KR100615835B1 - Apparatus for forming an alignment pattern of a liquid crystal display device and method for forming the alignment pattern using the same - Google Patents

Abstract

The present invention relates to an alignment pattern forming apparatus for a liquid crystal display device and an alignment pattern forming method using the same. In the present invention, an alignment pattern forming apparatus including a hot plate, a laser tool, and a mask plate is provided. Using a laser tool, the alignment film raw material liquid applied on the substrate is optically patterned. Of course, in this case, the alignment layer raw material liquid may be subjected to a rapid patterning process without direct contact with other instruments.

When the present invention is achieved, in the production line, the contact between the alignment film and the rubbing land is blocked in advance, thereby preventing unnecessary "generation of foreign objects" and "generation of static electricity", thereby eliminating them separately. The additional process of may be omitted, and as a result, the function and product yield of the final liquid crystal display device may be improved to a certain level or more.

In addition, when the present invention is achieved, the production line can be uniformly secured by adjusting the transmittance of the laser beam, thereby inducing uniform alignment of the liquid crystals in contact with the alignment patterns, As a result, the image quality of the finally completed liquid crystal display device can be secured to an appropriate level or more.

Description

Apparatus for forming an alignment pattern of a liquid crystal display device and method for forming the alignment pattern using the same}

1 is a flow chart sequentially showing a method of forming an alignment pattern according to the present invention.

Figure 2 is an exemplary view showing an alignment film raw material coating process for implementing the present invention.

3 is an exemplary view showing an alignment pattern forming apparatus according to an embodiment of the present invention.

Figure 4 is an illustration showing the shape of the alignment film implemented by an embodiment of the present invention.

5 is an enlarged view illustrating a portion A of FIG. 3.

6 is a side cross-sectional view of FIG.

7 is an exemplary view showing an alignment pattern forming apparatus according to another embodiment of the present invention.

8 is an exemplary view showing a shape of an alignment layer implemented by another embodiment of the present invention.

The present invention relates to an alignment pattern forming apparatus for a liquid crystal display device, and more particularly, to change an alignment pattern forming method of an alignment layer from a conventional mechanical contact method to an optical non-contact method, thereby contacting an alignment film with a rubbing surface. The present invention relates to an alignment film alignment apparatus which can prevent "producing foreign material", "generating static electricity", "bad profile of alignment patterns", and the like, by blocking in advance. Furthermore, the present invention relates to a method of forming an orientation pattern using such an orientation pattern forming apparatus.

Recently, as the modern society becomes the information society, the importance of the liquid crystal display device, which is one of the information display devices, is gradually increasing. Especially, due to its advantages such as small size, light weight, low power consumption, liquid crystal display Devices are increasingly being used as an alternative means of overcoming the drawbacks of the Cathode Ray Tube (CRT).

In general, such a liquid crystal display device has a structure in which liquid crystal molecules are injected between two glass substrates. In this case, the liquid crystal molecules injected between the organic substrates are arranged in a specific direction in accordance with an electrical signal applied from the outside and are dynamic. By causing scattering, it serves to ensure that the light transmittance of the device is adjusted to an appropriate amount.

In this case, in order for the liquid crystal display device to exhibit a particular optical effect, it is necessary to align the liquid crystal molecules in a specific direction. Since the conventional liquid crystal molecules are only locally oriented, in the conventional production line, the liquid crystal molecules are aligned in a specific direction. In order to achieve this, an organic polymer film in direct contact with liquid crystal molecules is artificially formed on the ITO electrode. Such an organic polymer film is usually referred to as an alignment film.

In a conventional production line, a rubbing cloth made of, for example, rayon, nylon, or the like is wound on a roller, and then the roller is brought into contact with the alignment film and rubbed with the surface of the alignment film, whereby the alignment film is "uniaxially oriented (or more than a predetermined level). Uni-directional alignment "and" a range of pretilt angles "are induced to be formed. In a conventional production line, such a process is commonly referred to as a "rubbing process".

The rubbing process of an alignment film according to the prior art is described in, for example, US Patent No. 4634228, "Ferroelectric liquid crystal cell with rubbed polyimide alignment layer", US Patent No. 5400159 " Liquid crystal device having alignment film with particular surface energy difference before and after rubbing ", US Patent Publication No. 5710610" Rubber applied to thin film transistors Apparatus and method for creating multiple tilt angles by rubbing the alignment layer applied to thin film transistors and color filter glass plate of a liquid crystal display ", US Patent No. 5744203 "Alignment layer for liquid crystal" It is shown in more detail in the back.

In a conventional production line, for example, an alignment film raw material liquid composed of "polyamic acid", "soluble polyimide", or the like is applied onto a substrate, and then pre-cured at about 60 ° C to 80 ° C with the alignment film raw material solution. curing) process and the rubbing process mentioned above with the polyimide oriented film by carrying out polyimide of the polyamic acid and soluble polyimide which were mentioned above, for example, by carrying out the main-curing process of about 180 to 200 degreeC. By advancing, the final completed alignment film can be formed a series of alignment patterns.

Thereafter, the production line cleans the surface of the alignment layer through a separate washing process using a cleaning solution, so that the final alignment layer can maintain the cleanliness above a predetermined standard.

However, there are some serious problems with this conventional method of forming an alignment pattern.

As described above, in the conventional production line, the rubbing process is performed with a polyimide oriented film so that the final oriented film can be formed with a series of alignment patterns. It is in direct contact with the structure.

As such, when the conventional rubbing process is performed while the rubbing land of the roller is in direct contact with the alignment layer, various foreign substances such as particles and debris remain on the surface of the final alignment patterns. By continuing to exist in the liquid crystal display device shipped, it greatly affects the function of the liquid crystal display device.

As described above, in order to remove such foreign matters, since a separate washing process must be performed at the last step of the rubbing process, the entire process becomes complicated and the process efficiency must be taken.                         

On the other hand, as described above, when the rubbing process is carried out, the roller on which the rubbing land is mounted causes extensive friction with the surface of the alignment layer. In this case, strong static electricity is generated on the surface of the alignment layer, and the static electricity is finally completed. By remaining in the liquid crystal display device, the thin film transistors formed on the substrate are damaged, resulting in a problem that the function of the liquid crystal display device is remarkably degraded and the yield of the product is remarkably degraded.

Moreover, since the conventional rubbing process is essentially a "mechanical method" in which the rubbing land and the alignment film are in direct contact, it is inevitable that in the production line, the shape of the final alignment patterns cannot be precisely controlled. You have to take it.

If the shape of the corresponding alignment patterns is not precisely controlled, and each of the alignment patterns has a "non-uniform profile" or a "partially broken profile", the liquid crystals in contact with the alignment patterns do not have a smooth alignment. As a result, the final liquid crystal display device does not maintain excellent image quality.

Accordingly, an object of the present invention is to change the alignment pattern formation method from the conventional mechanical contact method to the optical non-contact method, and through this, by blocking the contact between the alignment film and the rubbing surface in advance, the foreign material existing on the surface of the alignment patterns To prevent creation in advance.

Another object of the present invention is to prevent the static electricity is generated on the surface of the alignment film by blocking the contact between the alignment film and the rubbing land.

Another object of the present invention is to block the generation of "foreign material", "electrostatic" and the like remaining on the surface of the alignment pattern in advance, thereby improving the function and product yield of the final liquid crystal display device to a certain level or more.

Still another object of the present invention is to greatly simplify the overall alignment layer alignment process by blocking the generation of "foreign material" remaining on the surfaces of the alignment patterns in advance, thereby omitting a separate cleaning process.

Another object of the present invention is to use an optical method to form the alignment patterns of the alignment layer, thereby ensuring a uniform profile of the respective alignment patterns, so that the liquid crystal in contact with them can maintain a uniform alignment, and eventually Therefore, the final liquid crystal display device can exhibit excellent image quality.

Still other objects of the present invention will become more apparent from the following detailed description and the accompanying drawings.

In order to achieve the above object, in the present invention, the alignment pattern formation method of the alignment layer is changed from the conventional mechanical contact method to the optical non-contact method.

To this end, in the present invention, an alignment pattern forming apparatus including a hot plate, a laser tool, and a mask plate is provided, and the alignment film raw material liquid applied on the substrate is optically oriented using the laser tool of the alignment pattern forming apparatus. . Of course, in this case, the alignment layer raw material liquid may be subjected to a rapid alignment process without direct contact with other instruments.

At this time, the hot plate is a substrate to which the alignment film raw material liquid is applied to selectively apply heat of a constant temperature, for example, a temperature range of 60 ° C to 150 ° C, thereby promoting rapid polyimidization of the alignment film raw material liquid, and finally, the alignment film raw material liquid The fabrication is completed with the alignment film having the final completed structure.

Here, when the curing of the alignment film raw material liquid by the above-mentioned hot plate advances, the laser tool irradiates a laser beam having a wavelength of, for example, 535 nm or less with the above-mentioned alignment film raw material liquid, and thus, a predetermined depth to the final completed alignment film. A plurality of alignment patterns are formed by the grooves of the grooves.

At this time, the mask plate is interposed between the laser tool and the substrate to selectively transmit the laser beam irradiated from the laser tool, thereby adjusting the depth and width of the groove inclined surface. In this case, the mask plate selectively emits a laser beam so that the ratio of the width and depth of the inclined surface is, for example, 1: 4 to 1:20, and maintains the width of the inclined surface, for example, about several nm to several hundred nm, and the average of the inclined surfaces. Maintain depths of tens of nm to thousands of nm.

When the present invention is achieved, in the production line, the contact between the alignment film and the rubbing land is blocked in advance, thereby preventing unnecessary "generation of foreign objects" and "generation of static electricity", thereby eliminating them separately. The additional process of may be omitted, and as a result, the function and product yield of the final liquid crystal display device may be improved to a certain level or more.

In addition, when the present invention is achieved, the production line can be uniformly secured by adjusting the transmittance of the laser beam, thereby inducing uniform alignment of the liquid crystals in contact with the alignment patterns, As a result, the image quality of the finally completed liquid crystal display device can be secured to an appropriate level or more.

Hereinafter, an alignment pattern forming apparatus for a liquid crystal display device and an alignment pattern forming method using the same will be described in detail with reference to the accompanying drawings.

First, as shown in FIG. 1, in the production line, a process of applying the alignment film raw material liquid onto a substrate is performed (step S1).

At this time, as shown in Figure 2, the alignment film raw material solution, for example, the polyimide acid solution supplied by the dispenser 16 of the alignment film coating device 10, the rubber doctor doctor roll 15 and the ceramic anilox roll After sticking in between (14), it flows down by rotation of the doctor roll 15 and the anilox roll 14, and is adhered to the printing plate 18 wound on the outer peripheral surface of the plate roll 13.

In this case, when the plate roll 13 starts to rotate, the pinion gear 12 rotates while power is applied to the motor (not shown), and according to the rotation of the pinion gear 12, the power of the motor Is transmitted to the rack gear 11, and the table 17 on which the substrate 1 is mounted is advanced at a constant speed by the transmitted power. In this case, the rotational speed of the plate roll 13 and the advancing speed of the table 17 are set equal to each other.

At this time, the printing plate 18 which has received all of the alignment film raw material liquid is in contact with the substrate 1 which is rotated by the rotation of the plate roll 13 and is advanced to its bottom, and finally, the surface of the substrate 1 is thin. The thickness of the alignment film raw material liquid is transferred.

Meanwhile, as shown in FIG. 3, the alignment film raw material liquid 2 coated on the substrate 1 is cured in a predetermined region of the production line, and a plurality of alignment patterns are formed on the alignment film raw material liquid 2. The alignment pattern forming apparatus 100 is disposed.

As shown in the figure, the alignment pattern forming apparatus 100 includes a hot plate 200 and a laser tool 20 disposed to face each other, and is interposed between the hot plate 200 and the laser tool 20. It is made of a combination of mask plates 30.

At this time, the hot plate 200 is connected to an external power source (not shown), and receives electrical energy, and then a predetermined temperature, for example, 60 ° C. to 150 ° C. to the substrate 1 to which the alignment layer raw material liquid 2 is applied. By applying heat in the temperature range, it is possible to promote the rapid polyimidization of the alignment film raw material liquid 2, and finally, to make the alignment film raw material liquid 2 be manufactured into an alignment film having a final completed structure. .

In addition, when the curing of the alignment film raw material liquid 2 by the hot plate 200 proceeds as described above, the laser tool 20 uses a wavelength of 535 nm or less, for example, as the alignment film raw material liquid 2 described above. By irradiating a laser beam having a role, a plurality of alignment patterns can be formed in a final alignment layer. As the laser tool 20 of the present invention, for example, Nd: YAG laser, Ar laser, Kr laser and the like can be variously selected according to the situation of the production line.

At this time, the mask plate 30 is interposed between the laser tool 20 and the substrate 1 to selectively transmit the laser beam irradiated from the laser tool 20, thereby the depth and width of each groove separating the alignment patterns. It can play a role in controlling this ratio.

Hereinafter, the alignment pattern forming process of the alignment film raw material liquid using the alignment pattern forming apparatus 100 of the present invention having the above-described components will be described in detail.

First, when all the application process (step S1) of the above-mentioned alignment film raw material solution is completed, a process of heating the alignment film raw material solution and performing primary curing is performed in the production line (step S2).

In this case, in the production line, as shown in the drawing, the substrate 1 to which the alignment layer raw material liquid 2 is applied is loaded on the hot plate 200, and then electric energy of a predetermined size is transferred to the hot plate 200. By adding, the hot plate 200 can heat the alignment film raw material liquid 2 at the temperature of about 60 to 80 degreeC, for example. In this case, the alignment film raw material liquid 2 applied on the substrate 1 is primarily cured by heat transferred from the hot plate 200, thereby forming a basic profile of the final alignment film.

After the primary curing process of the alignment film raw material liquid has been progressed to some extent, the production line proceeds to heat the alignment film raw material liquid 2 to a higher temperature and to perform secondary curing (step S3).

In this case, in the production line, by applying stronger electric energy to the hot plate 200 described above, the hot plate 200 can heat the alignment film raw material liquid 2 at a temperature of, for example, about 100 ° C to 150 ° C. Make sure In this case, the alignment film raw material solution 2 in the state where the primary curing is completed through the above-described process is secondaryly cured by additional heat transferred from the hot plate 200, thereby causing a rapid polyimidization reaction. Curing is completed with the alignment film of the structure.

When this secondary curing process proceeds, care is taken in the production line so that the heating temperature of the hot plate 200 does not exceed 150 ° C. This is because if the heating temperature of the hot plate 200 exceeds 150 ° C., the heat of the hot plate 200 causes an unnecessary chemical transition of the alignment film raw material liquid 2, so that the alignment film raw material liquid 2 is optically unreacted. This can be caused by a problem of reaching.

In the case of the present invention, unlike the conventional method, since the alignment patterns must be formed in the alignment film raw material liquid 2 by using an optical method described below, for example, irradiation of a laser beam, the optical reaction of the alignment film raw material liquid 2 is required. Is a very important factor in achieving the present invention, and if the alignment film raw material liquid 2 reaches an optically non-reactive state, a problem may arise that the present invention itself cannot be established. In order to prevent this in advance, in the present invention, the temperature of the secondary curing process is necessarily maintained at 150 ° C or less.

When all of the secondary curing process of the present invention is completed, the alignment film raw material solution 2 exhibits, for example, a polyimide rate of about 75% to 85%.

Subsequently, in the production line, a process of forming a plurality of alignment patterns on the surface of the alignment film raw material 2 by scanning a laser beam of a predetermined wavelength with the alignment film raw material 2 through the operation of the above-described radar tool 20. Proceed to step S4. As described above, when the scanning process of the laser beam proceeds, the secondary curing process of the alignment film raw material liquid 2 described above maintains a continuous progress state without a separate intermediate step.

At this time, as shown in the figure, the mask plate 30 includes light transmitting filters 32 for transmitting a laser beam emitted from the laser tool 20 and light blocking filters 31 for shielding the laser beam. They are arranged in bands. In this case, each of the light transmitting filters 32 and the light blocking filters 31 is continuously alternating, where each of the light blocking filters 31 has a larger width than that of each of the light transmitting filters 32. To achieve.

When the laser plate is irradiated from the laser tool 20 with the mask plate 30 having the structure interposed between the laser tool 20 and the substrate 1, the light transmitting filters 32 of the mask plate 30 are formed. After passing through the laser beam having reached the alignment film raw material liquid 2 applied to the substrate 1, the alignment film raw material liquid 2 is quickly melted, and as shown in FIG. A plurality of grooves 2b separating the alignment patterns 2a are formed on the surface of 2).

This laser beam scanning process is performed at a point similar to the above-mentioned secondary curing process (step S3) of the alignment film raw material solution described above.

For example, in the production line, after the secondary curing process of the alignment film raw material liquid 2 is started, at about 3 minutes have elapsed, the laser beam is scanned with the alignment film raw material liquid 2, and the alignment film raw material liquid ( A plurality of grooves 2b are formed on the surface of 2). Of course, the secondary curing process of the alignment layer raw material liquid 2 starts and at the same time the laser beam is scanned with the alignment layer raw material liquid 2 to form a plurality of grooves 2b on the surface of the alignment layer raw material liquid 2 to achieve the present invention. There is nothing wrong with that. As such, the scanning point of the laser beam may be flexibly selected according to the situation of the production line.

In this case, in the production line, the width W and the depth D of the grooves 2b described above may be adjusted, for example, to achieve a ratio of 1: 4 to 1:20.

As such, in the production line, the reason for adjusting the ratio of the width W and the depth D of the grooves 2b is that the width W and the depth D of the grooves 2b are 1: 4 to 1:20. In this case, the liquid crystal to be injected next, for example, the temperature-transfer type liquid crystal can maintain a very good uniaxial orientation.

In addition, in the production line, the width W of the grooves 2b may be maintained, for example, in the range of several nm to several hundred nm, and the depth D of the grooves 2b may be maintained in the range of, for example, several tens of nm to several thousand nm. Adjust the laser beam projection environment.

As such, in the production line, the reason for adjusting the range of the width W and the depth D of the grooves 2b is that when the width W and the depth D of the grooves 2b maintain the above-mentioned range, This is because the liquid crystal can maintain a more stable alignment state.

At this time, in the production line, the width W and the depth D of the grooves 2b to be finished are maintained at a ratio of 1: 4 to 1:20, and the ranges are several nm to several hundred nm and several tens of nm, respectively. In order to be able to maintain thousands of nm, the width W of the grooves 2b can be adjusted, for example, the width of the light transmitting filters 32 and in conjunction with the grooves 2b A factor that can adjust the depth D) of, for example, the "laser beam intensity" of the laser tool 20 is adjusted.

For example, in the production line, the widths of the light transmitting filters 32 are maintained at, for example, 100 nm such that each of the grooves 2b has a width W of 100 nm, and each of the grooves 2b has a depth D of 1500 nm. The "laser beam intensity" of the laser tool 20 is maintained at 150 watts, for example.

In this case, each of the grooves 2b formed by the laser beam irradiation process can maintain a width of 100 nm and a depth of 1500 nm, thereby providing a ratio of "1: 4-1: 20" and "several nm". ~ Hundreds of nm, tens of nm to thousands of nm "can be satisfied.

At this time, in the production line, the photosensitive material for further promoting the melting of the alignment film raw material liquid 2 is further mixed in the alignment film raw material liquid 2. In this case, the melting temperature of the alignment film raw material liquid 2 is significantly lower than when the photosensitive material is not mixed. In the production line, grooves 2b of the same depth are used while using a "weak intensity laser beam". Can be formed.

In the above-described example, in the production line, the "laser beam intensity" of the laser tool 20 was maintained at 150 watts to form grooves 2b having a depth of 1500 nm, but the photosensitive property described above in the alignment film raw material liquid 2. When further mixing the material, the production line can form grooves 2b having a depth of 1500 nm while maintaining the "laser beam intensity" of the laser tool 20 at 100 watts. In this case, the production line can obtain the additional effect of significantly lowering the overall product cost.

In other words, in the present invention, when the secondary curing process of the alignment film raw material liquid 2 proceeds, the above-described laser beam is scanned at a similar point in time, and through this, the surface of the alignment film raw material liquid 2 which has undergone some curing is fixed. By forming the grooves 2b having a depth, the liquid crystal injected by the next liquid crystal injection process provides a foundation for maintaining the uniaxial orientation of a predetermined level or more.

On the other hand, in the production line, by dispersing the intensity of the laser beam reaching the alignment patterns (2a), the degree of melting of the alignment patterns (2a) are differentiated by position, whereby each alignment pattern (2a) is shown in the figure It is possible to achieve the projection shape as shown. As such, in the present invention, each of the alignment patterns 2a is formed in the shape of a protrusion because, when each of the alignment patterns 2a forms a protrusion by the intensity distribution of the laser beam, each of the protrusions has a predetermined size. This is because the inclination angle of the liquid crystal injected into the next by the inclination angle of the protrusions can secure a stable pretilt angle.

To this end, in the present invention, as shown in FIG. 5, a plurality of light emission control cells 33 are continuously disposed at a predetermined pitch P1 in light blocking filters 31 corresponding to the alignment patterns 2a.

 At this time, each of the light emission control cells 33 is formed by a step coated with a dye having a different concentration step by step, by the difference in the concentration of the dye, each light emission control cells 33 has its own edge As it progresses from the surface to the other edge surface, it has a high light blocking property step by step.

For example, as shown in the drawing, each of the light emission control cells 33 is coated with dyes having different concentrations in the areas from the area 33a to the area 33d, so as to have a high light shielding step by step.

In this case, since the region 33a of the light emission control cell 33 has a structure in which no dye is coated, the laser beam incident from the laser tool 20 can be transmitted through the whole quantity alignment film raw material liquid 2, Since the region 33b has a structure in which the dye is coated thinly, the laser beam incident from the laser tool 20 can be blocked by, for example, about 30%, and then transmitted through the alignment film raw material liquid 2, and the region 33c is formed by the dye. Since the structure is more heavily coated, the laser beam incident from the laser tool 20 can be shielded by, for example, about 70% and transmitted to the alignment layer raw material liquid 2, and the region 33d is coated with the dye dark black. Since the structure is provided, the total amount of the laser beam incident from the laser tool 20 can be shielded.

As described above, when the laser tool 20 outputs a laser beam while the light emission control cells 33 have a high light shielding property in stages from their edge surfaces to other edge surfaces, the laser tool 20 The laser beam output from the light beam is selectively transmitted through the light blocking filter 31 by the action of the light emission control cells 33, thereby receiving its melt strength by position of the alignment film raw material solution. The alignment patterns 2a exhibit different degrees of melting for each position, and as a result, as shown in FIG. 6, each of the alignment patterns 2a forms a protrusion having a predetermined pitch P2. Of course, since each of the alignment patterns 2a is formed based on the light emission control cells 33, the pitch P2 of each of the alignment pattern 2a is the pitch P1 of the light emission control cells 33 described above. To maintain the same spacing.

At this time, in the production line, the projection environment of the laser beam is appropriately adjusted so that each alignment pattern 2a can maintain the relationship of Equation 1 described later.

P2> = D

Where P2 is the pitch of each alignment pattern and D is the depth of each groove.

As such, in the production line, the reason why the light emission environment of the laser beam is adjusted so that each of the alignment patterns 2a maintains the above-described relationship of Equation 1 is that each of the alignment patterns 2a is described in This is because when the relationship of Equation 1 is achieved, the liquid crystal 300 to be injected next may maintain its wire diameter square theta value in a more stable value, for example, in the range of 1 ° to 10 °.

As such, in order to maintain each of the alignment patterns 2a in the above Equation 1, in the production line, a factor capable of adjusting the pitch P2 of each of the alignment patterns 2a, for example, The laser beam transmission energy per unit pitch of each light emission control cell 33 is adjusted. The " laser beam transmission energy per unit pitch " of the light emission control cells 33 is usually expressed by a value of Equation 2 described later.

는 레이저빔의 최대 투과에너지 및 최소 투과에너지의 차, P1은 각 투광량 조절셀들의 피치) (here,

Is the difference between the maximum transmission energy and the minimum transmission energy of the laser beam, P1 is the pitch of each light emission control cell)

At this time, in the production line, since "each alignment pattern 2a is formed based on each light emission control cell 33, the pitch P2 of each alignment pattern 2a is the same as the pitch P1 of the light emission control cells. Maintain the spacing "to adjust the value equal to P2, that is, the value of P1 to be greater than the value of D. In this case, each of the finally formed alignment patterns may maintain the above-described relationship of Equation 1, that is, "P2> = D".

의 값은 사용되는 레이저툴의 종류에 따라서, 다양하게 선택될 수 있다. here,

The value of may vary depending on the type of laser tool used.

"로 조절하게 되며, 이 경우, 돌기형상의 배향패턴들(2a)은 <수학식 1>의 관계를 만족시킬 수 있게 되고, 결국, 차기에 주입되는 액정(300)의 선경사각 theta 는 최적의 값으로 안정화될 수 있게 된다.If the depth D of the grooves 2b is selected to be 1500 nm through the above-described process, in the production line, " transmission energy per unit pitch "

In this case, the projection-shaped alignment patterns 2a can satisfy the relationship of Equation 1, and thus, the pretilt angle theta of the liquid crystal 300 to be injected next is optimal. Value can be stabilized.

When the present invention is achieved, in the production line, the alignment pattern formation method of the alignment film is changed from a conventional mechanical contact method to an optical non-contact method, for example, a laser beam irradiation method, thereby preventing contact between the alignment film and the rubbing surface in advance. In this way, it is possible to prevent "generating foreign matter", "generating static electricity", and the like, and, as a result, to improve the function and product yield of the finally completed liquid crystal display device to a certain level or more.

In addition, when the present invention is achieved, in the production line, it is possible to easily ensure a uniform profile of each of the alignment patterns 2a by adjusting the transmittance of the laser beam, thereby contacting the alignment patterns 2a. Uniform alignment of the liquid crystals 300 may be easily induced, and as a result, an image quality of the finally completed liquid crystal display device may be secured to an appropriate level or more.

Moreover, when the present invention is achieved, since the formation method of the alignment pattern 2a of the alignment film can be changed from the conventional mechanical contact method to the optical non-contact method, the " foreign material " remaining on the surface of the alignment patterns can be removed. The necessity of carrying out a separate cleaning process for removal can be eliminated and, as a result, the overall alignment film alignment process can be greatly simplified.

Meanwhile, in another embodiment of the present invention, the mask plate 40 may be formed in a structure as shown in FIG. 7. In this case, the light blocking filters 41 have a structure in which the front surface is coated with a dark dye in a state in which the light emission control cells 33 are not provided. Of course, the light transmitting filters 42 have the same structure as in the above-described embodiment.

Transmitting filters 42 of the mask plate 40 when the laser beam is irradiated from the laser tool 20 with the mask plate 40 having the structure interposed between the laser tool 20 and the substrate 1. After passing through the laser beam having reached the alignment film raw material liquid 2 applied to the substrate 1, the alignment film raw material liquid 2 is rapidly melted, and as shown in FIG. 8, the alignment film raw material liquid ( A plurality of grooves 2b separating the alignment patterns 2a are formed on the surface of 2).

In this case, as described above, since the light blocking filters 41 do not have the above-described light emission control cells 33, the entire surface of the light blocking filters 41 has a structure coated with a dark dye, the light blocking filters ( Unlike the above-described embodiment, 41) shields the laser beam incident from the laser tool 20 by 100%.

In this state, when the laser tool 20 outputs the laser beam, the laser beam output from the laser tool 20 toward the alignment film raw material liquid 2 is shielded by 100% by the action of the light blocking filters 41, It is impossible to reach the alignment film raw material liquid 2, and as a result, as shown in the drawing, each of the final alignment patterns 2a, unlike the above-described embodiment, does not form a protrusion shape.

In other words, in another embodiment of the present invention, by forming grooves 2a having a predetermined depth on the surface of the alignment film raw material liquid 2 to which the curing has been advanced to some degree, the uniaxial alignment of the liquid crystal is ensured, but the respective alignment patterns ( 2b) is not provided with a separate projection, so that the pretilt angle of the liquid crystal 300 is not secured.

Another embodiment of the present invention has a more excellent effect in the liquid crystal display device of the mode in which the uniaxial orientation of the liquid crystal 300 is more important than the pretilt angle of the liquid crystal 300, for example, the IPS mode liquid crystal display device.

Of course, also in this embodiment of the present invention, the width W and depth D of the grooves (2a), for example to achieve a ratio of 1: 4 ~ 1:20 to suitably adjust the light emitting environment of the laser beam. In addition, the width W and the depth D of the grooves are adjusted to the light emission environment of the laser beam so as to maintain the range of several nm to several hundred nm and several tens of nm to several thousand nm, respectively. In this case, the liquid crystal 300 to be injected next may maintain a very stable uniaxial orientation.

Also in this other embodiment of the present invention, similarly to the above-described embodiment, the photosensitive material for further promoting the melting of the alignment film raw material liquid 2 is further mixed inside the alignment film raw material liquid 2. In this case, the melting temperature of the alignment film raw material liquid is significantly lowered, and in the production line, grooves 2b of the same depth can be formed by using a more "weak intensity laser beam".

As described above, in the present invention, the alignment method of the alignment film is changed from the conventional mechanical contact method to the optical non-contact method, thereby preventing the contact between the alignment film and the rubbing land in advance, thereby creating "foreign material", It is possible to prevent "generation of static electricity", "bad profile of orientation patterns", and the like.

The present invention exhibits an overall useful effect in various kinds of liquid crystal display devices manufactured in a production line.

And while certain embodiments of the invention have been described and illustrated, it will be apparent that the invention may be embodied in various modifications by those skilled in the art.

Such modified embodiments should not be understood individually from the technical spirit or point of view of the present invention and such modified embodiments should fall within the scope of the appended claims of the present invention.

As described in detail above, in the alignment pattern forming apparatus for the liquid crystal display device and the alignment pattern forming method using the same according to the present invention, a combination of a hot plate, a laser tool, and a mask plate is provided, and the laser tool of the device is used. Then, the alignment film raw material liquid applied on the substrate is optically oriented. Of course, in this case, the alignment layer raw material liquid may be subjected to a rapid alignment process without direct contact with other instruments.

When the present invention is achieved, in the production line, the contact between the alignment film and the rubbing land is blocked in advance, thereby preventing unnecessary "generation of foreign objects" and "generation of static electricity", thereby eliminating them separately. The additional process of may be omitted, and as a result, the function and product yield of the final liquid crystal display device may be improved to a certain level or more.

In addition, when the present invention is achieved, the production line can be uniformly secured by adjusting the transmittance of the laser beam, thereby inducing uniform alignment of the liquid crystals in contact with the alignment patterns, As a result, the image quality of the finally completed liquid crystal display device can be secured to an appropriate level or more.

Claims (17)

A hot plate for curing the alignment film raw material liquid while the substrate on which the alignment film raw material liquid is formed is mounted; The alignment film raw material liquid is disposed on the hot plate, and the laser beam is scanned with the alignment film raw material liquid while the alignment film raw material liquid is cured by the action of the hot plate. A laser tool for forming a plurality of alignment patterns separated by grooves on a surface of the groove; Light transmission filters disposed between the laser tool and the substrate to transmit the laser beam, and a plurality of light emission control cells each having a high light shielding property with respect to the laser beam from an edge to another edge at a constant pitch An alignment pattern forming apparatus for a liquid crystal display device, characterized in that the light blocking filters formed include a mask plate formed alternately. delete The alignment pattern forming apparatus of claim 1, wherein the light transmitting filter transmits the laser beam such that a ratio of widths and depths of the grooves is 1: 4 to 1:20. 4. The alignment pattern forming apparatus for a liquid crystal display device according to claim 3, wherein the light transmitting filter transmits the laser beam such that the width of each groove is several nm to several hundred nm. 4. The alignment pattern forming apparatus of claim 3, wherein the light transmitting filter transmits the laser beam such that the depth of each groove is several tens of nm to several thousand nm. delete The alignment pattern forming apparatus for a liquid crystal display device according to claim 1, wherein the light emission control cells transmit the laser beam to satisfy the following equation. P2> = D Where P2 is the pitch of each alignment pattern and D is the depth of each groove. Applying an alignment layer raw material liquid onto a substrate; Primary curing the alignment film raw material liquid at a temperature of 60 ° C to 80 ° C; Performing secondary curing of the alignment film raw material liquid at a temperature of 100 ° C. to 150 ° C. to polyimide the alignment film raw material liquid; And irradiating a laser beam in a state in which the secondary curing process of the alignment film raw material liquid is in progress to form alignment patterns separated by a plurality of grooves on the surface of the alignment film raw material liquid. Method of forming an orientation pattern for a display device. delete delete delete 10. The method of claim 8, wherein the alignment layer raw material liquid is further mixed with a photosensitive material for promoting melting of the alignment layer raw material liquid. delete delete The alignment pattern of claim 8, wherein, in the process of irradiating the laser beam to the alignment layer raw material solution, the alignment patterns are selectively melted by the dispersion of the intensity of the laser beam to form protrusions. Formation method. The method of claim 15, wherein intensity dispersion of the laser beam is achieved by selectively transmitting the laser beam. The method of claim 16, wherein the laser beam maintains a wavelength of 535 nm or less.

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