KR100483948B1 - Power supplier for plasma capable of controlling gas and vaccum - Google Patents

Abstract

     The present invention relates to a plasma power supply for supplying energy to a plasma chamber for generating plasma in a vacuum plasma apparatus. In detail, among the components of the vacuum plasma apparatus, a gas regulator and a gas regulator for manipulating the valve of the vacuum system and the vacuum regulator and an energy supply device for supplying energy to the vacuum plasma apparatus are integrated, By configuring the sequence control to be performed, a plasma power supply is posted which can simplify the components constituting the vacuum plasma apparatus and at the same time operate and operate more conveniently.

Description

Power supplier for plasma capable of controlling gas and vaccum

     The present invention relates to a plasma power supply, and more particularly, to a plasma power supply that integrates a plasma power supply, a gas control device, a vacuum control device, and an electrical supply device so that sequence control by a microcomputer can be performed.

     In general, when energy is transmitted by collision of accelerated electrons to gas molecules or atoms, or when energy by heat or microwave is applied, the outermost electrons of the gas molecules become free electrons by leaving the orbit and exhibiting a positive charge. Molecules or atoms and electrons with negative charges are created. A large number of these positively charged ions and electrons are electrically neutral, and the particles interact with each other to emit unique light and have high reactivity due to the active movement of the particles. It is called plasma.

Such a plasma can be classified into a low temperature glow discharge plasma having a temperature of tens of thousands of degrees and a density of 109 to 1010 / cm 3 and an ultra high temperature fusion plasma having a temperature of tens of thousands of degrees and a density of 1013 to 1014 / cm 3. The industrially active plasma is a low-temperature glow discharge plasma, which is plasma etched and deposited (PECVD: Plasma Enhanceed Chemical Vapor Deposition), surface treatment of metals or polymers, synthesis of new materials, and plant exhaust. It is mainly used in environmental fields such as dry processing technology that removes NOx and SOx from gas. Recently, research on plasma display panel (PDP), which is one of the large screen flat panel displays required for the next generation high definition television, has been conducted. It's been making progress.

As an apparatus for generating a plasma that is variously applied as described above, a gas in a gaseous state is typically injected into a plasma chamber in a vacuum state, and then a predetermined energy is supplied to the plasma chamber to form the injected gas as a plasma. A vacuum plasma apparatus for converting is widely used. Hereinafter, a configuration and operation of a conventional vacuum plasma apparatus will be described with reference to FIG. 1.

1 is a view showing the configuration of a conventional vacuum plasma apparatus.

The vacuum plasma apparatus comprises a plasma chamber 19 and a plasma power supply 4, a gas control device 2, a vacuum control device 3 and an electrical supply device 5, each of which is a separate part.

The gas control valves 6 to 9 shown in the drawing adjust the flow rate of the gas injected into the plasma chamber according to the type of gas required according to the process. In the drawing, gas of gas 1 to gas 4 is injected for each type. It is shown to be. The gas valves 11 to 14 are valves for opening and closing the flow of gas.

The vent gas valve 10 is a valve for injecting a vent gas (VENT GAS) for making the air pressure inside the plasma chamber 19 equal to atmospheric pressure, and nitrogen gas is usually used as the vent gas to be injected.

Gas valves 11 to 14 are connected to the gas control valves 6 to 9, respectively, to maintain airtightness and gas shutoff in a vacuum state inside the plasma chamber 19.

The plasma power supply 4 may employ a high frequency generator, a direct current power supply, a pulse power supply, or the like as a device for supplying energy for converting gas in the gaseous state in the plasma chamber 19 as plasma.

The electricity supply device 5 is a device for supplying electricity to the above components, and reference numeral 15 is a common pipe installed at the outlet side of the gas valves 11 to 14 so that the gases are combined. Gases combined in the common pipe 15 are injected into the plasma chamber 19.

     The control panel 1 is electrically connected to the plasma power supply 4, the gas regulating device 2, the vacuum regulating device 3, and the electric supply device 5 constituting the vacuum plasma device, and the respective devices are connected in the operation sequence. It is an operator control panel for sequential operation.

     The vacuum pump 18 and the vacuum valve 17 are pumps for turning the plasma chamber 19 into a vacuum state and valves for opening and closing thereof, and reference numerals 16 and 20 denote low vacuum sensors 16 and high vacuum sensors 20, respectively. ) Is placed to sense the vacuum pressure value in the plasma chamber 19.

     The vacuum regulator 15 receives the opening and closing of the vacuum valve 17 and the vacuum pressure value in the plasma chamber 19 sensed by the low vacuum sensor 16 and the high vacuum sensor 20, and the control panel 1 receives the vacuum pressure value. To pass).

     Hereinafter, the operation of the general vacuum plasma apparatus configured as described above will be described.

     The operator manually operates the vacuum pump 18. Next, the vacuum valve 17 is opened in the sequence operation sequence to bring the air pressure in the plasma chamber 19 into a vacuum state. Then, the low vacuum sensor 16 or the high vacuum sensor 20 measures the vacuum pressure value of the plasma chamber 19, transmits the signal to the vacuum regulator 3, and the vacuum regulator 3 is The vacuum pressure value is converted into a vacuum unit value (typically converted into a Torr value, which is a vacuum unit), and the converted vacuum unit value is transferred to the control panel 1.

     The control panel 1 receiving the vacuum unit value from the vacuum regulator 3 has a gas regulating valve 6 to 9 and a gas valve 11 to 11 when the value reaches a predetermined minimum base pressure. A control signal for opening 14 is transmitted to the gas regulator 2.

     The gas regulator 2 receiving the control signal from the control panel 1 opens the gas valves 11, 12, 13, and 14 and controls the gas control valves 6, 7, 8, and 9 to preset flow rates. Gas is injected into the plasma chamber 19 in accordance with the value. Subsequently, when the gas valves 11 to 14 and the gas control valves 6 to 9 are operated, a flow rate sensor (not shown) built in the gas control valves 6 to 9 measures the flow rate of the injected gas. Is transmitted to the gas regulator 2, and the measured flow rate is displayed on a predetermined display unit (not shown) of the gas regulator 2 in cc or liter units, and is then transmitted to the control panel 1 again.

     The control panel 1, which has received the actual flow value flowing through the valve from the gas regulator 2, has a flow rate of the gas injected into the plasma chamber 19 reaching a preset flow rate value of the gas, and the transient flow of the gas. After having a time delay for the unstable vacuum degree to stabilize, the plasma power supply 4 is operated to generate energy by a high frequency generator, a pulse power supply, or a direct current power supply that can be used as the plasma power supply 4. It is supplied to the plasma chamber 19 for a set time. Then, plasma is generated in the plasma chamber 19 so that the operator can use the plasma in a desired processing process.

     At the end of the process, the control panel 1 cuts off the power supply of the plasma power supply 4 in the reverse order of the operation, and the gas regulator 2 zeros the set values of the gas control valves 6 to 9. Then, the gas valves 11 to 14 are shut off to allow a waiting time for a predetermined time (about 15 seconds or so) so that the plasma chamber 19 is again in a vacuum without residual gas. Next, the vacuum regulator 3 shuts off the gas valves 11 to 14 and the vacuum valve 17, respectively, and then the gas regulator 2 opens the vent gas valve 10 to release the vent gas into a vacuum state. The plasma chamber 19 is reduced to atmospheric pressure by supplying it to the plasma chamber 19 being maintained.

     When the plasma chamber 19 is reduced to atmospheric pressure, the atmospheric pressure switch 21 installed in the plasma chamber 19 generates an atmospheric pressure reduction signal and transmits it to the control panel 1. Then, the control panel 1 displays an operation completion signal to the operator, and the operator who recognizes this opens the plasma chamber 19 to obtain a product processed for a predetermined purpose.

     However, the general vacuum plasma apparatus having the above configuration and operation has the following problems,

   First, it is composed of individual independent components such as control panel (1), plasma power supply (4), gas regulator (2), vacuum regulator (3) and electricity supply (5). There is a problem that the volume of the configured finished device is large.

     Second, there is a problem that requires a relatively expensive cost because you have to purchase all the above components.

     Third, since each device must be connected one by one, it takes a considerable amount of time and manpower to construct a finished product, and there is a problem that the connection process is difficult.

     Fourth, there is a problem that a predetermined housing for supporting each of the devices to be configured is additionally needed.

     An object of the present invention for solving the above problems is, among the respective components constituting the vacuum plasma apparatus, the control panel 1, the plasma power supply (4), the gas regulator (2), the vacuum regulator ( 3) and the electric supply device 5 are integrated, and a plasma power supply for automatically controlling them by sequence control of the microcomputer is provided.

     The configuration of the present invention for achieving the above object,

    And a gas control valve having a plasma chamber having a vacuum sensor, a gas valve for supplying gas to the plasma chamber, and a flow rate sensor for sensing a flow rate of the gas, and a vacuum pump and a vacuum valve for vacuuming the plasma chamber. A vacuum power supply for supplying energy to the plasma chamber, wherein the plasma power supply generates a vacuum valve control signal for controlling the opening and closing of the vacuum valve, and has an input routine for a vacuum pressure value in the plasma chamber. Generating a gas control signal for controlling the opening and closing of the gas valve and the gas control valve in accordance with the received vacuum pressure value, has an input routine of the gas flow rate value sensed from the gas control valve, the magnitude of the energy supplied to the plasma chamber Do not generate power control signals to control the Com control unit; And opening and closing a gas valve connected to an electric line according to a gas control signal transmitted from the microcomputer control unit, receiving a gas flow rate input from a flow sensor of a gas control valve, and transferring the gas flow rate to a gas flow rate input routine of the microcomputer control unit. Gas control unit; And a plasma power supply unit for driving energy generation means for generating energy supplied to the plasma chamber by the power control signal transmitted from the microcomputer control unit to output an energy to the plasma chamber. And a key input and display unit having display means for displaying the vacuum pressure value, the gas flow rate, the magnitude and the supply time of the energy input to the microcomputer control unit, and input means for inputting the appropriate vacuum pressure value. Characterized in that consisting of.

     In addition, the vacuum pressure value is received from the vacuum sensor and transferred to the input routine of the vacuum pressure value of the microcomputer control unit, the control signal for opening and closing the vacuum valve from the microcomputer control unit is transmitted to the vacuum valve, input from the microcomputer control unit A vacuum controller which displays the received vacuum pressure value through a key input and a display of a microcomputer control unit; It characterized in that it further comprises.

     Hereinafter, with reference to the accompanying drawings will be described in detail the configuration of a preferred embodiment of the present invention.

     FIG. 2 is a schematic diagram of a vacuum plasma apparatus 100 using the plasma power supply 30 according to the first embodiment of the present invention, which will be described in detail with reference to the accompanying drawings. Description is omitted).

     The plasma power supply of the first embodiment of the present invention integrates the control panel 1, the plasma power supply 4, the gas regulating device 2 and the electric supply device 5 constituting the conventional general vacuum plasma apparatus, and the microcomputer. Invented to operate these sequentially by the sequence control of,

    As shown in the drawing, the plasma power supply of the present invention is the microcomputer control unit 31, the gas control unit 32, the plasma power supply unit 33, the key input and the display unit 34 is integrated, the control signal of the microcomputer control unit 31 The gas control unit 32 controls the opening and closing of the gas injected into the plasma chamber 19 and the flow rate, controls the driving of the plasma power supply unit 33 for outputting energy supplied to the plasma chamber, and the plasma chamber 30. It is installed on the outside of the) serves to control the vacuum regulator 3 for adjusting the vacuum state of the plasma chamber.

    Hereinafter, the components of the plasma power supply 30 of the first embodiment of the present invention will be described.

     1) Microcomputer control unit 31

    The microcomputer control unit 31 controls the gas control unit 32, the plasma power supply unit 33, the key input and the display unit 34 by a sequential operation program programmed in the microcomputer control unit 31. It has a microprocessor and a memory for storing the operation program, input and output port for transmitting a control signal to the gas control unit 32, the plasma power supply 33, the key input and display unit 34 and the vacuum control unit 15 Have In particular, between the vacuum regulator 15, it is possible to exchange data with each other through three vacuum regulator input stages 31a, 31b, 31c and one vacuum regulator output stage 31d. In addition, as shown in the figure, a serial port (not shown) is provided in the microcomputer control unit 31 so as to exchange data with a conventional computer or to debug the operation program in an RS-232C manner.

      2) gas control unit (32)

    The gas regulator 32 is a gas flow rate setting value that is a digital open / close signal of the gas valves 11 to 14 and a control signal of the gas control valves 6 to 9 through an input / output port of the microcomputer control unit 31. 11 to 14 and gas control valves 6 to 9, respectively, and measures the flow rate of the gas actually injected into the plasma chamber 19 by a flow sensor (not shown) built in the gas control valves 6 to 9. The value is transmitted to the microcomputer control unit 31.

     To this end, the gas regulating unit 32 has respective driving circuits for raising digital control signals to operate the gas valves 11 to 14, and the set values of the gas regulating valves 6 to 9 and the measured values are analogues. As an analog signal, there are D / A and A / D converter circuits of predetermined bits for transmitting and receiving data to and from the microcomputer control unit 31, and for controlling the gas control valves 6 to 9 appropriately. Signal control circuit and power supply circuit are built in. In some cases, the gas control valves 6 to 9 may be replaced by a mechanical flow meta to manually adjust the flow rate of the gas and to read the value of the flow rate with a scale engraved on the flow meta itself. In this case, electrical connection with the gas control part 32 is unnecessary.

      3) plasma power supply 33

     The plasma power supply unit 33 receives the control signal through the input / output port of the microcomputer control unit 31 to generate energy for converting the gas injected into the plasma chamber 19 in a vacuum state into plasma, thereby generating the energy. This is the part to output. As a means for generating energy, the above-described high frequency generator or DC power supply or pulse power supply can be employed.

     Here, when the energy generating means employed in the plasma power supply 33 is a high frequency generator, the frequency has a frequency between 30 [KHz] and 100 [MHz], and the high frequency output is between 10 [W] and 50 [KW]. It is desirable to be at.

     In addition, when the energy generating means employed in the plasma power supply 33 is a DC power supply, the DC voltage has a voltage between 5 [V] and 10 [KV], and the output of the DC power is It is preferred to be between 50 [W] and 300 [KW].

     In addition, when the energy generating means employed in the plasma power supply 33 is a pulse power supply, the pulse voltage is varied from 0 [V] to 1 [KV], and the frequency of the pulse is 10 [Hz]. ] In the range of 33 [KHz], the duty ratio of the pulse (ratio of ON TIME to OFF TIME) varies from 1 [%] to 99 [%], and the output of the pulse power supply is 50 [W ] Is preferably between 200 [KW].

      4) key input and display unit (34)

     The key input and display unit 34 is a flow rate of the appropriate pressure value gas of the plasma chamber 19, the output of energy from the plasma power supply unit 33 to the microcomputer control unit 31 to operate the vacuum plasma apparatus 100; Input means for manually inputting operational information such as its operation time, sequence operation sequence, and delay time, such as its attributes, and display means for displaying the values thereof. The above-mentioned input of operation information and exchange of information to be displayed are transmitted through the input / output port of the microcomputer control unit 31, and it is preferable to adopt a normal keypad as the input means and a normal LCD module as the display means.

     Hereinafter, the operation of the plasma power supply 30 of the first embodiment of the present invention configured as described above will be described in detail.

     First, the operator of the apparatus operates the vacuum pump 18 manually in the same order as for operating the conventional general vacuum plasma apparatus of FIG. Then, the microcomputer control unit 31 transmits a control signal to the vacuum regulator 15 to open the vacuum valve 17 through the vacuum regulator output terminal 31d, and the vacuum regulator 15 is connected to an electric line by vacuum. The control signal is transmitted to the valve 17 to open the vacuum valve 17.

    As the vacuum valve 17 is opened, a pumping action of the vacuum pump 18 is transmitted to the plasma chamber 19, and the internal pressure of the plasma chamber 19 gradually decreases to a low vacuum state. The vacuum pressure in the low vacuum state is sensed by the low vacuum sensor 16 to transmit a signal of the vacuum pressure to the vacuum regulator 15, the vacuum regulator 15 is a vacuum unit value of the detected vacuum pressure signal It is converted into Torr and the value is displayed through the display means (not shown) in itself.

    Subsequently, when the vacuum pressure value input from the low vacuum sensor 16 reaches the minimum base pressure value set by the operator of the apparatus, the vacuum regulator 15 may be The recognition signal of the lowest basic pressure value is input to the vacuum regulator input terminal 31b of the microcomputer control unit 31. The microcomputer control unit 3 receiving the recognition signal transmits control signals of the gas valves 11 to 14 and the gas control valves 6 to 9 to the gas control unit 32 through the input / output port, and the gas control unit The gas valves 11 to 14 are opened by transmitting the control signals to the gas valves 11 to 14 and the gas control valves 6 to 9 which are connected by an electric line through the input / output port elements, and the gas control valves 6 to 9. ) Allows gas to be injected into the plasma chamber 19 as much as the gas flow rate preset by the microcomputer control unit 31.

     Subsequently, the vacuum pressure value displayed on the display means of the vacuum regulator 15 is increased by the gas partial pressure of the pressure in the plasma chamber 19, and after a predetermined time, the overall vacuum degree in the plasma chamber 19 is stabilized. .

     Here, the use of the low vacuum sensor 16 and the high vacuum sensor 20 will be described. In general, the plasma chamber can be divided into a high vacuum and a low vacuum, and the conventional classification is 10E-1 to 10E-3. Torr band is low vacuum, vacuum detection is possible only by the low vacuum sensor 16, 10E-4 to 10E-7 torr band is high vacuum, and can be measured only by the high vacuum sensor 20. Therefore, if the plasma chamber used is for low vacuum, the high vacuum sensor 20 becomes unnecessary, but if the plasma chamber is for high vacuum, the vacuum plasma apparatus is operated as follows.

     First, the vacuum pump 18 is operated manually. Then, as described above, the vacuum valve 17 is opened so that the pressure in the plasma chamber 19 gradually decreases to a high vacuum state, and the vacuum pressure in the high vacuum state is sensed by the high vacuum sensor 16 to control the vacuum regulator 15. The vacuum regulator 15 transmits a signal of vacuum pressure, and the vacuum regulator 15 converts the detected vacuum pressure signal into a vacuum unit value, Torr, and displays the value through a display means (not shown) in itself.

    When the vacuum pressure value input from the high vacuum sensor 20 in the plasma chamber 19 reaches the lowest base pressure value set by the operator of the apparatus, the vacuum regulator ( 15) inputs the recognition signal of the lowest basic pressure value to the vacuum regulator input terminal 31a of the microcomputer control unit 31. The microcomputer control unit 3 receiving the recognition signal transmits the control signals of the gas valves 11 to 14 and the gas control valves 6 to 9 to the gas control unit 32 through the input / output port.

     Subsequently, when the injection of the gas by the gas control unit 32 continues, the pressure of the plasma chamber 19 is changed to low vacuum by the partial pressure of gas in the plasma chamber 19 so that the high vacuum sensor 20 stops operating. The vacuum pressure value is transmitted to the vacuum control unit 15 by the low vacuum sensor 16. The vacuum pressure value in the plasma chamber 19 is stabilized at an arbitrary value after a predetermined time.

     When the vacuum degree of the plasma chamber 19 is stabilized due to the gas injection as described above, the microcomputer control unit 3 transmits a control signal to the plasma power supply unit 33 to output energy having a predetermined output value, and the plasma power supply unit. 33 supplies predetermined energy to the plasma chamber. Plasma is generated in the chamber by ionization of the gas gases supplied by supplying energy to the plasma chamber 19. Typically, the time that the plasma is maintained in the plasma chamber 19 is referred to as a machining process time, and the operator may perform a desired plasma machining by chemical and physical phenomena of the plasma during the machining process time.

     After the processing time passes, the operation of the vacuum plasma apparatus is stopped in the reverse order. That is, the microcomputer control unit 31 cuts the output of the plasma power supply unit 33 and the gas valves 11 to 14 through the gas control unit 32. ) And the gas control valves 6 to 9 are stopped.

     After a certain time, when the residual gas is vacuum pumped into the plasma chamber 19, the microcomputer control unit 31 transmits a control signal for shutting off the vacuum valve 17 to the vacuum regulator output terminal 31d to provide a vacuum regulator 15. Causes the vacuum valve 17 to close. Then, when the control signal for opening the vent valve 10 is transmitted to the gas control unit 32 and the plasma chamber 19 in a vacuum state is changed to atmospheric pressure, the atmospheric pressure switch 21 installed in the plasma chamber 19 is Operating, and the atmospheric pressure acknowledgment signal of the atmospheric pressure switch 21 is input to the vacuum regulator input terminal 31c of the microcomputer control unit 3 via the vacuum regulator 15 so that the operation of the vacuum plasma apparatus 100 is stopped. Will be. The operator then opens the plasma chamber 19 at atmospheric pressure to obtain a processed article processed with the desired process.

     Next, the plasma power supply of the second embodiment of the present invention will be described in detail with reference to FIG. 3 (the description of the same reference numerals will be omitted).

     3 is a schematic diagram of a vacuum plasma apparatus using the plasma power supply of the second embodiment of the present invention.

     As shown in the figure, the plasma power supply 40 of the second embodiment of the present invention is a vacuum control corresponding to the vacuum regulator 15 of the first embodiment to the plasma power supply 30 of the first embodiment described above. In addition, the vacuum control unit 35 receives a vacuum pressure value from the high vacuum sensor 20 and the low vacuum sensor 16, and transfers the same to the microcomputer control unit 31. The control unit 31 displays this value through the key input and display unit 34 of the microcomputer control unit 31, and transmits a control signal of opening and closing the vacuum valve from the microcomputer control unit 31 to the vacuum valve 17 to provide a vacuum valve. (17) is controlled.

     Therefore, the vacuum regulator input stages 31a, 31b, 31c and the vacuum regulator output stage 31d of the first embodiment are not included in the second embodiment.

     On the other hand, the vacuum control unit 35 may be configured to select whether or not to operate through a predetermined key input from the microcomputer control unit 31.

     Since the operation of the vacuum plasma apparatus 200 using the plasma power supply 40 of the second embodiment as described above is performed in the same manner as the first embodiment, a detailed description thereof will be omitted.

     FIG. 4 is a view schematically illustrating external connections of the gas connector box 51 and the vacuum connector box 52 applied to the plasma power supply 40 of the second embodiment of the present invention. As shown in the drawing, FIG. Electrical lines 11 to 14, gas control valves 6 to 9, and vent valves 10 are connected by using a single gas connector box 51 connected to the gas control unit 32 by an electrical line. A gas channel (GAS CHANNEL) is formed for each of the gas valve and the gas control valve which are connected to each other, and the control signal is transmitted by the gas control unit 32 for each gas channel.

     In addition, the vacuum sensors such as the low vacuum sensor 16, the high vacuum sensor 20 and the vacuum valve 17 is connected by using a single vacuum connector box 52 connected to the vacuum control unit 35 and an electric line. By doing so, the low vacuum sensor 16, the high vacuum sensor 20 and the vacuum valve 17 is configured to transmit the control signal by the vacuum control unit 35 through the vacuum connector box 52.

     In addition, when the gas connector box 51 and the vacuum connector box 52 are mounted on a normal vacuum plasma apparatus, the gas connector box 51 and the vacuum connector box 52 are screwed to the body of the vacuum plasma apparatus, thereby providing electrical connection between the various gas valves and the vacuum sensor. Of course, when the gas connector box 51 and the vacuum connector box 52 are mounted on the plasma power supply 40 of the second embodiment of the present invention, the gas is supplied from the rear panel of the plasma power supply 40. Since the electrical connection is made between only the connector box 51 and the vacuum connector box 52 with a set of cables, the installation of the vacuum plasma apparatus becomes very simple. In addition, the gas connector box 52 may be applied to the output terminal of the gas regulator 15 of the plasma power supply 30 of the first embodiment of the present invention.

     The effect of the present invention having the above configuration is to unify various devices constituting the conventional vacuum plasma apparatus, and since the operation of each apparatus is sequentially controlled by a predetermined program, the operation for configuring the vacuum plasma apparatus is Since it is automated, there is an effect that the operator can simplify the desired plasma treatment process.

     In addition, since it is not necessary to purchase each part separately in order to configure the vacuum plasma apparatus, the installation space can be miniaturized, the cost can be reduced, and the assembly time and the manpower of the apparatus can be reduced.

    In addition, by using the gas connector box 51 and the vacuum connector box 52, the external exposure of the components of the vacuum plasma apparatus and the connection thereof are simplified, so that the durability and reliability of the apparatus are improved.

    In addition, since serial communication using RS-232 is possible, it is a very advanced invention that has the effect of easily configuring a remote control and monitoring system with another computer.

     1 is a schematic diagram of a conventional vacuum plasma apparatus,

     2 is a schematic diagram of a vacuum plasma apparatus using the plasma power supply of the first embodiment of the present invention;

     3 is a schematic diagram of a vacuum plasma apparatus using the plasma power supply of the second embodiment of the present invention;

Fig. 4 is a schematic diagram when a connector box is attached to the plasma power supply of the second embodiment of the present invention.

Explanation of symbols on the main parts of the drawings

One; Control panel 2; Gas regulator

3; Vacuum regulator 4; Plasma power supply

5; Electricity supply 6,7,8,9; Gas regulating valve

10; Vent gas valves 11, 12, 13, 14; Gas valve

15; Gas common pipe 16; Low vacuum sensor

17; Vacuum valve 18; Vacuum pump

19; Plasma chamber 20; High vacuum sensor

21; Atmospheric pressure switch

     30; Plasma power supply of the first embodiment

     31; A microcomputer control unit 32; Gas regulator

     33; A plasma power supply 34; Key input and display

     41; Vacuum control unit

     40; Plasma Power Supply of Second Embodiment

     51; Gas line connector box

     52; Vacuum line connector box

Claims (14)

     And a gas control valve having a plasma chamber having a vacuum sensor, a gas valve for supplying gas to the plasma chamber, and a flow rate sensor for sensing a flow rate of the gas, and a vacuum pump and a vacuum valve for vacuuming the plasma chamber. In the vacuum plasma apparatus,       Plasma power supply for supplying energy to the plasma chamber,      Generating a vacuum valve control signal for controlling the opening and closing of the vacuum valve, having an input routine for the vacuum pressure value in the plasma chamber, the gas control for controlling the opening and closing of the gas valve and the gas control valve in accordance with the input vacuum pressure value A microcomputer control unit which generates a signal and has an input routine of a gas flow rate value sensed from the gas control valve, and generates a power control signal for controlling a magnitude and a supply time of energy supplied to the plasma chamber; And      A gas that opens and closes a gas valve connected to an electric line according to a gas control signal transmitted from the microcomputer control unit, receives a gas flow rate inputted from a flow sensor of a gas control valve, and delivers the gas flow rate to a gas flow rate input routine of the microcomputer control unit. Control unit; And      A plasma power supply unit for driving energy generation means for generating energy supplied to the plasma chamber by the power control signal transmitted from the microcomputer control unit to output energy to the plasma chamber; And      A key input and display unit having display means for displaying the vacuum pressure value and the gas flow rate, the magnitude and supply time of the energy input to the microcomputer control unit, and input means for inputting the appropriate vacuum pressure value; And      Receives the vacuum pressure value from the vacuum sensor and transfers it to the input routine of the vacuum pressure value of the microcomputer control unit, transmits a control signal of opening and closing the vacuum valve from the microcomputer control unit to the vacuum valve, and the vacuum pressure received from the microcomputer control unit A vacuum controller which displays a value through a key input and a display of a microcomputer control unit; Plasma power supply capable of controlling gas and vacuum, characterized in that consisting of. delete      The method of claim 1,     The vacuum control unit is a plasma power supply capable of controlling the gas and vacuum, characterized in that configured to select whether to operate through the key input from the microcomputer control unit.      The apparatus of claim 1, wherein the microcomputer control unit comprises a memory for storing the operation program, an input / output port for transmitting a control signal to the gas adjusting unit, the plasma power supply unit, the key input and display unit, and the vacuum adjusting unit, and the vacuum control unit. A gas and vacuum controlled plasma power supply comprising a vacuum regulator input stage and a vacuum regulator output stage for data exchange with the apparatus.      [5] The plasma power supply of claim 4, wherein a serial port is provided in the microcomputer control unit to exchange data with a conventional computer or to debug the operation program in an RS-232C manner. feeder.     The method of claim 1,    The gas control unit is an input / output port dedicated device for transmitting the control signal received from the microcomputer control unit to the gas valve and the gas control valve, and the D / A and A / D converter for converting the flow rate measurement value to digital, for the operation of the gas valve A plasma power supply capable of controlling gas and vacuum, comprising: an analog signal adjusting circuit and a power supply circuit for enabling the valve driving circuit, the gas regulating valve to be properly controlled.     The method of claim 1,    The plasma power supply capable of gas and vacuum control, characterized in that the energy generating means of the plasma power supply unit is a high frequency generator.     8. The gas and vacuum controlled plasma power supply as claimed in claim 7, wherein the generated frequency of the high frequency generator has a frequency between 30KHz and 100MHz and the high frequency output is between 10W and 50KW.      2. The plasma power supply as claimed in claim 1, wherein the energy generating means of the plasma power supply unit is a DC power supply.      The method of claim 9,     Gas and vacuum control plasma power supply, characterized in that the DC (DC) voltage of the DC power supply has a voltage of 5V to 10KV, the output of DC (DC) power is between 50W to 300KW.      The method of claim 1,     The plasma power supply capable of controlling gas and vacuum, characterized in that the energy generating means of the plasma power supply unit is a pulse power supply.      12. The pulse power supply of claim 11, wherein the pulse voltage of the pulse power supply varies from 0V to 1KV, the frequency of the pulse varies from 10Hz to 33KHz, and the duty ratio of the pulse varies from 1% to 99%. And the output of the pulse power source is between 50W and 200KW.       The method of claim 1,      Gas and vacuum control plasma power supply, characterized in that for connecting the gas valve, gas control valve, vent valve using a single gas connector box connected to the gas control unit and the electric line.      The method of claim 1,     Gas and vacuum control plasma power supply, characterized in that for connecting a low vacuum sensor, a high vacuum sensor, a vacuum valve using a single vacuum connector box connected to the vacuum control unit and an electric line.