KR100596324B1 - 플라즈마 처리장치 - Google Patents
플라즈마 처리장치 Download PDFInfo
- Publication number
- KR100596324B1 KR100596324B1 KR1020040068069A KR20040068069A KR100596324B1 KR 100596324 B1 KR100596324 B1 KR 100596324B1 KR 1020040068069 A KR1020040068069 A KR 1020040068069A KR 20040068069 A KR20040068069 A KR 20040068069A KR 100596324 B1 KR100596324 B1 KR 100596324B1
- Authority
- KR
- South Korea
- Prior art keywords
- chamber
- electrode
- plasma processing
- processing apparatus
- viewport
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (2)
- 내부에 상부 전극이 마련되는 상부 챔버;내부에 하부 전극이 수용되며, 상부 챔버와 결합되어 내부에 진공을 형성하고 상기 하부 전극과 챔버 바닥과의 이격된 사방에 직립된 상태로 고정 설치하는 측판이 마련된 하부 챔버;상기 하부 챔버의 일측벽 중 하부 전극 일측에 적어도 하나 이상 마련되는 뷰포트(View Port);상기 뷰포트와 동일 선상에 위치된 측판의 소정 위치에 형성되어 내부를 투시할 수 있게 적어도 하나 이상 마련되는 투시창;을 포함한 것을 특징으로 하는 플라즈마 처리장치.
- 제 1항에 있어서, 상기 투시창과 뷰포트는,퀄츠(Quartz) 재질로 마련되는 것을 특징으로 하는 플라즈마 처리장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040068069A KR100596324B1 (ko) | 2004-08-27 | 2004-08-27 | 플라즈마 처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040068069A KR100596324B1 (ko) | 2004-08-27 | 2004-08-27 | 플라즈마 처리장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060019400A KR20060019400A (ko) | 2006-03-03 |
KR100596324B1 true KR100596324B1 (ko) | 2006-07-06 |
Family
ID=37126799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040068069A KR100596324B1 (ko) | 2004-08-27 | 2004-08-27 | 플라즈마 처리장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100596324B1 (ko) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0621003A (ja) * | 1992-07-03 | 1994-01-28 | Tokyo Electron Ltd | プラズマ処理装置 |
KR20030094904A (ko) * | 2002-06-10 | 2003-12-18 | 삼성전자주식회사 | 반도체 제조설비의 투시창 |
KR20050112361A (ko) * | 2004-05-25 | 2005-11-30 | 삼성전자주식회사 | 기판 가공 장치 |
-
2004
- 2004-08-27 KR KR1020040068069A patent/KR100596324B1/ko active IP Right Review Request
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0621003A (ja) * | 1992-07-03 | 1994-01-28 | Tokyo Electron Ltd | プラズマ処理装置 |
KR20030094904A (ko) * | 2002-06-10 | 2003-12-18 | 삼성전자주식회사 | 반도체 제조설비의 투시창 |
KR20050112361A (ko) * | 2004-05-25 | 2005-11-30 | 삼성전자주식회사 | 기판 가공 장치 |
Also Published As
Publication number | Publication date |
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KR20060019400A (ko) | 2006-03-03 |
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