KR100734526B1 - 오버레이 제어 에러들을 보정하기 위한 방법, 장치, 및/또는 저장 장치 - Google Patents

오버레이 제어 에러들을 보정하기 위한 방법, 장치, 및/또는 저장 장치 Download PDF

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KR100734526B1
KR100734526B1 KR1020027001937A KR20027001937A KR100734526B1 KR 100734526 B1 KR100734526 B1 KR 100734526B1 KR 1020027001937 A KR1020027001937 A KR 1020027001937A KR 20027001937 A KR20027001937 A KR 20027001937A KR 100734526 B1 KR100734526 B1 KR 100734526B1
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control input
step size
input parameters
semiconductor devices
response
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KR20020020964A (ko
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토프랙안토니제이.
보데크리스토퍼에이.
에드워드리차드디.
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어드밴스드 마이크로 디바이시즈, 인코포레이티드
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020027001937A 1999-08-10 2000-04-18 오버레이 제어 에러들을 보정하기 위한 방법, 장치, 및/또는 저장 장치 Expired - Fee Related KR100734526B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/371,550 1999-08-10
US09/371,550 US6405096B1 (en) 1999-08-10 1999-08-10 Method and apparatus for run-to-run controlling of overlay registration

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KR20020020964A KR20020020964A (ko) 2002-03-16
KR100734526B1 true KR100734526B1 (ko) 2007-07-03

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US (2) US6405096B1 (https=)
EP (1) EP1208592A1 (https=)
JP (1) JP4666858B2 (https=)
KR (1) KR100734526B1 (https=)
WO (1) WO2001011678A1 (https=)

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KR20020020964A (ko) 2002-03-16
US6622061B1 (en) 2003-09-16
US6405096B1 (en) 2002-06-11
JP2003506898A (ja) 2003-02-18
EP1208592A1 (en) 2002-05-29
JP4666858B2 (ja) 2011-04-06
WO2001011678A1 (en) 2001-02-15

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