KR100548922B1 - Bisphenol-s epoxy resin and preparation thereof - Google Patents

Bisphenol-s epoxy resin and preparation thereof Download PDF

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KR100548922B1
KR100548922B1 KR1020020058837A KR20020058837A KR100548922B1 KR 100548922 B1 KR100548922 B1 KR 100548922B1 KR 1020020058837 A KR1020020058837 A KR 1020020058837A KR 20020058837 A KR20020058837 A KR 20020058837A KR 100548922 B1 KR100548922 B1 KR 100548922B1
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bisphenol
epoxy resin
type epoxy
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KR20040027095A (en
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박수진
이재락
진팬-롱
허건영
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한국화학연구원
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/30Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • C08G59/302Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • C08G59/06Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins

Abstract

본 발명은 하기 화학식 1의 비스페놀-S 에폭시 수지 및 이의 제조방법에 관한 것으로, 본 발명에 따라 비스페놀-S와 에피클로로히드린을 염기 촉매의 존재하에 반응시켜 얻은 비스페놀-S 타입 에폭시 수지는 우수한 물성을 가져 기존의 비스페놀-A 및 비스페놀-F 타입 에폭시 수지를 대체하여 우수한 성능을 지닌 매트릭스를 구현할 수 있다.The present invention relates to a bisphenol-S epoxy resin of Formula 1 and a method for preparing the same, wherein bisphenol-S type epoxy resin obtained by reacting bisphenol-S and epichlorohydrin in the presence of a base catalyst according to the present invention has excellent physical properties. It is possible to replace the existing bisphenol-A and bisphenol-F type epoxy resin to implement a matrix with excellent performance.

Figure 112002031729176-pat00001
Figure 112002031729176-pat00001

Description

비스페놀-S 에폭시 수지 및 이의 제조방법{BISPHENOL-S EPOXY RESIN AND PREPARATION THEREOF} Bisphenol-S epoxy resin and its manufacturing method {BISPHENOL-S EPOXY RESIN AND PREPARATION THEREOF}             

도 1은 본 발명에 따른 비스페놀-S 에폭시 수지를 디아미노디페닐메탄(DDM)을 이용하여 경화시킬 때의 경화 발열 곡선을 나타내는 그래프이고,1 is a graph showing a curing exotherm curve when the bisphenol-S epoxy resin according to the present invention is cured using diaminodiphenylmethane (DDM),

도 2는 본 발명에 따른 비스페놀-S 에폭시 수지를 프탈산무수물(PA) 또는 테레프탈산무수물(THPA)을 이용하여 경화시킬 때의 경화 발열 곡선을 나타내는 그래프이다.2 is a graph showing a curing exotherm curve when the bisphenol-S epoxy resin according to the present invention is cured using phthalic anhydride (PA) or terephthalic anhydride (THPA).

본 발명은 비스페놀-S 타입의 에폭시 수지 및 이의 제조방법에 관한 것으로, 더욱 상세하게는 주쇄에 설폰기를 가진 비스페놀-S와 에피클로로히드린을 출발물질로 하여 제조된 우수한 물성을 가진 에폭시 수지 및 이의 제조 방법에 관한 것이다.The present invention relates to a bisphenol-S type epoxy resin and a method for preparing the same, and more particularly, to an epoxy resin having excellent physical properties prepared by using bisphenol-S having a sulfone group and epichlorohydrin as a starting material and its It relates to a manufacturing method.

기존의 비스페놀 타입의 에폭시 수지로는 주로 하기 화학식 2와 하기 화학식 3의 비스페놀-A계 에폭시 수지(diglycidyl ether of bisphenol-A, DGEBA) 및 비스페놀-F계 에폭시 수지(diglycidyl ether of bisphenol-F, DGEBF)의 두 가지 타입이 상업적으로 제조되어 폭넓은 분야에서 널리 사용되고 있다.Existing bisphenol-type epoxy resins are mainly bisphenol-A epoxy resins (DGEBA) and bisphenol-F epoxy resins (diglycidyl ether of bisphenol-F, DGEBF) Two types of) are commercially manufactured and widely used in a wide range of applications.

Figure 112002031729176-pat00002
Figure 112002031729176-pat00002

Figure 112002031729176-pat00003
Figure 112002031729176-pat00003

그러나 이 두 수지, DGEBA와 DGEBF는 고온에서의 열안정성 저하로 고성능 구조재 재료로의 이용에 제한을 받아왔다. 따라서 근래에는 이러한 단점들을 개선한 새로운 물성을 가진 수지의 개발이 절실히 필요하게 되었고 주쇄에 다른 관능기들을 도입하여 수지의 물성을 향상시키는데 관심이 모아지고 있는 추세이다.However, these two resins, DGEBA and DGEBF, have been limited in their use as high-performance structural materials due to their low thermal stability at high temperatures. Therefore, in recent years, the development of a resin having a new physical property that improves these disadvantages is urgently needed, and attention is being drawn to improving the physical properties of the resin by introducing other functional groups in the main chain.

따라서, 본 발명의 목적은 기존의 비스페놀-A 및 비스페놀-F 타입 에폭시 수지보다 더 우수한 물성을 지닌 새로운 에폭시 수지를 제공하는 것을 목적으로 한다.
Accordingly, an object of the present invention is to provide a new epoxy resin having better physical properties than existing bisphenol-A and bisphenol-F type epoxy resins.

상기 목적을 달성하기 위하여 본 발명에서는, 하기 화학식 1의 비스페놀-S 타입 에폭시 수지를 제공한다:In order to achieve the above object, the present invention provides a bisphenol-S type epoxy resin of the following general formula (1):

화학식 1Formula 1

Figure 112005033343498-pat00016
Figure 112005033343498-pat00016

본 발명에서는 또한, 하기 화학식 4의 비스페놀-S와 하기 화학식 5의 에피클로로히드린을 염기 촉매의 존재하에 반응시킴을 포함하는 화학식 1의 비스페놀-S 타입 에폭시 수지의 제조방법을 제공한다:The present invention also provides a process for preparing a bisphenol-S type epoxy resin of formula (1) comprising reacting bisphenol-S of formula (4) with epichlorohydrin of formula (5) in the presence of a base catalyst:

Figure 112002031729176-pat00005
Figure 112002031729176-pat00005

Figure 112002031729176-pat00006
Figure 112002031729176-pat00006

이하 본 발명에 대하여 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail.

본 발명에 따르면, 하기 반응식 1과 같이 화학식 4의 비스페놀-S와 화학식 5의 에피클로로히드린을 염기 촉매의 존재하에 반응시켜, 주쇄에 설폰기를 함유한 반고형의 수지 형태인 화학식 1의 비스페놀-S 타입 에폭시 수지를 제조한다.According to the present invention, bisphenol-S of formula (4) and epichlorohydrin of formula (5) are reacted in the presence of a base catalyst as shown in Scheme 1 below to form a semi-solid resin containing a sulfone group in the main chain, S type epoxy resin is prepared.

Figure 112005033343498-pat00014
Figure 112005033343498-pat00014

본 발명에 따른 방법에서 비스페놀-S는 순도가 98% 이상인 것을 사용하는 것이 제조 수율을 높이는 한편 최종적으로는 제조된 수지의 순도와 기대되는 물성을 발휘하는데 효과적이다.In the method according to the present invention, the use of bisphenol-S having a purity of 98% or more is effective in increasing the production yield and finally in achieving the purity and expected physical properties of the produced resin.

출발물질로 사용되는 비스페놀-S 및 에피클로로히드린, 및 촉매는 몰비로서 1 몰 : 3∼5 몰 : 0.5∼1 몰 범위로 사용되는 것이 적합하다.Bisphenol-S and epichlorohydrin used as starting materials, and a catalyst are suitably used in a molar ratio in the range of 1 mol: 3-5 mol: 0.5-1 mol.

상기 방법에 있어서, 온도는 90 내지 140℃ 범위에서 진행하는 것이 부산물 생성 최소화, 에피클로로히드린 손실의 최소화, 및 분자량 조절에 적합하다. 촉매로는 NaOH가 바람직하게 사용될 수 있으며, 촉매로 사용되는 NaOH는 30 내지 45%의 농도를 갖는 것이 제조 수지의 변색, 부산물 생성 최소화 및 반응속도에 적합하다. 제조 공정 온도가 90℃보다 낮거나, NaOH의 농도가 30%이하에서는 반응이 느려지고 수분 제거와 교반이 어려워 원하는 수지를 얻기 어렵고, 제조 공정 온도가 140℃ 이상이거나, NaOH의 농도가 45% 이상에서는 반응이 짧은 시간에 이루어져 고분자량의 생성물을 얻을 수는 있지만 가교도가 급속히 증가하여 고상에 가까운 수지가 제조되어 성형가공에 매우 불리하게된다.In this method, the temperature is in the range of 90 to 140 ° C., which is suitable for minimizing by-product generation, minimizing epichlorohydrin loss, and molecular weight control. NaOH may be preferably used as the catalyst, and the NaOH used as the catalyst may have a concentration of 30 to 45%, which is suitable for discoloration of production resin, minimization of by-product formation, and reaction rate. When the manufacturing process temperature is lower than 90 ° C or the NaOH concentration is 30% or less, the reaction is slow and the water removal and stirring are difficult to obtain the desired resin, and when the manufacturing process temperature is 140 ° C or higher or the NaOH concentration is 45% or higher The reaction can be obtained in a short time to obtain a high molecular weight product, but the degree of crosslinking is rapidly increased to produce a resin close to a solid phase, which is very disadvantageous for molding.

상기 공정의 반응 시간은 6 ∼10시간 범위에서 수행될 수 있다.The reaction time of the process may be performed in the range of 6 to 10 hours.

본 발명의 방법에 따라 제조된 비스페놀-S 타입 에폭시 수지는 분자량이 1,000∼3,000 범위 정도이며, 이를 통상의 경화제, 예를 들면 아민 또는 산무수물 경화제로 경화시킴으로써 유리전이온도 75∼100℃의 매트릭스 수지를 구현할 수 있다.The bisphenol-S type epoxy resin prepared according to the method of the present invention has a molecular weight in the range of about 1,000 to 3,000, and a matrix resin having a glass transition temperature of 75 to 100 ° C. by curing it with a conventional curing agent such as an amine or an acid anhydride curing agent. Can be implemented.

본 발명에 따른 비스페놀-S 에폭시 수지는 난연성이 우수하고 다른 물성에 있어서도 종래의 비스페놀 A 또는 비스페놀 F 수지에 필적하거나 그에 비해 우수하다.The bisphenol-S epoxy resin according to the present invention is excellent in flame retardancy and comparable to or superior to conventional bisphenol A or bisphenol F resins in other physical properties.

이하, 본 발명을 하기 실시예에 의거하여 좀더 상세하게 설명하고자 한다. 단, 하기 실시예는 본 발명을 예시하기 위한 것일 뿐 한정하는 것이 아니다.Hereinafter, the present invention will be described in more detail based on the following examples. However, the following examples are not intended to limit the invention only.

합성예 1Synthesis Example 1

비스페놀-S 200.2g (0.8 몰, 순도 99.8%, 한국정밀화학(주), 융점 245℃)와 에피클로로히드린 370.1g (4 몰, Aldrich Chem Co.), 및 40% NaOH 수용액 80g (0.8mol)을 교반기, 온도계, 및 콘덴서가 부착된 반응기에 넣고 온도를 100℃로 유지하면서 7시간 동안 반응시켜 비스페놀-S 타입 에폭시 수지를 제조하였다. 200.2 g of bisphenol-S (0.8 mol, purity 99.8%, Korea Fine Chemicals Co., Ltd., melting point 245 ° C), 370.1 g of epichlorohydrin (4 mol, Aldrich Chem Co.), and 80 g (0.8 mol of 40% NaOH aqueous solution) ) Was added to a reactor equipped with a stirrer, a thermometer, and a condenser, and reacted for 7 hours while maintaining the temperature at 100 ° C to prepare a bisphenol-S type epoxy resin.

반응후 제조된 수지에 존재하는 과량의 에피클로로히드린과 수분을 제거하기 위해 110℃, 80 kPa하의 진공오븐에서 2시간동안 건조하였고, 반응부산물과 불순물 제거 등의 목적으로 이소부틸메틸케톤 (MIBK)에 용해시켜 30분간 교반한 후 여과하였다. 여과된 비스페놀-S 타입 에폭시 수지를 100℃에서 진공 증류하여 MIBK를 제거하고 수율 80% 이상, 분자량 2093인 비스페놀-S 타입 에폭시 수지를 얻었다.In order to remove excess epichlorohydrin and water present in the resin prepared after the reaction, it was dried in a vacuum oven at 110 ° C. and 80 kPa for 2 hours, and isobutyl methyl ketone (MIBK) was used for the purpose of removing reaction byproducts and impurities. It was dissolved in) and stirred for 30 minutes and then filtered. The filtered bisphenol-S type epoxy resin was vacuum distilled at 100 ° C. to remove MIBK to obtain a bisphenol-S type epoxy resin having a yield of 80% or more and a molecular weight of 2093.

합성예 2Synthesis Example 2

상기 합성예 1과 동일한 방법으로 하되, 반응 온도를 120℃로 유지하면서 8시간 동안 반응시켜, 최종적으로 수율 80% 이상, 분자량 2472인 비스페놀-S 타입 에폭시 수지를 얻었다.In the same manner as in Synthesis Example 1, the reaction was carried out for 8 hours while maintaining the reaction temperature at 120 ° C to finally obtain a bisphenol-S type epoxy resin having a yield of 80% or more and a molecular weight of 2472.

시험예 1Test Example 1

상기 합성예 1에서 얻어진 비스페놀-S 타입 에폭시 수지에 경화제로 디아미노디페닐메탄(DDM)를 100:30 중량비로 가하여 생성 혼합물을 경화시켜 시편을 제작하였다. 이때 경화조건은 80℃에서 1시간, 120℃에서 3시간, 150℃에서 2시간으로 하였다. 경화시의 발열곡선 그래프를 도 1에 나타내었다.Diaminodiphenylmethane (DDM) was added to a bisphenol-S type epoxy resin obtained in Synthesis Example 1 in a weight ratio of 100: 30, and the resulting mixture was cured to prepare a specimen. The curing conditions were 1 hour at 80 ° C, 3 hours at 120 ° C, and 2 hours at 150 ° C. Exothermic curve at the time of curing is shown in FIG.

이 시편에 대해 만능 재료 시험기 (Universal Test Machine #1125)를 사용하여 변형속도 (cross-head speed)를 1mm/분으로, 지지대간 거리와 시편 두께의 비(span to depth ratio)는 4:1로 고정하여 각 조성물의 파괴인성을 임계응력 세기인자 (KIC)로서 측정하고, 변형속도 (cross-head speed)를 5mm/분으로 고정하여 인장강도를 측정한 결과, 임계응력 세기인자 값은 2.5MPa·m1/2, 인장강도는 37MPa를 얻었다. For this specimen, the cross-head speed was 1 mm / min using the Universal Test Machine # 1125, and the span-to-depth ratio between the support and the thickness of the specimen was 4: 1. The fracture toughness of each composition was measured as a critical stress intensity factor (K IC ), and the tensile strength was measured by fixing the cross-head speed at 5 mm / min. The critical stress factor value was 2.5 MPa. M 1/2 and tensile strength were obtained to 37 MPa.

시험예 2Test Example 2

상기 합성예 1에서 얻어진 비스페놀-S 타입 에폭시 수지에 산무수물 경화제인 프탈산무수물 (PA)를 100:30의 중량비로 가하여, 150℃에서 2시간 180℃에서 6시간 동안 경화시켜 시편을 제작하였다. 이렇게 제작된 시편의 유리전이온도(Tg)는 75℃였다. 경화시의 발열곡선 그래프를 도 2에 나타내었다.A phthalic anhydride (PA) as an acid anhydride curing agent was added to a bisphenol-S type epoxy resin obtained in Synthesis Example 1 at a weight ratio of 100: 30, and cured at 150 ° C. for 2 hours at 180 ° C. for 6 hours to prepare a specimen. The glass transition temperature (T g ) of the specimen thus prepared was 75 ° C. Exothermic curve at the time of curing is shown in FIG.

시험예 3Test Example 3

상기 합성예 1에서 얻어진 비스페놀-S 타입 에폭시 수지에 산무수물 경화제인 테레프탈산무수물 (THPA)를 100:30의 중량비로 가하여 실시예 2와 같은 경화 조건으로 시편을 제작하였다. 이렇게 제작된 시편의 유리전이온도(Tg)는 80℃였다. Terephthalic anhydride (THPA), an acid anhydride curing agent, was added to the bisphenol-S type epoxy resin obtained in Synthesis Example 1 at a weight ratio of 100: 30 to prepare a specimen under the same curing conditions as in Example 2. The glass transition temperature (T g ) of the specimen thus prepared was 80 ° C.

경화시의 발열곡선 그래프를 도 2에 나타내었다.Exothermic curve at the time of curing is shown in FIG.

시험예 4Test Example 4

상기 합성예 2에서 얻어진 비스페놀-S 타입 에폭시 수지에 경화제로 디아미노디페닐메탄 (DDM)를 1:1 당량비로 가하여 시편을 제작하였다.To the bisphenol-S type epoxy resin obtained in Synthesis Example 2, diaminodiphenylmethane (DDM) was added as a curing agent in a 1: 1 equivalent ratio to prepare a specimen.

이렇게 제작된 시편에 대해 만능 재료 시험기(Universal Test Machine #1125)를 사용하여 변형속도 (cross-head speed)를 1mm/min으로, span to depth는 4:1로 고정하여 각 조성물의 파괴인성을 임계응력 세기인자 (KIC)로서 측정하고, 변형속도(cross-head speed)를 5mm/분으로 고정하여 인장강도를 측정한 결과, 임계응력 세기인자 값은 3.8MPa·m1/2, 인장강도는 34.5MPa를 얻었다.The fracture toughness of each composition was determined by fixing the cross-head speed at 1 mm / min and the span to depth at 4: 1 using the Universal Test Machine # 1125 on the specimens thus fabricated. Measured as stress intensity factor (K IC ), and tensile strength was measured by fixing cross-head speed at 5mm / min.The critical stress intensity factor value was 3.8MPa · m 1/2 , and tensile strength was 34.5 MPa was obtained.

시험예 5Test Example 5

상기 합성예 2에서 얻어진 비스페놀-S 타입 에폭시 수지를 상기 실시예 2와 같은 경화 조건으로 시편을 제작한 결과 유리전이 온도(Tg) 78℃의 경화물을 얻었다. The bisphenol-S type epoxy resin obtained in Synthesis Example 2 was prepared under the same curing conditions as in Example 2 to obtain a cured product having a glass transition temperature (T g ) of 78 ° C.

시험예 6Test Example 6

상기 합성예 2에서 얻어진 비스페놀-S 타입 에폭시 수지를 상기 실시예 3과 같은 경화 조건으로 시편을 제작한 결과 유리전이 온도(Tg) 86℃의 경화물을 얻었다.A bisphenol-S type epoxy resin obtained in Synthesis Example 2 was prepared under the same curing conditions as in Example 3 to obtain a cured product having a glass transition temperature (T g ) of 86 ° C.

비교시험예Comparative test example

기존의 비스페놀 A와 F 수지를 상기 시험예 1과 같은 조건으로 경화시켜 시편을 제작한 후 임계응력 세기인자 (KIC), 인장강도를 평가하여 표 1에 나타내었다.Existing bisphenol A and F resins were cured under the same conditions as in Test Example 1, and then the specimens were prepared, and then the critical stress intensity factor (K IC ) and tensile strength were evaluated.

[표 1]TABLE 1

구분division KIC(MPa·m1/2)K IC (MPam 1/2 ) 인장강도 (MPa)Tensile Strength (MPa) 비스페놀 ABisphenol A 2.62.6 3232 비스페놀 FBisphenol F 2.12.1 2929 비스페놀 S (상기 합성예 1)Bisphenol S (Synthesis Example 1) 3.23.2 3939 비스페놀 S (상기 합성예 2)Bisphenol S (Synthesis Example 2) 3.83.8 3535

본 발명에 따라 제조된 비스페놀-S 타입 에폭시 수지는, 유리전이온도가 75 내지 100 ℃ 정도인 반고형이고, 기존의 비스페놀-A나 비스페놀-F 타입 에폭시 수지 보다 우수하거나 동등한 물성을 가져 이들 수지를 대체하여 이용할 수 있다.The bisphenol-S type epoxy resin prepared according to the present invention is semi-solid with a glass transition temperature of about 75 to 100 ° C. and has superior or equivalent physical properties to conventional bisphenol-A or bisphenol-F type epoxy resins. It can be used as a substitute.

Claims (9)

하기 화학식 1의 비스페놀-S 타입 에폭시 수지:Bisphenol-S type epoxy resin of formula (I): 화학식 1Formula 1
Figure 112005033343498-pat00017
Figure 112005033343498-pat00017
1 : 3 내지 5의 몰비의 하기 화학식 4의 비스페놀-S와 하기 화학식 5의 에피클로로히드린을, 비스페놀-S의 몰에 대해 0.5 내지 1 몰의 염기 촉매의 존재 하에 90 내지 140℃ 범위의 온도에서 6 내지 10 시간 동안 반응시킴을 포함하는, 제 1 항에 따른 화학식 1의 비스페놀-S 타입 에폭시 수지의 제조방법:1: Temperature of the bisphenol-S of the following formula (4) and epichlorohydrin of the following formula (5) in a molar ratio of 1: 3 to 5 in the presence of 0.5 to 1 molar base catalyst relative to the moles of bisphenol-S A process for preparing a bisphenol-S type epoxy resin of formula 1 according to claim 1 comprising reacting for 6 to 10 hours in 화학식 4Formula 4
Figure 112005033343498-pat00009
Figure 112005033343498-pat00009
화학식 5Formula 5
Figure 112005033343498-pat00010
Figure 112005033343498-pat00010
삭제delete 삭제delete 제 2 항에 있어서, The method of claim 2, 촉매가 30 내지 45% 농도의 NaOH임을 특징으로 하는 방법.Wherein the catalyst is NaOH at a concentration of 30 to 45%. 삭제delete 삭제delete 제 1 항에 따른 에폭시 수지를 포함하는 매트릭스 수지 조성물.A matrix resin composition comprising the epoxy resin according to claim 1. 제 8 항에 있어서,The method of claim 8, 에폭시 수지의 유리전이온도가 75 내지 100 ℃임을 특징으로 하는 제품.A product characterized in that the glass transition temperature of the epoxy resin is 75 to 100 ℃.
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JPS60155278A (en) * 1983-11-21 1985-08-15 Somar Corp Epoxy resin composition for powder coating
JPH02142818A (en) * 1988-11-25 1990-05-31 Nippon Kayaku Co Ltd Highly pure epoxy resin and its production
US5395900A (en) * 1993-09-27 1995-03-07 National Science Council Acrylated epoxy resins based on bisphenol-S and preparation thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60155278A (en) * 1983-11-21 1985-08-15 Somar Corp Epoxy resin composition for powder coating
JPH02142818A (en) * 1988-11-25 1990-05-31 Nippon Kayaku Co Ltd Highly pure epoxy resin and its production
US5395900A (en) * 1993-09-27 1995-03-07 National Science Council Acrylated epoxy resins based on bisphenol-S and preparation thereof

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