KR100759447B1 - Flat display panel and preparing method of same - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display and a method of manufacturing the flat panel display, wherein the flat panel display is disposed in a space between the first and second substrates facing each other, and is spaced between the first and second substrates to partition discharge cells. Barrier ribs, a phosphor layer formed in each of the discharge cells, address electrodes formed along one direction on the second substrate, a second dielectric layer covering the address electrodes on the second substrate, and the address on the first substrate. And a first dielectric layer formed along the direction crossing the electrodes, the display electrodes being formed to face each other at least one pair in the discharge cells, and covering the display electrodes on the first substrate. An electron amplification layer including a silica-treated carbon-based material is formed.

In the flat panel display device according to the present invention, the electron amplification layer can be easily formed without oxidation of a carbonaceous material during the process, and the secondary electron emission coefficient due to the ions inside the flat panel display device is increased, resulting in discharge characteristics and luminance characteristics. Can be significantly improved.

Plasma display, dielectric layer, carbonaceous material, electron amplification layer, brightness, discharge efficiency

Description

Flat display device and manufacturing method therefor {FLAT DISPLAY PANEL AND PREPARING METHOD OF SAME}

1 is an exploded perspective view schematically showing a flat panel display device according to an embodiment of the present invention;

FIG. 2 is a SEM photograph showing the carbon nanotubes treated with silica in Example 1. FIG.

FIG. 3 is a SEM photograph showing the carbon nanotubes treated with silica in Example 3. FIG.

[Technical Field]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display having excellent discharge characteristics and luminance characteristics, and a manufacturing method thereof.

[Private Technology]

Display devices can be broadly classified into a cathode ray tube (CRT) and a flat display panel (FDP). Compared to CRTs such as CRTs, FDP is becoming a representative display device that can replace CRTs due to its thickness, portability, and low power consumption.

FDP can be classified into liquid crystal display (LCD), plasma display panel (PDP), and field emission display (LCD). While it is difficult to form, PDP is called Photo Multiplier Tube (PMT) and MicroChannel Plate (MCP), which can improve the brightness while compensating for the LCD's disadvantages due to the formation of a large screen. An optical amplification element such as) is provided.

Among them, PDP uses the visible light of red (R), green (G) and blue (B) generated by vacuum ultraviolet (VUV: Vacuum Ultra-Violet) emitted from the plasma obtained through gas discharge to excite the phosphor. It is a display element to implement. The PDP can realize a 60-inch or larger screen with a thickness of only 10 cm or less, and since it is a self-luminous display device such as a CRT, it has no characteristic of distortion due to color reproduction and viewing angle, and also has a simple manufacturing method compared to LCD. It is gaining attention as a TV and industrial flat panel display that have strengths in terms of productivity and cost.

The PDP is required to improve the brightness by increasing the emission amount of secondary electrons when the ions separated by the plasma in the discharge cell collided, for this purpose, many technologies using carbon nanotubes have been developed. It is becoming.

Korean Patent Application No. 2001-0077686 discloses a plasma display panel including forming a secondary electron amplifying structure using carbon nanotubes to maximize secondary electron emission, improve luminance, and reduce driving voltage. , Korean Patent Application No. 2002-0036888 discloses a flat panel display device having an electron amplifying laminate using carbon nanotubes and a method of manufacturing the same.

An object of the present invention is to provide a flat panel display device which exhibits excellent discharge characteristics and luminance characteristics.

Another object of the present invention is to provide a method of manufacturing the flat panel display.

In order to achieve the above object, the present invention provides a first substrate and a second substrate disposed to face each other, partition walls disposed in the space between the first substrate and the second substrate to partition the discharge cells, formed in each discharge cell A phosphor layer, an address electrode formed along one direction on the second substrate, a second dielectric layer formed covering the address electrodes on the second substrate, and formed along a direction crossing the address electrode on the first substrate; At least one pair of display electrodes facing each other in the discharge cells, and a first dielectric layer covering the display electrodes on the first substrate, wherein the carbon-based material is silica-treated on the first dielectric layer. Provided is a flat panel display including an electron amplification layer formed thereon.

Preferably, the flat panel display is a plasma display panel (PDP).

The electron amplification layer may be formed on the entire surface of the first dielectric layer, or may be formed on a portion corresponding to the display electrode formation region on the first dielectric layer. In addition, the electron amplification layer is preferably exposed to the discharge cell.

The silica surface-treated carbon-based material is preferably arranged toward the discharge cell on the first dielectric layer, and the carbon-based material includes carbon nanotubes, graphite nanofibers, carbon nanofibers, carbon nanotips, and carbon nanorods. One or more selected from the group can be used.

The flat panel display may further include at least one protective film selected from the group consisting of a fluoride film and an oxide film on the first dielectric layer, more preferably MgO, MgF ₂ , CaF ₂ , LiF, Al ₂ O ₃ , ZnO, CaO, SrO, SiO ₂ and La ₂ O ₃ It may further include at least one protective film selected from the group consisting of.

The present invention also provides a method of forming a display electrode on a substrate for a first substrate, forming a first dielectric layer covering the display electrode on the first substrate, and depositing a silica-based carbon-based material on the first dielectric layer. A method of manufacturing a first substrate by forming an electron amplification layer, including forming an address electrode on a substrate for a second substrate, forming a second dielectric layer covering the address electrode on the second substrate, and forming the address electrode. Forming a partition wall partitioning a discharge cell on the second dielectric layer therebetween, forming a phosphor layer in the discharge cell to manufacture a second substrate, and sealing the formed first substrate and the second substrate to each other; It provides a method of manufacturing a flat panel display device comprising the step of evacuating and sealing.

The silica-based carbon-based material is preferably prepared by the sol-gel method or polymerization-gel method.

In the forming of the electron amplification layer, an electron amplification layer may be formed by plying a silica-based carbon-based material on the first dielectric layer.

The manufacturing method may further include forming at least one protective film selected from the group consisting of a fluoride film and an oxide film after the electron amplification layer is formed.

Hereinafter, the present invention will be described in more detail.

A flat panel display displays an image by forming a barrier rib on a substrate to form a plasma discharge cell and discharge the same. In general, a flat panel display includes a protective film including MgO to discharge secondary electrons in a discharge cell to lower the discharge voltage applied between the electrodes and to protect the electrodes inside the panel. However, the protective film used for the flat panel display device has a low secondary electron emission coefficient because of its low secondary electron emission coefficient. Such a low secondary electron amplification factor causes an increase in discharge voltage and a decrease in luminance.

In order to solve such a problem, a carbon nano tube may be used to increase the emission amount of secondary electrons due to ion collision separated by plasma in a discharge cell of a flat panel display. Since carbon nanotubes have a high aspect ratio (for example, about several microns in length with respect to several nm in diameter) and have metallic or semiconducting properties, electric fields tend to concentrate on the tip portion of the carbon nanotubes. In addition, since the carbon nanotube has a very low resistance, even when a low driving voltage is applied to the electrode, the carbon nanotube may induce the emission of electrons as much as a strong electric field is applied. As a result, a large amount of plasma discharge can be obtained, and the formed discharge is easily stabilized. Carbon nanotubes also have high mechanical strength, strong chemical resistance, and long life. Therefore, when the secondary electron amplifying means such as carbon nanotubes is applied to the flat panel display device, the secondary electron emission coefficient due to ions inside the flat panel display device is increased, so that excellent luminance characteristics and luminous efficiency can be obtained. In addition, it is possible to reduce the discharge voltage, in particular the address voltage, thereby lowering the power consumption and the driving voltage of the driver IC, so that a cheaper low-voltage IC can be used, thereby making a low-cost plasma display possible. .

However, there is a problem that such carbon nanotubes are easily oxidized when applied onto the dielectric layer during the manufacturing process, in particular, during planting. Therefore, in order to prevent oxidation of the carbon nanotubes, the carbon nanotubes should be fired in a nitrogen atmosphere. In contrast, the dielectric layer should be fired under an oxygen atmosphere when the flat panel display is formed. Therefore, the manufacturing process of the flat panel display device including the carbon nanotubes is complicated. In addition, the carbon nanotubes are not easy to disperse, so that the carbon nanotubes may be applied to be partially agglomerated, and thus, electric fields may be concentrated on a portion, resulting in poor uniformity of discharge.

On the other hand, in the present invention, by using a silica-treated carbon-based material in the manufacture of a flat panel display device, the manufacturing process is easy and the electron emission in the discharge cell is maximized, thereby improving the brightness and efficiency of the plasma display and increasing the discharge sustain voltage. Could be reduced.

That is, the flat panel display device according to an embodiment of the present invention,

A first substrate and a second substrate disposed to face each other;

Barrier ribs disposed in a space between the first substrate and the second substrate to partition discharge cells;

A phosphor layer formed in each discharge cell;

Address electrodes formed in one direction on the second substrate;

A second dielectric layer formed on the second substrate to cover address electrodes;

Display electrodes formed on the first substrate in a direction crossing the address electrodes, and at least one pair of the display electrodes facing each other in the discharge cells; And

A first dielectric layer covering the display electrodes on the first substrate,

An electron amplification layer including a silica-treated carbon-based material is formed on the first dielectric layer.

Hereinafter, various embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is an exploded perspective view schematically illustrating a flat panel display device according to an exemplary embodiment of the present invention.

Referring to the drawings, a flat panel display device will be described in brief. According to an embodiment of the present invention, a flat panel display device includes a first substrate (1, hereinafter referred to as a front substrate) and a second substrate (3, hereinafter, a back substrate). And the discharge gas is filled between the front substrate 1 and the back substrate 3, respectively. In the space formed between the front substrate 1 and the rear substrate 3, a plurality of partition walls 5 are arranged to form a plurality of discharge cells 7R, 7G, 7B. Red (R), green (G), and blue (B) color phosphors are formed in these discharge cells 7R, 7G, and 7B.

Display electrodes 9 and 11 are formed on the front substrate 1 along the x-axis direction of the drawing, and the display electrodes 9 and 11 correspond to the respective discharge cells 7R, 7G and 7B in the y-axis direction. Are arranged at intervals. In addition, address electrodes 13 are formed on the rear substrate 3 in a direction intersecting the display electrodes 9 and 11 (y-axis direction in the drawing), and the address electrodes 13 are formed on the x-axis of the drawing. In the direction corresponding to each discharge cell 7R, 7G, 7B. That is, the display electrodes 9 and 11 and the address electrodes 13 are arranged in a corresponding structure while crossing the discharge cells 7R, 7G, and 7B.

The partition walls 5 provided between the front substrate 1 and the rear substrate 3 are arranged in parallel with the other partition walls 5 adjacent to each other, thereby defining the front substrate 1 and the rear substrate 3. Discharge cells 7R, 7G, and 7B, which are required for plasma discharge, are arranged in the space between them to form partitions.

Although FIG. 1 illustrates a stripe-type barrier rib structure formed only of barrier ribs 5 formed in parallel with the address electrodes 13 (y-axis direction in the drawing), the barrier rib structure of the present invention is not limited to the barrier rib structure. . The barrier rib structure according to an embodiment of the present invention includes barrier ribs 5 formed in parallel with the address electrodes 13 (y-axis direction in the drawing) and a direction in which the barrier ribs 5 intersect the barrier ribs 5 (in the drawing). It may also include a closed partition structure for closing and partitioning the discharge cells (7R, 7G, 7B) independently by partitions (not shown) formed in the x-axis direction, the discharge cells (7R, 7G, It may also include a closed bulkhead structure that forms 7B) in quadrangles and a closed bulkhead structure that forms in hexagons and octagons.

Since the address electrodes 13 are typically formed on the rear substrate 3, the present embodiment exemplifies a configuration in which the address electrodes 13 are formed on the rear substrate 3, but the present invention is not limited thereto. (13) includes all of the configuration formed on the front substrate (1), the partition (5) or the like. The address electrodes 13 are covered with a second dielectric layer 15 to form wall charges in the discharge cells 7R, 7G, and 7B to cause an address discharge, and the partition wall 5 is covered with the second dielectric layer 15. ) Is formed on.

The display electrodes 9 and 11 are formed on the front substrate 1 by being formed of sustain electrodes and scan electrodes 9 and 11 opposing both sides of the discharge cells 7R, 7G and 7B. In addition, in the present exemplary embodiment, the front substrate 1 includes the sustain electrodes and the scanning electrodes 9 and 11, but the display electrodes 9 and 11 described above on the front substrate 1 for scanning and addressing. And a separate intermediate electrode (not shown) may be further provided between the sustain electrode and the scan electrodes 9 and 11.

As shown in FIG. 1, the sustain electrodes and the scan electrodes 9 and 11 may be formed of transparent electrodes 9a and 11a and bus electrodes 9b and 11b, respectively. It may be formed only by the electrodes 9b and 11b, respectively. When an intermediate electrode (not shown) is provided, the intermediate electrode is preferably formed of the same material as the sustain electrode and the scan electrodes 9 and 11 so as to simplify the manufacturing process. The transparent electrodes 9a and 11a may be formed in a stripe type formed in a direction crossing the address electrode 13 (the x-axis direction in the drawing). In addition, since the transparent electrodes 9a and 11a block surface areas of the discharge cells 7R, 7G and 7B as part of causing surface discharge inside the discharge cells 7R, 7G and 7B, the blocking of visible light is minimized. It is preferably formed of a transparent material so as to secure the brightness, and more preferably may be formed of an indium tin oxide (ITO) electrode.

In addition, the bus electrodes 9b and 11b are made of a metal material having excellent electrical conductivity by compensating for the high resistance of the transparent electrodes 9a and 11a to ensure the electrical conductivity of the transparent electrodes 9a and 11a. It is preferable, and more preferably, it can be formed with an Al electrode. The bus electrodes 9b and 11b are formed in a laminated structure on the transparent electrodes 9a and 11a formed on the front substrate 1 and are formed in a direction intersecting with the address electrode 13 (x-axis direction in the drawing). . In addition, since the bus electrodes 9b and 11b are formed of an opaque material, the bus electrodes 9b and 11b are disposed to correspond to the partition walls 5, and are formed to have a width smaller than that of the partition walls 5 to emit light from the discharge cells 7R, 7G, and 7B. It is desirable to minimize the blocking of visible light.

The display electrodes 9 and 11 formed as described above are covered by the first dielectric layer 17 to accumulate wall charges. The first dielectric layer 17 is preferably formed of a transparent dielectric to improve the transmittance of visible light.

An electron amplification layer 21 including a silica-treated carbon-based material may be formed on the first dielectric layer 17. The electron amplifying layer 21 is a secondary electron of the secondary electrons without interfering with the addressing and the emission of visible light between one of the sustain electrodes and the main electrodes 9 and 11 (usually the scanning electrode) and the address electrode 13. The emission amount is further increased to improve the ratio of the luminance to the power consumption, that is, the efficiency, thereby improving the luminance.

Accordingly, the electron amplification layer 21 is preferably exposed to the discharge space so that the secondary electrons can easily escape to the discharge space.

The electron amplifying layer 21 may be formed on the entire surface of the first dielectric layer 17, or may be formed only on a portion corresponding to the region where the display electrode is formed on the first dielectric layer 17. In addition, the electron amplification layer 21 may be formed with a specific pattern on the first dielectric layer. In addition, when the first dielectric layer 17 has a multilayer structure of an upper dielectric layer and a lower dielectric layer, an electron amplification layer 21 may be interposed therebetween. In this case, the electron amplification layer is applied to the entire surface of the lower dielectric layer, and is formed to correspond to a portion covered with the upper dielectric layer and an end portion toward the center of the discharge cell of the display electrode, and formed by the opening pattern of the upper dielectric layer. It is desirable to have exposed portions out of the dielectric layer.

The electron amplification layer 21 may be formed by applying a silica-treated carbon-based material onto the first dielectric layer, and more preferably, may be formed by planting a silica-treated carbon-based material. .

The silica surface-treated carbon-based material included in the electron amplification layer 21 thus formed is preferably arranged toward the discharge cell on the first dielectric layer.

 Silica surface-treated on the carbon-based material serves to prevent oxidation of the carbon-based material when the electron amplification layer is formed. As the carbon-based material treated with the silica surface, one prepared by the sol-gel method or the polymerized gel method is preferably used.

In this case, the carbonaceous material may be one or more selected from the group consisting of carbon nanotubes, graphite nanofibers, carbon nanofibers, carbon nanotips, carbon nanorods, and diamond, more preferably carbon. Nanotubes can be used. In addition, it is preferable to use a carbonaceous material having a large aspect ratio. The greater the aspect ratio, the easier the electric field is to concentrate on the tip portion of the carbon-based material can reduce the discharge voltage.

The flat panel display according to the exemplary embodiment may further include one or more layers selected from the group consisting of a fluoride layer and an oxide layer on the first dielectric layer. More preferably, the protective film 19 including at least one selected from the group consisting of MgO, MgF ₂ , CaF ₂ , LiF, Al ₂ O ₃ , ZnO, CaO, SrO, SiO _2, and La ₂ O ₃ is obtained. It may further comprise more than one layer.

The protective film 19 prevents the ions of the separated atoms from colliding with the first dielectric layer 17 and damaging the dielectric layer 17 and, when ions collide with, release the secondary electrons.

In the flat panel display according to the exemplary embodiment of the present invention having the above-described structure, when a voltage equal to or more than the discharge start voltage is applied between the scan and sustain electrodes formed side by side in a direction crossing the address electrode, surface discharge is applied to the discharge cell. As it happens, it can release secondary electrons in large quantities. This means that a large amount of plasma discharge is formed in the discharge cells while a voltage is applied between the scan and sustain electrodes. This also means that the discharge gas injected into the discharge cell is ionized more than before at the same applied voltage. Therefore, a larger amount of ultraviolet light is emitted in the discharge cell, and the emitted ultraviolet light excites the fluorescent film, so that the light emitted from the fluorescent film is much more than conventional. Therefore, the brightness of the image can be significantly improved.

The flat panel display according to the exemplary embodiment of the present invention is preferably a plasma display panel.

A flat panel display device according to an embodiment of the present invention, forming a display electrode on a substrate for a first substrate; Forming a first dielectric layer covering the display electrode on the first substrate; Forming a first substrate by forming an electron amplification layer including a silica-treated carbon-based material on the first dielectric layer; Forming an address electrode on the substrate for the second substrate; Forming a second dielectric layer covering the address electrode on the second substrate, and forming a partition wall on the second dielectric layer between the address electrodes to partition a discharge cell; Manufacturing a second substrate by forming a phosphor layer in the discharge cell; And sealing, exhausting, and sealing the formed first and second substrates.

In the flat panel display device process according to an embodiment of the present invention, except for the surface treatment method of the carbon-based material and the method of forming the electron amplification layer, the manufacturing method of the other flat panel display devices are well known in the art, The detailed description is omitted herein because it is a content that can be sufficiently understood by people. These embodiments are only intended to illustrate the present invention, but the present invention is not limited thereto.

First, a display electrode including a transparent electrode and a bus electrode is formed on a substrate for a first substrate, and then a first dielectric layer is formed on the display electrode. The method of forming the dielectric layer may be formed by a conventional forming method, and preferably may be formed to a thickness of 10 to 20㎛.

Next, an electron amplification layer is formed on the first dielectric layer by using a silica-based carbon-based material.

The silica-based carbon-based material may be prepared by a sol-gel method or a polymerization-gel method.

More specifically, the sol-gel method is to prepare a dispersion by dispersing a carbon-based material in a silica sol, to obtain a precipitate by centrifuging the dispersion liquid, and to wash the precipitate with alcohol to obtain a carbon-based surface-treated carbon-based material Manufacturing step.

In this case, the silica sol may include alcohol, silicon alkoxide and water, and more preferably 45 to 65% by weight of alcohol, 25 to 35% by weight of silicon alkoxide and the balance of water. If the content range of each component included in the silica sol is within the above range, the surface treatment efficiency for the carbon-based material is high, and if it is out of the above range, the surface treatment efficiency for the carbon-based material may be lowered. .

Ethanol or methanol may be used as the alcohol, and tetraethylorthosilicate (TEOS) may be used as the silicon alkoxide.

In addition, the carbon-based material is the same as described above, the carbon-based material and silicon alkoxide is preferably mixed in a weight ratio of 13: 1 to 16: 1, more preferably 14: 1 to 15: 1 can be mixed. have. Within the mixing ratio range, the surface treatment efficiency for the carbon-based material is high, and thus, the surface treatment efficiency for the carbon-based material may be lowered.

After dispersing the carbonaceous material in a silica sol, sonication may be further performed to increase the degree of dispersion. At this time, the ultrasonic treatment is preferably carried out for 1 to 2 hours at the conditions of 30 to 50kHz, 50 to 150Watt, more preferably 40kHz, 50 to 100Watt can be carried out for 1 hour.

The dispersion is then centrifuged. Centrifugation is preferably performed at 4000 to 6000 rpm, more preferably at 5000 rpm. In addition, centrifugation is preferably performed for 80 to 120 minutes, more preferably 100 minutes to 120 minutes. This centrifugation produces a precipitate.

The resulting precipitate may be washed with alcohol to obtain a silica-based carbonaceous material.

At this time, since the concentration of the alcohol used affects the thickness of the silica surface treatment layer, it is preferable to use an alcohol of 10 to 25M.

Another method of surface treating carbon-based materials with silica is the polymerization-gel method.

The polymerized gel method includes preparing a dispersion by dispersing a carbonaceous material in a silica gel solution, generating a precipitate by centrifuging the dispersion, and washing it with alcohol to prepare a carbonaceous material treated with silica. .

In this case, the silica gel may include alcohol and silicon alkoxide, more preferably alcohol: silicon alkoxide in a weight ratio of 17: 1 to 21: 1, and most preferably 20: 1. . The weight ratio of each component included in the silica gel is preferable because the surface treatment efficiency for the carbon-based material is excellent within the above range, and if it is outside the above range, the silica surface treatment efficiency for the carbon-based material may be lowered. not.

In addition, the carbon-based material is the same as described above, the carbon-based material and silicon alkoxide is preferably mixed in a weight ratio of 22: 1 to 26: 1, more preferably may be mixed in 25: 1. Within the mixing ratio range, the surface treatment efficiency for the carbon-based material is high, and thus, the surface treatment efficiency for the carbon-based material may be lowered.

After centrifugation and washing with alcohol is the same as the sol-gel method.

The silica surface-treated carbon-based material prepared as described above may be applied onto the first dielectric layer by a conventional coating method such as spray spraying or dropper dropping to form an electron amplifying layer. More preferably, the electron amplification layer is formed by using a planting method.

In the coating, the carbon-based material having the silica surface treatment may be applied to the entire surface of the first dielectric layer, or may be applied to a portion corresponding to the region where the display electrode on the first dielectric layer is formed.

When the silica surface-treated carbon-based material is slurry coated to form an electron amplification layer, the composition for forming an electron amplification layer including the silica-treated carbon-based material may be a silica-based carbon-based material treated with respect to the total weight of the composition. It is preferable to include less than 40% by weight, more preferably 0.1 to 40% by weight, still more preferably 5 to 30% by weight. When the content of the silica-treated carbon-based material is within the above content range, it is possible to obtain an excellent brightness and efficiency improvement effect and a discharge sustain voltage reduction effect. However, if the content is out of the above range, the electron amplification effect is insufficient or economically undesirable.

Thereafter, firing is performed at 430 to 600 ° C, more preferably at 450 to 580 ° C, in an oxygen atmosphere. If the firing temperature is lower than 430 ° C., the dielectric layer may not be completely fired. If the firing temperature is higher than 600 ° C., the carbon-based material may burn out, which is not preferable. Moreover, it is more preferable to perform the said baking process in oxygen atmosphere.

The silica surface-treated carbon-based material contained in the electron amplification layer thus prepared is preferably arranged toward the discharge cell.

As described above, the method of manufacturing the flat panel display device uses a silica surface-treated carbon-based material as an electron amplifying material, so that the dielectric layer in an oxygen atmosphere without oxidation of the carbon-based material and without calcination in a nitrogen atmosphere for the carbon-based material and Simultaneous firing of the electron amplification layer is possible.

In addition, the manufacturing method may further include forming at least one protective film selected from the group consisting of a fluoride film and an oxide film after formation of the electron amplification layer.

Specifically, the protective film is MgF ₂ , CaF ₂ Or a fluoride film such as LiF; And one or more protective films selected from the group consisting of oxide films such as MgO, Al ₂ O ₃ , ZnO, CaO, SrO, SiO ₂ or La ₂ O ₃ .

The method of forming the protective film is also not particularly limited, but may be formed by a thick film printing method using a paste and a deposition method using a plasma. Among them, the deposition method is relatively strong against sputtering due to the impact of ions, and discharge by secondary electron emission. It is preferable because the sustain voltage and the discharge start voltage can be reduced.

The method of forming the protective film by the plasma deposition method is magnetron sputtering, electron beam deposition, IBAD (ion beam assisted deposition), CVD (chemical vapor deposition), sol-gel (sol-gel) method Or ion plating to form a film by ionizing the evaporated particles. However, the ion plating method, which has similar characteristics to the sputtering method for the adhesion and crystallinity of the protective film, can be deposited at a high speed of 8 nm / s. Among these, electron beam deposition is most preferred.

As described above, in the case of using the flat panel display according to the exemplary embodiment of the present invention including the secondary electron amplifying means such as the carbon-based material treated with silica on the discharge cell, it is difficult to oxidize and disperse the carbon-based material during the process. The electron amplification layer can be easily formed without any problem. In addition, the secondary electron emission coefficient due to ions inside the flat panel display device is increased, so that electrons required for glow discharge can be easily supplied, so that the electron density in the discharge cell can be increased, and discharge characteristics and luminance characteristics due to the change of the discharge mode Can be significantly improved.

Hereinafter, preferred examples and comparative examples of the present invention are described. However, the following examples are only preferred embodiments of the present invention and the present invention is not limited to the following examples.

Example 1 Preparation of Carbon-Based Material Treated with Silica

Silica sol was prepared by mixing 60% by weight of ethanol, 30% by weight of tetraethylorthosilicate and 15% by weight of water (weight ratio of 4: 2: 1). Carbon nanotubes were added and dispersed in the silica sol in an amount such that the mixing weight ratio of tetraethylorthosilicate: carbon nanotubes was 15: 1, followed by sonication at 40 kHz and 100 Watts for 1 to 2 hours. Next, the precipitate was obtained by centrifugation at 5000 rpm for 100 minutes. The obtained precipitate was washed four times with 15 M of ethanol repeatedly to prepare a silica nanotube treated carbon nanotubes.

 Example 2 Preparation of Carbon-Based Material Treated with Silica

Silica gel was prepared by mixing ethanol: tetraethylorthosilicate in a weight ratio of 20: 1. Carbon nanotubes were added to the silica gel in an amount such that the mixed weight ratio of tetraethylorthosilicate: carbon nanotube was 25: 1, and then dispersed, and sonicated at 40 kHz and 100 Watts for 1 to 2 hours. Next, the precipitate was obtained by centrifugation at 5000 rpm for 100 minutes. The obtained precipitate was washed four times with 15M ethanol repeatedly to prepare a silica nanotube treated carbon nanotubes.

Example 3 Preparation of Silica Surface-treated Carbon-Based Material

Silica sol was prepared by mixing 73% by weight of ethanol, 18% by weight of tetraethylorthosilicate and 9% by weight of water (weight ratio of 8: 2: 1) to prepare a silica sol. Surface-treated carbon nanotubes were prepared.

Example 4 Fabrication of Plasma Display Panel

Dry film resist (DFR) was laminated after sputtering indium tin oxide on a substrate of soda lime glass. The patterned photomask was further laminated on the DFR, and then exposed using a high pressure mercury lamp, developed using Na ₂ CO ₃ 0.4% aqueous alkali solution, dried, and patterned into a transparent electrode shape. After etching using hydrochloric acid and nitric acid, the DFR pattern portion was peeled off using a NaOH 5.0% aqueous solution and then fired to form a transparent electrode. The paste for forming the photosensitive bus electrode containing Ag was apply | coated on the transparent electrode. The applied Ag-containing photosensitive paste was leveled, dried and exposed using a direct imaging (DI) exposure machine. After repeating the drying and exposure processes five times or more, a display electrode including the transparent electrode and the bus electrode was manufactured by developing and baking using an aqueous Na ₂ CO ₃ 0.4% alkali solution to form a bus electrode on a stripe. .

Subsequently, a dielectric paste consisting of 28.4 wt% SiO ₂ , 69.8 wt% PbO, and 1.8 w% B ₂ O ₃ was surface-treated over the entire surface of the substrate on which the display electrode was formed and baked in an oxygen atmosphere to form a first dielectric layer. It was.

Thereafter, the silica surface-treated carbon nanotubes prepared in Example 1 were formed on the first dielectric layer to form an electron amplification layer.

Next, the first substrate was manufactured by depositing a protective film containing MgO by using an ion plating method in a protective film deposition chamber. In the deposition chamber, the basic pressure was 1 × 10 ^-4 Pa, the deposition formation pressure was 5.3 × 10 ^-2 Pa, and the substrate was brought to 200 ± 5 ° C. while supplying oxygen at 100 sccm (flow volume unit). Maintained.

Separately, a second substrate was manufactured by forming a dielectric layer, a partition, and a phosphor layer on a substrate of soda lime glass. The plasma display panel was manufactured by assembling and encapsulating the first substrate together with the previously prepared substrate, exhausting the air in the discharge cell, and then injecting the discharge gas under the condition of 400 Torr.

Comparative Example 1 Manufacture of Plasma Display Panel

A plasma display panel was manufactured in the same manner as in Example 4, except that the electron amplification layer was not formed.

 Comparative Example 2 Manufacture of Plasma Display Panel

Dry film resist (DFR) was laminated after sputtering indium tin oxide on a substrate of soda lime glass. The patterned photomask was further laminated on the DFR, and then exposed using a high pressure mercury lamp, developed using Na ₂ CO ₃ 0.4% aqueous alkali solution, dried, and patterned into a transparent electrode shape. After etching using hydrochloric acid and nitric acid, the DFR pattern portion was peeled off using a NaOH 5.0% aqueous solution and then fired to form a transparent electrode. The paste for forming the photosensitive bus electrode containing Ag was apply | coated on the transparent electrode. The applied Ag-containing photosensitive paste was leveled, dried and exposed using a direct imaging (DI) exposure machine. After repeating the drying and exposure processes five times or more, a display electrode including the transparent electrode and the bus electrode was manufactured by developing and baking using an aqueous Na ₂ CO ₃ 0.4% alkali solution to form a bus electrode on a stripe. .

Subsequently, a dielectric paste consisting of 28.4 wt% SiO ₂ , 69.8 wt% PbO, and 1.8 w% B ₂ O ₃ was surface-treated over the entire surface of the substrate on which the display electrode was formed and baked in an oxygen atmosphere to form a first dielectric layer. It was.

Thereafter, an electron amplification layer-forming composition including 20 wt% of untreated carbon nanotubes on the first dielectric layer was screen printed, and then fired in a nitrogen atmosphere to form an electron amplification layer.

Next, the first substrate was manufactured by depositing a protective film containing MgO by using an ion plating method in a protective film deposition chamber. In the deposition chamber, the basic pressure was 1 × 10 ^-4 Pa, the deposition formation pressure was 5.3 × 10 ^-2 Pa, and the substrate was brought to 200 ± 5 ° C. while supplying oxygen at 100 sccm (flow volume unit). Maintained.

Separately, a second substrate was manufactured by forming a dielectric layer, a partition, and a phosphor layer on a substrate of soda lime glass. The plasma display panel was manufactured by assembling and encapsulating the first substrate together with the previously prepared substrate, exhausting the air in the discharge cell, and then injecting the discharge gas under the condition of 400 Torr.

Scanning electron microscope (SEM) photographs were taken of the silica surface-treated carbon nanotubes prepared in Examples 1 and 3. The results are shown in FIGS. 2 and 3.

FIG. 2 is an SEM photograph of the silica surface-treated carbon nanotubes prepared in Example 1, and FIG. 3 is an SEM photograph of the silica surface-treated carbon nanotubes prepared in Example 3. FIG.

As shown in FIG. 2 and FIG. 3, the thickness of the silica surface treatment layer of Example 1 was about 45 nm, but the thickness of the silica surface treatment layer of Example 3 was 50 nm. This is a difference depending on the concentration of ethanol used in the silica surface treatment on the carbon nanotubes, the higher the concentration of ethanol, the thicker the silica surface treatment layer was found.

The luminance characteristics of the plasma display panels manufactured from Example 4 and Comparative Examples 1 and 2 were evaluated.

Results The plasma display panel of Example 4 including the electron amplification layer of silica surface treated carbon nanotubes showed remarkably superior luminance characteristics as compared to the plasma display panel of Comparative Example 1 containing no electron amplification layer. In addition, the plasma display panel of Example 4 exhibited excellent luminance characteristics compared to the plasma display panel of Comparative Example 2 including the electron amplifying layer of carbon nanotubes. This is because some of the carbon nanotubes included in the electron amplification layer of the plasma display panel of Comparative Example 2 was oxidized during the manufacturing process, it can be seen that the electron emission effect is reduced by that, the luminance characteristics of the plasma display panel is also lowered.

In the flat panel display device according to the present invention, the electron amplification layer can be easily formed without oxidation of a carbonaceous material during the process, and the secondary electron emission coefficient due to the ions inside the flat panel display device is increased, resulting in discharge characteristics and luminance characteristics. Can be significantly improved.

Claims (23)

A first substrate and a second substrate disposed to face each other; Barrier ribs disposed in a space between the first substrate and the second substrate to partition discharge cells; A phosphor layer formed in each discharge cell; Address electrodes formed in one direction on the second substrate; A second dielectric layer formed on the second substrate to cover address electrodes; Display electrodes formed on the first substrate in a direction crossing the address electrodes, and at least one pair of the display electrodes facing each other in the discharge cells; A first dielectric layer covering the display electrodes on the first substrate; An electron amplification layer including a carbon-based material having a silica surface treatment on the first dielectric layer; And And at least one protective film formed on the electron amplification layer and selected from the group consisting of a fluoride film and an oxide film. The method of claim 1, And the electron amplifying layer is formed on the entire surface of the first dielectric layer. The method of claim 1, And the electron amplifying layer is formed corresponding to a region where a display electrode is formed on the first dielectric layer. delete The method of claim 1, The silica surface-treated carbon-based material is arranged toward the discharge cell on the first dielectric layer. delete delete The method of claim 1, The carbonaceous material is selected from the group consisting of carbon nanotubes, graphite nanofibers, carbon nanofibers, carbon nanotips, carbon nanorods, diamonds, and mixtures thereof. delete The method of claim 1, The protective film is a fluoride film selected from the group consisting of MgF ₂ , CaF ₂ , LiF, and mixtures thereof; And at least one layer selected from the group consisting of MgO, Al ₂ O ₃ , ZnO, CaO, SrO, SiO ₂ , La ₂ O ₃ , and mixtures thereof. . The method of claim 1, And the flat panel display is a plasma display panel. delete delete delete delete delete delete delete delete delete delete delete delete

Images