KR100512687B1 - Uv curing type composition having high conductivity and superior anti-scratching - Google Patents

Uv curing type composition having high conductivity and superior anti-scratching Download PDF

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KR100512687B1
KR100512687B1 KR1020040097669A KR20040097669A KR100512687B1 KR 100512687 B1 KR100512687 B1 KR 100512687B1 KR 1020040097669 A KR1020040097669 A KR 1020040097669A KR 20040097669 A KR20040097669 A KR 20040097669A KR 100512687 B1 KR100512687 B1 KR 100512687B1
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scratch resistance
curable composition
composition
oligomer
scratch
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KR1020040097669A
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Korean (ko)
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배동규
조이숙
배꽃나라
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배동규
배꽃나라
조이숙
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Priority to PCT/KR2005/003171 priority patent/WO2006080639A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • H01B1/124Intrinsically conductive polymers
    • H01B1/127Intrinsically conductive polymers comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/541Silicon-containing compounds containing oxygen
    • C08K5/5415Silicon-containing compounds containing oxygen containing at least one Si—O bond
    • C08K5/5419Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes

Abstract

본 발명은 폴리티오펜계 도전성 고분자, UV-올리고머 또는/및 모노머, 유기용매, 광개시제 및 내스크래치 첨가제로 이루어지는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 성형시트용 조성물에 관한 것으로, 보다 상세히는 폴리티오펜계 도전성 고분자 4 내지 5.9 중량%, UV-올리고머 또는/및 모노머 7 내지 9.9 중량%, 용매 82 내지 89 중량%, 광개시제 0.4 내지 0.8 중량% 및 내스크래치 첨가제 0.03 내지 0.05 중량%로 이루어지는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 성형시트용 조성물에 관한 것이다.The present invention relates to a composition for forming sheets having conductivity and scratch resistance, comprising a polythiophene conductive polymer, a UV-oligomer or / and a monomer, an organic solvent, a photoinitiator, and a scratch additive. 4 to 5.9% by weight of a polythiophene-based conductive polymer, 7 to 9.9% by weight of UV-oligomer or / and monomer, 82 to 89% by weight of solvent, 0.4 to 0.8% by weight of photoinitiator and 0.03 to 0.05% by weight of scratch resistant additive The present invention relates to a composition for molding sheets having electroconductivity and scratch resistance.

Description

도전성 및 내스크래치성을 갖는 자외선경화형조성물{UV curing type Composition having high conductivity and superior anti-scratching}UV curing type composition having high conductivity and superior anti-scratching

본 발명은 투명 플라스틱 고분자 재질위에 코팅하였을 때 고전도성, 고투명성 및 우수한 내스크래치성을 갖는 자외선경화형 조성물에 관한 것이다. 더욱 상세하게는, 폴리티오펜계 전도성 고분자 용액에 소량의 UV-올리고머 또는/및 모노머, 유기용매 및 내스크래치 첨가제로 에톡실레이티드 실리콘을 함께 첨가하여 가시광선투과도가 그 경화물자체가 96% 이상이면서, 표면저항이 107 Ω/□ 이하인 고전도성을 갖고, 내스크래칭성이 우수한 자외선경화형 조성물에 관한 것이다.The present invention relates to a UV-curable composition having high conductivity, high transparency and excellent scratch resistance when coated on a transparent plastic polymer material. More specifically, a small amount of UV-oligomer or / and monomer, organic solvent, and scratch resistant additives are added to the polythiophene-based conductive polymer solution, so that visible light transmittance is 96%. It is related with the ultraviolet curable composition which has the high electrical conductivity whose surface resistance is 10 7 ohms / square or less, and was excellent in scratch resistance.

최근 전도성 고분자를 이용한 브라운관 유리표면의 도전성 코팅재로 주목받기 시작한 것은 미국 특허 제 5,035,926호 및 제 5,391,472호에 기재되어 있는 바와 같이, 폴리티오펜계 전도성 고분자인 폴리에틸렌디옥시티오펜(polyethylene dioxythiophene: PEDT)이 주목받기 시작하면서부터이다. Recently, as the conductive coating material of the CRT glass surface using a conductive polymer has been attracting attention, polyethylene dioxythiophene (PEDT), which is a polythiophene-based conductive polymer, is described, as described in US Pat. It is from the beginning of attention.

이 전도성 고분자는 폴리아닐린계, 폴리피롤계뿐만 아니라, 폴리티오펜계와 같은 다른 전도성 고분자에 비해서 우수한 투명도를 나타내는 특성을 가지고 있다. 이 PEDT는 고분자산염(예를 들면, 폴리스틸렌술포네이트)을 도핑 물질로 이용하여 수분산이 가능한 코팅성 용액을 제조할 수 있어 가공성 또한 탁월한 특성을 가지고 있다. 또한, 이러한 수분산의 특징 때문에 유기 용매와 혼합성도 우수하여 브라운관(CRT) 유리, 플라스틱 필름표면 등 다양한 용도의 코팅재로 사용될 수 있다. 또한 유기용매로서 에테르 또는 알콜을 사용하므로, 환경적인 측면에서도 매우 유리하다. This conductive polymer has a property of exhibiting excellent transparency compared with other conductive polymers such as polyaniline and polypyrrole, as well as polythiophene. The PEDT has excellent properties in terms of processability as it can prepare a water dispersible coating solution using a high molecular acid salt (for example, polystyrene sulfonate) as a doping material. In addition, due to the characteristics of the water dispersion, it is also excellent in compatibility with organic solvents can be used as a coating material for a variety of applications, such as CRT glass, plastic film surface. In addition, since an ether or an alcohol is used as the organic solvent, it is very advantageous from an environmental point of view.

이러한 수분산 PEDT의 대표적인 예로서는 현재 판매중인 (주)베이어(Bayer) 사의 베이트론 피에이치(BAYTRON PH)가 대표적인 경우이다.A representative example of such a water-dispersible PEDT is BAYTRON PH of Bayer Co., Ltd., which is currently being sold.

그러나, 비록 PEDT 전도성 고분자가 투명도가 우수하여도 96%의 고투명도를 유지하기 위해서는 저농도의 PEDT로 코팅해야 하므로 일반적인 방법으로는 표면 저항 107 Ω/□ 이하를 달성하기 어렵다.However, even though the PEDT conductive polymer is excellent in transparency, it is difficult to achieve a surface resistance of 10 7 Ω / □ or less by coating with a low concentration of PEDT in order to maintain high transparency of 96%.

또한 막경도를 보강하기 위하여 내스크레치제로서 실리콘오일이나 광유등을 사용하지만, 이를 사용할 경우 전도도가 저하하여 107 Ω/□ 이하의 도전성막을 제조하기에는 더더욱 불가능하여 기존의 기술로는 저전도성이 요구되는 저급의 정전기방지용 코팅재 정도로만 사용되고 있는 실정이다.In addition, silicon oil or mineral oil is used as a scratch-resistant agent to reinforce the film hardness, but when it is used, the conductivity decreases, making it impossible to manufacture a conductive film of 10 7 Ω / □ or less, which requires low conductivity. It is a situation that is used only as a low level antistatic coating material.

이러한 단점들 때문에 투과율 96% 이상의 고투명성을 가지며, 전자파 차폐재로서 또는 고성능 대전방지코팅제로서 상품성이 있는 표면저항 107 Ω/□ 이하이고 우수한 내스크래치성을 실현하는 기술은 기존의 기술로는 불가능하였다.Due to these shortcomings, a technique having a high transmissivity of 96% or more and having a commercially available surface resistance of less than 10 7 Ω / □ as an electromagnetic wave shielding material or a high performance antistatic coating agent has not been possible with conventional techniques. .

본 발명은 플라스틱필름을 코팅할 때 표면저항이 107 Ω/□ 이하의 고전도도를 가지며, 코팅막의 투과도가 96% 이상의 고투명성을 갖는 내스크래치성이 우수한 PEDT 전도성 고분자 박막의 제조를 위한 조성물을 개발하는 것이다.The present invention provides a composition for producing a PEDT conductive polymer thin film having excellent scratch resistance having a high conductivity of 10 7 Ω / □ or less when the plastic film is coated and having a high transparency of 96% or more. To develop.

본 발명의 또 다른 목적은 상기 목표물성을 만족하는 조성물의 조성성분을 결정하여 재현성 있게 물성을 발현하는 조성성분 및 그 조성비를 제공하는 것이다. 바인더 솔리드의 함량을 줄임으로 인해 가시광선투과율을 96% 이상, 고농도의 PEDT 전도성 고분자, 소량의 에톡실레이티드 실리콘 및 올리고머 및 모노머를 사용함으로 인해 표면저항 107 Ω/□ 이하의 고전도도를 가지며, 소량의 에톡실레이티드 실리콘을 첨가함으로서 내스크래치성을 보다 증대시켜 본 발명을 완성하게 되었다.Still another object of the present invention is to determine a composition component of the composition that satisfies the target physical properties and to provide a composition component expressing physical properties reproducibly and its composition ratio. By reducing the content of binder solids, visible light transmittance of 96% or more, high concentration of PEDT conductive polymer, small amount of ethoxylated silicon, oligomer and monomer have high conductivity of 10 7 Ω / □ or less. By adding a small amount of ethoxylated silicon, the scratch resistance was further increased to complete the present invention.

본 발명의 또 다른 목적은 상기 조성물을 이용한 필름, 판넬, 시트와 같은 통상의 시트성형물을 제공하는 것이다. Another object of the present invention is to provide a conventional sheet molding such as a film, panel, sheet using the composition.

본 발명은 폴리티오펜계 도전성 고분자 수용액 4 내지 5.9 중량%, UV-올리고머 또는/및 모노머 7 내지 9.9 중량%, 용매 82 내지 88 중량%, 광개시제 0.4 내지 0.8 중량% 및 내스크래치 첨가제 0.02 내지 0.05 중량%로 이루어지는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형 조성물로서, 이 용액으로 코팅막을 제조했을 때 표면 저항이 107 Ω/□ 이하, 투과도 96% 이상, 연필경도가 4H 이상인 것을 특징으로 한다.The present invention provides 4 to 5.9 wt% of polythiophene conductive polymer aqueous solution, 7 to 9.9 wt% of UV-oligomer or monomer, 82 to 88 wt% of solvent, 0.4 to 0.8 wt% of photoinitiator, and 0.02 to 0.05 wt% of scratch resistance additive. An ultraviolet curable composition having conductivity and scratch resistance, characterized in that the surface resistance is 10 7 Ω / □ or less, transmittance of 96% or more, pencil hardness of 4H or more when the coating film is prepared from this solution do.

본 발명의 조성물은 투명성이 요구되는 폴리메틸메타크레이트, 폴리카보네이트, 폴리에틸렌테레프탈레이트, 비정질폴리에틸렌테레프탈레이트, 폴리에테르설폰, 폴리비닐클러라이드, 엠에스수지(MMA와 SM의 공중합체), 트리아세테이트셀룰로조 등의 플라스틱으로 제조된 투명필름 또는 시트 위에 코팅되어 사용된다.The composition of the present invention is polymethyl methacrylate, polycarbonate, polyethylene terephthalate, amorphous polyethylene terephthalate, polyether sulfone, polyvinyl chloride, MS resin (copolymer of MMA and SM), triacetate cellulose It is coated and used on a transparent film or sheet made of plastic such as a bath.

본 발명에 따른 상기 용액 조성물을 유리 또는 합성수지 필름과 같은 투명 기질 위에 코팅하면 전도도가 1×106 내지 9×106 Ω/□ 이하, 투과도가 96% 이상, 경도 4H 이상, 고전도성 및 고투명성의 하드 코팅막이 얻어진다.When the solution composition according to the present invention is coated on a transparent substrate such as glass or resin film, the conductivity is 1 × 10 6 to 9 × 10 6 Ω / □ or less, transmittance of 96% or more, hardness of 4H or more, high conductivity and high transparency A hard coat film of is obtained.

본 발명에서 전도성 고분자의 예로서는 (주)베이어사의 PEDT(상품명 : 베이트론 피에이치)이며, 이 PEDT는 도판트로서 폴리스티렌술포네이트(PSS)가 도핑되어 있어 물에 잘 녹는 성질을 나타내며, 열적 및 대기 안전성이 매우 우수하다. 또한 PEDT는 물에 최적 분산성을 유지하기 위하여 PEDT 및 PSS 고형분 농도가 1.3%로 조정되어 있다. 상기 PEDT는 추가로 물 또는, 알콜 또는 유전상수가 큰 용매와 잘 혼합되기 때문에 이러한 용매와 희석하여 쉽게 코팅할 수 있으며, 코팅막을 형성하였을 때도 기타의 전도성 고분자인 폴리아닐린, 폴리피롤에 비해서 우수한 투명도를 나타낸다.An example of the conductive polymer in the present invention is Bayer's PEDT (trade name: Baitron P.H.), which is doped with polystyrenesulfonate (PSS) and exhibits a property of being well soluble in water. The safety is very good. PEDT also has a 1.3% PEDT and PSS solids concentration to maintain optimum dispersibility in water. The PEDT can be easily coated by diluting with such a solvent because it is well mixed with water, alcohol or a solvent having a high dielectric constant, and shows excellent transparency compared with other conductive polymers such as polyaniline and polypyrrole even when the coating film is formed. .

PEDT 전도성 고분자 수용액 사용량은 4 내지 5.9 중량%가 적당하며, 4중량% 미만일 경우, 추가로 첨가되는 유기용매 및 올리고머나 모노머의 량이 고정될 때 전도성구현을 위한 전도성 고분자량이 너무 적어서 표면저항 107 Ω/□ 이하의 고전도성을 실현하기가 어려우며, 5.9 중량%를 초과하여 첨가하면 착색성을 가진 전도성 고분자량의 증가에 따른 투과도가 96% 이하로 감소하여 바람직하지 않다.PEDT conductive polymer solution usage and suitably 4 to 5.9% by weight, 4% less than when an organic solvent is further added, and raised when the amount of meona monomer be fixed amount of the conductive polymer for conducting implemented so low sheet resistance 10 7 Ω It is difficult to realize high conductivity of / □ or less, and when it is added in excess of 5.9% by weight, the transmittance due to the increase of the conductive high molecular weight with colorability decreases to 96% or less, which is not preferable.

본 발명의 PEDT 전도성 고분자의 유기용매로서는 n-프로필알코올, 메틸셀로솔브(methyl cellosolve: MCS), 프로필렌글리콜메틸에테르(propyleneglycolmethylether: PM), 디아세톤알코올(diacetone alcohol: DAA)들은 단독으로 사용하거나, 상호 혼합하여 사용할 수도 있으나, 가장 바람직하기로는 유기용매로 메틸기가 있는 에테르 용매인 메틸셀로솔브(MCS) 또는 프로필렌글리콜메틸에테르(PM)이 PEDT 전도성 고분자의 전도성을 최대로 구현할 수 있는 가장 바람직한 용매이다. As the organic solvent of the PEDT conductive polymer of the present invention, n-propyl alcohol, methyl cellosolve (MCS), propylene glycol methyl ether (PM), diacetone alcohol (DAA) are used alone or Although mixed with each other, most preferably, methyl cellosolve (MCS) or propylene glycol methyl ether (PM), which is an ether solvent having a methyl group as an organic solvent, is the most preferable to realize the maximum conductivity of the PEDT conductive polymer. Solvent.

본 발명에서는 자외선경화수지조성물에서 사용하는 통상의 용매인 메탄올, 에탄올, 부틸아세테이트(BA), 에틸아세테이트(EA), 이소프로판올(iso propyl alcohol: IPA) 및 에틸셀로솔브(ethyl cellosolve: EC)는 전도성에 매우 나쁜 영향을 미치므로 좋지 않다. In the present invention, methanol, ethanol, butyl acetate (BA), ethyl acetate (EA), isopropanol (IPA) and ethyl cellosolve (EC), which are common solvents used in UV curable resin compositions, are It is not good because it has a very bad effect on conductivity.

유기용매의 사용량은 82 내지 88 중량%가 적당한데, 82 중량% 미만의 경우는 코팅액의 다른 조성 즉 전도성고분자량과 올리고머 및 모노머량을 증대시키므로 가시광선투과도가 나빠지거나 고저항이 형성된다. 88 중량%를 초과할 경우 가시광선투과도는 극히 향상되나 내스크래치성이 본 발명 기준에 미달된다.The amount of the organic solvent is suitably 82 to 88% by weight, but less than 82% by weight increases the composition of the coating liquid, that is, the amount of the conductive polymer and the oligomer and monomer, so that the visible light transmittance is deteriorated or high resistance is formed. If the content exceeds 88% by weight, the visible light transmittance is extremely improved, but scratch resistance does not meet the criteria of the present invention.

본 발명에서 사용되는 UV-올리고머는 우레탄계 (메타)아크릴 올리고머를 사용하며, 이때 분자량은 2400 이하의 것을 사용한다. 2400 이상의 것은 용해성 및 분산성이 나쁘게 되어 좋지 않다. 상기 우레탄계 (메타)아크릴 올리고머는 통상의 이소시아네이트 및 디올과의 축합물이며, 분자량이 2400 이하인 한 어떤 것도 사용가능하다. 분자량 2400 이하의 우레탄계 (메타)아크릴 올리고머 중에서 하기 화학식 3인 디펜타에리스리톨펜타아크릴레이트(dipentaerithritolpentaacrylate: DPPA)와 하기의 화학식 2인 이소시아네이트트리머(일반명칭: H-MDI, 제조사: Nippon POLYURETHANES, 제품명: CORONATE HX)를 반응시켜 합성한 올리고머인 화학식 1인 화합물(U-DPPA)이 더욱 우수한 물성을 나타낸다. 또한 단량체인 DPHA(dipentaerithritolhexaacrylate)와 U-DPPA를 혼합하여 사용하면 저항값을 0.5 차수(order)로 낮추는 현저한 효과를 나타내어 매우 좋은 결과를 가진다. The UV-oligomer used in the present invention uses a urethane-based (meth) acryl oligomer, wherein the molecular weight is less than 2400. It is not good that 2400 or more becomes solubility and dispersibility bad. The urethane-based (meth) acrylic oligomer is a condensate of ordinary isocyanates and diols, and any one can be used as long as the molecular weight is 2400 or less. Among the urethane-based (meth) acryl oligomers having a molecular weight of 2400 or less, dipentaerythritolpentaacrylate (DPPA) represented by the following formula (3) and an isocyanate trimer represented by the formula (2) (general name: H-MDI, manufacturer: Nippon POLYURETHANES, product name: CORONATE) Compound (U-DPPA), which is an oligomer synthesized by reacting HX), shows more excellent physical properties. In addition, when a mixture of monomers such as DPHA (dipentaerithritolhexaacrylate) and U-DPPA is used, it shows a remarkable effect of lowering the resistance value to the order of 0.5 and has very good results.

본 발명에서 사용되는 모노머로는 1관능성 및 2관능성 이상의 다관능성 아크릴 단량체 및 이들의 혼합물을 사용한다. 다관능성으로는 폴리올 펜타에리쓰리톨, 디펜타에리쓰리톨의 아크릴 단량체 예를 들면, 디펜타에리스리톨헥사아크릴레이트(dipentaerithritolhexaacrylate: DPHA)등, 또는 히드록시알킬아크릴레이트 예를 들면, 2-하이드록시에틸메타크릴레이트(2-hydroxymethacrylate: HEMA)등, 1관능성 단량체로는 예를 들면, (메타)아크릴산, (메타)아크릴산메틸, (메타)아크릴산에틸, (메타)아크릴산부틸, (메타)아크릴산헥실, (메타)아크릴산옥틸, (메타)아크릴산-2-에틸헥실 등의 (메타)아크릴산 C1-20 알킬에스테르, (메타)아크릴산시클로헥실, (메타)아크릴산페닐, (메타)아크릴산벤질, (메타)아크릴산-2-히드록시에틸, (메타)아크릴산-2-히드록시프로필 등의 (메타)아크릴산히드록시 C2-4 알킬에스테르 등을 사용할 수 있으며, 이들 공중합 가능한 단량체는 단독으로 또는 이들을 조합하여 사용할 수 있다.As the monomer used in the present invention, mono- and bi-functional or higher polyfunctional acrylic monomers and mixtures thereof are used. As polyfunctionality, polyol pentaerythritol, an acrylic monomer of dipentaerythritol, for example, dipentaerythritol hexaacrylate (DPHA), or a hydroxyalkyl acrylate, for example, 2-hydroxyethyl As monofunctional monomers, such as methacrylate (2-hydroxymethacrylate: HEMA), for example, (meth) acrylic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and (meth) acrylate (Meth) acrylic acid C 1-20 alkyl esters such as octyl (meth) acrylate and 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, (meth) acrylate, benzyl (meth) acrylate (Meth) acrylic acid hydroxy C 2-4 alkyl esters such as 2-hydroxyethyl acrylate and 2-hydroxypropyl (meth) acrylate can be used, and these copolymerizable monomers can be used alone or in combination thereof. Can be used.

UV-올리고머 또는/및 모노머의 사용량은 7 내지 9.9 중량%가 적당한데, 7 중량% 미만이면 경도가 약하여 표면스크래치가 발생되는 단점이 있고, 9.9 중량% 이상이면 표면저항을 107 Ω/□ 이상 증가시키는 단점이 있다.The amount of UV-oligomer or / and monomer used is 7 to 9.9% by weight. If it is less than 7% by weight, there is a disadvantage in that surface scratches occur due to the hardness, and in the case of 9.9% by weight or more, the surface resistance is 10 7 Ω / □ or more. There is a drawback to increasing.

본 발명의 광개시제는 알파-하이드록시사이클로헥실페닐메탄논(α-hydroxycyclohexylphenylmethanone, Ciba Geigy의 광개시제: iRgAcure #184), 1-하이드록시사이클로헥실페닐케톤, 2-하이드록시-2-메틸-1-페닐 프로판온, 하이드록시디메틸아세토페논 또는 벤조페논 등을 사용함이 바람직하며, iRgAcure #184로 경화할 때가 다른 개시제보다 저항값을 0.5차수로 낮출 수 있어 보다 바람직하다. Photoinitiator of the present invention alpha-hydroxycyclohexylphenylmethanone (photoinitiator of Ciba Geigy: iRgAcure # 184), 1-hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenyl It is preferable to use propanone, hydroxydimethylacetophenone, benzophenone, or the like, and when cured with iRgAcure # 184, the resistance value can be lowered by 0.5 orders than other initiators.

광개시제의 사용함량은 0.4 내지 0.8 중량%가 바람직하고, 0.4 중량% 미만이면 광중합이 느려지고, 0.8 중량% 이상이면 반응속도가 빠르지만 표면물성이 저하되는 등의 단점이 있다.The use amount of the photoinitiator is preferably 0.4 to 0.8% by weight. If the content is less than 0.4% by weight, the photopolymerization is slow. If the content is 0.8% or more, the reaction rate is high but the surface properties are deteriorated.

본 발명의 내스크래치 첨가제는 실리콘의 피막특성이 전도성 고분자의 전도성 구현을 저해하지 않는 에톡실레이티드 실리콘(상품명: SiLWET, 회사명: GE SiLiCONES)을 사용한다. 또한 표면저항값을 적정수준(106 Ω/□ 대)로 유지하기 위해서는 실리콘 첨가제를 최소량 투입하여야 한다. 통상사용하는 실리콘 오일이나 과유 등을 내스크래치 첨가제로 사용 시에는 표면저항값이 낮아져서 목표로 하는 값을 얻을 수 없으므로 본 발명의 에톡시화 된 실리콘화합물을 사용해야하며, 상기 물질을 사용하는 경우 표면저항값의 저하가 없으며, 다른 내스크레치 첨가제에 비하여 매우 우수한 효과를 나타내었다.The scratch additive of the present invention uses ethoxylated silicon (trade name: SiLWET, company name: GE SiLiCONES), which does not inhibit the conductive implementation of the conductive polymer. In addition, a minimum amount of silicone additive should be added to maintain the surface resistance at an appropriate level (10 6 Ω / □). When using a silicone oil or fruit oil, which is commonly used as a scratch-resistant additive, the surface resistance value is lowered so that the target value cannot be obtained. Therefore, the ethoxylated silicon compound of the present invention should be used. There is no deterioration and it shows a very good effect compared to other scratch resistant additives.

내스크래치 첨가제의 사용함량은 0.02 내지 0.05 중량%가 바람직하다. 0.02 중량% 이하이면 내스크래치성이 떨어지게 되고, 0.05 중량% 이상이면 전도성이 떨어지게 되는 문제점이 있다. The use amount of the scratch resistant additive is preferably 0.02 to 0.05% by weight. If it is 0.02 wt% or less, scratch resistance is inferior, and if it is 0.05 wt% or more, there is a problem that conductivity is degraded.

본 발명에 따른 고전도성 및 고투명성을 갖는 폴리티오펜 전도성 고분자 용액 조성물의 제조방법은 먼저 혼합용기에서 PEDT 전도성 고분자 수용액을 넣고 격렬히 교반하면서, 약 1분 간격으로 유기용매, UV-올리고머 또는/및 모노머, 광개시제, 내스크래치첨가제를 넣고 약 2 내지 4시간정도 균일하게 혼합하여 제조하며, 제조된 조성물은 폴리메틸메타크레이트, 폴리카보네이트, 폴리에틸렌테레프탈레이트, 비정질폴리에틸렌테레프탈레이트, 폴리에테르설폰, 폴리비닐클러라이드, 엠에스수지 등의 플라스틱으로 제조된 투명필름 위에 본 발명의 혼합 용액 조성물을 붓고 바(bar)코팅, 스핀코팅, 플로우코팅 또는 딥코팅 등으로 균일하게 도포한 후, 60 내지 90℃ 정도의 이동용 체인이 있는 건조지역을 1분 내지 5분 유지시켜 코팅속에 존재하는 물과 솔벤트를 완전히 증발시킨다. 그 다음 400~1050 mJ/cm2의 자외선 광량을 아크릴시트에 조사하여 투명 고전도 고분자막을 제조한다.The method for preparing a polythiophene conductive polymer solution composition having high conductivity and high transparency according to the present invention is firstly added with an aqueous solution of PEDT conductive polymer in a mixing vessel, and vigorously stirred, followed by organic solvent, UV-oligomer or / and A monomer, a photoinitiator, and a scratch-resistant additive are added and uniformly mixed for about 2 to 4 hours. The prepared composition is made of polymethyl methacrylate, polycarbonate, polyethylene terephthalate, amorphous polyethylene terephthalate, polyether sulfone, polyvinyl chloride. Pour the mixed solution composition of the present invention onto a transparent film made of plastic, such as Ride and MS resin, and apply it uniformly by bar coating, spin coating, flow coating, or dip coating, and then move about 60 to 90 ° C. Keep the chain dry area for 1 to 5 minutes to allow water and solvents in the coating And completely evaporated. Then, the ultraviolet light amount of 400 ~ 1050 mJ / cm 2 is irradiated to the acrylic sheet to prepare a transparent high conductivity polymer film.

이하 본 발명을 실시예 및 비교예에 의해서 더욱 상세히 설명하면 다음과 같으며, 다음의 실시예는 본 발명을 예시하기 위한 것으로 다음의 실시예에 반드시 국한되는 것은 아니다. 하기에서 %는 별도의 언급이 없는한 중량%이다.Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, and the following Examples are provided to illustrate the present invention and are not necessarily limited to the following Examples. In the following,% is% by weight unless otherwise indicated.

[실시예]EXAMPLE

물성평가를 위해 코팅막의 제조는 다음과 같다. 본 실시예들에서 제조된 혼합용액을, 알코올로 세척한 건조한 아크릴시트 표면위에 플로우코팅한 후에 이를 70℃ 정도의 오븐에서 3분간 완전 건조한 상태에서 UV LAMP로 조사(1000 mJ/cm2)하여 경화시켰다. 건조된 도막의 두께는 모두 10 μm 이하이다.For the evaluation of the physical properties of the coating film is as follows. The mixed solution prepared in the Examples was flow coated on a dry acrylic sheet surface washed with alcohol, and then cured by irradiation with UV LAMP (1000 mJ / cm 2 ) in a completely dried state in an oven at 70 ° C. for 3 minutes. I was. The thickness of the dried coating film is all 10 micrometers or less.

상기에서 제작된 고전도성 아크릴시트의 물성평가는 다음과 같이 수행하였다. The physical property evaluation of the highly conductive acrylic sheet produced above was performed as follows.

전도도는 오옴메타기인 MONROE ELECTRONICS MODEL 292를 사용하여 ASTM D257의 시험방법에 의해 표면저항으로 측정하였다. Conductivity was measured by surface resistance by the test method of ASTM D257 using an ohmmeter group MONROE ELECTRONICS MODEL 292.

가시광선투과도는 uv-가시광선 스펙트로포토메타기를 사용하여 ASTM D1003의 시험방법에 의해 가시광선투과도를 측정하였다. Visible light transmittance was measured by the test method of ASTM D1003 using an uv-visible light spectrophotometer.

경도는 연필경도 테스트기로 ASTM D3502의 방법에 의해 경도를 측정하였다. Hardness was measured by the method of ASTM D3502 with a pencil hardness tester.

내스크래치성은 1 Kg/cm2의 하중으로 100회 왕복한 후 STEEL WOOL #0000의 시험방법에 의해 내스크래치도를 측정하였다. 스크래치는 5점 척도로 표시하였다. 전혀 스크래치가 발생하지 않은 경우는 5이고 과량의 스크래치가 발생한 경우를 1로 하여 상대적으로 비교 평가하여 5점 척도로 나타내었다.The scratch resistance was reciprocated 100 times with a load of 1 Kg / cm 2, and the scratch resistance was measured by the test method of STEEL WOOL # 0000. Scratch is indicated on a 5-point scale. The case where no scratches occurred at all was 5 and the case where excessive scratches occurred was 1, and a comparative evaluation was made on a 5-point scale.

접착력은 ASTM D3359의 방법에 의해 접착력을 측정하여 물성 평가를 하였다. The adhesive strength was measured by measuring the adhesive strength by the method of ASTM D3359.

본 발명에 따른 전도성 고분자 용액 조성물의 실시예 1 내지 실시예 4와 본 발명의 조성을 벗어난 고분자 용액 조성물인 비교예 1 내지 비교예 5의 조성 및 물성평가결과는 각각 하기의 표 1과 표 2에 나타내었다.The composition and physical property evaluation results of Examples 1 to 4 and Comparative Example 1 to Comparative Example 5, which are polymer solution compositions deviating from the composition of the present invention, are shown in Tables 1 and 2, respectively, according to the present invention. It was.

*1 : 내스크래치 첨가제: 에톡실레이티드 실리콘(상품명: SILWET, 회사명: GE SILICONES)* 1: Scratch-resistant additive: ethoxylated silicone (trade name: SILWET, company name: GE SILICONES)

*2 : 광개시제 : Igacure #184* 2: Photo Initiator: Igacure # 184

*3 : U-DPPA : 제조사 : NEW NAKAMURA (JAPAN), 제품명 : Oligo U-15HA * 3: U-DPPA: Manufacturer: NEW NAKAMURA (JAPAN), Product Name: Oligo U-15HA

상기 표 1에 나타난 바와 같이, 본 발명의 실시예 1 내지 실시예 4 및 비교예 1 내지 3에 사용된 조성에서 1.3 중량%의 PEDT 수용액(이하, “PEDT 수용액” 이라한다.) 5.9 중량%, 광개시제로 iRgACURE#184 0.75 중량%, 내스크래치첨가제로 에톡실레이티드실리콘 0.02 중량%를 공통으로 함유하며, 자외선경화형 올리고머의 성분이나 함량은 전술한 본 발명에 따른 전도성 고분자의 조성범위에 포함된다. 유기용매의 경우 실시예 1 내지 실시예 4에서는 본 발명에서 사용되는 바람직한 유기용매로 MCS(메틸셀로솔브), PM, n-프로필알콜, DAA가 단독으로 또는 혼합해서 사용하였고, 비교예 1 내지 3에서는 통상적으로 사용되는 EC와 IPA 혼합용매가 사용하여 물성비교평가를 하였다. 비교예 4 와 비교예 5는 내스크래치첨가제 함유되지 않은 것으로, 본 발명에 따른 조성물의 범위에서 벗어나는 조성물이다. 상기 실시예 1 내지 실시예 4 및 비교예 1 내지 비교예 5 고분자 조성물로 제조된 코팅막의 물성시험결과는 하기 표 2에 나타내었다. As shown in Table 1, 5.9 wt% of the PEDT aqueous solution (hereinafter referred to as "PEDT aqueous solution") of 1.3% by weight in the composition used in Examples 1 to 4 and Comparative Examples 1 to 3 of the present invention, IRgACURE # 184 0.75% by weight as a photoinitiator, 0.02% by weight of ethoxylated silicon as a scratch-resistant additive in common, the component or content of the UV-curable oligomer is included in the composition range of the conductive polymer according to the present invention described above. In the case of the organic solvent In Examples 1 to 4, MCS (methyl cellosolve), PM, n-propyl alcohol, and DAA were used alone or in combination as preferred organic solvents used in the present invention. In 3, the comparison of physical properties was carried out using a mixture of EC and IPA. Comparative Example 4 and Comparative Example 5 is a composition that does not contain a scratch-resistant additive, out of the range of the composition according to the present invention. The physical property test results of the coating film prepared in Examples 1 to 4 and Comparative Examples 1 to 5 are shown in Table 2 below.

표 2에서 보듯이, 유기용매로 통상적으로 사용되는 EC와 iPA 혼합용매를 사용한 비교예 1 내지 비교예 3은 MCS, PM, n-프로필알콜, DAA(디아세톤에탄올)를 단독으로 또는 혼합해서 사용된 실시예 1 내지 4 보다 훨씬 높은 저항치를 나타내며, 내스크래치첨가제를 함유되지 않고 본 발명의 조성물에서 벗어난 조성을 갖는 고분자조성물인 비교예 4 나 비교예 5의 경우 전도성이 급격히 떨어지거나 연필경도와 내스크래치성 및 투명도도 본 발명의 조성물인 실시예 1 내지 4의 조성물에 비해 현격히 떨어짐을 알 수 있다. 특히 비교예 4의 경우 올리고머로 DPPA와 U-DPPA를 본 발명의 조성함량을 초과하여 20 중량%를 사용하고 전도성 고분자를 본 발명의 조성함량보다 월등 높은 15 중량%를 사용하였으나 가시광선투과도가 본 발명의 조성물인 실시예 1 내지 4보다 훨씬 낮게 나타났다. As shown in Table 2, Comparative Examples 1 to 3 using EC and iPA mixed solvents commonly used as organic solvents are used alone or in combination of MCS, PM, n-propyl alcohol, DAA (diacetone ethanol) In the case of Comparative Example 4 or Comparative Example 5, which is a polymer composition which exhibits a much higher resistance value than Examples 1 to 4, and does not contain a scratch resistant additive and has a composition deviating from the composition of the present invention, the conductivity drops sharply or the pencil hardness and scratch resistance It can be seen that the properties and transparency is significantly lower compared to the compositions of Examples 1 to 4 of the composition of the present invention. Particularly, in Comparative Example 4, 20 wt% of DPPA and U-DPPA were used as oligomers in excess of the composition content of the present invention, and 15 wt% of the conductive polymer was significantly higher than the composition content of the present invention. It is much lower than Examples 1-4, which is the composition of the invention.

따라서 본 발명에 따른 전도성 고분자 용액 조성물의 실시예 1 내지 실시예 4는 96% 이상의 투과율, 4 H이상의 경도 및 우수한 내스크래치성을 유지하면서 동시에 표면저항도 9×106 Ω/□ 이하로 낮게 나타나 고전도도를 가짐을 확인할 수 있었다. 반면에 본 발명의 조성을 벗어난 고분자 용액 조성물인 비교예 1 내지 비교예 5는 전도도, 투과도, 내스크래치성 중 하나 이상이 본 발명의 목표에서 벗어남을 확인할 수 있어 전체적인 물성에서 본 발명의 물성보다 매우 열세에 있었다.Accordingly, Examples 1 to 4 of the conductive polymer solution composition according to the present invention maintain surface transmittance of 9 × 10 6 Ω / □ while maintaining transmittance of 96% or higher, hardness of 4H or higher, and excellent scratch resistance. It was confirmed to have a high degree of low appearing below. On the other hand, Comparative Example 1 to Comparative Example 5, which is a polymer solution composition deviating from the composition of the present invention, can be confirmed that at least one of conductivity, permeability, and scratch resistance deviates from the object of the present invention, which is very inferior to the physical properties of the present invention in overall physical properties. Was in.

본 발명에 따른 전도성 경화조성물은 DHPA와 U-DPPA 올리고머와 전도성고분자 등의 본 발명에 따른 조성물을 사용함으로써, 높은 경도와 107 Ω/□ 이하의 표면저항을 갖는 고전도성 및 우수한 내스크래치성을 갖는 장점이 있고, 또한 바인더솔리드의 사용함량을 줄이므로 전도성 고분자량을 줄이게 되어 가시광투과율을 구현 할 수 있는 장점이 있다.The conductive cured composition according to the present invention has high hardness and high scratch resistance having high hardness and surface resistance of 10 7 Ω / □ or less by using the composition according to the present invention such as DHPA and U-DPPA oligomer and conductive polymer. It also has the advantage, and also reduces the amount of binder solids used to reduce the conductive high molecular weight has the advantage of implementing the visible light transmittance.

Claims (14)

1.3중량%의 고형분을 갖는 폴리티오펜계 도전성 고분자 수용액 4 내지 5.9 중량%, UV-올리고머 7 내지 9.9 중량%, 유기용매 82 내지 88 중량%, 광개시제 0.4 내지 0.8 중량% 및 내스크래치 첨가제 0.02 내지 0.05 중량%로 이루어지는 조성물로서, 4 to 5.9 wt% of polythiophene conductive polymer solution having 1.3 wt% solids, 7 to 9.9 wt% of UV-oligomer, 82 to 88 wt% of organic solvent, 0.4 to 0.8 wt% of photoinitiator and 0.02 to 0.05 scratch resistance additive A composition consisting of weight percent 상기 유기용매는 n-프로필알코올, 메틸셀로솔브, 프로필렌글리콜메틸에테르 또는 디-아세톤알코올 중에서 선택되는 하나 이상이고,The organic solvent is at least one selected from n-propyl alcohol, methyl cellosolve, propylene glycol methyl ether or di-acetone alcohol, 상기 광개시제는 알파-하이드록시사이클로헥실페닐메타논, 1-하이드록시사이클로헥실페닐케톤, 2-하이드록시-2-메틸-1-페닐 프로판온, 하이드록시디메틸아세토페논 또는 벤조페논벤조인류 중에서 선택되는 어느 하나 이상이고,The photoinitiator is selected from alpha-hydroxycyclohexylphenylmethanone, 1-hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenyl propanone, hydroxydimethylacetophenone or benzophenone benzoin Any one or more, 상기 내스크래치 첨가제는 에톡실레이티드 실리콘이며,The scratch resistant additive is ethoxylated silicon, 상기 조성물을 이용하여 제조된 코팅막이 4H이상의 경도와 107Ω/□ 이하의 표면저항 및 96% 이상의 가시광투과율을 가지는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.The coating film prepared by using the composition has a hardness of 4H or more, 10 7 Ω / □ or less surface resistance and 96% or more visible light transmittance, UV curable composition having a scratch resistance. 제 1항에 있어서,The method of claim 1, 상기 UV-올리고머는 자외선경화형 단량체를 더 포함하는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.The UV-oligomer is a UV-curable composition having a conductive and scratch resistance, characterized in that it further comprises an ultraviolet curing monomer. 제 2항에 있어서,The method of claim 2, 상기 UV-올리고머는 평균분자량 2400 이하의 우레탄계 (메타)아크릴 올리고머인 U-DPPA, 또는 U-DPPA와 DPHA의 혼합물 중에서 선택되는 UV-올리고머인 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.The UV-oligomer is a UV-curable composition having a conductive and scratch resistance, characterized in that the UV-oligomer selected from U-DPPA, a urethane-based (meth) acryl oligomer having an average molecular weight of 2400 or less, or a mixture of U-DPPA and DPHA. . 제 3항에 있어서,The method of claim 3, wherein 상기 UV-올리고머가 U-DPPA와 DPHA의 혼합물인 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.The UV-curable composition having a conductive and scratch resistance, characterized in that the UV- oligomer is a mixture of U-DPPA and DPHA. 삭제delete 삭제delete 제 1항에 있어서,The method of claim 1, 상기 광개시제는 알파-하이드록시사이클로헥실페닐메탄논인 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.     The photoinitiator is an ultraviolet-curable composition having conductivity and scratch resistance, characterized in that alpha-hydroxycyclohexylphenylmethanone. 제 1항에 있어서,The method of claim 1, 폴리티오펜계 고분자는 폴리스티렌술포네이트(PSS)가 도판트로 하는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.A polythiophene-based polymer is an ultraviolet curable composition having conductivity and scratch resistance, characterized in that polystyrenesulfonate (PSS) is used as a dopant. 제 1항 내지 제 8항에서 선택되는 어느 한 항의 자외선 경화형조성물을 이용하여 제조되는 대전방지성 및 내스크래치성을 갖는 시트성형물.A sheet molding having an antistatic property and a scratch resistance produced using the ultraviolet curable composition of any one of claims 1 to 8. 삭제delete 삭제delete 폴리스티렌설포네이트로 도핑된 고형분 함량이 1.3중량%인 폴리티오펜계 도전성 고분자 수용액 4 내지 5.9 중량%, U-DPPA와 DPHA의 혼합물 7 내지 9.9 중량%, 유기용매 82 내지 88 중량%, 광개시제로 알파-하이드록시사이클로헥실페닐메탄논 0.4 내지 0.8 중량% 및 내스크래치 첨가제로 에톡실레이티드 실리콘 0.02 내지 0.05 중량%로 이루어지며 상기 조성물을 이용하여 제조된 코팅막이 4H이상의 경도와 107Ω/□ 이하의 표면저항 및 96% 이상의 가시광투과율을 가지는 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.4 to 5.9 wt% of polythiophene-based conductive polymer aqueous solution having a solid content doped with polystyrenesulfonate of 1.3 wt%, 7 to 9.9 wt% of a mixture of U-DPPA and DPHA, 82 to 88 wt% of organic solvent, alpha as photoinitiator 0.4 to 0.8 wt% of hydroxycyclohexylphenylmethanone and 0.02 to 0.05 wt% of ethoxylated silicone as a scratch-resistant additive, and the coating film prepared using the composition has a hardness of 4H or more and 10 7 Ω / □ or less. An ultraviolet curable composition having conductivity and scratch resistance, characterized by having a surface resistance of and a visible light transmittance of 96% or more. 제 12항에 있어서,The method of claim 12, 상기 유기용매는 노말-프로필알코올, 메틸셀로솔브, 프로필렌글리콜메틸에테르, 디-아세톤알코올 중에서 선택되는 하나 이상의 용매인 것을 특징으로 하는 도전성 및 내스크래치성을 갖는 자외선경화형조성물.The organic solvent is a UV-curable composition having conductivity and scratch resistance, characterized in that at least one solvent selected from normal-propyl alcohol, methyl cellosolve, propylene glycol methyl ether, di- acetone alcohol. 제 12항 또는 제 13항에서 선택되는 어느 한 항의 자외선 경화형조성물을 이용하여 제조되는 대전방지성 및 내스크래치성을 갖는 시트성형물.An antistatic and scratch resistant sheet molded article prepared using the ultraviolet curable composition of claim 12.
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