KR100710983B1 - Method for manufacturing thin antistatic hard-coated film and thin antistatic hard-coated film using thereof - Google Patents

Abstract

The present invention is to provide a method for producing a thin antistatic hard coating film, (a) 100% by weight of an antistatic hard coating layer composition consisting of a curable resin, an antistatic agent, a curing agent, a leveling agent, a photopolymerization initiator, the curable The resin is a photocurable resin, i) 0.5% to 30% by weight of the antistatic agent, ii) 0.1% to 15% by weight of the curing agent, i) 0.1% to 3% by weight of the leveling agent, Iii) The photopolymerization initiator is coated with an antistatic hard coating layer by in-line coating method on the transparent support to melt the solution of the antistatic hard coating layer composition comprising 0.1% by weight to 10% by weight with a dispersant. The content of the dispersant is an antistatic hard coating layer coating coating by mixing in a ratio of 20 parts by weight to 110 parts by weight with respect to 100 parts by weight of the antistatic hard coating layer composition Step; (b) a drying step of drying the antistatic hard coating layer at a temperature of 45 ° C. to 120 ° C. and a time of 45 seconds to 70 seconds; And (c) a curing step of ultraviolet curing the antistatic hard coating layer to 200mJ / Cm ² to 600mJ / Cm ² .

Description

Method for manufacturing thin antistatic hard coating film and thin antistatic hard coating film using same {Method for Manufacturing Thin Antistatic Hard-Coated Film and Thin Antistatic Hard-Coated Film using Technical}

1 is a structural diagram of a conventional antistatic hard coating film,

2 is a structural diagram of a thin antistatic hard coating film according to a temporary embodiment of the present invention,

3 is a graph showing the transmittance of the antistatic hard coating film obtained in Example 1,

4 is a graph showing the transmittance of the antistatic hard coating film obtained in Example 2,

5 is a graph showing the transmittance of the antistatic hard coating film obtained in Example 3,

6 is a graph showing the transmittance of the antistatic hard coating film obtained in Comparative Example 1.

Explanation of symbols on the main parts of the drawings

100: transparent support 200: hard coating layer

300: antistatic layer 400: antistatic hard coating layer

The present invention relates to a method for producing a thin antistatic hard coating film and a thin antistatic hard coating film using the same, in particular, by forming an antistatic hard coating layer using an inline coating method on a transparent support, foreign matter adhered by static electricity The present invention relates to a method for producing a thin antistatic hard coating film capable of preventing a thin film and having excellent scratch resistance and producing an ultrathin film, and to an antistatic hard coating film using the same.

In liquid crystal displays and the like, an image forming system necessarily requires a polarizing element disposed on both sides of a liquid crystal cell, and a polarizing plate is generally attached thereto. In addition, in the liquid crystal panel, in order to improve the display quality of the display device, various optical elements other than the polarizing plate are increasingly used. For example, the anti-coloration retardation plate, the viewing angle expansion film which improves the viewing angle of a liquid crystal display device, etc. are used. These films are collectively called an optical film.

However, the optical film as described above has a problem that the surface resistance is high, the static electricity is generated, and foreign matters are easily attached to the surface, and the liquid crystal is broken by external charge in a large liquid crystal display (LCD). In addition, there is a problem that the surface hardness is low, the scratch resistance is poor, and transparency is damaged by scratches or scrapes.

Therefore, it was necessary to prevent the generation of static electricity and to enhance the surface hardness. A structural diagram of a film that performs the two functions simultaneously is shown in FIG. 1.

As shown, the conventional antistatic hard coating film has a form in which the hard coating layer 200 and the antistatic layer 300 each containing a hard coating resin on the transparent support 100 are formed through separate coating processes.

However, the conventional antistatic hard coating film has a problem in that a process of forming a hard coating layer and a process of forming an antistatic layer are performed separately, so that the yield decreases and the cost increases due to the decrease in productivity.

Accordingly, the present invention has been proposed to solve the conventional problems as described above, the object of the present invention is to form an antistatic hard coating layer consisting of a single layer on the transparent support using an in-line coating method by foreign matter by static electricity A method of manufacturing a thin antistatic hard coating film having improved scratch resistance to such a degree that it can be prevented from adhering to a sufficient hardness that transparency is not impaired by scratches due to friction, and a thin antistatic hard coating film using the same. To provide.

Hereinafter, the present invention will be described in detail with reference to the technical spirit.

The thin antistatic hard coating film according to the present invention is prepared through a coating step-drying step-curing step of forming an antistatic hard coating layer using an inline coating method on a transparent support.

(1) Antistatic Hard Coating Layer Coating Step

The antistatic hard coating layer coating step is to prepare an antistatic hard coating layer composition consisting of a curable resin, an antistatic resin, a curing agent, a leveling agent, a photopolymerization initiator with a dispersing agent in the form of a solution, and then transparent support through an inline coating method. By coating on top.

The antistatic hard coating layer coating step of the present invention may be characterized by implementing the antistatic hard coating layer as one layer by appropriately adjusting the composition of the components.

The transparent support used in the present invention may be polyethylene terephthalate (PET), triacetyl cellulose (TAC), polyolefin, amorphous polyolefin, cyclo olefin, polybutylene terephthalate, polyamide, poly (methyl methacrylate) copolymer, And various transparent resin films such as polyacrylate, polyimide, polyether, polycarbonate, polysulfone, cellophane, aromatic polyamide, polyethylene, polypropylene and polyvinyl alcohol, and glass base materials such as quartz glass and soda glass. The transparent support used in the present invention is not limited to the materials listed above as long as they exhibit the same effect in view of transparency, mechanical strength, thermal stability, moisture shielding, isotropy, economic efficiency, and the like.

Coating heads used in the in-line coating method of the present invention is, for example, knife (Knife), comma (Comma), die (Die), micro gravure, gravure, nip (nip), spray and the like. In-line coating as in the present invention eliminates or minimizes the fine voiding phenomenon caused by using the coating heads listed above. In addition, air filling the voids can cause a change in the refractive index and scatter the light to reduce the overall transmittance.

Looking at the composition of the antistatic hard coating layer composition consisting of a curable resin, an antistatic agent, a curing agent, a leveling agent, a photopolymerization initiator used in the present invention and a dispersant mixed with the composition are as follows.

① Curable resin

The curable resin used in the present invention uses a photocurable resin for ultraviolet curing.

Photocurable resins generally use known resins. As the photocurable resin, unsaturated polyester resins, polyfunctional acrylate resins, urethane acrylates, epoxy acrylic resins, epoxy acrylate resins and the like can be used alone or in combination.

The curable resin used in the present invention is preferably 60% to 95% by weight, more preferably 70% to 90% by weight in 100% by weight of the antistatic hard coating layer composition. When the curable resin is less than 60% by weight in 100% by weight of the antistatic hard coating layer composition, it is difficult to obtain high hardness due to curing, and when the curable resin is greater than 95% by weight, the content of the curing agent and the leveling agent is relatively small, and thus the desired physical properties are achieved. Hard to get

If the curable resin usable in the present invention exhibits the same effect, the range or content is not limited to the listed resins or contents, of course.

The curable resin used in the present invention more preferably uses an ultraviolet curable polyfunctional acrylate-based resin in order to obtain properties such as high hardness and transparency. UV-curable polyfunctional acrylate-based resins used in the present invention are dipentaerythritol hexaacrylte, tetramethylolmethane tetraacrylate, tetramethylolmethane triacrylate, Trimethanolpropane triacrylate, 1,6-hexanediol diacrylate, 1,6-bis (3-acryloyloxy-2-hydroxypropyloxy) hexane [ Polyfunctional alcohol derivatives such as 1,6-bis (3-acryloyloxy-2-hydroxypropyl) hexane] and urethane acrylics such as polyethylene glycol diacrylate and pentaerythritol triacrylate Acrylate, hexamethylene diisocyanate urethane prepolymer, etc. It may be used in combination.

It is preferable to use 10 weight%-90 weight% of said ultraviolet curable polyfunctional acrylate resin with respect to 100 weight% of curable resin, More preferably, it is 30 weight%-87 weight%. Even more preferably, 50 to 85% by weight is used.

If the UV-curable polyfunctional acrylate-based resin is less than 10% by weight in 100% by weight of the curable resin, it is difficult to obtain high hardness due to the combination of functional groups because the absolute number of functional groups is small. There is a disadvantage of weak chemical.

② Antistatic Agent

The antistatic agent used in the present invention may be used alone or in combination with a conductive polymer, metal particles, inorganic oxides, metal oxides and the like.

The conductive polymer used as an antistatic agent in the present invention is polyacetylene, poly (p-phenylene) [poly (p-phenylene)], polythiophene, poly (3,4-ethylenedioxythiophene ) [Poly (3,4-ethylenedioxythiophene) (PEDOT)], Polypyrrole [Polypyrrole (pyridine polymer)], Poly (p-phenylene sulfide) [Poly (p-phenylene sulfide)], Poly (p-phenylene vinylene ) [Poly (p-phenylene vinylene)], poly (thienylene vinylene), polyaniline (Polyaniline) and the like can be used alone or in combination.

Metal particles used as antistatic agents in the present invention are silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), nickel (Ni), chromium (Cr), lead (Pb) , Cobalt (Co), rhodium (Rh), ruthenium (Ru), tin (Sn), iridium (Ir), palladium (Pd), titanium (Ti) and the like alone, mixed or silver (Ag) coated copper (Cu Coated with other metals like).

In the present invention, the inorganic oxide to be used refers to all oxides except organic oxides as inorganic oxides. In the present invention, it is preferable to use a metal oxide among the inorganic oxides.

Metals forming metal oxides are not limited and include sodium (Na), magnesium (Mg), potassium (K), calcium (Ca), scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), Manganese (Mn), Cobalt (Co), Iron (Fe), Copper (Cu), Zinc (Zn), Gallium (Ga), Aluminum (Al), Nickel (Ni), Copper (Cu), Rubidium (Rb), Yttrium (Y), lanthanum (La), strontium (Sr), zirconium (Zr), niobium (Nb), molybdenum (Mo) and the like can be used. These metals may form several metal oxides with one metal having a plurality of valences. It is also possible to form a multimetal oxide containing two or more metals.

In the present invention, typically, indium tin oxide (ITO), antinomy tin oxide (ATO), SiO ₂ , TiO ₂ , Al ₂ O ₃ , B ₂ O ₃ , CaO, SnO, MgO, SrO, ZnO, ZrO ₂ , Y ₂ Metal oxides such as O ₃ and La ₂ O ₃ may be used alone or in combination.

The particle diameter of the metal oxide is preferably 0.05 µm to 1 µm, more preferably 0.1 µm to 0.5 µm. If the particle diameter of the metal oxide is smaller than 0.05 μm, it is difficult to obtain an antistatic effect due to satisfactory light diffusion, and the light diffusivity is lowered, so that the image is discolored to aluminum color. In addition, when the particle diameter of the metal oxide is larger than 1 μm, the thickness of the antistatic hard coating layer becomes thick, and the background of the screen to be applied becomes rough and the image contrast deteriorates.

The content of the antistatic agent is preferably 0.5% by weight to 30% by weight with respect to 100% by weight of the antistatic hard coating layer composition, more preferably 3% by weight to 20% by weight. Even more preferably 7% to 15% by weight. If the content of the antistatic agent is less than 0.5% by weight, it is difficult to secure the conductivity, and when the content of the antistatic agent is greater than 30% by weight, the conductive effect is remarkable but mass productivity and economic efficiency may be deteriorated.

The antistatic agent can be mixed in the form of an antistatic solution. For example, the antistatic agent may be mixed with water or alcohols to be mixed in the form of an antistatic solution.

③ curing agent

The curing agent in the present invention may be appropriately selected or mixed according to the form of the functional group present in the photocurable resin, preferably isocyanate compound, epoxy compound, aziridine compound, metal chelate compound, metal alkoxide metal salt, amine A compound, a hydrazine compound, etc. are used individually or in mixture.

Isocyanate compounds in the present invention are trimethylene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, diphenylmethane isocyanate, xylene diisocyanate aromatic diisocyanate compounds such as diisocyanate, aliphatic diisocyanate such as hexamethyl diisocyanate, and the like are used alone or in combination.

In addition, the epoxy compound in the present invention is a polyethylene glycol diglycidyl ether (diglycidyl ether), diglycidyl ether (diglycidyl ether), trimethylol propane triglycidyl ether (trimethylol propane triglycidyl ether) and the like alone Or mixed.

In the present invention, the curing agent is preferably used in an amount of 0.1% to 15% by weight, more preferably 0.5% to 10% by weight in 100% by weight of the antistatic hard coating layer composition. Even more preferably 1% to 5% by weight.

In the present invention, the curing agent is an additive used to control the molecular weight or the chain structure of the antistatic hard coating layer composition. When the curing agent is used in the above-described range, the effect of suppressing phase separation and the like is prominent. If the content of the curing agent is less than 0.1% by weight, it is difficult to expect the function of the curing agent, if the content of more than 15% by weight it is difficult to increase the hardness of the relatively low content of the curable resin.

④ Leveling agent

In the present invention, a leveling agent is mixed and used to even out the surface of the antistatic hard coating layer. The leveling agent can be used by mixing a ketone or an ester solvent with a silicone resin. As a leveling agent by this invention, it is preferable to use a silicone diacrylate and a silicone polyacrylate compound individually or in mixture.

The content of the leveling agent is preferably 0.1% to 3% by weight, more preferably 0.5% to 2% by weight, based on 100% by weight of the antistatic hard coating layer composition. If the leveling agent is less than 0.1% by weight, it is difficult to expect the leveling effect, and when greater than 3% by weight, the hardness may be weakened.

⑤ polymerization initiator

When using a photocurable resin and using a photocuring agent to harden it, it is preferable to add a photoinitiator.

The photopolymerization initiator used in the present invention is diethoxyacetphenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 1-hydroxycyclohexyl-phenyl ketone, 2-methyl-2 Benzoin ethers such as acepine (4-thiomethylphenyl) propane-1-one, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfite, 4-benzoyl-N, N-dimethyl-N- [2- (1-oxo-2-propenyloxy) Ethyl] Benzophenones, such as benzene methananium bromide and (4-benzoyl benzyl) trimethylammonium chloride, thioxanthones, such as 2, 4- diethyl thioxanthone and 1-chloro-4- dichloro thioxanthone, 2, 4, 6-trimethylbenzoyldiphenylbenzoyl oxide, etc. can be used individually or in mixture. Moreover, as an accelerator (sensitizer), amine compounds, such as N, N- dimethyl paratoluidin, and 4, 4'- diethylamino benzophenone, can also be used individually or in mixture.

The content of the photopolymerization initiator is preferably in the range of 0.1% by weight to 10% by weight, more preferably 0.5% by weight to 5% by weight, in 100% by weight of the antistatic hard coating layer composition. If the content of the photoinitiator is less than 0.1% by weight, it is difficult to obtain a photopolymerization effect. If the content of the photoinitiator is more than 10% by weight, too much photoinitiator is added as compared to the photoinitiator effect, thereby reducing economic efficiency.

⑥ Dispersant

In the present invention, a dispersant is used to uniformly apply the antistatic hard coating layer to the transparent support. In the present invention, it is preferable to use an organic solvent in which the antistatic hard coating layer composition can be evenly dispersed.

The organic solvent is selected in consideration of the coating property of the antistatic hard coating layer, the adhesion to the transparent support, and the enhancement of the surface hardness enhancement function.

The organic solvent used in the present invention is a C1-8 saturated hydrocarbon alcohol such as methanol, isopropanol, butanol, t-butanol, isobutanol and the like, acetone, methyl ethyl ketone, methyl isobutyl ketone and the like of ketones. Saturated hydrocarbon-based diketones having 1 to 8 carbon atoms, such as 1 to 8 saturated hydrocarbon ketones and acetyl acetone, ethyl acetate of esters, ethyl hydrocarbons of 1 to 8 carbon atoms such as butyl acetate, and ethyl alcohols of ether alcohols. Solves, methyl cellosolves, butyl cellosolves, 1-methoxy-2-propanol, and N-methyl pyrrolidone, ethyl cellosolve acetate, diacetone alcohol, and the like are used alone or in combination. Moreover, benzene, toluene, xylene, ethylbenzene, etc. which correspond to an aromatic hydrocarbon can also be used individually or in mixture.

The organic solvent is preferably used in an amount of 20 parts by weight to 110 parts by weight, and more preferably 30 parts by weight to 80 parts by weight, based on 100 parts by weight of the antistatic hard coating layer composition to be applied. When the content of the organic solvent is less than 20 parts by weight with respect to 100 parts by weight of the antistatic hard coating layer composition, the viscosity is low, so that the coating property and adhesion with the transparent support are inferior, and when the content is greater than 110 parts by weight, the antistatic hard coating layer composition Compared with using too much organic solvent, it is inferior to profitability.

The antistatic hard coating layer coating step of the present invention is carried out by the in-line coating method after mixing in the form of a solution by mixing the above-mentioned antistatic hard coating layer composition and a dispersant as described above, the viscosity of the solution is It is preferable that they are 10cps-250cps at 30 degreeC. When the viscosity is lower than 5cps at 30 ℃ has a disadvantage of inferior adhesion to the transparent support, when the viscosity is higher than 250cps at 30 ℃ it becomes difficult to control the process is too large.

In addition, it is preferable to stir for a specific time in order to distribute the solution of the above-mentioned antistatic hard coating layer composition and the dispersant evenly distributed on the entire surface (transparent support surface) while maintaining the physical properties of the mixed components. The stirring time is preferably about 8 to 15 minutes at room temperature. However, it is a value that can be changed depending on the stirring conditions and the environment of the above time.

The thickness of the antistatic hard coat layer according to the present invention is preferably 2 µm to 10 µm, more preferably 4 µm to 7 µm. When the thickness of the antistatic hard coating layer is less than 2 μm, the thickness is too thin, making it difficult to secure scratch resistance and antistatic function, and when the antistatic hard coating layer is larger than 10 μm, a thin antistatic hard coating film cannot be obtained and the economy is inferior. There is this.

(2) drying step

In the drying step, the step of drying the antistatic hard coating film uniformly coated with the antistatic hard coating layer in the step (1). This is done to remove the solvent contained on the antistatic hard coating layer in this step.

The drying temperature performed in the drying step is preferably 45 ℃ to 120 ℃, more preferably 50 ℃ to 100 ℃. If the drying temperature is lower than 45 ℃ it takes a long time to remove the solvent, if the drying temperature is higher than 120 ℃ may affect the properties of the antistatic hard coating layer.

In addition, the drying time is preferably about 45 seconds to about 70 seconds. More preferably 55 to 65 seconds, still more preferably 58 to 62 seconds. If the drying time is less than 45 seconds, the effect of drying does not appear properly, and drying for more than 70 seconds may affect the physical properties.

(3) curing step

In the curing step, the antistatic hard coating layer formed through the antistatic hard coating layer coating step and the drying step is cured.

Photocuring in the present invention proceeds to UV curing, UV curing is preferably UV curing in the energy range of 200mJ / Cm ² to 600mJ / Cm ² , more preferably 300mJ / Cm ² to 500mJ / Cm ² .

When the amount of UV curing energy is less than 200mJ / Cm ² , sufficient photocuring effect may not be obtained. When the amount of UV curing energy is greater than 600mJ / Cm ² , excessive UV curing may affect the properties of the antistatic hard coating layer.

Based on this technical configuration, the antistatic hard coating film according to the present invention may form various coating layers of several nm to several μm. This can be realized by the number of coating heads used in the in-line coating method.

2 is a structural diagram of an antistatic hard coating film according to a temporary embodiment of the present invention. As shown in the figure, the antistatic hard coating film according to an embodiment of the present invention has a form in which an antistatic hard coating layer 400 is formed on the transparent support 100. The antistatic hard coating layer 400 is composed of one layer as a functional layer having an improved surface hardness along with an antistatic function. On the other hand, by adjusting the components and composition of the above-mentioned antistatic hard coating layer composition, it is possible to implement the antistatic hard coating layer 400 in one layer.

Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings, preferred embodiments of the present invention and comparative examples.

Example 1

50 g of IPA (Isopropylalcohol, isopropyl alcohol), 50 g of UV curable resin for hard coating (using polyfunctional acrylate resin), 50 g of antistatic solution (mixture of polythiophene and polypyrrole, which is a conductive polymer, is mixed with alcohol. After preparing the solution using 15%), 1 g of a curing agent (using hexamethylene diisocyanate), 2.5 g of a photopolymerization initiator (using diethoxyacetphenone), and 1 g of a leveling agent (using silicon diacrylate) were added thereto. After stirring for 10 minutes at room temperature, the 80㎛ transparent support in-line (in-line) coating and then dried and irradiated with ultraviolet light to prepare an antistatic hard coating film having a 5㎛ antistatic hard coating layer was formed.

Example 2

An antistatic hard coating film was prepared under the same conditions as in Example 1 except that 75 g of the antistatic solution was added thereto.

Example 3

An antistatic hard coating film was prepared under the same conditions as in Example 1 except that 100 g of the amount of the antistatic solution was added.

Comparative Example 1

In the TAC film, a conventional antistatic hard coating film (the same structure as shown in FIG. 1), in which a hard coating layer and an antistatic layer were formed in two layers through separate coating processes, was produced.

Table 1 shows the results of measuring adhesion, pencil hardness, wear resistance, transmittance, and the like, which are physical properties of the antistatic hard coating film obtained in Examples and Comparative Examples.

division Adhesion Surface resistance (Ω / □) Pencil hardness Coating thickness (μm) Transmittance (%) Cloudiness (%) Transparency (%) Example 1 100/100 3.7 * e06 2H 5 93.4 0.26 99.8 Example 2 100/100 3.5 * e05 2H 5 92.9 0.89 99.1 Example 3 100/100 3.5 * e04 2H 5 92.8 1.34 98.0 Comparative example 100/100 4.8 * e05 2H 6 93.1 0.56 99.2

The adhesion, pencil hardness, and wear resistance measured in [Table 1] were measured by the following method.

(Adhesiveness)

When the surface of the antistatic hard coating layer (an antistatic layer formed on the hard coating layer in Comparative Example 1) was put with 100 cross hatchings of 1 mm x 1 mm, a cellophane adhesive tape was attached, and the cellophane adhesive tape was removed. Count the remaining snow.

(Pencil hardness)

The pencil hardness of the surface of the antistatic hard coating layer (antistatic layer formed on the hard coating layer in Comparative Example 1) was measured using a conventional pencil scratch tester.

As shown in Table 1, the physical properties such as adhesion, surface resistance, pencil hardness, etc. of the antistatic hard coating film obtained in Examples 1 to 3 and the antistatic hard coating film obtained in Comparative Example 1 are almost similar. . This is because the antistatic hard coating film produced by the preferred embodiment of the present invention (Examples 1 to 3), which has a reduced manufacturing process compared to the conventional method, has the same function as the conventional antistatic hard coating film (Comparative Example 1). Means to do.

Table 2 shows the color values of the Examples and Comparative Examples.

Item L a b Example 1 96.65 -0.24 0.32 Example 2 96.60 -0.25 0.26 Example 3 96.57 -0.29 0.24 Comparative example 96.82 -0.24 0.24

L, a, and b represent color coordinates. As shown in [Table 2], it can be seen that the color coordinates of the color values in the examples and the comparative examples have obtained similar results. This means that the light transmitted through the antistatic hard coating film obtained in Examples 1, 2, 3, and Comparative Example 1 exhibited almost the same color. Therefore, even if the antistatic hard coating layer is formed as a single layer on the transparent support means that there is no effect on the color.

On the other hand, Figures 3 to 5 is a graph of the transmittance of the antistatic hard coating film obtained in Examples 1 to 3, Figure 6 is a graph of the transmittance of the antistatic hard coating film obtained in Comparative Example 1. As shown in the graph, it can be confirmed that the transmittance of all four graphs is about 92% or more. It can be interpreted that all four films perform almost the same role as functional films (antistatic function and surface hardness improvement).

In the above, this invention was demonstrated in detail with reference to an Example and a comparative example centering on a structure. However, the scope of the present invention is not limited to the above embodiments but may be embodied in various forms of embodiments within the appended claims. Without departing from the gist of the invention as claimed in the claims, any person of ordinary skill in the art is deemed to be within the scope of the claims underlying the present invention to the extent possible for various modifications.

In addition, the preferred range, more preferred range, and even more preferred range limitation in the present invention is to maximize the effect even more, it is possible to obtain a more satisfactory technical effect by narrowing the limited range.

As described above, the manufacturing method of the thin antistatic hard coating film according to the present invention and the thin antistatic hard coating film using the same by forming an antistatic hard coating layer using an inline coating method, foreign matters such as by static electricity The adhesion can be prevented from breaking the liquid crystal, there is an effect of improving the scratch resistance by increasing the surface hardness.

In addition, by forming an antistatic hard coating layer as a single layer using a direct inline coating method on the transparent support, there is an effect to improve the productivity by reducing the manufacturing process as well as thin.

Claims (10)

(a) 100% by weight of an antistatic hard coating layer composition comprising a curable resin, an antistatic agent, a curing agent, a leveling agent, and a photopolymerization initiator, wherein the curable resin uses a photocurable resin, Iii) 0.5 wt% to 30 wt% of the antistatic agent Ii) 0.1% to 15% by weight of the curing agent Iii) 0.1% to 3% by weight of the leveling agent Iii) 0.1% to 10% by weight of the photopolymerization initiator Iii) the curable resin is mixed with a dispersant to form an antistatic hard coating layer composition comprising the remaining weight% excluding the sum of the weight ratios of the components of (i) to iii) on the transparent support antistatic hard Coating the coating layer using an in-line coating method, but the content of the dispersant is an antistatic hard coating layer coating step of coating by mixing in a ratio of 20 parts by weight to 110 parts by weight with respect to 100 parts by weight of the antistatic hard coating layer composition; (b) a drying step of drying the antistatic hard coating layer at a temperature of 45 ° C. to 120 ° C. and a time of 45 seconds to 70 seconds; And (c) a method for producing a thin antistatic hard coating film, characterized in that it comprises a curing step of ultraviolet curing the antistatic hard coating layer to 200mJ / Cm ² to 600mJ / Cm ² . The method of claim 1, The viscosity of the solution prepared by mixing the antistatic hard coating layer composition and the dispersant is a method of producing a thin antistatic hard coating film, characterized in that 10cps to 250cps at 30 ℃. The method of claim 1, In the step (a), the antistatic agent is a method for producing a thin antistatic hard coating film, characterized in that at least one or more of a conductive polymer, metal particles, inorganic oxides are mixed. The method of claim 3, wherein The conductive polymer is polyacetylene, poly (p-phenylene) [Poly (p-phenylene)], polythiophene, poly (3,4-ethylenedioxythiophene) [Poly (3,4 -ethylenedioxythiophene (PEDOT)], polypyrrole (pyridine polymer), poly (p-phenylene sulfide), poly (p-phenylene sulfide), poly (p-phenylene vinylene) vinylene)], poly (thienylene vinylene), polyaniline (Polyaniline) at least one of the manufacturing method of a thin antistatic hard coating film. The method of claim 3, wherein The metal particles are silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), nickel (Ni), chromium (Cr), lead (Pb), cobalt (Co), rhodium (Rh), ruthenium (Ru), tin (Sn), iridium (Ir), palladium (Pd), titanium (Ti) at least one of the manufacturing method of the thin antistatic hard coating film characterized in that it is used. The method of claim 3, wherein The inorganic oxide is a metal oxide, but ITO, ATO, SiO ₂ , TiO ₂ , Al ₂ O ₃ , B ₂ O ₃ , CaO, SnO, MgO, SrO, ZnO, ZrO ₂ , Y ₂ O ₃ , La ₂ O Method for producing a thin antistatic hard coating film, characterized in that using at least one of _three . The method of claim 6, The metal oxide has a particle size of 0.05㎛ to 1㎛ characterized in that the manufacturing method of the thin antistatic hard coating film. The method of claim 1, The antistatic hard coating layer is a manufacturing method of a thin antistatic hard coating film, characterized in that the thickness is made to 2㎛ to 10㎛. The method of claim 1, The photopolymerization initiator in step (a) is diethoxyacetphenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 1-hydroxycyclohexyl-phenylketone, 2-methyl- Acetphenones such as 2-morphine (4-thiomethylphenyl) propane-1-one, benzoin ethers such as benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether, and benzophenone methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfonic acid, 4-benzoyl-N, N-dimethyl-N- [2- (1-oxo-2-propenyloxy Ethyl] Benzophenone, such as benzene methananium bromide and (4-benzoyl benzyl) trimethylammonium chloride, Thioxanthone, such as 2, 4- diethyl thioxanthone and 1-chloro-4- dichloro thioxanthone , 2, 4, 6-trimethylbenzoyldiphenylbenzoyl oxide at least one of the manufacturing method of the thin antistatic hard coating film. A thin antistatic hard coating film, which is produced by the manufacturing method according to any one of claims 1 to 9.

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