JP5423416B2 - Conductive composition, conductive film using the same, and laminate having the conductive film - Google Patents
Conductive composition, conductive film using the same, and laminate having the conductive film Download PDFInfo
- Publication number
- JP5423416B2 JP5423416B2 JP2010009594A JP2010009594A JP5423416B2 JP 5423416 B2 JP5423416 B2 JP 5423416B2 JP 2010009594 A JP2010009594 A JP 2010009594A JP 2010009594 A JP2010009594 A JP 2010009594A JP 5423416 B2 JP5423416 B2 JP 5423416B2
- Authority
- JP
- Japan
- Prior art keywords
- poly
- acid
- meth
- group
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000203 mixture Substances 0.000 title claims description 29
- -1 alkali metal salt Chemical class 0.000 claims description 53
- 239000002019 doping agent Substances 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 19
- 239000000178 monomer Substances 0.000 claims description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 16
- 229920001940 conductive polymer Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 14
- 229920005989 resin Polymers 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 12
- 239000002585 base Substances 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 7
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 6
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 5
- 150000008053 sultones Chemical class 0.000 claims description 5
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 claims description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 229930192474 thiophene Natural products 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 51
- 238000000576 coating method Methods 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 14
- 238000006116 polymerization reaction Methods 0.000 description 11
- 239000007787 solid Substances 0.000 description 10
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 9
- 239000006185 dispersion Substances 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 239000012986 chain transfer agent Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 229910003437 indium oxide Inorganic materials 0.000 description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 4
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 3
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 3
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 3
- 229910052809 inorganic oxide Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920000767 polyaniline Polymers 0.000 description 3
- 229920000447 polyanionic polymer Polymers 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 3
- QSUJHKWXLIQKEY-UHFFFAOYSA-N (2-oxooxolan-3-yl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCOC1=O QSUJHKWXLIQKEY-UHFFFAOYSA-N 0.000 description 2
- FSSPGSAQUIYDCN-UHFFFAOYSA-N 1,3-Propane sultone Chemical compound O=S1(=O)CCCO1 FSSPGSAQUIYDCN-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- QFNSAOSWJSCHID-UHFFFAOYSA-N 2-butylbenzenesulfonic acid Chemical compound CCCCC1=CC=CC=C1S(O)(=O)=O QFNSAOSWJSCHID-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- 229940092714 benzenesulfonic acid Drugs 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- GQVVQDJHRQBZNG-UHFFFAOYSA-N benzyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CC1=CC=CC=C1 GQVVQDJHRQBZNG-UHFFFAOYSA-N 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- AUZONCFQVSMFAP-UHFFFAOYSA-N disulfiram Chemical compound CCN(CC)C(=S)SSC(=S)N(CC)CC AUZONCFQVSMFAP-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- DOYOPBSXEIZLRE-UHFFFAOYSA-N pyrrole-3-carboxylic acid Chemical compound OC(=O)C=1C=CNC=1 DOYOPBSXEIZLRE-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- YNVOMSDITJMNET-UHFFFAOYSA-N thiophene-3-carboxylic acid Chemical compound OC(=O)C=1C=CSC=1 YNVOMSDITJMNET-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 2
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 2
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 2
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- YHQGMYUVUMAZJR-UHFFFAOYSA-N α-terpinene Chemical compound CC(C)C1=CC=C(C)CC1 YHQGMYUVUMAZJR-UHFFFAOYSA-N 0.000 description 2
- YKFLAYDHMOASIY-UHFFFAOYSA-N γ-terpinene Chemical compound CC(C)C1=CCC(C)=CC1 YKFLAYDHMOASIY-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- JIRHAGAOHOYLNO-UHFFFAOYSA-N (3-cyclopentyloxy-4-methoxyphenyl)methanol Chemical compound COC1=CC=C(CO)C=C1OC1CCCC1 JIRHAGAOHOYLNO-UHFFFAOYSA-N 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- YQZNAUDZOMRNEK-UHFFFAOYSA-N 1,1-diethoxy-2-(2-hydroxyethoxy)ethanol Chemical compound CCOC(O)(OCC)COCCO YQZNAUDZOMRNEK-UHFFFAOYSA-N 0.000 description 1
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 1
- IEIADDVJUYQKAZ-UHFFFAOYSA-N 1,8-naphthosultone Chemical compound C1=CC(S(=O)(=O)O2)=C3C2=CC=CC3=C1 IEIADDVJUYQKAZ-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- GMLYXPGQZVOYNT-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethylperoxy)ethane Chemical group CCOCCOOCCOCC GMLYXPGQZVOYNT-UHFFFAOYSA-N 0.000 description 1
- PZHIWRCQKBBTOW-UHFFFAOYSA-N 1-ethoxybutane Chemical compound CCCCOCC PZHIWRCQKBBTOW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- 229940015297 1-octanesulfonic acid Drugs 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- ZPOROQKDAPEMOL-UHFFFAOYSA-N 1h-pyrrol-3-ol Chemical compound OC=1C=CNC=1 ZPOROQKDAPEMOL-UHFFFAOYSA-N 0.000 description 1
- PCYWMDGJYQAMCR-UHFFFAOYSA-N 1h-pyrrole-3-carbonitrile Chemical compound N#CC=1C=CNC=1 PCYWMDGJYQAMCR-UHFFFAOYSA-N 0.000 description 1
- DCYGAPKNVCQNOE-UHFFFAOYSA-N 2,2,2-triphenylacetic acid Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C(=O)O)C1=CC=CC=C1 DCYGAPKNVCQNOE-UHFFFAOYSA-N 0.000 description 1
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 1
- AXUKJPRXRCPFFE-UHFFFAOYSA-N 2,3-dipropylbenzenesulfonic acid Chemical compound CCCC1=CC=CC(S(O)(=O)=O)=C1CCC AXUKJPRXRCPFFE-UHFFFAOYSA-N 0.000 description 1
- CHZLVSBMXZSPNN-UHFFFAOYSA-N 2,4-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C(C)=C1 CHZLVSBMXZSPNN-UHFFFAOYSA-N 0.000 description 1
- VJZBTBIZXCDAMV-UHFFFAOYSA-N 2-(1,3-dioxo-5,6,7,7a-tetrahydro-4h-isoindol-3a-yl)ethyl prop-2-enoate Chemical compound C1CCCC2C(=O)NC(=O)C21CCOC(=O)C=C VJZBTBIZXCDAMV-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- ILSNUTAMGVJXNT-UHFFFAOYSA-N 2-(2-phenoxyethyl)thiophene Chemical compound C=1C=CC=CC=1OCCC1=CC=CS1 ILSNUTAMGVJXNT-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- AAMTXHVZOHPPQR-UHFFFAOYSA-N 2-(hydroxymethyl)prop-2-enoic acid Chemical compound OCC(=C)C(O)=O AAMTXHVZOHPPQR-UHFFFAOYSA-N 0.000 description 1
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 1
- VUDVPVOIALASLB-UHFFFAOYSA-N 2-[(2-cyano-1-hydroxypropan-2-yl)diazenyl]-3-hydroxy-2-methylpropanenitrile Chemical compound OCC(C)(C#N)N=NC(C)(CO)C#N VUDVPVOIALASLB-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 1
- OCKQMFDZQUFKRD-UHFFFAOYSA-N 2-[(3-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC(COCC2OC2)=C1 OCKQMFDZQUFKRD-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- AJJLBMIIDVIQIA-UHFFFAOYSA-N 2-[1-(2-ethenylphenyl)ethoxymethyl]oxirane Chemical compound C=1C=CC=C(C=C)C=1C(C)OCC1CO1 AJJLBMIIDVIQIA-UHFFFAOYSA-N 0.000 description 1
- WZPIYCSDWSSKRZ-UHFFFAOYSA-N 2-[1-(3-ethenylphenyl)ethoxymethyl]oxirane Chemical compound C=1C=CC(C=C)=CC=1C(C)OCC1CO1 WZPIYCSDWSSKRZ-UHFFFAOYSA-N 0.000 description 1
- GBQNGHNVAOQHBN-UHFFFAOYSA-N 2-[1-(4-ethenylphenyl)ethoxymethyl]oxirane Chemical compound C=1C=C(C=C)C=CC=1C(C)OCC1CO1 GBQNGHNVAOQHBN-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FMVOPJLFZGSYOS-UHFFFAOYSA-N 2-[2-(2-ethoxypropoxy)propoxy]propan-1-ol Chemical compound CCOC(C)COC(C)COC(C)CO FMVOPJLFZGSYOS-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- BWONDYSHSJIGBM-UHFFFAOYSA-N 2-[[2-ethenyl-3,5-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=C(COCC2OC2)C=C(COCC2OC2)C(C=C)=C1COCC1CO1 BWONDYSHSJIGBM-UHFFFAOYSA-N 0.000 description 1
- DZYCUUFNXNXWBU-UHFFFAOYSA-N 2-[[2-ethenyl-3,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=CC(COCC2OC2)=C(COCC2OC2)C(C=C)=C1COCC1CO1 DZYCUUFNXNXWBU-UHFFFAOYSA-N 0.000 description 1
- NAHOABUATCSPEQ-UHFFFAOYSA-N 2-[[2-ethenyl-3-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=CC=C(COCC2OC2)C(C=C)=C1COCC1CO1 NAHOABUATCSPEQ-UHFFFAOYSA-N 0.000 description 1
- NCEFSFLKLRMYOL-UHFFFAOYSA-N 2-[[2-ethenyl-4,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C=1C(COCC2OC2)=C(COCC2OC2)C(C=C)=CC=1COCC1CO1 NCEFSFLKLRMYOL-UHFFFAOYSA-N 0.000 description 1
- LOXIWIOCGARHCY-UHFFFAOYSA-N 2-[[2-ethenyl-4-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C=1C=C(COCC2OC2)C(C=C)=CC=1COCC1CO1 LOXIWIOCGARHCY-UHFFFAOYSA-N 0.000 description 1
- DMAFESHBEJJZMF-UHFFFAOYSA-N 2-[[2-ethenyl-5-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1=C(COCC2OC2)C(C=C)=CC=C1COCC1CO1 DMAFESHBEJJZMF-UHFFFAOYSA-N 0.000 description 1
- RPZQXXDQOBDBGO-UHFFFAOYSA-N 2-[[2-ethenyl-6-(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1OC1COCC=1C(C=C)=CC=CC=1COCC1CO1 RPZQXXDQOBDBGO-UHFFFAOYSA-N 0.000 description 1
- JHLMJWVEODHXFB-UHFFFAOYSA-N 2-[[3-ethenyl-2,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1OC1COCC1=C(COCC2OC2)C(C=C)=CC=C1COCC1CO1 JHLMJWVEODHXFB-UHFFFAOYSA-N 0.000 description 1
- HBJKAXHCQPNZBZ-UHFFFAOYSA-N 2-[[4-ethenyl-2,6-bis(oxiran-2-ylmethoxymethyl)phenyl]methoxymethyl]oxirane Chemical compound C1OC1COCC=1C(COCC2OC2)=CC(C=C)=CC=1COCC1CO1 HBJKAXHCQPNZBZ-UHFFFAOYSA-N 0.000 description 1
- ICGLGDINCXDWJB-UHFFFAOYSA-N 2-benzylprop-2-enamide Chemical compound NC(=O)C(=C)CC1=CC=CC=C1 ICGLGDINCXDWJB-UHFFFAOYSA-N 0.000 description 1
- DNYWXJPIRSNXIP-UHFFFAOYSA-N 2-bromo-1,1,1-trichloroethane Chemical compound ClC(Cl)(Cl)CBr DNYWXJPIRSNXIP-UHFFFAOYSA-N 0.000 description 1
- OQFSYHWITGFERZ-UHFFFAOYSA-N 2-bromoethanesulfonic acid Chemical compound OS(=O)(=O)CCBr OQFSYHWITGFERZ-UHFFFAOYSA-N 0.000 description 1
- GNUGVECARVKIPH-UHFFFAOYSA-N 2-ethenoxypropane Chemical compound CC(C)OC=C GNUGVECARVKIPH-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- OWHSTLLOZWTNTQ-UHFFFAOYSA-N 2-ethylhexyl 2-sulfanylacetate Chemical compound CCCCC(CC)COC(=O)CS OWHSTLLOZWTNTQ-UHFFFAOYSA-N 0.000 description 1
- PORAHJALQRWUNW-UHFFFAOYSA-N 2-heptan-3-ylthiophene Chemical compound CCCCC(CC)C1=CC=CS1 PORAHJALQRWUNW-UHFFFAOYSA-N 0.000 description 1
- XATFRRKBXKIIRM-UHFFFAOYSA-N 2-heptylbenzenesulfonic acid Chemical compound CCCCCCCC1=CC=CC=C1S(O)(=O)=O XATFRRKBXKIIRM-UHFFFAOYSA-N 0.000 description 1
- SYSFRXFRWRDPIJ-UHFFFAOYSA-N 2-hexylbenzenesulfonic acid Chemical compound CCCCCCC1=CC=CC=C1S(O)(=O)=O SYSFRXFRWRDPIJ-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 229940006193 2-mercaptoethanesulfonic acid Drugs 0.000 description 1
- ICPWFHKNYYRBSZ-UHFFFAOYSA-M 2-methoxypropanoate Chemical compound COC(C)C([O-])=O ICPWFHKNYYRBSZ-UHFFFAOYSA-M 0.000 description 1
- WODGMMJHSAKKNF-UHFFFAOYSA-N 2-methylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C)=CC=C21 WODGMMJHSAKKNF-UHFFFAOYSA-N 0.000 description 1
- XEEYSDHEOQHCDA-UHFFFAOYSA-N 2-methylprop-2-ene-1-sulfonic acid Chemical compound CC(=C)CS(O)(=O)=O XEEYSDHEOQHCDA-UHFFFAOYSA-N 0.000 description 1
- ABUFMGLVKVVDFW-UHFFFAOYSA-N 2-methylpropane-2-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CC(C)(C)S(O)(=O)=O ABUFMGLVKVVDFW-UHFFFAOYSA-N 0.000 description 1
- QWHHBVWZZLQUIH-UHFFFAOYSA-N 2-octylbenzenesulfonic acid Chemical compound CCCCCCCCC1=CC=CC=C1S(O)(=O)=O QWHHBVWZZLQUIH-UHFFFAOYSA-N 0.000 description 1
- QQBZFCFCMKHPPC-UHFFFAOYSA-N 2-pentadecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O QQBZFCFCMKHPPC-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- OBNZQBVPDZWAEB-UHFFFAOYSA-N 2-phenylprop-1-ene-1-sulfonic acid Chemical compound OS(=O)(=O)C=C(C)C1=CC=CC=C1 OBNZQBVPDZWAEB-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- ZQGPVVNVISOGEU-UHFFFAOYSA-N 2-propylbenzenesulfonic acid Chemical compound CCCC1=CC=CC=C1S(O)(=O)=O ZQGPVVNVISOGEU-UHFFFAOYSA-N 0.000 description 1
- REBMNRMQTSWMMI-UHFFFAOYSA-N 3,4-dibromo-1h-pyrrole Chemical compound BrC1=CNC=C1Br REBMNRMQTSWMMI-UHFFFAOYSA-N 0.000 description 1
- VGKLVWTVCUDISO-UHFFFAOYSA-N 3,4-dibromothiophene Chemical compound BrC1=CSC=C1Br VGKLVWTVCUDISO-UHFFFAOYSA-N 0.000 description 1
- LGPVKMIWERPYIJ-UHFFFAOYSA-N 3,4-dibutyl-1h-pyrrole Chemical compound CCCCC1=CNC=C1CCCC LGPVKMIWERPYIJ-UHFFFAOYSA-N 0.000 description 1
- FKXCQUBXKMXXBG-UHFFFAOYSA-N 3,4-dibutylthiophene Chemical compound CCCCC1=CSC=C1CCCC FKXCQUBXKMXXBG-UHFFFAOYSA-N 0.000 description 1
- OJFOWGWQOFZNNJ-UHFFFAOYSA-N 3,4-dimethyl-1h-pyrrole Chemical compound CC1=CNC=C1C OJFOWGWQOFZNNJ-UHFFFAOYSA-N 0.000 description 1
- GPSFYJDZKSRMKZ-UHFFFAOYSA-N 3,4-dimethylthiophene Chemical compound CC1=CSC=C1C GPSFYJDZKSRMKZ-UHFFFAOYSA-N 0.000 description 1
- KFGFVPMRLOQXNB-UHFFFAOYSA-N 3,5,5-trimethylhexanoyl 3,5,5-trimethylhexaneperoxoate Chemical compound CC(C)(C)CC(C)CC(=O)OOC(=O)CC(C)CC(C)(C)C KFGFVPMRLOQXNB-UHFFFAOYSA-N 0.000 description 1
- RCXUFGSXIWDCQI-UHFFFAOYSA-N 3,5-dihydro-2h-[1,4]dioxino[2,3-b]pyrrole Chemical compound O1CCOC2=C1C=CN2 RCXUFGSXIWDCQI-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- NAWKEZLVUCJIPH-UHFFFAOYSA-N 3-(2-ethylhexoxy)-1H-pyrrole Chemical compound C(C)C(COC1=CNC=C1)CCCC NAWKEZLVUCJIPH-UHFFFAOYSA-N 0.000 description 1
- VYKRLIYPHRWOEN-UHFFFAOYSA-N 3-(2-ethylhexoxy)thiophene Chemical compound CCCCC(CC)COC=1C=CSC=1 VYKRLIYPHRWOEN-UHFFFAOYSA-N 0.000 description 1
- PVFCMODNLWOFGE-UHFFFAOYSA-N 3-(2-ethylhexyl)-1H-pyrrole Chemical compound C(C)C(CC1=CNC=C1)CCCC PVFCMODNLWOFGE-UHFFFAOYSA-N 0.000 description 1
- HWMQCIZYXLAJKM-UHFFFAOYSA-N 3-(2-ethylhexyl)thiophene Chemical compound CCCCC(CC)CC=1C=CSC=1 HWMQCIZYXLAJKM-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- HHHPYRGQUSPESB-UHFFFAOYSA-N 3-(dimethoxymethylsilyl)propyl prop-2-enoate Chemical compound COC(OC)[SiH2]CCCOC(=O)C=C HHHPYRGQUSPESB-UHFFFAOYSA-N 0.000 description 1
- SNKZJIOFVMKAOJ-UHFFFAOYSA-N 3-Aminopropanesulfonate Chemical compound NCCCS(O)(=O)=O SNKZJIOFVMKAOJ-UHFFFAOYSA-N 0.000 description 1
- ZSPTYLOMNJNZNG-UHFFFAOYSA-N 3-Buten-1-ol Chemical compound OCCC=C ZSPTYLOMNJNZNG-UHFFFAOYSA-N 0.000 description 1
- ZZHFDFIWLDELCX-UHFFFAOYSA-N 3-bromo-1h-pyrrole Chemical compound BrC=1C=CNC=1 ZZHFDFIWLDELCX-UHFFFAOYSA-N 0.000 description 1
- XCMISAPCWHTVNG-UHFFFAOYSA-N 3-bromothiophene Chemical compound BrC=1C=CSC=1 XCMISAPCWHTVNG-UHFFFAOYSA-N 0.000 description 1
- FCVHZARBOWEONP-UHFFFAOYSA-N 3-butoxy-1h-pyrrole Chemical compound CCCCOC=1C=CNC=1 FCVHZARBOWEONP-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- NZSSXTMHSXMZBL-UHFFFAOYSA-N 3-butoxythiophene Chemical compound CCCCOC=1C=CSC=1 NZSSXTMHSXMZBL-UHFFFAOYSA-N 0.000 description 1
- ATWNFFKGYPYZPJ-UHFFFAOYSA-N 3-butyl-1h-pyrrole Chemical compound CCCCC=1C=CNC=1 ATWNFFKGYPYZPJ-UHFFFAOYSA-N 0.000 description 1
- KPOCSQCZXMATFR-UHFFFAOYSA-N 3-butylthiophene Chemical compound CCCCC=1C=CSC=1 KPOCSQCZXMATFR-UHFFFAOYSA-N 0.000 description 1
- UUUOHRSINXUJKX-UHFFFAOYSA-N 3-chloro-1h-pyrrole Chemical compound ClC=1C=CNC=1 UUUOHRSINXUJKX-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- QUBJDMPBDURTJT-UHFFFAOYSA-N 3-chlorothiophene Chemical compound ClC=1C=CSC=1 QUBJDMPBDURTJT-UHFFFAOYSA-N 0.000 description 1
- BLTAXUSWJSKART-UHFFFAOYSA-N 3-dodecoxy-1H-pyrrole Chemical compound C(CCCCCCCCCCC)OC1=CNC=C1 BLTAXUSWJSKART-UHFFFAOYSA-N 0.000 description 1
- HQKVUWMATDWFJI-UHFFFAOYSA-N 3-dodecoxythiophene Chemical compound CCCCCCCCCCCCOC=1C=CSC=1 HQKVUWMATDWFJI-UHFFFAOYSA-N 0.000 description 1
- HGICMYITGGLHHY-UHFFFAOYSA-N 3-dodecyl-1h-pyrrole Chemical compound CCCCCCCCCCCCC=1C=CNC=1 HGICMYITGGLHHY-UHFFFAOYSA-N 0.000 description 1
- RFKWIEFTBMACPZ-UHFFFAOYSA-N 3-dodecylthiophene Chemical compound CCCCCCCCCCCCC=1C=CSC=1 RFKWIEFTBMACPZ-UHFFFAOYSA-N 0.000 description 1
- KEAYXGHOGPUYPB-UHFFFAOYSA-N 3-ethoxy-1h-pyrrole Chemical compound CCOC=1C=CNC=1 KEAYXGHOGPUYPB-UHFFFAOYSA-N 0.000 description 1
- LQSUUFPSVYPNEL-UHFFFAOYSA-N 3-ethoxy-4-methyl-1h-pyrrole Chemical compound CCOC1=CNC=C1C LQSUUFPSVYPNEL-UHFFFAOYSA-N 0.000 description 1
- ZFQVXRBCYGOGAA-UHFFFAOYSA-N 3-ethoxy-4-methylthiophene Chemical compound CCOC1=CSC=C1C ZFQVXRBCYGOGAA-UHFFFAOYSA-N 0.000 description 1
- RLLBWIDEGAIFPI-UHFFFAOYSA-N 3-ethyl-1h-pyrrole Chemical compound CCC=1C=CNC=1 RLLBWIDEGAIFPI-UHFFFAOYSA-N 0.000 description 1
- SLDBAXYJAIRQMX-UHFFFAOYSA-N 3-ethylthiophene Chemical compound CCC=1C=CSC=1 SLDBAXYJAIRQMX-UHFFFAOYSA-N 0.000 description 1
- XMMFKXRGHKXAGG-UHFFFAOYSA-N 3-fluoro-1h-pyrrole Chemical compound FC=1C=CNC=1 XMMFKXRGHKXAGG-UHFFFAOYSA-N 0.000 description 1
- WPAQIMRFMFRJTP-UHFFFAOYSA-N 3-fluorothiophene Chemical compound FC=1C=CSC=1 WPAQIMRFMFRJTP-UHFFFAOYSA-N 0.000 description 1
- IOKBHBPVRURKRQ-UHFFFAOYSA-N 3-hexoxy-1h-pyrrole Chemical compound CCCCCCOC=1C=CNC=1 IOKBHBPVRURKRQ-UHFFFAOYSA-N 0.000 description 1
- GFJHLDVJFOQWLT-UHFFFAOYSA-N 3-hexoxythiophene Chemical compound CCCCCCOC=1C=CSC=1 GFJHLDVJFOQWLT-UHFFFAOYSA-N 0.000 description 1
- CKGUYTNEYKYAQZ-UHFFFAOYSA-N 3-hexyl-1h-pyrrole Chemical compound CCCCCCC=1C=CNC=1 CKGUYTNEYKYAQZ-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- PQHJOXAAUHYVKJ-UHFFFAOYSA-N 3-iodo-1h-pyrrole Chemical compound IC=1C=CNC=1 PQHJOXAAUHYVKJ-UHFFFAOYSA-N 0.000 description 1
- WGKRMQIQXMJVFZ-UHFFFAOYSA-N 3-iodothiophene Chemical compound IC=1C=CSC=1 WGKRMQIQXMJVFZ-UHFFFAOYSA-N 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
- OTODBDQJLMYYKQ-UHFFFAOYSA-N 3-methoxy-1h-pyrrole Chemical compound COC=1C=CNC=1 OTODBDQJLMYYKQ-UHFFFAOYSA-N 0.000 description 1
- KAWOHTPEXDYIOJ-UHFFFAOYSA-N 3-methoxy-4-methyl-1h-pyrrole Chemical compound COC1=CNC=C1C KAWOHTPEXDYIOJ-UHFFFAOYSA-N 0.000 description 1
- HGDGACBSGVRCSM-UHFFFAOYSA-N 3-methoxy-4-methylthiophene Chemical compound COC1=CSC=C1C HGDGACBSGVRCSM-UHFFFAOYSA-N 0.000 description 1
- FEKWWZCCJDUWLY-UHFFFAOYSA-N 3-methyl-1h-pyrrole Chemical compound CC=1C=CNC=1 FEKWWZCCJDUWLY-UHFFFAOYSA-N 0.000 description 1
- OIXVNYHVHGWVEN-UHFFFAOYSA-N 3-methyl-5-(1h-pyrrol-2-yl)pentanoic acid Chemical compound OC(=O)CC(C)CCC1=CC=CN1 OIXVNYHVHGWVEN-UHFFFAOYSA-N 0.000 description 1
- GRTWOPGOPPTXOA-UHFFFAOYSA-N 3-methyl-5-thiophen-2-ylpentanoic acid Chemical compound OC(=O)CC(C)CCC1=CC=CS1 GRTWOPGOPPTXOA-UHFFFAOYSA-N 0.000 description 1
- FXNUTCHQNZBLFQ-UHFFFAOYSA-N 3-octadecoxy-1H-pyrrole Chemical compound C(CCCCCCCCCCCCCCCCC)OC1=CNC=C1 FXNUTCHQNZBLFQ-UHFFFAOYSA-N 0.000 description 1
- KPORMHZYIJPHAV-UHFFFAOYSA-N 3-octadecoxythiophene Chemical compound CCCCCCCCCCCCCCCCCCOC=1C=CSC=1 KPORMHZYIJPHAV-UHFFFAOYSA-N 0.000 description 1
- GNRWJLDIWSTMMT-UHFFFAOYSA-N 3-octadecyl-1h-pyrrole Chemical compound CCCCCCCCCCCCCCCCCCC=1C=CNC=1 GNRWJLDIWSTMMT-UHFFFAOYSA-N 0.000 description 1
- ARFJPHXJBIEWSZ-UHFFFAOYSA-N 3-octadecylthiophene Chemical compound CCCCCCCCCCCCCCCCCCC=1C=CSC=1 ARFJPHXJBIEWSZ-UHFFFAOYSA-N 0.000 description 1
- YIRWZHZOCIDDAH-UHFFFAOYSA-N 3-octoxy-1h-pyrrole Chemical compound CCCCCCCCOC=1C=CNC=1 YIRWZHZOCIDDAH-UHFFFAOYSA-N 0.000 description 1
- AUVZKIJQGLYISA-UHFFFAOYSA-N 3-octoxythiophene Chemical compound CCCCCCCCOC=1C=CSC=1 AUVZKIJQGLYISA-UHFFFAOYSA-N 0.000 description 1
- WFHVTZRAIPYMMO-UHFFFAOYSA-N 3-octyl-1h-pyrrole Chemical compound CCCCCCCCC=1C=CNC=1 WFHVTZRAIPYMMO-UHFFFAOYSA-N 0.000 description 1
- LJDRAKFYYGCAQC-UHFFFAOYSA-N 3-phenyl-1h-pyrrole Chemical compound N1C=CC(C=2C=CC=CC=2)=C1 LJDRAKFYYGCAQC-UHFFFAOYSA-N 0.000 description 1
- ZDQZVKVIYAPRON-UHFFFAOYSA-N 3-phenylthiophene Chemical compound S1C=CC(C=2C=CC=CC=2)=C1 ZDQZVKVIYAPRON-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- FAOPZUAEZGKQNC-UHFFFAOYSA-N 3-propyl-1h-pyrrole Chemical compound CCCC=1C=CNC=1 FAOPZUAEZGKQNC-UHFFFAOYSA-N 0.000 description 1
- QZNFRMXKQCIPQY-UHFFFAOYSA-N 3-propylthiophene Chemical compound CCCC=1C=CSC=1 QZNFRMXKQCIPQY-UHFFFAOYSA-N 0.000 description 1
- MAGBDTYJNJLSLP-UHFFFAOYSA-N 3-sulfonylpyrrole Chemical compound S(=O)(=O)=C1C=NC=C1 MAGBDTYJNJLSLP-UHFFFAOYSA-N 0.000 description 1
- IBRQELYMCHHXQE-UHFFFAOYSA-N 3-sulfonylthiophene Chemical compound O=S(=O)=C1CSC=C1 IBRQELYMCHHXQE-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- IEEGFBHLLWBJJH-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butane-1-sulfonic acid Chemical compound CC(=C)C(=O)OCCCCS(O)(=O)=O IEEGFBHLLWBJJH-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- AGAIBVLCUXWQRE-UHFFFAOYSA-N 4-[(4-carboxy-2-cyanobutan-2-yl)diazenyl]-4-cyanopentanoic acid methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC.OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N AGAIBVLCUXWQRE-UHFFFAOYSA-N 0.000 description 1
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 1
- ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 description 1
- RJWBTWIBUIGANW-UHFFFAOYSA-N 4-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-N 0.000 description 1
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 1
- BRIXOPDYGQCZFO-UHFFFAOYSA-N 4-ethylphenylsulfonic acid Chemical compound CCC1=CC=C(S(O)(=O)=O)C=C1 BRIXOPDYGQCZFO-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- FXPOCCDGHHTZAO-UHFFFAOYSA-N 4-methyl-1h-pyrrole-3-carboxylic acid Chemical compound CC1=CNC=C1C(O)=O FXPOCCDGHHTZAO-UHFFFAOYSA-N 0.000 description 1
- LRFIHWGUGBXFEC-UHFFFAOYSA-N 4-methylthiophene-3-carboxylic acid Chemical compound CC1=CSC=C1C(O)=O LRFIHWGUGBXFEC-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- QYQPEMBKLALUJY-UHFFFAOYSA-N 5-ethyl-4-methyl-1H-pyrrole-3-carboxylic acid Chemical compound CC1=C(NC=C1C(=O)O)CC QYQPEMBKLALUJY-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- QGFSQVPRCWJZQK-UHFFFAOYSA-N 9-Decen-1-ol Chemical compound OCCCCCCCCC=C QGFSQVPRCWJZQK-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229920003026 Acene Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- QTUPDYYYLIUZAU-UHFFFAOYSA-N C(CCC)C(CC)C=1NC=CC1 Chemical compound C(CCC)C(CC)C=1NC=CC1 QTUPDYYYLIUZAU-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N DEAEMA Natural products CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- FVCPXLWAKNJIKK-UHFFFAOYSA-N Dimexano Chemical compound COC(=S)SSC(=S)OC FVCPXLWAKNJIKK-UHFFFAOYSA-N 0.000 description 1
- FVIGODVHAVLZOO-UHFFFAOYSA-N Dixanthogen Chemical compound CCOC(=S)SSC(=S)OCC FVIGODVHAVLZOO-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- WSTYNZDAOAEEKG-UHFFFAOYSA-N Mayol Natural products CC1=C(O)C(=O)C=C2C(CCC3(C4CC(C(CC4(CCC33C)C)=O)C)C)(C)C3=CC=C21 WSTYNZDAOAEEKG-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 1
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- 229920000280 Poly(3-octylthiophene) Polymers 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- RRDRHWJDBOGQHN-JWCTVYNTSA-N [2-[(2s,5r,8s,11s,14r,17s,22s)-17-[(1r)-1-hydroxyethyl]-22-[[(2s)-2-[[(2s,3r)-3-hydroxy-2-[[(2s)-2-[6-methyloctanoyl(sulfomethyl)amino]-4-(sulfomethylamino)butanoyl]amino]butyl]amino]-4-(sulfomethylamino)butanoyl]amino]-5,8-bis(2-methylpropyl)-3,6,9,12,15 Chemical compound CCC(C)CCCCC(=O)N(CS(O)(=O)=O)[C@@H](CCNCS(O)(=O)=O)C(=O)N[C@H]([C@@H](C)O)CN[C@@H](CCNCS(O)(=O)=O)C(=O)N[C@H]1CCNC(=O)[C@H]([C@@H](C)O)NC(=O)[C@@H](CCNCS(O)(=O)=O)NC(=O)[C@H](CCNCS(O)(=O)=O)NC(=O)[C@H](CC(C)C)NC(=O)[C@@H](CC(C)C)NC(=O)[C@H](CCNCS(O)(=O)=O)NC1=O RRDRHWJDBOGQHN-JWCTVYNTSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- BWDSXUIPACFTNN-UHFFFAOYSA-N [SiH4].CCCCCCCC[Si](OCC)(OCC)OCC Chemical compound [SiH4].CCCCCCCC[Si](OCC)(OCC)OCC BWDSXUIPACFTNN-UHFFFAOYSA-N 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- CPLASELWOOUNGW-UHFFFAOYSA-N benzyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CC1=CC=CC=C1 CPLASELWOOUNGW-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 1
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- IWPATTDMSUYMJV-UHFFFAOYSA-N butyl 2-methoxyacetate Chemical compound CCCCOC(=O)COC IWPATTDMSUYMJV-UHFFFAOYSA-N 0.000 description 1
- SKGVGRLWZVRZDC-UHFFFAOYSA-N butyl 2-sulfanylacetate Chemical compound CCCCOC(=O)CS SKGVGRLWZVRZDC-UHFFFAOYSA-N 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- RLGQACBPNDBWTB-UHFFFAOYSA-N cetyltrimethylammonium ion Chemical compound CCCCCCCCCCCCCCCC[N+](C)(C)C RLGQACBPNDBWTB-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- ZNEWHQLOPFWXOF-UHFFFAOYSA-N coenzyme M Chemical compound OS(=O)(=O)CCS ZNEWHQLOPFWXOF-UHFFFAOYSA-N 0.000 description 1
- 108700028201 colistinmethanesulfonic acid Proteins 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- PGAXJQVAHDTGBB-UHFFFAOYSA-N dibutylcarbamothioylsulfanyl n,n-dibutylcarbamodithioate Chemical compound CCCCN(CCCC)C(=S)SSC(=S)N(CCCC)CCCC PGAXJQVAHDTGBB-UHFFFAOYSA-N 0.000 description 1
- ZFTFAPZRGNKQPU-UHFFFAOYSA-N dicarbonic acid Chemical compound OC(=O)OC(O)=O ZFTFAPZRGNKQPU-UHFFFAOYSA-N 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- FBELJLCOAHMRJK-UHFFFAOYSA-L disodium;2,2-bis(2-ethylhexyl)-3-sulfobutanedioate Chemical compound [Na+].[Na+].CCCCC(CC)CC(C([O-])=O)(C(C([O-])=O)S(O)(=O)=O)CC(CC)CCCC FBELJLCOAHMRJK-UHFFFAOYSA-L 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- WBZKQQHYRPRKNJ-UHFFFAOYSA-L disulfite Chemical compound [O-]S(=O)S([O-])(=O)=O WBZKQQHYRPRKNJ-UHFFFAOYSA-L 0.000 description 1
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 description 1
- 229960002377 dixanthogen Drugs 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000005678 ethenylene group Chemical class [H]C([*:1])=C([H])[*:2] 0.000 description 1
- SYGAXBISYRORDR-UHFFFAOYSA-N ethyl 2-(hydroxymethyl)prop-2-enoate Chemical compound CCOC(=O)C(=C)CO SYGAXBISYRORDR-UHFFFAOYSA-N 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- JLEKJZUYWFJPMB-UHFFFAOYSA-N ethyl 2-methoxyacetate Chemical compound CCOC(=O)COC JLEKJZUYWFJPMB-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- FJAKCEHATXBFJT-UHFFFAOYSA-N ethyl 2-oxobutanoate Chemical compound CCOC(=O)C(=O)CC FJAKCEHATXBFJT-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- JGFZNNIVVJXRND-UHFFFAOYSA-O ethyl-di(propan-2-yl)azanium Chemical compound CC[NH+](C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-O 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- NVVZQXQBYZPMLJ-UHFFFAOYSA-N formaldehyde;naphthalene-1-sulfonic acid Chemical compound O=C.C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 NVVZQXQBYZPMLJ-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UIZVMOZAXAMASY-UHFFFAOYSA-N hex-5-en-1-ol Chemical compound OCCCCC=C UIZVMOZAXAMASY-UHFFFAOYSA-N 0.000 description 1
- ORTRWBYBJVGVQC-UHFFFAOYSA-N hexadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCS ORTRWBYBJVGVQC-UHFFFAOYSA-N 0.000 description 1
- FYAQQULBLMNGAH-UHFFFAOYSA-N hexane-1-sulfonic acid Chemical compound CCCCCCS(O)(=O)=O FYAQQULBLMNGAH-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229940079826 hydrogen sulfite Drugs 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- PPFNAOBWGRMDLL-UHFFFAOYSA-N methyl 2-ethoxyacetate Chemical compound CCOCC(=O)OC PPFNAOBWGRMDLL-UHFFFAOYSA-N 0.000 description 1
- AKWHOGIYEOZALP-UHFFFAOYSA-N methyl 2-methoxy-2-methylpropanoate Chemical compound COC(=O)C(C)(C)OC AKWHOGIYEOZALP-UHFFFAOYSA-N 0.000 description 1
- XPIWVCAMONZQCP-UHFFFAOYSA-N methyl 2-oxobutanoate Chemical compound CCC(=O)C(=O)OC XPIWVCAMONZQCP-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- WUOSYUHCXLQPQJ-UHFFFAOYSA-N n-(3-chlorophenyl)-n-methylacetamide Chemical compound CC(=O)N(C)C1=CC=CC(Cl)=C1 WUOSYUHCXLQPQJ-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- RGHXWDVNBYKJQH-UHFFFAOYSA-N nitroacetic acid Chemical compound OC(=O)C[N+]([O-])=O RGHXWDVNBYKJQH-UHFFFAOYSA-N 0.000 description 1
- ZWWQICJTBOCQLA-UHFFFAOYSA-N o-propan-2-yl (propan-2-yloxycarbothioyldisulfanyl)methanethioate Chemical compound CC(C)OC(=S)SSC(=S)OC(C)C ZWWQICJTBOCQLA-UHFFFAOYSA-N 0.000 description 1
- WXPWPYISTQCNDP-UHFFFAOYSA-N oct-7-en-1-ol Chemical compound OCCCCCCC=C WXPWPYISTQCNDP-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- MADOXCFISYCULS-UHFFFAOYSA-N octyl 2-sulfanylacetate Chemical compound CCCCCCCCOC(=O)CS MADOXCFISYCULS-UHFFFAOYSA-N 0.000 description 1
- LWNSNYBMYBWJDN-UHFFFAOYSA-N octyl 3-sulfanylpropanoate Chemical compound CCCCCCCCOC(=O)CCS LWNSNYBMYBWJDN-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- MHYFEEDKONKGEB-UHFFFAOYSA-N oxathiane 2,2-dioxide Chemical compound O=S1(=O)CCCCO1 MHYFEEDKONKGEB-UHFFFAOYSA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- YWXLYZIZWVOMML-UHFFFAOYSA-N oxirane-2,2,3,3-tetracarbonitrile Chemical compound N#CC1(C#N)OC1(C#N)C#N YWXLYZIZWVOMML-UHFFFAOYSA-N 0.000 description 1
- LQAVWYMTUMSFBE-UHFFFAOYSA-N pent-4-en-1-ol Chemical compound OCCCC=C LQAVWYMTUMSFBE-UHFFFAOYSA-N 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- STIABRLGDKHASC-UHFFFAOYSA-N phthalic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C1=CC=CC=C1C(O)=O STIABRLGDKHASC-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920002849 poly(3-ethoxythiophene) polymer Polymers 0.000 description 1
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 1
- 229920002850 poly(3-methoxythiophene) polymer Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- HEZHYQDYRPUXNJ-UHFFFAOYSA-L potassium dithionite Chemical compound [K+].[K+].[O-]S(=O)S([O-])=O HEZHYQDYRPUXNJ-UHFFFAOYSA-L 0.000 description 1
- SXVNFKXWFLODKO-UHFFFAOYSA-M potassium hydrogen sulfite hydrate Chemical compound O.[K+].OS([O-])=O SXVNFKXWFLODKO-UHFFFAOYSA-M 0.000 description 1
- 229910001380 potassium hypophosphite Inorganic materials 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- CRGPNLUFHHUKCM-UHFFFAOYSA-M potassium phosphinate Chemical compound [K+].[O-]P=O CRGPNLUFHHUKCM-UHFFFAOYSA-M 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- QROGIFZRVHSFLM-UHFFFAOYSA-N prop-1-enylbenzene Chemical class CC=CC1=CC=CC=C1 QROGIFZRVHSFLM-UHFFFAOYSA-N 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- KOPQZJAYZFAPBC-UHFFFAOYSA-N propanoyl propaneperoxoate Chemical compound CCC(=O)OOC(=O)CC KOPQZJAYZFAPBC-UHFFFAOYSA-N 0.000 description 1
- YPVDWEHVCUBACK-UHFFFAOYSA-N propoxycarbonyloxy propyl carbonate Chemical compound CCCOC(=O)OOC(=O)OCCC YPVDWEHVCUBACK-UHFFFAOYSA-N 0.000 description 1
- CYIRLFJPTCUCJB-UHFFFAOYSA-N propyl 2-methoxypropanoate Chemical compound CCCOC(=O)C(C)OC CYIRLFJPTCUCJB-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- GRJISGHXMUQUMC-UHFFFAOYSA-N silyl prop-2-enoate Chemical class [SiH3]OC(=O)C=C GRJISGHXMUQUMC-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 1
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 229940001584 sodium metabisulfite Drugs 0.000 description 1
- 235000010262 sodium metabisulphite Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- KVCGISUBCHHTDD-UHFFFAOYSA-M sodium;4-methylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1 KVCGISUBCHHTDD-UHFFFAOYSA-M 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- NMOALOSNPWTWRH-UHFFFAOYSA-N tert-butyl 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOC(C)(C)C NMOALOSNPWTWRH-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- MYOWBHNETUSQPA-UHFFFAOYSA-N tetradecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCS(O)(=O)=O MYOWBHNETUSQPA-UHFFFAOYSA-N 0.000 description 1
- GEKDEMKPCKTKEC-UHFFFAOYSA-N tetradecane-1-thiol Chemical compound CCCCCCCCCCCCCCS GEKDEMKPCKTKEC-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 description 1
- 229940035024 thioglycerol Drugs 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- HERSKCAGZCXYMC-UHFFFAOYSA-N thiophen-3-ol Chemical compound OC=1C=CSC=1 HERSKCAGZCXYMC-UHFFFAOYSA-N 0.000 description 1
- GSXCEVHRIVLFJV-UHFFFAOYSA-N thiophene-3-carbonitrile Chemical compound N#CC=1C=CSC=1 GSXCEVHRIVLFJV-UHFFFAOYSA-N 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- SEACXNRNJAXIBM-UHFFFAOYSA-N triethyl(methyl)azanium Chemical compound CC[N+](C)(CC)CC SEACXNRNJAXIBM-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Description
本発明は、導電性組成物に関するものであり、その導電性組成物は、塗膜の均一性が非常に高く、さらには導電性の高い膜を形成することが出来る。これらの特徴を利用し、タッチパネル、有機エレクトロルミネッセンスパネル、無機エレクトロルミネッセンスパネル、液晶パネル等の透明電極として好適に使用することが出来る。 The present invention relates to a conductive composition, and the conductive composition has a very high uniformity of a coating film and can form a film having high conductivity. Utilizing these characteristics, it can be suitably used as a transparent electrode for touch panels, organic electroluminescence panels, inorganic electroluminescence panels, liquid crystal panels, and the like.
従来、透明電極材料として、酸化インジウム、酸化スズ、酸化亜鉛等の無機酸化物材料を中心に開発が行われてきた。中でも、酸化インジウムと酸化スズの混合焼成体であるITO(スズドープ酸化インジウム)が、その導電性の高さ等の理由により、一般的に使用されている。 Conventionally, as transparent electrode materials, development has been performed mainly on inorganic oxide materials such as indium oxide, tin oxide, and zinc oxide. Among them, ITO (tin-doped indium oxide), which is a mixed fired body of indium oxide and tin oxide, is generally used because of its high conductivity.
また、近年では、太陽電池や有機エレクトロルミネッセンス素子向けに、FTO(フッ素ドープ酸化スズ)やIZO(酸化インジウム、酸化亜鉛混合焼成体)などが開発されている。 In recent years, FTO (fluorine-doped tin oxide), IZO (indium oxide and zinc oxide mixed fired body), and the like have been developed for solar cells and organic electroluminescence elements.
これら、無機酸化物を中心とした透明電極は、真空蒸着法、スパッタリング法、プラズマ、イオンプレーティング法等の乾式成膜法を用いて成膜が行われる。高温成膜や高温焼成などの過程が必要となることから、主にガラスが基材として利用されている。 These transparent electrodes centered on inorganic oxides are formed using a dry film forming method such as a vacuum deposition method, a sputtering method, plasma, or an ion plating method. Since processes such as high-temperature film formation and high-temperature firing are required, glass is mainly used as a base material.
ガラスを基材として用いた場合、折り曲げることが出来ない、割れる、重いなどという点が、モバイル用途を想定した場合に問題点となる。 When glass is used as a base material, it cannot be bent, cracked, or heavy, which is a problem when mobile applications are assumed.
一方、近年「プリンタブルエレクトロニクス」といわれる領域の技術開発が積極的に行われている。これまでの高価な設備や、複雑な工程を駆使して生産されてきた高価な電子部品を、プロセス廃棄物が少なく、材料の利用効率が高く低コストで環境にやさしい印刷法を用いて製造するというものである。これにより、ローコスト・ハイスループットで電子部品を生産することが可能になるといわれている。さらには、低温プロセスを利用することができることから、基材にプラスチックフィルムを用いることが出来る。これにより、フレキシブルな導電膜が作成できる。しかしながら、電子部品の信頼性や性能が犠牲になるといった問題も抱えている。 On the other hand, technology development in the area called “printable electronics” has been actively carried out in recent years. Production of expensive electronic parts that have been produced using expensive equipment and complicated processes by using printing methods that are low in process waste, have high material utilization efficiency, and are low in cost and are environmentally friendly That's it. It is said that this makes it possible to produce electronic components at low cost and high throughput. Furthermore, since a low temperature process can be used, a plastic film can be used for the base material. Thereby, a flexible electrically conductive film can be created. However, there is a problem that the reliability and performance of electronic components are sacrificed.
前述のドライプロセスによってプラスチックフィルム上に無機酸化物からなる導電膜を作成することも可能であるが、その性質ゆえ、折り曲げ時にクラック等が入り、その可撓性が大幅に失われる。しかしながら、導電性高分子を導電剤とした導電膜は、その膜自身に柔軟性があり、クラック等の発生は大幅に抑えることができ、可撓性に優れた導電フィルムを作製することが出来る。このため、印刷法(湿式成膜法)に適した、導電インキの開発が急務となっている。 Although it is possible to produce a conductive film made of an inorganic oxide on a plastic film by the above-mentioned dry process, due to its nature, cracks and the like are generated at the time of bending, and its flexibility is greatly lost. However, a conductive film using a conductive polymer as a conductive agent has flexibility in the film itself, can greatly suppress the occurrence of cracks and the like, and can produce a conductive film excellent in flexibility. . For this reason, there is an urgent need to develop a conductive ink suitable for the printing method (wet film formation method).
本発明は、透明性、導電性、及び、可撓性に優れ、しかもプラスチック基材に塗布成膜することが可能であり、さらには均一な塗膜が得られる導電性組成物を提供することを課題とする。 The present invention provides a conductive composition that is excellent in transparency, conductivity, and flexibility, can be applied and formed on a plastic substrate, and can provide a uniform coating film. Is an issue.
本発明は、導電性高分子(A)、ドーパント(B)、及び、下記一般式[1]で表される化合物(C)を含み、導電性高分子(A)とドーパント(B)総量100重量部に対し、下記一般式[1]で表される化合物(C)を1から100重量部含むことを特徴とする導電性組成物に関する。
一般式[1]
R1−Si(OR2)3
(式中、R1は、炭素数1〜6のアルキル基、フェニル基、ベンジル基、メトキシ基、または、エトキシ基を表し、R2は、メチル基、または、エチル基を表す。)
The present invention includes a conductive polymer (A), a dopant (B), and a compound (C) represented by the following general formula [1], and the total amount of conductive polymer (A) and dopant (B) is 100. The present invention relates to a conductive composition comprising 1 to 100 parts by weight of a compound (C) represented by the following general formula [1] with respect to parts by weight.
General formula [1]
R 1 —Si (OR 2 ) 3
(In the formula, R 1 represents an alkyl group having 1 to 6 carbon atoms, a phenyl group, a benzyl group, a methoxy group, or an ethoxy group, and R 2 represents a methyl group or an ethyl group.)
また、本発明は、導電性高分子(A)が、チオフェン、アニリン、ピロール、及び、それらの誘導体からなる群から選択された、少なくとも一つを単量体成分としてなることを特徴とする前記の導電性組成物に関する。 In the present invention, the conductive polymer (A) is characterized in that at least one selected from the group consisting of thiophene, aniline, pyrrole, and derivatives thereof is used as a monomer component. It relates to a conductive composition.
また、本発明は、導電性高分子(A)が、ポリ(3,4−エチレンジオキシチオフェン)であることを特徴とする前記の導電性組成物に関する。 The present invention also relates to the above conductive composition, wherein the conductive polymer (A) is poly (3,4-ethylenedioxythiophene).
また、本発明は、ドーパント(B)が、スルホ基、または、そのアルカリ金属塩を有する化合物であることを特徴とする前記の導電性組成物に関する。 In addition, the present invention relates to the above conductive composition, wherein the dopant (B) is a compound having a sulfo group or an alkali metal salt thereof.
また、本発明は、ドーパント(B)が、水酸基を有する樹脂(B1)と、スルトン(B2)との反応により得られることを特徴とする前記の導電性組成物に関する。 In addition, the present invention relates to the conductive composition, wherein the dopant (B) is obtained by a reaction between a resin (B1) having a hydroxyl group and sultone (B2).
また、本発明は、前記の導電性組成物から形成されてなる導電膜に関する。 Moreover, this invention relates to the electrically conductive film formed from the said electrically conductive composition.
また、本発明は、基材と前記の導電膜とを有する積層体に関する。 Moreover, this invention relates to the laminated body which has a base material and the said electrically conductive film.
本発明を実施することにより、透明性、導電性、及び、可撓性に優れ、しかもプラスチック基材に塗布成膜することが可能であり、さらには均一な塗膜が得られる導電性組成物を提供することができる。 By carrying out the present invention, a conductive composition that is excellent in transparency, conductivity, and flexibility, can be applied to a plastic substrate, and can provide a uniform coating film. Can be provided.
まず、本発明の導電性高分子(A)について説明する。
本発明における導電性高分子とは、π共役系が全体にひろがった高分子を意味する。例えば、ポリチオフェン類、ポリピロ−ル類、ポリアニリン類、ポリフェニレンビニレン類、ポリアセチレン類、ポリフェニレン類、ポリアセン類、ポリチエニレンビニレン類、及びこれらの共重合体等を挙げられる。
First, the conductive polymer (A) of the present invention will be described.
The conductive polymer in the present invention means a polymer having a π-conjugated system spread throughout. Examples thereof include polythiophenes, polypyrroles, polyanilines, polyphenylene vinylenes, polyacetylenes, polyphenylenes, polyacenes, polythienylene vinylenes, and copolymers thereof.
これら導電性高分子は、導電性の向上、バインダー樹脂への相溶性向上などの目的で、アルキル基、アルコキシル基、カルボキシル基、水酸基、スルホ基等の官能基を置換基として導入することがある。 These conductive polymers may introduce a functional group such as an alkyl group, an alkoxyl group, a carboxyl group, a hydroxyl group, or a sulfo group as a substituent for the purpose of improving conductivity and compatibility with the binder resin. .
導電性高分子(A)の具体例としては、
ポリ(チオフェン)、ポリ(3−メチルチオフェン)、ポリ(3−エチルチオフェン)、ポリ(3−プロピルチオフェン)、ポリ(3−ブチルチオフェン)、ポリ(3−ヘキシルチオフェン)、ポリ(3−ヘプチルチオフェン)、ポリ(3−オクチルチオフェン)、ポリ(3−(2−エチルヘキシル)チオフェン)、ポリ(3−ドデシルチオフェン)、ポリ(3−オクタデシルチオフェン)、ポリ(3,4−ジメチルチオフェン)、ポリ(3,4−ジブチルチオフェン)、ポリ(3−フルオロチオフェン)、ポリ(3−クロロチオフェン)、ポリ(3−ブロモチオフェン)、ポリ(3−ヨードチオフェン)、ポリ(3,4−ジブロモチオフェン)、ポリ(3−シアノチオフェン)、ポリ(3−フェニルチオフェン)、ポリ(3−ビフェニルチオフェン)、ポリ(3−カルボキシチオフェン)、ポリ(3−スルホニルチオフェン)、ポリ(3−ヒドロキシチオフェン)、ポリ(3−メトキシチオフェン)、ポリ(3−エトキシチオフェン)、ポリ(3−ブトキシチオフェン)、ポリ(3−ヘキシルオキシチオフェン)、ポリ(3−オクチルオキシチオフェン)、ポリ(3−ドデシルオキシチオフェン)、ポリ(3−オクタデシルオキシチオフェン)、ポリ(3−(2−エチルヘキシル)オキシチオフェン)、ポリ(3−メチル−4−メトキシチオフェン)、ポリ(3,4−エチレンジオキシチオフェン)、ポリ(3−メチル−4−エトキシチオフェン)、ポリ(3−カルボキシチオフェン)、ポリ(3−メチル−4−カルボキシチオフェン)、若しくはポリ(3−メチル−4−カルボキシエチルチオフェン)、ポリ(3−メチル−4−カルボキシブチルチオフェン)等のポリチオフェン類;
ポリ(ピロール)、ポリ(3−メチルピロール)、ポリ(3−エチルピロール)、ポリ(3−プロピルピロール)、ポリ(3−ブチルピロール)、ポリ(3−ヘキシルピロール)、ポリ(3−ヘプチルピロール)、ポリ(3−オクチルピロール)、ポリ(3−(2−エチルヘキシル)ピロール)、ポリ(3−ドデシルピロール)、ポリ(3−オクタデシルピロール)、ポリ(3,4−ジメチルピロール)、ポリ(3,4−ジブチルピロール)、ポリ(3−フルオロピロール)、ポリ(3−クロロピロール)、ポリ(3−ブロモピロール)、ポリ(3−ヨードピロール)、ポリ(3,4−ジブロモピロール)、ポリ(3−シアノピロール)、ポリ(3−フェニルピロール)、ポリ(3−ビフェニルピロール)、ポリ(3−カルボキシピロール)、ポリ(3−スルホニルピロール)、ポリ(3−ヒドロキシピロール)、ポリ(3−メトキシピロール)、ポリ(3−エトキシピロール)、ポリ(3−ブトキシピロール)、ポリ(3−ヘキシルオキシピロール)、ポリ(3−オクチルオキシピロール)、ポリ(3−ドデシルオキシピロール)、ポリ(3−オクタデシルオキシピロール)、ポリ(3−(2−エチルヘキシル)オキシピロール)、ポリ(3−メチル−4−メトキシピロール)、ポリ(エチレンジオキシピロール)、ポリ(3−メチル−4−エトキシピロール)、ポリ(3−カルボキシピロール)、ポリ(3−メチル−4−カルボキシピロール)、ポリ(3−メチル−4−カルボキシエチルピロール)、ポリ(3−メチル−4−カルボキシブチルピロール)等のポリピロール類; 又は、
ポリアニリン、メチルポリアニリン、ジメチルポリアニリン、ヘキシルポリアニリン、ジヘキシルポリアニリン、メトキシポリアニリン、エトキシポリアニリン、ヘキシルオキシポリアニリン等のポリアニリン類; 等が挙げられるがこれらに限定されない。またこれらは、単独で、若しくは2種類以上組み合わせて用いることができる。
上記化合物の中でも、ポリ(3,4−エチレンジオキシチオフェン)が好ましく用いられる。
As a specific example of the conductive polymer (A),
Poly (thiophene), poly (3-methylthiophene), poly (3-ethylthiophene), poly (3-propylthiophene), poly (3-butylthiophene), poly (3-hexylthiophene), poly (3-heptyl) Thiophene), poly (3-octylthiophene), poly (3- (2-ethylhexyl) thiophene), poly (3-dodecylthiophene), poly (3-octadecylthiophene), poly (3,4-dimethylthiophene), poly (3,4-dibutylthiophene), poly (3-fluorothiophene), poly (3-chlorothiophene), poly (3-bromothiophene), poly (3-iodothiophene), poly (3,4-dibromothiophene) , Poly (3-cyanothiophene), poly (3-phenylthiophene), poly (3-biphenylthio) Phen), poly (3-carboxythiophene), poly (3-sulfonylthiophene), poly (3-hydroxythiophene), poly (3-methoxythiophene), poly (3-ethoxythiophene), poly (3-butoxythiophene) , Poly (3-hexyloxythiophene), poly (3-octyloxythiophene), poly (3-dodecyloxythiophene), poly (3-octadecyloxythiophene), poly (3- (2-ethylhexyl) oxythiophene), Poly (3-methyl-4-methoxythiophene), poly (3,4-ethylenedioxythiophene), poly (3-methyl-4-ethoxythiophene), poly (3-carboxythiophene), poly (3-methyl- 4-carboxythiophene) or poly (3-methyl-4-carbo) Phenoxyethyl thiophene), poly (3-methyl-4-carboxybutyl thiophene) polythiophenes such as;
Poly (pyrrole), poly (3-methylpyrrole), poly (3-ethylpyrrole), poly (3-propylpyrrole), poly (3-butylpyrrole), poly (3-hexylpyrrole), poly (3-heptyl) Pyrrole), poly (3-octylpyrrole), poly (3- (2-ethylhexyl) pyrrole), poly (3-dodecylpyrrole), poly (3-octadecylpyrrole), poly (3,4-dimethylpyrrole), poly (3,4-dibutylpyrrole), poly (3-fluoropyrrole), poly (3-chloropyrrole), poly (3-bromopyrrole), poly (3-iodopyrrole), poly (3,4-dibromopyrrole) , Poly (3-cyanopyrrole), poly (3-phenylpyrrole), poly (3-biphenylpyrrole), poly (3-carboxypyrrole) Poly (3-sulfonylpyrrole), poly (3-hydroxypyrrole), poly (3-methoxypyrrole), poly (3-ethoxypyrrole), poly (3-butoxypyrrole), poly (3-hexyloxypyrrole), poly (3-octyloxypyrrole), poly (3-dodecyloxypyrrole), poly (3-octadecyloxypyrrole), poly (3- (2-ethylhexyl) oxypyrrole), poly (3-methyl-4-methoxypyrrole) , Poly (ethylenedioxypyrrole), poly (3-methyl-4-ethoxypyrrole), poly (3-carboxypyrrole), poly (3-methyl-4-carboxypyrrole), poly (3-methyl-4-carboxyl) Ethylpyrrole), polypyrroles such as poly (3-methyl-4-carboxybutylpyrrole); It is,
And polyanilines such as polyaniline, methylpolyaniline, dimethylpolyaniline, hexylpolyaniline, dihexylpolyaniline, methoxypolyaniline, ethoxypolyaniline, hexyloxypolyaniline; and the like. Moreover, these can be used individually or in combination of 2 or more types.
Among the above compounds, poly (3,4-ethylenedioxythiophene) is preferably used.
次に、ドーパント(B)について説明する。
一般に導電性高分子は、ドーピングすることにより、キャリア密度を増大させ導電性が向上することが知られている。ドーピングに用いるドーパントは、ドーピングするキャリアの種類により、ドナー性ドーパントとアクセプター性ドーパントに分類できる。
Next, the dopant (B) will be described.
In general, it is known that a conductive polymer increases carrier density and improves conductivity by doping. The dopant used for doping can be classified into a donor dopant and an acceptor dopant depending on the type of carrier to be doped.
ドナー性ドーパントの具体例としては、
リチウム、ナトリウム、若しくはカリウム等のアルカリ金属;
カルシウム、若しくはマグネシウム等のアルカリ土類金属; 又は、
テトラメチルアンモニウム、テトラエチルアンモニウム、テトラプロピルアンモニウム、テトラブチルアンモニウム、エチルジイソプロピルアンモニウム、メチルトリエチルアンモニウム、トリオクチルメチルアンモニウム、若しくはセチルトリメチルアンモニウム等のアンモニウム塩等の4級アンモニウムカチオン等が挙げられるがこれらに限定されない。またこれらは、単独で、もしくは2種類以上組み合わせて用いることができる。
As a specific example of the donor dopant,
Alkali metals such as lithium, sodium or potassium;
Alkaline earth metals such as calcium or magnesium; or
Examples include, but are not limited to, quaternary ammonium cations such as tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetrabutylammonium, ethyldiisopropylammonium, methyltriethylammonium, trioctylmethylammonium, or ammonium salts such as cetyltrimethylammonium. Not. Moreover, these can be used individually or in combination of 2 or more types.
アクセプター性ドーパントの具体例としては、
塩素、臭素、ヨウ素、ICI、ICl3、IBr、若しくはIF等のハロゲン化合物;
HF、HCl、HNO3、H2SO4、HClO4、FSO3H、若しくはClSO3H等の無機プロトン酸;
ギ酸、酢酸、シュウ酸、安息香酸、フタル酸、マレイン酸、フマル酸、マロン酸、酒石酸、クエン酸、乳酸、コハク酸、セバシン酸、モノクロロ酢酸、ジクロロ酢酸、トリクロロ酢酸、トリフルオロ酢酸、ニトロ酢酸、若しくはトリフェニル酢酸等の有機カルボン酸;
メタンスルホン酸、エタンスルホン酸、1−プロパンスルホン酸、1−ブタンスルホン酸、1−ヘキサンスルホン酸、1−オクタンスルホン酸、1−ドデカンスルホン酸、1−テトラデカンスルホン酸、2−ブロモエタンスルホン酸、トリフルオロメタンスルホン酸、リグニンスルホン酸、コリスチンメタンスルホン酸、2−アクリルアミド−2−メチルプロパンスルホン酸、3−アミノプロパンスルホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸、キシレンスルホン酸、エチルベンゼンスルホン酸、プロピルベンゼンスルホン酸、ブチルベンゼンスルホン酸、ヘキシルベンゼンスルホン酸、ヘプチルベンゼンスルホン酸、オクチルベンゼンスルホン酸、ドデシルベンゼンスルホン酸、ペンタデシルベンゼンスルホン酸、へキサデシルベンゼンスルホン酸、カンファースルホン酸、2,4−ジメチルベンゼンスルホン酸、ジプロピルベンゼンスルホン酸、ブチルベンゼンスルホン酸、4−アミノベンゼンスルホン酸 、p−クロロベンゼンスルホン酸、ナフタレンスルホン酸、メチルナフタレンスルホン酸、若しくはナフタレンスルホン酸ホルマリン重縮合物等の有機スルホン酸;
テトラシアノエチレン(TCNE)、テトラシアノエチレンオキサイド、テトラシアノベンゼン、テトラシアノキノジメタン(TCNQ)、フッ素化テトラシアノキノジメタン(F4−TCNQ)、2,3−ジクロロ−5,6−ジシアノ−p−ベンゾキノン(DDQ)、クロラニル、若しくはテトラシアノアザナフタレン等の電子欠乏性有機化合物類;PF5、AsF5、SbF5、BF3、BCl3、BBr3、若しくはSO3等のルイス酸; 又は、
FeCl3、FeOCl、TiCl4、AlCl3、ZrCl4、HfCl4、TaCl5、MoCl5、WF6、若しくはWCl6等の遷移金属化合物等が挙げられるがこれらに限定されない。またこれらは、単独で、もしくは2種類以上組み合わせて用いることができる。
As a specific example of the acceptor dopant,
Halogen compounds such as chlorine, bromine, iodine, ICI, ICl 3 , IBr, or IF;
Inorganic protonic acids such as HF, HCl, HNO 3 , H 2 SO 4 , HClO 4 , FSO 3 H, or ClSO 3 H;
Formic acid, acetic acid, oxalic acid, benzoic acid, phthalic acid, maleic acid, fumaric acid, malonic acid, tartaric acid, citric acid, lactic acid, succinic acid, sebacic acid, monochloroacetic acid, dichloroacetic acid, trichloroacetic acid, trifluoroacetic acid, nitroacetic acid Or organic carboxylic acids such as triphenylacetic acid;
Methanesulfonic acid, ethanesulfonic acid, 1-propanesulfonic acid, 1-butanesulfonic acid, 1-hexanesulfonic acid, 1-octanesulfonic acid, 1-dodecanesulfonic acid, 1-tetradecanesulfonic acid, 2-bromoethanesulfonic acid , Trifluoromethanesulfonic acid, ligninsulfonic acid, colistin methanesulfonic acid, 2-acrylamido-2-methylpropanesulfonic acid, 3-aminopropanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, xylenesulfonic acid, ethylbenzenesulfonic acid , Propylbenzenesulfonic acid, butylbenzenesulfonic acid, hexylbenzenesulfonic acid, heptylbenzenesulfonic acid, octylbenzenesulfonic acid, dodecylbenzenesulfonic acid, pentadecylbenzenesulfonic acid, hexadeci Benzenesulfonic acid, camphorsulfonic acid, 2,4-dimethylbenzenesulfonic acid, dipropylbenzenesulfonic acid, butylbenzenesulfonic acid, 4-aminobenzenesulfonic acid, p-chlorobenzenesulfonic acid, naphthalenesulfonic acid, methylnaphthalenesulfonic acid, Or an organic sulfonic acid such as naphthalenesulfonic acid formalin polycondensate;
Tetracyanoethylene (TCNE), tetracyanoethylene oxide, tetracyanobenzene, tetracyanoquinodimethane (TCNQ), fluorinated tetracyanoquinodimethane (F4-TCNQ), 2,3-dichloro-5,6-dicyano- electron-deficient organic compounds such as p-benzoquinone (DDQ), chloranil, or tetracyanoazanaphthalene; Lewis acids such as PF 5 , AsF 5 , SbF 5 , BF 3 , BCl 3 , BBr 3 , or SO 3 ; ,
Examples include, but are not limited to, transition metal compounds such as FeCl 3 , FeOCl, TiCl 4 , AlCl 3 , ZrCl 4 , HfCl 4 , TaCl 5 , MoCl 5 , WF 6 , or WCl 6 . Moreover, these can be used individually or in combination of 2 or more types.
さらに、アクセプター性ドーパントとして、ポリアニオンを挙げることができる。ポリアニオンとは、前述のカルボン酸やスルホン酸のユニットを有する高分子化合物の総称である。 Furthermore, a polyanion can be mentioned as an acceptor type dopant. The polyanion is a general term for polymer compounds having the aforementioned carboxylic acid and sulfonic acid units.
ポリアニオンの具体例としては、ビニルスルホン酸、アリルスルホン酸、メタリルスルホン酸、4−スルホブチルメタクリレート、メタリルオキシベンゼンスルホン酸、アリルオキシベンゼンスルホン酸、スチレンスルホン酸、α−メチルスチレンスルホン酸、若しくはアクリルアミド−t−ブチルスルホン酸などの単独重合体もしくは共重合体、又は、それらのナトリウム塩、若しくはカリウム塩等が挙げられる。これらの市販品としては、例えば日本合成化学工業(株)社製ゴーセランL−3288、同L−0301、若しくは同L−0302等が挙げられるが、これらに限定されない。またこれらは、単独で、もしくは2種類以上組み合わせて用いることができる。 Specific examples of polyanions include vinyl sulfonic acid, allyl sulfonic acid, methallyl sulfonic acid, 4-sulfobutyl methacrylate, methallyloxybenzene sulfonic acid, allyloxybenzene sulfonic acid, styrene sulfonic acid, α-methylstyrene sulfonic acid, Alternatively, a homopolymer or copolymer such as acrylamide-t-butylsulfonic acid, or a sodium salt or potassium salt thereof may be used. Examples of these commercially available products include, but are not limited to, Goseiran L-3288, L-0301, or L-0302 manufactured by Nippon Synthetic Chemical Industry Co., Ltd. Moreover, these can be used individually or in combination of 2 or more types.
本発明においては、ドーパント(B)として、スルホ基、または、そのアルカリ金属塩を有する化合物が好ましく用いられる。 In the present invention, a compound having a sulfo group or an alkali metal salt thereof is preferably used as the dopant (B).
スルホ基を有するドーパントは、水酸基を有する樹脂(B1)とスルトン(B2)を反応させることによっても得られる。このとき、水酸基を有する樹脂(B1)は、例えば、水酸基を有するエチレン性不飽和単量体を重合する、あるいは、保護された水酸基を有するエチレン性不飽和単量体を重合した後、全部または一部を脱保護することにより得られる。また、重合時に前述のエチレン性不飽和単量体以外のエチレン性不飽和単量体と共重合してもよい。 A dopant having a sulfo group can also be obtained by reacting a hydroxyl group-containing resin (B1) and sultone (B2). At this time, the resin (B1) having a hydroxyl group is, for example, polymerized with an ethylenically unsaturated monomer having a hydroxyl group, or after polymerizing an ethylenically unsaturated monomer having a protected hydroxyl group, It is obtained by deprotecting a part. Moreover, you may copolymerize with ethylenically unsaturated monomers other than the above-mentioned ethylenically unsaturated monomer at the time of superposition | polymerization.
水酸基を有するエチレン性不飽和単量体の具体例としては、
2−ヒドロキシエチル(メタ)アクリレート、3−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、3−ヒドロキシブチル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート、エチル−α−(ヒドロキシメチル)アクリレート、2−ヒドロキシ−3−フェノキシプロピルアクリレート、1,4−シクロヘキサンジメタノールモノ(メタ)アクリレート、フタル酸モノヒドロキシエチル(メタ)アクリレート、2−ヒドロキシ−3−フェノキシプロピル(メタ)アクリレート、若しくはp−ヒドロキシフェニルエチル(メタ)アクリレート等の(メタ)アクリレート類; 又は、
ビニルアルコール、1−ヒドロキシ−3−ブテン、1−ヒドロキシ−4−ペンテン、1−ヒドロキシ−5−ヘキセン、1−ヒドロキシ−7−オクテン、1−ヒドロキシ−9−デセン、若しくは1−ヒドロキシ−3−メチル−3−ブテンなどのヒドロキシル基含有オレフィン類が挙げられるがこれらに限定されない。
保護された水酸基を有するエチレン性不飽和単量体としては、前述の水酸基を有するエチレン性不飽和単量体中の水酸基を、アセチル基、ベンゾイル基、ベンジル基、パラメトキシベンジル基、メトキシメチル基、トリメチルシリル基、トリエチルシリル基、t−ブチルジメチルシリル基、又はトリチル基などで保護してなるエチレン性不飽和単量体等が挙げられるがこれらに限定されない。
水酸基を有するエチレン性不飽和単量体および保護された水酸基を有するエチレン性不飽和単量体以外の、共重合可能なエチレン性不飽和単量体の具体例としては、
メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2,2,4−トリメチルシクロヘキシル(メタ)アクリレート、ステアリル(メタ)アクリレート、ラウリル(メタ)アクリレート、イソボルニル(メタ)アクリレート、アダマンチル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、ジシクロぺンテニルオキシエチル(メタ)アクリレート、トリシクロ−(5,2,1,0、2.6)−デカニル(メタ)アクリレート、若しくはトリシクロ−(5,2,1,0、2.6)−デカニルオキシエチル(メタ)アクリレート等の脂肪族(メタ)アクリレート類;
フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシジエチレングリコール(メタ)アクリレート、若しくはロジンアクリレート等の芳香族(メタ)アクリレート類;
(メタ)アクリル酸、アクリル酸ダイマー、イタコン酸、マレイン酸、フマール酸、クロトン酸、α−(ヒドロキシメチル)アクリル酸、若しくはα−(ヒドロキシメチル)メタクリル酸等のカルボキシル基を有するエチレン性不飽和単量体;
グリシジル(メタ)アクリレート、メチルグリシジル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレートグリシジエーテル、3,4−エポキシブチル(メタ)アクリレート、3−メチル−3,4−エポキシブチル(メタ)アクリレート、3−エチル−3,4−エポキシブチル(メタ)アクリレート、4−メチル−4,5−エポキシペンチル(メタ)アクリレート、5−メチル−5,6−エポキシヘキシル(メタ)アクリレート、α−エチルアクリル酸グリシジル、アリルグリシジルエーテル、クロトニルグリシジルエール、(イソ)クロトン酸グリシジルエーテル、(3,4−エポキシシクロヘキシル)メチル(メタ)アクリレート、N−(3,5−ジメチル−4−グリシジル)ベンジルアクリルアミド、o−ビニルベンジルグリシジルエーテル、m−ビニルベンジルグリシジルエーテル、p−ビニルベンジルグリシジルエーテル、α−メチル−o−ビニルベンジルグリシジルエーテル、α-メチル−m−ビニルベンジルグリシジルエーテル、α−メチル−p−ビニルベンジルグリシジルエーテル、2,3−ジグリシジルオキシメチルスチレン、2,4−ジグリシジルオキシメチルスチレン、2,5−ジグリシジルオキシメチルスチレン、2,6−ジグリシジルオキシメチルスチレン、2,3,4−トリグリシジルオキシメチルスチレン、2,3,5−トリグリシジルオキシメチルスチレン、2,3,6−トリグリシジルオキシメチルスチレン、3,4,5−トリグリシジルオキシメチルスチレン、2,4,6−トリグリシジルオキシメチルスチレンなどが挙げられ、好ましくはグリシジル(メタ)アクリレート、メチルグリシジル(メタ)アクリレート、(3,4−エポキシシクロヘキシル)メチル(メタ)アクリレート、オキセタン(メタ)アクリレート、テトラヒドロフルフリール(メタ)アクリレート、(2−エチル−2−メチル−1,3−ジオキソラン−4−イル)メチル(メタ)アクリレート、1,4−ジオキサスピロ[4,5]デカー2−イル)メチル(メタ)アクリレート、2−メタクリロイルオキシ−γ−ブチロラクトン、3−メタクリロイルオキシ−γ−ブチロラクトン、若しくはN−(メタ)アクリロイルオキシエチルヘキサヒドロフタルイミド等の複素環式(メタ)アクリレート類;
メトキシポリプロピレングリコール(メタ)アクリレート、若しくはエトキシポリエチレングリコール(メタ)アクリレート等のアルコキシポリアルキレングリコール(メタ)アクリレート類;
(メタ)アクリルアミド、N,N−ジメチル(メタ)アクリルアミド、N,N−ジエチル(メタ)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N−ブチル(メタ)アクリルアミド、イソブチル(メタ)アクリルアミド、t−ブチル(メタ)アクリルアミド、t−オクチル(メタ)アクリルアミド、ダイアセトン(メタ)アクリルアミド、若しくはアクリロイルモルホリン等のN置換型(メタ)アクリルアミド類;
N,N−ジメチルアミノエチル(メタ)アクリレート、若しくはN,N−ジエチルアミノエチル(メタ)アクリレート等のアミノ基を有する(メタ)アクリレート類;
及び、(メタ)アクリロニトリル等のニトリル類; 又は、
片末端メタクリロイル化ポリメチルメタクリレートオリゴマー、片末端メタクリロイル化ポリスチレンオリゴマー、若しくは片末端メタクリロイル化ポリエチレングリコール等の重合性オリゴマー等があげられる。
As a specific example of an ethylenically unsaturated monomer having a hydroxyl group,
2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 2-hydroxybutyl ( (Meth) acrylate, ethyl-α- (hydroxymethyl) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 1,4-cyclohexanedimethanol mono (meth) acrylate, monohydroxyethyl (meth) acrylate phthalate, 2-hydroxy (Meth) acrylates such as -3-phenoxypropyl (meth) acrylate or p-hydroxyphenylethyl (meth) acrylate; or
Vinyl alcohol, 1-hydroxy-3-butene, 1-hydroxy-4-pentene, 1-hydroxy-5-hexene, 1-hydroxy-7-octene, 1-hydroxy-9-decene, or 1-hydroxy-3- Examples include, but are not limited to, hydroxyl group-containing olefins such as methyl-3-butene.
As the ethylenically unsaturated monomer having a protected hydroxyl group, the hydroxyl group in the above-mentioned ethylenically unsaturated monomer having a hydroxyl group is an acetyl group, a benzoyl group, a benzyl group, a paramethoxybenzyl group, a methoxymethyl group. , Triethylsilyl group, triethylsilyl group, t-butyldimethylsilyl group, or an ethylenically unsaturated monomer protected with a trityl group, and the like, but is not limited thereto.
As specific examples of the copolymerizable ethylenically unsaturated monomer other than the ethylenically unsaturated monomer having a hydroxyl group and the ethylenically unsaturated monomer having a protected hydroxyl group,
Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, 2- Ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2,2,4-trimethylcyclohexyl (meth) acrylate, stearyl (meth) acrylate, lauryl (meth) acrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, di Cyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, tricyclo- (5,2,1,0,2.6) -decanyl (meth) acrylate, or tricyclo- (5, 2,1,0,2.6) -aliphatic (meth) acrylates such as decanyloxyethyl (meth) acrylate;
Aromatic (meth) acrylates such as phenyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, or rosin acrylate;
(Meth) acrylic acid, acrylic acid dimer, itaconic acid, maleic acid, fumaric acid, crotonic acid, α- (hydroxymethyl) acrylic acid or α- (hydroxymethyl) methacrylic acid and other ethylenic unsaturated Monomer;
Glycidyl (meth) acrylate, methyl glycidyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate glycidyl ether, 3,4-epoxybutyl (meth) acrylate, 3-methyl-3,4-epoxybutyl (meth) acrylate , 3-ethyl-3,4-epoxybutyl (meth) acrylate, 4-methyl-4,5-epoxypentyl (meth) acrylate, 5-methyl-5,6-epoxyhexyl (meth) acrylate, α-ethylacryl Acid glycidyl, allyl glycidyl ether, crotonyl glycidyl ale, (iso) crotonic acid glycidyl ether, (3,4-epoxycyclohexyl) methyl (meth) acrylate, N- (3,5-dimethyl-4-glycidyl) benzylacrylamide, o-Vinylbenzylglyce Jyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, α-methyl-o-vinyl benzyl glycidyl ether, α-methyl-m-vinyl benzyl glycidyl ether, α-methyl-p-vinyl benzyl glycidyl ether, 2,3-diglycidyloxymethylstyrene, 2,4-diglycidyloxymethylstyrene, 2,5-diglycidyloxymethylstyrene, 2,6-diglycidyloxymethylstyrene, 2,3,4-triglycidyloxymethyl Styrene, 2,3,5-triglycidyloxymethylstyrene, 2,3,6-triglycidyloxymethylstyrene, 3,4,5-triglycidyloxymethylstyrene, 2,4,6-triglycidyloxymethylstyrene, etc. Is preferred Is glycidyl (meth) acrylate, methyl glycidyl (meth) acrylate, (3,4-epoxycyclohexyl) methyl (meth) acrylate, oxetane (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, (2-ethyl-2- Methyl-1,3-dioxolan-4-yl) methyl (meth) acrylate, 1,4-dioxaspiro [4,5] deca-2-yl) methyl (meth) acrylate, 2-methacryloyloxy-γ-butyrolactone, 3- Heterocyclic (meth) acrylates such as methacryloyloxy-γ-butyrolactone or N- (meth) acryloyloxyethyl hexahydrophthalimide;
Alkoxypolyalkylene glycol (meth) acrylates such as methoxypolypropylene glycol (meth) acrylate or ethoxypolyethylene glycol (meth) acrylate;
(Meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N-butyl (meth) acrylamide, isobutyl (meth) acrylamide, t-butyl N-substituted (meth) acrylamides such as (meth) acrylamide, t-octyl (meth) acrylamide, diacetone (meth) acrylamide, or acryloylmorpholine;
(Meth) acrylates having an amino group such as N, N-dimethylaminoethyl (meth) acrylate or N, N-diethylaminoethyl (meth) acrylate;
And nitriles such as (meth) acrylonitrile; or
Examples thereof include polymerizable oligomers such as one-end methacryloylated polymethyl methacrylate oligomer, one-end methacryloylated polystyrene oligomer, or one-end methacryloylated polyethylene glycol.
また、さらには、
エチレン、プロピレン、1−ブテン、イソブテン、若しくは1−ヘキセンなどのα−オレフィン類;
スチレン、α−メチルスチレン、p−ヒドロキシスチレン、p−ビニル安息香酸、クロロメチルスチレン、ビニルトルエン、若しくはインデン等のスチレン類;
エチルビニルエーテル、n−プロピルビニルエーテル、イソプロピルビニルエーテル、n−ブチルビニルエーテル、若しくはイソブチルビニルエーテル等のビニルエーテル類; 又は、
N−メチルマレイミド、N−エチルマレイミド、N−シクロヘキシルマレイミド、若しくはN−フェニルマレイミド等のN置換マレイミド類があげられる。
In addition,
Α-olefins such as ethylene, propylene, 1-butene, isobutene, or 1-hexene;
Styrenes such as styrene, α-methylstyrene, p-hydroxystyrene, p-vinylbenzoic acid, chloromethylstyrene, vinyltoluene, or indene;
Vinyl ethers such as ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, or isobutyl vinyl ether;
Examples thereof include N-substituted maleimides such as N-methylmaleimide, N-ethylmaleimide, N-cyclohexylmaleimide, and N-phenylmaleimide.
水酸基を有するエチレン性不飽和単量体の重合、あるいは保護された水酸基を有するエチレン性不飽和単量体の重合は、公知の方法で行うことができる。すなわち、エチレン性不飽和単量体を任意で重合開始剤と混合して加熱することで行うことができる。重合温度は、40〜150℃、好ましくは50〜120℃である。 Polymerization of an ethylenically unsaturated monomer having a hydroxyl group or polymerization of an ethylenically unsaturated monomer having a protected hydroxyl group can be carried out by a known method. That is, it can be carried out by optionally mixing an ethylenically unsaturated monomer with a polymerization initiator and heating. The polymerization temperature is 40 to 150 ° C, preferably 50 to 120 ° C.
重合の際、エチレン性不飽和単量体100重量部に対して、任意に0.001〜15重量部の重合開始剤を使用することができる。重合開始剤としては、アゾ系化合物、又は有機過酸化物を用いることができる。
アゾ系化合物の例としては、2,2’−アゾビスイソブチロニトリル、2,2’−アゾビス(2−メチルブチロニトリル)、1,1’−アゾビス(シクロヘキサン1−カルボニトリル)、2,2’−アゾビス(2,4−ジメチルバレロニトリル)、2,2’−アゾビス(2,4−ジメチル−4−メトキシバレロニトリル)、ジメチル2,2’−アゾビス(2−メチルプロピオネート)、4,4’−アゾビス(4−シアノバレリック酸)、2,2’−アゾビス(2−ヒドロキシメチルプロピオニトリル)、又は2,2’−アゾビス[2−(2−イミダゾリン−2−イル)プロパン]等が挙げられる。
有機過酸化物の例としては、過酸化ベンゾイル、t−ブチルパーベンゾエイト、クメンヒドロパーオキシド、ジイソプロピルパーオキシジカーボネート、ジ−n−プロピルパーオキシジカーボネート、ジ(2−エトキシエチル)パーオキシジカーボネート、t−ブチルパーオキシネオデカノエート、t−ブチルパーオキシビバレート、(3,5,5−トリメチルヘキサノイル)パーオキシド、ジプロピオニルパーオキシド、又はジアセチルパーオキシド等が挙げられる。
これらの重合開始剤は、単独で、もしくは2種類以上組み合わせて用いることができる。
In the polymerization, 0.001 to 15 parts by weight of a polymerization initiator can be arbitrarily used with respect to 100 parts by weight of the ethylenically unsaturated monomer. As the polymerization initiator, an azo compound or an organic peroxide can be used.
Examples of the azo compounds include 2,2′-azobisisobutyronitrile, 2,2′-azobis (2-methylbutyronitrile), 1,1′-azobis (cyclohexane 1-carbonitrile), 2 , 2′-azobis (2,4-dimethylvaleronitrile), 2,2′-azobis (2,4-dimethyl-4-methoxyvaleronitrile), dimethyl 2,2′-azobis (2-methylpropionate) 4,4′-azobis (4-cyanovaleric acid), 2,2′-azobis (2-hydroxymethylpropionitrile), or 2,2′-azobis [2- (2-imidazolin-2-yl ) Propane] and the like.
Examples of organic peroxides include benzoyl peroxide, t-butyl perbenzoate, cumene hydroperoxide, diisopropyl peroxydicarbonate, di-n-propyl peroxydicarbonate, di (2-ethoxyethyl) peroxy Examples include dicarbonate, t-butyl peroxyneodecanoate, t-butyl peroxybivalate, (3,5,5-trimethylhexanoyl) peroxide, dipropionyl peroxide, or diacetyl peroxide.
These polymerization initiators can be used alone or in combination of two or more.
重合の際、分子量を調整する目的で連鎖移動剤を用いてもよい。エチレン性不飽和単量体100重量部に対して、任意に0.001〜15重量部の連鎖移動剤を使用することができる。 During the polymerization, a chain transfer agent may be used for the purpose of adjusting the molecular weight. 0.001 to 15 parts by weight of a chain transfer agent can be arbitrarily used with respect to 100 parts by weight of the ethylenically unsaturated monomer.
連鎖移動剤としては、分子量の調節ができる化合物であれば特に制限されず、公知の連鎖移動剤が使用できる。
例えば、
オクチルメルカプタン,n−ドデシルメルカプタン,t−ドデシルメルカプタン,n−ヘキサデシルメルカプタン,n−テトラデシルメルカプタン、メルカプトエタノール、チオグリセロール、チオグリコール酸、2−メルカプトプロピオン酸、3−メルカプトプロピオン酸、チオリンゴ酸、チオグリコール酸オクチル、3−メルカプトプロピオン酸オクチル、2−メルカプトエタンスルホン酸、若しくはブチルチオグリコレートなどのメルカプタン;
ジメチルキサントゲンジスルフィド、ジエチルキサントゲンジスルフィド、ジイソプロピルキサンチゲンジスルフィド、テトラメチルチウラムジスルフィド、テトラエチルチウラムジスルフィド、若しくはテトラブチルチウラムジスルフィドなどのジスルフィド;
四塩化炭素,塩化メチレン、ブロモホルム、ブロモトリクロロエタン、四臭化炭素,若しくは臭化エチレンなどのハロゲン化炭化水素;
イソプロパノール、若しくはグリセリン等の第2級アルコール;
亜リン酸、次亜リン酸、およびその塩(次亜リン酸ナトリウム、次亜リン酸カリウム等)や、亜硫酸、亜硫酸水素、亜二チオン酸、メタ重亜硫酸、若しくはそれらの塩(亜硫酸水素ナトリウム、亜硫酸水素カリウム、亜二チオン酸ナトリウム、亜二チオン酸カリウム、メタ重亜硫酸ナトリウム、メタ重亜硫酸カリウム等)等の低級酸化物およびその塩; 又は
アリルアルコール、2−エチルヘキシルチオグリコレート、α−メチルスチレンダイマー、ターピノーレン、α−テルピネン、γ−テルピネン、ジペンテン、又はアニソールなどを挙げることができる。これらは単独で、または2種以上を組み合わせて用いられる。
The chain transfer agent is not particularly limited as long as it is a compound capable of adjusting the molecular weight, and a known chain transfer agent can be used.
For example,
Octyl mercaptan, n-dodecyl mercaptan, t-dodecyl mercaptan, n-hexadecyl mercaptan, n-tetradecyl mercaptan, mercaptoethanol, thioglycerol, thioglycolic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, thiomalic acid, Mercaptans such as octyl thioglycolate, octyl 3-mercaptopropionate, 2-mercaptoethanesulfonic acid, or butylthioglycolate;
Disulfides such as dimethylxanthogen disulfide, diethylxanthogen disulfide, diisopropylxanthogen disulfide, tetramethylthiuram disulfide, tetraethylthiuram disulfide, or tetrabutylthiuram disulfide;
Halogenated hydrocarbons such as carbon tetrachloride, methylene chloride, bromoform, bromotrichloroethane, carbon tetrabromide, or ethylene bromide;
Secondary alcohols such as isopropanol or glycerin;
Phosphorous acid, hypophosphorous acid, and salts thereof (sodium hypophosphite, potassium hypophosphite, etc.), sulfurous acid, hydrogen sulfite, dithionite, metabisulfite, or salts thereof (sodium hydrogen sulfite) , Potassium oxide bisulfite, sodium dithionite, potassium dithionite, sodium metabisulfite, potassium metabisulfite, etc.) and the like; or allyl alcohol, 2-ethylhexyl thioglycolate, α- Examples thereof include methylstyrene dimer, terpinolene, α-terpinene, γ-terpinene, dipentene, and anisole. These may be used alone or in combination of two or more.
また、重合の際、重合溶媒として有機溶剤を使用することができる。有機溶剤としては、例えば、酢酸エチル、酢酸n−ブチル、酢酸イソブチル、トルエン、キシレン、アセトン、ヘキサン、メチルエチルケトン、シクロヘキサノン、プロピレングリコールモノメチルエーテルアセテート、又はジエトキシジエチレングリコール等が用いられるが特にこれらに限定されるものではない。これらの重合溶媒は、2種類以上混合して用いても良いが、最終用途で使用する溶剤であることが好ましい。 In the polymerization, an organic solvent can be used as a polymerization solvent. Examples of the organic solvent include ethyl acetate, n-butyl acetate, isobutyl acetate, toluene, xylene, acetone, hexane, methyl ethyl ketone, cyclohexanone, propylene glycol monomethyl ether acetate, or diethoxydiethylene glycol, but are not particularly limited thereto. It is not something. These polymerization solvents may be used as a mixture of two or more kinds, but are preferably used for final use.
スルトン(B2)の具体例としては、プロパンスルトン、ブタンスルトン、ペンタンスルトン、又は1,8−ナフタレンスルトン等が挙げられるがこれらに限定されない。 Specific examples of sultone (B2) include, but are not limited to, propane sultone, butane sultone, pentane sultone, 1,8-naphthalene sultone, and the like.
次に、化合物(C)について説明する。化合物(C)は、導電性高分子(A)とドーパント(B)との総量100重量部に対し、1から100重量部含むことが好ましい。1重量部より少ない場合は、その塗工膜にハジキが生じ、均質な塗膜を得ることが出来ない。また、100重量部より多い場合は、塗膜の可とう性が損なわれるだけでなく、導電性も低下する。 Next, the compound (C) will be described. The compound (C) preferably contains 1 to 100 parts by weight with respect to 100 parts by weight of the total amount of the conductive polymer (A) and the dopant (B). When the amount is less than 1 part by weight, the coating film is repelled and a uniform coating film cannot be obtained. Moreover, when more than 100 weight part, not only the flexibility of a coating film is impaired but electroconductivity also falls.
化合物(C)の具体例としては、メチルトリメトキシシラン、エチルトリメトキシシラン、プロピルトリメトキシシラン、イソプロピルトリメトキシシラン、ブチルトリメトキシシラン、ヘキシルトリメトキシシラン、フェニルトリメトキシシラン、ベンジルトリメトキシシラン、テトラメトキシシラン、メチルトリエトキシシラン、エチルトリエトキシシラン、プロピルトリエトキシシラン、イソプロピルトリエトキシシラン、ブチルトリエトキシシラン、ヘキシルトリエトキシシラン、フェニルトリエトキシシラン、ベンジルトリエトキシシラン、又はテトラエトキシシラン等が挙げられるがこれらに限定されない。またこれらは、単独で、もしくは2種類以上組み合わせて用いることができる。 Specific examples of the compound (C) include methyltrimethoxysilane, ethyltrimethoxysilane, propyltrimethoxysilane, isopropyltrimethoxysilane, butyltrimethoxysilane, hexyltrimethoxysilane, phenyltrimethoxysilane, benzyltrimethoxysilane, Tetramethoxysilane, methyltriethoxysilane, ethyltriethoxysilane, propyltriethoxysilane, isopropyltriethoxysilane, butyltriethoxysilane, hexyltriethoxysilane, phenyltriethoxysilane, benzyltriethoxysilane, or tetraethoxysilane Although it is mentioned, it is not limited to these. Moreover, these can be used individually or in combination of 2 or more types.
本発明の導電性組成物は、化合物(C)以外のシラン化合物を含んでいても良い。例えば、
ビニルトリス(β−メトキシエトキシ)シラン、ビニルトリエトキシシラン、若しくはビニルトリメトキシシラン等のビニルシラン類;
γ−(メタ)アクリロキシプロピルトリメトキシシラン、γ−(メタ)アクリロキシプロピルトリエトキシシラン、若しくはγ−(メタ)アクリロキシプロピルジメトキシメチルシラン等の(メタ)アクリロキシシラン類;
β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、β−(3,4−エポキシシクロヘキシル)メチルトリメトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、β−(3,4−エポキシシクロヘキシル)メチルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、若しくはγ−グリシドキシプロピルトリエトキシシラン等のエポキシシラン類;
N−β(アミノエチル)γ−アミノプロピルトリメトキシシラン、N−β(アミノエチル)γ−アミノプロピルトリエトキシシラン、N−β(アミノエチル)γ−アミノプロピルメチルジエトキシシシラン、γ−アミノプロピルトリエトキシシラン、γ−アミノプロピルトリメトキシシラン、N−フェニル−γ−アミノプロピルトリメトキシシラン、若しくはN−フェニル−γ−アミノプロピルトリエトキシシラン等のアミノシラン類;又は、
γ−メルカプトプロピルトリメトキシシラン、若しくはγ−メルカプトプロピルトリエトキシシラン等のチオシラン類;等が挙げられる。
The conductive composition of the present invention may contain a silane compound other than the compound (C). For example,
Vinylsilanes such as vinyltris (β-methoxyethoxy) silane, vinyltriethoxysilane, or vinyltrimethoxysilane;
(meth) acryloxysilanes such as γ- (meth) acryloxypropyltrimethoxysilane, γ- (meth) acryloxypropyltriethoxysilane, or γ- (meth) acryloxypropyldimethoxymethylsilane;
β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) methyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3, 4-epoxycyclohexyl) epoxysilanes such as methyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, or γ-glycidoxypropyltriethoxysilane;
N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropyltriethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldiethoxysilane, γ-amino Aminosilanes such as propyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, or N-phenyl-γ-aminopropyltriethoxysilane; or
and thiosilanes such as γ-mercaptopropyltrimethoxysilane or γ-mercaptopropyltriethoxysilane;
本発明の導電性組成物は、それの塗膜を形成するなどの目的に応じて溶剤を含んでいてもよい。このとき用いられる溶剤は、本発明の導電性組成物を溶解または分散させることができる溶媒であれば特に限定されることはないが、水; メチルエチルケトン、シクロヘキサノン、2−ヘプタノン、若しくは3−ヘプタノン等のケトン類; エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、若しくはプロピレングリコールモノエチルエーテルアセテート等の(ポリ)アルキレングリコールモノアルキルエーテルアセテート類; エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノ−n−プロピルエーテル、エチレングリコールモノ−n−ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノ−n−プロピルエーテル、エチレングリコールモノ−n−ブチルエーテル、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノ−n−プロピルエーテル、プロピレングリコールモノ−n−ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノ−n−プロピルエーテル、ジプロピレングリコールモノ−n−ブチルエーテル、トリプロピレングリコールモノメチルエーテル、若しくはトリプロピレングリコールモノエチルエーテル等の(ポリ)アルキレングリコールモノアルキルエーテル類; 酢酸エチル、酢酸−n−ブチル、酢酸イソブチル、ギ酸アミル、酢酸イソアミル、プロピオン酸ブチル、酪酸エチル、酪酸イソプロピル、酪酸ブチル、乳酸メチル、乳酸エチル、オキシ酢酸メチル、オキシ酢酸エチル、オキシ酢酸ブチル、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル、3−オキシプロピオン酸メチル、3−オキシプロピオン酸エチル、3−メトキシプロピオン酸メチル、3−メトキシプロピオン酸エチル、3−エトキシプロピオン酸メチル、3−エトキシプロピオン酸エチル、2−オキシプロピオン酸メチル、2−オキシプロピオン酸エチル、2−オキシプロピオン酸プロピル、2−メトキシプロピオン酸メチル、2−メトキシプロピオン酸エチル、2−メトキシプロピオン酸プロピル、2−エトキシプロピオン酸メチル、2−エトキシプロピオン酸エチル、2−オキシ−2−メチルプロピオン酸メチル、2−オキシ−2−メチルプロピオン酸エチル、2−メトキシ−2−メチルプロピオン酸メチル、2−メトキシ−2−メチルプロピオン酸エチル、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、2−オキソブタン酸メチル、若しくは2−オキソブタン酸エチル等のエステル類; トルエン、若しくはキシレン等の芳香族炭化水素類; 又は、N−メチルピロリドン、若しくはN,N−ジメチルアセトアミド等のアミド類等を挙げることができる。これらの溶剤は単独あるいは2種以上を適宜混合して用いることが可能である。 The conductive composition of the present invention may contain a solvent depending on the purpose such as forming a coating film thereof. The solvent used at this time is not particularly limited as long as it is a solvent that can dissolve or disperse the conductive composition of the present invention, but water; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc. (Poly) alkylene glycol monoalkyl such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, or propylene glycol monoethyl ether acetate Ether acetates; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene Glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene Glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono -N-propyl ether, dipropylene glycol (Poly) alkylene glycol monoalkyl ethers such as ethyl mono-n-butyl ether, tripropylene glycol monomethyl ether, or tripropylene glycol monoethyl ether; ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, propion Butyl acid, ethyl butyrate, isopropyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, Methyl 3-oxypropionate, ethyl 3-oxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropyl Ethyl pionate, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, 2-ethoxypropion Acid methyl, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, 2-methoxy-2-methyl Esters such as ethyl propionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate or ethyl 2-oxobutanoate; aromatic carbonization such as toluene or xylene Hydrogens; or - methylpyrrolidone, or N, and the like can be given amides such as N- dimethylacetamide. These solvents can be used alone or in admixture of two or more.
次に、調製した導電性組成物を用いて導電膜を形成する方法について説明する。導電膜の形成には、主に湿式成膜法が用いられる。具体的には、スピンコート法、スプレー法、ローラーコート法、グラビアコート法、ダイコート法、コンマコート法、ロールコート法、カーテンコート法、又はバーコート法等各種の手段を用いた方法がある。それらの方法は、塗布する厚み、粘度等に応じて適宜利用できる。 Next, a method for forming a conductive film using the prepared conductive composition will be described. A wet film forming method is mainly used for forming the conductive film. Specifically, there are methods using various means such as spin coating, spraying, roller coating, gravure coating, die coating, comma coating, roll coating, curtain coating, or bar coating. These methods can be appropriately used depending on the thickness, viscosity, and the like to be applied.
また、本発明の導電性組成物を成膜する際の基材として、ポリエチレン、ポリエチレンテレフテレート、ポリエチレンナフタレート、ポリエーテルサルフォン、ポリプロピレン、ポリイミド、ボリカーボネート、若しくはセルローストリアセテートなどのプラスチックフィルム、又は、ガラスなどを用いることができる。
基材上に、本発明の導電性組成物を用いて導電膜を形成することにより、積層体を得ることができる。
In addition, as a base material for forming the conductive composition of the present invention, a plastic film such as polyethylene, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polypropylene, polyimide, polycarbonate, or cellulose triacetate, Alternatively, glass or the like can be used.
A laminated body can be obtained by forming a conductive film on a substrate using the conductive composition of the present invention.
一般に、これら基材と導電膜との密着性を向上させる目的で、基材表面に様々な処理を行うことができる。具体的には、UVオゾン処理、コロナ処理、プラズマ処理、易接着処理などを挙げることができる。 In general, various treatments can be performed on the surface of the base material for the purpose of improving the adhesion between the base material and the conductive film. Specific examples include UV ozone treatment, corona treatment, plasma treatment, and easy adhesion treatment.
以下、実施例により、本発明をより具体的に説明する。なお、例中、「部」とあるのは「重量部」を、「%」とあるのは「重量%」をそれぞれ意味するものとする。また、「Mn」は、数平均分子量を表す。 Hereinafter, the present invention will be described more specifically by way of examples. In the examples, “parts” means “parts by weight”, and “%” means “% by weight”. “Mn” represents a number average molecular weight.
[合成例1]
100mLの脱イオン水中に、0.56gの3,4−エチレンジオキシチオフェン、2gのポリスチレンスルホン酸(Mn40,000)、0.27gの過硫酸アンモニウムおよび2.5mgの硫酸鉄(III)を加え、室温にて24時間攪拌することにより、樹脂(1)の水分散液を得た(固形分2.8%)。
[Synthesis Example 1]
In 100 mL deionized water, add 0.56 g 3,4-ethylenedioxythiophene, 2 g polystyrene sulfonic acid (Mn 40,000), 0.27 g ammonium persulfate and 2.5 mg iron (III) sulfate, By stirring at room temperature for 24 hours, an aqueous dispersion of resin (1) was obtained (solid content: 2.8%).
[合成例2]
ポリスチレンスルホン酸の代わりに、ドデシルベンゼンスルホン酸を用いた以外は、合成例1と同様にして樹脂(2)の水分散液を得た(固形分2.8%)。
[Synthesis Example 2]
An aqueous dispersion of resin (2) was obtained in the same manner as in Synthesis Example 1 except that dodecylbenzenesulfonic acid was used instead of polystyrenesulfonic acid (solid content: 2.8%).
[合成例3]
3,4−エチレンジオキシチオフェンの代わりに、ピロールを用いた以外は、合成例1と同様にして樹脂(3)の水分散液を得た(固形分2.8%)。
[Synthesis Example 3]
An aqueous dispersion of resin (3) was obtained in the same manner as in Synthesis Example 1 except that pyrrole was used instead of 3,4-ethylenedioxythiophene (solid content 2.8%).
[合成例4]
ポリスチレンスルホン酸の代わりに、p−トルエンスルホン酸ナトリウムを用いた以外は、合成例3と同様にして樹脂(4)の水分散液を得た(固形分2.8%)。
[Synthesis Example 4]
An aqueous dispersion of resin (4) was obtained in the same manner as in Synthesis Example 3 except that sodium p-toluenesulfonate was used instead of polystyrenesulfonic acid (solid content: 2.8%).
[合成例5]
3,4−エチレンジオキシチオフェンの代わりに、アニリンを用いた以外は、合成例2と同様にして樹脂(5)の水分散液を得た(固形分2.8%)。
[Synthesis Example 5]
An aqueous dispersion of resin (5) was obtained in the same manner as in Synthesis Example 2 except that aniline was used instead of 3,4-ethylenedioxythiophene (solid content 2.8%).
[合成例6]
ドデシルベンゼンスルホン酸の代わりに、AOT(ナトリウム ビス(2−エチルヘキシル)スルホサクシネート)を用いた以外は、合成例5と同様にして樹脂(6)の水分散液を得た(固形分2.8%)。
[Synthesis Example 6]
An aqueous dispersion of resin (6) was obtained in the same manner as in Synthesis Example 5 except that AOT (sodium bis (2-ethylhexyl) sulfosuccinate) was used instead of dodecylbenzenesulfonic acid (solid content 2. 8%).
[合成例7]
ポリビニルアルコール(クラレ社製、PVA102)10gをジメチルスルホキシド200gに溶解させた。室温にて、プロパンスルトン10gを添加し、さらに24時間攪拌した。その後、500gのメタノール中へ加え沈殿物をろ取することにより、ドーパント(7)を白色固体として得た。
ポリスチレンスルホン酸の代わりに、ドーパント(7)を用いた以外は、合成例1と同様にして樹脂(7)の水分散液を得た(固形分2.8%)。
[Synthesis Example 7]
10 g of polyvinyl alcohol (PVA102 manufactured by Kuraray Co., Ltd.) was dissolved in 200 g of dimethyl sulfoxide. At room temperature, 10 g of propane sultone was added and further stirred for 24 hours. Then, the dopant (7) was obtained as a white solid by adding to 500 g of methanol and collecting the precipitate by filtration.
An aqueous dispersion of resin (7) was obtained in the same manner as in Synthesis Example 1 except that dopant (7) was used instead of polystyrene sulfonic acid (solid content: 2.8%).
[合成例8]
ポリビニルアルコール(クラレ社製、PVA102)の代わりに、ポリビニルアルコール(クラレ社製、PVA120)を用いた以外は、合成例7と同様にして樹脂(8)の水分散液を得た(固形分2.8%)。
[Synthesis Example 8]
An aqueous dispersion of resin (8) was obtained in the same manner as in Synthesis Example 7 except that polyvinyl alcohol (Pura120, manufactured by Kuraray Co., Ltd.) was used instead of polyvinyl alcohol (PVA102, manufactured by Kuraray Co., Ltd.) (solid content 2 .8%).
[合成例9]
ガス導入管、コンデンサー、攪拌翼、および温度計を備え付けた反応槽に、水200部と、2−ヒドロキシエチルアクリルアミド20部および2−メルカプトエタノール0.1部とを仕込み60℃に昇温し、反応容器内を窒素置換した後、過硫酸アンモニウム0.05部を添加し、その後3時間、同じ温度で攪拌を続け、重合した。室温に冷却後、水を除去することによりポリ(2−ヒドロキシエチルアクリルアミド)を得た。
ポリビニルアルコール(クラレ社製、PVA102)の代わりに、ポリ(2−ヒドロキシエチルアクリルアミド)を用いた以外は、合成例7と同様にして樹脂(9)の水分散液を得た(固形分2.8%)。
[Synthesis Example 9]
A reaction vessel equipped with a gas introduction tube, a condenser, a stirring blade, and a thermometer was charged with 200 parts of water, 20 parts of 2-hydroxyethylacrylamide and 0.1 part of 2-mercaptoethanol, and the temperature was raised to 60 ° C. After replacing the inside of the reaction vessel with nitrogen, 0.05 part of ammonium persulfate was added, and then the polymerization was continued for 3 hours at the same temperature for polymerization. After cooling to room temperature, water was removed to obtain poly (2-hydroxyethylacrylamide).
An aqueous dispersion of resin (9) was obtained in the same manner as in Synthesis Example 7 except that poly (2-hydroxyethylacrylamide) was used instead of polyvinyl alcohol (manufactured by Kuraray Co., Ltd., PVA102) (solid content 2. 8%).
[実施例1]
表1に示す配合組成で、混合物を攪拌混合した後、バーコーター(#14)を用いて、未処理、または、易接着処理PET上に塗布した。80℃にて2分間乾燥させた後、全光線透過率、折り曲げ性試験、塗膜のハジキ、導電性の変化を測定した結果を表2に示す。
[Example 1]
After the mixture was stirred and mixed with the composition shown in Table 1, it was applied onto untreated or easy adhesion treated PET using a bar coater (# 14). Table 2 shows the results of measuring the total light transmittance, the bendability test, the repellency of the coating film, and the change in conductivity after drying at 80 ° C. for 2 minutes.
[実施例2]〜[実施例10]、[比較例1]〜[比較例4]
表1に示す配合組成で混合物を攪拌混合した後、実施例1と同様にして全光線透過率、折り曲げ性試験、塗膜のハジキ、導電性の変化を測定した結果を表2に示す。
[Example 2] to [Example 10], [Comparative Example 1] to [Comparative Example 4]
After stirring and mixing the mixture with the composition shown in Table 1, the results of measuring the total light transmittance, the bendability test, the repellency of the coating film, and the conductivity in the same manner as in Example 1 are shown in Table 2.
PhSi(OEt)3: フェニルトリエトキシシラン
EtSi(OEt)3: エチルトリエトキシシラン
PhCH2Si(OMe)3: ベンジルトリメトキシシラン
EtOSi(OEt)3: テトラエトキシシシラン
HexSi(OEt)3: n−ヘキシルトリエトキシシラン
MeOSi(OMe)3: テトラメトキシシラン
PrSi(OMe)3: n−プロピルトリメトキシシラン
MeSi(OMe)3: メチルトリメトキシシラン
C8H17Si(OEt)3: n−オクチルトリエトキシシラン
PhSi (OEt) 3 : Phenyltriethoxysilane EtSi (OEt) 3 : Ethyltriethoxysilane PhCH 2 Si (OMe) 3 : Benzyltrimethoxysilane EtOSi (OEt) 3 : Tetraethoxysilane SiHexSi (OEt) 3 : n- hexyltriethoxysilane MeOSi (OMe) 3: tetramethoxysilane PrSi (OMe) 3: n- propyltrimethoxysilane MeSi (OMe) 3: methyltrimethoxysilane C 8 H 17 Si (OEt) 3: n- octyltriethoxysilane Silane
表中、「折り曲げ性試験」とは、基材と一緒に乾燥塗膜を180度折り曲げ、元の状態に戻す試験のことであり、○: ウキ、ハガレが見られない、 △: 一部ウキ、ハガレが見られる、×: 完全に剥れる と評価した。また、「塗膜のハジキ」とは、塗工乾燥後の塗膜を無作為に、10×10cmに切り出したときのハジキの数を示し、ハジキの数により◎: 0個、 ○: 1〜3個、 △: 4〜6個、×: 7個以上、または、全体的にはじいてしまい塗膜にならない と評価した。また、「導電性の変化」とは、化合物(C)を添加していない塗工膜の表面抵抗値を100としたときの、実施例における塗膜の表面抵抗値の相対値を示す。 In the table, the “foldability test” is a test in which the dried coating film is bent 180 degrees together with the base material to return it to the original state. ○: No excitement or peeling, △: Partial excitement , Peeled off, x: evaluated as completely peeled. The “coating repellency” means the number of cissings when the coated and dried coatings are randomly cut out to 10 × 10 cm. Depending on the number of cissings, ◎: 0, ○: 1 to Three, Δ: 4-6, x: 7 or more, or evaluated that it was totally repelled and did not form a coating film. Further, “change in conductivity” refers to the relative value of the surface resistance value of the coating film in the example when the surface resistance value of the coating film to which the compound (C) is not added is 100.
表2において、実施例1から10、および、比較例1の比較より、化合物(C)を用いたことにより、基材の折り曲げにも強く、ハジキを大幅に抑制することができ、透明性と導電性も兼ね備えた塗膜を提供することができる。 In Table 2, from the comparison of Examples 1 to 10 and Comparative Example 1, by using the compound (C), it was strong against bending of the base material, and repelling could be greatly suppressed. A coating film having electrical conductivity can also be provided.
比較例2では、化合物(C)の添加量が少な過ぎたため、実施例1と比較して、特に塗膜のハジキの数が多く観察された。 In Comparative Example 2, since the amount of the compound (C) added was too small, a larger number of repellency of the coating film was observed as compared with Example 1.
比較例3では、化合物(C)の添加量が多過ぎたため、実施例1と比較して、折り曲げ性も悪く、さらには、導電性も大幅に悪化する結果となった。また、この時の塗液は、1日後白色の沈殿が生じ、塗液の安定性も低いことが分かった。 In Comparative Example 3, since the amount of the compound (C) added was too large, the bending property was poor as compared with Example 1, and the conductivity was also greatly deteriorated. In addition, it was found that the coating liquid at this time produced a white precipitate after one day and the stability of the coating liquid was low.
比較例4では、化合物(C)の代わりに、炭素数8のアルキル基を有するシラン化合物を用いているが、実施例に比べて折り曲げ性、塗膜のハジキ、及び、導電性が悪化する結果となっている。 In Comparative Example 4, a silane compound having an alkyl group having 8 carbon atoms is used instead of the compound (C), but the bending property, the repellency of the coating film, and the conductivity are deteriorated as compared with the Example. It has become.
本発明に係る導電性組成物は、有機エレクトロルミネッセンス、太陽電池、タッチパネル、液晶パネル、電子ペーパー等への透明導電膜、及び、熱線反射ガラス、電磁波シールド、帯電防止膜として使用することができ、透明性、導電性、及び、可撓性に優れ、しかもプラスチック基材に塗布成膜することが可能であり、さらには均一な塗膜を形成することができる。 The conductive composition according to the present invention can be used as a transparent conductive film to organic electroluminescence, solar cells, touch panels, liquid crystal panels, electronic paper, etc., and heat ray reflective glass, electromagnetic wave shields, antistatic films, It is excellent in transparency, conductivity, and flexibility, and can be applied and formed on a plastic substrate. Furthermore, a uniform coating film can be formed.
Claims (7)
一般式[1]
R1−Si(OR2)3
(式中、R1は、炭素数1〜6のアルキル基、フェニル基、ベンジル基、メトキシ基、または、エトキシ基を表し、R2は、メチル基、または、エチル基を表す。) 100 parts by weight of the total amount of the conductive polymer (A) and the dopant (B) including the conductive polymer (A), the dopant (B), and the compound (C) represented by the following general formula [1] In contrast, a conductive composition comprising 1 to 100 parts by weight of the compound (C) represented by the following general formula [1].
General formula [1]
R 1 —Si (OR 2 ) 3
(In the formula, R 1 represents an alkyl group having 1 to 6 carbon atoms, a phenyl group, a benzyl group, a methoxy group, or an ethoxy group, and R 2 represents a methyl group or an ethyl group.)
The laminated body which has a base material and the electrically conductive film of Claim 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010009594A JP5423416B2 (en) | 2010-01-20 | 2010-01-20 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010009594A JP5423416B2 (en) | 2010-01-20 | 2010-01-20 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011150818A JP2011150818A (en) | 2011-08-04 |
JP2011150818A5 JP2011150818A5 (en) | 2012-10-11 |
JP5423416B2 true JP5423416B2 (en) | 2014-02-19 |
Family
ID=44537642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010009594A Active JP5423416B2 (en) | 2010-01-20 | 2010-01-20 | Conductive composition, conductive film using the same, and laminate having the conductive film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5423416B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5879947B2 (en) * | 2011-11-18 | 2016-03-08 | 東洋インキScホールディングス株式会社 | Conductive composition and use thereof |
JP5919095B2 (en) * | 2012-05-31 | 2016-05-18 | 信越ポリマー株式会社 | Conductive polymer paint and conductive coating film |
WO2014189036A1 (en) * | 2013-05-21 | 2014-11-27 | 信越ポリマー株式会社 | Electroconductive polymer liquid dispersion and electroconductive coating |
JP7340955B2 (en) * | 2019-05-09 | 2023-09-08 | 信越ポリマー株式会社 | Conductive polymer-containing liquid and method for producing the same, and method for producing conductive film |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4806174B2 (en) * | 2003-10-20 | 2011-11-02 | 富士通株式会社 | Organic conductive composition, transparent conductive film, transparent conductor, input device and manufacturing method thereof |
JP4916740B2 (en) * | 2006-03-16 | 2012-04-18 | 信越ポリマー株式会社 | Conductive coating |
JP2009209241A (en) * | 2008-03-03 | 2009-09-17 | Nissan Motor Co Ltd | Conductive polymer structure and method for manufacturing the same |
-
2010
- 2010-01-20 JP JP2010009594A patent/JP5423416B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2011150818A (en) | 2011-08-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102276824B1 (en) | Electro-conductive polymer composite and substrate | |
JP5316000B2 (en) | Conductive polymer / dopant organic solvent dispersion and composition containing the dispersion | |
JP5537862B2 (en) | Conductive polymer solution and antistatic sheet | |
US20060062958A1 (en) | Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof | |
JP4786206B2 (en) | Antistatic paint, antistatic film and antistatic film, optical filter, optical information recording medium | |
JP2010538100A (en) | Process for preparing conductive polymers | |
JP6496258B2 (en) | Conductive polymer composite and substrate | |
JP5423416B2 (en) | Conductive composition, conductive film using the same, and laminate having the conductive film | |
JP6302432B2 (en) | Conductive polymer material and substrate | |
JP2016050304A (en) | Conductive polymer composite and substrate | |
JP5036997B2 (en) | Transparent conductive sheet for touch panel, manufacturing method thereof, and touch panel | |
CN111548708A (en) | Conductive polymer composite and conductive polymer composition | |
JP2017052886A (en) | Conductive polymer composite and substrate | |
JP6474358B2 (en) | Conductive polymer composite and substrate | |
KR101942622B1 (en) | Conductive material and substrate | |
JP6275083B2 (en) | Conductive polymer material, substrate and manufacturing method thereof | |
JP4916740B2 (en) | Conductive coating | |
JP6562548B2 (en) | Conductive polymer dispersion and conductive film | |
KR100393134B1 (en) | Manufacturing method of conductive polymer having high conductivity and high transparency | |
JP6450661B2 (en) | Conductive polymer composite and substrate | |
JP6611317B2 (en) | Conductive polymer dispersion and method for producing the same, conductive film and method for producing the same | |
US20230159766A1 (en) | Conductive polymer composition, substrate, and method for producing substrate | |
JP5621677B2 (en) | Conductive composition and method for producing the same | |
JP7504034B2 (en) | Conductive polymer liquid composition and method for producing same, conductive laminate and method for producing same, method for producing conductive film, and conductive molded body | |
JP6361125B2 (en) | Conductive composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120827 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20121001 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131022 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131029 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131111 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5423416 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |