KR100758461B1 - Method for reuse of wastewater in continuous electroplating lines - Google Patents

Method for reuse of wastewater in continuous electroplating lines Download PDF

Info

Publication number
KR100758461B1
KR100758461B1 KR1020010081451A KR20010081451A KR100758461B1 KR 100758461 B1 KR100758461 B1 KR 100758461B1 KR 1020010081451 A KR1020010081451 A KR 1020010081451A KR 20010081451 A KR20010081451 A KR 20010081451A KR 100758461 B1 KR100758461 B1 KR 100758461B1
Authority
KR
South Korea
Prior art keywords
plating
wastewater
water
reverse osmosis
continuous electroplating
Prior art date
Application number
KR1020010081451A
Other languages
Korean (ko)
Other versions
KR20030050911A (en
Inventor
안덕수
Original Assignee
주식회사 포스코
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 포스코 filed Critical 주식회사 포스코
Priority to KR1020010081451A priority Critical patent/KR100758461B1/en
Publication of KR20030050911A publication Critical patent/KR20030050911A/en
Application granted granted Critical
Publication of KR100758461B1 publication Critical patent/KR100758461B1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00Multistage treatment of water, waste water or sewage
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/16Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes

Abstract

본 발명은 가용성양극을 갖는 연속전기도금공정에서 발생되는 전기도금폐수 재활용방법에 관한 것으로,The present invention relates to an electroplating wastewater recycling method generated in a continuous electroplating process having a soluble anode,

연속전기도금공정중 발생되는 2차 폐수세액을 역삼투압필터로 농축하여 여과수는 공업용수로 재활용하고, 농축액은 도금폐수와 함께 반응조로 이송시킨 후, 알칼리염으로 중화처리한 다음 여과하여 금속수산화물의 슬러리를 제거하고 도금액순환조로 이송시켜 도금폐수중에 존재하는 유가의 전도보조재 및 첨가제를 도금공정에 재활용하는 전기도금폐수 재활용방법이 제공된다.Concentrate the secondary wastewater generated during the continuous electroplating process with a reverse osmosis filter, recycle the filtered water to industrial water, transfer the concentrate with the plating wastewater to the reaction tank, neutralize with alkali salts, and filter the metal hydroxide. An electroplating wastewater recycling method is provided in which a slurry is removed and transferred to a plating solution circulation tank to recycle conductive additives and additives of oil value present in the plating wastewater to a plating process.

본 발명에 따라, 가용성양극을 갖는 연속전기도금공정에서 발생되는 전기도금폐수를 역삼투압필터에 통과시키고 여과수는 재활용수로 사용하고, 농축액은 계속하여 중화처리 및 슬러리를 제거함으로써 도금폐수중에 함유되어 있는 전도보조재 및 첨가제 성분을 회수하여 도금공정에 재활용할 수 있다.
According to the present invention, the electroplating wastewater generated in the continuous electroplating process having a soluble anode is passed through the reverse osmosis filter, the filtered water is used as recycled water, and the concentrate is continuously contained in the plating wastewater by neutralization treatment and removing the slurry. Conductive aids and additives can be recovered and recycled into the plating process.

도금폐수, 재활용, 연속전기도금, 가용성양극, 역삼투압필터Plating wastewater, recycling, continuous electroplating, fusible anode, reverse osmosis filter

Description

가용성양극을 갖는 연속전기도금공정에서 발생되는 전기도금폐수 재활용방법{METHOD FOR REUSE OF WASTEWATER IN CONTINUOUS ELECTROPLATING LINES}Recycling method for electroplating wastewater generated in continuous electroplating process with soluble anodes {METHOD FOR REUSE OF WASTEWATER IN CONTINUOUS ELECTROPLATING LINES}

도 1은 본 발명의 도금폐수 재활용 공정을 도시한 흐름도이다.1 is a flowchart showing a plating wastewater recycling process of the present invention.

본 발명은 전기도금폐수 재활용방법에 관한 것으로, 보다 상세하게는 가용성양극을 갖는 연속전기도금공정에서 발생되는 전기도금폐수를 역삼투압필터에 통과시켜 얻은 여과수는 재활용수로 사용하고, 농축액은 중화처리 및 슬러리를 제거함으로써 도금폐수중에 함유되어 있는 전도보조재 및 첨가제 성분을 재활용하는 방법에 관한 것이다.The present invention relates to an electroplating wastewater recycling method, and more particularly, the filtered water obtained by passing the electroplating wastewater generated in a continuous electroplating process having a soluble anode through a reverse osmosis filter is used as recycled water, and the concentrate is neutralized. And it relates to a method for recycling the conductive auxiliary and additive components contained in the plating waste water by removing the slurry.

가용성양극을 갖는 연속전기도금공정은 아연도금, 아연-철, 아연-니켈 및 아연-코발트 등의 아연계의 합금도금공정 및 주석도금공정이 있다. 이러한 연속전기도금공정의 도금폐수는 도금과정에서 폐기하는 도금액이나 스트립의 수세과정에서 스트립에 묻어있던 도금액에 의해 오염된다. 그러므로 이들의 도금폐수액에는 금속이온, 전도보조재 및 도금첨가제 등이 함유되어 있다. 특히, 이들 도금액은 산성도금욕이기때문에 도금작업중에 음극에 환원되는 금속이온보다 양극에서 용해되는 금 속이온양이 더 많다. 그 이유는 양극에서는 전기적 반응에 의해 금속이 용해되지만 수소이온에 의한 치환반응으로 금속이 용해되면서 소소가스가 발생되고, 음극에서는 금속이온의 환원반응외에 수소이온의 환원반응이 일어나기때문에 음극에서 금속이온의 환원량과 양극에서 산화량의 차이가 발생하고 그 차이가 스트립에 묻어서 밖으로 배출되는 금속량보다 더 많기때문이다. 그러므로, 정상적인 도금작업을 하기위해서는 도금액의 일부를 계속 폐기해야할 필요가 있다. 도금액을 폐기하게되면, 그 안에 존재하는 전도보조재의 염이나 첨가제도 함께 폐기된다. 전도보조재로서 염화물계 산성 도금액내에는 염화칼륨, 황산계 도금액에서는 황산나트륨염이 사용되고있다. 그리고, 첨가제는 아연 및 아연계 합금의 경우에는 PEG(폴리에틸렌 글리콜), 주석도금액의 경우에는 PSA(페놀술폰산) 또는 MSA(메탄술폰산) 등이 사용되고 있다. 특히, 연속전기도금공정에서 도금액이 스트립에 묻어서 도금셀 밖으로 유출되기때문에 수세를 실시하고 있다. 수세공정은 주로 pH 0.5-1.5의 산성용액을 이용한 1차수세와 탈이온수를 이용한 2차수세로 이루어진다. 1차수세의 폐수액에는 보통 3,000~10,000ppm, 2차수세의 폐수액에는 100~500ppm 정도의 도금용 금속이온이 함유되어 있다.Continuous electroplating processes having a soluble anode include zinc-based alloy plating processes such as zinc plating, zinc-iron, zinc-nickel and zinc-cobalt, and tin plating processes. The plating wastewater of the continuous electroplating process is contaminated by the plating liquid disposed in the plating process or the plating liquid deposited on the strip during the washing of the strip. Therefore, these plating waste liquors contain metal ions, conductive aids and plating additives. In particular, since these plating solutions are acidic plating baths, the amount of metal ions dissolved in the positive electrode is greater than that of metal ions reduced in the negative electrode during plating. The reason is that the metal is dissolved by the electrical reaction at the anode, but the gas is generated as the metal is dissolved by the substitution reaction with hydrogen ions, and the reduction of the hydrogen ions is performed in addition to the reduction of the metal ions at the cathode. This is because there is a difference between the amount of reduction and the amount of oxidation at the anode and the difference is more than the amount of metal that is buried out of the strip. Therefore, in order to perform the normal plating operation, it is necessary to continuously discard a part of the plating liquid. When the plating liquid is discarded, the salts or additives of the conductive auxiliary material present therein are also discarded. Potassium chloride is used in the chloride-based acidic plating solution and sodium sulfate is used in the sulfuric acid-based plating solution as a conductive auxiliary material. As the additive, PEG (polyethylene glycol) in the case of zinc and zinc-based alloys, PSA (phenol sulfonic acid) or MSA (methanesulfonic acid) in the case of tin plating solution are used. In particular, in the continuous electroplating process, the plating liquid is buried in the strip and flows out of the plating cell. The washing process mainly consists of the first washing with acidic solution of pH 0.5-1.5 and the second washing with deionized water. The wastewater from the first wash usually contains 3,000 ~ 10,000ppm, and the wastewater from the second wash contains about 100 ~ 500ppm metal ions for plating.

일반적으로, 연속전기도금공정의 도금폐수처리는 중화처리에 의해 금속이온을 금속수산물의 슬러리로 만들어 필터로 분리하여 제거하고, 첨가제들은 활성탄에 의한 흡착제거되거나 또는 산화제를 첨가하여 유기물을 분해하여 제거하고, 전도보조염의 이온들은 배출물에 함유된 상태로 밖으로 배출된다. 이 경우에 전도보조재와 첨가제는 재활용되지 못하고 폐기된다. In general, the plating wastewater treatment of the continuous electroplating process removes metal ions into a slurry of metal aquatic products by neutralization and separates them with a filter, and the additives are removed by adsorption by activated carbon or by decomposing organic matter by adding an oxidizing agent. In addition, the ions of the conductive auxiliary salt are discharged out of the state contained in the discharge. In this case, the conductive additives and additives are not recycled and disposed of.                         

한편, 대한민국 특허출원 99-32745에는 도금폐수를 전기투석장치와 증발농축기를 사용하여 처리수와 농축액으로 분리한 후, 농축액은 도금액으로 전환하여 사용하고 처리수는 공업용수로 재활용하는 방법이 개시되어 있다. 그러나, 이 방법은 불용성 양극을 갖는 도금공정에는 적용가능하지만, 가용성 양극을 갖는 도금공정에는 적용하기에 적합하지 못하다. 그 이유는 가용성 양극을 갖는 도금공정에서는 도금용 금속이온의 농도가 더 증가하므로, 더 많은 양의 도금액을 폐기해야만 하고, 이 과정에서 전도보조염이나 첨가제가 함께 폐기될 수 밖에 없기때문이다.
Meanwhile, Korean Patent Application No. 99-32745 discloses a method of separating plating wastewater into treated water and concentrate using an electrodialysis apparatus and an evaporative concentrator, converting the concentrate into a plating solution, and recycling the treated water into industrial water. have. However, this method is applicable to plating processes with insoluble anodes, but is not suitable for application to plating processes with soluble anodes. The reason for this is that in the plating process having a soluble anode, the concentration of metal ions for plating is increased, and therefore, a larger amount of plating liquid must be discarded, and conductive auxiliary salts or additives must be disposed of in this process.

이에 본 발명의 목적은 가용성양극을 갖는 연속전기도금공정에서 발생되는 전기도금폐수를 재활용하는 방법을 제공하고자 한다.Accordingly, an object of the present invention is to provide a method for recycling electroplating wastewater generated in a continuous electroplating process having a soluble anode.

본 발명의 일견지에 의하면,According to one aspect of the invention,

가용성양극을 가지며 1차수세 및 2차수세를 거치는 연속전기도금공정중 발생되는 2차 폐수세액을 역삼투압필터로 농축하여 여과수와 농축액으로 분리하는 단계;Separating the secondary waste washing liquid generated during the continuous electroplating process having a soluble anode and undergoing primary and secondary washing with a reverse osmosis filter to be separated into filtrate and concentrate;

상기 여과수를 공업용수로 재활용하는 단계; 및Recycling the filtered water into industrial water; And

상기 농축액을 상기 연속전기도금공정중 발생되는 1차 폐수세액을 포함하는 폐수세액과 함께 반응조로 이송시킨 후, 알칼리염으로 중화처리한 다음 여과하여 금속수산화물의 슬러리를 제거하고 여과수는 도금액순환조로 이송시켜 도금폐수중 에 존재하는 유가의 전도보조재 및 첨가제를 도금공정에 재활용하는 단계;The concentrate is transferred to a reaction tank together with a waste washing solution containing a primary waste washing solution generated during the continuous electroplating process, neutralized with alkali salts and filtered to remove slurry of the metal hydroxide, and the filtered water is transferred to a plating solution circulation tank. Recycling the conductive additives and additives of oil value present in the plating wastewater to the plating process;

를 포함하여 이루어진 전기도금폐수 재활용방법이 제공된다.
Provided is an electroplating wastewater recycling method comprising a.

이하, 본 발명에 대하여 상세히 설명한다.
EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.

본 발명은 가용성양극을 갖는 연속전기도금공정에서 발생되는 폐수중 2차 폐수세액을 역삼투압필터로 농축하여 여과수는 재활용수로 사용하고, 농축액은 1차 폐수세액을 포함하는 도금폐수와 함께 반응조로 이송시켜 알칼리염을 투입하여 중성으로 중화처리하고 필터에 의해 금속수산화물의 슬러리를 제거하고 여과수는 도금액순환조로 이송하여 도금폐수중에 존재하는 유가의 전도보조재 및 첨가제를 재사용하는 것을 특징으로 한다. The present invention concentrates the secondary wastewater in the wastewater generated in the continuous electroplating process having a soluble anode with a reverse osmosis filter to use the filtered water as recycled water, and the concentrated solution into the reaction tank together with the plating wastewater containing the primary wastewater. Neutralization treatment is carried out by adding alkali salts to neutralization, and the slurry of metal hydroxide is removed by a filter, and the filtered water is transferred to a plating solution circulating tank to reuse conductive additives and additives present in the plating wastewater.

이러한 본 발명의 전기도금폐수 재활용공정을 도 1에 나타내었다.The electroplating wastewater recycling process of this invention is shown in FIG.

본 발명의 전기도금폐수 재활용공정에 따라 먼저, 가용성양극을 갖는 연속전기도금공정에서 발생되는 2차 폐수세액을 역삼투압필터로 농축하여 여과수와 농축액으로 분리한다. According to the electroplating wastewater recycling process of the present invention, first, the secondary wastewater washing liquid generated in the continuous electroplating process having a soluble anode is concentrated with a reverse osmosis filter and separated into filtered water and a concentrate.

일반적으로 가용성양극을 갖는 연속전기도금공정은 1차 수세 및 2차 수세를 거치게 되며, 그중 일반적으로 2차 수세를 거친 2차 폐수세액내에는 100~500ppm의 금속 이온들이 존재한다. 만일, 이러한 2차 폐수세액을 역삼투압필터에 통과시켜 10배로 농축시킬 경우, 농축수는 처음 용량의 1/10이 되고 그 안에 존재하는 금속이온의 농도는 10배로 증가하게 된다. 그리고, 투과된 여과수의 양은 처음 용량의 9/10으로 감소되며, 금속이온의 농도는 10ppm이하로 감소된다. 따라서, 역삼투압필터에 통과시킨 2차 폐수세액의 여과수는 다시 1차 수세액으로 사용되거나 또는 도금과정의 롤세척액 등의 용도로 사용될 수 있다. 바람직하게 투과된 여과수는 100ppm이하의 금속이온 농도를 갖는다. 이때, 농축시 역삼투압필터를 사용하는 이유는 금속이온 및 유기첨가제가 이온막을 통과하면 쉽게 농축될 수 있으며 경제적으로 비용이 저가이기때문이다. 상기 2차 폐수세액의 농축은 바람직하게, 8-12배, 보다 바람직하게는 9-11배 그리고 가장 바람직하게는 10배로 농축된다. 만일, 농축이 너무 과도하게 이루어지는 경우, 역삼투압필터의 이온막에 금속염이 농축되어 투과효율이 저하되고 투과수중에 금속이온의 농도가 증가되어 투과된 여과수의 수질이 재활용되기에 적절치 못하게 저하되며, 농축이 너무 적게 이루어지는 경우에는 경제적으로 비효율적이다. In general, a continuous electroplating process having a soluble anode undergoes a first washing and a second washing, among which 100 to 500 ppm of metal ions are present in the second washing liquid. If the secondary waste water is concentrated through a reverse osmosis filter 10 times, the concentrated water becomes 1/10 of the initial capacity and the concentration of metal ions present in the water increases by 10 times. And, the amount of permeate filtered water is reduced to 9/10 of the initial capacity, and the concentration of metal ions is reduced to 10 ppm or less. Therefore, the filtered water of the secondary wastewater passed through the reverse osmosis filter may be used again as the first wash, or may be used as a roll washing solution during the plating process. Preferably the permeate filtered water has a metal ion concentration of 100 ppm or less. In this case, the reason why the reverse osmosis filter is used at the time of concentration is that the metal ions and the organic additives can easily be concentrated when passing through the ion membrane and are economically inexpensive. The concentration of the secondary waste washings is preferably concentrated 8-12 times, more preferably 9-11 times and most preferably 10 times. If the concentration is excessively excessive, the metal salt is concentrated in the ion membrane of the reverse osmosis filter, thereby decreasing the permeation efficiency and increasing the concentration of metal ions in the permeated water, thereby improperly reducing the water quality of the filtered filtrate. Too little concentration is economically inefficient.

상기한 바와 같이, 역삼투압필터를 통과한 여과수는 1차 수세액으로 사용되거나 또는 도금과정의 롤세척액 등에 사용되는 공정의 공업용수로 재활용될 수 있다.
As described above, the filtered water passed through the reverse osmosis filter may be used as the first washing liquid or may be recycled as industrial water of the process used for the roll washing liquid of the plating process.

한편, 2차 폐수세액을 역삼투압필터로 농축하여 얻은 농축액은 도 1에 나타낸 바와 같이, 1차 폐수세액을 포함하는 다른 폐도금액에 합류되어 반응조로 이송된 다. 그 후, 상기 반응조에 알칼리염을 투입하여 중성으로 중화처리하고 이를 다시 여과하여 금속 수산화물의 슬러리를 제거한다. 이때 중화처리는 pH 6-8, 바람직하게는 6.5-6.5범위로 한다. 그 다음, 상기 여과수를 도금액순환조로 직접 이송하 거나 또는 진공증발기로 이송하여 다시 농축한 다음 도금액순환조로 이송된다. 이렇게 하여 얻어진 여과수는 금속수산화물의 슬러리가 제거된 중성상태이며 또한 유가성분의 전도보조재 및 기타 첨가제를 함유하고 있어 도금공정에 재활용될 수 있다. 상기 여과수는 도 1에 나타낸 바와 같이 도금공정에 걸쳐 반복적으로 순환될 수 있다.
On the other hand, the concentrated liquid obtained by concentrating the secondary waste washings with a reverse osmosis filter, as shown in Figure 1, is joined to the other waste plating liquid containing the primary waste washings are transferred to the reaction tank. Thereafter, an alkali salt is added to the reaction tank to neutralize the solution, followed by filtration to remove the slurry of the metal hydroxide. At this time, the neutralization treatment is in the range of pH 6-8, preferably 6.5-6.5. Then, the filtered water is transferred directly to the plating solution circulation tank or concentrated by transfer to a vacuum evaporator and then to the plating solution circulation tank. The filtrate thus obtained is in a neutral state in which the slurry of the metal hydroxide is removed and contains valuable conductive additives and other additives and can be recycled in the plating process. The filtered water may be repeatedly circulated throughout the plating process as shown in FIG.

이하, 실시예를 통하여 본 발명을 보다 상세히 설명한다.
Hereinafter, the present invention will be described in more detail with reference to Examples.

실시예Example

실시예Example

표 1에 나타낸 바와 같이, 하기 3가지 도금계의 도금액을 이용하며 가용성양극을 갖는 연속전기도금공정에서 발생되는 2차 폐수세액을 본 발명의 공정에 따라 처리하고 각 성분의 농도를 측정하였다.As shown in Table 1, the secondary waste washing liquid generated in the continuous electroplating process having the soluble anode using the plating solution of the following three plating systems was treated according to the process of the present invention and the concentration of each component was measured.

각 도금계의 도금액 성분의 농도를 측정하고, 각 공정에서 배출된 2차 폐수세액을 10㎥/시간의 공급속도로 역삼투압 필터(Dow Chemical Co.에서 제조된 BW30-8040 멤브레인을 사용하여 자체제작된 역삼투압 필터)에 투과시켜 10배로 농축시키고, 투과된 여과수내 각 성분의 농도를 측정하여 비교하였다.The concentration of the plating liquid component of each plating system was measured, and the second waste water discharged from each process was self-manufactured using a reverse osmosis filter (BW30-8040 membrane manufactured by Dow Chemical Co.) at a feed rate of 10 m 3 / hour. Permeate through the reverse osmosis filter), and concentrated 10 times, and compared the concentration of each component in the filtered filtrate.

그리고, 상기 역삼투압 필터로 처리하여 얻은 10배수의 농축액은 반응조에서 알칼리염을 투입하여 중화처리하였다. 이때, 알칼리염은 아연 및 아연-철 도금계인 경우 수산화 칼륨을 이용하였으며, 주석 도금계인 경우에는 수산화 나트륨을 사용 하였으며 그리고, 이때 pH는 6.5-7.5범위로 조절하였다. 그 다음, 상기 중화처리된 반응물을 가압식 여과기(1 마이크론미터 이상을 여과할 수 있는 페놀수지의 여과포로 자체제작된 가압식 여과기)에 통과시켜 여과하여 금속수산화물의 슬러리를 제거하였다. The concentrated solution of 10-fold water obtained by treatment with the reverse osmosis filter was neutralized by adding an alkali salt in a reaction tank. At this time, the alkali salt was used potassium hydroxide in the case of zinc and zinc-iron plating system, sodium hydroxide in the case of tin plating system, and the pH was adjusted to 6.5-7.5 range. The neutralized reactant was then filtered through a pressurized filter (a pressurized filter self-made with a filter cloth of phenol resin capable of filtering 1 micron or more) to remove slurry of metal hydroxide.

그 결과물의 각 성분의 농도를 측정하여 처리하기전과 비교하였다. 각 측정결과를 하기 표 1에 나타내었다. 그리고 여과액을 아연, 아연-철 및 주석 도금액의 폐수에 대하여서는 각각 5배, 10배, 및 10배로 증발농축하여 도금액으로 사용하였다.
The concentration of each component of the resultant was measured and compared with before treatment. Each measurement result is shown in Table 1 below. The filtrate was evaporated and concentrated 5 times, 10 times, and 10 times with respect to the wastewater of the zinc, zinc-iron, and tin plating solutions, respectively, to be used as the plating solution.

도금계  Plating system 도금액 농도(ppm)  Plating solution concentration (ppm) 2차 폐수세액의 역삼투압 필터 처리전 및 처리후, 여과수의 농도(ppm)The concentration of filtrate (ppm) before and after the reverse osmosis filter treatment of the secondary wastewater 2차 폐수액을 역삼투압필터 처리하여 얻은 농축액의 중화처리 및 슬러리 제거처리전 및 처리후의 농도(ppm)Concentration before and after neutralization and slurry removal treatment of the concentrate obtained by the reverse osmosis filter treatment of the secondary wastewater (ppm) 처리전Before treatment 처리후After treatment 처리전Before treatment 처리후After treatment 아연zinc ZnCl2 ZnCl 2 15,00015,000 200200 55 6,0006,000 2020 KClKCl 30,00030,000 350350 33 7,5007,500 7,4007,400 PEGPEG 100100 1212 1One 4545 4242 아연-철Zinc-iron ZnCl2 ZnCl 2 15,00015,000 180180 1616 1,4001,400 1212 FeCl2 FeCl 2 2,0002,000 8080 88 600600 77 KClKCl 30,00030,000 330330 3232 3,0003,000 2,8002,800 PEGPEG 300300 4343 44 180180 175175 주석Remark SnCl2 SnCl 2 40,00040,000 260260 3030 2,5002,500 88 Na2SO4 Na 2 SO 4 50,00050,000 330330 3232 3,1003,100 3,0503,050 PSAPSA 200200 4141 33 3434 3131

상기 표 1에 나타낸 바와 같이, 본 발명에 따라 연속전기도금공정에서 발생되는 2차 폐수세액을 처리한 경우, 역삼투압필터에 의해 여과된 여과수는 금속이온 이 100ppm이하로 감소하여 도금공정의 공업용수로 재활용가능하며 또한, 역삼투압필터처리하여 얻어진 농축액을 중화처리 및 슬러리 제거처리시 전도보조재(KCl 및 Na2SO4) 및 첨가제(PEG 및 PSA)는 대부분 회수되어 모두 재활용할 수 있음을 확인하였다.
As shown in Table 1, when the secondary wastewater generated in the continuous electroplating process according to the present invention, the filtered water filtered by the reverse osmosis filter is reduced to less than 100ppm metal ion industrial water of the plating process In addition, the neutralization and slurry removal treatment of the concentrate obtained by reverse osmosis filter treatment was carried out, and most of the conduction aids (KCl and Na 2 SO 4 ) and additives (PEG and PSA) were recovered and recycled. .

본 발명의 방법은 전기도금폐수를 역삼투압필터에 통과시킴으로써 여과수는 재활용수로 사용하고, 농축액은 계속하여 중화처리 및 슬러리를 제거함으로써 도금폐수중에 함유되어 있는 전도보조재 및 첨가제 성분을 회수하여 도금공정에 재활용할 수 있다.In the method of the present invention, the electroplating wastewater is passed through a reverse osmosis filter, and the filtered water is used as recycled water. Can be recycled.

Claims (3)

가용성양극을 가지며 1차수세 및 2차수세를 거치는 연속전기도금공정중 발생되는 2차 폐수세액을 역삼투압필터로 농축하여 여과수와 농축액으로 분리하는 단계;Separating the secondary waste washing liquid generated during the continuous electroplating process having a soluble anode and undergoing primary and secondary washing with a reverse osmosis filter to be separated into filtrate and concentrate; 상기 여과수를 공업용수로 재활용하는 단계; 및Recycling the filtered water into industrial water; And 상기 농축액을 상기 연속전기도금공정중 발생된 1차 폐수세액을 포함하는 도금폐수와 함께 반응조로 이송시킨 후, 알칼리염으로 중화처리한 다음 여과하여 금속수산화물의 슬러리를 제거하고 여과수는 도금액순환조로 이송시켜 도금폐수중에 존재하는 유가의 전도보조재 및 첨가제를 도금공정에 재활용하는 단계;The concentrate is transferred to a reaction vessel together with the plating wastewater containing the primary wastewater generated during the continuous electroplating process, neutralized with alkali salts and filtered to remove slurry of the metal hydroxide, and the filtered water is transferred to a plating solution circulation tank. Recycling the conductive additives and additives of oil value present in the plating waste water in the plating process; 를 포함하여 이루어진 전기도금폐수 재활용방법.Electroplating wastewater recycling method comprising a. 제 1항에 있어서, 상기 첫번째 단계에서 상기 여과수는 금속이온농도 100ppm이하임을 특징으로 하는 방법.The method of claim 1, wherein the filtered water in the first step is characterized in that the metal ion concentration of 100ppm or less. 제 1항에 있어서, 상기 세번째 단계에서 여과수를 도금액순환조로 이송시킬때 진공 증발기를 이용하여 농축시킨후 도금액순환조로 이송시킴을 특징으로 하는 방법.The method of claim 1, wherein in the third step, the filtrate is concentrated by using a vacuum evaporator and then transferred to the plating solution circulation tank.
KR1020010081451A 2001-12-19 2001-12-19 Method for reuse of wastewater in continuous electroplating lines KR100758461B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020010081451A KR100758461B1 (en) 2001-12-19 2001-12-19 Method for reuse of wastewater in continuous electroplating lines

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020010081451A KR100758461B1 (en) 2001-12-19 2001-12-19 Method for reuse of wastewater in continuous electroplating lines

Publications (2)

Publication Number Publication Date
KR20030050911A KR20030050911A (en) 2003-06-25
KR100758461B1 true KR100758461B1 (en) 2007-09-14

Family

ID=29576594

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010081451A KR100758461B1 (en) 2001-12-19 2001-12-19 Method for reuse of wastewater in continuous electroplating lines

Country Status (1)

Country Link
KR (1) KR100758461B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101492212A (en) * 2008-11-25 2009-07-29 林挺 Environment friendly electroplating waste processing equipment
CN105800848A (en) * 2015-01-21 2016-07-27 天津海鑫鸿达科技有限公司 Comprehensive utilization method for chemical nickel-plating concentrated liquid wastewater

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100753977B1 (en) * 2006-06-21 2007-08-31 동양기전 주식회사 Apparatus for recycling plating solution
KR100799277B1 (en) * 2006-12-27 2008-01-30 삼원금속 주식회사 Plating solution recycle method
KR101434417B1 (en) * 2014-04-25 2014-08-26 주식회사 엘에이치이노베이션 Treatment method of wastewater from gilding process for reuse
CN104692560B (en) * 2015-03-03 2016-07-06 石泰山 A kind of processing method containing phosphor/phosphine electroplating wastewater
CN106277427B (en) * 2016-04-28 2019-02-01 南京霖厚环保科技有限公司 Electroplating comprehensive waste water Intelligent processing device and its control method
CN110937656A (en) * 2019-10-17 2020-03-31 珠海市江河海水处理科技股份有限公司 Full-automatic electroplating nickel wastewater zero-discharge equipment and operation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0739874A (en) * 1993-05-26 1995-02-10 Sumitomo Chem Co Ltd Method for concentrating waste liquid containing photoresist
US5783057A (en) * 1996-09-19 1998-07-21 Nippon Mining & Metals Co., Ltd. Method of purifying copper electrolytic solution
KR20000000456A (en) * 1999-10-25 2000-01-15 지은상 System of treated for industrial wastewater
JP2000070933A (en) * 1998-08-27 2000-03-07 Kurita Water Ind Ltd Production of pure water

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0739874A (en) * 1993-05-26 1995-02-10 Sumitomo Chem Co Ltd Method for concentrating waste liquid containing photoresist
US5783057A (en) * 1996-09-19 1998-07-21 Nippon Mining & Metals Co., Ltd. Method of purifying copper electrolytic solution
JP2000070933A (en) * 1998-08-27 2000-03-07 Kurita Water Ind Ltd Production of pure water
KR20000000456A (en) * 1999-10-25 2000-01-15 지은상 System of treated for industrial wastewater

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101492212A (en) * 2008-11-25 2009-07-29 林挺 Environment friendly electroplating waste processing equipment
CN105800848A (en) * 2015-01-21 2016-07-27 天津海鑫鸿达科技有限公司 Comprehensive utilization method for chemical nickel-plating concentrated liquid wastewater

Also Published As

Publication number Publication date
KR20030050911A (en) 2003-06-25

Similar Documents

Publication Publication Date Title
US4652352A (en) Process and apparatus for recovering metals from dilute solutions
EP0246070B1 (en) Process and apparatus for recovery of precious metal compound
US3470044A (en) Electrolytic regeneration of spent ammonium persulfate etchants
EP0251691B1 (en) Effluent treatment
JPS60106583A (en) Method of treating aqueous flow containing precipitable material and acid and/or base
US5091070A (en) Method of continuously removing and obtaining ethylene diamine tetracetic acid (edta) from the process water of electroless copper plating
US5804057A (en) Method of removing metal salts from solution by electrolysis an electrode closely associated with an ion exchange resin
JP4579682B2 (en) Method and apparatus for recycling metal pickling baths
KR100758461B1 (en) Method for reuse of wastewater in continuous electroplating lines
US4954230A (en) Decontamination of waste water
US4943360A (en) Process for recovering nitric acid and hydrofluoric acid from waste pickle liquors
EP0149917A2 (en) Electrodialytic conversion of multivalent metal salts
US5324403A (en) Process for salt extraction from hydrogen-sulphide scrubber solution using electrodialysis
US3806436A (en) Concentration of electrolyte from dilute washings
US4439293A (en) Electrodialytic purification process
US4325792A (en) Purification process
US10329160B2 (en) Methods and equipment to make lithium hydroxide monohydrate from lithium salts
FI76839B (en) FOERFARANDE FOER BEHANDLING MEDELST ELEKTRO-ELEKTRODIALYS AV EN VATTENHALTIG LOESNING INNEHAOLLANDE RIKLIGT AV ETT SALT AV DEN METALL SOM SKALL UTVINNAS, FOERETRAEDESVIS ZINK.
US20070256940A1 (en) Device and Method for Removing Foreign Matter from Process Solutions
US5244551A (en) Process of regenerating waste pickle which contains metal salts and acids
JP2711241B2 (en) Acid waste liquid regeneration method
EP0728863B1 (en) A process for treating liquids in pulp manufacturing
US5792315A (en) Purifying aqueous effluent from a pulp mill using electro chemical membrane device
US6984300B2 (en) Method for recovering useful components from electrolytic phosphate chemical treatment bath
KR100395114B1 (en) A reusing method of waste sulfuric acid solution as pickling solution and ferrous sulfate coagulant

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120903

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20130909

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20150907

Year of fee payment: 9

FPAY Annual fee payment

Payment date: 20160907

Year of fee payment: 10

FPAY Annual fee payment

Payment date: 20170906

Year of fee payment: 11

FPAY Annual fee payment

Payment date: 20180905

Year of fee payment: 12