KR100467680B1 - Formation method of black matrix of color CRT - Google Patents

Abstract

SUMMARY OF THE INVENTION: The present invention provides a method for forming a black matrix of a color CRT tube in which a black matrix pattern can be formed by a single film treatment process using a photosensitive black matrix solution in which an exposed portion is developed and removed.

Composition: A single film treatment process using a photosensitive black matrix solution mixed with a polymer, a photosensitive agent, graphite, and an additive of polymethacrylate or polyacrylate substituted with an alkyl system to form a black matrix pattern. The alkyl system is t-butyloxycarbonyl (t-BOC), t-butyl (tertial-butyl), isobutyl (iso-butyl), secondary butyl (sec-butyl), or isopropyl (iso -propyl), and the photosensitive agent is a photoacid generator, triphenylsulfonium triflate, diphenyliodonium, 4,4'-di-t-butyldiphenyl iodonium One of butyldipheyliodonium fluorophosphate, the additive being at least one of silicates, thickeners, stabilizers.

Effect: In the present invention, since the desired black matrix pattern can be formed by a single film treatment process using a photosensitive black matrix solution in which the exposed portion is removed, the number of processes can be reduced compared to the conventional method, making process management easier and productivity. This improves the production cost.

Description

Formation method of black matrix of color CRT

The present invention relates to a method for forming a black matrix of a color CRT, particularly a method for forming a black matrix of a CRT in which a black matrix pattern can be formed by a single film treatment process using a photosensitive black matrix solution in which an exposed portion is developed and removed. It is about.

Conventional shadow mask type CRTs arrange red, green, and blue phosphors in the form of dots (stripes) on the inner surface of the panel, and emit light by emitting electron beams smaller than the size of the phosphor dots (stripes). Consists of.

In this case, as the electrons scattered around the inner wall of the panel and the periphery of the shadow mask hit the entire fluorescent surface, the fluorescent film emits light and the contrast decreases. It emits light to lower the color purity.

In order to solve this drawback, a black matrix method has been developed in which the size of the phosphor is smaller than the size of the electron beam to be scanned and the space between each phosphor dot is filled with a non-luminescent absorbing material such as graphite.

The advantages of the black matrix method can be to prevent the lowering of the contrast due to external light, to improve the color purity, and to improve the luminance by increasing the transmittance of the front glass.

The manufacturing process of the black matrix for improving the display quality of the color CRT will be described with reference to FIGS. 2A to 2D.

The black matrix is coated with a photosensitive resin solution on the entire surface of the cleaned panel 2 as shown in FIG. 2A to form and dry the photosensitive resin film 4, and then covered with a mask MSK as shown in FIG. 2B. After the photosensitive resin film 4 is formed in a desired pattern by an etching process, graphite is coated and dried on the entire upper surface thereof to form the graphite film 6 as shown in FIG. 2C, and then the photosensitive resin film 4 is formed. The high-pressure etching removes the final black matrix pattern BM by the remaining pattern of the graphite film 6 as shown in FIG. 2D.

The process of forming the black matrix pattern is summarized as follows.

1st step: application of photosensitive resin film

-Second step: drying the coated photosensitive resin film

Third Step: Phenomenon of Photosensitive Resin Film

-Fourth step: drying the developed photosensitive resin film pattern

-Fifth step: applying a graphite film on top of the photosensitive resin film pattern

6th step: drying the graphite film

Step 7: Applying Etching Solution

Step 8: complete after high pressure etching

The photosensitive resin solution used in the formation of the photosensitive resin film is composed of a polymer compound, a photosensitive agent as a main component, and silane, a surfactant, and the like are added. PVP-DAS photoresist using 4'-Diazidostilbene-2,2'-sodium disulationate) is used.

In the reaction of the photosensitive resin film, the DAS is decomposed in the exposed portion, which again attacks the PVP to cause the photopolymerization crosslinking reaction, so that the exposed portion is cured so that the exposed portion is not dissolved in the developer and the unexposed portion is developed.

When a black matrix film is formed on the entire upper surface of the photosensitive resin film thus formed, a strong acid such as sulfuric acid is applied, and then developed using high pressure water, a portion where the pattern of the photosensitive resin film is formed is developed together with graphite by sulfuric acid. Therefore, a black matrix film is formed which is exactly the opposite of the pattern of the photosensitive resin film formed at first.

The conventional method of forming a black matrix as described above in the manufacturing process requires a two-time film treatment process for forming and etching the photosensitive resin film and the graphite film, so that the process takes a long time and the process management becomes difficult. Have

The present invention devised to solve the above-mentioned problems is a method of forming a black matrix of a color CRT tube, which can be reduced to a single film treatment process of two conventional film treatment processes for forming a black matrix. The purpose is to provide.

In the method of the present invention for achieving the above object, in the method of forming a black matrix of a color CRT, a photosensitive black matrix solution mixed with a polymer, a photosensitive agent, graphite, and an additive of an alkyl-based polymethacrylate or polyacrylate is used. The black matrix pattern is formed as a single film treatment step.

The alkyl system is t-butyloxycarbonyl (t-BOC), t-butyl (tertial-butyl), isobutyl (iso-butyl), secondary butyl (sec-butyl), or isopropyl (iso -propyl) can be applied.

The photoresist is a photoacid generator in triphenylsulfonium triflate, diphenyliodonium triphenylate, 4,4'-di-t-butyldiphenyl iodonium fluorophosphate One can apply.

The additive is at least one of silicates, thickeners, stabilizers.

In addition, the said single film | membrane process process is performed in order by the process of application | coating, drying, exposure, baking, and developing.

Hereinafter, the present invention will be described in detail as a preferred embodiment.

First embodiment

99 wt% of polymethacrylic acid 80% substituted with t-BOC and 1 wt% of triphenylsulfonium triflate were dissolved in PGMEA (Propyrene Glycol Methyl Ether Acetate) at a concentration of 7%. The mixture is stirred at a mixing ratio to form a photosensitive black matrix solution, which is then spin-coated to the cleaned glass panel. In this process, the panel on which the photosensitive black matrix film is formed is exposed to UV of 365 nm wavelength for 30 seconds, and then baked at 120 ° C. for 30 seconds and developed with 5% NaOH solution for 40 seconds. The inventors of the present application were able to obtain a black matrix pattern having a 1 μm resolution in which exposed portions were removed from the results of repeated experiments according to this first embodiment.

Second embodiment

99 wt% of polymethacrylic acid, 85% substituted by t-butyl system, and 1 wt% of 4,4'-di-t-butyldiphenylyodonium triflate were dissolved in PGMEA at a concentration of 7%, and graphite was added thereto. The mixture is stirred at a mixing ratio of 13% to form a photosensitive black matrix solution, which is then spin-coated to the cleaned glass panel. In this manner, the panel on which the photosensitive black matrix film is formed is exposed to UV of 365 nm wavelength for 30 seconds, and then baked at 120 ° C. for 30 seconds and then developed for 40 seconds with 5% NaOH solution. The inventors of the present application were able to obtain a black matrix pattern having a 1 μm resolution in which the exposed portion was removed even in the results of repeated experiments according to this second embodiment.

In the above two embodiments, when the photosensitizer receives light, it decomposes to generate acid. When attacking the polymer and reacting to change the hydrophobic group into a hydrophilic group and developing with an alkali solution such as NaOH after exposure, only the exposed part is developed with the polymer and graphite to obtain a positive pattern. It is formed.

As can be seen from these two embodiments, the black matrix pattern manufactured by the present invention is formed by a single film processing process rather than by two film processing processes as in the prior art.

That is, after the photosensitive black matrix solution containing the photosensitive resin and graphite is applied and dried to the cleaned panel 12 as shown in FIG. 1A to form the photosensitive black matrix film 14, the upper surface of FIG. As shown in FIG. 1C, the mask MSK is covered to be exposed, baked, cured, and then developed to remove the exposed portion of the photosensitive black matrix film 14, thereby providing a desired structure as shown in FIG. 1C. It is possible to form the black matrix pattern BM.

The process of manufacturing the black matrix pattern according to the present invention described above is summarized as follows.

First step: forming a photosensitive black matrix film (photosensitive resin film & graphite film)

Second step: drying the photosensitive black matrix film

3rd step: exposure

4th step: baking

-5th step: Complete after developing photosensitive black matrix film (photosensitive resin film & graphite film)

As described above, the method of the present invention capable of forming a black matrix pattern in a stepwise manner can form a black matrix pattern in a single film processing step by a photosensitive black matrix film from which an exposed portion is removed, thereby forming a photosensitive resin film. It is possible to save one film processing process compared with the conventional method of forming a desired black matrix pattern by two film processing processes, such as post-development to make a pattern, and then forming a graphite film thereon and high pressure etching. will be.

As described above, the present invention can form the desired black matrix pattern by a single film treatment process using the photosensitive black matrix solution in which the exposed portion is removed, thereby reducing the number of processes compared to the conventional process management. It can be easier, improves productivity and reduces production costs.

1A to 1C are process flowcharts to which the method of the present invention is applied.

2a to 2d is a process flow chart according to the conventional black matrix forming method

Claims (6)

In the black matrix forming method of the color CRT, A black film of a color CRT tube, characterized by forming a black matrix pattern as a single film treatment process using a photosensitive black matrix solution mixed with a polymer, a photoresist, graphite, and an additive of an alkyl-based polymethacrylate or a polyacrylate. Matrix Formation Method. The method of claim 1, wherein the alkyl system is tertial-butyloxycarbonyl (t-BOC), t-butyl (tertial-butyl), isobutyl (iso-butyl), secondary butyl (sec-butyl) Or black matrix forming method of color CRT, characterized in that one of isopropyl system is applied. The method of claim 1, wherein the photosensitive agent is a photoacid generator, triphenylsulfonium triflate, diphenyliodonium, diphenyliodonium, 4,4'-di-t- butyldiphenyl iodonium flow A method of forming a black matrix of color CRT, characterized in that one of phosphate (butyldipheyliodonium fluorophosphate) is applied. The method of claim 1, wherein the additive is at least one of a silicate, a thickener, and a stabilizer. The method for forming a black matrix of color CRTs according to any one of claims 1 to 5, wherein the graphite has a mixing ratio of 5 to 20% in the photosensitive black matrix solution. 2. The method of forming a black matrix of color CRTs according to claim 1, wherein the single film processing step is performed sequentially in the processes of coating, drying, exposure, baking, and developing.