed in Korean Patent Application Nos. 1998-51844 and US Pat. Nos. 5,998,085, 6,214,520 and 6,114,088.

Conventionally, when fabricating a full color organic electroluminescent device by the LITI, a light emitting layer pattern is formed on a substrate using each donor substrate having a red, green, or blue light emitting layer composed of only one of red, green, and blue colors. It was. Therefore, in order to realize the full color, after forming the light emitting layer having one color, the substrate must be moved to form the light emitting layer having the different color. In addition, since a transfer process for forming the light emitting layers having respective colors is required, a lot of equipment is required and there is a problem that the transfer process takes a lot of time.

The technical problem to be achieved by the present invention is to solve the problems of the prior art described above, when manufacturing a full-color organic electroluminescent device by LITI at least one red, green and blue light emitting layer on the same plane of the donor substrate, respectively By the above formation, the donor substrate for laser transfer and its process which can transfer all the red, green, and blue light emitting layers onto the substrate with one donor substrate, simplify the processing equipment, and reduce the processing time due to the substrate movement. An object thereof is to provide a manufacturing method and a manufacturing method of a full color organic electroluminescent device using the same.

In order to achieve the above technical problem, the present invention provides a donor substrate for laser transfer. The donor substrate for laser transfer is characterized in that at least two red, green, and blue light emitting layers are formed on the same plane of the donor substrate, respectively.

In order to achieve the above technical problem, the present invention also provides a method of manufacturing a donor substrate for laser transfer. The method comprises: injecting a donor substrate, forming a first light emitting layer on the donor substrate, forming a second light emitting layer on the same plane of the donor substrate, and a third light emitting layer on the same plane of the donor substrate It characterized in that it comprises a step of forming.

In order to achieve the above technical problem, the present invention also provides a method of manufacturing a full color organic electroluminescent device. The method includes providing a substrate having a pixel electrode formed thereon, laminating a donor substrate having first, second, and third light emitting layers formed by a method of manufacturing the laser transfer donor substrate on the entire surface of the substrate; Irradiating a predetermined area of the first light emitting layer of the donor substrate to form a first light emitting layer pattern on the pixel electrode, irradiating a laser to a predetermined area of the second light emitting layer of the donor substrate And forming a third light emitting layer pattern on the pixel electrode by irradiating a laser to a predetermined region of the third light emitting layer of the donor substrate.

The first, second, and third light emitting layers may be formed of red, green, or blue light emitting materials, respectively.

The light emitting layer may be formed by a wet coating method.

The light emitting layer formed on the donor substrate may be made of a polymer or a low molecular material.

The donor substrate moves in-line through the inside of the vacuum chamber, and the first, second and third light emitting layers are respectively formed on the donor substrate by first, second and third deposition apparatuses formed in the vacuum chamber. Can be formed on. The vacuum chamber may be a combination of at least three or more vacuum chambers in a row, the vacuum chamber is a combination of three vacuum chambers in a row, the deposition apparatus is formed in the middle vacuum chamber of the three vacuum chambers It may be.

The forming of the first, second and third light emitting layers may include: releasing a donor substrate by an unwinding roller formed in a vacuum chamber, moving the donor substrate in the vacuum chamber, and forming a first formed in the vacuum chamber. Forming a first, second, and third light emitting layer on the donor substrate, respectively, by a first, second, and third deposition apparatus, and the first, second, and third light emitting layer by means of a winding roller formed in the vacuum chamber. The donor substrate may be wound up.

The deposition apparatus may be a resistive heating deposition apparatus.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings in order to describe the present invention in more detail. Like numbers refer to like elements throughout the specification.

1A and 1B are a plan view and a front view illustrating a donor substrate for laser transfer according to the present invention.

1A and 1B, a first light emitting layer 121, a second light emitting layer 122, and a third light emitting layer 123 are formed on the same plane of the laser transfer donor substrate 110. Each of the first, second, and third light emitting layers may be formed of any one material of red, green, or blue light emitting materials, and each of the first, second, and third light emitting layers may be formed. That is, at least one red, green, or blue light emitting layer is formed on the same plane of the laser transfer donor substrate 110. Therefore, a full color organic electroluminescent device can be manufactured by LITI using only one donor substrate 110.

At this time, the first light emitting layer 121, the second light emitting layer 122, and the third light emitting layer 123 applied onto the laser transfer donor substrate 110 are dissolved by a solvent and applied in a solution state by a wet coating method. Can be formed. As the wet coating method, a spin coating method, a dip coating method, a spray method, a screen printing method, an inkjet printing method, or the like may be used. In addition to this, conventional methods used in this field may be used.

In addition, the first emission layer 121, the second emission layer 122, and the third emission layer 123 may be formed by vacuum deposition. The vacuum deposition refers to a method of heating a material to be deposited in a vacuum chamber to increase vapor pressure to be deposited on a substrate. Deposition methods include resistive heating deposition, electron beam deposition, and induction heating deposition. The resistive heating deposition refers to a method of depositing the light emitting layer on a donor substrate by heating the light emitting material included in the deposition apparatus to a vapor state by heating the deposition apparatus at a temperature of 250 ° C. or higher.

The light emitting layer formed on the donor substrate may be made of a polymer or a low molecular material.

2A to 2C are process diagrams illustrating a method for manufacturing a laser transfer donor substrate according to a first embodiment of the present invention, which relates to a method of forming first, second and third light emitting layers by vacuum deposition. .

Referring to FIG. 2A, a deposition apparatus is formed in the vacuum chamber 210. The vacuum chamber 210 may combine at least three or more vacuum chambers in a row to maintain high vacuum. In this embodiment, the vacuum chamber 210 in which the first vacuum chamber 211, the second vacuum chamber 212, and the third vacuum chamber 213 are coupled in a row is used. In order to maintain the inside of the vacuum chamber 210 at a high vacuum, a pump (not shown in the drawing) is used, and high vacuum can be maintained by exhausting the air in the vacuum chamber 210. In forming the transfer layer by the vapor deposition apparatus described later, high vacuum is advantageous, such as preventing the deposition of impurities, and it is preferable to form the transfer layer by maintaining a vacuum degree of 10 ^-4 torr or less.

First, second and third deposition apparatuses 231, 232, and 233 are formed in the second vacuum chamber 212, and the deposition apparatuses are resistive heating deposition apparatuses.

First, a donor substrate 220 is introduced into the vacuum chamber 210. The donor substrate 220 is introduced into the first vacuum chamber 211 while moving in-line by the donor substrate transfer roller 250. The donor substrate 220 having passed through the first vacuum chamber 211 moves into the second vacuum chamber 212 and then stops. The donor substrate 220 may have a flexible property.

The first emission layer 241 is formed on the donor substrate 220 by using the first deposition apparatus 231 fixed to the lower portion of the donor substrate 220 in the second vacuum chamber 212. In this case, the second and third deposition apparatuses 232 and 233 may be blocked by a shutter so as not to form a light emitting layer.

Referring to FIG. 2B, after forming the first light emitting layer 241, a second light emitting layer 242 is formed on the donor substrate 220 using the second deposition apparatus 232. In this case, the first and third deposition apparatuses 231 and 233 are blocked by a shutter and adjusted so that the light emitting layer cannot be formed.

Referring to FIG. 2C, after forming the second emission layer 242, a third emission layer 243 is formed on the donor substrate 220 using the third deposition apparatus 233. In this case, the first and second deposition apparatuses 231 and 232 may be blocked by a shutter so as not to form a light emitting layer.

The first, second and third light emitting layers may be made of any one material of red, green, or blue light emitting materials, respectively, and may be a polymer or a low molecular material.

The donor substrate 220 on which the first, second, and third light emitting layers are formed passes through the second vacuum chamber 212 to the third vacuum chamber 213 and then passes outside the vacuum chamber 210. At this time, in the second vacuum chamber 212, the process of forming the first, second and third light emitting layers is performed again. By repeating the light emitting layer forming process, a laser transfer donor substrate having at least one red, green, and blue light emitting layer formed on the same plane of the donor substrate may be completed.

In the present exemplary embodiment, the light emitting layer is formed while the donor substrate 220 is stopped in the second vacuum chamber 212. However, the donor substrate 220 may be formed in the second vacuum chamber 212. The first, second and third light emitting layers may be formed while continuously moving at.

In addition, in the present exemplary embodiment, the deposition apparatus is fixed in the second vacuum chamber 212, but the deposition apparatus is not fixed in the second vacuum chamber 212 to perform the deposition process while reciprocating. It may be.

In addition to the method of forming the light emitting layer by vacuum deposition, the first, second and third light emitting layers may be formed by the wet coating method described above.

3A to 3C are process drawings for explaining a method for manufacturing a donor substrate for laser transfer according to a second embodiment of the present invention.

Referring to FIG. 3A, first, second, and third deposition apparatuses 351, 352, and 353 are formed in a single vacuum chamber 310. The deposition apparatus is a resistive heating deposition apparatus.

The unwinding roller 320 formed in the vacuum chamber 310 releases the donor substrate 330. The released donor substrate 330 is moved by the donor substrate transfer roller 370 in the upper portion of the vacuum chamber 310 and then stopped. In this case, the first emission layer 361 is formed on the donor substrate 330 by using the first deposition apparatus 351 fixed to the lower portion of the donor substrate 330 in the vacuum chamber 310. In this case, the second and third deposition apparatuses 352 and 353 are blocked by a shutter so as not to form a light emitting layer.

A light emitting material may be deposited on the unwinding roller 320 and the winding roller 340 during the formation of the light emitting layer. In order to prevent this, a deposition material preventing plate 380 may be disposed on the unwinding roller 320. It may be installed below the winding roller 340.

Referring to FIG. 3B, after forming the first light emitting layer 361, a second light emitting layer 362 is formed on the donor substrate 330 using the second deposition apparatus 352. In this case, the first and third deposition apparatuses 351 and 353 are blocked by a shutter to control the light emitting layer from being formed.

Referring to FIG. 3C, after forming the second light emitting layer 362, a third light emitting layer 363 is formed on the donor substrate 330 by using a third deposition apparatus 353. In this case, the first and second deposition apparatuses 351 and 352 may be blocked by a shutter so as not to form a light emitting layer.

The donor substrate 330 on which the light emitting layer is formed is moved again by the donor substrate transfer roller 370 and wound by the winding roller 340.

Subsequently, when a portion in which the light emitting layer is not formed on the donor substrate 330 is positioned above the deposition apparatus, the donor substrate 330 is stopped again, and thus the first, second, and first portions are formed on the donor substrate 330. 3 form a light emitting layer. By repeating the above process, the donor substrate for laser transfer, in which at least one red, green, and blue light emitting layer is formed on the same plane of the donor substrate 330, is completed.

Except for the above, the method of manufacturing the donor substrate for laser transfer according to the first embodiment of the present invention is the same.

 FIG. 4 is a flowchart illustrating a method for manufacturing a full color organic electroluminescent device according to a first embodiment of the present invention, and illustrates a case in which a light emitting layer formed on a donor substrate is formed by vacuum deposition.

Referring to FIG. 4, a substrate 410 on which a pixel electrode is formed is provided inside the LITI facility 400. The transfer process is performed in the LITI facility 400, and is in a vacuum state. The donor substrate 420 for laser transfer according to the first and second embodiments of the present invention is introduced to the entire surface of the substrate 410. That is, a donor substrate for laser transfer in which at least one red, green, and blue light emitting layer is formed on the same plane of the donor substrate 420 is introduced to the entire surface of the substrate 410.

First, the donor substrate 420 is laminated on the substrate 410 so that the first emission layer 431 may cover the entire surface of the substrate 410. The laser 440 is irradiated to a predetermined region of the first emission layer 431 to form a first emission layer pattern 451 on the pixel electrode.

Subsequently, the substrate 410 remains as it is, and the donor substrate 420 is moved so that the second light emitting layer 432 covers the entire surface of the substrate 410 and then laminated on the entire surface of the substrate 410. A second light emitting layer pattern 452 is formed on the pixel electrode by irradiating a laser to a predetermined region of the second light emitting layer 432.

Subsequently, the substrate 410 remains as it is, and the donor substrate 420 is moved so that the third light emitting layer 433 covers the entire surface of the substrate 410 and then laminated on the entire surface of the substrate 410. A laser is irradiated to a predetermined region of the third light emitting layer 433 to form a third light emitting layer pattern 453 on the pixel electrode.

Therefore, in the present invention, all of the red, green, and blue light emitting layers may be formed with one donor substrate, and the process time due to the substrate movement may be shortened because the substrate does not need to be moved during the transfer process.

5A to 5D are flowcharts illustrating a method of manufacturing a full color organic electroluminescent device according to a second exemplary embodiment of the present invention, and illustrate a case in which a light emitting layer formed on a donor substrate is formed by a wet coating method.

Referring to FIG. 5A, the LITI facility 500 maintains a normal pressure state, and a substrate 510 on which the pixel electrode 515 is formed is provided inside the LITI facility 500. On the donor substrate 520, a first light emitting layer 531, a second light emitting layer 532, and a first wet coating device 541, a second wet coating device 542, and a third wet coating device 543 are respectively formed. The third light emitting layer 533 is formed. The donor substrate 520 is moved by the donor substrate transfer roller 560 and is introduced to the entire surface of the substrate 510 on which the pixel electrode 515 is formed.

Referring to FIG. 5B, the donor substrate 520 is laminated on the substrate 510 so that the first emission layer 531 covers the entire surface of the substrate 510. The laser 540 is irradiated to a predetermined region of the first emission layer 531 to form a first emission layer pattern 551 on the pixel electrode.

Referring to FIG. 5C, the substrate 510 is left as it is, and the donor substrate 520 is moved to cover the entire surface of the substrate 510, and then the front surface of the substrate 510 is moved. Laminate. The laser 540 is irradiated to a predetermined area of the second emission layer 532 to form a second emission layer pattern 552 on the pixel electrode.

Referring to FIG. 5D, the substrate 510 remains as it is, and after moving the donor substrate 520 to cover the entire surface of the substrate 510, the donor substrate 520 may be disposed on the entire surface of the substrate 510. Laminate. The laser 540 is irradiated to a predetermined region of the third light emitting layer 533 to form a third light emitting layer pattern 553 on the pixel electrode.

Except for the above-mentioned, it is the same as the manufacturing method of the full color organic electroluminescent element which concerns on 1st Example of this invention.

As described above, according to the present invention, when the full color organic electroluminescent device is manufactured by LITI, at least one red, green, and blue light emitting layer is formed on the same plane of the donor substrate, thereby providing red, one, A donor substrate for laser transfer, a method of manufacturing the same, and a full-color organic electroluminescent device using the same, which can transfer both the green and blue light emitting layers onto the substrate, simplify the process equipment, and reduce the processing time due to the substrate movement. There is an advantage of providing a method for producing the same.

While the foregoing has been described with reference to preferred embodiments of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. Could be.

Claims (28)

At least two red, green, and blue light emitting layers are formed on the same plane of the donor substrate, and the light emitting layer is formed by vacuum deposition. delete delete The method of claim 1, A donor substrate for laser transfer, wherein the light emitting layer formed on the donor substrate is made of a polymer or a low molecular material. Inputting a donor substrate; Forming a first light emitting layer on the donor substrate; Forming a second light emitting layer on the same plane of the donor substrate; And Forming a third light emitting layer on the same plane of the donor substrate, The donor substrate moves in-line through the vacuum chamber, And the first, second and third light emitting layers are formed on the donor substrate respectively by first, second and third deposition apparatuses formed in the vacuum chamber. The method of claim 5, The first light emitting layer is a method of manufacturing a donor substrate for laser transfer, characterized in that made of a red, green or blue light emitting material. The method of claim 5, The second light emitting layer is a method of manufacturing a donor substrate for laser transfer, characterized in that the red, green or blue light emitting material. The method of claim 5, And the third light emitting layer is a red, green or blue light emitting material. delete The method of claim 5, The light emitting layer formed on the donor substrate is a method of manufacturing a donor substrate for laser transfer, characterized in that made of a high molecular or low molecular material. delete The method of claim 5, The vacuum chamber includes three, and a plurality of the vacuum chamber manufacturing method of the donor substrate for laser transfer, characterized in that coupled in a row. The method of claim 5, The vacuum chamber is a method of manufacturing a donor substrate for laser transfer, characterized in that three vacuum chambers are coupled in a row, and the deposition apparatus is formed in a vacuum chamber among the three vacuum chambers. The method of claim 5, The deposition apparatus is a method of manufacturing a donor substrate for laser transfer, characterized in that the resistive heating deposition apparatus. The method of claim 5, Forming the first, second and third light emitting layers Releasing the donor substrate by an unwinding roller formed in the vacuum chamber; Moving the donor substrate in the vacuum chamber; Forming first, second and third light emitting layers on the donor substrate by first, second and third deposition apparatuses formed in the vacuum chamber, respectively; And And winding the donor substrate on which the first, second, and third light emitting layers are formed by a winding roller formed in the vacuum chamber. The method of claim 15, The deposition apparatus is a method of manufacturing a donor substrate for laser transfer, characterized in that the resistive heating deposition apparatus. Providing a substrate on which a pixel electrode is formed; Introducing a donor substrate having a first, a second, and a third light emitting layer manufactured by the method of claim 5 on the entire surface of the substrate; Irradiating a laser onto a predetermined region of the first light emitting layer of the donor substrate to form a first light emitting layer pattern on the pixel electrode; Irradiating a laser onto a predetermined region of the second light emitting layer of the donor substrate to form a second light emitting layer pattern on the pixel electrode; And Irradiating a laser to a predetermined region of the third light emitting layer of the donor substrate to form a third light emitting layer pattern on the pixel electrode; The donor substrate moves in-line through the vacuum chamber, And the first, second and third light emitting layers are formed on the donor substrate by first, second and third deposition apparatuses formed in the vacuum chamber, respectively. The method of claim 17, The first light emitting layer is a manufacturing method of a full color organic electroluminescent device, characterized in that made of a red, green or blue light emitting material. The method of claim 17, The second light emitting layer is a manufacturing method of a full color organic electroluminescent device, characterized in that the red, green or blue light emitting material. The method of claim 17, The third light emitting layer is a manufacturing method of a full color organic electroluminescent device, characterized in that the red, green or blue light emitting material. delete The method of claim 17, The light emitting layer formed on the donor substrate is a method of manufacturing a full color organic electroluminescent device, characterized in that made of a high molecular or low molecular material. delete The method of claim 17, The vacuum chamber includes three, and a plurality of the vacuum chamber is a method of manufacturing a full-color organic electroluminescent device, characterized in that coupled in a row. The method of claim 17, The vacuum chamber has three vacuum chambers coupled in a row, and the deposition apparatus is formed in a middle vacuum chamber among the three vacuum chambers. The method of claim 17, The deposition apparatus is a method of manufacturing a full color organic electroluminescent device, characterized in that the resistive heating deposition apparatus. The method of claim 17, Forming the first, second and third light emitting layers Releasing the donor substrate by an unwinding roller formed in the vacuum chamber; Moving the donor substrate in the vacuum chamber; Forming first, second and third light emitting layers on the donor substrate by first, second and third deposition apparatuses formed in the vacuum chamber, respectively; And And winding the donor substrate on which the first, second, and third light emitting layers are formed by winding rollers formed in the vacuum chamber. The method of claim 27, The deposition apparatus is a method of manufacturing a full color organic electroluminescent device, characterized in that the resistive heating deposition apparatus.

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