KR100738594B1 - 마이크로리소그래피 축소 대물렌즈 및 투영 노광 장치 - Google Patents

마이크로리소그래피 축소 대물렌즈 및 투영 노광 장치 Download PDF

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Publication number
KR100738594B1
KR100738594B1 KR1020000006836A KR20000006836A KR100738594B1 KR 100738594 B1 KR100738594 B1 KR 100738594B1 KR 1020000006836 A KR1020000006836 A KR 1020000006836A KR 20000006836 A KR20000006836 A KR 20000006836A KR 100738594 B1 KR100738594 B1 KR 100738594B1
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KR
South Korea
Prior art keywords
mirror
image
projection objective
vertex
distance
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KR1020000006836A
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English (en)
Korean (ko)
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KR20000076656A (ko
Inventor
딩어우도
Original Assignee
칼 짜이스 에스엠테 아게
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Publication of KR20000076656A publication Critical patent/KR20000076656A/ko
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Publication of KR100738594B1 publication Critical patent/KR100738594B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020000006836A 1999-02-15 2000-02-14 마이크로리소그래피 축소 대물렌즈 및 투영 노광 장치 KR100738594B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE19906001 1999-02-15
DE19948240A DE19948240A1 (de) 1999-02-15 1999-10-07 Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
DE19906001.0 1999-10-07
DE19948240.3 1999-10-07

Publications (2)

Publication Number Publication Date
KR20000076656A KR20000076656A (ko) 2000-12-26
KR100738594B1 true KR100738594B1 (ko) 2007-07-11

Family

ID=7897378

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000006836A KR100738594B1 (ko) 1999-02-15 2000-02-14 마이크로리소그래피 축소 대물렌즈 및 투영 노광 장치

Country Status (2)

Country Link
KR (1) KR100738594B1 (de)
DE (2) DE19948240A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130102078A (ko) * 2010-09-30 2013-09-16 칼 짜이스 에스엠티 게엠베하 Euv 마이크로리소그래피용 투영 노광 장치 및 마이크로리소그래피 노광을 위한 방법

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6985210B2 (en) 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
USRE42118E1 (en) 1999-02-15 2011-02-08 Carl-Zeiss-Smt Ag Projection system for EUV lithography
US7151592B2 (en) 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
WO2002048796A2 (en) * 2000-12-12 2002-06-20 Carl Zeiss Smt Ag Projection system for euv lithography
EP1615076A1 (de) * 2001-01-09 2006-01-11 Carl Zeiss SMT AG Projektionssystem für die extrem-ultraviolettlithographie
KR100831706B1 (ko) * 2001-01-09 2008-05-22 칼 짜이스 에스엠티 에이지 극자외선 리소그라피를 위한 투영시스템
DE50207927D1 (de) 2001-01-26 2006-10-05 Zeiss Carl Smt Ag Schmalbandiger spektralfilter und seine verwendung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0779528A2 (de) * 1995-12-12 1997-06-18 Svg Lithography Systems, Inc. Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur
WO1999057606A1 (en) * 1998-05-06 1999-11-11 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0779528A2 (de) * 1995-12-12 1997-06-18 Svg Lithography Systems, Inc. Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur
WO1999057606A1 (en) * 1998-05-06 1999-11-11 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Jewell T E, Proc. SPIE, 2437(20), pp.340-346, 1995 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130102078A (ko) * 2010-09-30 2013-09-16 칼 짜이스 에스엠티 게엠베하 Euv 마이크로리소그래피용 투영 노광 장치 및 마이크로리소그래피 노광을 위한 방법
KR101889116B1 (ko) 2010-09-30 2018-08-16 칼 짜이스 에스엠티 게엠베하 Euv 마이크로리소그래피용 투영 노광 장치 및 마이크로리소그래피 노광을 위한 방법

Also Published As

Publication number Publication date
KR20000076656A (ko) 2000-12-26
DE59914901D1 (de) 2008-12-18
DE19948240A1 (de) 2000-08-24

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