KR100488344B1 - Photosensitive resin composition for color filter - Google Patents

Abstract

The present invention relates to an alkali aqueous solution developing photosensitive resin composition used in a color filter, and more specifically, (1) cardo binder resin; (2) carboxyl group-containing acrylic copolymers; (3) acrylic photopolymerizable monomers; (4) photopolymerization initiators; (5) pigments; And (6) a photosensitive resin composition for color filters containing a solvent, wherein the photosensitive resin composition of the present invention is excellent in chemical resistance, heat resistance, and process characteristics, and greatly improves light resistance, and when the resin composition of the present invention is used, Can produce color filters.

Description

Photosensitive resin composition for color filters {PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER}

The present invention relates to an alkali aqueous developing photosensitive resin composition used in a color filter, and more particularly, to a color filter containing a carboxyl group-containing acrylic copolymer, having excellent chemical resistance, heat resistance, and process characteristics, and at the same time improving light resistance. It relates to a photosensitive resin composition.

The color filter is used in a liquid crystal display device, an optical filter of a camera, and the like, and is manufactured by coating a fine region colored with three or more colors on a solid state imaging device or a transparent substrate. Such colored thin films are usually formed by dyeing, printing, electrodeposition, pigment dispersion, or the like.

In the dyeing method, an image having a dye-based base material such as natural photosensitive resin such as gelatin, amine-modified polyvinyl alcohol, amine-modified acrylic resin, etc. is formed on a substrate in advance and then dyed with a dye such as a direct dye to form a colored thin film. In order to form a multi-colored thin film on the same substrate, it is necessary to perform flameproof processing every time the color is changed, so that the process is very complicated and the time is delayed. In addition, the clarity and dispersibility of the commonly used dyes and resins themselves are good, but there are disadvantages in that light resistance, moisture resistance and heat resistance, which are the most important characteristics, are poor. For example, although Korean Patent Publication No. 91-4717 and Korean Patent Publication No. 94-7778 use azo compounds and azide compounds as dyes, they have disadvantages in that heat resistance and durability are inferior to pigment type.

In the printing method, printing is performed using the ink which disperse | distributed the pigment to thermosetting or photocurable resin, and a colored thin film is formed by hardening with heat or light. According to this method, the material cost can be reduced compared to other methods, but it is difficult to form highly precise and detailed images, and the thin film layer formed is not uniform. Republic of Korea Patent Publication No. 95-703746 and Republic of Korea Patent Publication No. 96-11513 propose a method of manufacturing a color filter using the inkjet method, the color resist sheet composition sprayed from the nozzle for the printing of a delicate and accurate pigment Since it is a mold, durability and heat resistance are inferior as in the dyeing method.

In contrast, Korean Patent Publication No. 93-700858, Korean Patent Publication No. 96-29904, and Korean Patent Publication No. 96-29904 propose an electrodeposition method using an electroprecipitation method. It can be formed, and because it uses a pigment, it has excellent heat resistance and light resistance, but when the pixel size is precise and the electrode pattern becomes fine in the future, colored stains due to electrical resistance appear on both ends or the thickness of the colored film becomes thick, It is difficult to apply to color filters that require a high degree of precision.

On the other hand, the pigment dispersion method is a method in which a colored thin film is formed by repeating a series of processes of coating-exposure-developing-thermosetting a photopolymerizable composition containing a colorant on a transparent substrate provided with a black matrix. The pigment dispersion method has the advantage of improving heat resistance and durability, which are the most important properties of the color filter, and maintaining the thickness of the film uniformly. For example, Korean Patent Publication No. 92-702502, Korean Patent Publication No. 94-5617, Korean Patent Publication No. 95-11163, Korean Patent Publication No. 95-700359, and the like, propose a method for producing a color resist using pigment dispersion. have.

The coloring photosensitive resin composition used for manufacturing the color filter by the pigment dispersion method generally consists of binder resin, a photopolymerizable monomer, a photoinitiator, an epoxy resin, a solvent, other additives, etc. For example, the photosensitive polyimide resin composition of Unexamined-Japanese-Patent No. 60-237403; Photosensitive resin compositions comprising an acrylic polymer and an azide compound disclosed in Japanese Patent Laid-Open Nos. Hei 1-200353, Hei 4-7373, Hei 4-91173, and the like; Radically polymerized photosensitive resin compositions composed of acrylate monomers, organic polymer binders and photopolymerization initiators disclosed in Japanese Patent Application Laid-Open No. Hei 1-52449; Various photosensitive resin compositions have been proposed, such as the photosensitive resin composition comprising a phenol resin, a crosslinking agent having an N-methylol structure, and a photoacid generator disclosed in Japanese Patent Application Laid-open No. Hei 4-163552 and Korean Patent Publication No. 92-5780.

However, when a photosensitive polyimide or a phenol resin is used as the binder resin in the photosensitive resin composition to be applied to the pigment dispersion method, there are disadvantages such as high heat resistance but low sensitivity and development with an organic solvent. Moreover, when using an azide compound as a photosensitizer, there exists a problem of being low in sensitivity, inferior in heat resistance, or influenced by oxygen at the time of exposure. In order to avoid the influence of oxygen, it is necessary to provide an oxygen barrier film or to expose it under inert gas conditions. As a result, the process is complicated and equipment costs are high. In addition, the photosensitive resin which forms an image by the action of an acid generated by exposure has a high sensitivity and is not affected by oxygen during exposure, but a heating process is required in the exposure and development processes, and the pattern formation requires a heating time. Because it is sensitive to the problem, there is a problem that optimal process control is difficult.

In order to solve this problem, Japanese Patent Laid-Open Nos. 7-64281, 7-64282, 8-278630, 6-1938, 5-339356, and Korea Patent Publication No. 95- 702313 proposes a color filter manufacturing method using a cardo binder resin. In general, cardo-based resins are known to have high sensitivity and excellent heat resistance, shrinkage resistance, transparency, and the like without being affected by oxygen. Nevertheless, color filters manufactured using cardo-based resins as binder resins have disadvantages of insufficient chemical resistance, and in order to compensate for this, the use of cardo-based binder resins having epoxy groups introduced therein has been proposed, but the chemical resistance is still insufficient. When using cardo resin as resin, it is preferable to introduce another epoxy resin component to the photosensitive resin composition. Moreover, since the photosensitive resin composition containing cardo-type binder resin does not have a place to react with alkaline developing solution in itself, developability was inferior and the residue after image development was often left. In order to solve this problem, Japanese Patent Application Laid-Open No. Hei 4-363311 treats cardo-based binder resins with acid anhydrides and changes them into alkali-soluble resins to improve developability. In addition, in order to further improve developability, Japanese Patent Application Laid-open No. Hei 5-70528 used photopolymerizable monomers in addition to cardo-based binder resins by treating them with acid anhydrides.

However, cardo-based binder resins have excellent heat resistance, transparency, and sensitivity as described above when applied to color filters. However, color change and aging of color filters when exposed to xenon arc or carbon arc for a long time There is a fatal flaw that occurs.

The present invention is to solve the problems of the prior art as described above, by introducing a carboxyl group-containing acrylic copolymer in the photosensitive resin composition for color filters using a cardo resin as a binder resin to improve the chemical resistance, heat resistance and process characteristics of the pattern It aims at improving light resistance, keeping it excellent.

That is, the present invention provides a photosensitive resin composition for color filters comprising the following components:

(1) 0.5-20 wt% of cardo-based binder resin;

(2) 0.5 to 20% by weight of a carboxyl group-containing acrylic copolymer;

(3) 0.5 to 20% by weight of an acrylic photopolymerizable monomer;

(4) 0.1 to 10% by weight of photopolymerization initiator;

(5) 0.1 to 40% by weight of pigment; And

(6) 20-90 weight% of solvents.

Hereinafter, the present invention will be described in more detail.

The cardo-based binder resin (component 1) used in the present invention is a kind of terpolymer composed of three monomers of (A), (B) and (C) represented by the following general formulas (1), (2) and (3), A): (B): (C) = 1 mol: 2-4 mol: It has a composition of 2-8 mol, Preferably it has a molecular weight of 1,000-20,000.

Wherein R represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, a phenyl group or a benzyl group, or an ethoxy group having 1 to 8 carbon atoms; X represents a halogen atom.

In the formula, R represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, a phenyl group or a benzyl group, or an ethoxy group having 1 to 8 carbon atoms.

It is preferable that the usage-amount of the said component (1) is 0.5-20 weight% with respect to the whole composition. If the content of component (1) is less than 0.5% by weight, sufficient film strength cannot be maintained, whereas if the content of component (1) is more than 20% by weight, there is a disadvantage in that no pattern is formed at the exposed portion or an unexposed portion is generated.

In this invention, in order to make the cardo binder resin of the said component (1) into alkali-soluble resin, it processes and uses it with an acid anhydride. Suitable acid anhydrides for this purpose have the structure of formula (4).

In the above formula, R ₁ and R ₂ represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, a phenyl group or a benzyl group, or an ethoxy group having 1 to 8 carbon atoms.

In the present invention, an epoxy resin may be optionally used in combination for the purpose of supplementing the insufficient chemical resistance of the cardo-based binder resin. Epoxy resins usable in the present invention include phenol novolac epoxy resins, tetramethyl biphenyl epoxy resins, bisphenol A type epoxy resins, cycloaliphatic epoxy resins, and the like.

When using an epoxy resin, it is preferable that the usage-amount is 0.1-20 weight% with respect to the whole composition. If the content of the epoxy resin is less than 0.1% by weight, there is no added effect, while if the content of the epoxy resin exceeds 20% by weight, there is a problem such as the pattern surface impairment of the residue or the exposed part due to the undeveloped portion of the non-exposed part.

The carboxyl group-containing acrylic copolymer (component 2) used in the present invention is a copolymer of an ethylenically unsaturated monomer having one or more carboxyl groups and other ethylenically unsaturated monomers copolymerizable therewith. At this time, the weight ratio of the carboxyl group-containing ethylenically unsaturated monomer is in the range of 5 to 50%, preferably 10 to 40% of the total copolymer. The molecular weight (Mw) of the carboxyl group-containing acrylic copolymer is 3,000 to 150,000, preferably 5,000 to 50,000.

Examples of the carboxyl group-containing ethylenically unsaturated monomers include acrylic acid, methacrylic acid, maleic acid, itaconic acid, and fumaric acid, and the carboxyl group-containing acrylic copolymer used in the present invention includes at least one monomer thereof. do. As another ethylenically unsaturated monomer copolymerizable with the said carboxyl group-containing ethylenically unsaturated monomer, For example, styrene, (alpha) -methyl styrene, vinyltoluene, vinyl benzyl methyl ether, methyl acrylate, methyl methacrylate, ethyl acrylate, Ethyl methacrylate, butyl acrylate, butyl methacrylate, 2-hydroxy ethyl acrylate, 2-hydroxy ethyl methacrylate, 2-hydroxy butyl acrylate, 2-hydroxy butyl methacrylate, benzyl acryl Unsaturated carboxylic acid esters such as latex, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate and phenyl methacrylate; Unsaturated carboxylic acid amino alkyl esters such as 2-amino ethyl acrylate, 2-amino ethyl methacrylate, 2-dimethyl amino ethyl acrylate and 2-dimethyl amino ethyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate and vinyl benzoate; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Vinyl cyanide compounds such as acrylonitrile and methacrylonitrile; Unsaturated amides such as acryl amide and methacryl amide, and the like, and the carboxyl group-containing acrylic copolymer used in the present invention includes one or more of these monomers.

Specific examples of the carboxyl group-containing acrylic copolymer composed of the above monomers include methacrylic acid / benzyl methacrylate copolymer, methacrylic acid / benzyl methacrylate / styrene copolymer, methacrylic acid / benzyl methacryl Late / 2-hydroxy ethyl methacrylate copolymer, methacrylic acid / benzyl methacrylate / styrene / 2-hydroxy ethyl methacrylate copolymer, and the like.

It is preferable that the usage-amount of the said component (2) is 0.5-20 weight% with respect to the whole composition. If the content of component (2) is less than 0.5% by weight, the desired light resistance enhancing effect cannot be obtained in the present invention, while if it is more than 20% by weight, chemical resistance and heat resistance are deteriorated.

The acrylic photopolymerizable monomer (component 3) used in the present invention is a monomer generally used in the photosensitive resin composition for color filters, for example, ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol di Acrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, Dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, tri Ethylene Glycol Dimethacrylate, Propylene Glycol Dimethacrylate, 1,4-Butane And the like oldi methacrylate, 1,6-hexanediol dimethacrylate.

It is preferable that the usage-amount of the said component (3) is 0.5-20 weight% with respect to the whole composition. If the content of component (3) is less than 0.5% by weight, the problem of deterioration in film strength and smoothness occurs, while in excess of 20% by weight, residual film may occur due to the undevelopment of the unexposed areas.

In this invention, the acryl-type photopolymerizable monomer of the said component (3) is also used by processing with an acid anhydride so that it may be easy to melt | dissolve in an alkaline developing solution like the said component (1). The acid anhydrides usable here are the same as those used for the treatment of component (1) above.

The photoinitiator (component 4) used in this invention is a photoinitiator generally used for the photosensitive resin composition, For example, an acetophenone type compound, a benzophenone type compound, a thioxanthone type compound, a benzoin type compound, a triazine type compound Etc. can be used.

It is preferable that the usage-amount of the said component (4) is 0.1-10 weight% with respect to the whole composition. If the content of component (4) is less than 0.1% by weight, photopolymerization may not sufficiently occur during exposure in the pattern forming process, whereas if it exceeds 10% by weight, the pattern of the exposed area may be peeled off or the remaining film of the non-exposed part may occur.

Specific examples of the acetophenone-based compound used as the photopolymerization initiator include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylproriophenone, and pt-butyl Trichloroacetophenone, pt-butyldichloroacetophenone, benzophenone, 4-chloroacetophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-meth Methoxybenzophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropan-1-one, 2-benzyl-2 -Dimethylamino-1- (4-morpholinophenyl) -butan-1-one and the like.

As the benzophenone compound, benzophenone, benzoyl benzoic acid, benzoyl benzoic acid methyl, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis (dimethyl amino) benzophenone, 4,4'-bis (Diethyl amino) benzophenone and the like.

Examples of thioxanthone compounds include thioxanthone, 2-chloro thioxanthone, 2-methyl thioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, and 2,4-diisopropyl thioke Acid, 2-chloro thioxanthone, and the like.

Benzoin-based compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal and the like.

Triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (3 ', 4'-dimethoxy Styryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4'-methoxy naphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxy phenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-tril) -4,6-bis (trichloromethyl) -s-triazine, 2- Fiphenyl-4,6-bis (trichloromethyl) -s-triazine, bis (trichlorobetayl) -6-styryl-s-triazine, 2- (naphtho 1-yl) -4,6- Bis (trichloro methyl) -s-triazine, 2- (4-methoxy naphtho 1-yl) -4,6-bis (trichloro methyl) -s-triazine, 2-4-trichloro methyl ( Piperonyl) -6-triazine, 2-4-trichloro methyl (4'-methoxy styryl) -6-triazine and the like.

In addition, carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, biimidazole compounds, and the like can also be used.

In the present invention, as the pigment (component 5), inorganic pigments such as carbon black may be used in addition to organic pigments such as anthraquinone pigments, condensed polycyclic pigments, phthalocyanine pigments, and azo pigments. May be used alone or in combination of two or more thereof.

It is preferable that the usage-amount of the said component (5) is 0.1-40 weight% with respect to the whole composition. If the content of component (5) is less than 0.1% by weight, the coloring effect is insignificant, whereas if it is more than 40% by weight, there is a disadvantage in that no pattern formation or residual film of the non-exposed part occurs due to the decrease in the degree of crosslinking of the exposed part.

Solvents (component 6) usable in the present invention include ethylene glycol acetate, ethyl cellosolve, propylene glycol methyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether and the like. May be used alone or in combination of two or more thereof.

It is preferable that the usage-amount of the said component (6) is 20 to 90 weight% with respect to the whole composition. If the content of the component (6) is less than 20% by weight, application of the resin composition is difficult, while if it exceeds 90% by weight, problems such as uneven patterning may occur and a desired pattern thickness may not be obtained.

The photosensitive resin composition of this invention is apply | coated in thickness of 0.5-10 micrometers, for example using suitable methods, such as spin coating, roller coating, and spray coating, on the glass substrate for color filters. After application, the active line is irradiated to form a pattern required for the color filter. As a light source used for irradiation, UV ray of 190-450 nm, Preferably 200-400 nm area | region is irradiated, for example, electron beam and X-ray irradiation are also suitable. After irradiating the light, the coating layer is treated with an alkaline developer, so that the unilluminated portion of the coating layer is dissolved and a pattern necessary for the color filter is formed. By repeating this process in accordance with the required number of colors, a color filter having a desired pattern can be obtained. Further, in the above process, crack resistance, solvent resistance, and the like can be further improved by heating the image pattern obtained by development again or curing by active ray irradiation or the like.

Hereinafter, the present invention will be described in more detail with reference to examples, but these examples are for illustrative purposes only and should not be construed as limiting the present invention.

Example 1

(1) cardo binder resin 5.25 g

    (A) / (B) / (C) = 1/2/2 (m / m), molecular weight (Mw) = 8,000

    (A): 9,9'-bis (4-hydroxyphenyl) fluorene

    (B): epichlorohydrin

    (C): acrylic acid

(2) 3 g of carboxyl group-containing acrylic copolymer

    (A ') / (B') = 30/70 (w / w), molecular weight (Mw) = 25,000

    (A '): methacrylic acid

    (B '): benzyl methacrylate

(3) acrylic photopolymerizable monomer

     Dipentaerythritol hexaacrylate 4g

     1 g of 1,6-hexanediol diacrylate

(4) photopolymerization initiator

     TAZ-110 (made by Midori Kagaku Corporation) 0.3 g

     Igacure 907 (Shiba-Gaigi Co., Ltd.) 0.3g

     4,4'-bis (diethylamino) benzophenone (made by Hodogaya Corporation) 0.1 g

(5) pigment

     Diketo-Pyrrollo-Pyrole Red 8g

(6) solvent

     Propylene Glycol Monomethyl Ether Acetate 62g

     16 g of cyclohexanone

(7) dispersant

     Fluorinated Dispersant (FC-430, 3M) 0.05g

Using the above components, a photosensitive resin composition was prepared as follows:

 (1) After dissolving a photoinitiator in a solvent, it stirred at room temperature for 2 hours.

 (2) The cardo binder resin, the acrylic copolymer and the photopolymerizable monomer were added and stirred at room temperature for 2 hours.

 (3) The pigment was added and stirred at room temperature for 1 hour.

 (4) A dispersant was added and stirred at room temperature for 1 hour.

 (5) Three times of filtration was performed to remove impurities.

Example 2

A photosensitive resin composition was prepared in the same manner as in Example 1, except that the acrylic copolymer was replaced with a resin having the following composition.

    (A ') / (B') / (C ') = 30/65/5 (w / w / w), molecular weight (Mw) = 25,000

    (A '): methacrylic acid

    (B '): benzyl methacrylate

    (C '): 2-hydroxy methyl acrylate

Comparative Example 1

A photosensitive resin composition was prepared in the same manner as in Example 1, except that 8 g of an acrylic copolymer was used instead of the cardo binder resin.

Comparative Example 2

A photosensitive resin composition was prepared in the same manner as in Example 1, except that no acrylic copolymer was used and only 8 g of a cardo binder resin was used instead.

Comparative Example 3

A photosensitive resin composition was prepared in the same manner as in Example 1, except that 2 g of epoxy resin (YX-4000HK, manufactured by Nippon Kayaku Co., Ltd.) and 6 g of cardo-based binder resin were used instead of the acrylic copolymer.

Characterization of the pattern formed using the photosensitive colored resin composition prepared in Examples 1 to 2 and Comparative Examples 1 to 3 was performed as follows:

-Chemical resistance

The photosensitive resin composition was applied to a thickness of 1 to 2 μm on a 0.7 mm thick glass substrate washed with degreasing, and dried in a hot air circulation drying furnace at 80 ° C. for 1 minute to obtain a coating film. Subsequently, irradiated with an ultra-high pressure mercury lamp having a wavelength of 365 nm, developing at 30 ° C. and atmospheric pressure for 60 seconds using a 1% KOH-based aqueous solution, and then drying at 220 ° C. for 40 minutes in a hot air circulation drying furnace. A pattern was obtained. Each of these patterns was prepared for each Example and 5 Comparative Examples, each pattern was immersed in 5% HCl aqueous solution, 5% NaOH aqueous solution, N-methylpyrrolidone (NMP), xylene or IPA (isopropyl alcohol) for 60 minutes After the drying, the pattern change and the color difference were observed. If any of the five solutions did not pass, it was determined to be defective.

 ○: No change in pattern, color difference (ΔE) is 3.0 or less

 (Triangle | delta): There is little change of a pattern, or color difference ((DELTA) E) is 3.0-5.0

 X: many pattern changes or color difference ((DELTA) E) is 5.0 or more

 (※ change of pattern: swelling, peeling, melting of pattern)

-Heat resistance

The photosensitive resin composition was applied to a thickness of 1 to 2 μm on a 0.7 mm thick glass substrate washed with degreasing, and dried in a hot air circulation drying furnace at 80 ° C. for 1 minute to obtain a coating film. Subsequently, irradiated with an ultra-high pressure mercury lamp having a wavelength of 365 nm, developing at 30 ° C. and atmospheric pressure for 60 seconds using a 1% KOH-based aqueous solution, and then drying at 220 ° C. for 40 minutes in a hot air circulation drying furnace. A pattern was obtained. After the pattern was heat-treated at 220 ° C. for 3 hours, the pattern was changed and the color difference was observed.

 ○: No change in pattern, color difference (ΔE) is 3.0 or less

 (Triangle | delta): There is little change of a pattern, or color difference ((DELTA) E) is 3.0-5.0

 X: many pattern changes or color difference ((DELTA) E) is 5.0 or more

 (※ change of pattern: swelling of pattern, recrystallization phenomenon on pattern surface)

Light resistance

The photosensitive resin composition was applied to a thickness of 1 to 2 μm on a 0.7 mm thick glass substrate washed with degreasing, and dried in a hot air circulation drying furnace at 80 ° C. for 1 minute to obtain a coating film. Subsequently, irradiated with an ultra-high pressure mercury lamp having a wavelength of 365 nm, developing at 30 ° C. and atmospheric pressure for 60 seconds using a 1% KOH-based aqueous solution, and then drying at 220 ° C. for 40 minutes in a hot air circulation drying furnace. A pattern was obtained. The pattern was subjected to light treatment for 500 hours using a xenon arc lamp (Ci65, manufactured by Atlas), and then the change of the pattern and the color difference were observed.

 ○: No change in pattern, color difference (ΔE) is 3.0 or less

 (Triangle | delta): There is little change of a pattern, or color difference ((DELTA) E) is 3.0-5.0

 X: many pattern changes or color difference ((DELTA) E) is 5.0 or more

 (※ change of pattern: swelling or cracking of pattern)

Developability

Applying the photosensitive resin composition to a thickness of 1 ~ 2μm on a 1mm thick chromium coated glass substrate degreased, and after the EBR (Edge Bead Remover) treatment, dried for 1 minute at 80 ℃ in a hot air circulation drying furnace to obtain a coating film It was. Subsequently, a photomask was placed on the coating film and exposed using a high-pressure mercury lamp having a wavelength of 365 nm, followed by developing at 30 ° C. and atmospheric pressure for 60 seconds using a 1% KOH-based aqueous solution, followed by hot air circulation drying. Dry at 220 ° C. for 40 minutes to obtain a pattern. Then, the presence or absence of the residue was visually examined under a halogen lamp.

 ○: Excellent processability-No residue or EBR residue on the pattern.

 (Triangle | delta): Good processability-There exist some residue and EBR residue on a pattern.

 X: poor processability-Many residues remain on the pattern.

Pattern surface roughness

The photosensitive resin composition was applied to a thickness of 1 to 2 μm on a 1 mm thick chromium-coated glass substrate, and dried for 1 minute at 80 ° C. in a hot air circulation drying furnace to obtain a coating film. Subsequently, a photomask was placed on the coating film and exposed using a high-pressure mercury lamp having a wavelength of 365 nm, and then developed at 30 ° C. and 1 atmosphere using a 1% KOH-based aqueous solution, followed by hot air circulation drying. Drying in the furnace at 220 ° C. for 40 minutes yielded a pattern. Then, the shape of the pattern of 100μm size was observed using P-10 manufactured by TENCO.

 ○: roughness of surface of pattern is less than 50Å

 Δ: roughness of the surface of the pattern is 50 kPa to 100 kPa

 ×: roughness of pattern surface is 100 패턴 or more

The results according to the above evaluation method are shown in Table 1 below.

Light resistance Chemical resistance Heat resistance Developability Surface roughness Example 1 ○ ○ ○ ○ ○ Example 2 ○ ○ ○ ○ ○ Comparative Example 1 ○ × △ ○ △ Comparative Example 2 × ○ ○ ○ ○ Comparative Example 3 △ ○ ○ △ △

As described in detail above, the photosensitive resin composition of the present invention is excellent in chemical resistance, heat resistance, and process characteristics, and greatly improves light resistance, and thus, the resin composition of the present invention can produce a high quality color filter.

Claims (5)

Photosensitive resin composition for color filters comprising the following components: (1) 0.5-20 wt% of cardo-based binder resin; (2) 0.5 to 20% by weight of a carboxyl group-containing acrylic copolymer; (3) 0.5 to 20% by weight of an acrylic photopolymerizable monomer; (4) 0.1 to 10% by weight of photopolymerization initiator; (5) 0.1 to 40% by weight of pigment; And (6) 20-90 weight% of solvents. The terpolymer according to claim 1, wherein the cardo-based binder resin is composed of three monomers of (A), (B) and (C) represented by the following general formulas (1), (2) and (3). B): (C) = 1 mol: 2-4 mol: It has a composition of 2-8 mol, and has a molecular weight of 1000-20000, The photosensitive resin composition for color filters characterized by the above-mentioned: [Formula 1] [Formula 2] Wherein R represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, a phenyl group or a benzyl group, or an ethoxy group having 1 to 8 carbon atoms; X represents a halogen atom. [Formula 3] In the formula, R represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, a phenyl group or a benzyl group, or an ethoxy group having 1 to 8 carbon atoms. The photosensitive resin composition for color filters according to claim 1, wherein the cardo-based binder resin and the acrylic photopolymerizable monomer are treated with an acid anhydride having a structure of Formula 4 below. [Formula 4] In the above formula, R ₁ and R ₂ represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, a phenyl group or a benzyl group, or an ethoxy group having 1 to 8 carbon atoms. The photosensitive resin composition for color filters according to claim 1, wherein the composition further comprises 0.1 to 20 wt% of an epoxy resin. The color filter manufactured by forming a pattern from the photosensitive resin composition of any one of Claims 1-4.