KR100752144B1 - Method of manufacture for photoluminscent porcelain enamel signboard - Google Patents
Method of manufacture for photoluminscent porcelain enamel signboard Download PDFInfo
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- KR100752144B1 KR100752144B1 KR1020060129135A KR20060129135A KR100752144B1 KR 100752144 B1 KR100752144 B1 KR 100752144B1 KR 1020060129135 A KR1020060129135 A KR 1020060129135A KR 20060129135 A KR20060129135 A KR 20060129135A KR 100752144 B1 KR100752144 B1 KR 100752144B1
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F13/00—Illuminated signs; Luminous advertising
- G09F13/20—Illuminated signs; Luminous advertising with luminescent surfaces or parts
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/22—Luminous paints
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/06—Coating on selected surface areas, e.g. using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F19/00—Advertising or display means not otherwise provided for
- G09F19/22—Advertising or display means on roads, walls or similar surfaces, e.g. illuminated
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Abstract
Description
도 1은 본 발명에 따라 제조된 축광법랑 표지판의 단면도.1 is a cross-sectional view of a photoluminescent enamel sign manufactured according to the present invention.
도 2는 본 발명에 따른 축광법랑 표지판의 제조방법 1을 나타내는 순서도.Figure 2 is a flow chart showing a method 1 of manufacturing a photoluminescent enamel sign according to the present invention.
도 3은 본 발명에 따른 축광법랑 표지판의 제조방법 2를 나타내는 순서도.Figure 3 is a flow chart showing a method 2 of manufacturing a photoluminescent enamel sign according to the present invention.
< 도면의 주요부분에 대한 부호의 설명 ><Description of Symbols for Major Parts of Drawings>
10 : 판재10: plate
20 : 하유법랑층 30 : 상유법랑층20: Lower enamel layer 30: Upper enamel layer
40 : 축광법랑층 50 : 비축광문양층 40: photoluminescent enamel layer 50: non-luminescent glyph layer
본 발명은 축광법랑 표지판의 제조방법에 관한 것으로서, 보다 상세하게는 본 출원인의 선등록 고안인 실용신안등록 제0319954호를 더욱 개량하여, 바탕면은 축광성 법랑으로, 문양면은 비축광성 법랑으로 형성된 축광법랑 표지판의 제조방법 에 관한 것이다.The present invention relates to a method of manufacturing a photoluminescent enamel sign, and more particularly, to further improve the utility model registration No. 0319954, which is the applicant's pre-registered design, the base surface is a photoluminescent enamel, the pattern surface is a non-luminescent enamel It relates to a method of manufacturing the formed photoluminescent enamel signs.
법랑은 무기 유리질을 강판 혹은 금속판 위에 도포 후 소성시켜 제작되므로, 내구성, 내화성 및 내열성이 우수하며, 미관이 수려하고 청결하여 일반적으로 주방용구나 시험용기로 두루 사용되지만, 법랑의 이러한 장점과 특히 자외선에 강한 특성은 일반적 표지판의 소재로 적합하다. 그러나 야간이나 어두운 상황에서 별도의 조명시설을 구비하여야 하는 문제점이 있다. 또한, 소방시설물, 안전수칙 안내판 또는 안전사고 예방을 위한 경계 표지판과 각종 유도표지판은 축광의 특성을 갖는 표면에 비축광성 문양을 넣어 대비되도록 하여 어두운 환경에서도 시인성이 좋게 만들어야 하지만, 상기의 일반적 표지판으로는 많은 장점에서도 불구하고 사용할 수 없다는 문제점이 있다. 특히, 소방시설물에서는 전기가 끊긴 상황에서도 정해진 시간 동안은 유도시설물이 그 기능을 수행할 수 있어야하므로, 축광의 성능이 필히 요구된다.Since the enamel is made by applying inorganic glass on a steel plate or metal plate and baking it, it has excellent durability, fire resistance, and heat resistance, and is beautiful and clean, so it is generally used as a kitchen or test container. Strong characteristics make it a suitable material for general signs. However, there is a problem that a separate lighting facility should be provided at night or in a dark situation. In addition, fire protection facilities, safety information signs or warning signs for the prevention of safety accidents and various induction signs should be prepared by putting a non-luminescent pattern on the surface having the characteristics of the photoluminescent property so that they can be easily seen even in a dark environment. Is not available despite its many advantages. In particular, in a firefighting facility, the induction facility must be able to perform its function for a predetermined time even in the event of a power failure, so the performance of the photoluminescence is required.
따라서, 상기와 같은 문제점을 해결하고자 본 출원인은 실용신안등록 제0319954호를 이미 출원한 바 있다. 상기의 실용신안의 내용은 법랑용유약과 축광안료를 혼합하여 축광성유약을 조성하고, 법랑 처리된 판재 표면에 상기 축광성유약으로 문양를 표현한 후 소성하여 형성된 축광법랑 표지판과; 법랑 처리된 판재 표면을 상기 축광성유약으로 도포하고, 비축광성 유약으로 문양를 표현한 후 소성하여 형성된 축광법랑 표지판에 관한 것이나, 제조방법이 구체적이고 체계적이지 못 한 한계가 있었다.Therefore, in order to solve the above problems, the applicant has already applied for utility model registration No. 0319954. The contents of the utility model includes a photoluminescent enamel sign formed by mixing the enamel glaze and the photoluminescent pigment to form a photoluminescent glaze, and expressing a pattern with the photoluminescent glaze on the surface of the enameled plate; The surface of the enameled sheet was coated with the photoluminescent glaze, and the pattern of the photoluminescent glaze was expressed and then fired, but there was a limitation that the manufacturing method was not specific and systematic.
이에 본 발명에서는 본 출원인이 기 출원한 실용신안등록 제0319954호를 더욱 개량하여, 축광성 바탕면 위에 비축광성 문양이 조성된 축광법랑 표지판의 더욱 구체적이고 체계화된 제조방법을 제공하고자 한다.Accordingly, the present invention is to further improve the utility model registration No. 0319954 filed by the present applicant, to provide a more specific and systematic method of manufacturing a photoluminescent enamel sign that a non-luminescent pattern is formed on the photoluminescent surface.
이하 첨부된 도면을 참조하여 상기 목적을 달성하기 위한 본 발명을 설명한다. 첨부된 도면들에서 공정에 표기된 참조번호는 다른 도면에서도 동일한 공정을 표기할 때에 가능한 한 동일한 참조부호를 사용하고 있음을 유의하여야 한다. 또한 반복되는 설명은 생략하였으며, 관련된 공지의 공정에 대한 구체적인 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우에는 그 상세한 설명을 생략한다.Hereinafter, with reference to the accompanying drawings will be described the present invention for achieving the above object. In the accompanying drawings, it should be noted that reference numerals denoted in processes may use the same reference numerals as much as possible when referring to the same processes in other drawings. In addition, repeated descriptions have been omitted, and in the case where it is determined that detailed descriptions of related well-known processes may unnecessarily obscure the subject matter of the present invention, detailed descriptions thereof will be omitted.
도 1은 본 발명에 따라 제조된 축광법랑 표지판의 단면도이다.1 is a cross-sectional view of a photoluminescent enamel sign manufactured according to the present invention.
도 1에 따르면 본 발명에 따라 제조된 축광법랑 표지판은, 표지판의 소재로 사용되는 강판, 스텐레스판, 알루미늄판, 함금판 중에 하나인 판재(10); 상기 판재(10)의 종류, 두께 및 제품의 용도에 따라 선택된 법랑용 하유를 상기 판재(10) 표면에 균일하게 도포하고 건조한 후, 소성로에서 적절한 온도로 소성하여 형성된 하유법랑층(20); 상기 판재(10)의 종류, 두께, 제품의 용도 및 작업여건에 따라 선택된 법랑용 상유를 상기 하유법랑층(20) 표면에 균일하게 도포하고 건조한 후, 소성로에서 적절한 온도로 소성하여 형성된 상유법랑층(30); 상기 상유법랑층(20) 표면에, 법랑용 투명유약과 축광안료를 소정 비율로 혼합하여 조성된 축광성 유약을 도포하고 건조한 후, 소성로에서 소성하여 형성된 축광법랑층(40); 상기 축광법랑층(40) 표면에, 법랑용 유약 전사지로 문자, 숫자, 기호, 도표, 그림 등을 붙인 후, 법랑용 소성로에서 소성하여 축광법랑층과 일체화시킨 비축광 문양층(50);으로 구성된다.According to Figure 1, the photoluminescent enamel signs produced according to the present invention, the
도 2는 본 발명에 따른 축광법랑 표지판의 제조방법 1을 나타내는 순서도이다.Figure 2 is a flow chart showing a method 1 of manufacturing a photoluminescent enamel sign according to the present invention.
도 2에 따르면, 축광성 바탕면과 비축광성 안내문을 갖는 법랑 표지판은,According to Figure 2, the enamel sign having a photoluminescent base surface and a non-luminescent notice,
(P110) 표지판의 용도 및 설치 위치에 따라서 강판, 스텐레스판, 알루미늄판, 합금판, 중에 하나로 정해진 판재(10)를, 법랑용 유약의 도포와 소성이 잘 되도록 표면 처리하는 판재의 표면 전처리 공정;(P110) the surface pretreatment process of the plate | plate material which surface-treats the board |
(P120) 상기 판재(10)의 종류, 두께 및 제품의 용도에 따라 선택된 법랑용 하유를 상기 판재(10) 표면에 균일하게 도포하고 건조한 후, 소성로에서 적절한 온도로 소성하는 하유법랑층(20) 피복 공정;(P120) The
(P130) 상기 판재(10)의 종류, 두께, 제품의 용도 및 작업여건에 따라 선택된 법랑용 상유를 상기 하유법랑층(20) 표면에 균일하게 도포하고 건조한 후, 소성 로에서 적절한 온도로 소성하는 상유법랑층(30) 피복 공정; (P130) Uniformly applying the enamel for the enamel selected according to the type, thickness, product use and working conditions of the
(P140) 상기 상유법랑층(30)의 표면에, 법랑용 투명유약 100중량부와 축광안료 20~70중량부를 혼합하여 조성된 축광성 유약을 균일하게 도포하여 축광법랑층(40)을 형성하고, 건조하는 공정;(P140) the
(P150) 상기의 축광성 유약으로 도포된 축광법랑층(40)을 소성로에서 소성하는 공정;(P150) baking the
(P160) 상기의 소성된 축광법랑층(40)의 표면에, 비축광성 법랑용 유약 전사지로 문자, 숫자, 기호, 도표, 그림 등을 붙여 비축광문양층(50)을 형성하는 공정;(P160) forming a
(P170) 상기 비축광문양층(50)을 소성로에서 소성하는 공정;들을 수행하여 제조된다.(P170) the step of firing the non-axis
상기 제조방법에서 소성온도는 판재(10)의 종류에 따라서 달리 적용되어 강판의 경우 800-920℃, 알루미늄판의 경우 520-560℃에서 4분 내지 6분 동안 소성하는 것이 바람직하며, 상기 온도와 시간 범위를 벗어날 경우 유약과 판재의 결합이 좋지 못하거나 판재가 형태를 유지하지 못하는 문제가 발생할 수 있다. 판재는 황산으로 표면을 전처리하는 과정을 거친 후 사용하며, 이 과정에서 형성된 무수한 핀홀이 하유와의 밀착을 견고하게 한다. 단, 법랑에 적합토록 표면처리된 판재일 경우에는 상기 전처리 공정을 생략할 수 있다.In the manufacturing method, the firing temperature is differently applied depending on the type of the
하유는 판재와의 밀착을 돕기 위한 산화코발트와 같은 밀착제의 성분을 함유하는 법랑용 하유를 사용하며, 법랑층이 너무 얇거나 두꺼우면 판재와의 밀착이 좋 지 못하거나 법랑층에 균열이 생길 수 있으므로 80-120㎛의 두께로 하유법랑층을 형성시키는 것이 바람직하다. 상유는 하유층을 시각적으로 차단할 수 있도록 산화티탄 유백제를 함유하는 법랑용 상유를 사용하며, 법랑층이 너무 얇거나 두꺼우면 하유층이 비치거나 법랑층에 균열이 생길 수 있으므로 80-120㎛의 두께로 상유법랑층을 형성시키는 것이 바람직하다.The lower oil uses enamel lower oil containing the ingredients of adhesive such as cobalt oxide to help the adhesion with the plate.If the enamel layer is too thin or thick, it may not be in close contact with the plate or cracks may occur in the enamel layer. Since it is possible to form the enamel layer in the thickness of 80-120㎛. The oil is enameled oil containing titanium oxide whitening agent to visually block the oil layer. If the enamel layer is too thin or too thick, the oil layer may be exposed or crack may occur. It is preferable to form an enamel layer in thickness.
본 발명에서 축광성 유약에 혼합되는 투명유약은 45-55중량%의 SiO2, 15-20중량%의 Na2O, 10-20중량%의 B2O3, 1-5중량%의 K2O, 2-5중량%의 TiO2, 3-5중량%의 ZnO, 2-6중량%의 Li2O, 2-6중량%의 ZrO2, 5-10중량%의 Al2O3로 이루어진 유약과 같이 투광성이 좋으면서도 융점이 낮은 유약을 선택함으로써 제조가 용이하도록 한다. 또한, 축광안료는 (SrO)(MgO)0.1Al2O3(EuO,Dy2O3)0.01B0, A2O3SrO3B2O3 등과 같이 인체에 무해하면서도 휘도가 높고 지속성이 좋으며 내열성이 우수한 화합물로 이루어진 것을 사용하는 것이 바람직하다. 축광성 유약에 있어서 축광안료의 양이 적으면 축광효과를 제대로 낼 수 없고, 양이 많으면 비용이 상승하는 단점이 있으므로, 법랑용 투명유약 100중량부와 축광안료 20~70중량부를 혼합하여 축광성 유약을 제조하며, 일반용도에 사용할 경우 축광법랑층은 80-120㎛의 두께로 형성함으로써 축광효과와 비용의 문제를 동시에 해결한다.In the present invention, the transparent glaze mixed in the photoluminescent glaze is 45-55 wt% SiO 2 , 15-20 wt% Na 2 O, 10-20 wt% B 2 O 3 , 1-5 wt% K 2 O, 2-5 wt% TiO 2 , 3-5 wt% ZnO, 2-6 wt% Li 2 O, 2-6 wt% ZrO 2 , 5-10 wt% Al 2 O 3 It is easy to manufacture by selecting a glaze having a low light melting point, such as glaze is good. In addition, photoluminescent pigments are (SrO) (MgO) 0.1 Al 2 O 3 (EuO, Dy 2 O 3 ) 0.01 B 0 , A 2 O 3 SrO 3 B 2 O 3 It is preferable to use what consists of compounds which are excellent in heat resistance. In the photoluminescent glaze, if the amount of the photoluminescent pigment is small, the photoluminescent effect cannot be properly produced, and if the amount of the photoluminescent glaze is high, the cost increases. When the glaze is manufactured and used for general use, the photoluminescent enamel layer is formed to a thickness of 80-120㎛ to solve the problem of photoluminescent effect and cost at the same time.
법랑유약전사지는 불투명한 안료를 함유하여 비축광문양층이 축광법랑층과 대비될 수 있도록 하며, 80-120㎛의 두께로 비축광문양층을 형성한다.The enamel glaze transfer paper contains an opaque pigment, so that the non-luminescent glyph layer can be contrasted with the photoluminescent enamel layer, and forms a non-glowing glyph layer with a thickness of 80-120 μm.
[실시예 1] Example 1
법랑용 유약의 접착이 잘 되도록 표면처리한 강판 위에 법랑용 하유를 도포하여 건조하고 830-920℃의 법랑용 소성로에서 5분 동안 소성하여 하유법랑층을 만든 후, 법랑용 상유를 80-120㎛의 두께로 도포하여 건조하고 800-830℃의 법랑용 소성로에서 5분 동안 소성하여 상유법랑층을 만든 다음, 법랑용 투명유약과 축광안료를 중량비 7:3으로 혼합하여 제조한 축광성 유약을 도포하여 건조하고 750-830℃의 법랑용 소성로에서 5분 동안 소성하여 축광법랑층을 만든 후, 원하는 문양이 인쇄된 법랑용 유약 전사지를 축광법랑층에 붙인 후 750-830℃의 법랑용 소성로에서 5분 동안 소성하여 비축광문양층을 만드는 방법으로 축광법랑 표지판 1을 제조하였다.Apply enamel lower oil on the surface-treated steel sheet to make the enamel glaze adhere well, and bake for 5 minutes at 830-920 ℃ for enamel firing to make lower enamel layer. It is dried by applying a thickness of and dried in an enamelling kiln at 800-830 ° C. for 5 minutes to make an enamel layer. Then, the photoluminescent glaze prepared by mixing the enamel transparent glaze and the phosphorescent pigment in a weight ratio of 7: 3 is applied. After drying and firing for 5 minutes in the enamel firing furnace at 750-830 ℃, to make a photoluminescent enamel layer, and paste the enamel glaze transfer paper with the desired pattern to the enamel enamel layer and then in the enamel firing furnace at 750-830 ℃ 5 Photoluminescent enamel sign 1 was prepared by firing for minutes to make a non-luminescent pattern.
[실시예 2]Example 2
법랑용 유약의 접착이 잘 되도록 표면처리한 스텐레스판 위에 법랑용 하유를 도포하여 건조하고 880-920℃의 법랑용 소성로에서 5분 동안 소성하여 하유법랑층을 만든 후, 법랑용 상유를 도포하여 건조하고 800-830℃의 법랑용 소성로에서 5분 동안 소성하여 상유법랑층을 만든 다음, 법랑용 투명유약과 축광안료를 중량비 7:3으로 혼합하여 제조한 축광성 유약을 도포하여 건조하고 750-830℃의 법랑용 소성로에서 5분 동안 소성하여 축광법랑층을 만든 후, 원하는 문양의 법랑용 유약 전사지를 축광법랑층에 붙인 후 750-830℃의 법랑용 소성로에서 5분 동안 소성하여 비축광문양층을 만드는 방법으로 축광법랑 표지판 2를 제조하였다.Apply enamel lower oil on the stainless steel plate surface-treated for good adhesion of enamel glaze and dry it at 880-920 ℃ for 5 minutes to make lower enamel layer, then apply enamel oil to dry And calcined for 5 minutes in an enamel firing furnace at 800-830 ° C. to form an enamel layer. Then, the photoluminescent glaze prepared by mixing the enamel transparent glaze and the photoluminescent pigment in a weight ratio of 7: 3 was applied and dried, and then 750-830. After baking for 5 minutes in the enamel firing furnace at ℃ ℃ to form a photoluminescent enamel layer, after attaching the enamel glaze transfer enamel of the desired pattern to the photoluminescent enamel layer, and calcined for 5 minutes in the enamel firing furnace at 750-830 ℃ The photoluminescent enamel sign 2 was manufactured by the method of making.
도 3은 본 발명에 따른 축광법랑 표지판의 제조방법 2를 나타내는 순서도이다.3 is a flow chart showing a method 2 of manufacturing a photoluminescent enamel sign according to the present invention.
도 3에 따르면, 축광법랑 표지판의 제조방법 2에서는 축광법랑층(40)과 비축광문양층(50)을 형성함에 있어서 소성과정을 단일화하였으며, 도 2에서 설명한 상기 (P110), (P120), (P130), (P140) 및 (P160) 공정은 도 3의 공정에서도 동일하게 적용되므로 설명은 생략한다.According to Figure 3, in the manufacturing method of the photoluminescent enamel sign 2, in the formation of the
제조방법 2에 따른 축광성 바탕면과 비축광성 안내문을 갖는 법랑 표지판은,상기의 (P110), (P120), (P130), (P140) 및 (P160)의 공정을 순차적으로 수행하며, 축광법랑층(40)의 소성 공정(P150)과 비축광문양층(50)의 소성 공정(170)을 별도의 소성 공정으로 수행하지 않고, 단일의 소성 공정(P180)으로 수행하여 제조된다.Enamel sign having a photoluminescent base surface and a non-luminescent guide according to the manufacturing method 2, performs the process of (P110), (P120), (P130), (P140) and (P160) above sequentially, The firing process (P150) of the
[실시예 3]Example 3
법랑용 유약의 접착이 잘 되도록 표면처리한 강판 위에 법랑용 하유를 도포하여 건조하고 830-920℃의 법랑용 소성로에서 5분 동안 소성하여 하유법랑층을 만든 후, 법랑용 상유를 도포하여 건조하고 800-830℃의 법랑용 소성로에서 5분 동안 소성하여 상유법랑층을 만든 다음, 법랑용 투명유약과 축광안료를 중량비 7:3으로 혼합하여 제조한 축광성 유약을 도포하여 건조하고, 원하는 문양의 법랑용 유약 전사지를 축광법랑층에 붙인 후 750-830℃의 법랑용 소성로에서 5분 동안 소성하여 축광법랑층과 비축광문양층을 만드는 방법으로 축광법랑 표지판 3을 제조하였다.Apply enamel lower oil on the surface treated steel sheet for good adhesion of enamel glaze and dry it at 830-920 ℃ for 5 minutes to make lower enamel layer, then apply enamel oil to dry. After baking for 5 minutes in the enamel firing furnace at 800-830 ° C. to form an enamel layer, it is dried by applying a photoluminescent glaze prepared by mixing the enamel transparent glaze and the photoluminescent pigment in a weight ratio of 7: 3. Photoluminescent enamel sign 3 was prepared by attaching the enamel glaze transfer paper to the photoluminescent enamel layer and baking it in an enamel firing furnace at 750-830 ° C. for 5 minutes.
실시예 1 내지 3에 따라 제조한 축광법랑 표지판은 축광성 바탕면 위에 비축광성 문양이 일체화되어 도드라지게 보이는 특징이 있었다.The photoluminescent enamel signs prepared according to Examples 1 to 3 had a non-luminescent pattern integrated on the photoluminescent base surface and appeared to be sharp.
상기와 같이 본 발명은 축광성 바탕면 위에 비축광성 문양이 형성된 축광법랑 표지판의 구체적이고 체계화된 제조방법을 제공하며, 특히 제조방법 2는 공정을 단축시킬 수 있는 장점을 갖는다.As described above, the present invention provides a specific and systematic method of manufacturing a photoluminescent enamel sign having a non-luminescent pattern formed on a photoluminescent surface, and in particular, the manufacturing method 2 has an advantage of shortening the process.
또한 본 발명에 따라 제조된 축광법랑 표지판은 축광의 바탕면에 비축광의 문양이 일체화되어 도드리지게 보이는 장점을 가지므로, 소방시설물, 안전수칙 안내판 또는 안전사고 예방을 위한 경계 표지판과 각종 유도표지판에 사용될 수 있다.In addition, the photoluminescent enamel signs manufactured according to the present invention have the advantage that the pattern of the non-luminescent light is integrated to the base surface of the photoluminescent light so that it can be used to be used in fire protection facilities, safety information guide boards or boundary signs for preventing accidents and various induction signs. Can be.
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KR970019345U (en) * | 1996-08-12 | 1997-05-26 | 박명수 | Improved structure of phosphorescent induction sign |
KR200319954Y1 (en) * | 2003-04-12 | 2003-07-12 | 디에스엔터프라이즈(주) | Photoluminescent Porcelain Enamel for Instruction Plate and Signage |
JP2003255869A (en) * | 2001-12-28 | 2003-09-10 | Osamu Tsutsui | Display member with light accumulating function |
KR20040079260A (en) * | 2003-03-07 | 2004-09-14 | 최종근 | Guide Indicator With A Storage Light Property |
KR20060062806A (en) * | 2004-12-06 | 2006-06-12 | 권필주 | Method for making guide-sign apparatus |
KR20060122398A (en) * | 2005-05-27 | 2006-11-30 | 주식회사 오빌테크 | Guide indicating plate using luminescent materials and method for manuafacturing therof |
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KR970019345U (en) * | 1996-08-12 | 1997-05-26 | 박명수 | Improved structure of phosphorescent induction sign |
JP2003255869A (en) * | 2001-12-28 | 2003-09-10 | Osamu Tsutsui | Display member with light accumulating function |
KR20040079260A (en) * | 2003-03-07 | 2004-09-14 | 최종근 | Guide Indicator With A Storage Light Property |
KR200319954Y1 (en) * | 2003-04-12 | 2003-07-12 | 디에스엔터프라이즈(주) | Photoluminescent Porcelain Enamel for Instruction Plate and Signage |
KR20060062806A (en) * | 2004-12-06 | 2006-06-12 | 권필주 | Method for making guide-sign apparatus |
KR20060122398A (en) * | 2005-05-27 | 2006-11-30 | 주식회사 오빌테크 | Guide indicating plate using luminescent materials and method for manuafacturing therof |
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KR101286043B1 (en) | 2012-02-16 | 2013-07-19 | 디에스엔터프라이즈(주) | Memorial plate and commemorative plate coated with porcelain enamel having excellent durability and manufacturing method thereof |
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